From mdeal at stanford.edu Tue May 1 07:54:45 2007 From: mdeal at stanford.edu (Michael Deal) Date: Tue, 01 May 2007 07:54:45 -0700 Subject: Fwd: Re: SNF tour Message-ID: <6.2.5.6.2.20070501074832.01da5798@stanford.edu> SNF Labmembers, Would anyone be interested in helping me out with giving a tour of SNF (window tour) to some middle and high school students from Daly City? It sounds like an interesting group (see below). It's for this Friday, staring at around 10:15-1-:30 am and ending by 11:15. It would be a window tour of the cleanroom, then lots of QandA about nanoscience and being a researcher/grad student, etc. Depending on how many volunteers we get, we would divide the 25 students into a number of smaller groups. Thanks. -Mike Deal, SNF >>>Dear Mike, >>>..... >>>Pat asked that I provide you with some information regarding the >>>tour of SNF we have asked for next Friday, May 4. The tour is for >>>a group of junior and senior high school students from Jefferson >>>High School in Daly City. These students are part of a special >>>learning community at Jefferson as they have been identified as >>>students with potential but who just don't seem to try. Their >>>biology teacher, Wanderson Carlos, who was one of the participants >>>in our Summer Research Experience program for teachers here on >>>campus last summer, has asked to bring them to Stanford for a tour >>>of some of the labs he saw during the summer. It is a rather large >>>group (approx 80) so I am trying to arrange three different lab >>>tours and will then divide the group. They will be taking a campus >>>tour at 9:15 and I could ask the tour guide to deliver them to SNF >>>at the conclusion (around 10:15 - 10:30). I was thinking the lab >>>tours would last about an hour. >>> >>>I really do appreciate your offer to help. Please let me know if >>>it is possible to arrange a SNF tour at this time (or if there is >>>someone else you would like me to contact to try and make these >>>arrangements). Again my sympathy is with you. >>> >>>Take care, >>>Judy >>>Judy McKeon >>>Administrator/Event Planner >>>Office of Science Outreach >>>Stanford University >>>T 650.724.5476 From mdeal at stanford.edu Tue May 1 07:56:25 2007 From: mdeal at stanford.edu (Michael Deal) Date: Tue, 01 May 2007 07:56:25 -0700 Subject: Fwd: Re: SNF tour In-Reply-To: <6.2.5.6.2.20070501074832.01da5798@stanford.edu> References: <6.2.5.6.2.20070501074832.01da5798@stanford.edu> Message-ID: <6.2.5.6.2.20070501075514.01d7b590@stanford.edu> That should say "starting at around 10:15-10:30 am and ending by 11:15." At 07:54 AM 5/1/2007, Michael Deal wrote: >SNF Labmembers, > Would anyone be interested in helping me out with giving a > tour of SNF (window tour) to some middle and high school students > from Daly City? It sounds like an interesting group (see > below). It's for this Friday, staring at around 10:15-1-:30 am > and ending by 11:15. It would be a window tour of the cleanroom, > then lots of QandA about nanoscience and being a researcher/grad > student, etc. Depending on how many volunteers we get, we would > divide the 25 students into a number of smaller groups. Thanks. > -Mike Deal, SNF > >>>>Dear Mike, >>>>..... >>>>Pat asked that I provide you with some information regarding the >>>>tour of SNF we have asked for next Friday, May 4. The tour is for >>>>a group of junior and senior high school students from Jefferson >>>>High School in Daly City. These students are part of a special >>>>learning community at Jefferson as they have been identified as >>>>students with potential but who just don't seem to try. Their >>>>biology teacher, Wanderson Carlos, who was one of the >>>>participants in our Summer Research Experience program for >>>>teachers here on campus last summer, has asked to bring them to >>>>Stanford for a tour of some of the labs he saw during the summer. >>>>It is a rather large group (approx 80) so I am trying to arrange >>>>three different lab tours and will then divide the group. They >>>>will be taking a campus tour at 9:15 and I could ask the tour >>>>guide to deliver them to SNF at the conclusion (around 10:15 - >>>>10:30). I was thinking the lab tours would last about an hour. >>>> >>>>I really do appreciate your offer to help. Please let me know if >>>>it is possible to arrange a SNF tour at this time (or if there is >>>>someone else you would like me to contact to try and make these >>>>arrangements). Again my sympathy is with you. >>>> >>>>Take care, >>>>Judy >>>>Judy McKeon >>>>Administrator/Event Planner >>>>Office of Science Outreach >>>>Stanford University >>>>T 650.724.5476 > From tberg at stanford.edu Tue May 1 10:09:22 2007 From: tberg at stanford.edu (Ted Berg) Date: Tue, 01 May 2007 10:09:22 -0700 Subject: VAX Replacement Message-ID: <46377442.1010803@stanford.edu> Hello All, Just a quick note to let everyone know that the VAX upgrade will begin on MAY 17 2007 and will last about 1.5 weeks Weeks sorry for any inconvenience.ted -------------- next part -------------- An HTML attachment was scrubbed... URL: From tberg at stanford.edu Tue May 1 12:33:50 2007 From: tberg at stanford.edu (Ted Berg) Date: Tue, 01 May 2007 12:33:50 -0700 Subject: Japanese fab shoes Message-ID: <4637961E.30500@stanford.edu> Hello All, We have several contractors from Japan starting up the new TEL tool. It seems that one pair of their fab shoes is missing.They are unlike our booties-actual fab shoes. They were in the clean room yesterday. If anyone has seen them please let me know. Thanks ted From mmlee at stanford.edu Thu May 3 11:57:35 2007 From: mmlee at stanford.edu (Meredith M. Lee) Date: Thu, 3 May 2007 11:57:35 -0700 Subject: [Reminder] Stanford OSA Confocal Laser-Scanning Microscope Seminar, Today 2:30pm AP299 Message-ID: <9fa245520705031157r42ff26f0xc3104e7a3e42b4ed@mail.gmail.com> The student OSA chapter is pleased to announce a demonstration given by Lee Bazella, Bay Area Territory Manager for Olympus Industrial Micro Imaging. Please see details below. -------------------------------------------------------------------------------------------------------------------- Demonstration of the Olympus confocal laser-scanning microscope Thursday May 3rd, 2:30PM Ginzton AP299 ** **** Bring samples that you would like to analyze **** The LEXT, Olympus' confocal laser-scanning microscope, offers high resolution and high magnification imaging with little or no sample preparation. It offers magnification up to 14,400X with 120 nm lateral resolution and 10 nm Z resolution using a 408 nm laser. The LEXT provides standard white light microscope observation including brightfield, darkfield and Nomarski DIC and laser observation in non-confocal, confocal and confocal DIC modes. It can perform distance, height and roughness measurements with an X repeatability of less than 0.02 microns and a Z repeatability of less than 0.05 + 0.001L microns. The LEXT is considered a bridge tool between white light microscopes and scanning electron microscopes. There is also an IR version of the LEXT that uses a 1320 nm laser to image through silicon and a few other materials. It offers a resolution of 700 nm. The LEXT IR has an XY repeatability of 0.05 microns or less and a Z repeatability of 0.1 microns or less. Here is a website link with more information about the LEXT: http://www.olympusmicroimaging.com/index.cfm/page/products.index.cfm/cid/1085/navid/206/parentid/182 The presentation will be followed by a demonstration of the laser-scanning microscope. You are welcome to bring samples that you would like to analyze. Presentation and demonstration by: Lee Bazella Territory Manager - San Jose, CA Micro-Imaging Division Olympus Industrial America Refreshments will be provided. -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Fri May 4 08:00:27 2007 From: shott at stanford.edu (John Shott) Date: Fri, 04 May 2007 08:00:27 -0700 Subject: Scheduled