kimsora at stanford.edu
Wed Oct 10 10:58:24 PDT 2007
I am just wondering about how much undercut I get when I etch 5 um polysilicon in STS2.
A long time ago, I heard that the undercut is 0.5um. Is there a recipe that gives smaller undercut than 0.5um?
Is there difference about undercut between having a photo-resist mask and an oxide mask?
I have 4um wide features, so 1um undercut from both sides is detrimental to my devices.
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