High Humidity in Litho

Mary Tang mtang at stanford.edu
Tue Dec 5 14:19:34 PST 2006

Sorry everyone --

The lithography area is experiencing out-of-spec humidity (52% - nominal 
spec is 45% with low and high of 40% and 50%, respectively.)  According 
to Facilities, it is because the outside weather is unusually dry and 
the control system appears to be overcompensating.  They are looking 
into this.  In the meantime, please be aware of the humidity problem -- 
you may want to delay processing of critical layers until humidity 
returns to normal.

Litho Staff

Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at stanford.edu

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