Problems with PMMA as a mask

Scott D. Andrews sandrew at stanford.edu
Fri Oct 3 14:37:26 PDT 2003


Has anyone tried using PMMA as a mask when etching SiO2?  I need to etch
10 nm of SiO2 with 100 nm of PMMA as the mask layer.  However, when I use
the mrc with O2 and freon 23, the PMMA does not survive.  Ideally, I would
like an anisotropic etch, but if necessary, I would accept a wet process
that undercuts slightly.

Thanks,
Scott Andrews





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