Coral downtime early Saturday morning (May 5) .... Message-ID: <463B4A8B.3070300@stanford.edu> An HTML attachment was scrubbed... URL: From mtang at stanford.edu Fri May 4 15:33:17 2007 From: mtang at stanford.edu (Mary Tang) Date: Fri, 04 May 2007 15:33:17 -0700 Subject: ASML News Message-ID: <463BB4AD.6020907@stanford.edu> Dear labmembers: Many of you have been waiting patiently (and some, less so). Finally, we are please to announce news about the ASML. First, we?d like to introduce you to the ASML team: Alex Fong (afong), Binder Mann (bindermann), and Michael Robles (mrobles.) Alex leads this group and has had many years of lithography experience using not only the ASML, but also Ultratech and Nikon. Binder has been with ASML for about nine years; previously she was at National Semiconductor. Michael is actually a biologist by training who has seen the light and become a process engineer. As of now, the ASML gang plans to be hereWednesdays through Fridays, starting at 7:30 am. If they aren?t in the lab (or exploring lunch options around campus), you?ll find them in the bull pen and CIS 145 where they?ve established home base. Please introduce yourselves if you haven?t already ? they are an extraordinarily friendly, extremely knowledgeable group and we are really looking forward to working with them on a continuing basis. And please join me in welcoming them to our lab. Second, news about the system itself: When a new ASML system is installed, there are a series of acceptance qualification tests that need to be run to ensure that everything is functioning to spec. Unfortunately, the system here is not passing all tests with flying colors. The installation engineers have been reluctant to release the system until the problems were fully understood, which is why plans have not yet been announced. The ASML team has confirmed that there some issues with the lens and have run tests which should quantify the extent of the problem and how it will be addressed ? the definitive results are due next week. In the meantime, they have also determined that the system is functional, definitely down to 0.8 microns, and very probably down to 0.7 microns. (The spec on this system is 0.45 microns.) Following the results of next week?s tests, parts will be ordered and repairs will be scheduled. Repairs are not likely to take place for many weeks and will requiring complete acceptance qualification protocols. In other words, the system may be unavailable at some future date for perhaps up to several weeks, but this will be planned and announced in advance. Third, what everyone wants to know about -- training... In the meantime, the ASML team has agreed that training can begin (hooray!!!) Training will be limited initially, until the team can get a better idea of user needs and the machine capability ? and how to tailor training for SNF. So, here?s the plan. The first session will be held next Wednesday and Thursday (5/9-5/10) from 10-12 in the lab. The next session will be the following Wednesday and Thursday (5/16-5/17) from 10-12. Two to three people will be accomodated in each session. To try to make the most of the ASML team?s efforts, for these sessions we will require the following: 1. Limit of one labmember from each research group. 2. The labmember must be qualified to use either the Nikon or the Ultratech and be an experienced user (>8 hours of independent use.) 3. The labmember must have immediate plans to layout a mask and use the machine. 4. The labmember must be willing to participate in process characterization efforts and share results. The reasons for these requirements is that we need to establish processes and procedures that will work at SNF ? and are hoping to use the engineering power of our most experienced and knowledgeable labmembers. As of now, the ASML has not yet been characterized on on 4? wafers nor is there a standard resist process. The ASML engineers will work with us on this, but contributions from the first trained users would speed things up. We also want to make sure that the first people who get trained on the system will make good use of this training (please note that only 65% of people who get trained on the nikon actually end up using it at all ? for this ASML ramp up/startup, the rate should be closer to 100%.) Please contact me or Paul Rissman if you would like to volunteer for this initial training. Please remember you must meet the requirements and be willing to represent your research group and contribute to the development efforts for this tool. Fourth, there will be an ASML/Maskmaking workshop here from 1-4 pm on Thursday, May 25, in the CISX Auditorium. ASML will give a 90 minute presentation describing the PAS 5500/60 system we have here and some special features these systems have over conventional steppers. This will be followed by another 90 minute presentation by Benchmark Technologies on the basics of mask layout and an overview of the capabilities of advanced reticle design. Everyone is invited to attend the workshop. Stay tuned for more details. As a final note, we have been hoping to have a truly advanced optical lithography tool here at SNF for many years. ASML is offering us a unique opportunity for access, not only to this tool, but to the expertise of a knowledgeable team of experienced engineers. In turn, they hope to learn from us about new applications for this tool and ways in which the technology can be pushed. This is just the start of what promises to be a great relationship. Please do give your feedback to the SNF and ASML staff as to how you would like to see this relationship progress in months and years to come. Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From shott at stanford.edu Sat May 5 08:29:07 2007 From: shott at stanford.edu (John Shott) Date: Sat, 05 May 2007 08:29:07 -0700 Subject: Coral upgrade complete ... Message-ID: <463CA2C3.5060604@stanford.edu> An HTML attachment was scrubbed... URL: From tberg at stanford.edu Tue May 8 08:00:08 2007 From: tberg at stanford.edu (Ted Berg) Date: Tue, 08 May 2007 08:00:08 -0700 Subject: Possible alarms on Thursday morning Message-ID: <46409078.2050108@stanford.edu> Hello All, On this Thursday morning we will be tying in new H2 sensors for the TEL system. This may cause temporary alarms during this process. We should not loose any gases. Thanks in advance . Ted From jhaydon at stanford.edu Tue May 8 16:55:12 2007 From: jhaydon at stanford.edu (Jim Haydon) Date: Tue, 08 May 2007 16:55:12 -0700 Subject: New Tubewash instalation Message-ID: <46410DE0.8060009@stanford.edu> Hello lab users, On Thursday 05/10/07 we will be receiving and installing a new (used) vertical tube wash in L119 behind the Thermco furnaces. This should happen in the late morning or early afternoon and should not cause any disruption in the lab. Thanks . Jim h From johnpaul at stanford.edu Wed May 9 09:56:16 2007 From: johnpaul at stanford.edu (John Paul) Date: Wed, 09 May 2007 09:56:16 -0700 Subject: University PhD dissertation Defense for John Paul Strachan Message-ID: <4641FD30.3040106@stanford.edu> * * * * * * * * * * * * *DEPARTMENT OF APPLIED PHYSICS* *UNIVERSITY PhD DISSERTATION DEFENSE* * * * * *Time-Resolved X-Ray Imaging of Spin Transfer Torque in Magnetic Nanostructures* * * * * *John Paul Strachan* * * *Research Advisor: Professor Joachim St?hr* * * * Thursday 10 May, 2007* *10:30 A.M.