Etching low stress SiN in MRC

Venkatesh Hanumant Rao Chembrolu cvenky at
Mon Jul 26 12:58:14 PDT 2004


I am trying to etch 300nm of low stress silicon nitride in MRC (this is for a 5"
wafer which doesnot fit into Drytek 1) with 1.6um photoresist as the etch mask.
I am thinking of using the nitride etch recipe for MRC (Oxygen 3sccm, CHF3,
15sccm, 50mT, 50W) and would like to know if someone has done anything similar
before. Thanks.


More information about the labmembers mailing list