Etching low stress SiN in MRC
Venkatesh Hanumant Rao Chembrolu
cvenky at stanford.edu
Mon Jul 26 12:58:14 PDT 2004
I am trying to etch 300nm of low stress silicon nitride in MRC (this is for a 5"
wafer which doesnot fit into Drytek 1) with 1.6um photoresist as the etch mask.
I am thinking of using the nitride etch recipe for MRC (Oxygen 3sccm, CHF3,
15sccm, 50mT, 50W) and would like to know if someone has done anything similar
More information about the labmembers