* * * *Center for Integrated Systems, Room 101* * * * * *ABSTRACT* * * *Spin-torque (or spin transfer torque) is a novel phenomenon involving the transfer of angular momentum from a spin-polarized current to a ferromagnet. There is much excitement in the use of this effect for developing non-volatile, high density magnetic RAM, as well as for DC current-driven microwave oscillators. Indeed, steady-state precessional modes as well as full magnetization reversal of nanoscale magnetic elements driven by spin-torque have been observed. These observations have been via giant magneto-resistance measurements, using a reference "fixed" magnetic layer, which also serves as the spin-polarizer. Given the experimental challenges in probing thin, buried nanomagnets, the detailed magnetic configuration of the element has remained unknown. I describe a high resolution, time-resolved x-ray microscopy technique to image directly the nanomagnet during the switching process. Motion pictures with 200 ps time resolution and 35 nm spatial resolution reveal that the process is based on the transient formation of a vortex configuration. A vortex is a magnetic pattern analogous to the wind pattern of a hurricane. The vortex moves across the magnetic element, driven by the spin-current and leaving behind a switched magnetization in its wake. A physical understanding of this novel mechanism is discussed, as well as the dependence on sample size and shape. It is seen that other switching mechanisms may dominate for smaller length scales.* -------------- next part -------------- An HTML attachment was scrubbed... URL: From clueth at stanford.edu Wed May 9 13:43:39 2007 From: clueth at stanford.edu (christopher lueth) Date: Wed, 9 May 2007 13:43:39 -0700 Subject: quartz etching Message-ID: All, I am trying to etch 100um deep channels with smooth (<1um roughness), vertical sidewalls in fused quartz. Does anyone know what the best way to do this is? I've read some things about using inductively coupled plasma-DRIE that have an aspect ratio (depth to width) of the sidewalls of >10. However, I haven't found any companies that could do this for me. I've also seen this done by laser etching and found a company, Translume, that can do this for me. However this is a little expensive $1000 for 3 pieces. Does anyone have any reccomendations or know any companies that could help me out? Thanks, Chris From elvislin at stanford.edu Wed May 9 19:07:34 2007 From: elvislin at stanford.edu (Elvis Der-Song Lin) Date: Wed, 9 May 2007 19:07:34 -0700 Subject: resource for wire bonding Message-ID: <20070510020706.4897B4C07F@smtp2.stanford.edu> Dear all labmemebers, have you happened to know any vendor or the resource on campus for wire bonding? I am looking for any other resource rather than Paulin in Ginzton building who is only available every Tuesday. thanks in advance, --------------------------------------------------- Elvis Der-Song Lin Stanford University Ginzton Lab. Stanford CA, 94305 e-mail: elvislin at stanford.edu mob tel.: (650) 862 8428 --------------------------------------------------- -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Thu May 10 09:17:19 2007 From: mbaran at stanford.edu (Maureen Baran) Date: Thu, 10 May 2007 08:17:19 -0800 Subject: Short Closure of ALL Bathrooms in the CIS Building Message-ID: <20070510161719.EF8184CD2F@smtp3.stanford.edu> There is a water leak in one of the bathrooms and maintenance needs to shut off the water to the entire building in order to fix the leak. They will turn off the water at 10:00A and it will be off until 10:30A. We apologize for any convenience. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bayoung at stanford.edu Thu May 10 10:46:58 2007 From: bayoung at stanford.edu (Betty Young) Date: Thu, 10 May 2007 10:46:58 -0700 Subject: Need Bismuth Film dep ASAP Message-ID: <20070510104658.f0ojldkpewgsk4os@webmail.stanford.edu> Hi All, I need to find a vendor who can e-beam or sputter bismuth. The underlying structures are Al and will need a light sputter-etch before Bi dep. Please send any suggestions as soon as possible to me. THANK YOU! Betty Young (Physics) bayoung at stanford.edu From mtang at stanford.edu Thu May 10 17:14:00 2007 From: mtang at stanford.edu (Mary Tang) Date: Thu, 10 May 2007 17:14:00 -0700 Subject: BEWARE OF WET CHEMICAL BOTTLES!!! Message-ID: <4643B548.4090101@stanford.edu> Dear wet bench users -- The Stockroom staff has brought to our attention the fact that sometimes, when they remove the empty bottles from the chemicals passthrough, they are wet -- on the OUTSIDE of the bottles. Sometimes, the liquid feels thick and viscous. Sometimes, the liquid smells very sharp.... This is completely unacceptable. It appears that some people are becoming careless in using chemicals. This careless behavior is endangering others -- not only our staff, but anyone who may be using the chemicals carts or chemicals pass through which may also become contaminated by the wet bottles. We only know too well that it is hard to find who is doing this -- and often the culprit doesn't even realize what he/she is doing. So please, please, PLEASE make sure to pour chemicals slowly and carefully to avoid splashing. If you do manage to drip chemical on the outside of the bottle, take it to wbgaas, where there is a large sink. Place it on the holey deck and spray it down with the DI hand sprayer. Use pH paper, if you like, to ensure the bottle is thoroughly rinsed. Make sure you screw the bottle cap firmly back onto the bottle, even on empty bottles --but especially on with chemicals. Make sure to place the bottle back in the correct location. If you have any questions, please ask a staff member. Remember that this is a shared facility -- everything you do has the potential to affect other lab and staff members. So that was my plea for sanity.... Now, here's the threat... The next time our stockroom staff is exposed to chemicals on the outside of bottle, I will randomly select two people from the labmembers who have enabled any wet bench using that chemical during the previous 24 hours -- who will help our stockroom staff run the bottle washer to clean empty bottles. Yes, I will even qualify them to use the bottle wash on Coral.... Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From leewy at stanford.edu Thu May 10 18:09:26 2007 From: leewy at stanford.edu (Wonyoung Lee) Date: Thu, 10 May 2007 18:09:26 -0700 Subject: Pb substrate References: <20070424105308.od0l7gud7w2s0osk@webmail.stanford.edu> Message-ID: <006c01c79369$04da6820$eb3140ab@leewyIBM> Hi all, Does anyone know the vendor who sells Pb substrate? I don't care the substrate size as long as it is more than a few mm. Thank you, Wonyoung Lee From mtang at stanford.edu Fri May 11 15:57:40 2007 From: mtang at stanford.edu (Mary Tang) Date: Fri, 11 May 2007 15:57:40 -0700 Subject: Optical Lithography Workshop, Thursday, May 25, 1-5 pm, CISX Auditorium Message-ID: <4644F4E4.5080301@stanford.edu> Labmembers: Announcing a special workshop on optical lithography, presented by ASML and Benchmark Technologies When: Thursday, May 24, 1-5 pm Where: Paul Allen Auditorium, CISX-101, Stanford University. ASML and SNF have joined in a partnership to bring access to new optical lithography capabilities to the broader labmember community. ASML is the world leader in advanced lithography systems and SNF is pleased to be able to facilitate access to these technologies for our labmembers. Benchmark Technologies is one of ASML's suppliers of specialized masks. This workshop will be the first of many which will consist of tutorials on topics ranging from beginning to advanced lithography methods and offer a chance for labmembers to interact with applications engineers. This first workshop will feature the capabilities of the new ASML PAS 5500/60 recently installed in our lab and an overview of mask technology. The agenda for this first workshop is as follows: Time 1:00 Overview/Introduction: ASML - Keith Best/Norbert Kappel 1:10 ASML PAS 5500 Technology Overview: ASML - Keith Best 2:00 Mask Technology Overview: Benchmark - Andy Zanzal 3:15 Coffee Break 3:30 ASML - Enabling Technologies: ASML - Keith Best 4:30 Q & A Session: All 5:00 End of Session Speakers: Keith Best, Director of Applications Development for ASML's SA/200mm Business Unit, ASML Norbert Kappel, Marketing manager, ASML Special Applications, ASML Andrew