From mtang at snf.stanford.edu Wed Sep 1 17:09:14 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 01 Sep 2004 17:09:14 -0700 Subject: Missing photoresist Message-ID: <413664AA.23B4CE25@snf.stanford.edu> Labmembers -- Please help! A bottle of AZ4620 was special-ordered for a student wishing to finish a project, but has gone missing. If you happen to see this around, please let a staff member know. If you happened to take this bottle (I certainly hope this wasn't taken outside the lab, because I am sure everyone knows that chemicals should not be transported outside designated areas of this building), please return this immediately, so this student can keep working. Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at snf.stanford.edu Thu Sep 2 10:27:35 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 02 Sep 2004 10:27:35 -0700 Subject: TVC Symposium and the mystery of the missing resist Message-ID: <41375807.8D33731F@snf.stanford.edu> Hi all -- We've been in contact with TVC, the organizers of the CA Equity Capital Symposium. They cannot offer any more free registrations, but they are very kindly offering a special 50% discount to SNF labmembers. If you're interested, check out the SNF home page for more info. By the way, for those of you who asked, the mystery of the missing resist has been solved. A very conscientious labmember noticed that the recommended storage temperature was <55 F and so placed the resist in the refrigerator. Thanks very much for voicing your concerns and suggestions! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From rcrane at snf.stanford.edu Thu Sep 2 18:39:41 2004 From: rcrane at snf.stanford.edu (Dick Crane) Date: Thu, 02 Sep 2004 18:39:41 -0700 Subject: Chemical use this weekend Message-ID: <4137CB5D.A1888232@snf.stanford.edu> Labmembers, Please help the next wet bench user have enough chemicals this long weekend. We are starting a three day weekend so chemical supplies may run low by Monday night. Please observe the recommended bath changing schedules and we should be OK. If you must change a bath, please check for an adequate supply of refill chemicals before dumping. Litho area: developer and photoresist refill supplies are in the yellow storage cabinet. Thanks for your help and have a nice Labor Day weekend, Dick From shott at snf.stanford.edu Tue Sep 7 07:18:30 2004 From: shott at snf.stanford.edu (John Shott) Date: Tue, 07 Sep 2004 07:18:30 -0700 Subject: E-mail spoof from EBay ... Message-ID: <413DC336.5010602@snf.stanford.edu> SNF Lab Members: I wanted to alert you all to the fact that there is a "spoof" e-mail message that appears to come from EBay that is asking for you to confirm sensitive account information. I'm taking up valuable SNF bandwidth to alert you to this in part because such a request came to the labmembers mailing list ... and you may receive it on other mailing lists as well. I believe that we were able to purge this message before it went out to the labmembers mailing list ... however, you should be aware and suspicious of similar requests. In this case, the e-mail from EBay looks pretty authentic ... but EBay has confirmed that it is a spoof. It is unusual for any legitimate business to send out requests for this type of information ... and most of them are quite happy to confirm whether any request is legitimate (and most are not). While spoofs such as this are becoming a common occurrence, the fact that I had five of them in my inbox this morning caused me to think that many of the rest of you will encounter this as well. So, I apologize for filling your inbox with this alert ... but hope that none of you will fall prey to this type of treachery. Thanks for your continued support, John From mtang at snf.stanford.edu Tue Sep 7 08:04:48 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 07 Sep 2004 08:04:48 -0700 Subject: SNF Annual Reports Message-ID: <413DCE10.AF2F5EB0@snf.stanford.edu> Greetings labmembers! It?s that time of the year again, when we ask (beg, plead, browbeat) you for annual reports... Your reports are very important to us: they help us to show NSF the kinds of activities that our tax dollars are supporting. And perhaps even more importantly, they provide a really nice snapshot of what you and your fellow SNF labmates are up to... As for the reports: 1. Reports are due October 1, 2004. Email them as attachments to access at snf.stanford.edu. 2. Format is a single powerpoint slide, with a few bullets describing your work in general terms, and a graphic or two. The graphic may be an SEM, a photo, or even just a conceptual sketch. More than one slide may be used, if desired. If there are any publications resulting from your work, please reference them. 3. Unless you wish to do so yourself, we will reformat your material to fit a standard layout. If you would like the template, let us know and we?ll send it to you. And let us know if you wish to see how the slide looks before it is shown to NSF. 4. No proprietary or unreleased information should be included in this slide. Please note that the slide will be presented to our NSF governing committees, and may be used (with permission) in promotional materials for SNF, including possible posting on our website. If you wish the information to be embargoed (i.e., info is about to be published or presented at a conference), please let us know when it may be released. 5. This report is required from all labmembers active in the lab over the past academic year. Two or more people on the same project can submit a single report. Labmembers who have joined in the last three months are not required to submit a report, although are absolutely welcome to do so. 6. If you have material (meeting abstracts, publications, websites) which describe your work and are willing to allow us to interpret and extract the pertinent information, you can provide this material in electronic format instead of a slide. Please indicate which aspects of your work required the use of SNF or Nanocharacterization Lab resources. 