Getting rid of photoresist

Venkatesh Hanumant Rao Chembrolu cvenky at
Tue Aug 3 11:56:30 PDT 2004


I am looking for a solvent to get rid of photoresist which has hardened after
being exposed to Ar etch in MRC. I was using PR as the etch mask to protect some
metal layers beneath. Soaking in Acetone for a day doesnt rip it off completely
(and I am reluctant to use oxgen plasma as it will be harsh on the metal
layers.) Has anyone dealt with something like this before? 

Many thanks.


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