Zanzal, Vice President of Sales, Benchmark Technologies Attendees will be eligible for door prizes, generously provided by Benchmark Technologies (Handbook of Photomask Manufacturing Technology, ed. S. Rizvi and Photomask Fabrication Technology, by B.G. Eynon & B. Wu.) -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Fri May 11 16:15:15 2007 From: mtang at stanford.edu (Mary Tang) Date: Fri, 11 May 2007 16:15:15 -0700 Subject: Correction: Optical Lithography Workshop, Thursday, May 24 Message-ID: <4644F903.6020902@stanford.edu> Sorry all, it's Thursday, May 24th (not 25th.) -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An embedded message was scrubbed... From: Mary Tang Subject: Optical Lithography Workshop, Thursday, May 25, 1-5 pm, CISX Auditorium Date: Fri, 11 May 2007 15:57:40 -0700 Size: 2429 URL: From mtang at stanford.edu Fri May 11 16:30:43 2007 From: mtang at stanford.edu (Mary Tang) Date: Fri, 11 May 2007 16:30:43 -0700 Subject: BEWARE OF WET CHEMICAL BOTTLES!!! In-Reply-To: <4643B548.4090101@stanford.edu> References: <4643B548.4090101@stanford.edu> Message-ID: <4644FCA3.3070703@stanford.edu> Sigh.... It looks I will have to make good on a threat... Reports are that this morning was OK. But this afternoon, THREE sulfuric acid bottles were found dripping with acid on the outsides of the bottles. Two victims, oops, I mean, "labmembers" were chosen by a nonlabmember third party to be informed that they will be helping with bottle washing next week.... Stop endangering our staff. STOP IT!! Be careful with your chemical handling. Mary Mary Tang wrote: > Dear wet bench users -- > > The Stockroom staff has brought to our attention the fact that > sometimes, when they remove the empty bottles from the chemicals > passthrough, they are wet -- on the OUTSIDE of the bottles. > Sometimes, the liquid feels thick and viscous. Sometimes, the liquid > smells very sharp.... This is completely unacceptable. > > It appears that some people are becoming careless in using chemicals. > This careless behavior is endangering others -- not only our staff, > but anyone who may be using the chemicals carts or chemicals pass > through which may also become contaminated by the wet bottles. > > We only know too well that it is hard to find who is doing this -- and > often the culprit doesn't even realize what he/she is doing. > > So please, please, PLEASE make sure to pour chemicals slowly and > carefully to avoid splashing. If you do manage to drip chemical on > the outside of the bottle, take it to wbgaas, where there is a large > sink. Place it on the holey deck and spray it down with the DI hand > sprayer. Use pH paper, if you like, to ensure the bottle is > thoroughly rinsed. Make sure you screw the bottle cap firmly back > onto the bottle, even on empty bottles --but especially on with > chemicals. Make sure to place the bottle back in the correct > location. If you have any questions, please ask a staff member. > Remember that this is a shared facility -- everything you do has the > potential to affect other lab and staff members. > > So that was my plea for sanity.... Now, here's the threat... The > next time our stockroom staff is exposed to chemicals on the outside > of bottle, I will randomly select two people from the labmembers who > have enabled any wet bench using that chemical during the previous 24 > hours -- who will help our stockroom staff run the bottle washer to > clean empty bottles. Yes, I will even qualify them to use the bottle > wash on Coral.... > > Thanks for your attention -- > > Mary > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From patlu at Stanford.EDU Fri May 11 16:51:47 2007 From: patlu at Stanford.EDU (Patrick Lu) Date: Fri, 11 May 2007 16:51:47 -0700 Subject: single-side KOH etching? Message-ID: <5ef4413c0705111651t7e68aa3anc262c27f2f3758e3@mail.gmail.com> Hi, I was wondering if people had suggestions for where to get wafer holders that can accommodate single-side KOH etching of Si wafers. I need something to protect one side of my 4" wafer while I do a wet etch on the other. I know I've seen these before in the clean room but I can't for the life of me remember which company supplied them. Thanks! Patrick -------------- next part -------------- An HTML attachment was scrubbed... URL: From mmlee at stanford.edu Mon May 14 07:31:20 2007 From: mmlee at stanford.edu (Meredith M. Lee) Date: Mon, 14 May 2007 07:31:20 -0700 Subject: Stanford OSA Seminar Series and demo: Photonics CAD simulation - Thursday 5/17/2007 4:00pm AP299 Message-ID: <9fa245520705140731j1301bb49pd122ca218f84a83e@mail.gmail.com> The student OSA chapter is pleased to announce a talk given by Dr. Richard J. Black from OptoSapiens Design. Please see details below. -------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------- Structural Invention & Optimized Design of Lightwave Circuits and Devices: Tapered Lightguides and Photonic Crystals Richard J. Black Founder of OptoSapiens Design (www.optosapiens.com) & Representative for Photon Design (www.photond.com) Thursday, May 17th, 2007 4:00pm.Applied Physics Building, Room 299 Demo/Q&A from 3:00-4:00pm & 5:00-5:30pm, AP 299 Abstract State-of-the-art multi-parameter design optimization - local and global - can both facilitate the development of innovative lightguiding structures and drastically reduce the design cycle times for photonic devices and circuits. As an illustrative example we consider application to tapered lightguide injectors coupling into compact photonic crystal micro-circuits involving y-junctions and bends. We also show how appropriate choice of electromagnetic field propagation engines such as the Eigen-Mode Expansion (EME), the Finite-Difference Time Domain (FDTD) and other methods can facilitate the understanding of the physics of electromagnetic field propagation considering modal interferometry and the adiabatic and sudden approximation limits. The approach is particularly valuable from the educational and research viewpoints as well as helpful in practical industrial device optimization. Dr. Black will be available in AP 299 before and after the seminar to demonstrate Photon Design software and answer questions. The software includes CrystalWave and OmniSim (using general purpose time-domain and frequency-domain solvers, as well as FIMMWAVE (a power mode solver), FIMMPROP (wave propagation using Eigen-Mode Expansion (EME)), Kallistos (state-of-the-art optimization), and Cladiss (for semiconductor laser modeling). Biography Dr. Richard J. Black obtained his PhD in optical fiber and waveguide modeling from the Australian National University (ANU) in 1984 and has spent the subsequent 23 years in academia and industry working with leading international groups in photonics in telecom, sensing and optical signal processing applications. For example, Richard researched and taught at the Ecole Polytechnique de Montreal pioneering work on tapered and fused fiber components, was Invited Professor at the Swiss Federal Institute of Technology, has held visiting positions at Stanford, University of Arizona, ANU, Universite di Padova, CNET, etc., and has worked with a range of start-up and other companies in Silicon Valley and elsewhere. In addition to his work at the device modeling level with Photon Design, Richard also works on optical fiber sensor systems as Chief Scientist for Intelligent Fiber Optic Systems which produces fiber Bragg grating sensor interrogators and Raman-based distributed temperature sensor systems. This seminar also owes much to Richard's colleagues at Photon Design, especially (1) Founder & CEO, Dr. Dominic Gallagher (a laser physicist) who did his PhD at Cambridge University, UK followed by work on optical logic and gain switching, and two years at the Fraunhofer Institute, helping to develop some of the world's fastest laser diodes and also working on inter-sub-band photodetectors, before