e-beam lithography presentation
rissman at stanford.edu
Tue Feb 22 12:55:08 PST 2005
There will be a presentation on electron beam lithography by Dr. Tim Groves
of Leica on:
Friday, March 4th
The abstract is listed below. Please forward this message on to anyone who
you think would be interested in the talk.
>Recent Progress in Electron Beam Lithography of Nanometer Scale Structures
>Dr. Tim Groves, Director of Technology at Leica Microsystems Lithography,
>and Consulting Professor of Electrical Engineering at Stanford
>E-beam lithography remains the method of choice for fabricating structures
>in the range of 4 nm to 200 nm in size. In additon to having inherently
>high resolution, it has the ability to store and print complex patterns,
>thus avoiding the cost and cycle time of photomasks. Recent years have seen
>an enormous proliferation of commercial and research applications for EBL.
>Dr. Groves will describe some of these, along with the capabilities and
>limitations of the technology. An open discussion of the EBL needs of the
>Stanford community will follow.
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