Ti RIE

Wei Hu mse.whu at stanford.edu
Tue Nov 6 17:21:42 PST 2007


Dear labmembers,

I am thinking of using PMMA as mask to dry etch Ti. Does anybody have 
experience or know a chemistry that gives the best selectivity to 
minimize the lateral erosion? Thanks a lot.

Best,

Wei

Wei Hu
PhD candidate
Materials Science & Engineering
Stanford University
Tel: (650)-723-4015
E-mail: mse.whu at stanford.edu 




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