founding Photon Design in 1991, and (2) Dr. Tom Felici (a mathematician) who did his Cambridge PhD in magnetohydrodynamics followed by 8 years lecturing in optimization theory before joining Photon Design to lead development of FIMMPROP & Kallistos. --++**==--++**==--++**==--++**==--++**==--++**==--++**== studentosa mailing list studentosa at lists.stanford.edu https://mailman.stanford.edu/mailman/listinfo/studentosa -------------- next part -------------- An HTML attachment was scrubbed... URL: From bongsang at stanford.edu Mon May 14 18:12:46 2007 From: bongsang at stanford.edu (Bongsang Kim) Date: Mon, 14 May 2007 18:12:46 -0700 Subject: Ph.D. Dissertation Defense (May 21st, Monday) - Bongsang Kim Message-ID: <74f115fb0705141812l158e2861m29ff31b879a3ccad@mail.gmail.com> Ph.D. Oral Examination, Stanford University Stability and Performance of Wafer-scale Thin-film Encapsulated MEMS Resonators Bongsang Kim Advisor : Professor Thomas W. Kenny Co-Advisor : Professor Roger T. Howe Date : Monday, May 21st, 2007 Time : 9AM (Refreshments served at 8:45 AM) Place : CISX 101 (Auditorium) Abstract Silicon resonators are one of the most promising devices due to their potential application as frequency references in electronic circuits. Reduced size and batch fabrication will make silicon resonators cost effective compared to the quartz oscillators which are the most widely used as circuit frequency references. While there have been many breakthroughs in the field of MEMS resonators, the problem of packaging is yet to be solved. The stability of the resonant frequency over time is absolutely essential for use as a frequency reference, and the frequency stability depends on the quality of the package environment. This work presents the stability and performance of MEMS resonators packaged in wafer-scale thin-film encapsulation process, called 'epi-seal'. This encapsulation is formed by depositing polycrystalline silicon at CMOS clean and extremely high temperature (~980?C) environment. Mechanical robustness of the encapsulation provide MEMS resonators extremely high yield even after harsh post processing, such as wafer sawing and wire bonding. During more than 1 year of operation, resonant frequencies of these encapsulated resonators were stable in ppm level drift. This commercial level stability was achieved with the help of the secured operating environment provided by the cleanliness and hermeticity of the 'epi-seal' encapsulation. For further optimization of encapsulation design, diffusive gas species and diffusion paths were investigated by 400?C accelerated diffusion experiment. In addition, the other efforts to develop commercial level high performance MEMS resonators are presented. Quality Factor, Q is a description of energy loss of resonators, which is very important for designing oscillator circuits with the resonators. The temperature dependence of various energy losses is investigated. The quality factor of MEMS resonators can be engineered to be either a strong or a weak function of temperature. Especially for 'oven-based' active temperature compensation, strong temperature dependent Q can be used as an effective, direct, and delayless measure of temperature of resonators. To achieve temperature stability, silicon dioxide, which becomes stiffer as temperature increases while silicon becomes softer, can be used as compensating material. Si-SiO2 composite resonators were successfully fabricated inside modified 'epi-seal' encapsulation. These encapsulated Si-SiO2 composite resonators showed more than 20x improvement in temperature stability. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon May 14 18:32:43 2007 From: mtang at stanford.edu (Mary Tang) Date: Mon, 14 May 2007 18:32:43 -0700 Subject: Toxic Gas Alarm, 5/14/07 Message-ID: <46490DBB.8050104@stanford.edu> Hi all -- As you may know, a toxic gas alarm went off and caused evacuation of the lab (though not the building.) It appears that it wasn't an actual toxic that was detected, but rather that the burnbox which treats the exhaust from the LP furnaces may have been overloaded. The LPCVD furnaces have been shutdown on Coral until the burnbox can be investigated. Otherwise, the lab is safe to occupy. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From closega at stanford.edu Fri May 18 12:15:31 2007 From: closega at stanford.edu (Gael Close) Date: Fri, 18 May 2007 12:15:31 -0700 Subject: UV-ozone cleaning Message-ID: <1e089c430705181215p3ce8feb4w6496f1ed4182fc12@mail.gmail.com> Dear labmembers, I would like to clean the surface of my sample using UV-ozone cleaning. Do we have this capability at SNF? I know that commercial systems are available http://www.jelight.com/uvo-ozone-cleaning.php Is there anything similar at SNF, or elsewhere on campus? Thank you, -Gael -- Gael Close PhD Candidate Center for Integrated Systems, CISX-300 Stanford University, California +1-650-450-3567 From mahnaz at stanford.edu Fri May 18 16:44:38 2007 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 18 May 2007 16:44:38 -0700 Subject: SVG and EVG aligner up date Message-ID: <464E3A66.6000609@stanford.edu> Hello all, Gary worked on the prime station of Svgcoat2 all day We tested the contact angle of the si wafers and is around 34.5 to 35.5 degree, please note that we do not have a historical data on this but we think that there is a mechanical problem wit the track. Gary would follow up on this next week. I did ran two wafers which got primed on the track and ran it trough EV aligner they came out ok ( no lifting was observed, I used the resolution mask). I still be hesitant to totally give you the green light. Please try to use the YES oven especially with different kind of substrate., do not take a chance till we give you more information. Mario worked on the EV aligner. He cleaned the ellipsoidal mirror and realigned the lamp and tested the lamp uniformity, all good. We need to order the mirror and I would do that on Monday ( I wrote it on my calendar). I did test the system 1 Um resist for all these tests Si wafer yes oven hard contact 1.1 second exposure 1.5 resolved but the right side minim 2 um slight under expose. Si wafer prime /svgcoat2 same condition as above 1.5 um resolved but the right side minim 2.5 um slight underexpose. Si wafer yes oven vac. contact 1.3 second of exposure 1/1.5 um resolved right side still little problematic. so 1.2 to 1.4 would be the best exposure as of right now. why do I see so many Teflon cassettes out of their boxes? Please keep the place clean and tidy. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Sat May 19 08:18:21 2007 From: shott at stanford.edu (John Shott) Date: Sat, 19 May 2007 08:18:21 -0700 Subject: Power failure .... Message-ID: <464F153D.3040700@stanford.edu> An HTML attachment was scrubbed... URL: From bongsang at stanford.edu Sun May 20 01:55:38 2007 From: bongsang at stanford.edu (Bongsang Kim) Date: Sun, 20 May 2007 01:55:38 -0700 Subject: Reminder : PhD Oral defense (Bongsang Kim) , 5/21, Monday 9am CISX-auditorium Message-ID: <74f115fb0705200155xe7c93d3h7041b231659d651d@mail.gmail.com> Hi all, This is the reminder for my PhD Oral defense, this Monday 9am at CISX auditorium. You can download the summary slides under following link. http://www.stanford.edu/~bongsang/defense_slide/BK_PhD_Defense_Slides_Summary.pdf Best regards, Bongsang Ph.D. Oral Examination, Stanford University Title : Stability and Performance of Wafer-scale Thin-film Encapsulated MEMS Resonators Ph.D. Candidate : Bongsang Kim Advisor : Professor Thomas W. Kenny Co-Advisor : Professor Roger T. Howe Date : Monday, May 21st, 2007 Time : 9AM (Refreshments served at 8:45 AM) Place : CISX 101 (Auditorium) Abstract Silicon resonators are one of the most promising devices due to their potential application as frequency references in electronic circuits. Reduced size and batch fabrication will make silicon resonators cost effective compared to the quartz oscillators which are the most widely used as circuit frequency references. While there have been many breakthroughs in the field of MEMS resonators, the problem of packaging is yet to be solved. The stability of the resonant frequency over time is absolutely essential for use as a frequency reference, and the frequency stability depends on the quality of the package environment. This work presents the stability and performance of MEMS resonators packaged in wafer-scale thin-film encapsulation process, called 'epi-seal'. This encapsulation is formed by depositing polycrystalline silicon at CMOS clean and extremely high temperature (~980?C) environment. Mechanical robustness of the encapsulation provide MEMS resonators extremely high yield even after harsh post processing, such as wafer sawing and wire bonding. During more than 1 year of operation, resonant frequencies of these encapsulated resonators were stable in ppm level drift. This commercial level stability was achieved with the help of the secured operating environment provided by the cleanliness and hermeticity of the 'epi-seal' encapsulation. For further optimization of encapsulation design, diffusive gas species and diffusion paths were investigated by 400?C accelerated diffusion experiment. In addition, the other efforts to develop commercial level high performance MEMS resonators are presented. Quality Factor, Q is a description of energy loss of resonators, which is very important for designing oscillator circuits with the resonators. The temperature dependence of various energy losses is investigated. The quality factor of MEMS resonators can be engineered to be either a strong or a weak function of temperature. Especially for 'oven-based' active temperature compensation, strong temperature dependent Q can be used as an effective, direct, and delayless measure of temperature of resonators. To achieve temperature stability, silicon dioxide, which becomes stiffer as temperature increases while silicon becomes softer, can be used as compensating material. Si-SiO2 composite resonators were successfully fabricated inside modified 'epi-seal' encapsulation. These encapsulated Si-SiO2 composite resonators showed more than 20x improvement in temperature stability. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon May 21 15:26:04 2007 From: mtang at stanford.edu (Mary Tang) Date: Mon, 21 May 2007 15:26:04 -0700 Subject: Gowning Room Detour, Friday, 5/25/07 Message-ID: <46521C7C.7040208@stanford.edu> Hi everyone -- Good news -- and bad. The good: the old, worn blue Dycem flooring in the gowning room will be replaced on Friday, May 25, starting at 7:30 am. The bad: this means the gowning room will be inaccessible during this time. The plan: Gowning room entry will be temporarily routed through the service area (behind the furnaces, near the maintenance office area.) An ample number of visitor bunnysuits (unassigned) will be made available in the service area. Personal bunnysuits will be wrapped and removed from the gowning area while floor replacement is taking place, and so will be temporarily unavailable. If you really, REALLY want to use your OWN bunnysuit and plan to be in the cleanroom Friday morning, there will be instructions posted in the cleanroom Thursday morning. The project should be done by lunchtime Friday, although they have allocated up to 6 hours for completion. (Volunteers to help pack, unpack, and clean are welcome.) We apologize for the inconvenience, but trust that the gowning room will be a cleaner, neater place as a result! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From erik.anderson at stanford.edu Mon May 21 22:38:13 2007 From: erik.anderson at stanford.edu (Erik Anderson) Date: Mon, 21 May 2007 22:38:13 -0700 Subject: die photograph Message-ID: <465281C5.2080608@stanford.edu> Hi all, I need a die photograph of my IC. Does anyone have any recommendations for places on campus to take a photo of it? Thanks. Erik From shott at stanford.edu Tue May 22 07:40:11 2007 From: shott at stanford.edu (John Shott) Date: Tue, 22 May 2007 07:40:11 -0700 Subject: die photograph In-Reply-To: <465281C5.2080608@stanford.edu> References: <465281C5.2080608@stanford.edu> Message-ID: <465300CB.6030708@stanford.edu> An HTML attachment was scrubbed... URL: From mtang at stanford.edu Wed May 23 09:00:12 2007 From: mtang at stanford.edu (Mary Tang) Date: Wed, 23 May 2007 09:00:12 -0700 Subject: Reminder: ASML/Benchmark Litho Workshop, Thursday, 5/24/07, 1 pm Message-ID: <4654650C.9020008@stanford.edu> Hi everyone! Just a reminder of the Litho Workshop to be held Thursday, 5/24, starting at 1 pm, in the CISX Auditorium. There will be refreshments and door prizes (cool ones! electronic accessories and books), not to mention a great intro to advanced litho methods and the new ASML program at SNF. http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:2728:200705:pinneobcgncifbjlgoai Your SNF staff -- -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mahnaz at stanford.edu Wed May 23 15:13:23 2007 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Wed, 23 May 2007 15:13:23 -0700 Subject: Laurell Bench Message-ID: <4654BC83.2090907@stanford.edu> Hello all, This morning Mario found a big puddle of resist mixed with acetone underneath the laurell bench. Actually he did pm the bench few days earlier and everything was cleaned. I like to bring to everyones attention that the laurell bench is not designed for transferring resist from big bottles to beakers, this process needs to be done at SOLVENT BENCH ONLY. Secondly, I appreciate the cleaning part but we are not suppose to spray the bench with acetone. In order to clean the bench, Spray wipes with acetone and then wipe down the surface area and always be cautious of the hot plates ( make sure that no sample is on the hot plates). Questions and concerns please see Uija or me. Mahnaz From harris at snow.stanford.edu Wed May 23 20:38:02 2007 From: harris at snow.stanford.edu (James Harris) Date: Wed, 23 May 2007 20:38:02 -0700 Subject: BCB/polyimide process In-Reply-To: <20070523145625.0j6nk25m8v4koc0g@webmail.stanford.edu> References: <20070523145625.0j6nk25m8v4koc0g@webmail.stanford.edu> Message-ID: Mathilde, Hong Liu, one of my former students did some form of polyimde planarizing for high speed modulators. You should look at her thesis for possible recipes and if you don't see what you need, I can contact her and she is still local, so might even be able to come bye some afternoon/evening and look at what you are doing and make suggestions. The other former student who might have useful ideas is Chien Chung Lin and he is also still local. Let me know if you would like me to contact any of these people or you need their theses. Coach At 2:56 PM -0700 5/23/07, mgobet at stanford.edu wrote: >Hello, > >I am looking into planarizing 5 to 10 um height mesas, either with >BCB or polyimide (photosensitive or etchable). I was wondering if I >could borrow some BCB or polyimide from somebody to first try my >processing. Also, if somebody is interested in sharing BCB or >polyimide in the long run, we could split the cost of the material >as they are very expensive chemicals. > >I will also appreciate any advice regarding using any of these >materials, or processing recipes. Thanks in advance for your help. > >Best regards, >Mathilde > >!DSPAM:4654bd2a186912052816694! -- James S. Harris, '64 James & Ellenor Chesebrough Professor E-Mail:Harris at snow.stanford.edu Department of Electrical Engineering http://www-ee.stanford.edu/~harris/ 420 Via Ortega, CIS-X Rm 328 Ph: (650)723-9775 Stanford, CA 94305-4075 Fax: (650)723-4659 Adm. Asst.: Gail Chun-Creech Ph: (650)723-0983 __ ___ | | |__| __ arris Group, Solid State & Photonics Lab __| |__ http://www-snow.stanford.edu/ From mtang at stanford.edu Thu May 24 09:01:48 2007 