hot plate vs. oven

[SangBum Kim]

Dear labmembers,

 

 Just out of curiosity, how are the hot plate and oven different for the
postbake process after development?
http://snf.stanford.edu/Process/Lithography/3612.html says 1 minute on the
hot plate and 25 minutes in the oven will work the same. Why can we use much
shorter time for the hot plate? When I tried to use 3612 as a wet etch mask
in 20:1 BOE, 25 minute oven baked sample worked better than 1 minute hot
plate baked sample.

 

Thanks,

SangBum

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