Etching low stress SiN in MRC

Venkatesh Hanumant Rao Chembrolu cvenky at stanford.edu
Mon Jul 26 12:58:14 PDT 2004


Hi,

I am trying to etch 300nm of low stress silicon nitride in MRC (this is for a 5"
wafer which doesnot fit into Drytek 1) with 1.6um photoresist as the etch mask.
I am thinking of using the nitride etch recipe for MRC (Oxygen 3sccm, CHF3,
15sccm, 50mT, 50W) and would like to know if someone has done anything similar
before. Thanks.

Venkatesh




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