RIE etch of SiN using a PMMA mask

ACREMANN at SSRL.SLAC.STANFORD.EDU ACREMANN at SSRL.SLAC.STANFORD.EDU
Wed Oct 15 11:04:45 PDT 2003


Hi

We need to pattern a SiN film of 10nm thickness using a 100nm PMMA
mask.
Is there a dry etching process in which the mask survives the etching
through the thin SiN layer? We can only use gold-contaminated
equipment.

Thanks
Yves



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