Advanced Litho Workshop: Monday afternoon, 10/30/06

Paul Rissman rissman at
Mon Oct 30 08:47:27 PST 2006

Reminder - Today


Greetings Labmembers:

We've invited ASML, a leading optical lithography equipment provider, 
to host a workshop on applications for advanced lithography 
methods.  This will be held this coming Monday afternoon, October 30, 
in the CISX Auditorium.  The agenda is as follows:

1:30pm  to 1:45pm        Introductions          ASML/SNF
1:45pm  to 2:30pm        Enabling Technologies  ASML
2:30pm  to 2:45pm        Q&A
2:45pm  to 3:15pm        RELACS Process         Clarient
3:15pm  to 3:30pm        Q&A
3:30pm  to 4:30pm        Fabrication Challenges SNF Staff, Students & 
4:30pm  to 5:30pm        Q&A
6:00pm                   Dinner to all interested to continue 
discussions on a more one to one basis

ASML has products and capabilities which we think are scalable and of 
interest to researchers.  These include:  3-D alignment, which 
facilitated high resolution backside align on silicon and novel 
substrates for MEMS and electronics.  This also include the RELACS 
(Resolution Enhancement Lithography Assisted by Chemical Shrink) 
process which, in combination with advanced 193 nm lithography, can 
yield 30 nm structures quickly, with precise alignment, across 8" 
substrates -- a capability which could nicely complement (maybe 
compete with?) direct-write ebeam.

Just to let you know...  SNF is in discussions with ASML, about 
technology and equipment access.  The purpose of this workshop is to 
introduce researchers to the capabilities of ASML and likewise, for 
researchers to present their patterning challenges to their 
applications engineers.  The workshop is open to all.

Hope to see you there!

Your SNF staff

Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
mtang at

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