From mbaran at stanford.edu Thu Sep 1 11:26:24 2005 From: mbaran at stanford.edu (Maureen Baran) Date: Thu, 1 Sep 2005 11:26:24 -0700 Subject: Lost and Found Items in the Lab Message-ID: <200509011826.j81IQPk4010648@smtp1.Stanford.EDU> I have some items at my desk that were found in the lab. 2 silver loop earrings (different sizes) 1 necklace 1 pair of prescription silver framed glasses. If you are missing any of these items, please come by my desk (cubicle 41) and claim them. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at snf.stanford.edu Fri Sep 2 06:09:32 2005 From: shott at snf.stanford.edu (John Shott) Date: Fri, 02 Sep 2005 06:09:32 -0700 Subject: Card key access problems ... Message-ID: <43184F0C.50306@snf.stanford.edu> CIS Building Residents and SNF Lab Members: As a number of you are likely painfully aware, we appear to be experiencing some sort of failure that doesn't unlock the exit doors to this building when presented with a valid access card. As a result, a number of you tried, but failed, to gain access to the exit doors last night. Looking back through database records, this seems to have begun on 9/1/2005 at 00:00:00 ... unfortunately, I was not aware of this problem until this morning but have filed an urgent problem report with the university office that maitains and supports this system. Hopefully they will get this resolved quickly. While we don't have direct control over this system, e-mail sent to either labmembers at snf or maybe cis-building at cis may alert someone who can contact the cardkey people at the earliest possible time to resolve this sort of problem. We apologize for this inconvenience. In general, the cardkey access system has been quite reliable and we will be working with the people responsible for the system to understand what has failed in an attempt to insure that we don't have this problem in the future. Thanks, John shott at stanford.edu From mtang at snf.stanford.edu Fri Sep 2 07:11:33 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Fri, 02 Sep 2005 07:11:33 -0700 Subject: SNF Survey Message-ID: <43185D95.5040907@snf.stanford.edu> Greetings labmembers! Could you please take a few minutes to complete an on-line survey for SNF? This would really be helpful for us to gage how we are doing and plan for the future. Your honest, constructive opinions would be much appreciated. A summary of the survey results will be posted in a few weeks. To get to the survey, please follow this link: http://www.surveymonkey.com/s.asp?u=22761269462 Thanks for your time -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From luckyyrl at gmail.com Fri Sep 2 12:34:29 2005 From: luckyyrl at gmail.com (Yuerui Lu) Date: Fri, 2 Sep 2005 12:34:29 -0700 Subject: a question about TiN and TaN and conductive oxide Message-ID: <9dc2cbc050902123479a63ad0@mail.gmail.com> Dear labmembers, Does anybody know any place or any company, which provides TiN or TaN deposition? How about conductive oxide deposition, such as ZnO? Thanks a lot. Sincerely, YR From s_harshal at yahoo.com Mon Sep 5 20:00:59 2005 From: s_harshal at yahoo.com (Harshal Surangalikar) Date: Mon, 5 Sep 2005 20:00:59 -0700 (PDT) Subject: 4% PSG dep rate. Message-ID: <20050906030059.62142.qmail@web30513.mail.mud.yahoo.com> hello all, i wanted to know if anybody has used / uses 4% doped PSG at tylanbpsg and knows the dep rate for 4% PSG. if yes, can you please let me know. many thanks, harshal. From luckyyrl at gmail.com Tue Sep 6 00:57:01 2005 From: luckyyrl at gmail.com (Yuerui Lu) Date: Tue, 6 Sep 2005 00:57:01 -0700 Subject: question about PZT target ordering Message-ID: <9dc2cbc0509060057179e6bc5@mail.gmail.com> Dear all, Does anybody know any information where to order PbTiO3 (or PZT) sputtering target? Thanks a lot. Sincerely, YR From aecohen at stanford.edu Tue Sep 6 07:36:47 2005 From: aecohen at stanford.edu (Adam E. Cohen) Date: Tue, 6 Sep 2005 07:36:47 -0700 Subject: working with fused silica Message-ID: <1126017407.431da97f6a5f7@webmail.stanford.edu> Hi All, Does anybody know if it is possible to use SU 8 as an etch-mask for HF on fused silica? More generally, if anybody has been making microstructures out of fused silica, I'd love to get in touch to compare notes. Thanks in advance! Adam -- Adam Cohen www.stanford.edu/~aecohen 646-258-9068 From lscjblue at yahoo.com Tue Sep 6 08:26:44 2005 From: lscjblue at yahoo.com (Ping Zhang) Date: Tue, 6 Sep 2005 10:26:44 -0500 Subject: working with fused silica Message-ID: Hello Adam E. Cohen, Normally BOE won't attack PR or hard cured polymer or polyimide. If you plan to use 49%HF,it may strip off SU8. You probably would like to try it on a Si wafer first to see if it will work or not. Best regards, Ping ======= At 2005-09-06, 09:36:47 you wrote: ======= >Hi All, > Does anybody know if it is possible to use SU 8 as an etch-mask for HF >on fused silica? More generally, if anybody has been making >microstructures out of fused silica, I'd love to get in touch to compare >notes. Thanks in advance! > >Adam > >-- >Adam Cohen >www.stanford.edu/~aecohen >646-258-9068 > > From jazz9152 at slac.stanford.edu Wed Sep 7 12:43:43 2005 From: jazz9152 at slac.stanford.edu (Jasmine Hasi) Date: Wed, 7 Sep 2005 12:43:43 -0700 (PDT) Subject: Bake sale for Katrina victims Message-ID: Hi Everyone, As many of you knew, I was collecting money for the victims of Katrina yesterday and I wanted to say a very big thank you for everyone who donated and gave me alot support. We made an impressive total of $260.34, which I will forward onto the American Red Cross. I couldn't have done it without all your kind donations. Thanks again, Jasmine From s_harshal at yahoo.com Wed Sep 7 21:33:15 2005 From: s_harshal at yahoo.com (Harshal Surangalikar) Date: Wed, 7 Sep 2005 21:33:15 -0700 (PDT) Subject: PSG deposition problems. Message-ID: <20050908043315.22531.qmail@web30513.mail.mud.yahoo.com> hello all, i wanted to know if anyone has had a problem with deposition in the Tylanbpsg furnace lately. i have been using PSG400 recipe to put down a 2 um layer. but yesterday as i was trying to put down the layer in two parts (for better uniformity), the furnace failed the leak check on every occassion and i had to re-run the process. also the process pressure was unusually high (~610)and that has affected the dep rate. i wanted to know if anybody has had similar problems and the dep rates that they observed. i observed dep rates of 180 A/min for both 8% and 4% PSG (which is odd), down from ~240 A/min i have measured earlier for 8% PSG. also, after the release etch/removal of the PSG layers lately, i am seeing a dirty carbon/soot residue at the site of PSG layer. as i am trying to understand why this layer is seen, i wanted to know if anybody is having similar "contamination" issues with regards to etch chemicals used, or a bad furnace run where hydrocarbon contamination could have caused a contaminated PSG layer to be deposited. contamination can also be caused while cleaning and wafer handling on my part, but as i try to eliminate the possible reasons, i would like to check if similar observations have been made. thank you and any and all inputs will be very helpful. best, harshal. From rcrane at snf.stanford.edu Thu Sep 8 07:23:52 2005 From: rcrane at snf.stanford.edu (Dick Crane) Date: Thu, 08 Sep 2005 07:23:52 -0700 Subject: Room air problem Message-ID: <43204978.5090808@snf.stanford.edu> Lab users, An air transfer fan lost a bearing last night and is being replaced this morning. This work will shutoff the recirculating air in rooms L108 and L109 (the measurement room and the metalica and STSetch aisles). Temperature control will be lost in this area. The work should be completed by 1000 this morning, Thursday, 9/8/05. Thanks for your patience, Dick From rissman at stanford.edu Thu Sep 8 12:24:09 2005 From: rissman at stanford.edu (Paul Rissman) Date: Thu, 08 Sep 2005 12:24:09 -0700 Subject: Welcome Cam Chan Message-ID: <6.2.1.2.2.20050908122359.02d857f8@rissman.pobox.stanford.edu> Please welcome Cam Chan as the new lab finance and administration service manager of SNF. Cam comes to us after 2 years at the Center for International Security and Cooperation, and 9 months at the Volunteers in Asia organization which works through the Haas Center. Cam also worked at the Gap, Inc as a project manager and business analyst. Prior to that Cam worked for the Scient Corporation and as a commercial specialist at the US Embassy in Bejing. Cam holds a BA degree in economics from UC San Diego. Cam is sitting in the office next to mine, CIS130. Her e-mail is camchan at stanford.edu and she can be reached at extension 4-2909. If you have a chance, please stop by and introduce yourself to Cam. Paul Rissman P.S. If I have missed someone on the distribution please forward this message on. From mtang at snf.stanford.edu Thu Sep 8 18:17:43 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 8 Sep 2005 18:17:43 -0700 (PDT) Subject: Fall course at ME: Applied electrochemistry at micro and nano scale (fwd) Message-ID: Labmembers -- Here's an announcement for a course, being taught by fellow labmember, Rainer Fasching! If you have any interest in electrochemistry, particularly if you have any interest in biosensors, this is for you (the classes I sat in on last year were simply amazing...) Mary -------------- next part -------------- Hi Mary, could you do me a favor and announce my class to the SNF community. Attached is the course syllabus. Thank you -Rainer --------------------------------------------------- Rainer Fasching, Ph.D Act. Associate Professor Design and Mechanical Engineering Stanford University T 650-723-1301 F 650-723-5034 rfasch at stanford.edu www-rpl.stanford.edu (RPL-Biology) -------------------------------------------------- PS: I think your proposal is very interesting... Applied Electrochemistry at Micro- and Nanoscale, ME420 (3 units) The class is an introduction to applied electrochemistry with focus on micro- and nano scale applications. Basic concepts of physical chemistry are presented, of which the fundamentals of electrochemistry are built. Theory of electrochemical methods for material analyses and modifications are discussed with emphasis on the scaling behaviors. Electrochemical devices such as sensors, actuators, and electrochemical-probes for scanning microscopes as well their miniaturization concepts are discussed in class. Project proposals are developed within the framework of the course with focus on current problems and needs in biology, material science, micro-fabrication and energy conversion. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Syllabus-Fall2005-ME420.pdf Type: application/pdf Size: 22816 bytes Desc: URL: From bwacker at sbcglobal.net Fri Sep 9 17:21:01 2005 From: bwacker at sbcglobal.net (Barbara Wacker) Date: Fri, 9 Sep 2005 17:21:01 -0700 (PDT) Subject: Quartz wafers Message-ID: <20050910002101.64169.qmail@web81307.mail.yahoo.com> Hello all, I would like to purchase some std thickness quartz wafers 6" diameter. Please let me know if you heard about a vendor selling quartz wafers. Thanks a lot, Barbara From mtang at snf.stanford.edu Mon Sep 12 08:42:19 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Mon, 12 Sep 2005 08:42:19 -0700 Subject: Special SNF Workshop: "Prototype to Product" Message-ID: <4325A1DB.8040403@snf.stanford.edu> Greeting Labmembers! SNF is pleased to host a one-day workshop, entitled "Prototype to Product", to be held here on Thursday, Oct. 20. This workshop is free to SNF labmembers and members of the Stanford/SLAC community (students, staff, and faculty). For more information, see: http://snf.stanford.edu/Labmembers/P2PDay.html As you probably know, many SNF labmembers, academic as well as industrial, have successfully turned their research devices into real products (for example, Matrix, T-RAM, and many others.) However, as will be discussed in this workshop, there's a lot of work involved in turning what's in your lab notebook into a production-worthy process. Among the questions to be covered: *How much is this all going to cost? *What is involved in tech transfer? (Who has intellectual property rights? What about co-licensing or co-development?) *How mature should: 1. the prototype be? 2. the business model be? (Do you need money in hand?) *What are the most important & deciding technology issues? -Wafer size? -MEMS versus IC equipment? -Compatibility of specialized equipment or processes? -Contamination? We'll hear from companies who serve as manufacturing partners, as well as former labmembers who have undergone this process. Again, this workshop is free to labmembers and Stanford members -- but space is limited, so preregistration is encouraged. Hope to see you there! Your SNF staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at snf.stanford.edu Mon Sep 12 08:58:00 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Mon, 12 Sep 2005 08:58:00 -0700 Subject: CNF/NNIN Workshop: Modeling the Nanoscale World Message-ID: <4325A588.8080008@snf.stanford.edu> Hello labmembers! We'd like to draw your attention to another workshop, this one sponsored by the Cornell Nano Facility/NNIN entitled "Modeling the Nanoscale World." This is a three-day workshop on computational methods for elucidating nanoscale phenomena and features speakers from several NNIN sites (including Zhiyong Zhang from Stanford). The workshop will be held at Cornell, October 10-12. For more information, check out the website at: http://www.cnf.cornell.edu/cnf_2005fallworkshop.html Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From sunaeseo at stanford.edu Sun Sep 11 22:06:55 2005 From: sunaeseo at stanford.edu (sunaeseo) Date: Mon, 12 Sep 2005 14:06:55 +0900 Subject: SOG In-Reply-To: <4325A588.8080008@snf.stanford.edu> Message-ID: <200509122107.j8CL7NYA013428@smtp-roam.Stanford.EDU> Hello! everyone. I want to use SOG for Boron doping. I found some company in web but I don't have any exprience about SOG. If you have company to recommend, please let me know. Thank you so much. ============================================================= SUNAE SEO. PH.D CIS #105, 420 Via Palou Stanford University Stanford CA 94305-4070 sunaeseo at stanford.edu Mobile: 1-650-704-4313 Work : 1-650-725-5725 ============================================================== From nishiy at stanford.edu Mon Sep 12 21:01:30 2005 From: nishiy at stanford.edu (Yoshio Nishi) Date: Mon, 12 Sep 2005 21:01:30 -0700 Subject: SNF Ethics in Nanotechnology Survey Message-ID: <4AA12F8337194842A6F00D387813AF1E033B85D5@ehost011-7.exch011.intermedia.net> Dear Member of the SNF and NNIN Community: Science and technology's impacts on society can be seen and felt all around us. This creates a strong social and ethical context for the research activities that we pursue. Nanotechnology, which is a major focus of the activities of SNF/NNIN users, may raise a number of social and ethical issues and has been the subject of