From: mtang at stanford.edu (Mary Tang) Date: Thu, 24 May 2007 09:01:48 -0700 Subject: Optical Litho Workshop Message-ID: <4655B6EC.50306@stanford.edu> Hi all -- Just a reminder that the Litho workshop, featuring ASML and Benchmark, takes place this afternoon (Thursday) starting at 1 pm in the Paul Allen CISX Auditorium. For more details, see: http://snf/.stanford.eduAffiliates/LithoWorkshop/index.html Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mgobet at stanford.edu Wed May 23 14:56:25 2007 From: mgobet at stanford.edu (mgobet at stanford.edu) Date: Wed, 23 May 2007 14:56:25 -0700 Subject: BCB/polyimide process Message-ID: <20070523145625.0j6nk25m8v4koc0g@webmail.stanford.edu> Hello, I am looking into planarizing 5 to 10 um height mesas, either with BCB or polyimide (photosensitive or etchable). I was wondering if I could borrow some BCB or polyimide from somebody to first try my processing. Also, if somebody is interested in sharing BCB or polyimide in the long run, we could split the cost of the material as they are very expensive chemicals. I will also appreciate any advice regarding using any of these materials, or processing recipes. Thanks in advance for your help. Best regards, Mathilde From ofidaner at stanford.edu Thu May 24 11:07:49 2007 From: ofidaner at stanford.edu (Onur Fidaner) Date: Thu, 24 May 2007 11:07:49 -0700 Subject: BCB/polyimide process In-Reply-To: <20070523145625.0j6nk25m8v4koc0g@webmail.stanford.edu> References: <20070523145625.0j6nk25m8v4koc0g@webmail.stanford.edu> Message-ID: <6.0.1.1.2.20070524105421.00b96b90@ofidaner.pobox.stanford.edu> Mathilde, We've done some work on BCB processing some time ago. You can check the link below for a paper of ours that includes our recipe as well. One suggestion about the chemical: Dow chemical (supplier of BCB) guarantees a shelf life of at least one year from the date you purchase. Though, if you ask them they may be able to provide you with an extended one so you have a chance to use it longer. Also, we've used the chemical up to two years past the expiration date and still got satisfactory results for 2 um mesas. We used headway to spin the chemical and then the bluem oven for the anneal cycle described in the data sheet. We found it useful to protect the backside of the wafer/piece with some blue sticky tape during spinning to avoid cleaning later. Thanks, Onur Fidaner the paper: http://ieeexplore.ieee.org/iel5/66/30318/01393058.pdf?tp=&arnumber=1393058&isnumber=30318 At 02:56 PM 5/23/2007, you wrote: >Hello, > >I am looking into planarizing 5 to 10 um height mesas, either with BCB >or polyimide (photosensitive or etchable). I was wondering if I could >borrow some BCB or polyimide from somebody to first try my processing. >Also, if somebody is interested in sharing BCB or polyimide in the >long run, we could split the cost of the material as they are very >expensive chemicals. > >I will also appreciate any advice regarding using any of these >materials, or processing recipes. Thanks in advance for your help. > >Best regards, >Mathilde From mtang at stanford.edu Thu May 24 16:17:39 2007 From: mtang at stanford.edu (Mary Tang) Date: Thu, 24 May 2007 16:17:39 -0700 Subject: Reminder: Gowning room closure, Friday am, 5/25 Message-ID: <46561D13.90706@stanford.edu> Hi everyone -- Just a reminder that the gowning room will be temporarily closed Friday morning (5/25) from 7 am to replace the blue Dycem flooring. Cleanroom entry will be routed through the service area during this time. Visitor bunnysuits will be available there. If you want to use your own bunnysuit, please pack your suit (booties separately) before 7 am Friday in a ziplock plastic bag and label it with your coral login. You may leave the suit in the labeled bin in the gowning room and it will be placed in the service area Friday morning. We apologize for the inconvenience. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From nishiy at stanford.edu Thu May 24 19:56:06 2007 From: nishiy at stanford.edu (Yoshio Nishi) Date: Thu, 24 May 2007 19:56:06 -0700 Subject: FW: Collection of Publications Message-ID: <200705250256.l4P2u9WP014579@smtp-roam.Stanford.EDU> Dear SNF users, We have been asked to submit a list of publications coming out from SNF users to NSF to demonstrate research supported by NNIN funded infrastructures. As we will soon start preparing for the renewal of NNIN, I would like to ask your active collaboration to provide us with your list of publications in the following 5 categories. 1. External User Peer-Reviewed Archival Journal Publications 2. Internal User Peer-Reviewed Archival Journal Publications 3. External User Conference Presentations 4. Internal User Conference Presentations 5. Other major publications items, e.g. books, short courses, etc. Please send your list for the corresponding categories to Yoshio Nishi (nishiy at stanford.edu), John Shott (shott at snf.stanford.edu) and Paul Rissman (Rissman at stanford.edu) before the end of June. Thank you in advance for your great support on this matter. Regards, Yoshio Nishi ---------- From: Lynn Rathbun [mailto:rathbun at cnf.cornell.edu] Sent: Thursday, May 24, 2007 12:46 PM To: NNIN directors :; nnin coordinators :; nnin nac : Subject: Collection of Publications Dear NNIN folks: As in the past year, at the end of the school year we are collecting a comprehensive list of publications in peer-reviewed journals, presentations at conferences, and other major publication-oriented activity. This effort is one of the tangible outputs demonstrating research supported by NSF funding, and one of the measures of each sites contributions. I would particularly add to it the importance of making sure that the external usersresearch effort is comprehensively reflected. This is also a good occasion to remind all users that NNIN and NSFs support is properly acknowledged in the publications and presentations. This is a once in a year activity. The list will cover June 1, 2006-May 30, 2007 period and is due July 31, 2007. This is 2 months from now so it should give you adequate time to COLLECT and FORMAT these. I expect you will have to poll all your users to collect this information. Please stick to the date range indicated and do not resubmitt items submitted last year. Since we will be writing our renewal proposal before the NEXT time we collect publications, this will be come part of the documentation for our renewal. The collection is divided into the following parts: Please submit 5 separate sections, in order, in ONE FILE by SRS. The SRS will be sent out later today. If any work is invited, please identify it as Invited Paper. Please do not include university talks, or small workshop talks, etc. We will adopt AIPs reference style, but will also include the title of the publication. A comprehensive style manual is available at http://www.aip.org/pubservs/style/4thed/toc.html . Example of a journal publication: J.J. Amato, R.R. Rahimgar and A. Mastrangelo, Chaos in Nanosystems,Phys. Rev. Lett. 21, 1709 (2005). Example of a conference presentation/publication: J.J. Amato, R.R. Rahimgar and A. Mastrangelo, Chaos in Nanosystems,Seventh IEEE Conference on Complex Systems, Atlanta, GA, 163 (2006). Please it is YOUR RESPONSIBILITY to properly format ALL citations as shown. Lynn ********************************************************** Dr. Lynn Rathbun Rathbun at cnf.cornell.edu NNIN Program Manager (607)-254-4872 CNF Laboratory Manager Duffield Hall (607)-255-8601 Fax Cornell University (607)-592-1549 Cell Ithaca, New York 14853 -------------- next part -------------- An HTML attachment was scrubbed... URL: From thfung at stanford.edu Fri May 25 18:03:15 2007 From: thfung at stanford.edu (Tracy H Fung) Date: Fri, 25 May 2007 18:03:15 -0700 Subject: Co-polymer Lithography? Message-ID: <20070525180315.afty7yhuyc74wkog@webmail.stanford.edu> Hi, I'm working on a project and hoping to use co-polymer lithography technique to pattern periodic high aspect ratio nanopillars. Does anyone know if this can be done in the SNF? And is there anyone around able to share their process or help us gain some insight? Thanks! __________________________________ Tracy H. Fung From mgobet at stanford.edu Tue May 29 14:10:00 2007 From: mgobet at stanford.edu (mgobet at stanford.edu) Date: Tue, 29 May 2007 14:10:00 -0700 Subject: Sharing costs of BCB Message-ID: <20070529141000.3odj9s3275s4kk0o@webmail.stanford.edu> Hello, I am about to order BCB, Cyclotene 3022-57, together with another labmember, Deji. We are wondering if somebody else is interested in buying this product with us to further split the costs. The order is for 1 liter bottle, which is a large quantity as we only need a few droplets per wafer. As you may know, BCB is very expensive, so this may be a very good opportunity to get some at a cheaper price. Please let us know by tomorrow if you are interested. Thanks. Best, Mathilde From jkoma at stanford.edu Tue May 29 16:06:27 2007 From: jkoma at stanford.edu (Jason Komadina) Date: Tue, 29 May 2007 16:06:27 -0700 Subject: PDMS on Mylar? Message-ID: <465CB1F3.5060203@stanford.edu> Does anyone have or know someone with experience depositing PDMS on Mylar? The process I'm looking for info on just uses the Mylar as a temporary substrate/backing material. I plan to lay the PDMS on another surface and peel the Mylar off. Thanks, Jason From mehdij at stanford.edu Wed May 30 11:28:46 2007 From: mehdij at stanford.edu (Mehdi Javanmard) Date: Wed, 30 May 2007 11:28:46 -0700 Subject: bonding pdms with gold or platinum Message-ID: <20070530112846.oxg2vzwy9wggwkck@webmail.stanford.edu> Hello everybody, I was wondering if any of you have any experience in bonding pdms with gold or platinum. I've fabricated some fluidic channels with gold electrodes at the bottom, and when I inject fluid into the channels, I get leakage in the area where pdms and gold should have been bonded together. i was wondering if any of you have any suggestion as to how to get around this problem. Are there other metals like platinum that would bond better, or can gold be modified to solve this problem. thanks, Mehdi From amanu at stanford.edu Thu May 31 09:15:34 2007 From: amanu at stanford.edu (Manu Agarwal) Date: Thu, 31 May 2007 09:15:34 -0700 Subject: Manu Agarwal, University Oral Exam Announcement Message-ID: <021301c7a39e$eaf31d30$06ba0c80@Coupled> Stanford University Oral Exam: Manu Agarwal, Department of Electrical Engineering Date/Time: June 4th 2007, 9:30AM Location: Packard 101 Thesis title: Impact of Nonlinearities and External Accelerations in Electrostatic MEMS Resonators ABSTRACT: Electrostatically transduced Micro-Electro-Mechanical-System (MEMS) resonators are being viewed as a viable replacement for quartz crystal resonator technology for the multi-billion dollar timing and frequency reference market. Single-crystal-Si MEMS resonators have been shown to exhibit frequency stability over temperature and over long time periods (long term stability or aging) that is comparable to mass produced state-of-the-art quartz crystal resonators. Several efforts to commercialize this technology are already underway. In this work, we have investigated some of the mechanisms that limit the phase/frequency noise performance of these resonators. Sensitivity of resonant frequency to acceleration leads to frequency noise, as random environmental vibrations (random accelerations) are always present in real world applications. We have investigated the acceleration sensitivity in a double ended tuning fork resonator and have found this sensitivity for our design to be comparable to quartz. The impact of the noise from the electronics has also been investigated. One of the biggest challenges of this technology, compared to quartz, is to achieve large signal current handling capability. The signal current handling is limited by force nonlinearities in the resonator. This limitation causes reduction in the achievable signal-to-noise-ratio (SNR), thereby limiting performance. Several mechanisms are responsible for force nonlinearities, such as structural stiffening and electrostatic softening. We have developed lumped nonlinear analytical models for these resonators, and have verified them experimentally. Using these models, optimization of the resonator parameters to increase the SNR has been shown. Impact and tradeoffs in scaling of physical parameters like size, frequency and parallel plate gap size have been investigated. We find that several conclusions are at departure from recommendations that come from linear modeling of the device, and these discrepancies are discussed. The developed nonlinear models help better understand the interaction of the mechanical devices with electronic circuits, and aid in developing high precision MEMS-based frequency reference oscillators. -------------- next part -------------- An HTML attachment was scrubbed... URL: From amanu at stanford.edu Thu May 31 09:41:53 2007 From: amanu at stanford.edu (Manu Agarwal) Date: Thu, 31 May 2007 09:41:53 -0700 Subject: Ph.D. Dissertation Defence (June 4th, 2007) - Manu Agarwal Message-ID: <028a01c7a3a2$97ee1320$06ba0c80@Coupled> ************************************************************** Stanford University Oral Exam: Manu Agarwal, Department of Electrical Engineering Date/Time: June 4th 2007, 9:30AM Location: Packard 101 http://campus-map.stanford.edu/index.cfm?ID=04-030 Thesis title: Impact of Nonlinearities and External Accelerations in Electrostatic MEMS Resonators ABSTRACT: Electrostatically transduced Micro-Electro-Mechanical-System (MEMS) resonators are being viewed as a viable replacement for quartz crystal resonator technology for the multi-billion dollar timing and frequency reference market. Single-crystal-Si MEMS resonators have been shown to exhibit frequency stability over temperature and over long time periods (long term stability or aging) that is comparable to mass produced state-of-the-art quartz crystal resonators. Several efforts to commercialize this technology are already underway. In this work, we have investigated some of the mechanisms that limit the phase/frequency noise performance of these resonators. Sensitivity of resonant frequency to acceleration leads to frequency noise, as random environmental vibrations (random accelerations) are always present in real world applications. We have investigated the acceleration sensitivity in a double ended tuning fork resonator and have found this sensitivity for our design to be comparable to quartz. The impact of the noise from the electronics has also been investigated. One of the biggest challenges of this technology, compared to quartz, is to achieve large signal current handling capability. The signal current handling is limited by force nonlinearities in the resonator. This limitation causes reduction in the achievable signal-to-noise-ratio (SNR), thereby limiting performance. Several mechanisms are responsible for force nonlinearities, such as structural stiffening and electrostatic softening. We have developed lumped nonlinear analytical models for these resonators, and have verified them experimentally. Using these models, optimization of the resonator parameters to increase the SNR has been shown. Impact and tradeoffs in scaling of physical parameters like size, frequency and parallel plate gap size have been investigated. We find that several conclusions are at departure from recommendations that come from linear modeling of the device, and these discrepancies are discussed. The developed nonlinear models help better understand the interaction of the mechanical devices with electronic circuits, and aid in developing high precision MEMS-based frequency reference oscillators. -------------- next part -------------- An HTML attachment was scrubbed... URL: