Etching small features in Si

Rohan D. Kekatpure rohank at stanford.edu
Tue Nov 2 13:07:18 PST 2004


Hi all,

I am trying to etch ~ 200-250nm wide trenches in Silicon with an aspect 
ratio of about 1:2 to 1:3. I have an oxide hard mask and it is not critical 
that I stop perfectly on some material (eg., oxide etc). About 5 degrees 
tilt in the sidewalls is also tolerable. I am looking for a first order 
guess on what chemistry (Fluorine, Chlorine, SF6 etc) to use and which 
instrument would be best suited for this purpose.

Thank you in advance!

-Rohan




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