Reminder: STS Etch Talk Today at 3pm

Jim McVittie mcvittie at snf.stanford.edu
Mon Mar 17 10:12:41 PST 2003


SNF Lab Members,

Richard Barnett of STS Wales will give a talk this afternoon (Monday,
March17)
in CISX 101 at 3pm entitled    
 
Surface Technology Systems High Rate Si Etch M Source.

Abstract:
The STS ASE(superscript: HRM(TM)) is the result of the extensive
development work undertaken to improve the basic Bosch process used on
the original ASE(superscript: (TM))-SR tool.  The HRM gives a three-fold
increase of etch rate over the SR as well as numerous other benefits
obtained through the different process chamber architecture and the
various process hardware and software improvements which gives the user
extra
process flexibility.  This presentation is an introduction to the STS
ASE (superscript: HRM(TM)) system, with a description of the background
to
the development work, a brief explanation of the tool configuration and
examples of the process results obtained.



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