much discussion in the media and in the professional literature. Prof. Robert McGinn at Stanford, who is a member of the NNIN team, is conducting a very important study to explore what we in the NNIN community believe about ethical issues related to nanotechnology. The survey is completely confidential, does not identify individuals, and the results will be made available to any of you who are interested. I strongly encourage you to complete this "ethics and nanotechnology" survey. It is important that NNIN take nanotechnology-related social and ethical issues seriously and this survey is one way that we are doing so. To access the survey please go to http://www.surveymonkey.com/s.asp?u=464221235656 and use the password nnin2005. I ask that you help us to develop solid knowledge about this topic. The survey will take about 20 minutes to complete. Thanks for your help with this valuable project. Sincerely, Prof. Yoshio Nishi SNF Director -------------- next part -------------- An HTML attachment was scrubbed... URL: From xfan at ucsc.edu Mon Sep 12 17:20:29 2005 From: xfan at ucsc.edu (Xiaojuan Fan) Date: Mon, 12 Sep 2005 17:20:29 -0700 Subject: Mask for evaporating electrodes Message-ID: Hi, I am wondering if you have comb-type electrode mask that I can borrow for making gold electrodes on Si wafer in e-beam evaporator? The interval between comb fingers ranging from micron to milimeters would be great. Thank you! Judy From mahnaz at snf.stanford.edu Wed Sep 14 10:52:51 2005 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Wed, 14 Sep 2005 10:52:51 -0700 Subject: 7" blanket mask Message-ID: <43286373.3080409@snf.stanford.edu> Hello all, I am in desperate need of a 7" blanket mask. Does anybody out there have one that I could borrow it for few hours? mahnaz From aeonia at stanford.edu Thu Sep 15 11:36:34 2005 From: aeonia at stanford.edu (Hyeun-Su Kim) Date: Thu, 15 Sep 2005 11:36:34 -0700 Subject: Cu plating vendors? Message-ID: <001201c5ba24$66a02f10$142642ab@interposer> Dear Lab members, I am trying to plate copper onto 2um and 10um thick cantilevers. Does anybody know any reliable plating vendor who deals with MEMS structures? Thank you very much. Hyeun-su -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at snf.stanford.edu Thu Sep 15 16:04:08 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 15 Sep 2005 16:04:08 -0700 Subject: Free stuff! Message-ID: <4329FDE8.2060007@snf.stanford.edu> Sorry labmembers, Maybe I fibbed... (like, would you read this email otherwise?) But I am not lying when I say that "we NEED your feedback!" and may very well continue to pester you until we do... In all seriousness, please help us by sharing your views with us. We ask (beg!) you to take some time to fill out two survey forms. The SNF Survey Form is designed to get your input on what you think about our lab and how we can make it better. Your feedback will be helpful in determining where our priorities are, for now and the future. Your inputs will be summarized and posted, sometime in early October. Who knows -- maybe some action items will come from this (imagine: your vote matters!) The Ethics and Nanotechnology Survey is key to an effort to build the NNIN program in this new area -- think about it: will your research lead to the next technical revolution? Will it have the legacy of penicillin or asbestos? Will it improve national security or will destroy privacy? Or, closer to home, what do you think and what do you do when you see someone cheating in the lab? These questions and more in the SEI survey . As for free stuff -- yes, actually there is free stuff. If you fill out these surveys, you are eligible for either: 1. an authentic, Stanford red, retractable SNF ball point pen; 2. a nifty clip-on SNF calculator (in Stanford red, of course.) So please, do a favor for the labmember community and fill out these surveys (and then drop to pick up your freebie.) Thanks, Mary * *-- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From wistey at snowmass.Stanford.EDU Sat Sep 17 14:09:39 2005 From: wistey at snowmass.Stanford.EDU (Mark Wistey) Date: Sat, 17 Sep 2005 14:09:39 -0700 (PDT) Subject: 1165 empty Message-ID: <200509172109.OAA19634@snowmass.Stanford.EDU> Sorry for the spam, but does anyone know where we can get any more 1165 stripper this weekend? The only bottle I found was empty. - Mark From shott at snf.stanford.edu Sun Sep 18 08:06:35 2005 From: shott at snf.stanford.edu (John Shott) Date: Sun, 18 Sep 2005 08:06:35 -0700 Subject: 1165 empty In-Reply-To: <200509172109.OAA19634@snowmass.Stanford.EDU> References: <200509172109.OAA19634@snowmass.Stanford.EDU> Message-ID: <432D827B.6020307@snf.stanford.edu> Mark: I placed a new bottle of 1165 resist stripper in the rightmost yellow cabinet. We apologize for the shortage ... John From shiwei20012002 at yahoo.com Sun Sep 18 11:13:10 2005 From: shiwei20012002 at yahoo.com (Wei Shi) Date: Sun, 18 Sep 2005 11:13:10 -0700 (PDT) Subject: thick indium plating vender Message-ID: <20050918181310.26871.qmail@web33305.mail.mud.yahoo.com> dear all, I want to find a vender that can plate 50-100um thick indium with good surface roughness (no matter what plating method). I appreciate if you could provide any information. Thanks, Wei --------------------------------- Yahoo! for Good Click here to donate to the Hurricane Katrina relief effort. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mcvittie at snf.stanford.edu Mon Sep 19 10:23:49 2005 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Mon, 19 Sep 2005 10:23:49 -0700 Subject: PEUG/TFGU 2005 Annual Symposium Message-ID: <432EF425.3C71202F@snf.stanford.edu> The local AVS plasma etch and thin film users groups are having a one day symposium on Oct 4th in San Jose. It is a good meeting to attend if you want to get an overview of state-of-the-art patterning tranfer and thin film technologies applied to advanced electronic devices. On Oct. 5th there will be a follow on symposium on CMP. The early registration fee ($175) ends on Friday Sept. 23. After the 23th the fee goes to $250. Registration and symposium details are available at www.avsusergroups.org. The symposium program is below. Thanks, Jim PEUG/TFGU 2005 Annual Symposium--Tuesday, October 4, 2005 DoubleTree Hotel, San Jose, CA REGISTER NOW -- www.avsusergroups.org 7:30 Registration 8:00 Introduction by PEUG and TFUG Chairs ; Jim McVittie and Huey-Chiang Liou Session I: Front End--Printing Patterning--Plasma Etch Session Co-Chair: Jim McVittie, Stanford 8:10 Keynote: "Process Challenges for Advanced FETs", Prof Tsu-Jae King, UC Berkeley 8:50 "Ge and III-V Device Research for CMOS", Wilman Tsai, Intel 9:20 "Advanced Photoresist Issues", Mark Slezak, JSR Micro 9:50 Break Session Co-Chair: Brett Cruden, NASA 10:10 "Pattern Transfer Integration", Arpan Mahorowala, IBM 10:40 "The Use of Pattern Transfer Layers for Advanced Processing", Calvin Gabriel, S. Bell, A. Agarwal, H. Tokuno and L. You, AMD 11:10 "Why We Need High Frequency Capacitive Coupling Plasma for Process", Dan Hoffman, S. Shannon, K. Bera, AMAT 11:40 ?In Situ Real-Time Monitoring of Evaporation Induced Self-Asssembly of Mesoporous Low-Dielectric-Constant SiO2 and Its Profile Evolution During Plasma Etching?, Prof. Sang Han, University of New Mexico 12:10 Lunch Session II: Low-k --- ;Nanotechnology --- Reliability Session Co-Chair: Huey-Chiang Liou, Intel 1:10 " Plasma Etch Polymer: When Good Polymer Goes Bad? Jeff Shields, O. del Carpio, J. Foster, AMD/Spansion C. Gabriel, AMD 1:40 "Molecular Caulk: EnablingAspects for Ultra-Low k Dielectric Integration at 45nm", Jay Senkevich, B.P Carrow, B.W. Woods. Brewer Science D-L Bae, T.S. Cale, Rensselaer 2:10 "Aurora Low-k Integration with Advanced ALD Barrier", Devendra Kumar, ASM 2:40 Break Session Co-Chair: Mira Ben-Tsur, Cypress 3:00 Keynote: "Nanotechnology for Microelectronics", Meyya Meyyappan, NASA 3:40 "Nano-imprinting Technology", Wei Wu, HP 4:10 ?Advanced Back End Integration Issues?, Roey Shaviv, A. Bayman, T. Mountsier, W. Wu, K. Chattopadhyay, B. van Schravendijk, G. Alers, G. Dixit and R. Havemann, Nevellus Systems 4:40 "Computational Modeling of Process Induced Damage During Back End of Line Wafer Processing", Shahid Rauf, Freescale From bwacker at sbcglobal.net Tue Sep 20 09:38:05 2005 From: bwacker at sbcglobal.net (Barbara Wacker) Date: Tue, 20 Sep 2005 09:38:05 -0700 (PDT) Subject: Thin silicon wafers Message-ID: <20050920163805.85544.qmail@web81310.mail.yahoo.com> Dear Lab Members, I would like to purchase thin silicon wafers 75 to 100um thick. If you have a source, please let me know. Thanks a lot! Barbara From ben.jian at arrayedfiberoptics.com Tue Sep 20 11:20:37 2005 From: ben.jian at arrayedfiberoptics.com (Ben Jian) Date: Tue, 20 Sep 2005 11:20:37 -0700 Subject: Can anyone sell us some thick silicon double-side polished wafers? In-Reply-To: <20050920163805.85544.qmail@web81310.mail.yahoo.com> Message-ID: <009e01c5be10$0043e190$0301a8c0@laptop> Hi, We need some thick silicon (100) wafer with double side polish and a thickness of 750um to 1000um. Any help will be appreciated. Regards. Ben Jian, PhD Arrayed Fiberoptics Corp. Phone: (510) 449-6510 Fax: (408) 228-8772 From mtang at snf.stanford.edu Wed Sep 21 10:31:12 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 21 Sep 2005 10:31:12 -0700 Subject: Free stuff still available! (Or surveys, surveys, surveys!) Message-ID: <433198E0.90601@snf.stanford.edu> Hello labmembers! We've still got lots of lovely, Stanford cardinal red pens! We've still got lots of nifty, Stanford-red, official SNF clip-on calculators! (OK, they're cheesy -- but also really handy to have, especially in the lab -- if only so you don't have to go rummaging in your labmate's bin.) All you have to do is to fill out a couple of surveys. Not only will you have earned a couple of handy items, but you will have done your share to help SNF and the NNIN. The SNF Labmember survey can be found at (needs your Coral