From amf at amfitzgerald.com Mon Apr 3 10:22:31 2006 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Mon, 3 Apr 2006 10:22:31 -0700 Subject: Upcoming event: "The New Equipment Makers: MEMS-Specific Tools" Thursday April 13th 7pm Message-ID: <000f01c65743$30d30940$6401a8c0@minicat> Dear Colleagues, Please see below for an event that might be of interest to you. Best regards, Alissa _____________________________________ The MIT Club of Northern California Semiconductor Entrepreneurship Series presents: The New Equipment Makers: MEMS-Specific Tools Date: April 13th, 2006 Thursday Event Time: 7pm (6:30 networking) Venue: Cooley Godward LLP - Hanover St. Campus Location: 3175 Hanover Street, Palo Alto [directions] Cost: $20 preregistration/$30 at the door (includes food/beverage) Online registration link: http://www.mitcnc.org/Events_Single.asp?eventID=1219 Contact: alissa.fitzgerald at alum.mit.edu Micromachining technology, used to produce MEMS, or micro-electro-mechanical systems, is an offspring of the IC industry. For over twenty years, engineers have been using and modifying IC-specific tools (often depreciated, older equipment cast off from mainstream production) to fabricate mechanical structures such as pressure sensors, accelerometers, display chips, and countless other sensors and MEMS devices. However, the 3D geometry of MEMS, and the desire to use non-standard materials and processes, have created a need for MEMS-specific tools. Deep silicon etch, wafer bonding, and sacrificial layer release are some of these new processes. The MEMS industry has finally grown to a point that it is now attracting new equipment makers, as well as established IC equipment makers, to develop tools specifically for MEMS production work. Join us for a panel discussion with a group of tool makers and their customers. Some questions to be discussed are: - What was the genesis and history of your process/tool? - How do you fund the development of a new piece of equipment? - What barriers do you face in educating the market about your tools? - How is selling tools to the MEMS industry different than to the IC industry? - Can your products crossover to IC fabs? Do you care? - Have your MEMS-specific tools enabled new capabilities for IC production? Was this anticipated? - Where are additional opportunities for entrepreneurs in the MEMS-specific tool industry? - What are the end applications that will drive the growth of both the MEMS industry and the MEMS equipment makers? Moderator: Joe Brown, Strategic Alliances, SiTime Corporation Joe Brown is the head of Strategic Alliances for SiTime, his third Silicon valley based start-up. He was formerly a Director of MEMS at SUSS MicroTec and Chairman of the International MEMS Steering Group for SEMI. Early on he identified the InChipMEMS as technology capable of removing the barriers to MEMS full commercialization. Joe Brown has more than 30 years of experience in the field of microelectronic technology with an emphasis on processing. His vision helped bring the founding team together. He held positions at IBM Research, TranSensory Devices (TDI), one of the first MEMS commercial start-ups, and NovaSensor, his second start-up venture. Panelists: Brian Folmer, Western Regional Sales Manager, SUSS MicroTec Brian J. Folmer is the Western Regional Sales Manager for SUSS MicroTec. His 21 plus years with SUSS have been spent working with MEMS and other SUSS customers of all sizes exclusively in the western U.S. With the broad MEMS-specific SUSS product portfolio, Brian has interacted extensively on the lithography and wafer bonding needs of not only MEMS start-ups, but also universities, and the larger semiconductor companies. Brian's career at SUSS reflects the growth of the MEMS industry and response of companies like SUSS that have targeted this market. Todd Smith, Surface Technology Systems Eelco Bergman, Consultant, formerly Senior Vice President, Amkor Technology Mr. Bergman is a 20+ year semiconductor industry veteran with extensive senior management and international business experience. Currently he is providing strategic marketing, business development and operations consulting services to several fabless semiconductor and semiconductor design companies. Prior to this Mr. Bergman spent fourteen years with Amkor Technology in a variety of sales, marketing, and business development management positions, most recently as the senior vice president of strategic marketing and business development. Prior to his career with Amkor he spent four years in manufacturing and operations management with Eurasem, BV in the Netherlands and four years in manufacturing engineering management positions with Micron Technology, Inc. in Boise, Idaho. Bert Bruggeman, Managing Director, Silicon Valley Technology Center, a division of Cypress Semiconductor Bert Bruggeman focuses on providing third party engineering groups access to its advanced semiconductor fab in San Jose, CA. SVTC positions itself as the bridge between the lab and the fab to enable the efficient development of novel silicon ideas from prototyping into real manufacturing. He holds an MSEE from the Catholic University of Leuven, Belgium and joined Cypress Semiconductor as a photolithography engineer from IMEC, Belgium in 1996. Since then, he has held various management positions in technology, operations and business management. He has authored and co-authored over 20 publications in the field of process development and semiconductor operations. -------------- next part -------------- An HTML attachment was scrubbed... URL: From aeonia at stanford.edu Mon Apr 3 14:39:11 2006 From: aeonia at stanford.edu (Hyeun-Su Kim) Date: Mon, 3 Apr 2006 14:39:11 -0700 Subject: One question about polyimide dryetch Message-ID: <200604032139.k33Ld5if012019@smtp1.Stanford.EDU> Dear Lab Members, I tried to etch away 15um fully cured photo-definable polyimide which was a sacrificial layer underneath Al structures. The polyimide was patterned as 500um by 100um block with 15um thickness and the aluminum structure was defined with 40um~100um width on top of the polyimide as like the following figure. I used drytek1 - O2 plasma with pressure 3000, flow 100 and 200mW of power (max powering the drytek1) - to etch the polyimide for 35hrs and it seems polyimide was not stripped away completely and left thin backbone under the aluminum as like the following figure. Is 40um~100um wide Aluminum too wide to expect the complete undercut underneath? Or Do I need more time to etch them all? It doesn't seem there is much difference between 20hrs and 35hrs etch when I see the polyimide residuals at the outside of aluminum (They never go away). Does this kind of thick polyimide always leave some residuals? Please give me any piece of advice if you have any experience on any polyimide. Thank you very much. Hyeun-Su (aeonia) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1127 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.gif Type: image/gif Size: 601 bytes Desc: not available URL: From bipin at stanford.edu Tue Apr 4 08:52:01 2006 From: bipin at stanford.edu (Bipin Rajendran) Date: Tue, 4 Apr 2006 08:52:01 -0700 Subject: Bipin Rajendran Ph.D. Orals Abstract Message-ID: <1144165921.4432962174eb3@webmail.stanford.edu> Bipin Rajendran Department of Electrical Engineering Advisor: Professor R. Fabian W. Pease CIS-X Auditorium Thursday, April 6, 2006. 