Seminar on Reactive Sputtering

Jim McVittie mcvittie at cis.Stanford.EDU
Wed Jul 18 09:39:28 PDT 2007

Special Seminar, Tuesday, July 24, 1:30 pm,  CIS 101

Modeling of Reactive Sputtering

Dr. Hans-Olof Blum, Thin Film Group, Solid State Electronics division
The Angstrom Laboratory, Uppsala University, Sweden

( From his lab's web site) The basic model of the reactive sputtering 
process was first published in 1987 by Berg and Blom. It is based on basic 
gas kinetics and consists of a number of straightforward steady-state 
balance equations. Despite its simplicity, it has been proven to agree 
well with experimental observations and it is extremely useful for 
description of hysteresis in reactive sputtering.

The model can predict variations in the sputtering rate, the composition 
of the deposited film, the partial pressure of the reactive gas, the 
fraction of the target surface covered by the compound, and the position 
of the hysteresis region. Moreover, it is very flexible and can easily be 
modified to account for sputtering using multiple targets, sputtering with 
several reactive gases, or multi-phase compound formation

Our group continues in development of models for reactive sputtering 
processes. At present the dynamics of reactive sputtering has been 
studied. The original steady-state Berg's model has been extended in order 
to reproduce dynamical behaviour. It has been successfully applied to 
study dynamical effects on hysteresis curves, and to simulate reactive 
process with pulsing of reactive gas.

Another research interest are high deposition rate processes for oxides. 
Several ways of eliminating hysteresis has been proposed based on 
simulations and successfully tested. As an example, reduction of target 
area or the use of a substoichiometric target may be mentioned.

Modeling of Reactive Sputtering of Compound Materials
S.Berg, H.O.Blom, T.Larsson, and C.Nender, J. Vac. Sci. Technol. A 5 
(1987) 202

Modeling of the Reactive Sputtering Process. S. Berg, T. Nyberg, H.-O. 
Blom, and C. Nender., Handbook of Thin Film Process Technology, A5.3, IOP, 

Jim McVittie, Ph.D.    			Senior Research Scientist 
Allen Center for Integrated Systems     Electrical Engineering
Stanford University             	jmcvittie at
Rm. 336, 330 Serra Mall			Fax: (650) 723-4659
Stanford, CA 94305-4075			Tel: (650) 725-3640

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