Etching mask for TMAH
hjkim at exch.hpl.hp.com
Fri Apr 4 11:38:31 PST 2003
Hi, Mr. Kim
I don't know if there's any wax, or polymer, withstanding
the base. In my experience, most of them didn't. Both oxide
and nitride work great, as you may know, except that a
long-time etch leaves some unwanted hillocks behind.
Some metals - like Au - are known to work also. But I don't
have much experience in this domain.
If making a mask hinders you from working on Si-materials,
you may use so called "soft lithography" with transparency
films, a laser printer and an old-fashioned contact printer
which doesn't care too much about the size and dimension of
Han-Jun Kim Hewlett-Packard Lab.
(650) 857-8525 1501 Page Mill Rd.
(650) 857-8948 FAX MS 1198
hjkim at hpl.hp.com Palo Alto, CA 94304
From: Hyoungsub Kim [mailto:hsubkim at stanford.edu]
Sent: Friday, April 04, 2003 12:51 AM
To: labmembers at snf.stanford.edu
Subject: Etching mask for TMAH
Dear lab members.
These days, I'm trying to etch a small piece of Si (dia. 3mm) from the
backside using TMAH at my lab w/o patterning.
I want to make a small hole in the center to make TEM sample, however, it is
hard to find a suitable mask (like wax type) to cover unwanted area.
I tried several waxes but all are easily soluble in TMAH. It should be
easily removed after Si etching.
I would appreciate if anybody can let me know possible material.
Thanks a lot.
Materials Science and Engineering, Stanford
E-mail : hsubkim at stanford.edu
Phone : (O) 650-725-2616
Address : (O) Rm 203 McCullough Bldg, Stanford, CA94305
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