Dry etching of Al or Ag film

Hideo Iwase open4891 at stanford.edu
Mon Feb 27 18:25:11 PST 2006



Dear labmembers;

I would like to etch silver or aluminum film in PlasmaQuest. Does anyone
have experience of that?  I would be grateful if someone would let me know
the etching conditions for these films.

Details of my experiment are as follows;
material of film: Al or Ag
thickness of film : 20-100 nm.
Mask : PMMA (t=300 nm)
substrate: GaAs wafer
Patterns: Ph.C-like (a =250 nm, Φ = 50-150 nm)

Any suggestion is greatly appreciated.

Best Regards;

Hideo Iwase.
Vuckovic group in Ginzton Lab.




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