high dose implant resist process?

Dan Grupp grupp at snowmass.Stanford.EDU
Tue Mar 9 15:51:44 PST 2004


Hello,
   I am having trouble with a 1E15 175 keV implant. the 1 um 3612 resist
blisters.  Bake must not be long enough. does anyone have a working
process for this?
Much Thanks,
Dan

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Dr. Daniel Grupp
Center for Integrated Systems
Stanford University
Stanford, CA 94305
(650) 724-6911
FAX:  723-4659
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