Shallow Si etch(2um) with Drytek2

Yu-Ju Lin yjlin at stanford.edu
Mon Nov 5 12:23:19 PST 2001


Hi all,

I wonder how uniform is the shallow Si etch with Drytek2, could that be as
good as 20% error?

Since I must use photoresist as an etch mask, I couldn't use Lampoly. And
with STS, the etch rate is too fast; uniformity is also worse.

My process will be six trenches, 10um wide, 2um deep, and smallest spacing
is 5um.

Thanks!!

Yu-ju




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