High Humidity in Litho
Mary Tang
mtang at stanford.edu
Tue Dec 5 14:19:34 PST 2006
Sorry everyone --
The lithography area is experiencing out-of-spec humidity (52% - nominal
spec is 45% with low and high of 40% and 50%, respectively.) According
to Facilities, it is because the outside weather is unusually dry and
the control system appears to be overcompensating. They are looking
into this. In the meantime, please be aware of the humidity problem --
you may want to delay processing of critical layers until humidity
returns to normal.
Litho Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu
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