10:00 AM (Refreshments served at 9:45 AM) Low Thermal Budget Processing for Sequential 3D IC Fabrication Recently, there has been great interest in developing three-dimensional (3D) integrated circuits (ICs) with multiple layers of transistors stacked one above the other. In this scheme, the active devices on different planes are separated by insulating layers (not more than a few microns thick) and are connected to each other by metal wires running vertically. Thus, it would be possible to increase the number of transistors per unit area and improve the overall circuit performance by reducing the average interconnect length. If the transistors at different levels are made sequentially on crystalline layers above existing circuitry, three-dimensional circuits with more than a million vertical wires per square millimeter could be fabricated. However, conventional high temperature processes such as dopant activation and gate oxidation would adversely affect the circuits at lower levels. Therefore, these steps have to be changed. Our new process sequence features pulsed laser annealing for dopant activation. The thermal transient behavior during laser annealing is studied by solving the light absorption and thermal diffusion equations. Calculations and experiments indicate that it is possible to use laser annealing to activate dopants at the upper levels of 3D ICs while maintaining the quality and reliability of circuits at lower levels. Low temperature deposition techniques are promising candidates for forming the gate dielectric layer of upper level transistors. In our process, low-pressure chemical vapor deposition (LPCVD) is used to form the silicon dioxide gate insulator at 450 ?C. Implanted dopants at the source/drain and the amorphous silicon gate are activated using 30 ns pulses from a KrF excimer laser (248 nm wavelength) delivering more than 10 MW/cm^2. Both n and p channel transistors exhibit on-off ratios in excess of 10^6, with drive currents and sub-threshold slopes similar to that of conventionally fabricated transistors. This process technology could be used to fabricate multiple levels of active devices in 3D ICs in a sequential manner. PS: Apologies to those who are receiving multiple copies of this announcement. From ndhuang at stanford.edu Tue Apr 4 18:01:57 2006 From: ndhuang at stanford.edu (Ningdong Huang) Date: Tue, 4 Apr 2006 18:01:57 -0700 Subject: Looking for a cassette of Si wafers lost in the clean room Message-ID: <1144198917.4433170591c95@webmail.stanford.edu> Dear labmates, Does anyone by any chance have seen a plastic cassette of Si wafers in the clean room with letters 'Nordlund' or 'Nilsson group' on the lid? The letters are either in blue or red. There are about ten wafers inside. We lost it last week in the yellow room. We are in a hurry to have these wafers back. Thanks a lot for your attention! Best, Ningdong -- Ningdong Huang, Graduate Student Applied Physics, Stanford University Stanford Synchrotron Radiation Laboratory 650-926-2345 From yamanaka at snowmass.stanford.edu Wed Apr 5 20:30:09 2006 From: yamanaka at snowmass.stanford.edu (Kazuhiko Yamanaka) Date: Wed, 05 Apr 2006 20:30:09 -0700 Subject: Looking for a quartz baker In-Reply-To: <1144198917.4433170591c95@webmail.stanford.edu> References: <1144198917.4433170591c95@webmail.stanford.edu> Message-ID: <20060405202949.33FA.YAMANAKA@snowmass.stanford.edu> Dear Labmembers, I need a quartz baker ASAP right now. Does anyone know where or which company I can buy it from? I know there are no quartz bakers in the biostore. Can I get it in the chemical store? Or does anyone give me that baker for a while. I will return a new one after I get it. Thanks for any information, Kazuhiko On Tue, 4 Apr 2006 18:01:57 -0700 Ningdong Huang wrote: NH> Dear labmates, NH> NH> Does anyone by any chance have seen a plastic cassette of Si wafers in the NH> clean room with letters 'Nordlund' or 'Nilsson group' on the lid? The NH> letters are either in blue or red. There are about ten wafers inside. We NH> lost it last week in the yellow room. We are in a hurry to have these wafers NH> back. Thanks a lot for your attention! NH> NH> NH> Best, NH> Ningdong NH> -- NH> Ningdong Huang, Graduate Student NH> Applied Physics, Stanford University NH> Stanford Synchrotron Radiation Laboratory NH> 650-926-2345 NH> NH> ------- Kazuhiko Yamanaka Harris Group, Solid State & Photonics Lab, Center for Integrated Systems, Stanford University CIS-X Rm 126X, Stanford, CA 94305-4075 Tel : (650)725-6909 Fax: (650)723-4659 E-mail : yamanaka at snowmass.stanford.edu From amf at amfitzgerald.com Wed Apr 5 21:49:27 2006 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Wed, 5 Apr 2006 21:49:27 -0700 Subject: Next SNF User's Meeting: Thurs 4/20, 5pm, CIS101 Message-ID: <008701c65935$7cdbdbc0$0300a8c0@minicat> Hello Labmembers, The next SNF Labuser's meeting will be Thursday 4/20 at 5pm in CIS101. This meeting is going to be a roundtable, technical discussion with a focused purpose - to develop a *proposal* for a very simple, pilot process monitoring program for the furnaces. (There are other tools that could use monitoring, but the informal consensus is that it's needed most urgently on the furnaces.) This is an issue that many of us care about, and we've had a lot of informal discussion on it, but now it's time for us to put our heads together and figure out how to do something about it. We will then bring our proposal to the staff, work together with them to finalize it, and then implement it. The agenda will be as follows: Discussion: - Which furnace(s) and recipe(s) should be monitored. - Best way to do monitoring given limited resources. We should converge on test criteria, testing interval, number of wafers, etc. - Division of labor Actions: - Draft up a strawman proposal to discuss (at a future time) with SNF mgmt. - Nominate a labuser volunteer to head up this effort: discussions w/staff, organize future meetings, etc. Regards, Alissa -------------- next part -------------- An HTML attachment was scrubbed... URL: From curlwang at stanford.edu Wed Apr 5 22:11:36 2006 From: curlwang at stanford.edu (Ke Wang) Date: Wed, 5 Apr 2006 22:11:36 -0700 (PDT) Subject: Looking for a quartz baker In-Reply-To: <20060405202949.33FA.YAMANAKA@snowmass.stanford.edu> Message-ID: Hey, do you mean quartz beaker? You might want to check with Uli. There are tons at the webgen bench, so she may know where to get them. Ke On Wed, 5 Apr 2006, Kazuhiko Yamanaka wrote: > Dear Labmembers, > > I need a quartz baker ASAP right now. > Does anyone know where or which company I can buy it from? > I know there are no quartz bakers in the biostore. > Can I get it in the chemical store? > > Or does anyone give me that baker for a while. I will return a new one > after I get it. > > Thanks for any information, > Kazuhiko > > On Tue, 4 Apr 2006 18:01:57 -0700 > Ningdong Huang wrote: > > NH> Dear labmates, > NH> > NH> Does anyone by any chance have seen a plastic cassette of Si wafers in the > NH> clean room with letters 'Nordlund' or 'Nilsson group' on the lid? The > NH> letters are either in blue or red. There are about ten wafers inside. We > NH> lost it last week in the yellow room. We are in a hurry to have these wafers > NH> back. Thanks a lot for your attention! > NH> > NH> > NH> Best, > NH> Ningdong > NH> -- > NH> Ningdong Huang, Graduate Student > NH> Applied Physics, Stanford University > NH> Stanford Synchrotron Radiation Laboratory > NH> 650-926-2345 > NH> > NH> > > ------- > Kazuhiko Yamanaka > Harris Group, Solid State & Photonics Lab, > Center for Integrated Systems, > Stanford University > CIS-X Rm 126X, > Stanford, CA 94305-4075 > Tel : (650)725-6909 > Fax: (650)723-4659 > E-mail : yamanaka at snowmass.stanford.edu > _____________________________________________ Ke Wang PHD Candidate Department of Applied Physics, Stanford University (O): (650)725-5774 From curlwang at stanford.edu Thu Apr 6 09:03:44 2006 From: curlwang at stanford.edu (Ke Wang) Date: Thu, 6 Apr 2006 09:03:44 -0700 (PDT) Subject: Correction: Looking for a quartz baker In-Reply-To: Message-ID: Sorry! I made a mistake in my email yesterday. I mixed up with the quartz beaker at the litho solvent bench for tweezer cleaning. The ones at webgen are glass beakers. Sorry for any confusion I may have caused. Ke On Wed, 5 Apr 2006, Ke Wang wrote: > Hey, do you mean quartz beaker? > You might want to check with Uli. There are tons at the webgen bench, so > she may know where to get them. > > Ke > > On Wed, 5 Apr 2006, Kazuhiko Yamanaka wrote: > > > Dear Labmembers, > > > > I need a quartz baker ASAP right now. > > Does anyone know where or which company I can buy it from? > > I know there are no quartz bakers in the biostore. > > Can I get it in the chemical store? > > > > Or does anyone give me that baker for a while. I will return a new one > > after I get it. > > > > Thanks for any information, > > Kazuhiko > > > > On Tue, 4 Apr 2006 18:01:57 -0700 > > Ningdong Huang wrote: > > > > NH> Dear labmates, > > NH> > > NH> Does anyone by any chance have seen a plastic cassette of Si wafers in the > > NH> clean room with letters 'Nordlund' or 'Nilsson group' on the lid? The > > NH> letters are either in blue or red. There are about ten wafers inside. We > > NH> lost it last week in the yellow room. We are in a hurry to have these wafers > > NH> back. Thanks a lot for your attention! > > NH> > > NH> > > NH> Best, > > NH> Ningdong > > NH> -- > > NH> Ningdong Huang, Graduate Student > > NH> Applied Physics, Stanford University > > NH> Stanford Synchrotron Radiation Laboratory > > NH> 650-926-2345 > > NH> > > NH> > > > > ------- > > Kazuhiko Yamanaka > > Harris Group, Solid State & Photonics Lab, > > Center for Integrated Systems, > > Stanford University > > CIS-X Rm 126X, > > Stanford, CA 94305-4075 > > Tel : (650)725-6909 > > Fax: (650)723-4659 > > E-mail : yamanaka at snowmass.stanford.edu > > > > _____________________________________________ > Ke Wang > PHD Candidate > Department of Applied Physics, Stanford University > > (O): (650)725-5774 > > _____________________________________________ Ke Wang PHD Candidate Department of Applied Physics, Stanford University (O): (650)725-5774 From rissman at stanford.edu Thu Apr 6 10:05:36 2006 From: rissman at stanford.edu (Paul Rissman) Date: Thu, 06 Apr 2006 10:05:36 -0700 Subject: FW: Deadline for Submissions: Lux Research Invites Innovative Companies to Present at Lux Executive Summit Message-ID: <6.2.5.6.2.20060406100432.0284e5d8@stanford.edu> >X-Sieve: CMU Sieve 2.2 >From: "Yoshio Nishi" >To: "'Paul Rissman'" >Subject: FW: Deadline for Submissions: Lux >Research Invites Innovative Companies to Present at Lux Executive Summit >Date: Thu, 6 Apr 2006 09:40:18 -0700 >X-Mailer: Microsoft Office Outlook, Build 11.0.6353 >Thread-Index: AcZZl++EMVP5pSZvQQWYqIrUztvNBgAAKEhg > >Hi Paul, >Just for our industrial users? information. Please forward. >Yoshio > > >---------- >From: Lux Research Inc. [mailto:Lux_Research_Inc. at mail.vresp.com] >Sent: Thursday, April 06, 2006 9:27 AM >To: nishi at snf.stanford.edu >Subject: Deadline for Submissions: Lux Research >Invites Innovative Companies to Present at Lux Executive Summit > > >[] > > > >DEADLINE FOR SUBMISSIONS: LUX RESEARCH INVITES >INNOVATIVE COMPANIES TO PRESENT AT LUX EXECUTIVE SUMMIT >Twelve Companies Will Be Chosen to Present New, >Innovative Technologies to Exclusive Audience > > >New York, NY ? April 6, 2006 ? Lux Research, the >world's leading nanotechnology research and >advisory firm, today announced that it is now >accepting submissions for the Lux Executive >Summit Showcase, a premier opportunity for >technology companies and innovators to present >at the company's 2006 Lux Executive Summit in Cambridge, Massachusetts. > >Now in its second year, the Lux Executive Summit >(www.luxexecutivesummit.com) >will be held on October 16-17, 2006 off Harvard >University's campus at the Charles Hotel. The >event, which draws more than 250 senior >technology and business executives, will feature >keynote, panel and breakout discussions on how >the commercialization of nanotechnology and >other emerging technologies will impact >industries and fuel economic growth. Lux >Research primarily supports large global >corporations that are evaluating emerging >technologies as growth strategies ? as >customers, partners, or investors. Last year?s >Lux Executive Summit featured more than 40 >representatives from corporations with greater >than $1 billion in annual revenues accountable >for making purchase, partnership, and/or >investment decisions in the field of nanotechnology. > >The Showcase is open to companies with >innovations in the following areas: Life >Sciences, Electronics, Semiconductors, >Telecommunications, Energy, Materials, and >Manufacturing. A total of 12 companies will be selected. > >Companies interested in participating at this >year?s Summit must contact Lux Research prior to May 31, 2006. > >"We expect more than 300 senior-level >decision-makers and investors to attend this >year's Lux Executive Summit. This year's >Showcase is an ideal way for a growing business >to present its offerings to nanotechnology's >best and brightest leaders, create and build >awareness, gain international exposure, develop >business opportunities, and attract investment," >said Lux Research's Vice President of Sales, Rob Burns. > >The Lux Executive Summit is nanotechnology?s >most exclusive event, featuring proprietary >content and insight drawn from the unparalleled >network and rigorous methodologies of Lux >Research?s analysts. The Lux Research team will >be joined onstage by more than 40 speakers >including emerging technology leaders from large >corporations, innovative start-ups, >forward-thinking investment management firms, >and the public sector. Capacity is limited at >this premier event. Additional details are >available online at >www.luxexecutivesummit.com > > >For additional information about participating >in the Lux Executive Summit Showcase, please >contact Lux Executive Summit Sales Director >Vincent Caprio at vcaprio at ontrackevents.com or (203) 733-1949. > >About Lux Research: >Lux Research is the world's leading >nanotechnology research and advisory firm. We >help our clients make better decisions to profit >from nanoscale science and technology, tapping >into our analysts' unique expertise and >unrivaled network. Our clients include top >decision makers at large corporations, portfolio >managers and analysts at leading financial >institutions, CEOs of the most innovative >start-ups, and visionary public policy makers. >To get connected and for more information, visit >www.luxresearchinc.com. >For Lux Executive Summit registration and >additional event details, please visit >www.luxexecutivesummit.com. > > > >---------- >If you no longer wish to receive these emails, >please reply to this message with "Unsubscribe" >in the subject line or simply click on the >following link: >Unsubscribe > >---------- >This message was sent by Lux Research Inc. using >VerticalResponse's >iBuilder? > >[] > >Lux Research Inc. >140 E. 45rd St., 30th Floor >New York, New York 10017 > >Read >the VerticalResponse marketing policy. >[] > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jerabek at snf.stanford.edu Thu Apr 6 15:21:41 2006 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Thu, 6 Apr 2006 15:21:41 -0700 (PDT) Subject: mask writer Message-ID: To whom it may concern: Micronic mask writer is down for unscheduled exposure laser replacement. Current one died in it's infancy.Replacement is on a way and downtime should not be more then one or two days. -Paul From rissman at stanford.edu Fri Apr 7 10:36:28 2006 From: rissman at stanford.edu (Paul Rissman) Date: Fri, 07 Apr 2006 10:36:28 -0700 Subject: industrial cap reduction Message-ID: <6.2.5.6.2.20060407103449.02829660@stanford.edu> In January, 2005 SNF raised the the monthly cap in order to balance the laboratory budget. The academic cap was raised from 21.3 hours to 25 hours, and the industrial cap was raised from 21.3 hours to 30 hours. Obviously, the financial impact on the industrial users was greater than on the academic users. At that time, we pledged to review the finances and revisit the rate structure once we determined the impact of the changes. Through the efforts of the SNF management, expenses have been reduced and the budget is now under control. In addition, a number of new capabilities have been added to the lab. Users now have a new general purpose wet bench, ALD, and a second RTA. Soon they will have an additional epi reactor, a new bank of 6" furnaces, a XeF2 isotropic silicon etcher and a new multilayer metrology instrument. For more information, see the SNF website: http://www-snf.stanford.edu/ In October, we announced a special SBIR rate to encourage use of the lab by small start-up companies. We are now announcing a reduction in the industrial cap to 25 hours, equivalent to the academic cap. This applies to both conventional and SBIR industrial users. With this new cap, the industrial rates with the 56% Stanford overhead are reduced from $7521 to $6267 and SBIR rates from $5148 to $4290. This reflects a 17% reduction in fees for a capped lab user. SNF will continue to work to improve the lab capability. We hope these new rates will make working in the laboratory more affordable for industrial users. Please see Paul Rissman if you have any questions about the new rates. Yoshio Nishi From edmyers at stanford.edu Fri Apr 7 11:27:10 2006 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 07 Apr 2006 11:27:10 -0700 Subject: JA Woollam Visit and Presentations Message-ID: <6.0.1.1.2.20060407111705.02d8c680@edmyers.pobox.stanford.edu> SNF Users, Some of you have heard SNF is evaluating metrology tools to expand our capability in transparent thin film measurements. The objective is to bring in modern ellipsometer or reflectometer technology. A group was put together and has done some of the initial evaluations. Next week Tim Tiwald of JA Woollam will be on to present their equipment (VASE and M-2000) and demonstrate their analysis software (WVASE). The presentation times are as follows: Thursday, April 13th, 1:30-3:00pm in CIS101: Overview of the VASE and M-2000 systems. Friday, April 14th, 1:30-3:00pm in CIS101: Demonstration of their WVASE analysis software. Please feel free to join us. Regards, Ed Myers From mtang at stanford.edu Fri Apr 7 16:18:22 2006 From: mtang at stanford.edu (Mary Tang) Date: Fri, 07 Apr 2006 16:18:22 -0700 Subject: Process "Grand Rounds" Message-ID: <4436F33E.2000805@stanford.edu> Hi everyone -- Prof. Beth Pruitt had an excellent suggestion (which we would like to try out): A meeting where labmembers could review each others' processes, and discuss recommendations about process flow, equiment choices, etc. Over pizza, of course. This might be a great way to jumpstart a new process flow or find a new way around that annoying little process marginality that's been bugging you. So, I've reserved CIS 101 for next Friday, April 14, at noon, for a trial get-together. We're calling it "Grand Rounds" after the meetings that MD's have when they discuss medical case histories of their patients. If you have a process that you'd like to discuss, let me know and we'll put it on the agenda. And just to start things out, I thought I would take a few minutes to tell anyone interested everything I know about PDMS/silicone elastomer (unless anyone else is willing to volunteer to share their favorite process?) and maybe take some time to review the EE410 process flow, depending on what everyone's interested in discussing. Please do let me know if you're interested in attending (it's not mandatory, but gives me an idea of how many pizzas we'd need.) Hope to see you there! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mahnaz at stanford.edu Fri Apr 7 14:35:46 2006 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 07 Apr 2006 14:35:46 -0700 Subject: EV aligner/bonder Message-ID: <4436DB32.4020208@stanford.edu> Hello all, There will be a presentation given by Chad Brubaker ( staff engineer) of EVG group on Wednesday 12th on EV bonder and EV aligner. We will do the EV bonder at 10 am in the lab so if you need training in near future or need a refresher or simply like to talk about your process join us by the EV bonder in the lab. We will do the training on EValigner in the lab at 2 pm the same day. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From jerabek at snf.stanford.edu Fri Apr 7 16:37:12 2006 From: jerabek at snf.stanford.edu (Paul Jerabek) Date: Fri, 7 Apr 2006 16:37:12 -0700 (PDT) Subject: mask writer Message-ID: Micronic mask writer is back on line. -Paul From maryamzm at stanford.edu Mon Apr 10 01:54:08 2006 From: maryamzm at stanford.edu (Maryam Ziaei-Moayyed) Date: Mon, 10 Apr 2006 01:54:08 -0700 Subject: MEMS Seminar: Wednesday 4/12, 3PM, Packard 101 Message-ID: <1144659248.443a1d30e63de@webmail.stanford.edu> Spring 2006 MEMS Seminar Series WHEN: Wednesday 4/12/06 3:30-4:30 pm Refreshments at 3pm WHERE: Packard 101 TITLE: From Optical MEMS to Nanophotonics SPEAKER: J. Provine Department of Electrical Engineering, Stanford University ABSTRACT: Even with the golden goose of optical telecom switching having flown the coop, Optical MEMS remains a fertile area for research. Specifically it looks to be an enabling technology for both new devices and physical phenomena research beds for photonic crystals and other forms of nanophotonics. This talk will focus on a few of the new phenomena that are being researched in this area including metallic surface plasmons, semi-conducting photonic crystals, and applications for micro-fluidics and bioMEMS. BIO: J Provine has recently joined Stanford University's Department of Electrical Engineering as a Post-doctoral Researcher. He spent the calendar year 2005 as a post-doc at the Berkeley Sensor Actuator Center, after completing his PhD at Cornell University. He received a BA in physics, and the BS and MEE degrees in Electrical Engineering at Rice University in 1999. His research interests include nanophotonics, optical MEMS, photonic crystals, optical telecom, and IR spectroscopy. From mahnaz at stanford.edu Wed Apr 12 08:17:02 2006 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Wed, 12 Apr 2006 08:17:02 -0700 Subject: [Fwd: EV aligner/bonder] Message-ID: <443D19EE.8070706@stanford.edu> -------- Original Message -------- Subject: EV aligner/bonder Date: Fri, 07 Apr 2006 14:35:46 -0700 From: Mahnaz Mansourpour Organization: SNF To: evalign at snf.stanford.edu, evbond at snf.stanford.edu, Lab Hello all, There will be a presentation given by Chad Brubaker ( staff engineer) of EVG group on Wednesday 12th on EV bonder and EV aligner. We will do the EV bonder at 10 am in the lab so if you need training in near future or need a refresher or simply like to talk about your process join us by the EV bonder in the lab. We will do the training on EValigner in the lab at 2 pm the same day. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From arvisun at stanford.edu Wed Apr 12 13:57:04 2006 From: arvisun at stanford.edu (arvind sundaramurthy) Date: Wed, 12 Apr 2006 13:57:04 -0700 Subject: Fwd: Postdoctoral Opening with Prof. Ken Crozier, Harvard Message-ID: <6.0.1.1.2.20060412135601.02bc6210@arvisun.pobox.stanford.edu> >X-Sieve: CMU Sieve 2.2 >Date: Tue, 11 Apr 2006 14:05:17 -0400 >From: Ken Crozier >User-Agent: Mozilla Thunderbird 0.8 (Windows/20040913) >X-Accept-Language: en-us, en >To: arvind sundaramurthy >Subject: Postdoctoral Opening, Harvard >X-Flow-Control: Sendmail Flow Controller v1.4.0 gorf.deas.harvard.edu >k3BI5HS3026762 >X-Spam-Score: 0.00% > >************************************* >Postdoctoral Position in Nanophotonics, Harvard > >A postdoctoral position is available in the group of Professor Kenneth >Crozier, in the Division of Engineering and Applied Sciences (DEAS) at >Harvard University. The position is in the field of nanophotonics, and >the successful candidate will work on the experimental realization of >metallic and dielectric nanophotonic devices. In addition, the candidate >will develop new near-field techniques for mapping optical field >distributions with ultra-high spatial resolution. > >A wide variety of fabrication tools for the proposed work exist at the >Center for Nanoscale Systems (CNS) at Harvard. Facilities for high >resolution patterning include two electron-beam lithography systems and a >focused ion beam (FIB) system. Additional fabrication facilities include: >mask aligners for photolithography, reactive ion etching, high vacuum >evaporators, CVD dielectric deposition systems, rapid thermal annealing, >and scanning and transmission electron microscopy. > >A PhD in Electrical Engineering, Applied Physics, Physics, Materials >Science or a related field is required. Experience in one or more of >these areas is desired: microfabrication, in particular electron beam >lithography, optics laboratory measurements, knowledge of >optics/electromagnetic wave theory, in particular photonic crystals and >plasmonics, and scanning probe microscopy. The position is initially for >one year, with the possibility of extension for several years by mutual >agreement. > >Applications should contain: a curriculum vitae (CV), full list of >publications, copies of at most 3 relevant publications, a letter >(one-page maximum) describing their strengths for this research project, >and names and contact details for three people who may be asked for >references. Applications should be emailed in PDF format to: >nanophotonics at deas.harvard.edu > >Deadline for applications: 1st July, 2006 >Starting Date for Position: Preferably by 1st September, 2006. An earlier >starting date is possible. > >Harvard University is an Equal Opportunity/Affirmative Action Employer > > From mtang at stanford.edu Thu Apr 13 07:21:30 2006 From: mtang at stanford.edu (Mary Tang) Date: Thu, 13 Apr 2006 07:21:30 -0700 Subject: Process Grand Rounds, 4/14/06 noon Message-ID: <443E5E6A.3040506@stanford.edu> Hi everyone -- Just a reminder that the first Process Grand Rounds will be held at noon, this Friday, April 14, in CIS 101. The agenda so far: a quick and dirty intro to PDMS; a review of a MEMS process from Christophe Antoine and Nau Sugawara; open discussion. Pizza will be served. Hope to see you there! Mary From edmyers at stanford.edu Thu Apr 13 07:26:50 2006 From: edmyers at stanford.edu (Ed Myers) Date: Thu, 13 Apr 2006 07:26:50 -0700 Subject: JA Woollam Visit and Presentations Message-ID: <6.0.1.1.2.20060413072606.02df23e0@edmyers.pobox.stanford.edu> SNF Users, Some of you have heard SNF is evaluating metrology tools to expand our capability in transparent thin film measurements. The objective is to bring in modern ellipsometer or reflectometer technology. A group was put together and has done some of the initial evaluations. Next week Tim Tiwald of JA Woollam will be on to present their equipment (VASE and M-2000) and demonstrate their analysis software (WVASE). The presentation times are as follows: Thursday, April 13th, 1:30-3:00pm in CIS101: Overview of the VASE and M-2000 systems. Friday, April 14th, 1:30-3:00pm in CIS101: Demonstration of their WVASE analysis software. Please feel free to join us. Regards, Ed Myers From mtang at stanford.edu Fri Apr 14 07:23:27 2006 From: mtang at stanford.edu (Mary Tang) Date: Fri, 14 Apr 2006 07:23:27 -0700 Subject: Process Grand Rounds - Postponed! Message-ID: <443FB05F.607@stanford.edu> Hi everyone -- I'm REALLY sorry, but have decided to POSTPONE the first Process Grand Rounds. I'm afraid my 3-year old was so inconsiderate as to wake up with a temperature of 103 F this morning. I would like postpone, tentatively to next Friday, at noon (pending rescheduling of room, pizza, and presenters.) And since several of you have said that taxes were the only thing keeping you away, this is probably just as well. Again, my apologies -- Mary From mahnaz at stanford.edu Fri Apr 14 09:11:13 2006 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 14 Apr 2006 09:11:13 -0700 Subject: Wet benches Down Message-ID: <443FC9A1.5010607@stanford.edu> Hello all, The scrubber went down and needs fan replacement, ALL the wet benches will be down at least till 11 am this morning. I will send an email out when scrubber fixed. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From rcrane at stanford.edu Fri Apr 14 12:11:56 2006 From: rcrane at stanford.edu (Dick Crane) Date: Fri, 14 Apr 2006 12:11:56 -0700 Subject: Bench exhaust is back up Message-ID: <443FF3FC.2010701@stanford.edu> The wet benches and other tools requiring exhaust air are now back up. Scrubber fan, SF-1, suffered a bearing failure this morning. The bearing has been replaced and the exhaust system is back up. Dick From maryamzm at stanford.edu Sat Apr 15 19:39:32 2006 From: maryamzm at stanford.edu (Maryam Ziaei-Moayyed) Date: Sat, 15 Apr 2006 19:39:32 -0700 Subject: MEMS Seminar: Monday 4/17, 3:30PM, CISX Auditorium Message-ID: <1145155172.4441ae6493972@webmail.stanford.edu> Spring 2006 MEMS Seminar Series WHEN: Monday 4/17/06 4-5pm Refreshments at 3:30pm WHERE: CISX Auditorium TITLE: SIGE: A PROMISING MATERIAL FOR MEMS POST-PROCESSING SPEAKER: Sherif Sedky Physics Department, The American University in Cairo (AUC) WEBSITE: http://www.stanford.edu/~maryamzm/memsseminar ABSTRACT: Polycrystalline silicon germanium (Si1-xGex) is considered an attractive alternative to poly Si, especially, for low temperature applications due to its lower transition temperature from amorphous to polycrystalline and its lower electrical resistivity. In addition, the thermal conductivity of Si1-xGex is lower than that of poly Si as the phonon scattering is mainly affected by the Ge atoms. Over the last decade there has been tremendous development for tuning the physical properties of silicon germanium (Si1-xGex) to be suitable for a broad range of MEMS applications that can be monolithically integrated with the driving and control electronics using a modular post-processing approach. This talk gives an overview of the major SiGe developments carried at IMEC, Berkeley and AUC. This includes different techniques implemented to reduce the processing temperature of SiGe to a CMOS backend temperature using low pressure chemical vapor deposition (LPCVD), plasma enhanced chemical vapor deposition (PECVD) or pulsed laser deposition (PLD). Furthermore, low thermal budget techniques for enhancing crystallization at low temperatures (≤ 370C) such as pulsed laser annealing and metal induced crystallization are presented. BIO: Sherif Sedky was born in Cairo (Egypt) in 1969. He received the B.Sc. degree, with honors, in electronics engineering in 1992, and the M.Sc. degree in engineering physics in 1995 both from Faculty of Engineering, Cairo University, and the Ph.D. degree in microelectronics in 1998 from the Katholieke Universiteit Leuven, Belgium. In 1995 he joined the MEMS group of the Interuniversity Microelectronics Center (IMEC) in Leuven (Belgium). From 1999 to 2002 he was assistant professor at Cairo University. During the academic year 1999-2000, he was a postdoctoral fellow at the Katholieke Universiteit Leuven, and a visiting professor at the same university during Summer 2001, 2003, 2004 and 2005. In 2002 he was a visiting researcher at the University of California, Berkeley. At present, he is associate professor at The American University in Cairo. He is a member in the Institute of Electrical and Electronic Engineers (IEEE), and the materials research society. He holds six patents and authored and coauthored fifty international publications and a book chapter in the field of design, fabrication and monolithic integration of MEMS with the driving electronics using polycrystalline silicon germanium as a structural material. He is the author of the book titled: ?Post-processing techniques for integrated MEMS?. Currently, he is establishing a MEMS fabrication facility at The Science and Technology Research Center at The American University in Cairo. He is a recipient of the Egyptian prestigious national award in advanced technological sciences in 2002, and the graduate studies award from Cairo University in 1996. He served on committees of several international conferences. From mtang at stanford.edu Mon Apr 17 10:37:56 2006 From: mtang at stanford.edu (Mary Tang) Date: Mon, 17 Apr 2006 10:37:56 -0700 Subject: Bunnysuit Shortage... Message-ID: <4443D274.2060406@stanford.edu> Labmembers ? Deepest apologies for the bunnysuit shortage this weekend. I take responsibility: I mis-timed the last monthly bunnysuit cleanout and we?d missed the weekly pickup, so had to go two weeks on the remaining supply instead of just one. And although we did leave nearly 50 suits in the visitor section just for this contingency, I can understand the reluctance to share suits and the general annoyance at the lack of bagged suits. (I can also thus appreciate the motivation of the clever soul who ?borrowed? my personal bunnysuit ? point taken.) Please do bear with us as we iron the bugs out of the bunnysuit cleanout system. We?ll time our monthly bunnysuit cleanouts with the pickup. And we?ll be putting an additional 50 or so complete new suits into service (medium, large, and extra large). Please also do help us by putting your suit into the laundry when you do not plan to work in the lab for the month. Thanks, Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Mon Apr 17 23:05:14 2006 From: mtang at stanford.edu (Mary Tang) Date: Mon, 17 Apr 2006 23:05:14 -0700 Subject: Process Grand Rounds: Let's try again! Message-ID: <4444819A.6090706@stanford.edu> Hi everyone -- The first Process Grand Rounds has been rescheduled for this Friday, April 21, at noon, in CIS 101 (Linvill Conference room.) On the agenda so far: a quick & dirty overview of PDMS/silicone elastomer and a MEMS fabrication process proposed by Christophe Antoine and Nao Sugawara. If you'd like to share your part or all of your fabrication process, one of your process modules, or other processing question with others, please bring it along. If you'd like to share your expertise, or just watch the show, come and join us. An RSVP would be nice (so I know how much pizza to order) but not required. Hope to see you there! Mary From amf at amfitzgerald.com Wed Apr 19 14:06:35 2006 From: amf at amfitzgerald.com (Alissa M. Fitzgerald) Date: Wed, 19 Apr 2006 14:06:35 -0700 Subject: Reminder: SNF User's Meeting: Thurs 4/20, 5pm, CIS101 (process monitoring, furnaces) Message-ID: <002f01c663f5$25209ef0$6401a8c0@minicat> Please come tomorrow if you are interested in this topic! All are welcome to attend. If you can not attend, please feel free to email your input. Regards, Alissa _____ From: Alissa M. Fitzgerald [mailto:amf at amfitzgerald.com] Sent: Wednesday, April 05, 2006 9:49 PM To: labmembers at snf.stanford.edu Subject: Next SNF User's Meeting: Thurs 4/20, 5pm, CIS101 Hello Labmembers, The next SNF Labuser's meeting will be Thursday 4/20 at 5pm in CIS101. This meeting is going to be a roundtable, technical discussion with a focused purpose - to develop a *proposal* for a very simple, pilot process monitoring program for the furnaces. (There are other tools that could use monitoring, but the informal consensus is that it's needed most urgently on the furnaces.) This is an issue that many of us care about, and we've had a lot of informal discussion on it, but now it's time for us to put our heads together and figure out how to do something about it. We will then bring our proposal to the staff, work together with them to finalize it, and then implement it. The agenda will be as follows: Discussion: - Which furnace(s) and recipe(s) should be monitored. - Best way to do monitoring given limited resources. We should converge on test criteria, testing interval, number of wafers, etc. - Division of labor Actions: - Draft up a strawman proposal to discuss (at a future time) with SNF mgmt. - Nominate a labuser volunteer to head up this effort: discussions w/staff, organize future meetings, etc. Regards, Alissa -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Thu Apr 20 08:24:37 2006 From: mtang at stanford.edu (Mary Tang) Date: Thu, 20 Apr 2006 08:24:37 -0700 Subject: Process Grand Rounds Message-ID: <4447A7B5.9090709@stanford.edu> Hi everyone -- Just a reminder that the first Process Grand Rounds is scheduled for tomorrow (Friday) at noon, in CIS 101 (the Linvill conference room, not the auditorium.) On the agenda: 1. A quick and dirty overview of PDMS/silicone elastomer processing 2. Christophe Antoine and Nao Sugawara would like to solicit comments and suggestions for their MEMS process flow 3. Brainstorming session to help Aaron Parness find ways to make gecko-toe-skin, which is based on structured pillars. Aaron is thinking of becoming a labmember -- and his decision rests on whether we can find a workable solution in our lab for him. Can we do it? Will he join or won't he? Come to the Process Grand Rounds and find out! Pizza for 16 will be provided (based on definite "yeses" received so far) -- but please feel free to come and bring your lunch if you've haven't RSVP'ed. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Fri Apr 21 08:03:06 2006 From: mtang at stanford.edu (Mary Tang) Date: Fri, 21 Apr 2006 08:03:06 -0700 Subject: CAD MEMulator Program? Message-ID: <4448F42A.5020801@stanford.edu> Hi everyone -- As you may know, we have the Coventor MEMulator product license on one of the PC's in the CAD room. It's nearly time for the annual renewal of this license. We'd like to solicit feedback from you to decide whether this is something we would like to continue to have in the lab (or would we rather have, for example, a second updated PC instead?) Please let me know what you think -- Thanks, Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From kupnik at stanford.edu Fri Apr 21 16:01:30 2006 From: kupnik at stanford.edu (Mario Kupnik) Date: Fri, 21 Apr 2006 15:01:30 -0800 Subject: TEOS deposition Message-ID: <004a01c66597$876a8550$1a5740ab@NBKUP> Dear all, I was wondering if someone has experience with TEOS (tetraethylorthosilicate) deposition? We have thermal oxidized wafers with small trenches (~500 nm wide) and need to fill these trenches with TEOS. Please let me know if you can recommend a company which can do this process step for us. Thank you! Mario From erhan.ata at gmems.com Fri Apr 21 17:10:53 2006 From: erhan.ata at gmems.com (Erhan Ata) Date: Fri, 21 Apr 2006 17:10:53 -0700 (PDT) Subject: ZnO or AlN Message-ID: <20060422001054.66579.qmail@web31413.mail.mud.yahoo.com> Dear Colleagues, I'm seeking for a vendor that can deposit ZnO (AlN is second preference). I'd appreciate if you can share your relevant experience With Regards Erhan Ata PhD., Principal MEMS Process Eng. General MEMS Corp. From edmyers at stanford.edu Mon Apr 24 10:30:17 2006 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 24 Apr 2006 10:30:17 -0700 Subject: HORIBA - Jobin Yvon Ellipsometer Presentation Message-ID: <6.0.1.1.2.20060424102633.02e29eb0@edmyers.pobox.stanford.edu> All, Dr. Yong of HORIBA - Jobin Yvon will in Wednesday to give a presentation covering their UVISEL and MM-16 ellipsometers. He will demonstrate the system software and show some typical applications. Wednesday, April 26th 10am to 11am CIS101 Regards, Ed Myers From vigneshg at stanford.edu Mon Apr 24 10:41:14 2006 From: vigneshg at stanford.edu (Vignesh G) Date: Mon, 24 Apr 2006 10:41:14 -0700 Subject: Etching away Cr Message-ID: <6.2.5.6.2.20060424103916.04d8f310@stanford.edu> Hi all, I use Cr as RIE etch-masks for creating nanostructures. I would like to remove the excess Cr (2-3 nm) that is left behind after this RIE step. Does anybody know how to remove the Cr (wet-etch, dry-etch etc.) Thanks. - Vignesh. From mtang at stanford.edu Mon Apr 24 16:36:30 2006 From: mtang at stanford.edu (Mary Tang) Date: Mon, 24 Apr 2006 16:36:30 -0700 Subject: Upcoming Safety Fair: Get your Prescription Safety Glasses!!! Message-ID: <444D60FE.9080602@stanford.edu> Hi everyone -- You'll hear official announcements in weeks to come, but we wanted to give you advance notice... The School of Engineering is hosting a Safety Fair which will be held in the CISX patio on Thursday, May 18, from 11-2 pm. There will be lots of safety info and gear, for the lab, office, and home. You can also get fitted for prescription safety glasses from 9 am to noon that day. As part of the Safety Fair, an optician from Dispensers Optical (the official Stanford provider) will be on hand to show off the vast range of prescription safety eyewear available. As I understand it, the prices are 40% off what you might normally pay. We would all really like to encourage everyone to get prescription safety glasses -- there are so many styles and frames available, it should be easier nowadays to find something that is comfortable and light for you. If you need more persuasion, take a look at this: http://www.iceh.org.uk/files/tsno2/text/04.htm and please keep in mind this factoid: in 1999, according to the CDC/NIOSH website, most facial injuries resulting in lost workdays involved eye injuries -- and the most common type was chemical burns. (Yes, safety glasses with side shields don't prevent chemical splashes, but I'm willing to bet they are much better than no protection at all.) If you'd like to get fitted for prescription safety glasses, please get in touch with Jackie Chan, the SOE Health and Safety Specialist (Jackie.Chan at Stanford.edu), as she is coordinating the optician's schedule. Please make sure you have a current prescription (no more than one year old). If you are a Stanford employee, your department may cover part or all of the cost - please contact Jackie to find out the specific departmental coverage/reimbursement policy. Payment may be also be make from PO, PTA number (i.e., if you have an active SNF account, you have a PTA#), or credit card. I'd like to add that I gave a lab tour this morning to Jackie and her two visitors (a toxicologist and an industrial hygienist) from the State of California Occupational Health departments. They noted that several people were either not wearing any eye protection or wore it on top of their heads... It was a bit embarrassing... Now, I admit to once being young and stupid and terrible about wearing safety glasses (so darned inconvenient when crawling under equipment...) -- and it took an exploding hot phosphoric acid tank to convince me to be better about this. Please don't wait for an accident to happen to convince you. The optician, by the way, is also available for appointment on campus two Thursdays a month. Hope to see you all at the Safety Fair! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From scaccag at stanford.edu Mon Apr 24 19:02:24 2006 From: scaccag at stanford.edu (Luigi Scaccabarozzi) Date: Mon, 24 Apr 2006 19:02:24 -0700 (PDT) Subject: PhD Dissertation Defense Announcement Message-ID: Dear all, I'm defending next week and I thought that someone may be interested in the topic. Here are the details of my defense. Gigi PS:Sorry if you receive this messaeg in multiple copies ---------------------------------------------- Department of Applied Physics University Ph.D. Dissertation Defense ALGAAS/AL-OX-BASED SUBMICRON WAVEGUIDES AND RESONANT CAVITIES FOR NON-LINEAR OPTICS Luigi Scaccabarozzi Research Advisor: Professor J. S. Harris Wednesday May 3rd, 2006, 10:00 a.m. (Refreshments served at 9.45) CIS-X Auditorium, Room 101 ABSTRACT In fiber optics systems, such as Wavelength Division Multiplexing, there is an increasing need for fast, compact switches. Currently employed opto-electro-optical converters are relatively slow and power demanding. Non-linear optical devices, such as lithium niobate (LiNbO3) waveguides, can provide fast, all-optical wavelength conversion. However, because they require interaction lengths on the order of centimeters for high efficiency, they are not suitable for dense optical integration. Gallium Arsenide quasi-phasematched (QPM) waveguides have also been demonstrated, and although the interaction length is smaller (millimeters), they require a complex fabrication process. In this work we present the design, fabrication and characterization of a tightly confining, (AlGaAs)/aluminum oxide (AlxOy) non-linear waveguide device. AlGaAs has a nonlinear coefficient five times larger than LiNbO3 and a well-established fabrication technology. Moreover, passive and active devices could potentially be integrated to realize on-chip photonic circuits. Because of the high index contrast of the AlGaAs/AlxOy material system, phasematching can be achieved by artificial birefringence, greatly simplifying the fabrication process compared to QPM waveguides. This technique has been recently demonstrated. However, the conversion efficiency remained low, due to poor lateral confinement. We employed the AlGaAs/AlxOy material system to achieve both birefringent phasematching and sub-micron confinement. We developed a new fabrication process to realize high aspect ratio, extremely smooth AlGaAs/AlxOy structures, leading to low propagation loss (~2.5 dB/mm) at the fundamental wavelength. Normalized conversion efficiency larger than 20000 %/W/cm2, one order of magnitude larger than previously reported works, was obtained. Moreover, we showed that nonlinear effects can be further enhanced using a cavity embedded in the waveguide, resonant at the fundamental wavelength. For this purpose, a novel dichroic mirror that is highly reflective at the fundamental wavelength and has high transmission at the second harmonic wavelength was designed and fabricated. Ultra-compact (100-mm long) cavity devices have been realized and showed large resonant enhancements compared to plain waveguide devices. In conclusion, we demonstrated tightly confining, birefringently phasematched waveguides and resonant cavities with the highest normalized conversion efficiency ever reported. In addition, a novel dichroic mirror was developed, allowing large resonant enhancement of second harmonic generation. -- From mbaran at stanford.edu Wed Apr 26 09:04:59 2006 From: mbaran at stanford.edu (Maureen Baran) Date: Wed, 26 Apr 2006 09:04:59 -0700 Subject: Workshop on Probing the Nanoscale at Stanford Message-ID: <200604261605.k3QG50ap022228@smtp3.Stanford.EDU> Dear students and postdocs, Doing something neat in nanotechnology or nanoscience? Using microfabrication to create phenomena which could not occur (or be observed) otherwise? I strongly encourage you to attend the first annual workshop on Probing the Nanoscale here at Stanford, next Friday May 5, and to PRESENT A POSTER. Based on last year's experience and this year's preregistration, we expect substantial interest in the poster session from Bay Area academic and especially industrial scientists who are eager to meet you and hear about your work. Posters will also be judged for attractive prizes ($500 first prize, two $100 runners-up). In addition to the posters, we have an exciting all-day roster of talks, covering not only techniques for observing nanoscale objects but also connections to major industrial challenges, and how scientists communicate with the public: http://www.stanford.edu/group/cpn/research/anworkshop.html This year, registration is free for students -- this includes breakfast, lunch, and hors-d'oeuvres during the poster session. When you register, please email Laraine Lietz-Lucas lietz at stanford.edu, Program Manager of the Center for Probing the Nanoscale, to sign up to give a poster. Please do this by the end of this week if at all possible, to ensure we have enough poster boards set up, enough food, etc. Tell your friends and colleagues! I apologize for the short notice. If you contact us next week, we'll still try to accommodate you if we can. Below I copy the announcement of the Workshop. Best wishes, David CPN: Center for Probing the Nanoscale An NSF Nanoscale Science and Engineering Center, a Joint Venture of Stanford University and IBM Research Labs Second Annual Workshop Probing the Nanoscale Friday, May 5, 2006 You are cordially invited to attend the CPN's flagship annual event: Probing the Nanoscale, a one-day workshop on challenges and approaches to visualizing nanoscale structures. This year, the focuses will be nanoelectronic probes, nanomagnetic probes, and nanomechanical probes. Hear talks by leading experts from industry and academia. Meet CPN investigators and the broader Bay Area community interested in nanoscale imaging and metrology. Location: Bechtel Conference Center, http://bcc.stanford.edu/ on the Stanford campus. Hours: 8:30-6, with continental breakfast and box lunch included. There will be a poster session from 4-6, during which tasty, light fare will be served. Speakers include: Professor Pat Collier, California Institute of Technology "Functionalized Nanoelectrode Scanning Probes Using Carbon Nanotubes " Professor Eric Heller, Harvard University "Imaging Electron Flow in 2DEGs With and Without Magnetic Fields " Professor Zhi-Xun Shen, Stanford University "Developing the Next Generation Scanning Microwave Imager" Professor Dan Dahlberg, University of Minnesota "Magnetism at the Nanoscale: A Voyeur's Tale" Professor Roland Wiesendanger, Institute of Applied Physics, University of Hamburg "Mapping Spin Structures on the Atomic Scale" Professor Michael F. Crommie, University of California, Berkeley "Exploring and Manipulating Fullerenes at the Single Molecule Level" Professor Michael L. Roukes, California Institute of Technology Dr. Sergei Magonov, Veeco Instruments, Santa Barbara "Atomic Force Microscopy of Soft Matter: From High-resolution Imaging to Quantitative Studies of Local Mechanical Properties" Dr. H. Kumar Wickramasinghe, IBM Almaden Research Center "Molecular Sorting with an AFM" Register online NOW! http://www.stanford.edu/group/cpn/research/anworkshop.html Questions: Laraine Lietz-Lucas, lietz at stanford.edu ----------------------------------------------------------------- David Goldhaber-Gordon goldhaber-gordon at stanford.edu Assistant Professor of Physics davidg at post.harvard.edu and Deputy Director, (permanent forwarding) Center for Probing the Nanoscale www.goldhaber-gordon.com Stanford University www.stanford.edu/group/cpn/ (650) 725-2047 (lab) (650) 724-3709 (office) Address for letters or packages: Administrative Associate: David Goldhaber-Gordon Roberta Edwards Geballe Laboratory for Advanced Materials McCullough, Rm. 338 McCullough Building, Room 346 Phone: (650) 723-8028 476 Lomita Mall Fax: (650) 724-3681 Stanford, CA 94305-4045 email: redward at stanford.edu From rcrane at stanford.edu Thu Apr 27 16:27:37 2006 From: rcrane at stanford.edu (Dick Crane) Date: Thu, 27 Apr 2006 16:27:37 -0700 Subject: Door disruptions on Friday Message-ID: <44515369.8030700@stanford.edu> Fab users, On Friday, 4/28, from 0730 to 1000, the fab perimeter doors will be rekeyed. Some fab areas will have a high particle count while the door is open. Critical areas will be addressed first. Rekeying typically can be done in less than a minute unless a problem is encountered. Photo area: There will danger of light exposure in the YES over area. Diffusion area: Higher particle counts near Thermco1. Other perimeter doors are less critical. Thanks for your cooperation, Dick From mtang at stanford.edu Fri Apr 28 07:57:00 2006 From: mtang at stanford.edu (Mary Tang) Date: Fri, 28 Apr 2006 07:57:00 -0700 Subject: Fire Extinguisher Training rescheduled: Wed, May 3, 1:30 pm Message-ID: <44522D3C.2060104@stanford.edu> Hi everyone -- The weather forecast is clear -- and the Fire Marshall is resuming fire extinguisher training. If you'd like to learn how to properly wield one of these, please RSVP to me. The next scheduled training is Wednesday, May 3, at 1:30 pm. We meet in CIS 101 for a 20 minute video and then convene in the Shipping & Receiving area for some fire-fighting fun. Of course, we're still subject to prevailing weather conditions, but as rain is unlikely at this point (which would dampen the fun), the only possible concern would be wind (which could make things quite exciting.) If you'd like to join in on the fun (See Uli put out a fire: http://snf.stanford.edu/Uli-Fire.html --and yes, she IS wearing safety glasses -- the frames are clear and don't show up well), let me know, as the class size is limited. (If you've already RSVP'ed in the last week or so, you don't need to do so again.) Seriously, though, as we've said before, SNF really is full of hazards, and despite engineering controls and safety training, accidents can still happen... For a sobering example of what can happen with a small fire in a microfab lab, see this: http://www.flickr.com/photos/johnbullas/58459134/in/set-1264633/ Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From jonroth at stanford.edu Fri Apr 28 10:29:00 2006 From: jonroth at stanford.edu (Jonathan Edgar Roth) Date: Fri, 28 Apr 2006 10:29:00 -0700 Subject: Wet/Dry selective etching of SiGe over Si Message-ID: <1146245340.445250dcd01b5@webmail.stanford.edu> Hello, Does anyone have experience/suggestions for wet or dry selective etching of SiGe over Si? I've tried a wet etch consisting of nitric acid, water, and very little HF (~0.2%). It works OK but attacks photoresists somewhat (tried AZ4620 and Shipley 1813) Any suggestions for wet or dry etching would be appreciated. Jon From rcrane at stanford.edu Fri Apr 28 12:35:13 2006 From: rcrane at stanford.edu (Dick Crane) Date: Fri, 28 Apr 2006 12:35:13 -0700 Subject: Fab door replacement 5/1 + 5/2 Message-ID: <44526E71.2010609@stanford.edu> Fab users, An outside contractor will be replacing the main, fab access, sliding door next week. Work will start Monday morning 5/1, (time unknown) and continue through Tuesday, 5/2. Entry to the fab will still be through the doorway, but there may occasional delays for safety reasons. The finished product will give us our interlocking door function back again. Wbgen may have a high particle count issue when both door are open. Running critical process at wbgen is not advised. Sorry for the inconvenience, Dick From mahnaz at stanford.edu Fri Apr 28 16:27:18 2006 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 28 Apr 2006 16:27:18 -0700 Subject: Laurell Message-ID: <4452A4D6.6090409@stanford.edu> Hello all, I like to let you know that controller for Laurell ( our manual spinner) will be here Monday Morning and we should be able to have it up before lunch. I had send out an email regarding the problem yesterday which I am attaching it here as I am not sure had reached everyone so here you go.... Hello all, The touch pad indicator on the Laurell simply died. we shipped the controller to Laurell this afternoon and I have talked to them they will work on it immediately so I will find out more information by tomorrow mid day. One other thing came to my attention is that when the system started misbehaving some lab members opened the front panel and pressed the circuit breaker button using it as switch to reset the system. This is totally unacceptable. All you need to report the problem Coral. Please report the problems on coral. mahnaz