Seminar on Reactive Sputtering
mcvittie at cis.Stanford.EDU
Wed Jul 18 09:39:28 PDT 2007
Special Seminar, Tuesday, July 24, 1:30 pm, CIS 101
Modeling of Reactive Sputtering
Dr. Hans-Olof Blum, Thin Film Group, Solid State Electronics division
The Angstrom Laboratory, Uppsala University, Sweden
( From his lab's web site) The basic model of the reactive sputtering
process was first published in 1987 by Berg and Blom. It is based on basic
gas kinetics and consists of a number of straightforward steady-state
balance equations. Despite its simplicity, it has been proven to agree
well with experimental observations and it is extremely useful for
description of hysteresis in reactive sputtering.
The model can predict variations in the sputtering rate, the composition
of the deposited film, the partial pressure of the reactive gas, the
fraction of the target surface covered by the compound, and the position
of the hysteresis region. Moreover, it is very flexible and can easily be
modified to account for sputtering using multiple targets, sputtering with
several reactive gases, or multi-phase compound formation
Our group continues in development of models for reactive sputtering
processes. At present the dynamics of reactive sputtering has been
studied. The original steady-state Berg's model has been extended in order
to reproduce dynamical behaviour. It has been successfully applied to
study dynamical effects on hysteresis curves, and to simulate reactive
process with pulsing of reactive gas.
Another research interest are high deposition rate processes for oxides.
Several ways of eliminating hysteresis has been proposed based on
simulations and successfully tested. As an example, reduction of target
area or the use of a substoichiometric target may be mentioned.
Modeling of Reactive Sputtering of Compound Materials
S.Berg, H.O.Blom, T.Larsson, and C.Nender, J. Vac. Sci. Technol. A 5
Modeling of the Reactive Sputtering Process. S. Berg, T. Nyberg, H.-O.
Blom, and C. Nender., Handbook of Thin Film Process Technology, A5.3, IOP,
Jim McVittie, Ph.D. Senior Research Scientist
Allen Center for Integrated Systems Electrical Engineering
Stanford University jmcvittie at stanford.edu
Rm. 336, 330 Serra Mall Fax: (650) 723-4659
Stanford, CA 94305-4075 Tel: (650) 725-3640
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