7. We have fifty nifty gifts awaiting the first 10 labmembers to submit reports and drawing winners for later entries. Thanks for your attention and we look forward to your contributions (really and truly, we do -- despite the administrative overhead, this is something we staff members do enjoy doing ? it?s really gratifying to see the breadth, quality, and sheer ingenuity of the work that is done here!) If you have any questions, please don?t hesitate to contact access at snf.stanford.edu. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at snf.stanford.edu Tue Sep 7 10:30:40 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 07 Sep 2004 10:30:40 -0700 Subject: SNF Annual Reports - exceptions Message-ID: <413DF040.E7B19761@snf.stanford.edu> Greetings labmembers! As was just pointed out to me, labmembers whose projects have been generously sponsored by the CIS New User Grants program are exempt from the SNF Annual Report requirement, since they've already turned in reports. So, let me repeat now: If you're a labmember for less than three months or have received and turned in a report for the CIS New User Grant, you do NOT have to turn in an annual report (although again, you are more than welcome to contribute!) For everyone else who's been active in the lab over the past calendar year, we know that you are very busy, but please understand that these reports are very important to us and we do try to make it so that it is not a large burden. We'll gladly work with you to help fulfill this requirement. On behalf of the SNF staff, thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mcvittie at snf.stanford.edu Tue Sep 7 13:33:14 2004 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Tue, 07 Sep 2004 13:33:14 -0700 Subject: Thursday PEUG Meeting on MEMS Etching Message-ID: <413E1B09.F1B147CD@snf.stanford.edu> All, The annual Plasma Etcher User's Mtg on MENS related plasam etching will held this Thursday (Sept 9) afternoon at the National Semiconductor Credit Union Bldg in Santa Clara. It is free. All are welcome. See attachment. Jim McVittie -------------- next part -------------- An embedded message was scrubbed... From: "Heather Korff" Subject: REMINDER--PEUG Monthly Meeting--September 9, 2004 Date: Tue, 7 Sep 2004 11:01:04 -0700 Size: 31818 URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: mcvittie.vcf Type: text/x-vcard Size: 422 bytes Desc: Card for Jim McVittie URL: From edmyers at stanford.edu Wed Sep 8 08:22:41 2004 From: edmyers at stanford.edu (Ed Myers) Date: Wed, 08 Sep 2004 08:22:41 -0700 Subject: Pacific Nanotechnology AFM Demo at SNF Message-ID: <6.0.1.1.2.20040908081815.01b205c0@edmyers.pobox.stanford.edu> C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image002.jp Atomic Force Microscope Pacific Nanotechnology is sponsoring an all day forum with hands on demonstration on our Nano R. Wednesday Sept. 15th 2004 from 10-4 PM. Stanford University Nanofabrication Facility CIS Building Stanford, Ca 94305 in Room CIS101 Agenda Applications of the Atomic Force Microscope to Nanotechnology---10:00-10:20am Introduction to Pacific Nanotechnology, Inc. Products---- 10:20-10:40am Live Instrument Demonstration of the Nano-R? Atomic Force Microscope--Please bring your sample-10:45-4:00pm Lunch will served. If you are interested in attending this seminar, please RSVP to Ed Myers at 1-650-725-4702 or email Ed Myers at edmyers at stanford.edu Please confirm with Ed Myers if you would like to bring a sample. Depending on time, all samples may not get imaged. Note: If you do not wish to receive PNI newsletters, please email us at info at pacificnanotech.com with unsubscribe in the subject line. Nano-R? Atomic Force Microscope The Nano-R? is a general purpose atomic force microscope (AFM) for making routine images on structures with nanometer sized features. Because the Nano-R? can be used with two versions of image acquisition software, X'Pert? software and EZMode?, it is optimized for novices, casual users, and routine users. Further, the Nano-R? is supplied with the most commonly used AFM modes including contact, lateral force, material sensing, non-contact and close contact mode. The three primary subsystems of the Nano-R? AFM are the master computer, a control unit, and the Nano-R? stage. C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image003.jp Nano-R? Atomic Force Microscope Enlarged The Pacific Nanotechnology Nano-R? AFM sets a new standard in atomic force microscopy for nanotechnology, nanoscience and nanoinspection applications. It is designed to make the highest quality images and measurements of materials and structures with nanometer scale dimensions. The Nano-R? is ideal for both independent researchers and for research teams that want to share an AFM. -------------- next part -------------- A non-text attachment was scrubbed... Name: C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image002.jpg Type: image/jpeg Size: 6240 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image003.jpg Type: image/jpeg Size: 12500 bytes Desc: not available URL: From mdeal at stanford.edu Wed Sep 8 08:23:48 2004 From: mdeal at stanford.edu (Michael Deal) Date: Wed, 08 Sep 2004 08:23:48 -0700 Subject: cnri/mems-exchange microscope Message-ID: <6.1.1.1.2.20040908081254.01ebf3b0@mdeal.pobox.stanford.edu> SNF Labmembers, Many of you have been asking about using the CNRI/MEMS-Exchange microscope (Leica INM200) that is currently located in the AFM room of the cleanroom. This microscope was brought in as part of the MEMS-Exchange program, in which SNF staff (primarily Nancy Latta) does remote processing for MEMS-Exchange users (see www.mems-exchange.org). The microscope is on loan to us from CNRI for use in that program. In the past, the people at CNRI said that SNF labmembers could use the microscope when it isn't being used by MEMS-Exchange users. However, they required SNF labmembers to first register with CNRI, which did not always happen in a timely or convenient manner. I am glad to announce that SNF labmembers can now use the microscope without needing to register. We will try this on an experimental basis. If damage is done to the microscope or is otherwise abused, then we will discontinue this. But in the meantime, if you wish to use the microscope to view your samples and acquire jpg images, you may do so. You will need to enable it on Coral ("cnri-scope"), but there will be no equipment charge for it. The instructions for its use will be posted near the microscope. Note that the operation of the scope is a combination of manual and web-based controls. If you have any problems or questions, contact Mike Deal (mdeal at stanford.edu) or Jim McVittie (mcvittie at cis.stanford.edu). -Mike From mtang at snf.stanford.edu Fri Sep 10 16:40:36 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Fri, 10 Sep 2004 16:40:36 -0700 Subject: MIT-Stanford-Berkeley Nanotech Forum Message-ID: <41423B74.8D1D6325@snf.stanford.edu> Greetings labmembers -- The MIT-Stanford-Berkeley Nanotech Forum is hosting an event which might be of interest to some of you. It's titled: Beyond Photolithography: The Promise of Nano-Imprint Lithography Date: Thursday, September 16, 2004 Time: Hors d'oeuvres and networking at 6:00 PM, program starts at 7:00 PM Cost: $10 general admission Location: Frances C. Arrillaga Alumni Center, Stanford University. More info at www.mitstanfordberkeleynano.org As you probably know, we have recently received a donation from the EV Group of a nanoimprint system. If you aren't familiar with the technology and the possibilities it presents, this might be a good forum in which to learn about it. Cheers -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From edmyers at stanford.edu Mon Sep 13 12:56:18 2004 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 13 Sep 2004 12:56:18 -0700 Subject: PNI AFM Demo, Wed. Sept. 15 Message-ID: <6.0.1.1.2.20040913125003.01b8cdd8@edmyers.pobox.stanford.edu> C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image002.jp Atomic Force Microscope Pacific Nanotechnology is sponsoring an all day forum with hands on demonstration on our Nano R. Wednesday Sept. 15th 2004 from 10-4 PM. Stanford University Nanofabrication Facility Room CIS101, CIS Building Stanford, Ca 94305 Room to be announced Agenda Applications of the Atomic Force Microscope to Nanotechnology---10:00-10:20am Introduction to Pacific Nanotechnology, Inc. Products---- 10:20-10:40am Live Instrument Demonstration of the Nano-R? Atomic Force Microscope--Please bring your sample-10:45-4:00pm CIS Extension, Room 127X Library Lunch will served. If you are interested in attending this seminar, please RSVP to Ed Myers at 1-650-725-4702 or email Ed Myers at edmyers at stanford.edu Please confirm with Ed Myers if you would like to bring a sample. Depending on time, all samples may not get imaged. Note: If you do not wish to receive PNI newsletters, please email us at info at pacificnanotech.com with unsubscribe in the subject line. Nano-R? Atomic Force Microscope The Nano-R? is a general purpose atomic force microscope (AFM) for making routine images on structures with nanometer sized features. Because the Nano-R? can be used with two versions of image acquisition software, X'Pert? software and EZMode?, it is optimized for novices, casual users, and routine users. Further, the Nano-R? is supplied with the most commonly used AFM modes including contact, lateral force, material sensing, non-contact and close contact mode. The three primary subsystems of the Nano-R? AFM are the master computer, a control unit, and the Nano-R? stage. C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image003.jp Nano-R? Atomic Force Microscope Enlarged The Pacific Nanotechnology Nano-R? AFM sets a new standard in atomic force microscopy for nanotechnology, nanoscience and nanoinspection applications. It is designed to make the highest quality images and measurements of materials and structures with nanometer scale dimensions. The Nano-R? is ideal for both independent researchers and for research teams that want to share an AFM. -------------- next part -------------- A non-text attachment was scrubbed... Name: C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image002.jpg Type: image/jpeg Size: 6240 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: C:/DOCUME~1/EDMYER~1/LOCALS~1/Temp/msoclip1/01/clip_image003.jpg Type: image/jpeg Size: 12500 bytes Desc: not available URL: From ziebarth at stanford.edu Mon Sep 13 13:31:35 2004 From: ziebarth at stanford.edu (Jonathan Mickle Ziebarth) Date: Mon, 13 Sep 2004 13:31:35 -0700 Subject: Jonathan M. Ziebarth orals abstract Message-ID: <1095107495.414603a7c9f0c@webmail.stanford.edu> A theoretical and experimental investigation of light extraction from polymer light-emitting diodes Jonathan M. Ziebarth Department of Electrical Engineering Friday, September 17 1:00 PM CIS-X Auditorium Low operating voltages, a wide range of emission wavelengths, and solution processing make polymer light-emitting diodes attractive for high-growth markets including flexible displays, large-area displays, and solid-state lighting. However, the external efficiencies of these devices must be improved in order to compete with existing technologies. Currently, the majority of the light generated inside polymer LEDs remains trapped within the device by total internal reflection. Extracting this trapped light can significantly increase the external efficiency. In this thesis, we use both theoretical tools and experimental results to study light extraction from polymer LEDs. First, we examine the optical properties of the light-emitting polymer. The properties of this layer have important implications for light extraction and need to be measured carefully. We have developed a method to accurately measure the optical properties of a light-emitting polymer by using grating outcoupling. The results show that the polymer layers are anisotropic and dispersive. Using numerical modeling techniques, we predict the emission into air, substrate, polymer/indium tin oxide (ITO) and surface plasmon modes of a polymer light-emitting diode. The results give good insight into the possible efficiency increases that can be expected for various light extraction techniques. In addition, the effects of