From ahazeghi at stanford.edu Mon May 2 11:28:57 2005 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Mon, 2 May 2005 11:28:57 -0700 Subject: Ti deposition Message-ID: <3ed6945ae175ff2c40e5ffe89ebe93b3@stanford.edu> Hello, I want to prepare a substrate for carbon nanotube growth, the substrate will be SiO2/Ti/W/Ti/SiO2/Si-substrate, Ti is for better adhesion between SiO2 and W but I am not sure if Ti can withstand 900C temperature cycle needed for CNT growth, I would be pleased to hear your comments, Thank you Arash Hazeghi From shott at snf.stanford.edu Mon May 2 13:12:36 2005 From: shott at snf.stanford.edu (John Shott) Date: Mon, 02 May 2005 13:12:36 -0700 Subject: Probe Station Abuse .... Message-ID: <427689B4.4010307@snf.stanford.edu> SNF Lab Members: I just took a look at the Micromanipulator probe station in CIS 151 and found that someone has seriously dismantled and damaged that instrument. In particular, someone has removed the rod that engages/disengages the coarse up/down mechanism. In removing that piece, they badly bent it. I also can't find the round push button that is used to release the up/down mechanism. Someone clearly knows what happened to this ... because it took some serious effort to remove this piece. That person had best contact me as soon as possible to explain themselves. Until that happens and until we can fix it, SNF no longer has any probing capability for general use. If you didn't break it ... but know who did ... you may want to contact me as well because nothing is going to happen to repair that probe station until I've spoken with the person or persons who damaged this and fully understand what their reasoning process was. John From rjkline at stanford.edu Mon May 2 13:38:24 2005 From: rjkline at stanford.edu (Joe Kline) Date: Mon, 2 May 2005 13:38:24 -0700 Subject: Ph.D. Oral Examination Message-ID: <1115066304.42768fc0337b3@webmail.stanford.edu> Stanford University Ph.D. Oral Examination "A Fundamental Study of Morphology and Charge Transport in Regioregular Polythiophene" R. Joseph Kline Materials Science and Engineering Building 550 - 550A Friday, May 6, 2005 1:00 pm (refreshments at 12:45 pm) Conjugated polymers include some of the most promising candidates for the active layer of low-cost thin-film transistors (TFTs) and bulk heterojunction photovoltaic (PV) cells. The charge carrier mobility of these conjugated polymers is the key materials property limiting the performance of both of these devices. This thesis outlines a fundamental investigation of the charge transport and morphology of the first high mobility conjugated polymer, regioregular poly(3-hexylthiophene) (P3HT). The charge carrier mobility in TFTs was found to increase by four orders-of-magnitude as the molecular weight (MW) of P3HT is increased from 3000 g/mole to 36,000 g/mole. P3HT films with different MWs provided an ideal system for correlating morphological changes in conjugated polymers to resulting changes in charge transport. Atomic force microscopy, x-ray diffraction and grazing incidence x-ray scattering (GIXS) were used to measure changes in the crystallinity and crystal orientation associated with varying the spin-casting solvent, annealing conditions, substrate surface treatment, and drop-casting at a constant MW. The GIXS results showed that at a constant MW in both low- and high-MW films, the mobility correlated to the strength of in-plane pi-stacking. When comparing different MWs, however, this correlation broke down. Rocking curves on samples with a chemically modified surface showed highly oriented crystals that were nucleated from the substrate and correlated with variations in charge transport. Switching to low-MW P3HT improves the overall crystallinity, the intensity of in-plane pi-stacking, and the concentration of highly oriented crystals, but the mobility is more than a factor of 100 lower than high-MW P3HT. These counterintuitive results clearly show that the charge carrier mobility of conjugated polymers is coupled to several different aspects of the morphology. In the case of the low-MW films, the strong driving force for ordering creates grain boundaries that isolate the ordered regions from their neighbors. Whereas in high-MW films, the long chains connect the small ordered regions and provide a clear pathway for charges to move through the film. These results were used to develop a model for relating charge transport and structure that can be used as a guide for the development of new, improved chemical structures. From suriadi at stanford.edu Mon May 2 15:48:31 2005 From: suriadi at stanford.edu (Arief Suriadi Budiman) Date: Mon, 2 May 2005 15:48:31 -0700 Subject: TiN etchant In-Reply-To: <427689B4.4010307@snf.stanford.edu> References: <427689B4.4010307@snf.stanford.edu> Message-ID: <1115074111.4276ae3f57f6d@webmail.stanford.edu> Dear fellow labmembers, I need to etch/pattern TiN - I'm wondering if anybody has etched TiN before in the lab, and can share how to do that with me. I haven't tried with the Ti/W etchant at the wbmetal, but has been told that it will not work. Looking forward certainly to hearing back from anybody who can help me with this. Thanks and best regards, suriadi From kimsora at stanford.edu Tue May 3 14:57:01 2005 From: kimsora at stanford.edu (Sora Kim) Date: Tue, 3 May 2005 14:57:01 -0700 Subject: Good vendor for clean wafer cutting Message-ID: <1115157421.4277f3ad4d5fe@webmail.stanford.edu> Dear all, Is there anybody who knows good vendors for clean wafer cutting? I have 6 inch SOI wafers with thin film of 500nm and oxide of 3um, and want to cut them into 4 inch wafers. Please let me know if you know some. Sora From mse.whu at stanford.edu Wed May 4 09:43:50 2005 From: mse.whu at stanford.edu (Wei Hu) Date: Wed, 4 May 2005 09:43:50 -0700 Subject: thinning down LOL2000 Message-ID: <1115225030.4278fbc6b7383@webmail.stanford.edu> Dear labmembers, Does anyone have the experience of thinning down LOL2000 to ~50nm? Thanks! Best, Wei -- Wei Hu Ph.D. Candidate Department of Materials and Engineering Stanford University From mtang at snf.stanford.edu Thu May 5 06:27:36 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 05 May 2005 06:27:36 -0700 Subject: [Fwd: Invitation to IEEE/NATEA conference: "Wireless Sensor Network"] Message-ID: <427A1F48.7090506@snf.stanford.edu> -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An embedded message was scrubbed... From: Eaden Saw Subject: Invitation to IEEE/NATEA conference: "Wireless Sensor Network" Date: Thu, 5 May 2005 01:09:54 -0700 (PDT) Size: 457650 URL: From mtang at snf.stanford.edu Thu May 5 07:14:42 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 05 May 2005 07:14:42 -0700 Subject: [Fwd: Thurs, May 5 / Kurt Peterson's MEMS talk] Message-ID: <427A2A52.9080708@snf.stanford.edu> -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An embedded message was scrubbed... From: "viji at stanford.edu" Subject: Thurs, May 5 / Kurt Peterson's MEMS talk Date: Wed, 4 May 2005 16:07:53 -0700 Size: 7867 URL: From jules83 at stanford.edu Mon May 9 13:53:43 2005 From: jules83 at stanford.edu (Julia R Greer) Date: Mon, 9 May 2005 13:53:43 -0700 Subject: Ph.D. Oral Defense - Julia R. Greer Message-ID: <015a01c554d9$307975f0$d37640ab@Touffler> Dear everyone, I will be defending my dissertation on Tuesday, May 17th, at 1pm in the CIS-X Auditorium. Refreshments will be provided at 12:45. Please find the attached abstract below. I really hope some of you will be able to come. Size Effect in Plasticity of Metals at the Sub-Micron Scale Julia R. Greer (Advisor: Professor William D. Nix) Department of Materials Science and Engineering Abstract The results of both experimental studies and molecular dynamics simulations indicate that crystals exhibit strong size effects at the sub-micron scale. In experimental studies, the size effects are usually explained by the presence of strain gradients. One of the more prominent strain gradient plasticity theories was developed by Nix and Gao. While this model accurately predicts the observed increase in hardness as the deformation volume decreases, it fails to describe the discrete behavior indicative of nucleation of dislocations at the indentation depths shallower than ~100nm. By contrast, more recent experiments and some molecular dynamics (MD) simulations suggest that the yield strength of crystalline materials depends on the specimen size even without strain gradients and scales with the sample size through a power relationship. In the scope of this work, results of uniaxial compression experiments of free-standing gold single-crystalline and polycrystalline "nanopillars" without imposing significant stress/strain gradients are presented. These Au cylinders are created by focused ion beam (FIB) machining and by Microlithography/Electroplating techniques. They are subsequently compressed using a Nanoindenter fitted with a custom-fabricated diamond flat punch. Compressive stresses and strains, as well as pillar stiffnesses are determined from the test data. The experiments show that the flow stresses of these pillars increase significantly with decreasing pillar volume, reaching stresses as high as 0.8 GPa for the smallest pillars. These results indicate a 50x flow stress increase compared to that of bulk gold which is reported to be ~20 MPa at 2% strain. These high strengths appear to be controlled by dislocation starvation, unique to very small crystals. TEM studies and dislocation starvation model results are discussed. Julia R. Greer Ph.D. Candidate in Materials Science and Engineering Stanford University (415) 26-JULES -------------- next part -------------- An HTML attachment was scrubbed... URL: From rcrane at snf.stanford.edu Tue May 10 08:37:25 2005 From: rcrane at snf.stanford.edu (Dick Crane) Date: Tue, 10 May 2005 08:37:25 -0700 Subject: Disruption of hepa airflow next week Message-ID: <4280D535.6020300@snf.stanford.edu> Fab users, HEPA air flow (the clean, particle free air from the ceiling filters) will be disrupted for one to two hours, in the morning next week, on Monday, Tuesday, and Wednesday, while Facilities and Operations checks and/or replaces fan belts. The air for the cleanroom is supplied by ten separate transfer fans. Only one fan will be shut down at a time, so the disruption should be minimal. If you need to execute a procedure which is particle critical you may wish to delay until later in the morning. Fan work should take less than one hour, but may take up to two hours. Current status will be posted at the fab entrance door. Shutdown schedule: Monday, May 16, 0700-0900, litho area, all aisles. Tuesday, May 17, 0700-0900, AG4110, Implant, Tylan oxidation, Innotec aisle, etch, diffusion furnaces, LPCVDs. Wednesday, May 18, 0700-0900, Gowning, Metallica aisle, STSetch aisle, Metrology, Micronic. Thanks for your patience, Dick From jzheng at rheosense.com Tue May 10 10:15:35 2005 From: jzheng at rheosense.com (Jun Zheng) Date: Tue, 10 May 2005 10:15:35 -0700 Subject: Silicon membrane thickness measurement Message-ID: <001401c55583$e4d8fe30$6801a8c0@RheoSense1> Hi, Everyone: I want to use FTIR to measure the Si membrane thickness on our device in a very small area (0.5mm by 0.5mm). If anyone knows any place in Stanford has such equipment, please let me know. Also if anyone have other ideal on how to measure it (Non-destructive), please share your ideal with me. Thank you very much! Jun Zheng From matteoja at stanford.edu Tue May 10 11:11:32 2005 From: matteoja at stanford.edu (Joseph Anthony Matteo) Date: Tue, 10 May 2005 11:11:32 -0700 Subject: Ph.D. Thesis Defense - Joe Matteo Message-ID: <1115748692.4280f95456645@webmail.stanford.edu> Hello Everyone, I'll be defending next Tuesday, May 17th, at 1:30pm in the Clark Center Auditorium in Bio-X. There will be refreshments at 1:15. Hope you can make it, and come see what I've been up to for the last (ahem!) years. ----------------------------------------------------- Stanford University Ph.D. Oral Examination ??Design, Characterization and Application of Resonant Nano-Aperture Near-Field Probes?? Joseph A. Matteo, Dept. of Applied Physics Clark Center Auditorium (Bio-X) Tuesday, May 17, 2005 1:30p.m. ?V 2:30p.m. (Refreshments at 1:15) In recent years, there has been an ongoing trend to investigate smaller, more basic physical systems, create smaller devices, and encode information more densely. As these physical systems and their associated length scales approach that of the wavelength of light, the diffraction limit becomes a major impediment to achieving these goals optically. One method for overcoming this limit is to make these measurements in the near-field of a sub-wavelength aperture. Unfortunately, it has been shown that the power throughput of apertures much smaller than a wavelength falls off as (d/??)4. I will present efforts to design, classify, and fabricate resonantly shaped apertures shown to exhibit >1000 times throughput enhancement in simulation and microwave experiments, for use in the optical regime. Such a high throughput nano-aperture would be an enormous asset for use in single-molecule studies, data storage, optical lithography, and nano-scale optical manipulation. Any effective implementation of this approach, however, requires a systematic method for design, characterization , and quantification of aperture performance. Operating at optical frequencies presents many challenges as well. In particular, optical properties of metals, topological artifacts introduced by FIB fabrication, and the strong coupling with measurement probes must be understood and accounted for in order to properly design apertures and interpret results. Individual transmission spectra taken using confocal spectroscopy showed that the C-shaped apertures we designed exhibited from 13-22 times enhancement over square apertures of the same area, which implies a 106 improvement over a square aperture modeled to produce the same near field spot size. Furthermore, the location of this resonance was tuned over 70nm simply by scaling the aperture dimensions. Photon Scanning Tunneling Microscopy (PSTM) was used to characterize the near-field performance of C-apertures determined to be resonant at 633nm by the spectral study. A deeply sub-wavelength spot size was verified for these structures. Detailed calibration studies were carried out to deconvolve the images with the preferential collection efficiency of the probe for certain field components, and its finite collection range. A general formalism was developed for extraction of quantitative information from near-field images. Advanced numerical studies were carried out on novel fractal configurations of nano-apertures which were shown to elicit throughput enhancements yet another order of magnitude larger and several times enhancement in achievable resolution. Applications of these designs will also be presented from a wide range of areas including near-field data storage and lithography, nano-scale optical trapping, and enhanced near-field optical probe manufacturing. -------------- next part -------------- A non-text attachment was scrubbed... Name: Thesis_abstract.doc Type: application/octet-stream Size: 28160 bytes Desc: not available URL: From sanli at stanford.edu Tue May 10 11:45:55 2005 From: sanli at stanford.edu (Arif Sanli Ergun) Date: Tue, 10 May 2005 11:45:55 -0700 Subject: Al/Au contact Message-ID: <6.1.2.0.2.20050509081558.01fdee30@sanli.pobox.stanford.edu> Hi labmembers, Does anyone have experience with Gold to Aluminum contact. I'm trying to put gold on Aluminum pads for easier wire bonding. The Aluminum is deposited with gryphon (100 % Al). Then, I do lift-off lithography and evaporate Ti/Pt/Au. The lift-off goes very well, but Ti/Pt/Au does not stick to Al very well: it peels off while trying to wire-bond. Any ideas why, and how to prevent it? Sanli From bwacker at sbcglobal.net Wed May 11 18:02:51 2005 From: bwacker at sbcglobal.net (Barbara Wacker) Date: Wed, 11 May 2005 18:02:51 -0700 (PDT) Subject: High temperature vacuum anneals Message-ID: <20050512010251.80925.qmail@web81305.mail.yahoo.com> Hi All, We would like to find a vendor who could anneal our sample at 2600C in vacuum. It is an unusual request and I wonder if anybody heard about vendor like this. We would appreciate very much any hints! Thank you very much, Barbara Wacker From xbyin at stanford.edu Thu May 12 09:06:31 2005 From: xbyin at stanford.edu (Xiaobo Yin) Date: Thu, 12 May 2005 09:06:31 -0700 Subject: National Instrument LabVIEW Talk Message-ID: <000501c5570c$8fd45ad0$836140ab@xbyincmp> Hi All, There will be an advanced LabVIEW skill presentation and demonstration today in Packard building. Time: 12pm, May 12, 2005 Room: Packard 101 Speaker: Adeel Malik, National Instruments Topics: LabVIEW Application Optimization, Speed, Memory and File I/O, etc. There will be an open session to discuss the problem the audience interested. Thanks, Xiaobo Yin -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Thu May 12 10:40:33 2005 From: mbaran at stanford.edu (Maureen Baran) Date: Thu, 12 May 2005 10:40:33 -0700 Subject: Please Move Your Bike on Via Pueblo! Message-ID: <200505121740.j4CHeXt7016206@smtp1.Stanford.EDU> Please move your bike, if it is parked along the CIS building that faces Via Pueblo. The Power Washers want to get started on that side NOW. We apologize for the short notice however; we did not get much notice ourselves. Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From sanli at stanford.edu Fri May 13 12:12:39 2005 From: sanli at stanford.edu (Arif Sanli Ergun) Date: Fri, 13 May 2005 12:12:39 -0700 Subject: Al/Au contact Message-ID: <1116011559.4284fc273eded@webmail.stanford.edu> Hi all, Thanks a lot for the responses. I didn't know this was such a popular subject. Here is a summary of the responses: 1. It is not a good idea to contact Au and Al directly, because Al/Au alloy, also known as purple plague, is nasty, and high resistive. I was aware of this and therefore was putting Ti/Pt on top of Al before putting Au. 2. It is possible to wire-bond to Al pads both with Au and Al wires, Al being the preferred choice. To do this you have to scratch the Al with the tip of the wire bonder. This works for small volumes, but I have about 400 bonds per device. In addition to the time consumed in making 400 scratches and wire bonds, I need the wire bonds to be all working and reliable. That's why I'm trying to put Au on the pads. 3. The Ti/Pt/Au layer peels of while trying to wire bond. That is, Ti is not sticking to Al. In fact, I'm depositing Al in gryphon, and evaporating Ti/Pt/Au in Ginzton which means there is actualy Aluminum oxide on the surface, not Al. So, the problem seems to be sticktion between Aluminum oxide and Ti. Monty says Ti sticks by reducing native oxide, which happens at an elevated temperature, for example at 400 C. Because I have gold and because of stress issues I cannot do a heat treatment. Then, that is probably why Ti is not sticking to Aluminum oxide. The solution I thought is to deposit a thin layer of Ti on top of Al in gryphon without breaking the vacuum, so that I don't have Ti/Alumina interface. When I break the vacuum, Ti will immediately oxidize. Then, I will evaporate Ti/Pt/Au as before. Assuming that Ti/TiOx sticktion is good (which shouldn't be a wrong assumption) I won't have the peeling problem while wire-bonding. Thanks again for the help, Sanli From zhangy at stanford.edu Fri May 13 16:02:11 2005 From: zhangy at stanford.edu (Yuan Zhang) Date: Fri, 13 May 2005 16:02:11 -0700 Subject: TiW etchant Message-ID: <1116025331.428531f3ee985@webmail.stanford.edu> Hi all, I want to do wet etch TiW layer after I patterned the sample with photoresist. Has anyone tried this method before? What chemicals do you use under what conditions? And whether photoresist will be removed either or not? Thank you for the help. -Yuan Yuan Zhang EE department From lll2002 at stanford.edu Fri May 13 20:56:32 2005 From: lll2002 at stanford.edu (liangliang li) Date: Fri, 13 May 2005 20:56:32 -0700 Subject: about the dielectric constant measurement of thin film Message-ID: <6.1.2.0.2.20050513204842.01b83eb0@lll2002.pobox.stanford.edu> An HTML attachment was scrubbed... URL: From mvikram at stanford.edu Sat May 14 09:46:57 2005 From: mvikram at stanford.edu (Vikram Mukundan) Date: Sat, 14 May 2005 09:46:57 -0700 Subject: LOL2000 question Message-ID: <002e01c558a4$8a9d90b0$3aa80c80@Vikram> Hi all, I am trying to pattern gold on silicon with a lift-off process. I have features etched in my wafer varying between 15-50 mic deep. When I try to spin LOL2000 after HMDS prime, I notice that I dont get a conformal coating on the devices. I had a similar problem with PR earlier and eventually found I needed to have atleast 7 mic resist to prevent it from running off the trenches. Has anyone seen this problem or has any recommendations? Any inputs will be greatly appreciated. thanks, Vikram -------------- next part -------------- An HTML attachment was scrubbed... URL: From matteoja at stanford.edu Tue May 17 10:18:18 2005 From: matteoja at stanford.edu (Joseph Anthony Matteo) Date: Tue, 17 May 2005 10:18:18 -0700 Subject: Reminder: Ph.D. Defense Joseph Matteo Message-ID: <1116350298.428a275a1f925@webmail.stanford.edu> Just a reminder...... "Design, Characterization and Application of Resonant Nano-Aperture Near-Field Probes" Clark Center Auditorium, Today (5/17), 1:30p.m. From rcrane at snf.stanford.edu Tue May 17 15:49:59 2005 From: rcrane at snf.stanford.edu (Dick Crane) Date: Tue, 17 May 2005 15:49:59 -0700 Subject: Corosive gas sensor test Wednesday 1000-1030 Message-ID: <428A7517.1040907@snf.stanford.edu> Labusers: This notice is addressed to users of corrosive gases: primarily etch tools and EPI reactor. There will be a test of two toxic gas sensors tomorrow, May 18, between 1000 and 1030. The test will cause a momentary shutdown of the corrosive gas vault. Staff will be on hand to reset the gases within two minutes. The test should not be noticeable by tool users. The amount of stored gas in the distribution system should continue to supply the tools during the test (HCl for the EPI reactor is an exception). This test concerns the HBr gas supply. Thanks for your support, Dick From ajavey at stanford.edu Wed May 18 09:33:35 2005 From: ajavey at stanford.edu (Ali Javey) Date: Wed, 18 May 2005 09:33:35 -0700 (PDT) Subject: Ph.D. Thesis Defense - Ali Javey Message-ID: Dear All, I will be defending on Monday, May 23rd at 9 am in the CISX Auditorium. I hope you can make it despite the early time. Best, Ali ------------------------------------------------------------------------- Carbon Nanotube Electronics Ali Javey Monday, May 23 at 9 am CISX Auditorium Molecular electronics is an emerging field with a goal of developing miniaturized device elements based on the bottom-up synthetic processes. As the conventional Si technology reaches its scaling limit, many have approached novel molecular concepts, such as nanotube-based electronics, as alternatives. Carbon nanotubes are chemically derived quantum wires (diameter ~ 1 nm) with atomically well-defined structures, and are ideal for elucidating basic phenomena in 1-D and have been proposed as the potential building blocks for future nanoelectronics. In this talk, I will discuss ohmic contacts, high-k dielectric integration, electrostatics, device physics, and electron-phonon interactions in carbon nanotube devices with novel geometries. Unprecedented near-ballistic electron transport is observed at room temperature in nanotube FETs with high-k dielectrics, capable of delivering higher current densities and therefore switching speeds than the state-of-the-art Si MOSFETs. The results show the promise of nanotube building blocks in paving a "revolutionary" pathway for future generation of high density and performance digital electronics. Furthermore, I will present electron transport spectroscopy measurements of molecular-scale organic electronics obtained by incorporating metallic nanotubes as miniaturized contact materials with better electrostatic gate control and contact transparencies than the bulk metal contacts. ------------------------------------------------------------------------- From mbaran at stanford.edu Wed May 18 11:29:18 2005 From: mbaran at stanford.edu (Maureen Baran) Date: Wed, 18 May 2005 11:29:18 -0700 Subject: Personal Toiletries in the Men's Shower Message-ID: <200505181829.j4IITI4R004360@smtp2.Stanford.EDU> Dear Labmembers, It was told to me by a male labmember that someone has left their toiletries and some clothes in the men's shower. These items have been there since Monday. If they are not picked up by the close of business today they will be thrown away. Thank you in advance for your attention in this matter. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jhemanth at stanford.edu Wed May 18 11:20:37 2005 From: jhemanth at stanford.edu (Hemanth Jagannathan) Date: Wed, 18 May 2005 11:20:37 -0700 Subject: Si 110 wafers In-Reply-To: Message-ID: <000001c55bd6$4b3b3eb0$0100000a@JAGANNATHANPC> Hello Everyone, I am in search of Si 110 wafers or pieces. Does anyone have some pieces of Si (110) lying around that you can spare or do not need. I am also interested in vendors who could sell me Si 110 wafers in a small quantity (~5) as opposed to a whole box. Thanks, Hemanth Jagannathan PhD Candidate Department of Electrical Engineering Stanford University, CA Phone :(O)(650)-725-0417; (C) (650)-380-2105 e-mail: jhemanth at stanford.edu From zhangy at stanford.edu Wed May 18 13:02:05 2005 From: zhangy at stanford.edu (Yuan Zhang) Date: Wed, 18 May 2005 13:02:05 -0700 Subject: TiW wire bonding Message-ID: <1116446525.428b9f3d87b93@webmail.stanford.edu> Dear labmembers, I want to wire bond W and TiW layer for thermal measurement. Is there anybody who has such experience? What kind of metal wire is easy to be bonded with W or TiW? Thank you so much! Best, Yuan Yuan Zhang EE department From daweiw at uci.edu Wed May 18 17:25:48 2005 From: daweiw at uci.edu (David Wang) Date: Wed, 18 May 2005 17:25:48 -0700 Subject: resistivity of Si wafer at low T Message-ID: <6.2.1.2.0.20050518171956.02a80e20@pop.uci.edu> Hi, I have a degenerately doped Si wafer (P-type, Boron doped) which has a resistivity of 0.005 Ohm-cm at room T. Does anyone know what its resistivity will be when the temperature drops to 0.3 K. Will it behave like an insulator or a conductor at this low T. Thanks a lot, David From lwchang at stanford.edu Wed May 18 19:38:56 2005 From: lwchang at stanford.edu (Li-Wen Chang) Date: Wed, 18 May 2005 19:38:56 -0700 Subject: Feature uniformity examination Message-ID: <005a01c55c1b$e8a6e010$52840c80@LiWen> Dear labmembers: I have a feature of hexagonal array of holes in polystyrene film such as the attached image. I would like to get the diameter of each hole and hole to hole spacing out of the image to examine the spatial uniformity. Does anyone know any software that may help? Thank you in advance. Li-Wen Chang -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: holes.tif Type: image/tiff Size: 321541 bytes Desc: not available URL: From randalg at gmail.com Wed May 18 20:40:25 2005 From: randalg at gmail.com (Randal Grow) Date: Wed, 18 May 2005 20:40:25 -0700 Subject: Feature uniformity examination In-Reply-To: <005a01c55c1b$e8a6e010$52840c80@LiWen> References: <005a01c55c1b$e8a6e010$52840c80@LiWen> Message-ID: <7aa62c88050518204023c6e494@mail.gmail.com> I think biologists use something called NIH Image to count cells and particles. Maybe that would work for you. Randy On 5/18/05, Li-Wen Chang wrote: > > Dear labmembers: > I have a feature of hexagonal array of holes in polystyrene film such as the > attached image. > I would like to get the diameter of each hole and hole to hole spacing out > of the image to examine the spatial uniformity. > Does anyone know any software that may help? > > Thank you in advance. > Li-Wen Chang > -- Randy Grow Ph.D. Candidate Dept. of Applied Physics Stanford University Stanford, CA 94305-4090 rgrow at stanford.edu (650) 387-2588 (cell) (650) 725-9156 (lab) From goldhaber-gordon at stanford.edu Thu May 19 00:02:16 2005 From: goldhaber-gordon at stanford.edu (David Goldhaber-Gordon) Date: Thu, 19 May 2005 00:02:16 -0700 Subject: resistivity of Si wafer at low T In-Reply-To: <6.2.1.2.0.20050518171956.02a80e20@pop.uci.edu> Message-ID: <000501c55c40$b0f27830$8f44f4cc@cocoanibs> Hi David, That wafer should conduct nicely at 300 mK (i.e. it is degenerately doped). However, you need to be careful to make good contacts to the wafer. A thin layer of dirt, or a Schottky barrier, may not matter at room T but might dominate at low T. Best, David -----Original Message----- From: David Wang [mailto:daweiw at uci.edu] Sent: Wednesday, May 18, 2005 5:26 PM To: labmembers at snf.stanford.edu Subject: resistivity of Si wafer at low T Hi, I have a degenerately doped Si wafer (P-type, Boron doped) which has a resistivity of 0.005 Ohm-cm at room T. Does anyone know what its resistivity will be when the temperature drops to 0.3 K. Will it behave like an insulator or a conductor at this low T. Thanks a lot, David From gyama at snf.stanford.edu Thu May 19 08:31:48 2005 From: gyama at snf.stanford.edu (Gary Yama (SNF)) Date: Thu, 19 May 2005 08:31:48 -0700 Subject: zygo dynamic measurement Message-ID: <428CB164.6080806@snf.stanford.edu> I'm trying to measure an out of plane 1kHz - 10kHz resonating diaphragm, 1mm x 1mm. Has anyone done this on the zygo? If it is not possible, is there some other tool that may be around that can do this? Thanks in advance - Gary From wibool at stanford.edu Thu May 19 09:09:48 2005 From: wibool at stanford.edu (Wibool Piyawattanametha) Date: Thu, 19 May 2005 09:09:48 -0700 Subject: zygo dynamic measurement In-Reply-To: <428CB164.6080806@snf.stanford.edu> Message-ID: <200505191609.j4JG9lFm021690@smtp1.Stanford.EDU> Hi All, My old lab (which is not here) has a machine called "laser Doppler vibrometer" from Polytech PI. It can measure dynamic responses of a diaphragms or torsional mirrors. I am wondering whether if any labs here have similar machines. Thanks. WP Wibool Piyawattanametha, Ph.D. Stanford University Departments of Biological Sciences, Applied Physics, and Pediatrics James H. Clark Center (Bio-X) - Room W080 318 Campus Drive Stanford, CA 94305 Telephone: (650) 725-4097 Fax: (650) 724-5805 Mobile: (949) 228-0771 -----Original Message----- From: Gary Yama (SNF) [mailto:gyama at snf.stanford.edu] Sent: Thursday, May 19, 2005 8:32 AM To: labmembers at snf.stanford.edu Subject: zygo dynamic measurement I'm trying to measure an out of plane 1kHz - 10kHz resonating diaphragm, 1mm x 1mm. Has anyone done this on the zygo? If it is not possible, is there some other tool that may be around that can do this? Thanks in advance - Gary From lian at stanfordalumni.org Thu May 19 11:16:34 2005 From: lian at stanfordalumni.org (Lian Zhang) Date: Thu, 19 May 2005 11:16:34 -0700 Subject: Cu electroplating Message-ID: <000c01c55c9e$e4127450$3201a8c0@koilainc.com> I'm wondering if anyone has experience in thick (up to 300um) Cu electroplating on any substrate. Also, vendor information will be greatly appreciate it. Thanks, Lian -------------- next part -------------- An HTML attachment was scrubbed... URL: From wibool at stanford.edu Thu May 19 12:15:35 2005 From: wibool at stanford.edu (Wibool Piyawattanametha) Date: Thu, 19 May 2005 12:15:35 -0700 Subject: Feature uniformity examination In-Reply-To: <7aa62c88050518204023c6e494@mail.gmail.com> Message-ID: <200505191915.j4JJFY0J029141@smtp1.Stanford.EDU> It is "imagej". See it at: http://rsb.info.nih.gov/ij/ Good luck WP Wibool Piyawattanametha, Ph.D. Stanford University Departments of Biological Sciences, Applied Physics, and Pediatrics James H. Clark Center (Bio-X) - Room W080 318 Campus Drive Stanford, CA 94305 Telephone: (650) 725-4097 Fax: (650) 724-5805 Mobile: (949) 228-0771 -----Original Message----- From: Randal Grow [mailto:randalg at gmail.com] Sent: Wednesday, May 18, 2005 8:40 PM To: Li-Wen Chang Cc: labmembers at snf.stanford.edu Subject: Re: Feature uniformity examination I think biologists use something called NIH Image to count cells and particles. Maybe that would work for you. Randy On 5/18/05, Li-Wen Chang wrote: > > Dear labmembers: > I have a feature of hexagonal array of holes in polystyrene film such as the > attached image. > I would like to get the diameter of each hole and hole to hole spacing out > of the image to examine the spatial uniformity. > Does anyone know any software that may help? > > Thank you in advance. > Li-Wen Chang > -- Randy Grow Ph.D. Candidate Dept. of Applied Physics Stanford University Stanford, CA 94305-4090 rgrow at stanford.edu (650) 387-2588 (cell) (650) 725-9156 (lab) From jwc at snf.stanford.edu Thu May 19 14:14:29 2005 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 19 May 2005 14:14:29 -0700 Subject: Feature uniformity examination In-Reply-To: <7aa62c88050518204023c6e494@mail.gmail.com> References: <005a01c55c1b$e8a6e010$52840c80@LiWen> <7aa62c88050518204023c6e494@mail.gmail.com> Message-ID: <428D01B5.5050005@snf.stanford.edu> Here is the link to NIH image . Many image analysis platforms utilize this software expanding on the capabilities provided. Hope this is useful to you, James Conway SNF Randal Grow wrote: >I think biologists use something called NIH Image to count cells and >particles. Maybe that would work for you. > >Randy > >On 5/18/05, Li-Wen Chang wrote: > > >> >>Dear labmembers: >>I have a feature of hexagonal array of holes in polystyrene film such as the >>attached image. >>I would like to get the diameter of each hole and hole to hole spacing out >>of the image to examine the spatial uniformity. >>Does anyone know any software that may help? >> >>Thank you in advance. >>Li-Wen Chang >> >> >> > > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From tparco2002 at yahoo.com Fri May 20 08:02:33 2005 From: tparco2002 at yahoo.com (Tony Parco) Date: Fri, 20 May 2005 08:02:33 -0700 (PDT) Subject: Cu electroplating In-Reply-To: 6667 Message-ID: <20050520150234.94199.qmail@web52304.mail.yahoo.com> Hi Lian (& Labmembers), I have a couple of vendors that are terrific for your project (as well as mems features projects): American Galvano 312 North Cota St. Unit "I" Corona, Ca 91720 phone (909)-736-2821 fax (909)-736-2842 email eform at pacbell.net ask for Anthony Covey (one of the earlier people who use to work for Fairchild; 25+ years in the industry in electroplating). next: NiCoForm, Inc. 72 Casacade Dr. Rochester, NY 14614 phone (877)-278-0098 fax (585)-454-5167 www.nicoform.com Tony Tony Parco --- Lian Zhang wrote: > I'm wondering if anyone has experience in thick (up > to 300um) Cu electroplating on any substrate. Also, > vendor information will be greatly appreciate it. > > Thanks, > Lian __________________________________________________ Do You Yahoo!? Tired of spam? Yahoo! Mail has the best spam protection around http://mail.yahoo.com From mtang at snf.stanford.edu Fri May 20 08:09:30 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Fri, 20 May 2005 08:09:30 -0700 Subject: NASA Ames: Nano2005 Message-ID: <428DFDAA.1060207@snf.stanford.edu> Dear Labmembers: I'd like to direct your attention to Nano2005, a conference sponsored by NASA Ames focusing on emerging business opportunities in nanotechnology (announcement below). The organizers have kindly agreed to provide SNF researchers with a 50% academic discount. (Details below.) Thanks for your attention ? Mary ********************************************************** You are invited to attend the premier event focused on emerging business opportunities in nanotechnology. June 7-8 , 2005 * The Westin * Santa Clara, CA www.techbriefs.com/nano Hot Topics and Speakers: Strategic Industry Roadmaps * Electronics/Computing * Biotechnology * Aerospace * Defense/Security Keynote Speakers: * Scott Hubbard, Director, NASA Ames Research Center * Matthew Nordan, VP, Lux Research * Paul Saffo, Director, Institute of the Future Visit www.techbriefs.com/nano to view the full agenda and speaker line-up. Register online today at www.techbriefs.com/nano For more information contact: Luke Schnirring, Conference Director, 212-490-3999, luke at abpi.net Academic registrations can be done online at http://www.techbriefs.com/nano/register.html. Please use the promo code "academia" when registering online to take advantage of the discount. -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From randalg at gmail.com Fri May 20 10:47:30 2005 From: randalg at gmail.com (Randal Grow) Date: Fri, 20 May 2005 10:47:30 -0700 Subject: Fwd: University PhD Dissertation Defense/ Randal J. Grow In-Reply-To: References: Message-ID: <7aa62c88050520104776cd04f5@mail.gmail.com> ---------- Forwarded message ---------- From: Claire Nicholas Date: May 18, 2005 11:39 AM Subject: Re: University PhD Dissertation Defense/ Randal J. Grow To: Cc: apgradstudents at lists.stanford.edu, apfaculty at lists.stanford.edu DEPARTMENT OF APPLIED PHYSICS UNIVERSITY PhD DISSERTATION DEFENSE Speaker: Randal J. Grow Research Advisor: Professor Hongjie Dai Title: Novel Atomic Force Microscope Cantilevers; Piezoresistance of Carbon Nanotubes and Germanium Nanowires. Date: May 25, 2005 Time: 10:30 A. M. Place: CIS-X Auditorium ABSTRACT There has been great interest in recent years in nanometer-scale materials and tools for fabricating and characterizing them. One such tool is the atomic force microscope (AFM), which has developed rapidly since its invention in 1986. Imaging soft or fragile samples requires low-spring-constant cantilevers to minimize the force on the sample. Silicon nitride is well-suited to making soft cantilevers, but it is not ideal for making sharp tips. We combined a silicon tip with a silicon nitride cantilever to achieve a hybrid with both a low spring constant and a sharp tip. Carbon nanotubes have remarkable mechanical and electrical properties. Their electromechanical properties are also interesting, as a few groups have determined by deforming suspended nanotubes. Their change in resistance under strain is stronger than that of silicon, which is commonly used in mechanical sensors such as pressure sensors, accelerometers, and strain gauges. However, the fragility of suspended tubes makes them impractical for mass-produced sensors. Tubes on surfaces are more robust. We fabricated micro-machined pressure sensors using a thin silicon nitride membrane with metal-contacted carbon nanotubes on the surface. Deforming the membrane introduced longitudinal strain in the nanotube, and we characterized the resistance changes. We found responses stronger than those of suspended nanotubes, probably because of local deformations in the nanotube caused by interaction with the surface. Nanowires of inorganic semiconductors such as silicon, germanium, and III-V semiconductors have evoked much interest for electronics and optics applications. The piezoresistive effect in nanowires should be larger than that of the bulk material, which could be useful for increasing the sensitivity of mechanical sensors. We have fabricated pressure sensors with germanium nanowires as the sensing elements, and we have found the piezoresistance to be much stronger than in the bulk. We understand this to be partly the result of the one-dimensionality, but there may be other contributing factors. We have also measured the mechanical properties of germanium nanowires suspended across trenches by pressing on them with AFM cantilevers. We found that their behavior matched what we expected for a simple mechanical model. DEPARTMENT OF APPLIED PHYSICS UNIVERSITY PhD DISSERTATION DEFENSE -- -- -- Randy Grow Ph.D. Candidate Dept. of Applied Physics Stanford University Stanford, CA 94305-4090 rgrow at stanford.edu (650) 387-2588 (cell) (650) 725-9156 (lab) From sahin at stanford.edu Fri May 20 13:58:05 2005 From: sahin at stanford.edu (Ozgur Sahin) Date: Fri, 20 May 2005 13:58:05 -0700 Subject: PhD Oral Defense, Ozgur Sahin Message-ID: <1116622685.428e4f5de9f47@webmail-imap> Dear Labmembers, I will defend my PhD thesis this Tuesday. It is on a nanomechanical sensor for single molecule level biomolecular recognition and material charcterization. It involves micromachined devices, as well. I'd be happy to see you there. Date, time, and location are given below. Thanks, Ozgur PHD ORAL DEFENSE Thesis title: Harmonic Force Microscope: A new tool for biomolecular identification and material characterization based on nanomechanical measurements. Speaker: Ozgur Sahin Department of Electrical Engineering Date: Tuesday, May 24th, 2005 Time: 1:30 pm (refreshments at ~1:15 pm) Place: David Packard Electrical Engineering Building, Room 101 (near Bytes Cafe) At the molecular level, physical and chemical properties of materials are tightly coupled to the mechanical properties. The potential of mechanics for interacting with matter at the nanoscale has been largely unexplored due to lack of instruments capable of performing mechanical measurements at nanometer length scales. On the other hand, most of the efforts have been concentrated on the nanoscale electrical or optical measurements with the tools available, albeit with limited sensitivity and practicality. In this talk a new kind of a nanomechanical sensor, the harmonic force microscope, will be presented. This tool allows sensitive mechanical measurements at the nanoscale and single molecular level. It is based on the atomic force microscope (AFM), an imaging instrument capable of resolving individual atoms by measuring the force interaction between an atomically sharp tip and a sample. I will briefly present a mathematical study of the nonlinear dynamics of the vibrating probe of AFMs that shows that information on mechanical properties is hidden in the weak higher-harmonic vibrations of the probe. Then I will present special micromachined cantilevers that enhance the higher harmonic generation by as much as six orders of magnitude through a phenomenon I call mechanical resonant energy transfer. These cantilevers allow us to recover the information on the mechanical properties of materials and molecules. With a nanomechanical sensor at hand, I investigated phase transformations of sub micron domains of composite polymers and observed their glass transitions. Studies on nucleic acids attached to a surface, a configuration commonly used in DNA microarray technology, showed that the hybridization of a single molecule can be observed with unprecedented sensitivity. By providing data on chemistry and mechanics with high sensitivity and nanometer spatial resolution, harmonic force microscopy has the potential to enable a new class of biological and chemical sensors and instruments for materials design and characterization. From edwardsj at stanford.edu Sat May 21 13:47:52 2005 From: edwardsj at stanford.edu (Jane Edwards) Date: Sat, 21 May 2005 13:47:52 -0700 Subject: Souza Fest: Tony Souza Retirement Lunch, Friday, May 27 Message-ID: <000b01c55e46$5c0a2ea0$236540ab@AVANDEL> You are cordially invited to attend a lunch given in honor of Tony Souza on his retirement from Stanford. The party will be held in the parking area outside of the CIS shipping and receiving area, on Friday, May 27, at 12 o?clock. Be prepared to eat, laugh and share in this tribute to Tony. ? ? ? rsvp:? jane.edwards at stanford.edu From amf at amfitzgerald.com Sun May 22 13:24:32 2005 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Sun, 22 May 2005 13:24:32 -0700 Subject: fyi, nitride film quality problem, esp. for KOH etch Message-ID: Hello Labmembers, I thought you should know that we have observed pinholing problems with LPCVD nitride deposited in the past two weeks. We have been using nitride as a mask for long KOH etch, and the film quality was bad enough to create serious problems with our pattern. We also recently verified the film quality problem by KOH etching blank nitrided wafers that had experienced a minimum of handling. We were using the nitride2 recipe. If you have recently done successful long KOH etches (10+ hours), I would be interested to know which nitride recipe/thickness you used and what date you did your nitride on. Regards, Alissa -------------- next part -------------- An HTML attachment was scrubbed... URL: From amf at amfitzgerald.com Mon May 23 23:07:39 2005 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Mon, 23 May 2005 23:07:39 -0700 Subject: upcoming PECVD nitride vendor run Message-ID: Hello labusers, I am going to outsource a low-stress *PECVD* nitride run to a reputable vendor in the next few days. Target thickness is 5000A but I have some flexibility. If you would like to piggyback onto this run, please contact me asap. I can only take whole silicon 4" wafers. Cost is $50/wafer. If you are generally interested in piggybacking on vendor runs, please send me an email, and I'll alert you of other upcoming opportunities. Regards, Alissa 650 520 4438 cell Alissa M. Fitzgerald, Ph.D. Member A.M. Fitzgerald & Associates, LLC Technical Consulting Services MEMS | Materials | Sensor Systems 655 Skyway Suite 118 San Carlos, CA 94070 (650) 592-6100 tel/fax www.amfitzgerald.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From cvenky at stanford.edu Tue May 24 01:12:59 2005 From: cvenky at stanford.edu (Venkatesh Chembrolu) Date: Tue, 24 May 2005 01:12:59 -0700 Subject: Wire Bonder? Message-ID: <4292E20B.4070100@stanford.edu> Dear Lab members, I have the following question. Any of your input/advise will be much appreciaited. I need to connect the contact pads of my device to an external waveguide structure using wire bonding. Is there a facility to wire bond here at SNF? If not what do people usually do if they need to wire bond? Thanks, Venkatesh From ankurjn at stanford.edu Tue May 24 15:52:26 2005 From: ankurjn at stanford.edu (Ankur Jain) Date: Tue, 24 May 2005 15:52:26 -0700 (PDT) Subject: electromigration limit for thin film Ti? Message-ID: Hello labmembers, Is anyone aware of the electromigration limit on current density for thin film Ti? I have a 4 micron wide, 0.1 micron thick Titanium line, and passing 1 uA or so of current makes it fail (it breaks at a sharp point, where the line turns) within 1-2 hours. The devices seem to fail quicker at low temperatures (around -50 C). Does anyone have similar prior experience like this? thanks, Ankur. From rcrane at snf.stanford.edu Wed May 25 06:59:56 2005 From: rcrane at snf.stanford.edu (Dick Crane) Date: Wed, 25 May 2005 06:59:56 -0700 Subject: Litho area temperature control work Message-ID: <429484DC.3040904@snf.stanford.edu> Fab users, Temperature and humidity control for the HEPA air flow in the litho area will be disrupted from 0700 to 0830, on Tuesday, May 31, while Facilities and Operations personnel upgrade the uninterruptable power supplies in the main control unit. If you need to execute a procedure which is dimensionally critical you may wish to delay until later in the morning. Current status will be posted at the fab entrance door. Shutdown schedule: Tuesday, May 31, 0700-0830, litho area, all aisles. Thanks for your patience, Dick From dshankar at stanford.edu Thu May 26 13:29:37 2005 From: dshankar at stanford.edu (Shankar Devasenathipathy) Date: Thu, 26 May 2005 13:29:37 -0700 Subject: Teflon AF Message-ID: <6.1.2.0.2.20050526132454.0283ffe0@dshankar.pobox.stanford.edu> All, I would like to check as to whether anybody has worked with Teflon AF at CIS. I am a new affiliate at SNF working on patterning Teflon AF onto glass substrates for live cell imaging studies. Any help / suggestions on this front would be much appreciated. Thanks, Shankar. Shankar Devasenathipathy, Ph.D. Department of Molecular Pharmacology Stanford University 318 Campus Drive Clark Center, Room W200 Phone: 650-723-9819 Fax: 650-725-2952 From adhikari at stanford.edu Fri May 27 08:46:53 2005 From: adhikari at stanford.edu (Hemant Adhikari) Date: Fri, 27 May 2005 08:46:53 -0700 Subject: sapphire In-Reply-To: <6.1.2.0.2.20050526132454.0283ffe0@dshankar.pobox.stanford. edu> References: <6.1.2.0.2.20050526132454.0283ffe0@dshankar.pobox.stanford.edu> Message-ID: <6.1.2.0.2.20050527084453.06e93018@adhikari.pobox.stanford.edu> >Hi, I was wondering if someone could suggest me vendors for buying (0001) and (1,-1,0,2) sapphire? thanks, hemant Hemant Adhikari PhD Candidate, Materials Science and Engineering Stanford University, Stanford, CA-94305 650-387-7763 Reality continues to ruin my life. -Calvin -------------- next part -------------- An HTML attachment was scrubbed... URL: From rcrane at snf.stanford.edu Fri May 27 16:33:10 2005 From: rcrane at snf.stanford.edu (Dick Crane) Date: Fri, 27 May 2005 16:33:10 -0700 Subject: Floor and carpet cleaning next week Message-ID: <4297AE36.5030503@snf.stanford.edu> Labmembers and CIS/CISX building dwellers, Our building janitorial service will be performing a major, annual hard floor cleaning and polishing and carpet shampooing next week. The schedule is as follows: CIS 2nd floor, Tuesday, 5/31, 1800-2400, carpets and hard flooring. CIS 1st floor, Wednesday, 6/1, 1800-2400, carpets and hard flooring (includes SNF office space and hallways). CISX 2nd and 3th floors, Thursday, 6/2, 1800-2400, carpets and hard flooring. CISX 1st and basement floors, Friday, 6/3, 1800-2400, carpets and hard flooring. To maximize to benefit of this annual event and to protect your belongings, please remove boxes, papers, and other personal objects from the floor for these evenings. The janitorial staff will be using motorized maintenance equipment, detergents, and liquid polish chemicals. The carpets may be slightly damp in the morning. Thanks for your patience, Dick -------------- next part -------------- An HTML attachment was scrubbed... URL: From rsshenoy at us.ibm.com Mon May 30 07:29:33 2005 From: rsshenoy at us.ibm.com (Rohit S Shenoy) Date: Mon, 30 May 2005 07:29:33 -0700 Subject: nearly out of 50:1 HF and H2O2 Message-ID: Hi, Does anyone know of a way to restock the chemical supply today? We are down to just 2 bottles of 50:1 HF. The supply of H2O2 is also low (2-3 bottles). thanks, -- Rohit -------------- next part -------------- An HTML attachment was scrubbed... URL: From rcrane at snf.stanford.edu Tue May 31 14:29:36 2005 From: rcrane at snf.stanford.edu (Dick Crane) Date: Tue, 31 May 2005 14:29:36 -0700 Subject: Carpet and floor cleaning Message-ID: <429CD740.6070609@snf.stanford.edu> A kind reminder... Labmembers and CIS/CISX building dwellers, Our building janitorial service will be performing a major, annual hard floor cleaning and polishing and carpet shampooing this week. The schedule is as follows: CIS 2nd floor, Tuesday, 5/31, 1800-2400, carpets and hard flooring. CIS 1st floor, Wednesday, 6/1, 1800-2400, carpets and hard flooring (includes SNF office space and hallways). CISX 2nd and 3th floors, Thursday, 6/2, 1800-2400, carpets and hard flooring. CISX 1st and basement floors, Friday, 6/3, 1800-2400, carpets and hard flooring. To maximize to benefit of this annual event and to protect your belongings, please remove boxes, papers, and other personal objects from the floor for these evenings. The janitorial staff will be using motorized maintenance equipment, detergents, and liquid polish chemicals. The carpets may be slightly damp in the morning. Thanks for your patience, Dick -------------- next part -------------- An HTML attachment was scrubbed... URL: