Advanced Litho Workshop: Monday afternoon, 10/30/06

Mary Tang mtang at
Fri Oct 27 08:43:01 PDT 2006

Greetings Labmembers:

We've invited ASML, a leading optical lithography equipment provider, to 
host a workshop on applications for advanced lithography methods.  This 
will be held this coming Monday afternoon, October 30, in the CISX 
Auditorium.  The agenda is as follows:

1:30pm  to 1:45pm        Introductions          ASML/SNF
1:45pm  to 2:30pm        Enabling Technologies  ASML
2:30pm  to 2:45pm        Q&A           
2:45pm  to 3:15pm        RELACS Process         Clarient
3:15pm  to 3:30pm        Q&A
3:30pm  to 4:30pm        Fabrication Challenges SNF Staff, Students & 
4:30pm  to 5:30pm        Q&A
6:00pm                   Dinner to all interested to continue 
discussions on a more one to one basis

ASML has products and capabilities which we think are scalable and of 
interest to researchers.  These include:  3-D alignment, which 
facilitated high resolution backside align on silicon and novel 
substrates for MEMS and electronics.  This also include the RELACS 
(Resolution Enhancement Lithography Assisted by Chemical Shrink) process 
which, in combination with advanced 193 nm lithography, can yield 30 nm 
structures quickly, with precise alignment, across 8" substrates -- a 
capability which could nicely complement (maybe compete with?) 
direct-write ebeam.

Just to let you know...  SNF is in discussions with ASML, about 
technology and equipment access.  The purpose of this workshop is to 
introduce researchers to the capabilities of ASML and likewise, for 
researchers to present their patterning challenges to their applications 
engineers.  The workshop is open to all.

Hope to see you there!

Your SNF staff

Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at

More information about the labmembers mailing list