various optical properties and layer thicknesses on the optical performance of the device are reported. We show how modification of the substrate can be used to focus light into mode types that can be easily extracted. We then report our experimental results for two very different light extraction techniques. First, we demonstrate how Bragg gratings can be used to extract light from waveguide modes in the polymer/indium tin oxide (ITO) layers. With an optimized Bragg grating, we have increased the external power efficiency by 25% at high brightness levels. In addition, we have used substrate-shaping techniques to extract light from waveguide modes in the glass substrate. In this case, we were able to increase the efficiency by over 60%. Finally, we compare our numerical and experimental results to summarize the possible benefits of various light extraction strategies. -- 'people understand music even better than words' georg holm - sigur ros From ankurjn at stanford.edu Tue Sep 14 15:35:58 2004 From: ankurjn at stanford.edu (Ankur Jain) Date: Tue, 14 Sep 2004 15:35:58 -0700 (PDT) Subject: Wire bond protection during device spin? Message-ID: Hello everyone, I have a 1 cm by 1 cm device with about 15 Aluminum wire bonds to a standard chip carrier and would like to deposit a thin liquid film on it by spinning. I was wondering if anyone has experience doing such a thing. I am concerned about whether wire bonds can withstand the forces in a spin process. The wire bonds will be out of the way of the liquid being poured, but I am concerned whether they will withstand the centripetal force of spin. Do you know if something can be done to protect the bonds (dab some epoxy?). Any suggestions would be useful. thanks, Ankur. ************************************************************************* ANKUR JAIN Graduate Student Microscale Heat Transfer Laboratories Residence: Room 201, Building 530 126 Blackwelder Ct, Apt 902 Stanford, CA-94305 Stanford, CA - 94305 Ph: 650-736-0044 Cell Ph: 650-799-8986 http://www.stanford.edu/~ankurjn From mtang at snf.stanford.edu Wed Sep 15 09:06:57 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 15 Sep 2004 09:06:57 -0700 Subject: FYI: Frontiers in Nanoscale Science and Technology Workshop Message-ID: <414868A1.9A1802E@snf.stanford.edu> Hello all -- In case you're interested -- travel grants available to students.... -------- Original Message -------- Subject: FW: Frontiers in Nanoscale Science and Technology Workshop Date: Tue, 14 Sep 2004 21:07:58 -0700 From: "Jane Edwards" To: "'Mary Tang'" -----Original Message----- From: Kathryn Hollar [mailto:hollar at deas.harvard.edu] Sent:Friday, September 10, 20041:33 PM To: gharris at negril.msrce.howard.edu; tina.prestridge at mirc.gatech.edu; mallison at cnf.cornell.edu; j.toll at mail.utexas.edu; kevin.martin at mirc.gatech.edu; anupam at uts.cc.utexas.edu; claudia at ece.ucsb.edu; ywilliams at negril.msrce.howard.edu; ernie at ece.umn.edu; rathbun at cnf.cornell.edu; jeannie at mer.utexas.edu; Lisa A.Daub; gmccarty at engr.psu.edu; deal at ee.stanford.edu; jennifer at ece.gatech.edu; brainard at u.washington.edu; cmem at unm.edu; najafi at umich.edu; Kirsty Mills; jane.edwards at stanford.edu; dswartz at eecs.umich.edu; reynolds at physics.harvard.edu; thibeault at ece.ucsb.edu; Kathryn Hollar; amy at mer.utexas.edu; carter at chem.washington.edu; ginger at chem.washington.edu Cc: Bill Appleton; Robert Westervelt; Naomi Brave; Robert Graham Subject: Frontiers in Nanoscale Science and Technology Workshop Dear Colleagues, At the NNIN REU convocation at Penn State, I mentioned an opportunity for graduate students in the areas of coherent electronics, quantum information processing and quantum optoelectronics to present a poster at and attend the workshop described below October 25-26 at Harvard University. Students who present a poster are eligible for travel scholarships. Please remind interested graduate students that they should submit a poster by September 20 to be eligible for travel funds. I have also attached a pdf announcement for the workshop. Thank you for advertising this opportunity to your students. Best regards, Kathryn ******************************************************************************************************************************************* We are pleased to announce an International Workshop sponsored by the Nanoscale Science and Engineering Center based at Harvard, with the University of Tokyo and Delft University of Technology. NSEC Frontiers in Nanoscale Science and Technology: Coherent Electronics, Quantum Information Processing and Quantum Optoelectronics October 25-26, 2004 HarvardUniversity The speakers include: Gerhard Abstreiter (TU Munchen), Yashuhiko Arakawa (U Tokyo), Raymond Ashoori (MIT), David Awschalom (UCSB) Moungi Bawendi (MIT), Leonid Glazman (U Minnesota), Bertrand I. Halperin (Harvard), Toshiaki Hayashi (NTT), Yoshiro Hirayama (NTT), Leo Kouwenhoven (TU Delft), Daniel Loss (Uni Basel), Mikhail Lukin (Harvard), Charles Marcus (Harvard), Venky Narayanamurti (Harvard), Hongkun Park (Harvard), Hiroyuki Sakaki (IIS, U Tokyo), Robert Schoelkopf (Yale), Seigo Tarucha (U Tokyo) and Robert Westervelt (Harvard). To register or learn more about student scholarships please go to: http://www.nsec.harvard.edu/FNST.htm -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: FNST_Flyer_w_talksV4.pdf Type: application/pdf Size: 206227 bytes Desc: not available URL: -------------- next part -------------- Kathryn Hollar, PhD Director of Educational Programs Division of Engineering & Applied Sciences Harvard University 206A Pierce Hall 29 Oxford Street Cambridge, MA 02138 617.496.7479 (v) 617.495.2875 (f) www.eduprograms.deas.harvard.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: ATT00011.txt Type: text/enriched Size: 249 bytes Desc: not available URL: From mbaran at stanford.edu Thu Sep 16 09:42:14 2004 From: mbaran at stanford.edu (Maureen Baran) Date: Thu, 16 Sep 2004 09:42:14 -0700 Subject: Lost items in the lab Message-ID: <200409161642.i8GGgF14027599@smtp1.Stanford.EDU> Dear Labmembers, If you have misplaced or left behind something of value in the lab in the last day or so, please see me in cubicle #41. Maureen Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From wangqian at stanford.edu Thu Sep 16 11:16:50 2004 From: wangqian at stanford.edu (Qian Wang) Date: Thu, 16 Sep 2004 11:16:50 -0700 Subject: Moving Raith time References: Message-ID: <004d01c49c19$564cdd90$a25540ab@qwang> Lab, It seems to me that we will have no DUV this week. I just talked with Mahnaz and she confirmed to me that the parts for KSII have not been here. So KSI have to keep in UV mode in case of KSII being down. qian ----- Original Message ----- From: "Ryan Tu" To: "Dunwei Wang" ; "Qian Wang" ; "Ali Javey" ; "Woong Kim" Sent: Thursday, September 16, 2004 11:08 AM Subject: Moving Raith time > Just letting everyone know that I moved my Raith time to 12-5 tomorrow. I > do not think that we have DUV time again this week. I have to double > confirm, but someone in the lab did not see the "DUV" sign on the Karl > Suss > that is normally there when they change the lamps. > > Thanks, > Ryan > From edmyers at stanford.edu Fri Sep 17 10:28:36 2004 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 17 Sep 2004 10:28:36 -0700 Subject: Gasonics Vs Matrix Reminder Message-ID: <6.0.1.1.2.20040917102415.01b11818@edmyers.pobox.stanford.edu> SNF Lab Members, The Gasonic Aura Asher has been in use for the past couple of weeks. I've gotten all positive reports from those who have been using the Gasonics. As a reminder the tool is designated strictly for Non-metals and Standard Metals Only. The Gasonic will be replacing the Matrix Asher as the Clean Asher for the facility. The goal is to have all certified Matrix users transfer their processes to the Gasonic by Oct. 1st. Beginning October 1st, the Matrix Asher will migrate to the Gold Contaminated equipment group and become available for processing gold contaminated wafers. Please have your training and processes transferred from the Matrix to the Gasonics by October 1st. Training can be scheduled by emailing Ed Myers at emyers at snf.stanford.edu or edmyers at stanford.edu. Regards, Ed Myers Stanford Nanofabrication Facility CIS Room 143, Mail Code 4070 Stanford, CA 94305 (650)725/4702 edmyers at stanford.edu From bcui at stanford.edu Mon Sep 20 08:41:09 2004 From: bcui at stanford.edu (Bianxiao Cui) Date: Mon, 20 Sep 2004 08:41:09 -0700 Subject: thick SPR220-7 photoresist In-Reply-To: <413DCE10.AF2F5EB0@snf.stanford.edu> References: <413DCE10.AF2F5EB0@snf.stanford.edu> Message-ID: <6.0.1.1.2.20040920083807.01e2f720@bcui.pobox.stanford.edu> Hi, I am trying to coat silica wafer with a thick (~50um) SPR220-7 photoresist. Now I am having a trouble to develop it with LDD 26-W developer. No matter how long the wafer stays in the developer solution, there is always a think layer of photoresist that can't be cleared off. Does any one have experience on this? Thanks Bianxiao From edmyers at stanford.edu Mon Sep 20 11:37:19 2004 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 20 Sep 2004 11:37:19 -0700 Subject: Open Gasonics Training Message-ID: <6.0.1.1.2.20040920113120.01b9f420@edmyers.pobox.stanford.edu> All, I will give an open Gasonics training session on Tuesday, Sept. 21st at 3:30 pm. The training should take approximately 30 minutes. There is no need to register, just show up at the tool. Since the training is so quick, please show up on time. If you arrive late, you may be asked to return at another time. If you can not make this time slot and have a need for training please let me know. Regards, Ed Myers From bcui at stanford.edu Mon Sep 20 14:57:04 2004 From: bcui at stanford.edu (Bianxiao Cui) Date: Mon, 20 Sep 2004 14:57:04 -0700 Subject: thick SPR220-7 photoresist In-Reply-To: <200409201607.i8KG7Rnf023443@smtp-roam.Stanford.EDU> References: <6.0.1.1.2.20040920083807.01e2f720@bcui.pobox.stanford.edu> <200409201607.i8KG7Rnf023443@smtp-roam.Stanford.EDU> Message-ID: <6.0.1.1.2.20040920144739.01e20eb0@bcui.pobox.stanford.edu> Dear all, I got many replies regarding the problem of the thick photoresis, many good suggestions and also people encountering with the same problem. (Ps, I have tried different exposure time for the thick photoresist: ranging from 10s to 140s. I found that longer exposure time (>25s) burns the photoresist, while the short exposure time isn't enough.) Here I listed all the suggestions that might be helpful to other people who have the same problem: 1. Try multi-exposure-development cycles, to avoid the burning of photoresist while get enough exposure time. 2. Stir the developer solution when developing. 3. Try SU-8 photoresist instead of SPR220-7 for thick photoresist. (SU-8 is a negative photoresist) 4. Remove residue HMDS using plasma etching for old wafer. Thanks, Bianxiao -----Original Message----- >From: Bianxiao Cui [mailto:bcui at stanford.edu] >Sent: Monday, September 20, 2004 8:41 AM >To: labmembers at snf.stanford.edu >Subject: thick SPR220-7 photoresist > >Hi, > >I am trying to coat silica wafer with a thick (~50um) SPR220-7 photoresist. >Now I am having a trouble to develop it with LDD 26-W developer. No matter >how long the wafer stays in the developer solution, there is always a think >layer of photoresist that can't be cleared off. Does any one have >experience on this? Thanks > >Bianxiao From mtang at snf.stanford.edu Mon Sep 20 16:11:34 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Mon, 20 Sep 2004 16:11:34 -0700 Subject: SNF Annual Reports! Message-ID: <414F63A6.2C8AE07@snf.stanford.edu> Greetings labmembers -- Many, many thanks to those of you who turned in slides -- as ever, the work that is being done here is impressive, if not jaw-dropping (you do THAT? HERE???!) For those of you who turned slides in, you are entitled to a nifty bonus gift, while supplies last (one gift per project slide -- please see Jane!) For those of you who haven't turned in your slides, well, you may still be able to pick up a gift, if you act soon -- supplies are limited... (Remember: Reports are due Oct. 1: See http://snf.stanford.edu/Labmembers/AnnualReports.html for more info!) Please, please, please help do your part to help SNF by submitting a project slide. Or else I will continue to pester until you do... I have to say that I would really much prefer to rely on everyone's good will (if not guilt, taking a cue from the KQED radio pledge drive now underway), but would not be above playing hard ball for a good cause (hmmm, bin assignments? maybe even desks??? -- particularly for those heavy users of the lab who are currently conspicuously missing from the ranks of submitted reports...) Oct. 1, remember that date! Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at snf.stanford.edu Thu Sep 23 16:31:13 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 23 Sep 2004 16:31:13 -0700 Subject: New student visits: Any volunteers? Message-ID: <41535CC1.2E5EEF5A@snf.stanford.edu> Hi all -- As you know, the new students are in town and just itching to see the labs in the School of Engineering. They will be visiting tomorrow (Friday, 9/24) some time between 1:30 and 2:30 (probably later in that time slot.) Would any of you Stanford students be interested in hosting a window tour of SNF? The tour would probably be on the order of 15 minutes or so. Several volunteers would be ideal (I think last year, there were 50 people! It would be good to be able to split them up in case of a large turnout.) In exchange, I would like to offer you the choice of lunch on me at Bytes, or one of the nifty "thank you" gifts we have on hand. If you're interested, please let me know -- Thanks! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From aflannery at invensense.com Thu Sep 23 19:00:55 2004 From: aflannery at invensense.com (Anthony Flannery) Date: Thu, 23 Sep 2004 19:00:55 -0700 Subject: Planarization Services Message-ID: All, We are entertaining a process that involves planarizing an interlayer dielectric to a maximum of 0.1 um step height. Would anyone be able to share their experience using an SNF film for this with an outside vendor? Thanks much, Tony Anthony F. Flannery Jr. Director of Development MEMS Gyroscope Invensense, Inc. 2900 Gordon Ave., Suite 203 Tel: 408-720-8482 ext. 203 Cell: 408-515-4026 -------------- next part -------------- An HTML attachment was scrubbed... URL: From lgx at stanford.edu Fri Sep 24 10:24:16 2004 From: lgx at stanford.edu (Guanxiong Li) Date: Fri, 24 Sep 2004 10:24:16 -0700 Subject: University Oral Examination Announcement for Guanxiong Li Message-ID: <01ae01c4a25b$51d08440$876b40ab@stanford.edu> University Oral Examination Title: Spin Valve Sensor for Biomolecular Identification: Design, Fabrication and Characterization Guanxiong Li Department of Materials Science and Engineering Date: Tuesday, October 5, 2004 Time: 1:30 pm Place: McCullough 335 (Refreshments will be served at 1:15 pm) Biomolecular identification, e.g. DNA recognition, has broad applications in biology and medicine such as gene expression analysis, disease diagnosis and DNA fingerprinting. We have been developing a magnetic biodetection technology based on the giant magnetoresistive spin valve sensors and the magnetic nanoparticles (< 20 nm in diameter) as biomolecular labels in an effort to provide a highly sensitive, quantitative, portable and cost-effective biomolecular identification device. This dissertation is concentrated on the design, modeling, fabrication and characterization of the spin valve sensors, aiming to prove the magnetic biodetection concept and demonstrate the feasibility of the magnetic nanoparticle detection by the spin valve sensors. The intended magnetic nanoparticle labels are superparamagnetic at room temperature with zero magnetic remanence. Therefore, the nanoparticles need to be magnetically excited in order to generate magnetic fringing fields detectable by the field-sensitive spin valve sensors. DC or AC magnetic excitation can be applied, for which we have designed several nanoparticle detection schemes. An analytical model has been developed for the magnetic nanoparticle detection, based on the two assumptions of (1) the equivalent average field of magnetic nanoparticles and (2) the coherent rotation of spin valve free layer magnetization. Micromagnetic simulations have also been performed for the spin valve sensors. The analytical model is found consistent with the micromagnetic simulations and can be used as an efficient design tool. The prototype spin valve sensors have been fabricated at both micron and submicron scales. We first demonstrated that the micron-sized spin valve sensors successfully detected a single 2.8-um magnetic microbead. To demonstrate the detection of magnetic nanoparticles, we developed a bilayer liftoff process, based on a polymer-mediated self-assembly and fine lithography, to deposit magnetic nanoparticles onto sensor surface in a controlled manner. With this liftoff process, we successfully detected the monodisperse 16-nm Fe3O4 nanoparticles in a quantity from tens to hundreds using submicron spin valve sensors at room temperature. A linear dependence of the spin valve sensor signal on the number of nanoparticles has been found, as desired for the quantitative biodetection. The detection limit was found to be 14 Fe3O4 nanoparticles with the current detection scheme. Preliminary detection results on the nanoparticle-labeled DNA hybridization events will also be presented. ________________________________ Materials Science and Engineering Stanford University Office: McCullough 208 Phone: 650-723-2939 _________________________________ -------------- next part -------------- A non-text attachment was scrubbed... Name: Defense Abstract.pdf Type: application/pdf Size: 22769 bytes Desc: not available URL: From mbaran at stanford.edu Fri Sep 24 11:50:25 2004 From: mbaran at stanford.edu (Maureen Baran) Date: Fri, 24 Sep 2004 11:50:25 -0700 Subject: Found Nokia Phone in Lab Message-ID: <200409241850.i8OIoQDH021087@smtp2.Stanford.EDU> Dear Labmembers, We have found a Nokia cell phone in the lab today. If it is yours, please come and claim it. Currently, I have it locked in my cubicle. I will be away from my desk from 12:00 to 1:00 for lunch however; I will be here the rest of the day. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From yy7343 at hotmail.com Sat Sep 25 08:35:41 2004 From: yy7343 at hotmail.com (Yahong Yao) Date: Sat, 25 Sep 2004 08:35:41 -0700 Subject: HELP!!! evalign is frozen Message-ID: Any expert out there can help? The evalign is frozen with my mask and wafer loaded. No key is working. Thank you very much. Yahong _________________________________________________________________ Don?t just search. Find. Check out the new MSN Search! http://search.msn.click-url.com/go/onm00200636ave/direct/01/ From ankurjn at stanford.edu Sun Sep 26 14:01:11 2004 From: ankurjn at stanford.edu (Ankur Jain) Date: Sun, 26 Sep 2004 14:01:11 -0700 (PDT) Subject: Looking for vendors for sandblasting Message-ID: hello Labmembers, I would like to etch a large number of through holes in a glass wafer. Is anyone aware of any vendor that offers sandblasting, or any other technique by which a number of holes can be accurately made in one go? thanks, Ankur. From tberg at snf.stanford.edu Mon Sep 27 09:42:32 2004 From: tberg at snf.stanford.edu (tberg) Date: Mon, 27 Sep 2004 09:42:32 -0700 Subject: WB silicide Move Message-ID: <415842F8.7000608@snf.stanford.edu> Hello all, As part of the move to 6" capability the WBsilicide wet bench will be moved in approximately 2 weeks. This will allow bank 4 to be moved out and the other Thermco bank to be moved in WBsilicide will be down for approximately 2 weeks assuming permit issues are satisfied. Please let Dick Crane or myself know if there are any problems or issues. Process is working on an alternative clean area while this happens. Thanks ted From rohits at stanford.edu Tue Sep 28 00:55:31 2004 From: rohits at stanford.edu (Rohit S. Shenoy) Date: Tue, 28 Sep 2004 00:55:31 -0700 Subject: Rohit Shenoy - Ph.D. Oral Examination - Friday Oct 1 2pm Message-ID: <415918F3.8030003@stanford.edu> ---- Stanford University Ph.D. Oral Examination "Technology and Scaling of Ultrathin Body Double-Gate FETs" Rohit S. Shenoy Department of Electrical Engineering Stanford University CIS-X Auditorium Friday, Oct 1, 2004 2:00 pm - 3:00 pm (Refreshments at 1:45 pm) Abstract As silicon CMOS technology advances into the sub-50 nm regime, fundamental and manufacturing limits impede the traditional scaling of transistors. Innovations in materials and device structures will be needed for continued transistor miniaturization with commensurate performance improvements. The ultrathin body double-gate (DG) FET is a leading candidate for replacing bulk CMOS transistors in future technology generations. Multiple gates and the ultrathin body enable better electrostatic gate control over the channel, allowing DG FETs to be scaled to smaller dimensions than their conventional bulk counterparts. This research is focused on some of the major issues in the design and fabrication of high performance scaled DG FETs. The first part of the talk deals with extrinsic factors that limit the overall performance of ultrathin body DG FETs. The impact of parasitic capacitance and resistance is studied and quantified by device simulation. In particular, the importance of optimizing the lateral doping profile in the thin source/drain extension regions to minimize series resistance is discussed in detail. Next, a novel process is proposed to fabricate the ideal planar DG FET with the following attributes: 1) deposition controlled uniform ultrathin body, 2) fully self-aligned gates for low parasitic capacitance, and 3) flared-out low resistance source/drain regions. Experimental work on the unit process development verifies the feasibility of the key steps. As proof of concept, functional transistors with very good turn-off characteristics are demonstrated. ---- From vlordi at stanford.edu Tue Sep 28 11:52:02 2004 From: vlordi at stanford.edu (Vincenzo Lordi) Date: Tue, 28 Sep 2004 11:52:02 -0700 Subject: metal evaporation outsourcing Message-ID: <1096397522.4159b2d2a9b7b@webmail.stanford.edu> Hi, I was wondering if anyone knows of a good outside vendor who can do metal (Au) evaporation, with relatively short turnaround time. I'd appreciate any leads. Thanks, -Vince From grupp at stanford.edu Tue Sep 28 15:42:49 2004 From: grupp at stanford.edu (Dan Grupp) Date: Tue, 28 Sep 2004 15:42:49 -0700 (PDT) Subject: metal evaporation outsourcing In-Reply-To: <1096397522.4159b2d2a9b7b@webmail.stanford.edu> Message-ID: Lance Goddard Associates www.lgafilms.com On Tue, 28 Sep 2004, Vincenzo Lordi wrote: > Hi, > > I was wondering if anyone knows of a good outside vendor who can do metal (Au) > evaporation, with relatively short turnaround time. I'd appreciate any leads. > > Thanks, > -Vince > --------------------------------------------------------------------------- Dr. Daniel Grupp, Visiting Scholar Center for Integrated Systems Stanford University Stanford, CA 94305 (650) 724-6911 FAX: 723-4659 --------------------------------------------------------------------------- From mtang at snf.stanford.edu Wed Sep 29 07:13:07 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 29 Sep 2004 07:13:07 -0700 Subject: Access to the maskmaking room/ruined masks Message-ID: <415AC2F3.2020800@snf.stanford.edu> Hi all -- I'd like to bring up a concern about increased traffic in the maskmaking room. Just recently, a batch of masks was ruined. The culprit appears to have used Paul Jerabek's wet sink in the mask-making room. Please understand: this wet bench is NOT for general use! Paul carefully tracks the Cr etchant lifetime and adjusts his mask processing accordingly. When the etchant is overused (and it appears that someone had done, in using this sink), Cr actually _redeposits_ on substrates (did you know this? I didn't know until just now.) In this case, it resulted in the several masks (and many hours of Paul's time spent in writing them) being destroyed. Again, this bench is NOT for general use. If you have a special need for it, please consult with Paul Jerabek. And please do not use any of the supplies at this bench and in this area, without asking Paul's permission. Although there's no doubt this was unintentional, it is worth reminding everyone that there is generally a very good reason why some things are they way they are in the lab (and I grant, this is not always the case.) And if you're considering doing something that doesn't seem quite standard procedure, please ask! We'd also like to take a moment to caution people about being careful in the maskmaking room. Although it is good to see that the new tools in this area are seeing activity, there are concerns about the impact of traffic on maskmaking. There have been a couple of other inadvertent problems. The maskwriter laser power was unplugged, for example. And some real causes for concern (the maskwriter terminal, for example, is always live -- tapping a key or nudging the mouse can ruin a write.) Please restrict your activities just to the equipment you are using. Thanks for your attention. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at snf.stanford.edu Wed Sep 29 07:33:47 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 29 Sep 2004 07:33:47 -0700 Subject: Reminder: Annual Reports! Message-ID: <415AC7CB.2000506@snf.stanford.edu> Hi everyone, Just a reminder that annual reports are due Oct. 1. For info, check out: http://snf.stanford.edu/Labmembers/AnnualReports.html And as much as I hate to be "bad cop", I can't help but see that there may be an opportunity here to solve another serious problem we have: a month-long waiting list of people requesting lab storage bins. And maybe I'm a bit unreasonable, but it seems to me that if a labmember has a storage bin in the lab, but can't be bothered to provide a slide, then perhaps this person doesn't really have a genuine need for a lab bin? Please, unless you're in one of the exempt groups (new labmember, CIS New User Grant recipient, ME342 class member), please keep those slides (or maybe lab bins?) coming... Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at snf.stanford.edu Thu Sep 30 10:20:17 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 30 Sep 2004 10:20:17 -0700 Subject: [Fwd: Dr. Chenming Hu's keynote speech delivered in Mandarin on Oct. 2, 2004 at Stanford] Message-ID: <415C4051.9010407@snf.stanford.edu> Hi all -- An invitation from Fumin! Mary -------- Original Message -------- Subject: Dr. Chenming Hu's keynote speech delivered in Mandarin on Oct. 2, 2004 at Stanford Date: Thu, 30 Sep 2004 02:33:27 -0700 From: Fu-Min Wang To: Mary Tang Mary, Dr. Chenming Hu, Professor, UC Berkeley; former CTO of TSMC, will come to Stanford to give a talk. Since the talk is in Mandarin, I am not sure if it's ok to send to lab members. If you think lab members who understand mandarin can benefit, please help me to forward to the lab members. Thanks! Fumin -------------------------------------- I just would like to invite you to come to Dr. Chenming Hu's keynote at 2 pm on Oct. 2 (Saturday). It will be a very wonderful talk and the topic is for general audience. Dr. Hu is a luminary and it is always great to see this type of person give a talk. As the organizer of this event, I sincerely hope our members can attend. The admission is free but the talk is priceless. I do hold some reservations for Stanford affiliated members since Center for Integrated Systems at Stanford and Prof. Ken Goodson are our sponsoring department and faculty. Please RSVP to fumin at stanford.edu if you can come. You can find one article about Dr. Hu in the following. (http://www.techvantage.com.tw/content/021/021064.asp) Looking forward to seeing you. Sincerely, Fumin ---------------------------------------------------------- Event: National Taiwan University Alumni Association in North California Annual Meeting (www.ntuaa.org ) Keynote Speaker: Dr. Chenming Hu (Professor, UC Berkeley; former CTO of TSMC) Time: Oct. 2 (Saturday) 2:00 - 3:10 PM Place: Auditorium, James H. Clark Center at Stanford University (318 Campus Drive, Stanford, CA 94305) map and directions Title: Report from Taiwan (delivered in Mandarin) Abstract: Dr. Hu lived the past three years in Hsinchu. His full-time job was the chief technology officer of a large electronics company- Taiwan Semiconductor Manufacturing Company (TSMC) but he also interacted with universities and government agencies often. He'll share his experiences and observations with the audience. Speaker Bio: Dr. Chenming Hu received his B.S. degree from National Taiwan University and M.S. and Ph.D. degrees from the University of California at Berkeley, all in electrical engineering. Dr. Hu is on leave from UC Berkeley, where he is TSMC Distinguished Professor of Electrical Engineering and Computer Science. He has been the Chief Technology Officer of Taiwan Semiconductor Manufacturing Company (TSMC) in Taiwan for the past three years and is coming back to lead his research group in September at UC Berkeley. He was an assistant professor at MIT before joining UC Berkeley. He was the board chairman of the East San Francisco Bay Chinese School and is a frequent advisor to industry and educational institutions. He was founding chairman of Celestry Design Technologies, an IC design software company that was acquired by Cadence Design Systems in 2003. His research area is microelectronic devices and technologies. He has authored or co-authored five books as well as over 750 research papers and supervised 60 doctoral students. In 1997, Dr. Hu received the IEEE Jack A. Morton Award for contributions to MOSFET reliability physics. In 1999, he received the DARPA Most Significant Technological Accomplishment Award for FinFET. In 2002, he received the IEEE Solid State Circuits Field Award for BSIM transistor model. Dr. Hu is a member of the US National Academy of Engineering(????? ??????), an Academician of Academia Sinica(?????), a fellow of the IEEE(????????????), a fellow of the Institute of Physics, and an Honorary Professor of the Chinese Academy of Science, Beijing, and of Chiao Tung University, Taiwan. He has received UC Berkeley's highest honor for teaching -- the Distinguished Teaching Award. -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu