Vignesh G Shankar
vigneshg at stanford.edu
Mon Jul 12 10:51:52 PDT 2004
I have a 25 nm thick patterned block copolymer template, which I am trying
to use for liftoff. Unfortunately, even with 2 nm of Cr down I am unable to
lift the unwanted polymer off. The polymer is cross-linked polystyrene.
Do you have any suggestions? I was thinking of ion milling at a glancing
angle to remove the top 2 - 3 nm layer of Cr enabling access for the
solvent (toluene) to the block. Do any of you know if such an ion milling
is possible at the SNF?
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