mahnaz at snf.stanford.edu
Wed Oct 23 16:45:03 PDT 2002
It is my pleasure to let you know that there will be a class on DUV-248
nm on Thursday 10/24/02 at 2 pm in Auditorium in
The class will be given by Dr. Frank Yaghmaie of shipley and will cover:
Short discussion of I- line resist
DUV-248 nm lithography.
Material aspects of polymers, photo acid generators, quenchers and what
type of solvents used for 248 nm resists.
Families of DUV resists, high and low activation formulations.
Bi- layer lithography.
use of bottom anti reflective coating.
I will bring cookies
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