Thermal reflow of +ve resist 3612
Rohan D. Kekatpure
rohank at stanford.edu
Mon Dec 11 16:29:47 PST 2006
I am using a process in which I expose circular patterns in the 1 um thick
3612 resist using Nikon stepper. I am concerned about the circularity and
the line edge roughness in the resist (which I intend to use as a dry
etch mask). Therefore, I am wondering if anyone has tried a reflow on this
particular resist. If indeed you have tried, it would be great if you
could provide me the starting parameters (reflow temperature and time).
Thanks in advance for your help.
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