From rissman at stanford.edu Mon Oct 4 08:45:09 2004 From: rissman at stanford.edu (Paul Rissman) Date: Mon, 04 Oct 2004 08:45:09 -0700 Subject: New Agreement Form Message-ID: <5.1.1.5.2.20041004083746.022a68c8@rissman.pobox.stanford.edu> Dear non-Stanford labmember: As you know, your use of this lab is governed by the terms covered in the SNF User Agreement form that you signed upon joining SNF. Over the years, the form has evolved somewhat, and it seems now that different terms may apply to different labmembers, depending on when he or she joined SNF. We have now updated the labmember agreement form. This form is now available on the web and is the official version of the form, as of October 1, 2004. All new prospective, non-Stanford labmembers will be required to sign this form. http://www-snf.stanford.edu/Access/AgreementForm.pdf I am also asking that all active non-Stanford labmembers sign this new form as well and to submit them to Maureen Baran by November 1. There will be a grace period, as a courtesy to those whose institutions may require additional time to review the new forms; a request for additional time must be made in writing to access at snf.stanford.edu. If an updated agreement form is not received, we will assume that you wish your labmembership to lapse. I apologize for the inconvenience this may cause, but please bear with usas we get underway on our program to update and streamline our adminstration. Thank you, Paul Rissman, Director Research Operations Stanford Nanofabrication Facility From lgx at stanford.edu Mon Oct 4 09:07:12 2004 From: lgx at stanford.edu (Guanxiong Li) Date: Mon, 4 Oct 2004 09:07:12 -0700 Subject: Reminder: University Oral Examination Announcement for Guanxiong Li References: <01ae01c4a25b$51d08440$876b40ab@stanford.edu> Message-ID: <001d01c4aa2c$35dc75e0$27a70c80@stanford.edu> ************ REMINDER ************ University Oral Examination Title: Spin Valve Sensor for Biomolecular Identification: Design, Fabrication and Characterization Guanxiong Li Department of Materials Science and Engineering Date: Tuesday, October 5, 2004 Time: 1:30 pm Place: McCullough 335 (Refreshments will be served at 1:15 pm) Biomolecular identification, e.g. DNA recognition, has broad applications in biology and medicine such as gene expression analysis, disease diagnosis and DNA fingerprinting. We have been developing a magnetic biodetection technology based on the giant magnetoresistive spin valve sensors and the magnetic nanoparticles (< 20 nm in diameter) as biomolecular labels in an effort to provide a highly sensitive, quantitative, portable and cost-effective biomolecular identification device. This dissertation is concentrated on the design, modeling, fabrication and characterization of the spin valve sensors, aiming to prove the magnetic biodetection concept and demonstrate the feasibility of the magnetic nanoparticle detection by the spin valve sensors. The intended magnetic nanoparticle labels are superparamagnetic at room temperature with zero magnetic remanence. Therefore, the nanoparticles need to be magnetically excited in order to generate magnetic fringing fields detectable by the field-sensitive spin valve sensors. DC or AC magnetic excitation can be applied, for which we have designed several nanoparticle detection schemes. An analytical model has been developed for the magnetic nanoparticle detection, based on the two assumptions of (1) the equivalent average field of magnetic nanoparticles and (2) the coherent rotation of spin valve free layer magnetization. Micromagnetic simulations have also been performed for the spin valve sensors. The analytical model is found consistent with the micromagnetic simulations and can be used as an efficient design tool. The prototype spin valve sensors have been fabricated at both micron and submicron scales. We first demonstrated that the micron-sized spin valve sensors successfully detected a single 2.8-um magnetic microbead. To demonstrate the detection of magnetic nanoparticles, we developed a bilayer liftoff process, based on a polymer-mediated self-assembly and fine lithography, to deposit magnetic nanoparticles onto sensor surface in a controlled manner. With this liftoff process, we successfully detected the monodisperse 16-nm Fe3O4 nanoparticles in a quantity from tens to hundreds using submicron spin valve sensors at room temperature. A linear dependence of the spin valve sensor signal on the number of nanoparticles has been found, as desired for the quantitative biodetection. The detection limit was found to be 14 Fe3O4 nanoparticles with the current detection scheme. Preliminary detection results on the nanoparticle-labeled DNA hybridization events will also be presented. -------------------------------------------------- Materials Science and Engineering Stanford University Office: 208 McCullough Bldg. Phone: 650-723-2939 --------------------------------------------------- -------------- next part -------------- A non-text attachment was scrubbed... Name: Defense Abstract.pdf Type: application/pdf Size: 22769 bytes Desc: not available URL: From edmyers at stanford.edu Mon Oct 4 11:23:18 2004 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 04 Oct 2004 11:23:18 -0700 Subject: Nanospec Failure Message-ID: <6.0.1.1.2.20041004111314.01bc0880@edmyers.pobox.stanford.edu> Labmembers, It appears the terminal configurations for both Nanospecs next to the WBGENERAL have been corrupted. It is unfortunate we have lost the measurement capabilities of this equipment do to unauthorized meddling in the computer set-up. In the future, if the systems are not functioning properly please put them down on Coral and inform the staff. We are attempting to get both systems operational. Unfortunately, the recommended recovery procedures from Nanometrics have not worked. There is a high likelihood a visit from Nanometrics will be required to get the systems functional. Regards, Ed Myers From guerra at par.stanford.edu Mon Oct 4 13:59:46 2004 From: guerra at par.stanford.edu (Ann Guerra) Date: Mon, 4 Oct 2004 13:59:46 -0700 (PDT) Subject: EE310 Integrated Circuits Seminar, 10/5/04 Message-ID: "Silicon Devices at the 'End of Scaling' -- Opportunities and Challenges" H.-S. Philip Wong Dept. of Electrical Engineering Stanford University Tuesday, October 5, 2004 4:15 p.m. Packard-101 ABSTRACT As silicon CMOS devices scale into the nanometer regime, the material set and device structures employed by conventional Si FET are beginning to reach their limits. We begin this talk by outlining the opportunities for device performance improvements, along with potential challenges and solutions to the challenges. Examples of research topics of current interest will be given. These include: transport-enhanced devices, multi-gate FETs, and other novel devices. Directions for further research will be discussed. BIOGRAPHY H.-S. Philip Wong joined the IBM T. J. Watson Research Center, Yorktown Heights, New York, in 1988. In September, 2004, he joined Stanford University as Professor of Electrical Engineering. While at IBM Research, he was a Senior Manager having the responsibility of shaping and executing IBMs strategy on nanoscale science and technology and semiconductor technology. At IBM, he performed and managed research that has a time horizon that rivals the most adventurous university research. His research interests are in nanoscale science and technology, semiconductor technology, solid state devices, and electronic imaging. He is interested in exploring new materials, novel fabrication techniques, and novel device concepts for future nanoelectronics systems. Novel devices often require new concepts in circuit and system designs. His research also includes explorations into circuits and systems that are device-driven. (URL: http://www.stanford.edu/~hspwong). He is a Fellow of the IEEE. He is a member of the Emerging Research Devices Working Group of the International Technology Roadmap for Semiconductors (ITRS). From grupp at stanford.edu Wed Oct 6 14:23:16 2004 From: grupp at stanford.edu (Dan Grupp) Date: Wed, 6 Oct 2004 14:23:16 -0700 (PDT) Subject: Laser wafer cutting, Message-ID: Hello, Does anyone know where to have a small wafer laser cut out of a larger diameter wafer? Thanks, Dan --------------------------------------------------------------------------- Dr. Daniel Grupp, Visiting Scholar Center for Integrated Systems Stanford University Stanford, CA 94305 (650) 724-6911 FAX: 723-4659 --------------------------------------------------------------------------- From mbaran at stanford.edu Thu Oct 7 08:41:56 2004 From: mbaran at stanford.edu (Maureen Baran) Date: Thu, 7 Oct 2004 08:41:56 -0700 Subject: Found item Message-ID: <200410071541.i97Fft0K024422@smtp2.Stanford.EDU> If you have lost something of value in or around the lab in the last day, please come see me in cubicle # 41. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mahnaz at snf.stanford.edu Thu Oct 7 14:29:43 2004 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Thu, 07 Oct 2004 14:29:43 -0700 Subject: KS Bonder presentaion Message-ID: <4165B547.6B8F3372@snf.stanford.edu> Hello all, There will be a presentation on Clean silicon Direct bonding on Tuesday 10/12 at 10 am in CIS 101, given by Suzanne Ericson of Karl suss. The session will follow with a presentation next to the system in the lab from 2-4 pm. Please do your best to attend both sessions. The Ks bonder is a clean system ( diffusion clean) so No anodic or eutectic bond is allowed in the system. If you have a specific question or topic to be covered send your request to me as soon as possible. Please rsvp to me if you plan to attend. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From shsia at unitysemi.com Thu Oct 7 15:16:07 2004 From: shsia at unitysemi.com (Steve Hsia) Date: Thu, 7 Oct 2004 15:16:07 -0700 Subject: FW: Laser wafer cutting, Message-ID: <000001c4acbb$3f61c390$0780800a@SteveHsia> Directed Light, Inc. Corporate Office Directed Light, Inc. 633 River Oaks Parkway San Jose, CA 95134 408-321-8500 (ph) 408-321-8466 (fx) 800-468-2326 (Toll Free - USA) -----Original Message----- From: Ed Ward [mailto:eward at unitysemi.com] Sent: Thursday, October 07, 2004 11:12 AM To: Steve Hsia Subject: FW: Laser wafer cutting, Steve, do you remember the company that did this. If so can you give this guy a little help. Thanks, Ed -----Original Message----- From: Dan Grupp [mailto:grupp at stanford.edu] Sent: Wednesday, October 06, 2004 2:23 PM To: labmembers at snf.stanford.edu Subject: Laser wafer cutting, Hello, Does anyone know where to have a small wafer laser cut out of a larger diameter wafer? Thanks, Dan ------------------------------------------------------------------------ --- Dr. Daniel Grupp, Visiting Scholar Center for Integrated Systems Stanford University Stanford, CA 94305 (650) 724-6911 FAX: 723-4659 ------------------------------------------------------------------------ --- From qngo at mail.arc.nasa.gov Thu Oct 7 16:50:22 2004 From: qngo at mail.arc.nasa.gov (Quoc Ngo) Date: Thu, 7 Oct 2004 16:50:22 -0700 Subject: Shadow mask manufacturer Message-ID: Dear Colleagues- I was wondering if any one out there knows of a shadow mask manufacturer that is reliable and has a relatively quick turn around time. My desired minimum feature sizes are >5um and are fairly simple structures. Any help would be greatly appreciated! Regards, Quoc Ngo NASA Ames Research Center MS229-1 Moffett Field, CA 94035 (650) 604-2434 qngo at arc.nasa.gov From mahnaz at snf.stanford.edu Thu Oct 7 16:52:09 2004 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Thu, 07 Oct 2004 16:52:09 -0700 Subject: Yes oven Message-ID: <4165D6A9.2E09548@snf.stanford.edu> Hello all, Please do not play with oven's setting, Yesterday 10/7 we found yes oven at 125 C and checking the equipment we realized that the setting was changed. This is a unacceptable behavior, need help see Mike, Mario or me mahnaz From grupp at snowmass.stanford.edu Thu Oct 7 18:23:51 2004 From: grupp at snowmass.stanford.edu (Dan Grupp) Date: Thu, 7 Oct 2004 18:23:51 -0700 Subject: Shadow mask manufacturer In-Reply-To: References: Message-ID: I used recently DEK, they made a mask with 150um squares with pretty sharp corners in 2 mil stainless. -Dan DEK USA 2231 Ringwood Avenue San Jose CA. 95131 Phone +1 408 954 1269 >Dear Colleagues- > >I was wondering if any one out there knows of a shadow mask >manufacturer that is reliable and has a relatively quick turn around >time. My desired minimum feature sizes are >5um and are fairly >simple structures. Any help would be greatly appreciated! > >Regards, >Quoc Ngo > >NASA Ames Research Center >MS229-1 >Moffett Field, CA 94035 >(650) 604-2434 >qngo at arc.nasa.gov -- --------------------------------------------------------------------------- Dr. Daniel Grupp, Visiting Scholar Center for Integrated Systems Stanford University Stanford, CA 94305 (650) 724-6911 FAX: 723-4659 --------------------------------------------------------------------------- -------------- next part -------------- An HTML attachment was scrubbed... URL: From mcvittie at snf.stanford.edu Fri Oct 8 12:58:32 2004 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Fri, 08 Oct 2004 12:58:32 -0700 Subject: Local AVS Symposium on CMP, Thin Films & Plasma Etch Message-ID: <4166F167.3C5BCDAF@snf.stanford.edu> The Local Chapter of the American Vaccuumm Society (AVS) is having three one day symposiums next week in San Jose at the San Jose DoubleTree Hotel. The one day registration is $175, two day is $300 and all three days are $400. http://www.avsusergroups.org/index.cfm?menu=2004&page=2004_information Oct 13 Annual CMP group symposium http://www.avsusergroups.org/index.cfm?menu=CMPUG&page=2004_CMPUG Oct 14 Annual CMP group symposium http://www.avsusergroups.org/index.cfm?menu=TFUG&page=2004_TFUG Oct 15 PEUG Annual Symposium "Challenges for the 65 nm Node" 8:30 - 9:10 "Nanoelectronic Materials and Devices beyond CMOS Scaling" Yoshio Nishi, Stanford Nanofabrication Facility 9:10 - 9:50 "FEOL Challenges For The 65nm Node" Ravindre Kapre, Cypress Semiconductor 9:50 - 10:30 "Front End Technology Direction at 65nm Node and Beyond" Mohammad Mirabedini, LSI Logic 10:30 - 10:50 Break 10:50 - 11:30 "65nm and Beyond: Advanced Plasma Etching Technology" Timothy Dalton, IBM 11:30 - 12:10 "Dual damascene porous ultra low-k etch development" Ricky McGowan, Sematech 12:10 - 1:20 Lunch 1:20 - 2:00 "The Impact of New Process Control on Etch Limited Yield" Kevin Monahan, KLA/Tencor 2:00 - 2:40 "Addressing Technology, Productivity, and Cost Challenges of Post Etch Dry Processing for 65nm and Below Technology Nodes" Hongching Shan, Mattson 2:40 - 3:00 "Tool and wafer level data for process optimization using integrated metrology and in-situ sensors" Andy Skumanich, Matt Davis, David Mui, John Yamartino, Applied Materials 3:00 - 3:20 "Study on Plasma Induced Damaged in High-Density Plasma--For 65/90nm Technology Nodes" Hanming Wu, David Gao, John Chen, Semiconductor Manufacturing International Corporation (SMIC) -------------- next part -------------- A non-text attachment was scrubbed... Name: mcvittie.vcf Type: text/x-vcard Size: 422 bytes Desc: Card for Jim McVittie URL: From jwc at snf.stanford.edu Fri Oct 8 15:35:06 2004 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 08 Oct 2004 15:35:06 -0700 Subject: Shadow mask manufacturer In-Reply-To: References: Message-ID: <4167161A.1010109@snf.stanford.edu> Greetings: I have had some very nice shadow mask made for me by Photo Sciences with very fast turn around time and high quality too! Contact: Suresh Biligiri Director of Engineering 310-634-1565 sureshb at photo-sciences.com James Conway Stanford Nanofabrication Facility Quoc Ngo wrote: > Dear Colleagues- > > I was wondering if any one out there knows of a shadow mask > manufacturer that is reliable and has a relatively quick turn around > time. My desired minimum feature sizes are >5um and are fairly simple > structures. Any help would be greatly appreciated! > > Regards, > Quoc Ngo > > NASA Ames Research Center > MS229-1 > Moffett Field, CA 94035 > (650) 604-2434 > qngo at arc.nasa.gov -------------- next part -------------- An HTML attachment was scrubbed... URL: From mcvittie at snf.stanford.edu Mon Oct 11 09:25:48 2004 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Mon, 11 Oct 2004 09:25:48 -0700 Subject: FW: Laser wafer cutting, References: <000001c4acbb$3f61c390$0780800a@SteveHsia> Message-ID: <416AB40C.D4DF3A8D@snf.stanford.edu> Steve, Here are two names of places where we have gotten laser cutting done in the past. Jim Date: Tue, 1 Feb 2000 From: Dinkar Singh (Gibbon's group) Our group usually goes to the following place Applied Fusion 1915 REPUBLIC AVENUE SAN LEANDRO, CA 94577 Phone: 415-351-8314 Talk to: Ron Holton -------- From: Lukaszek Subject: Re: Wafer Cutting Vendor Name The name of the outfit is SILICON QUEST INTERNATIONAL. Our contact there is MYRA PARKS Her number is 408-496-1000 x. 134+ADs- fax: 408-496-1133 ------------ Steve Hsia wrote: > Directed Light, Inc. > > Corporate Office > Directed Light, Inc. > 633 River Oaks Parkway > San Jose, CA 95134 > > 408-321-8500 (ph) > 408-321-8466 (fx) > 800-468-2326 (Toll Free - USA) > > -----Original Message----- > From: Ed Ward [mailto:eward at unitysemi.com] > Sent: Thursday, October 07, 2004 11:12 AM > To: Steve Hsia > Subject: FW: Laser wafer cutting, > > Steve, do you remember the company that did this. If so can you give > this guy a little help. > > Thanks, > > Ed > > -----Original Message----- > From: Dan Grupp [mailto:grupp at stanford.edu] > Sent: Wednesday, October 06, 2004 2:23 PM > To: labmembers at snf.stanford.edu > Subject: Laser wafer cutting, > > Hello, > Does anyone know where to have a small wafer laser cut out of a > larger diameter wafer? Thanks, Dan > > ------------------------------------------------------------------------ > --- > Dr. Daniel Grupp, Visiting Scholar > Center for Integrated Systems > Stanford University > Stanford, CA 94305 > (650) 724-6911 > FAX: 723-4659 > ------------------------------------------------------------------------ > --- -------------- next part -------------- A non-text attachment was scrubbed... Name: mcvittie.vcf Type: text/x-vcard Size: 422 bytes Desc: Card for Jim McVittie URL: From shimm at stanford.edu Mon Oct 11 12:24:12 2004 From: shimm at stanford.edu (Joon Hyung Shim) Date: Mon, 11 Oct 2004 12:24:12 -0700 Subject: looking for vendors for stainless steel etching Message-ID: <1097522652.416adddcdf7ac@webmail.stanford.edu> CIS labmembers, I have a part should be made of stainless steel with various thicknesses from 20um to 500um. And holes should be etched out. Is anyone aware of any etching company doing fast service. Thank you. Joon From mahnaz at snf.stanford.edu Tue Oct 12 08:52:32 2004 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Tue, 12 Oct 2004 08:52:32 -0700 Subject: [Fwd: KS Bonder presentaion] Message-ID: <416BFDC0.E61CD4FD@snf.stanford.edu> -------------- next part -------------- An embedded message was scrubbed... From: Mahnaz Mansourpour Subject: KS Bonder presentaion Date: Thu, 07 Oct 2004 14:29:43 -0700 Size: 2968 URL: From rcrane at snf.stanford.edu Thu Oct 14 08:57:25 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Thu, 14 Oct 2004 08:57:25 -0700 Subject: 2004 Holiday Shutdown Message-ID: <416EA1E4.7DC02C2A@snf.stanford.edu> Fab users, Time to plan ahead. We are approaching the Christmas Holiday season, Stanford University will being closing down for two weeks and it is time for the SNF annual equipment maintenance marathon. The fab will close at 0700 on Friday, December 17. All users need to be out of the fab by then. The fab reopens for use at 1600 on Monday, January 3. Staff will be requalifying equipment during the day and we will have 80-90% of the tools ready for use by 1600. Watch for tool status on Coral. CIS and CISX building will be officially closed for the 12/17-1/3 break. There will be no heating, janitorial services, staff services, mail and package delivery services and the building will be locked. The receiving area is not available for parking. Any vehicles locked in will need to be recovered through police services or left overnight. Please don't park there. A, C, and Z parking lot permit enforcement will be suspended during the break (fire zone and handicap areas excluded). Thanks, Dick From jerabek at snf.stanford.edu Thu Oct 14 16:07:10 2004 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Thu, 14 Oct 2004 16:07:10 -0700 (PDT) Subject: Micronic mask writer Message-ID: To whoom it may concern, Micronic mask writer is down due to an optical path misalignment. Micronic service has been working on it today without favorable outcome. They will continue tomorrow, and beyond if neccessary, until fixed. -Paul From rcrane at snf.stanford.edu Mon Oct 18 11:07:09 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Mon, 18 Oct 2004 11:07:09 -0700 Subject: construction in bank3/4 area tomorrow Message-ID: <4174064D.DC194D20@snf.stanford.edu> Lab users, The wbsilicide will be moved from the bank 4 fingerwall to the bank 3 fingerwall (same aisle) tomorrow, Tuesday, 10/19. The work will start at 0730 and run throughout the day with most of the work being finished by noon. Bank 3 and 4 furnace will be open for use, but there will be two to three contractors working in the bench area and walking through the door between furnaces. If you are doing critical furnace work, you want to wait until after 1600. This move is the next step in installing the second Thermco furnace. Sorry for any inconvenience, Dick From shott at snf.stanford.edu Wed Oct 20 05:34:05 2004 From: shott at snf.stanford.edu (John Shott) Date: Wed, 20 Oct 2004 05:34:05 -0700 Subject: Overnight shutdown of SiH4, Si2H2Cl2, and dopant gases last night (Tuesday night) Message-ID: <41765B3D.9010707@snf.stanford.edu> SNF Lab Members: It appears as if we experienced an exhaust fan failure (or at least a failure of the sensor that determines whether the exhaust fan is on) in the toxic gas vault. It appears as if this conditions causes the gases in that room to be shutdown as a safety precaution. This would include silane (SiH4), germane (GeH4), dichlorosilane (SiH2Cl2), as well as the arsine (AsH3), phosphine (PH3), and diborane (B2H6). If you were running equipment that uses any of these gases last night (Tuesday night), please check your runs and deposition thicknesses ... those gases may have turned off during your run. We are still checking out this situation and will provide more details once folks more expert than I have been able to examine the exhaust fan and sensors. However, at the moment, I believe that all of the above gases are still turned off. Please do not attempt to run the epi reactor, any of the LPCVD tubes, or the STS pecvd system this morning until we have removed this notification from the lab door. Thanks for your continued support ... we'll try to get this condition resolved as quickly as possible. John From shott at snf.stanford.edu Wed Oct 20 06:35:01 2004 From: shott at snf.stanford.edu (John Shott) Date: Wed, 20 Oct 2004 06:35:01 -0700 Subject: Toxic gases (including SiH4, GeH4, DCS, PH3, AsH3, and B2H6) have been restored .... Message-ID: <41766985.4070107@snf.stanford.edu> SNF Lab Members: The fault condition on the exhaust fan in the toxic gas vault has been cleared and all of the above mentioned toxic gases have been restored as of 6:30 a.m. this morning. We are working with O&M (campus operations and maintenance) to adress the failed fan or sensor that triggered this condition. In the meantime you may resume normal usage of the STS pecvd, epi reactor, and LPCVD tools .... subject, of course, to their normal individual shutdown and problems states. Based on a study of the alarm history, it appears as if the fan alarm likely shutdown the gas cylinders at 00:48 a.m. on Wednesday morning (that is shortly after midnight on Tuesday night) and those gases would have been off until they were restored to service at 6:30 a.m. this morning. Anyone using tools with these gases overnight should carefully check their deposition thicknesses. Thank you for your continued support, John From rcrane at snf.stanford.edu Wed Oct 20 07:15:29 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Wed, 20 Oct 2004 07:15:29 -0700 Subject: DI water off 0800-0815 today Message-ID: <41767301.61685097@snf.stanford.edu> Lab users, There will a brief shutdown of the DI water system this morning between 0800 to 0815 to allow work on wbsilicide. The wetbenchs will be posted. Please time your cleans and SRD work to avoid this shutdown window. Sorry for the inconvenience, Dick From rcrane at snf.stanford.edu Wed Oct 20 08:23:20 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Wed, 20 Oct 2004 08:23:20 -0700 Subject: DI water back up Message-ID: <417682E8.4A1B2A6C@snf.stanford.edu> Lab users, The DI water system is back on line and ready for use. With the exception of wbsilicide, all wet benches and SRDs are ready for use. Thanks for your cooperation, Dick From jerabek at snf.stanford.edu Wed Oct 20 09:11:00 2004 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Wed, 20 Oct 2004 09:11:00 -0700 (PDT) Subject: Mask laser writer Message-ID: Mask laser writer is still down due to stage hight tracking errors and/or faulty beam blanker. -Paul From rissman at stanford.edu Thu Oct 21 15:06:49 2004 From: rissman at stanford.edu (Paul Rissman) Date: Thu, 21 Oct 2004 15:06:49 -0700 Subject: new user agreement Message-ID: <5.1.1.5.2.20041021143951.0173d478@rissman.pobox.stanford.edu> Dear non-Stanford labmember: As you know, we asked all non-Stanford-affiliated labmembers submit a new agreement form by November 1. Please complete this form by this time. This will allow us to update our records and to ensure that everyone at SNF is working under the same principles. The form can be found at: http://www-snf.stanford.edu/Access/AgreementForm.pdf As I mentioned previously, if you need more time for a legal review of the form, please let us know with a request to access at snf.stanford.edu and we will extend the deadline. Otherwise, we will assume that you wish your SNF labmembership to lapse and will disable your Coral login after this date. Any personal belongings you may still have stored in bins and lockers will be collected, so that we can reissue storage space available to labmembers who have been patiently waiting. Thank you for your prompt attention. Paul Rissman P.S. If you will not be returning to the lab, please send a message to Maureen Baran (mbaran at snf.stanford.edu) so we can proceed with removal of your account, bin and locker. -------------- next part -------------- An HTML attachment was scrubbed... URL: From ankurjn at stanford.edu Thu Oct 21 16:35:56 2004 From: ankurjn at stanford.edu (Ankur Jain) Date: Thu, 21 Oct 2004 16:35:56 -0700 (PDT) Subject: Anyone wants to get Silicon coated glass wafers? Message-ID: Hello labmembers, I am planning to purchase Amorphous Silicon coated Borofloat glass wafers. If you are also interested in purchasing these wafers, please let me or Mary Tang know how many you want to purchase. We can get a lower price by ordering in bulk. thanks, Ankur. ************************************************************************* ANKUR JAIN Graduate Student Microscale Heat Transfer Laboratories Residence: Room 201, Building 530 126 Blackwelder Ct, Apt 902 Stanford, CA-94305 Stanford, CA - 94305 Ph: 650-736-0044 Cell Ph: 650-799-8986 http://www.stanford.edu/~ankurjn From jhemanth at stanford.edu Fri Oct 22 15:06:29 2004 From: jhemanth at stanford.edu (Hemanth Jagannathan) Date: Fri, 22 Oct 2004 15:06:29 -0700 Subject: Importing bmp/jpg into GDSII Message-ID: <000001c4b883$63e27ab0$c66340ab@JAGANNATHANPC> Hi everyone, I am trying to import bmp / jpg pictures into my gds file and am unable to do that. Is anyone aware of a good way to convert pictures into gdsII format? Any tips/suggestions would be much appreciated. Thanks Hemanth Jagannathan PhD Candidate Department of Electrical Engineering Stanford University, CA -------------- next part -------------- An HTML attachment was scrubbed... URL: From abowers at siliconlight.com Fri Oct 22 15:44:53 2004 From: abowers at siliconlight.com (Amy Bowers) Date: Fri, 22 Oct 2004 15:44:53 -0700 Subject: Importing bmp/jpg into GDSII Message-ID: <3BCAE30B89986249B06918160F29E9350334C1D8@exchange.internal.siliconlight.com> Hi Hemanth, You can download a 15-day trial copy of Link Cad at www.linkcad.com. I just finished a layout project using this software and it worked really well. -Amy -----Original Message----- From: Hemanth Jagannathan [mailto:jhemanth at stanford.edu] Sent: Friday, October 22, 2004 3:06 PM To: labmembers at snf.stanford.edu Subject: Importing bmp/jpg into GDSII Hi everyone, I am trying to import bmp / jpg pictures into my gds file and am unable to do that. Is anyone aware of a good way to convert pictures into gdsII format? Any tips/suggestions would be much appreciated. Thanks Hemanth Jagannathan PhD Candidate Department of Electrical Engineering Stanford University, CA __________________________________________________ The WebShield e500 Appliance has scanned this email message and attachments for viruses. -------------- next part -------------- An HTML attachment was scrubbed... URL: From amf at amfitzgerald.com Fri Oct 22 15:53:53 2004 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Fri, 22 Oct 2004 15:53:53 -0700 Subject: Importing bmp/jpg into GDSII In-Reply-To: <000001c4b883$63e27ab0$c66340ab@JAGANNATHANPC> Message-ID: I believe the latest version of L-Edit Pro can import JPG into Tanner format (which can subsequently be output to GDSII). It may be an 'add-on' module to their base software package. I would recommend checking out the copy of L-edit in the CAD room, and then calling Tanner if you have more questions. www.tanner.com Good luck, Alissa _____ From: Hemanth Jagannathan [mailto:jhemanth at stanford.edu] Sent: Friday, October 22, 2004 3:06 PM To: labmembers at snf.stanford.edu Subject: Importing bmp/jpg into GDSII Hi everyone, I am trying to import bmp / jpg pictures into my gds file and am unable to do that. Is anyone aware of a good way to convert pictures into gdsII format? Any tips/suggestions would be much appreciated. Thanks Hemanth Jagannathan PhD Candidate Department of Electrical Engineering Stanford University, CA -------------- next part -------------- An HTML attachment was scrubbed... URL: From wingcat at pacbell.net Fri Oct 22 16:41:49 2004 From: wingcat at pacbell.net (Adrian Tymes) Date: Fri, 22 Oct 2004 16:41:49 -0700 (PDT) Subject: Importing bmp/jpg into GDSII In-Reply-To: <3BCAE30B89986249B06918160F29E9350334C1D8@exchange.internal.siliconlight.com> Message-ID: <20041022234149.71326.qmail@web81607.mail.yahoo.com> I've had a few problems using LinkCAD to convert image files (like BMP or JPEG) into GDS II format. It seems to work passably well* with black and white (not greyscale) images where you've already filled in the areas to write to. (Don't count on it to read grey or colored images correctly.) This kind of drawing can be done more easily with BMPs (and PNGs and GIFs) than with most JPEGs, since a JPEG's lossy compression can mess up a drawing's lines, although this can be avoided by specifying lossless compression when creating the JPEG. *By "passably well", I mean that LinkCAD creates a bunch of rectangular blocks within the filled-in areas that, when written to, make up the original filled-in area. I don't know if this makes any significant difference - it hasn't to me, since I do my editing in a different format (DXF, which LinkCAD has none of the above troubles with) then convert to GDS II - but it is technically not exactly what was in the original source image. All that said, it can work. Just make sure to check the GDS II files that LinkCAD produces for errors, and correct them before incorporating the result into your other work. --- Amy Bowers wrote: > Hi Hemanth, > > You can download a 15-day trial copy of Link Cad at > www.linkcad.com. I just finished a layout project > using this software and it worked really well. > > -Amy > > > > -----Original Message----- > From: Hemanth Jagannathan > [mailto:jhemanth at stanford.edu] > Sent: Friday, October 22, 2004 3:06 PM > To: labmembers at snf.stanford.edu > Subject: Importing bmp/jpg into GDSII > > > > Hi everyone, > > > > I am trying to import bmp / jpg pictures > into my gds file and am unable to do that. Is anyone > aware of a good way to convert pictures into gdsII > format? Any tips/suggestions would be much > appreciated. > > > > Thanks > > > > Hemanth Jagannathan > > PhD Candidate > > Department of Electrical Engineering > > Stanford University, CA > > > > > > __________________________________________________ > The WebShield e500 Appliance has scanned > this email message and attachments for viruses. > > From qngo at arc.nasa.gov Mon Oct 25 10:48:11 2004 From: qngo at arc.nasa.gov (Quoc X Ngo) Date: Mon, 25 Oct 2004 10:48:11 -0700 Subject: Chromium etchant Message-ID: Does anyone have any ideas for wet etchants for thermally evaporated chromium? I know there are a couple of commercially available chemicals (Cyantek, etc.), however, I just wanted to get an idea if you have any personal experience with this. Thanks, Quoc Ngo NASA Ames Research Center Moffett Field, CA 94035 (650) 604-2434 From daweiw at uci.edu Mon Oct 25 12:04:30 2004 From: daweiw at uci.edu (daweiw at uci.edu) Date: Mon, 25 Oct 2004 12:04:30 -0700 (PDT) Subject: ZnO etching Message-ID: <3692.128.195.183.192.1098731070.squirrel@128.195.183.192> Hi, Does anyone has experience on wet etching of ZnO, what solvent do you use, how to control the etching rate? Thank you, David From jerabek at snf.stanford.edu Thu Oct 28 09:19:39 2004 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Thu, 28 Oct 2004 09:19:39 -0700 (PDT) Subject: Micronic Message-ID: To whoom it may concern: Micronic service has replaced stage Y-drive shaft. I have written 4 masks since and everything looks O.K. -Paul From edmyers at stanford.edu Thu Oct 28 11:04:37 2004 From: edmyers at stanford.edu (Ed Myers) Date: Thu, 28 Oct 2004 11:04:37 -0700 Subject: NanoSpecs Message-ID: <6.0.1.1.2.20041028105632.01bf0288@edmyers.pobox.stanford.edu> All, As you have seen and heard we have experience attrition of our NanoSpec reflectance tools. We lost the first two do to terminal configuration being corrupted. Yesterday, we lost the system in Litho do the computer power supply going bad. This leaves us without any functioning NanoSpecs. On the upside, last week we arranged for Nanometrics field service to come in. At present we are expecting them after lunch today (Thurs., 10/28). Maintenance is working hard to get the Litho computer up and running before they arrive. Hopefully we can get a couple of systems running by the end of the day. Regards, Ed Myers From shott at snf.stanford.edu Fri Oct 29 09:54:42 2004 From: shott at snf.stanford.edu (John Shott) Date: Fri, 29 Oct 2004 09:54:42 -0700 Subject: Coral upgrade Saturday a.m. ... Message-ID: <418275D2.1080302@snf.stanford.edu> SNF Lab Members: Coral will likely be down from approximately 7:30 a.m. until 9:00 a.m. tommorow morning for some software and hardware maintenance and upgrades. We have tried to schedule this outage to be minimally inconvenient for most people. If you will be working on Saturday morning, please schedule your enables and disables of equipment on either side of this planned outage. Thanks for your continued support, John From hungtao at stanford.edu Fri Oct 29 10:07:00 2004 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Fri, 29 Oct 2004 10:07:00 -0700 Subject: Chromium etchant In-Reply-To: References: Message-ID: <1099069620.418278b451209@webmail.stanford.edu> Hi! I use Transene Chromium Etchants 1020 to etch Cr. My Cr layer is thermally evaporated and is 5-7 nm thick to avoid electrical charging in doing e-beam lithography. Sample with Cr layer is etched for 30 seconds in the etchant and then I rinse it with DI water. You can check the information from the link below. http://www.transene.com/cr.html Best, Hungtao Quoting Quoc X Ngo : > Does anyone have any ideas for wet etchants for thermally > evaporated chromium? I know there are a couple of > commercially available chemicals (Cyantek, etc.), however, > I just wanted to get an idea if you have any personal > experience with this. > > Thanks, > Quoc Ngo > > NASA Ames Research Center > Moffett Field, CA 94035 > (650) 604-2434 > From edmyers at stanford.edu Fri Oct 29 11:21:45 2004 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 29 Oct 2004 11:21:45 -0700 Subject: NanoSpecs Service Complete Message-ID: <6.0.1.1.2.20041029111132.01bfc0e8@edmyers.pobox.stanford.edu> After a days delay, Nanometrics has completed servicing of our NanoSpecs. Field service was able to get 2 of the 3 systems tuned up and running. All the systems were optically aligned and calibrated. We should have repeatable measurements as long as we don't abuse the systems. I also had field service install and align the UV source on the NanoSpec in the Litho area. UV is used for measuring thin films <100 Angstroms. If you have a need for this option please let me know, since we will not be leaving the light source on. We could not repair the third system due to failure of the terminal. We can purchase a refurbished terminal for a third party. However Nanometrics imbeds their own firmware, which most likely is no longer available. Collectively we should decide if the time, dollars and labor to get the system functional will be valued added for the facility. Regards, Ed Myers From shott at snf.stanford.edu Sat Oct 30 10:29:18 2004 From: shott at snf.stanford.edu (John Shott) Date: Sat, 30 Oct 2004 10:29:18 -0700 Subject: The newly installed version of Coral ... Message-ID: <4183CF6E.7050700@snf.stanford.edu> SNF Lab Members: We successfully installed a new version of Coral this morning. This will mean that Remote Coral clients will download a new set of files. Because it will download a new version of the package that we use to encrypt/decrypt your remote passwords, it will pop up a window if you want to install a library from "The Legion of the Bouncy Castle". While that name does not sound terribly professional, it IS a legitimate group and, I believe, that largest supplier of open source cryptography products. Many of the changes in this release are features that will help our staff to keep track of members, projects, and accounts. It also allows them to correct some of those "Oops, I forgot to disable ...." events. It will allow the ability to do simple searching for members on the "Resources" page based on their first name, last name, login name, etc. Please let us know if you encounter any problems with this latest version of Coral. Thank you for your continued support, John