Reminder: XeF2 Etch Seminar

Mary Tang mtang at
Tue Oct 21 11:21:36 PDT 2003

Hi all --

Just a reminder of the XeF2 etch seminar, being given by David Springer
of Xactix....  M


Xenon Difluoride Silicon Etch: A Key Process Technology for MEMS
Thursday, Oct. 23, 2003
CIS Room 101 (The Linville Room)
Seminar 2:00pm - 3:00pm
Refreshments and Discussion 3:00pm - 4:00pm

A Rapidly growing number of companies and major MEMS R&D centers,
including Analog Devices, Northrop Grumman, Mitsubishi, NIST, NASA,
Berkeley, Cal Tech and Stanford, are using isotropic etching of silicon
with xenon difluoride for MEMS release and for creating micro
structures. The xenon difluoride etch is a
dry, gas phase etch, highly selective to a large number of materials,
which provides substantial benefits over wet or plasma etch processes.

In this seminar Dr. Springer will describe the etching process and
introduce some of the most recent products and research using xenon
silicon etch. These will serve as examples to demonstrate the many
advantages of releasing MEMS using xenon difluoride including its
excellent "reach",
the wide variety of materials which can now be used in manufacturing
MEMS devices and the ability to integrate MEMS with electronics, perform
long undercuts
and release using nano-scale release holes and  release layers.

Refreshments will be served.

David Springer is President of XACTIX, Inc, the leading supplier of
xenon difluoride silicon etch equipment. David received his Ph.D. in
engineering from Carnegie Mellon in 2001. Before joining XACTIX David
was active in the Electronic Design Automation industry including an
extended period as president and founder of DASYS, Inc. which pioneered
tools linking the behavioral design of ASICS and FPGAs with physical

Mary X. Tang, Ph.D.
National Nanofabrication Users' Network
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at

More information about the labmembers mailing list