login to verify): http://www.surveymonkey.com/s.asp?u=22761269462 The NNIN Ethics survey can be found at(requires a password, which is: nnin2005) http://www.surveymonkey.com/s.asp?u=464221235656 We've gotten a lot of good and interesting feedback on the SNF survey so far (and I'm sure there's lots of good stuff on the Ethics survey as well). For example, running neck-and-neck for the leading tool on the "replace or improve equipment" list are the Wafersaw (#1 by a hair) and the Ebeam (?) And so far, on the "new capability" list is: improved multifilm stack metrology (!) (Do you agree? Well, let us know!) And we're also getting a lot of really insightful (and soul-searching) comments about our lab today, our main challenges, and problems for the future. So please, if you haven't done so already, let us know what you think! (And once you do, come by and pick up your free stuff!) Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From ahazeghi at stanford.edu Thu Sep 22 13:47:16 2005 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Thu, 22 Sep 2005 13:47:16 -0700 Subject: W etch Message-ID: <947219ab428b43e0813e707ab33b5442@stanford.edu> Hi, I have a wafer with thick "~1um" CVD Tungsten and standard resist on, I want to etch Tungsten all the way to oxide with good selectivity and later measure the thickness, what is the best method to do this? Thanks Arash From amf at amfitzgerald.com Sun Sep 25 16:32:24 2005 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Sun, 25 Sep 2005 16:32:24 -0700 Subject: SNF User's Meeting - this Friday Sept 30, 4-5pm, CIS 101 Message-ID: Hello Labmembers, *NOTE different day and place!* There will be a SNF user's meeting on Friday, September 30th, from 4-5 pm, in CIS 101. All are welcome to attend. If you haven't already filled out the SNF User's survey, please do so - the lab needs your candid input! http://www.surveymonkey.com/s.asp?u=22761269462 Agenda - Summary of Sept Advisory Committee meeting - New fee structure for Industrial users working on SBIR grants - Annual fee increases of 3.5% to become standard - Equipment status update - Equipment wish list - Problems/concerns/suggestions **Mark your calendars for October 20th, a special one day event at the SNF: "From Prototype to Product" http://snf.stanford.edu/Labmembers/P2PDay.html Hope to see you there! Regards, Alissa Fitzgerald Alissa M. Fitzgerald, Ph.D. A.M. Fitzgerald & Associates, LLC Technical Consulting Services MEMS | Materials | Sensor Systems 655 Skyway Suite 118 San Carlos, CA 94070 (650) 592-6100 tel/fax www.amfitzgerald.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From sroonter at stanford.edu Sun Sep 25 22:29:10 2005 From: sroonter at stanford.edu (Saeroonter Oh) Date: Sun, 25 Sep 2005 22:29:10 -0700 Subject: where to get (110) Si wafers Message-ID: <1127712550.433787269c520@webmail.stanford.edu> Hello, I need some Si wafers with (110) crystal orientaion. They aren't available in the stockroom. Can anyone tell me a good place to buy them? Thank you so much. Saeroonter From zhiliu at stanford.edu Sun Sep 25 22:32:02 2005 From: zhiliu at stanford.edu (zhi liu) Date: Sun, 25 Sep 2005 22:32:02 -0700 Subject: FW: Tuesday Sept. 27th IEEE MEMS event at CISX Message-ID: <200509260532.j8Q5W1TD171452@pimout5-ext.prodigy.net> --------------------------------------------------------- IEEE WIE and the Nanotech Council present MEMS Micro Electro Mechanical Systems Guest speakers: Alissa Fitzgerald, Ph.D., & Anthony Flannery, Ph. D. This unique talk will cover the following: * A gentle introduction to MEMS (MEMS primer for those new to the field) * An in depth talk about a specific MEMS application: Large-scale Integrated Mirror Array for Optical Communications Driven by the dot-com era need for communications bandwidth, Micro-Optical Electrical Mechanical Systems (MOEMS) promised new advantages for telecommunication companies. While market conditions caused many of the ventures in this area to fall short of investor expectations, many new advances were made in the area of MEMS fabrication and design during the optical MEMS bubble. Presented here is the large-scale integration of electronics with MOEMS mirrors. A novel design was conceived in which integrated electronics driving 1200 mirrors dissipate only 2W, or under 400 ?W for each electrode. The process includes a novel bulk micromachining process and electronic integration through wafer bonding. When: September 27, 2005 6: 00 to 8:30 PM Donation: This event is FREE. You do not need to be a member to attend. Donations are welcome to help cover refreshment costs. Please RSVP to k.chin at ieee.org. Agenda: 6:00-6:30 pm networking and refreshments 6:30-7:15 pm Intro/Prime! r on MEMS, Alissa Fitzgerald of A. M. Fitzgerald & Associates 7:30-8:15 pm Large-scale Integrated Mirror Array for Optical Communications, Anthony Flannery of Invensense Where: Stanford University's CISX Auditorium (Center for Integrated Systems Extension) Directions at: http://www-cis.stanford.edu/misc/directions.html About the speakers: Anthony F. Flannery Jr. Mr. Flannery received his B.A. in chemistry from Princeton University. He received his MSEE at Stanford University. At Stanford his research focused on the development of PECVD silicon carbide for environmentally hardened chemical and pressure sensors. Other significant accomplishments include the use of dry film lithography for non-planar substrates, stress control in deposited films. and laser ablation for patte! ! rning on MEMS substrates. In June of 2003 he joined the founding team of Invensense. Invensense successfully raised $8 million in April of 2004. As Director of Development, he was co-inventor of a novel silicon bulk micromachining process which included a hermetic seal achieved by wafer bonding with a custom ASIC. Prior to Invensense, he was with Transparent Networks where he managed the successful development of the world?s largest integrated mirror array for optical communications. Alissa Fitzgerald As the founder of A. M. Fitzgerald & Associates, Alissa Fitzgerald provides technical consulting services to clients ranging from one-person start-ups to companies in the Fortune 500. Her areas of expertise include mechanical design and analysis for advanced applications; sensor systems; MEMS design and fabrication; materials science; and reliability testing. She has worked on projects as diverse as MEMS sensors for spacecraft and medical applications, condition-based maintenance systems for military helicopters, and the study of hot electron injection into PECVD dielectrics. She has been employed by the Jet Propulsion Laboratory, Orbital Sciences Corporation, Signal Processing Associates, and Sensant Corporation. Dr. Fitzgerald received her bachelor and master degrees from the Massachusetts Institute of Technology and her doctorate from Stanford University. Dr. Fitzgerald has numerous journal publications and holds two patents. She is a member of the American Society of Mechanical Engineers and the Materials Research Society and has been a reviewer for the Journal of MicroElectroMechanical Systems, Sensors & Actuators: A, and the Materials Research Society Symposium Proceedings. For more info see website at: http://ewh.ieee.org/r6/scv/wie/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IEEE WIE MEMS.doc Type: application/msword Size: 38400 bytes Desc: not available URL: From ankurjn at stanford.edu Mon Sep 26 16:31:57 2005 From: ankurjn at stanford.edu (Ankur Jain) Date: Mon, 26 Sep 2005 16:31:57 -0700 Subject: Ceramic package with a hole? Message-ID: <1127777517.433884ed6d3ae@webmail.stanford.edu> Hello everyone, I am interested in a ceramic package for a 13 mm by 13 mm silicon chip that has a hole on its floor where the chip sits, so that I can optically access both sides of the chip. The hole needs to be about 8 mm by 8 mm - the shape and size are flexible. If you have used such a product before, or know which companies I should contact, please let me know. I would appreciate any input for this issue. thanks, Ankur. From mtang at snf.stanford.edu Tue Sep 27 13:18:19 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 27 Sep 2005 13:18:19 -0700 Subject: Gowning Room Cleanup Message-ID: <4339A90B.6000303@snf.stanford.edu> Hi everyone -- It's time for bunnysuit clean up! And, as you may have noticed walking into the gowning room, we're trying something new this month.... If you would like to keep your bunnysuit and hanger for the month of October, please take one bright orange tyrap (available at the gowning room entrance) and tie it LOOSELY around the neck of your hanger. Please make sure it is visible. If you don't think you'll need your suit for October, don't do anything (although, if you could remove your own suit and hanger, it would save us the bother...) We're planning to go through the suits next Tuesday, so please have your bright orange tyrap (if you want to keep your suit) on your hanger by Monday, Oct. 3. Thanks! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From kapurp at stanford.edu Tue Sep 27 16:34:12 2005 From: kapurp at stanford.edu (Pawan Kapur) Date: Tue, 27 Sep 2005 16:34:12 -0700 Subject: TiN deposition Message-ID: <1127864052.4339d6f49b6b2@webmail.stanford.edu> Hello, We are looking to have TiN sputtered on 4 inch wafers. Would appreciate if someone can give us the contact info. for an outside vendor who can do this. THanks, Pawan From aeonia at stanford.edu Tue Sep 27 18:00:38 2005 From: aeonia at stanford.edu (Hyeun-Su Kim) Date: Tue, 27 Sep 2005 18:00:38 -0700 Subject: about PRs in the etch rate chart Message-ID: <200509280100.j8S10dLp018834@smtp2.Stanford.EDU> Dear Lab members, Is anybody familiar with photoresist name OCG 820 or Olin Hnt? I found these names from etch rate chart http://snf/Process/WetProcessing/WetER2.pdf . I am looking for good masking material for the glass wafer etching with HF in wbgeneral. According to the chart, they seem to have zero etch rate in the