From dshankar at stanford.edu Wed Jun 2 06:34:10 2004 From: dshankar at stanford.edu (Shankar Devasenathipathy) Date: Wed, 2 Jun 2004 06:34:10 -0700 Subject: cleaning Platinum surfaces Message-ID: <1086183250.40bdd752eb710@webmail.stanford.edu> All, I am looking for a recipe for cleaning platinum surfaces and would like to check as to whether existing recipes for cleaning gold surfaces can be extended to platinum surfaces. If so, I would like to check with users on recommended gold cleaning approaches. Thanks, Shankar. From narayan.sundararajan at intel.com Thu Jun 3 11:27:40 2004 From: narayan.sundararajan at intel.com (Sundararajan, Narayan) Date: Thu, 3 Jun 2004 11:27:40 -0700 Subject: Chrome maskmaking vendor information Message-ID: All, I would like to get some chrome masks made with the minimum feature of 2.5 um as soon as possible. Does somebody have a list of vendors in the bay area that I can use or does somebody recommend a vendor in particular ? Thanks a lot Narayan From mtang at snf.stanford.edu Thu Jun 3 11:42:14 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 03 Jun 2004 11:42:14 -0700 Subject: ME342 Message-ID: <40BF7105.17AE6CA@snf.stanford.edu> Hi all -- Just a reminder that the ME342 class will be showing off their project posters this afternoon, at 3:30 pm, in the CIS lobby. (I understand there will be snacks.) Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From xzhuang at stanford.edu Thu Jun 3 11:51:36 2004 From: xzhuang at stanford.edu (Steve Zhuang) Date: Thu, 3 Jun 2004 11:51:36 -0700 Subject: need info--KOH etch protection Message-ID: <003501c4499b$cc12a8f0$bb5640ab@pky7> Hi all, Does anyone know an effective yet easy to clean material that can protect metal pads and silicon substrate during long KOH etch (about 10 hours)? Your input is highly appreciated! Steve Zhuang -------------- next part -------------- An HTML attachment was scrubbed... URL: From vlordi at stanford.edu Fri Jun 4 01:41:30 2004 From: vlordi at stanford.edu (Vincenzo Lordi) Date: Fri, 4 Jun 2004 01:41:30 -0700 Subject: REMINDER: University Oral Examination - Vincenzo Lordi (June 8, 3:30pm) Message-ID: University Oral Examination Vincenzo Lordi Department of Materials Science and Engineering Stanford University Tuesday, June 8, 2004 3:30pm (Refreshments will be served at 3:15pm) CIS-X Auditorium "Band Edge Optical Properties of GaInNAs(Sb) and the Relation to Atomic Structure" Lasers, detectors, and electroabsorption modulators operating in the telecommunications wavelength range of 1300-1600 nm are important not only for optical fiber communications, but also for use in optical interconnects to replace the electrical lines limiting the future speed of microelectronics. The design of long wavelength optical interconnects allows lower voltage operation as well as seamless integration with optical networking. The novel dilute nitride III-V alloys, GaInNAs and GaInNAsSb, are promising material systems for realizing quantum-well (QW) optoelectronic devices on GaAs that operate in this wavelength range. We grow these materials using solid-source molecular beam epitaxy (MBE). The luminescent quality of as-grown material is generally poor but is improved by ex situ rapid thermal annealing at 700-800 degC for 1-3 min. However, the improvement in material quality is accompanied by an undesirable blueshift of the wavelength. Understanding the mechanism of this blueshift is critical for reproducible control of the operating wavelength of devices using these materials in the active region. X-ray absorption, electroreflectance, and photoluminescence spectroscopies were used to study a series of transitions near the apparent band edge of the material that correspond to different N-In nearest neighbor configurations. These band-edge states are found to be a dominant contribution to the bandgap blueshift upon annealing. As-grown material contains a random distribution of bonds, which is dominated by N-Ga nearest neighbors, corresponding to a smaller bandgap. Annealing shifts the distribution of bonds toward increased N-In nearest neighbors and a configuration with a larger bandgap that is also more thermodynamically stable. The anneal-induced blueshift of the bandgap saturates after the material has reached equilibrium, as expected, although the luminescent quality of the material can continue to be increased. In addition, the electroabsorption properties of the GaInNAs(Sb) QWs were measured by photocurrent to determine their suitability for use in optical modulators. Spectra taken at room temperature demonstrate very nice quantum confined Stark effect (QCSE) behavior, with sharp exciton peaks having FWHM less than 25 meV. The peak absorption coefficient of fully annealed GaInNAsSb QWs was measured to be close to 35,000 /cm at ~1525 nm wavelength, a value higher than reported for competing materials, while annealed GaInNAs QWs showed peak absorption of ~18,000 /cm at 1250 nm. Analogous to the material's luminescent behavior, thermal annealing was found to increase the absorption coefficient of the QWs while blueshifting the bandgap, employing the mechanism described above. The measured electroabsorption characteristics indicate that optical modulators can be fabricated throughout the 1300-1600 nm wavelength range with performance comparable or superior to competing materials grown on InP substrates. We predict device performance for an asymmetric Fabry-Perot reflection modulator of up to 15-20 dB modulation ratio using less than 3 V swing. -------------- next part -------------- A non-text attachment was scrubbed... Name: % Type: application/applefile Size: 128 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Lordi-Abstract.pdf Type: application/octet-stream Size: 69879 bytes Desc: not available URL: From mcvittie at snf.stanford.edu Mon Jun 7 10:42:40 2004 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Mon, 07 Jun 2004 10:42:40 -0700 Subject: Nano Interconnect Technology Seminar Message-ID: <40C4A910.2EA70E3F@snf.stanford.edu> Special Seminar Thursday, June 10, 2004 11:00 AM CISX 338 Nano Interconnect Technology - Looking at the End of the Roadmap Werner Pamler, Infineon Technologies, Corporate Research, Munich, Germany Moving along the International Roadmap of Semiconductors we will be facing a series of severe challenges: keeping the resistivities small in spite of size effects, lowering the dielectric constant of insulators, and reducing the thickness of diffusion barriers. The nano-interconnects group at Infineon Corporate Research has the task to assess these challenges. This presentation will give an overview of these activities. Emphasis will be placed upon air gap technology where selective ozone / TEOS deposition may overcome some of the drawbacks of other approaches. This presentation is a NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing TeleSeminar. The slides will be posted to ERC's website prior to the seminar (http://www.erc.arizona.edu) >>>> follow the Weekly Seminars link for current presentation. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: mcvittie.vcf Type: text/x-vcard Size: 422 bytes Desc: Card for Jim McVittie URL: From rcrane at snf.stanford.edu Wed Jun 9 08:07:44 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Wed, 09 Jun 2004 08:07:44 -0700 Subject: Litho area HEPAs down Monday Message-ID: <40C727C0.493F06D4@snf.stanford.edu> Litho area users: As part of the humidifier water quality upgrade project for the litho area, on Monday, June 14, from 0700 through 1500, HEPA air (the clean air from the ceiling filters) will be turned off, one aisle at a time, (three aisles) for up to two hours per aisle, for up to a total of six hours. This HEPA air shutdown will affect the cleanroom's ability to maintain Class 100 air quality. Particle counts will increase. I would guess we could have a Class 1000 condition in the shutdown aisle. If your process is particle critical, please avoid processing during this time. Sorry for the inconvenience, Dick From rcrane at snf.stanford.edu Tue Jun 15 11:52:07 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Tue, 15 Jun 2004 11:52:07 -0700 Subject: Litho area humidity control Message-ID: <40CF4557.D873DDD0@snf.stanford.edu> Litho area users: As part of the humidifier water quality upgrade project for the litho area, on Monday, June 28, from 0700 through 1500, steam, for the humidifiers, will be turned off for up to eight hours. This shutdown will affect the litho area's ability to maintain 45% (+/- 5%) if the outside air (make-up air) is dryer than 45%. If the litho area air becomes dry, this condition will affect photoresist coatings performance (line resolution). If your process is critical, please avoid using the coat and expose tools in the litho area. Sorry for the inconvenience, Dick -------------- next part -------------- An HTML attachment was scrubbed... URL: From kaima at stanford.edu Tue Jun 15 12:19:03 2004 From: kaima at stanford.edu (Kai Ma) Date: Tue, 15 Jun 2004 12:19:03 -0700 (PDT) Subject: wire bonding service nearby Message-ID: Dear labmembers, Does anybody know any wire bonding service nearby except Pauline? I remember somebody asked the same question before but I don't recall the answer. Many thanks in advance for any information! Kai From cumings at stanford.edu Tue Jun 15 13:05:24 2004 From: cumings at stanford.edu (cumings at stanford.edu) Date: Tue, 15 Jun 2004 13:05:24 -0700 Subject: wire bonding service nearby Message-ID: <30CEAB6F30CF68AC@cumings.stanford.edu> -----Original Message----- Sent: Tuesday 6/15/2004 12:19:02 PM Subject: wire bonding service nearby Kai, At my former job, we used the wirebonding services of Quik-Pak / Gel-Pak. The wirebonding is done in San Diego. -John >Dear labmembers, > >Does anybody know any wire bonding service nearby except Pauline? I >remember somebody asked the same question before but I don't recall the >answer. > >Many thanks in advance for any information! > >Kai > -------------------------------------------------------- John Cumings cumings at stanford.edu Postdoctoral Scholar Physics Department Stanford University office (650) 725-1025 lab (650) 725-2047 fax (650) 724-3681 Geballe Laboratory for Advanced Materials 239 McCullough Building 476 Lomita Mall Stanford, CA 94305-4045 -------------------------------------------------------- From SMostarshed at nanosysinc.com Tue Jun 15 13:51:52 2004 From: SMostarshed at nanosysinc.com (Shahriar Mostarshed) Date: Tue, 15 Jun 2004 13:51:52 -0700 Subject: wire bonding service nearby Message-ID: <89C911D40A45984A82D27F7BF541386E2911C7@ca-exch1.at.nanosysinc.com> Try Semi-Pac in Sunnyvale 408-734-3832 -----Original Message----- From: cumings at stanford.edu [mailto:cumings at stanford.edu] Sent: Tuesday, June 15, 2004 1:05 PM To: kaima at stanford.edu; labmembers at snf.stanford.edu Subject: Re:wire bonding service nearby -----Original Message----- Sent: Tuesday 6/15/2004 12:19:02 PM Subject: wire bonding service nearby Kai, At my former job, we used the wirebonding services of Quik-Pak / Gel-Pak. The wirebonding is done in San Diego. -John >Dear labmembers, > >Does anybody know any wire bonding service nearby except Pauline? I >remember somebody asked the same question before but I don't recall the >answer. > >Many thanks in advance for any information! > >Kai > -------------------------------------------------------- John Cumings cumings at stanford.edu Postdoctoral Scholar Physics Department Stanford University office (650) 725-1025 lab (650) 725-2047 fax (650) 724-3681 Geballe Laboratory for Advanced Materials 239 McCullough Building 476 Lomita Mall Stanford, CA 94305-4045 -------------------------------------------------------- From Spotworthy at aol.com Tue Jun 15 14:02:53 2004 From: Spotworthy at aol.com (Spotworthy at aol.com) Date: Tue, 15 Jun 2004 17:02:53 -0400 Subject: wire bonding service nearby Message-ID: <558D21CA.68E8BC23.0CEC25E7@aol.com> Did a quick search on the online Thomas Register http://www.thomasregional.com did a search for wire bonding in N. California. Came up with: Semi-Pac, Inc 1206F Mountain View Alviso Rd. Sunnyvale, CA 94089 408-734-3832 Linda W. From kaima at stanford.edu Tue Jun 15 16:24:21 2004 From: kaima at stanford.edu (Kai Ma) Date: Tue, 15 Jun 2004 16:24:21 -0700 (PDT) Subject: Thanks! Re: wire bonding service nearby In-Reply-To: Message-ID: Many thanks for the quick answers! And if anybody is also interested in the answer, please let me know and I will forward to you. BTW, the reason I asked for service except Pauline is because Pauline will be in vacation for a little while next week but I need to do something quick and cannot wait for her to come back. I usually use her help and her work is fantastic. Thank you! Kai From bsooi at earthlink.net Tue Jun 15 20:40:17 2004 From: bsooi at earthlink.net (Boon Siew Ooi) Date: Tue, 15 Jun 2004 23:40:17 -0400 Subject: wire bonding service nearby References: <30CEAB6F30CF68AC@cumings.stanford.edu> Message-ID: <002801c45353$a5108210$0e0110ac@ad.lehigh.edu> Hi, I happen to know a small company called Agilecom in San Jose that provides wirebond (Al or Au), and small quantity semiconductor laser & high frequency device packaging services. Agilecom's contact is; Amy Lin or Yuan Shu Agilecome Fiber Solution 2372 Qume Dr., Menlo Business Park, Suite F San Jose, CA 95131, USA Tel: (408) 943-0815 fax (408) 943-1800 Regards, Boon ----- Original Message ----- From: To: ; Sent: Tuesday, June 15, 2004 4:05 PM Subject: Re:wire bonding service nearby -----Original Message----- Sent: Tuesday 6/15/2004 12:19:02 PM Subject: wire bonding service nearby Kai, At my former job, we used the wirebonding services of Quik-Pak / Gel-Pak. The wirebonding is done in San Diego. -John >Dear labmembers, > >Does anybody know any wire bonding service nearby except Pauline? I >remember somebody asked the same question before but I don't recall the >answer. > >Many thanks in advance for any information! > >Kai > -------------------------------------------------------- John Cumings cumings at stanford.edu Postdoctoral Scholar Physics Department Stanford University office (650) 725-1025 lab (650) 725-2047 fax (650) 724-3681 Geballe Laboratory for Advanced Materials 239 McCullough Building 476 Lomita Mall Stanford, CA 94305-4045 -------------------------------------------------------- From arvisun at stanford.edu Wed Jun 16 16:36:59 2004 From: arvisun at stanford.edu (arvind sundaramurthy) Date: Wed, 16 Jun 2004 16:36:59 -0700 Subject: SU-8 Message-ID: <143601c453fa$d1ccb600$cd5640ab@arvind> hi, I would like to know if someone has any experience/information about thinning down SU-8 negative resist and spinning it on to a thickness less than ~100nm. I would appreciate any assistance on this subject. Thanks, arvind Arvind Sundaramurthy Ph.D. Candidate, Dept. of Electrical Engg. Rm #16, Edward.L.Ginzton Lab 650-450-0475 arvisun at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From loropeza at engineering.ucsb.edu Thu Jun 17 11:52:00 2004 From: loropeza at engineering.ucsb.edu (Laura Oropeza) Date: Thu, 17 Jun 2004 11:52:00 -0700 Subject: gold alloy for tunneling electrodes Message-ID: Hello, I would like to know if someone has any experience/information about the appropiate metallization for tunneling tips on Silicon. Some people have used Al/Au but it presents the purple plague phenomena and it is easy that the metal comes out in the wire bonding process. I was thinking to use Ti/Au or Cr/Au but I don't Know how do these could affect the Au work function or if there is atoms migration. I would appreciate any assistance on this subject Thanks, Laura From zlrao at stanford.edu Sun Jun 20 23:21:03 2004 From: zlrao at stanford.edu (Zhilong Rao) Date: Sun, 20 Jun 2004 23:21:03 -0700 Subject: adhesion layer for highly reflective Au mirror Message-ID: <000a01c45757$eda82ed0$39aa0c80@Rao> Dear labmembers, I am considering depositing about 200nm Au film onto fused silica substrate and using the SiO2/Au interface as a highly reflective mirror operating at lambda~980nm. The problem is that Au peels off easily from SiO2 without adhesion layer. However, typical adhesion layer like Ti and Cr has relatively low reflectivity. Does anyone know any other metal that can help Au adhering to SiO2 and has high reflectivity at 980nm? One potential material other than metal is TiO2. Does anyone know whether there is any equipment here at Stanford that can provide deposition of amorphous TiO2? Or, is there a company nearby that can provide this service? Also, does anyone know where to find out the refractive index of amorphous TiO2 at around 980nm? Your input to any of the above questions would be highly appreciated. Thanks, Zhilong -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at snf.stanford.edu Mon Jun 21 17:23:08 2004 From: shott at snf.stanford.edu (John Shott) Date: Mon, 21 Jun 2004 17:23:08 -0700 Subject: New reservation system ... Message-ID: <080d01c457ef$182b2ee0$286540ab@jds> SNF Lab Members: The new revervation module will likely be installed in the next hour or two. This will necessitate a short shutdown of the Coral servers to reload the system. That shutdown period should be no longer than 10-15 minutes. If you have any questions about the new reservation module, please send e-mail to coral at snf.stanford.edu Thanks, John -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at snf.stanford.edu Tue Jun 22 07:09:21 2004 From: shott at snf.stanford.edu (John Shott) Date: Tue, 22 Jun 2004 07:09:21 -0700 Subject: New Coral capabilities ... Message-ID: <08c501c45862$843631c0$286540ab@jds> SNF Lab Members: We have a new set of capabilities in Coral that I'd like to tell you a bit about. First and foremost is the new reservation policy manager ... this allows us to define and enforce equipment-specific rules for reserving equipment that will, hopefully, allow better sharing of equipment in SNF. You will notice that with only a couple of exceptions (raith and innotec, I think) the reservation horizon has been returned to seven days. In general, making or deleting a reservation will be no different than it has been in the past. If a reservation is denied, however, you should get a more detailed message than you did in the past explaining why your reservation was denied. If you want to see what reservations apply to any piece of equipment, you can click on the new "Policy" tab on the Coral client. This shows a hierarchy of all of the reservation rules. Furthermore, if you select any piece of equipment on the equipment hierarchy, the policies that are applicable to that piece of equipment will be highlighted in green. While we have tried to name the individual policies so that they are somewhat self-explanatory, if you click on any one of the policies, you should see a description of exactly what that rule enforces in the lower right corner of the policy panel. Additionally, you will see the machines to which that rule applies in the upper right corner of the policy panel. If the rule is listed as applying to "SNF" it is a default rule that applies to all pieces of equipment unless it is specifically overridden on a particular piece of equipment. We have also added 2 new icons ... There is an icon that has an orange light where the red light is supposed to be. This means that this piece of equipment has a required facility that is unavailable ... and it means that you cannot enable it. Note: in the past, if a piece of required supporting equipment was shutdown, you could not enable it either ... but you got no visible indication that there was a problem. The second icon has an orange light in the place where the yellow problem light normally goes. This means that an optional piece of supporting equipment is shutdown ... however, because that equipment is optional, you may still enable the piece of equipment just as you can still enable a piece of equipment that is in a problem condition. We hope that these enhancements to the Coral system will be of use to you. If you have any comments, suggestions, or feedback, please send them to coral at snf.stanford.edu Thank you for your continued support, Team Coral -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at snf.stanford.edu Tue Jun 22 08:08:08 2004 From: shott at snf.stanford.edu (John Shott) Date: Tue, 22 Jun 2004 08:08:08 -0700 Subject: Remote Coral and old versions of Java ... Message-ID: <090201c4586a$ba328ff0$286540ab@jds> SNF Lab Members: We have discovered that some of the new Coral enhancements depend on Java features that are not supported by old versions of Java. If you try to fire up Remote Coral and get the message "Unable to Launch Remote Coral" it is likely that you are running an older version of Java. To fix that, you should go to http://java.sun.com/j2se/1.4.2/download.html and download the appropriate version of the "Java Runtime Environment" (JRE) for your machine. Note: on that page there are also several other things that you can download that you don't need ... and that are significantly bigger files to download. The things that you probably DON'T want (but are listed higher on the page than what you DO want) include: J2SE v1.4.2_04 SDK with NetBeans 3.6 Bundle (NetBeans aren't used by Remote Coral) J2EE 1.4 SDK (the "Enterprise Edition" is big and you don't need anything there for Remote Coral) J2SE SDK (the Software Developer's Kit includes a bunch of stuff that you don't need to run Remote Coral). So, make sure to look for and click the link that says "Download J2SE JRE". While we apologize for those of you who have to upgrade now, it's clear that virtually all of our planned Coral enhancements will require the newer versions of the JRE. Anything newer than 1.4.0 should work. Thanks, John -------------- next part -------------- An HTML attachment was scrubbed... URL: From vigneshg at stanford.edu Tue Jun 22 13:10:06 2004 From: vigneshg at stanford.edu (Vignesh G Shankar) Date: Tue, 22 Jun 2004 13:10:06 -0700 Subject: Etching pieces / smaller wafers in AMT? Message-ID: <5.2.1.1.2.20040622125618.017ce978@vigneshg.pobox.stanford.edu> Hi, I was wondering if any of you had any idea on how to etch smaller pieces or smaller wafers (like 3") in the AMT. Thanks. - Vignesh From jerabek at snf.stanford.edu Wed Jun 23 09:52:18 2004 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Wed, 23 Jun 2004 09:52:18 -0700 (PDT) Subject: mask writter Message-ID: To whoom it may concern, Laser mask writter LRS-18 is down due to a problem with objective lens movement. I have called Micronic service to address the issue. -Paul From mcvittie at snf.stanford.edu Wed Jun 23 12:02:00 2004 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Wed, 23 Jun 2004 12:02:00 -0700 Subject: Etching pieces / smaller wafers in AMT? References: <5.2.1.1.2.20040622125618.017ce978@vigneshg.pobox.stanford.edu> Message-ID: <40D9D3A8.9212CB8F@snf.stanford.edu> Vignesh, You have to get my ok to use pieces on the AMT. Presently, we do not allow pieces in that tool. We are using pieces in some other tools but only after experiments show we have a specific technique the tool. Oxide etching is the most difficult plasma process to do pieces in since it runs at the highest power density. We have done piece tests in the AMT in the past without finding a good reliable technique. In the clean etchers, we do not allow the use of Kapton tape to hold pieces on to carrier wafers because concerns about metal impurities. Maybe we can setup a time and talk about your need. Jim Vignesh G Shankar wrote: > Hi, > > I was wondering if any of you had any idea on how to etch smaller pieces or > smaller wafers (like 3") in the AMT. Thanks. > > - Vignesh -------------- next part -------------- A non-text attachment was scrubbed... Name: mcvittie.vcf Type: text/x-vcard Size: 422 bytes Desc: Card for Jim McVittie URL: From wkim at stanford.edu Wed Jun 23 18:11:21 2004 From: wkim at stanford.edu (Woong Kim) Date: Wed, 23 Jun 2004 18:11:21 -0700 (PDT) Subject: Question about TiN, TaN, Ti3N Message-ID: Does anybody know where we can evaporate/sputter TiN, Ti3N or TaN ? We need about 30 nm thick deposition on SiO2 substrate. I'd really appreciate it, if anyone let me know where these things can be done or which group does this kind of metal nitride deposition. Thanks. Woong From mrolandi at stanford.edu Wed Jun 23 21:47:00 2004 From: mrolandi at stanford.edu (Marco Rolandi) Date: Wed, 23 Jun 2004 21:47:00 -0700 (PDT) Subject: Question about TiN, TaN, Ti3N (fwd) Message-ID: posting for a collegue... ---------- Forwarded message ---------- Date: Wed, 23 Jun 2004 21:22:20 -0700 (PDT) From: Woong Kim To: Marco Rolandi Subject: Question about TiN, TaN, Ti3N (fwd) ---------- Forwarded message ---------- Date: Wed, 23 Jun 2004 18:11:21 -0700 (PDT) From: Woong Kim To: labmembers at snf.stanford.edu Subject: Question about TiN, TaN, Ti3N Does anybody know where we can evaporate/sputter TiN, Ti3N or TaN ? We need about 30 nm thick deposition on SiO2 substrate. I'd really appreciate it, if anyone let me know where these things can be done or which group does this kind of metal nitride deposition. Thanks. Woong From ofidaner at stanford.edu Thu Jun 24 09:38:45 2004 From: ofidaner at stanford.edu (Onur Fidaner) Date: Thu, 24 Jun 2004 09:38:45 -0700 Subject: Question about TiN, TaN, Ti3N In-Reply-To: Message-ID: <5.2.0.9.2.20040624093108.00a6aa70@localhost> We had the HTE labs sputter TaN for us. They are a small company in Santa Clara: 2964 Scott Blvd. Santa Clara, a 95054 (408) 986-8026 http://www.htelabs.com/ At 06:11 PM 6/23/2004 -0700, Woong Kim wrote: >Does anybody know where we can evaporate/sputter TiN, Ti3N or TaN ? > >We need about 30 nm thick deposition on SiO2 substrate. >I'd really appreciate it, if anyone let me know where these things can be >done or which group does this kind of metal nitride deposition. Thanks. > >Woong From jerabek at snf.stanford.edu Thu Jun 24 16:54:44 2004 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Thu, 24 Jun 2004 16:54:44 -0700 (PDT) Subject: mask writer shutdown Message-ID: Problem has been fixed by Micronic service yesterday evening. I have written several masks since and everything looks fine. -Paul From rcrane at snf.stanford.edu Fri Jun 25 07:21:04 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 25 Jun 2004 07:21:04 -0700 Subject: Litho area humidity control Message-ID: <40DC34D0.2527F9B2@snf.stanford.edu> Reminder for litho area users: As part of the humidifier water quality upgrade project for the litho area, on Monday, June 28, from 0700 through 1500, steam, for the humidifiers, will be turned off for up to eight hours. This shutdown will affect the litho area's ability to maintain 45% (+/- 5%) if the outside air (make-up air) is dryer than 45%. If the litho area air becomes dry, this condition will affect photoresist coatings performance (line resolution). If your process is critical, please avoid using the coat and expose tools in the litho area. Sorry for the inconvenience, Dick From mtang at snf.stanford.edu Fri Jun 25 16:26:05 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Fri, 25 Jun 2004 16:26:05 -0700 Subject: Slow Coral... Message-ID: <40DCB48C.9C96EB12@snf.stanford.edu> Greetings -- I understand from the Coral Development Team that when response time on Coral is slow, nowadays, it's almost always because of non-Coral related use of the system. Apparently, Mozilla, Netscape, and Star Office use up a lot of system resources, particularly when people have multiple sessions going on at once. So, the recommendations are, as follows (at least as I understand them -- I take full responsibility for inaccuracies or misunderstanding): 1. Keep only one active session (please use and hang on to that SunRay card!) 2. Mozilla is the preferred browser (Netscape has a tendency to run away and take up lots of computing resources) 3. Close Mozilla and Star Office when not in use 4. Use of remote Coral (which does not load the system) is encouraged Please try to conserve computer resources -- if we all do, then there will be no waiting to enable something... Thanks, Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From bsjung at stanford.edu Wed Jun 30 13:29:13 2004 From: bsjung at stanford.edu (Byoungsok Jung) Date: Wed, 30 Jun 2004 13:29:13 -0700 Subject: glass wafer grinding/polishing References: <89C911D40A45984A82D27F7BF541386E2911C7@ca-exch1.at.nanosysinc.com> Message-ID: <037b01c45ee0$e88bae50$f5a440ab@scipa> Dear Labmembers, Does anyone know any glass wafer polishing/grinding service nearby? Many thanks in advance for any information. Regards, Byoungsok From latta at snf.stanford.edu Wed Jun 30 17:10:38 2004 From: latta at snf.stanford.edu (Nancy Latta) Date: Wed, 30 Jun 2004 17:10:38 -0700 Subject: Missing Process Information Book Message-ID: <40E3567E.1060303@snf.stanford.edu> Folks, A unknown labmember has unwittingly removed the process information book from the tycom near the LPCVD's.area. The book contains lots of useful information about processing in the lab, such as SiH4 and PH3 ratios for doped LTO, etchrates for various wet etchants and oxidation charts time vs temp. If you are this unknow person, will you please replace the book. The labmembers in general will thank you. -Nancy