ARC for Resist

Colin Reese ccreese at stanford.edu
Tue Feb 27 13:01:24 PST 2007


Hello all,

I'm spin-coating PR on top of 2-6um PDMS and performing lithography atop 
of it. I've been using 3617M to prevent transmission and reflection. 
Resolution is fine, however adhesion is not so great, resulting in 
feature-related cracks across the wafer.

I'm looking for either an intermediate layer to improve adhesion, or an 
Anti-Reflective Coating that can perform this function and allow me to 
use a different resist.

Any suggestions welcomed.

Regards,
Colin



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