ARC for Resist
ccreese at stanford.edu
Tue Feb 27 13:01:24 PST 2007
I'm spin-coating PR on top of 2-6um PDMS and performing lithography atop
of it. I've been using 3617M to prevent transmission and reflection.
Resolution is fine, however adhesion is not so great, resulting in
feature-related cracks across the wafer.
I'm looking for either an intermediate layer to improve adhesion, or an
Anti-Reflective Coating that can perform this function and allow me to
use a different resist.
Any suggestions welcomed.
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