HF; however, I can't find any vendor who deals with them. They may be discontinued or have different names now. Could you please share your valuable experiences about these PRs or any good masking material for HF? Thank you very much. hyeun-su (aeonia) -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at snf.stanford.edu Wed Sep 28 06:50:38 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Wed, 28 Sep 2005 06:50:38 -0700 Subject: about PRs in the etch rate chart In-Reply-To: <200509280100.j8S10dLp018834@smtp2.Stanford.EDU> References: <200509280100.j8S10dLp018834@smtp2.Stanford.EDU> Message-ID: <433A9FAE.3080204@snf.stanford.edu> Hi Hyeun-Su -- This is a generic photoresist which is no longer supplied, but is pretty comparable to the AZ3612 that we use now. The Olin Hunt and AZ3612 (and all the other standard resists) are sufficient for masking etch in BOE, but not for 49% HF -- resists will become holey and peel in 49% HF (I should add that the etch rate chart you have is from Berkeley -- it's quite correct, but some of the entries require some interpretation. The Olin Hunt is listed as "P", for peeling, and "0" for no measureable etch rate -- which I think really means that it could not really be measured, not that it doesn't etch.) If you are doing a shallow etch (few microns) and your geometries are larger (>10 microns), you could probably use 7 microns of SPR220, hardbaked for any hour or so at 150 C (please do NOT use the singe oven for this - use the BlueM or hotplate instead.) If you need a deeper etch or finer structures, you will need a hard mask. Most commonly used are Cr/Au (which can be deposited in metalica) or amorphous silicon (a better film, but you have to send this out for deposition -- we have some wafers in stock which may work for you -- ask me.) We've got process diagrams and etch rates which I hope to post some day when I get around to finishing them -- if you're interested, let me know and I'll forward what I've got to you. Good luck! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu Hyeun-Su Kim wrote: > Dear Lab members, > > Is anybody familiar with photoresist name OCG 820 or Olin Hnt? I found > these names from etch rate chart > http://snf/Process/WetProcessing/WetER2.pdf . I am looking for good > masking material for the glass wafer etching with HF in wbgeneral. > According to the chart, they seem to have zero etch rate in the HF; > however, I can ? t find any vendor who deals with them. They may be > discontinued or have different names now. Could you please share your > valuable experiences about these PRs or any good masking material for > HF? Thank you very much. > > hyeun-su (aeonia) > From mtang at snf.stanford.edu Thu Sep 29 10:02:58 2005 From: mtang at snf.stanford.edu (Mary Tang) Date: Thu, 29 Sep 2005 10:02:58 -0700 Subject: Surveys and free stuff! Message-ID: <433C1E42.6070200@snf.stanford.edu> Hi everyone -- We still have a few pens and calculators left (well, maybe more than a few...) The SNF lab survey closes today, so if you haven't filled it out already, this is your last chance! Just go to: http://www.surveymonkey.com/s.asp?u=22761269462 And there have been some truly interesting discussions resulting from the Ethics Survey -- and yes, interesting discussions about the survey itself. If you haven't done so already, find out for yourself why at: http://www.surveymonkey.com/s.asp?u=464221235656 (password: nnin2005) Enjoy! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From shott at snf.stanford.edu Thu Sep 29 17:10:20 2005 From: shott at snf.stanford.edu (John Shott) Date: Thu, 29 Sep 2005 17:10:20 -0700 Subject: Ethics survey reminder ... Message-ID: <433C826C.9040107@snf.stanford.edu> An HTML attachment was scrubbed... URL: From amf at amfitzgerald.com Fri Sep 30 13:33:08 2005 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Fri, 30 Sep 2005 13:33:08 -0700 Subject: Reminder! SNF User's Meeting TODAY Sept 30, 4-5pm, CIS 101 Message-ID: Hello Labmembers, There will be a SNF user's meeting today , September 30th, from 4-5 pm, in CIS 101. All are welcome to attend. If you haven't already filled out the SNF User's survey, please do so - the lab needs your candid input! http://www.surveymonkey.com/s.asp?u=22761269462 Agenda - Summary of Sept Advisory Committee meeting - Upcoming new fee structure for Industrial users working on SBIR grants - Annual fee increases of 3.5% to become standard - Equipment status update - Equipment wish list - Problems/concerns/suggestions **Mark your calendars for October 20th, a special one day event at the SNF: "From Prototype to Product" http://snf.stanford.edu/Labmembers/P2PDay.html Hope to see you there! Regards, Alissa Fitzgerald Alissa M. Fitzgerald, Ph.D. A.M. Fitzgerald & Associates, LLC Technical Consulting Services MEMS | Materials | Sensor Systems 655 Skyway Suite 118 San Carlos, CA 94070 (650) 592-6100 tel/fax www.amfitzgerald.com -------------- next part -------------- An HTML attachment was scrubbed... URL: