From ahryciw at stanford.edu Tue Apr 1 14:30:25 2008 From: ahryciw at stanford.edu (Aaron Hryciw) Date: Tue, 1 Apr 2008 14:30:25 -0700 Subject: Ag dry etch recipe? Message-ID: <4d36fb940804011430xcdf1ae2k96375393427ca184@mail.gmail.com> Hello labmembers - Does anyone know of a well-controlled dry etch recipe for Ag? Also, does anyone know of a good wet etch chemistry yielding low etch rates (~10 nm/minute or so) for Ag? I'd appreciate any advice on the matter. Cheers! - Aaron -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Wed Apr 2 10:01:32 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 02 Apr 2008 10:01:32 -0700 Subject: Next SNF Process Grand Rounds, Friday, 4/4 Message-ID: <47F3BBEC.4000902@stanford.edu> Hi all -- Another Process Grand Rounds, scheduled for this Friday, 4/4, at 11:30, in CIS 101. Lunch provided. Agenda: 1. Process Clinic: Everyone helps brainstorm process issues posed by labmembers. If you've got a process flow problem or question, please bring it to share with your fellow labmembers. 2. Quality Circle Update: Student representatives for each functional area quality circle will present a brief summary of the first meetings. 3. Superuser plan: Based on the Quality Circle discussions, come up with a proposal for the SNF Superuser program. All labmembers and staff members are welcome. Hope to see you there! Your SNF staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From gsosa at stanford.edu Wed Apr 2 13:27:16 2008 From: gsosa at stanford.edu (Gary J Sosa) Date: Wed, 02 Apr 2008 13:27:16 -0700 Subject: ASM-L Demo Update 4/2 Message-ID: <20080402132716.3r26y6ccyssk04kc@webmail.stanford.edu> Hi All... The 8" demo scheduled for this week( 4/2 through 4/4 ) is currently on hold. The tool is still configured for 4 inch wafers and is available for use until 8:30 tomorrow morning(4/3). We will keep you posted on any more changes in status or schedules. Thanks.. Gary From tberg at stanford.edu Thu Apr 3 09:55:59 2008 From: tberg at stanford.edu (Ted Berg) Date: Thu, 03 Apr 2008 09:55:59 -0700 Subject: Micronics Moving Out of the Lab Message-ID: <47F50C1F.3000809@stanford.edu> Hello All, Just to let everyone know the Micronic will most likely be moved out of the lab next Thursday. This may caouse some slight disruption as it moves from its room down the aisle with SVG coater L102 to L100 and out the door to the bumpy hallway. Thank you all for your understanding and cooperation ted From gsosa at stanford.edu Thu Apr 3 12:24:29 2008 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 03 Apr 2008 12:24:29 -0700 Subject: ASM-L Stepper Status 4/3/2008 Message-ID: <20080403122429.vt2kfdnhdogskc48@webmail.stanford.edu> Hi All The planned ASM-L demo for this week has been scratched(4/3 and 4/4). The stepper is configured for 4" wafer processing. All staff reserevations for today and tomorrow have been removed and the tool is ready for use. Thanks.. Gary From gsosa at stanford.edu Thu Apr 3 15:47:46 2008 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 03 Apr 2008 15:47:46 -0700 Subject: ASM-L 3-D Align Install Rescheduled Message-ID: <20080403154746.jjlrnxbomsc8w0wk@webmail.stanford.edu> Hi All The 3-D align installation originally scheduled for the week of 4/7 through 4/11 and 4/14 through 4/18 has been rescheduled. The new schedule is 4/14 through 4/18 and 4/21 through 4/25. Schedules have been posted outside the lab and at the stepper. The stepper is up and available for 4" wafer processing through next week. Thanks.. Gary From mtang at stanford.edu Fri Apr 4 16:20:50 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 04 Apr 2008 16:20:50 -0700 Subject: Mask Layout Clinic, Monday, 4/7, 3 pm Message-ID: <47F6B7D2.4060004@stanford.edu> Greetings Labmembers: Bill Martin -- who gave the excellent presentation about mask design a few weeks ago -- will be here at SNF on Monday, April 7, at 3 pm. Bring your mask layouts, maskmaking request forms, and mask questions -- he's generously agreed to be on-hand to answer your questions. We'll also have an intro to LEdit CAD layout session for anyone interested. We'll be in or near the bullpen/cubicle area (between CIS 136 and CIS 143) from 3 pm on. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Fri Apr 4 20:22:03 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 04 Apr 2008 20:22:03 -0700 Subject: E341 MEMS Fabrication Class at SNF Message-ID: <47F6F05B.8020309@stanford.edu> Hi everyone! It's that time of year again -- E341 begins in the lab next week. For those who aren't familiar with this, E341 is a hands-on lab class where students learn first hand how to run and are qualified on the equipment at SNF needed to fabricate cantilevers. The formal training sessions in the lab will be scheduled as follows: Tuesdays/Thursdays - 1 pm - 5:30 pm Wednesdays/Fridays - 8 am -12:30 pm The class syllabus is aggressive -- we ask for your patience in supporting these students -- they will be your fellow labmembers very soon! If you have any questions, comments, or suggestions, please let Staff know. The head TA for this term is Roozbeh Parsa (rparsa). If you would like to learn more about this class, check out the website at: http://memsed.stanford.edu/e341/Main_Page Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From eap at gloworm.Stanford.EDU Sat Apr 5 17:20:13 2008 From: eap at gloworm.Stanford.EDU (Eric Perozziello) Date: Sat, 5 Apr 2008 16:20:13 -0800 (PST) Subject: Security alert Message-ID: Today I noticed several of the skateboard kids inside of the building. They claim to be "just using the bathroom" but I observed them inside of individual cubicle areas. Please keep your eyes open... Thanks -Eric From shott at stanford.edu Sun Apr 6 08:58:51 2008 From: shott at stanford.edu (John Shott) Date: Sun, 06 Apr 2008 08:58:51 -0700 Subject: Security alert In-Reply-To: References: Message-ID: <47F8F33B.6090303@stanford.edu> As a follow up to Eric's note of yesterday: This morning I found marker-pen graffiti on the partition walls of the men's room closest to the skateboarder's "jumping area". While I know that correlation does not constitute proof and that skateboarding is not a crime, it seems mighty strange that graffiti would appear on the same afternoon, particularly when the building is nominally locked. I've cleaned up the graffiti, but would encourage folks entering the building to not allow unknown persons to "tail gate" as they enter the building, unless you know them, when the building is otherwise locked. There are simply too many valuable things laying around if someone is intent on looking for them. Of course we should all be conscious about not leaving wallets, cellphones, laptops, and other valuables in places where they can be easily stolen. Thanks for you attention, John From saraswat at cis.stanford.edu Sun Apr 6 12:36:50 2008 From: saraswat at cis.stanford.edu (Krishna Saraswat) Date: Sun, 6 Apr 2008 12:36:50 -0700 Subject: Security alert In-Reply-To: References: Message-ID: <811B3693-946F-45F0-86EB-EA1D3F73A54A@cis.stanford.edu> I have seen many times these kids outside our building and chased them away. We have to be very firm in not allowing them to use CIS steps for skateboarding. Krishna --------- On Apr 5, 2008, at 5:20 PM, Eric Perozziello wrote: > > Today I noticed several of the skateboard kids inside of the > building. They claim to be "just using the bathroom" but I > observed them inside of individual cubicle areas. > > Please keep your eyes open... > > Thanks > -Eric > > From shott at stanford.edu Mon Apr 7 14:13:46 2008 From: shott at stanford.edu (John Shott) Date: Mon, 07 Apr 2008 14:13:46 -0700 Subject: This morning's flood in CIS-X .... Message-ID: <47FA8E8A.9030101@stanford.edu> SNF Lab Members: As a number of you know, this morning there was a flood in CIS-X due to a rupture of a 2" process cooling water line in the Harris lab that quickly spread to the Nishi lab and others. A number of SNF staff members including Mike Dickey (always first on the scene ....), Jim McVittie, Gary Sosa, Ray Seymour, Ed Myers, and Mary Tang .... as well as a number of students, the entire ABM contingent, and likely others that I've omitted .... worked hard to mop up the mess. So, if you thought the staffing in the lab looked a little light this morning, that is why. But thanks to all who helped with the mop up operation. This should also be a good reminder to all of us .... some of these building facilities can "go" at any time. Such a break in a water line can be an EXCEEDINGLY hazardous situation .... particularly in terms of possible electrical hazards. Any flooding situation should be approached with great caution because of possible live electrical circuits. This should also be a reminder to us to take a critical look on our lab floors .... it is all too easy to end up with live electrical equipment on the floor which can greatly increase the likelihood of a shock hazard. This moring there was standing water at least 2 cm deep just a few minutes after the line ruptured. How many of our labs have energized power strips sitting on the floors? I suggest that this would be a good time to look at some of those things and improve our overall electrical safety before the next major flood condition. Thanks for your continued support, John From tberg at stanford.edu Mon Apr 7 14:34:11 2008 From: tberg at stanford.edu (Ted Berg) Date: Mon, 07 Apr 2008 14:34:11 -0700 Subject: Micronic move out of lab Message-ID: <47FA9353.6090002@stanford.edu> Hello All, Just an update to let everyone know that the micronic will be moving form its home on Thursday. The route has changed slightlyit will still go down the SVG coater aisle and then turn left and out the drytek 2 aisle and left again between Epi and Tycom and out to the dock. This is to pervent bumpy bump on the blue floor. Sorry for any disruption and thanks in advance for your cooperation. ted From edmyers at stanford.edu Tue Apr 8 09:41:13 2008 From: edmyers at stanford.edu (Ed Myers) Date: Tue, 08 Apr 2008 09:41:13 -0700 Subject: Fwd: J.A. Woollam Co. - Short Course Announcement Message-ID: <6.2.5.6.2.20080408094043.039cc348@stanford.edu> >Dear J.A. Woollam Customers, > >We would like to invite you to our next Standard WVASE32 Short >Course to be held June 16-19, 2008 at Vanderbilt University in >Nashville, Tennessee, USA. I have attached a course description and >registration form. If you are interested, please fill out the >registration form completely and fax back to me at +1(402)-477-8214 >by May 16, 2008. Once I receive your registration form, I will send >a confirmation email. > >This course will focus on data analysis methods for spectroscopic >ellipsometry with a significant amount of "hands-on" computer time. >For this reason, participants should be familiar with WVASE32 software. > >For those of you who also use the software program VASEManager, we >are tentatively planning an additional day of training on Friday, >June 20th focusing solely on VASEManager. If you do not currently >use this program, you do not need to attend this additional day. >Participants interested in VASEManager training will be contacted as >soon as we have received adequate interest to insure holding this >additional training day. Please indicate on your registration form >if you would like to attend the VASEManager training. > >If you have any questions, please feel free to contact me. > >Sincerely, > >Veronica Inlow > > >******************************* >Veronica Inlow >Marketing Coordinator >J. A. Woollam Co., Inc. >645 M Street, Suite 102 >Lincoln, NE 68508 >vinlow at jawoollam.com >Phone: (402)477-7501 x101 >Fax: (402)477-8214 -------------- next part -------------- A non-text attachment was scrubbed... Name: StandardShortCourseRegistration_Vanderbilt.pdf Type: application/pdf Size: 338192 bytes Desc: not available URL: From mtang at stanford.edu Tue Apr 8 14:06:05 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 08 Apr 2008 14:06:05 -0700 Subject: Today's Lab/Building Evacuation Message-ID: <47FBDE3D.1000401@stanford.edu> Dear Labmembers and Building Occupants -- Around 10:30 today, the fire alarm/building evacuation alarms went off. The problem was found to be caused by a break in a water pipe located above three toxic gas sensor modules in a CISX lab. The sensors were shorted or damaged, thereby activating the automatic toxic gas alarm system. This appears to be related to the flooding incident yesterday. We apologize for the disruption, but please be assured that the toxic gas monitoring system is working as it should. Just as a reminder, when the evacuation fire alarm sounds, you should leave the building through the nearest exit and meet at the Evacuation Assembly point. If you leave the premises, make sure to let someone know. And you must not re-enter the building until cleared to do so by Response Personnel. And although today's incident proved not to be a safety issue, we want to remind everyone of the serious hazards in this building and to treat every alarm as if it were the real thing. Again, many apologies for the disruption -- and thanks for your cooperation. Your SNF staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mrjpark at stanford.edu Thu Apr 10 05:05:06 2008 From: mrjpark at stanford.edu (Joong Sun Park) Date: Thu, 10 Apr 2008 05:05:06 -0700 Subject: Platinum etchant Message-ID: Hi all, Does anyone know if there is a platinum etchant in SNF? I googled and people used to make solution with 7HCl:1HNO3:8H2O at 60 deg. Is there pre-mixed etchant? Also I'm wondering whether the etchant could remove oxide underneath the platinum which should be avoided. Please let me know best process for patterning platinum rather than lift-off. Thanks. Cheers, Joongsun From mbaran at stanford.edu Thu Apr 10 13:30:00 2008 From: mbaran at stanford.edu (Maureen Baran) Date: Thu, 10 Apr 2008 13:30:00 -0700 Subject: Found Cell Phone in Lab Message-ID: <20080410203001.4F2D82D6EB1@smtp1.stanford.edu> A cell phone was found in the Analytical room inside the lab, if this is your phone please come to my cubicle #41 on the first floor of the CIS building and claim it. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Apr 10 18:34:41 2008 From: shott at stanford.edu (John Shott) Date: Thu, 10 Apr 2008 18:34:41 -0700 Subject: Hungry this evening? Muffins, banana bread, etc ... Message-ID: <47FEC031.1090805@stanford.edu> SNF Lab Members: Professor Nishi informs me that there are muffins and banana bread that were not consumed drung a meeting he hosted in CIS 101 and suggested that some of you working this evening might be able to help finish them off. While they last .... Have a good evening, John From slatif at stanford.edu Fri Apr 11 18:24:42 2008 From: slatif at stanford.edu (Salman Latif) Date: Fri, 11 Apr 2008 18:24:42 -0700 Subject: Missing notebook Message-ID: <20080411182442.jfgfwxjx2ckc0sg4@webmail.stanford.edu> Dear SNF users, I keep my SNF notebook in my bin, and now it's gone. If any of you see it around, please, please, let me know. It should have my name and e-mail written on the front. It has many processing details inside that I won't be able to recall otherwise. Thanks, Salman. From slatif at stanford.edu Fri Apr 11 20:43:28 2008 From: slatif at stanford.edu (Salman Latif) Date: Fri, 11 Apr 2008 20:43:28 -0700 Subject: Missing notebook In-Reply-To: <20080411193829.jfm2rh10o4oocw4k@webmail.stanford.edu> References: <20080411182442.jfgfwxjx2ckc0sg4@webmail.stanford.edu> <20080411193829.jfm2rh10o4oocw4k@webmail.stanford.edu> Message-ID: <20080411204328.auxwdzx29csk4woo@webmail.stanford.edu> Found it! Thanks, Shrestha! :) Quoting Shrestha Basu Mallick : > It was next to the Nanospec. > I put it on the ASML table. > -Shrestha > Quoting Salman Latif : > >> Dear SNF users, >> >> I keep my SNF notebook in my bin, and now it's gone. If any of you see >> it around, please, please, let me know. It should have my name and >> e-mail written on the front. It has many processing details inside that >> I won't be able to recall otherwise. >> >> Thanks, >> Salman. From kevhuang at stanford.edu Sat Apr 12 15:10:06 2008 From: kevhuang at stanford.edu (Kevin Huang) Date: Sat, 12 Apr 2008 15:10:06 -0700 Subject: LED wafers and processing Message-ID: <93586f8c0804121510m2a7cdb6dq74dffd90a570f7de@mail.gmail.com> Hi, I am trying to make a simple LED structure on silicon wafers. Could anyone please tell me if there are groups or vendors that can make a few wafers with LED materials (such as III-Vs) on top? Emission in the visible will be desirable. Also, post processing is needed for the wafers and the tools I need are DRIE for silicon, pin-hole free LPCVD/PECVD oxide (to coat and protect my structures for XeF2 etch in a later step), oxide etcher, metal sputtering, and metal etcher. I assume that all LED materials will be considered gold contaminated. I was told that Santa Barbara has contaminated DRIE. I tried searching the NNIN sites but they don't have the cleanliness category listed on the website. Could anyone please also let me know if there are any places or vendors that can provide these services/tools? Thanks. Kevin -- ================================== Kevin Huang Ph.D. Candidate Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ================================== -------------- next part -------------- An HTML attachment was scrubbed... URL: From nishiy at stanford.edu Mon Apr 14 09:41:57 2008 From: nishiy at stanford.edu (Yoshio Nishi) Date: Mon, 14 Apr 2008 09:41:57 -0700 Subject: FW: [CPN] Agilent Technologies/Labs -free Scientific AFM Seminar Message-ID: <000901c89e4e$75800120$801142ab@stanford.edu> For your information for those who use Agilent AFM. Yoshio Nishi _____ From: cpn-announcements-bounces at lists.stanford.edu [mailto:cpn-announcements-bounces at lists.stanford.edu] On Behalf Of Kyle Cole Sent: Monday, April 14, 2008 9:39 AM To: cpn-announcements at lists.stanford.edu Subject: [CPN] Agilent Technologies/Labs -free Scientific AFM Seminar Scientific AFM Seminar at Agilent April 15th! Agilent Technologies and Agilent Labs invite you to register for a one-day Scientific AFM Seminar to be held on April 15 in Santa Clara, California. This special event offers a unique opportunity to learn about the latest AFM techniques, technologies, and research. The content-rich program will feature several 45-minute presentations, each of which will be followed by its own Q&A session. Scheduled speakers: Katherine Willets, Ph.D. University of Texas at Austin "Spatially Correlated Total Internal Reflection Plasmon Spectroscopy and Atomic Force Microscopy" Fritz B. Prinz, Ph.D. Stanford University "Novel Applications for AFM" Sanjeevi Sivasankar, Ph.D. University of California, Berkeley, Q3 Institute "Manipulation and Detection of Single Biomolecules Using Simultaneous Force and Fluorescence Microscopy" Sergei Magonov, Ph.D. Agilent Nanotechnology Measurements Division "Multi-Frequency Approach in Atomic Force Microscopy: Studies of Local Electric and Mechanical Properties" Tom Kopley, Ph.D. Agilent Labs "Electrical Applications of AFM" The seminar begins at 8:30 a.m. with coffee and a continental breakfast at Agilent's 5301 Stevens Creek Blvd. facility in Santa Clara, includes an onsite lunch, and runs until approximately 4:00 p.m. Register Here for this exciting and informative event. (in the event field - enter "Santa Clara Seminar") Stu Stuart G. Spencer Regional Mgr. Nanotech Measurements Div. Agilent Technologies Office (760) 941-7488 Cell (619) 846-7332 stuart_spencer at agilent.com www.agilent.com/find/afm Stu Stuart G. Spencer Regional Mgr. Nanotech Measurements Div. Agilent Technologies Office (760) 941-7488 Cell (619) 846-7332 stuart_spencer at agilent.com www.agilent.com/find/afm -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- An embedded and charset-unspecified text was scrubbed... Name: ATT00007.txt URL: From harris at snow.stanford.edu Mon Apr 14 10:04:43 2008 From: harris at snow.stanford.edu (James Harris) Date: Mon, 14 Apr 2008 10:04:43 -0700 Subject: LED wafers and processing In-Reply-To: <93586f8c0804121510m2a7cdb6dq74dffd90a570f7de@mail.gmail.com> References: <93586f8c0804121510m2a7cdb6dq74dffd90a570f7de@mail.gmail.com> Message-ID: Kevin, You are asking for what people are currently doing research on, so there are absolutely no vendors who can supply what you are looking for. You will have to do a great deal of the work yourself, including process development and work with one of the groups putting III-V materials onto Si, which isn't so hard, but trying to do mixed processing is literally impossible except by research groups working on mixed III-V/Si as NO ONE wants to risk contamination of any decent Si processing equipment. I would suggest that the two best chances are at the NNUN facilities at UCSB and Cornell as they have far more III-V work and relatively little Si, so tend to already be "contaminated". I would first look at Cornell as they not only have a lot of III-V work, but also considerable Si based MEMS activity. Good luck, Jim Harris >Hi, > I am trying to make a simple LED structure on silicon >wafers. Could anyone please tell me if there are groups or vendors >that can make a few wafers with LED materials (such as III-Vs) on >top? Emission in the visible will be desirable. > > Also, post processing is needed for the wafers and the tools >I need are DRIE for silicon, pin-hole free LPCVD/PECVD oxide (to >coat and protect my structures for XeF2 etch in a later step), oxide >etcher, metal sputtering, and metal etcher. I assume that all LED >materials will be considered gold contaminated. I was told that >Santa Barbara has contaminated DRIE. I tried searching the NNIN >sites but they don't have the cleanliness category listed on the >website. Could anyone please also let me know if there are any >places or vendors that can provide these services/tools? > >Thanks. > >Kevin > >-- >================================== >Kevin Huang >Ph.D. Candidate >Stanford Organic Electronics Lab >Dept. of Electrical Engineering >Email: kevhuang at stanford.edu >Phone: (650) 725-6924 >================================== !DSPAM:480134c9123471923448402! -- James S. Harris, '64 James & Ellenor Chesebrough Professor E-Mail:Harris at snow.stanford.edu Department of Electrical Engineering http://www-ee.stanford.edu/~harris/ 420 Via Palou Mall, CIS-X Rm 328 Ph: (650)723-9775 Stanford, CA 94305-4075 Fax: (650)723-4659 Adm. Asst.: Gail Chun-Creech Ph: (650)723-0983 __ ___ | | |__| __ arris Group, Solid State & Photonics Lab __| |__ http://www-snow.stanford.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon Apr 14 13:21:08 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 14 Apr 2008 13:21:08 -0700 Subject: Vacuum Technology Seminar, 4/24/08 Message-ID: <4803BCB4.70904@stanford.edu> Greetings Labmembers -- Just a reminder that there is a Vacuum Technology Seminar scheduled for next Thursday, 4/24, in the CISX Auditorium, from 8-12. Gary Scarsdale, from Varian Inc. will be hosting a tutorial on the practical/equipment aspects of vacuum systems. This event includes a workshop manual, plenty of opportunity for Q&A, and even lunch. To register, contact Gary Scarsdale ? Call 408.248.8061 or e-mail gary.scarsdale at varianinc.com Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- A non-text attachment was scrubbed... Name: ScarsdaleStanfordHEP4'08-2.pdf Type: application/pdf Size: 164832 bytes Desc: not available URL: From mmlee at stanford.edu Mon Apr 14 13:32:35 2008 From: mmlee at stanford.edu (Meredith M. Lee) Date: Mon, 14 Apr 2008 13:32:35 -0700 Subject: Stanford OSA/SPIE Seminar "Optics, MEMS, and More: Multiphysics Modeling" Thurs 4/17 4pm AP200 Message-ID: <9fa245520804141332o7f20c4f7pd2e724cb07868d8a@mail.gmail.com> ** The Stanford OSA/SPIE student chapter is hosting the following seminar this week, open to everyone. For more information about our events, including our Google Calendar, please visit http://student-osa.stanford.edu! * * *Optics, MEMS, and More: * *Multiphysics Modeling Using COMSOL* * * *Thursday, April 17, 2008* *AP 200* *4:15pm (refreshments at 4pm)* Simulating scientific phenomena is rapidly becoming an integral part of the design and optimization process in many science and engineering fields. Multiphysics simulation that can account for coupling of various models has never been easier - or more powerful - than what COMSOL (formerly FEMLAB) offers today. This seminar covers an overview of COMSOL's capabilities, including specific examples relevant to those conducting research and teaching in fields such as: ? Optics, RF and microwave modeling ? Acoustics modeling ? Electromagnetics modeling ? MEMS and Microfluidics modeling ? Electrical-mechanical-thermal coupling ? Flow, transport and chemical reaction modeling ? Unlimited Multiphysics coupling: simulating multiple phenomena and their interactions * * *About the Speaker* Brian Adolf graduated from the University of California, Berkeley with degrees in Electrical Engineering / Computer Science and Physics. He worked as an Analog IC designer making DC/DC converters for cell phones and portable electronics. Brian then started his own company using COMSOL Multiphysics, and is now a COMSOL Applications Engineer at the Palo Alto office. --------------------- http://student-osa.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rostam at stanford.edu Tue Apr 15 19:54:20 2008 From: rostam at stanford.edu (Rostam Dinyari) Date: Tue, 15 Apr 2008 19:54:20 -0700 Subject: POCl3/BBr3 doping in sentaurus Message-ID: <20080415195420.t4uoc8gn40gosokg@webmail.stanford.edu> Hi, Does anyone know if Sentaurus has a command for doping by gas diffusion with POCl3 or BBr3? Thanks, Rostam From mtang at stanford.edu Wed Apr 16 10:11:20 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 16 Apr 2008 10:11:20 -0700 Subject: [Fwd: seminar today-display and image technology] Message-ID: <48063338.4010401@stanford.edu> -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An embedded message was scrubbed... From: Subject: seminar today-display and image technology Date: Wed, 16 Apr 2008 10:10:00 PDT Size: 26847 URL: From kimsangb at stanford.edu Thu Apr 17 12:51:17 2008 From: kimsangb at stanford.edu (SangBum Kim) Date: Thu, 17 Apr 2008 12:51:17 -0700 Subject: photo resist pretreatment before ion implantation Message-ID: <003101c8a0c4$66bdd450$a9b50c80@sangbumhome> Dear SNF labmembers, Could anyone give me some advice on typical photoresist pretreatment before ion implantation, please? For example, do I need 1) UV hardening of resist or 2) heat treatment? Any other suggestions? I plan to use ion implantation service from Innovion and use 1.6um thick SPR 3612 as a photoresist with maximum As ion energy of 180keV. Thanks, SangBum -------------- next part -------------- An HTML attachment was scrubbed... URL: From tberg at stanford.edu Fri Apr 18 06:38:07 2008 From: tberg at stanford.edu (Ted Berg) Date: Fri, 18 Apr 2008 06:38:07 -0700 Subject: Horizontal tube cleaner removal Message-ID: <4808A43F.30906@stanford.edu> Hello all, Just a heads up. The horizontal tube cleaner in the wafersaw-bottle clean room will be removed on Monday April 21 so the room will be very noisy and dirty i have reseved the saw for that day so it as well as polisher will not be available. Thanks in advance for your cooperation, ted From mtang at stanford.edu Fri Apr 18 14:22:02 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 18 Apr 2008 14:22:02 -0700 Subject: Process Clinic/SpecMat: Monday, April 21, 2-4 pm, CIS bullpen Message-ID: <480910FA.7000802@stanford.edu> Greetings Labmembers -- In order to try to improve communication and encourage you to use Staff as a resource, we will be holding regular "Process Clinics" in the bullpen area outside the lab. As opposed to the larger Grand Rounds, these will be informal gatherings where labmembers can discuss technical issues one-on-one with Staff and each other. New labmembers are especially encouraged to bring their process flows and design layouts for feedback, suggestions about equipment choices and training logistics. More experienced labmembers are encouraged to join in on the discussions, propose/solicit support for processing related projects, make processing requests, etc. We will try to make each Clinic topical, but still want to encourage all labmembers to bring any process-related issue. For example, there was the Mask Clinic two weeks ago (and by the way, Bill Martin has agreed to return on a regular basis, to answer questions and review labmembers' files in this forum.) For the Process Clinic next Monday (4/21), there will an open forum from 2-3 pm. At 3 pm, a quorum of SpecMat members will be on hand to review any SpecMat requests anyone wishes to make (please be prepared with MSDS and other supporting information as appropriate, preferable in electronic format for easier database entry.) So, bring your process questions and SpecMat requests, or just stop on by for a chat -- Monday, 4/21, 2-4 pm in the CIS Bullpen area. Hope to see you there! Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From cvenky at stanford.edu Sat Apr 19 18:24:21 2008 From: cvenky at stanford.edu (Venkatesh Chembrolu) Date: Sat, 19 Apr 2008 18:24:21 -0700 Subject: Fwd: University PhD Dissertation Defense for Venkatesh H. R. Chembrolu Message-ID: <20080419182421.yl5rlxvaw0k8k88g@webmail.stanford.edu> -------------- next part -------------- Department of Applied Physics University PhD Dissertation Defense Time Resolved X-ray Imaging of Magnetization Dynamics in Spin Transfer Torque Devices Venkatesh Hanumant Rao Chembrolu Research Advisor: Professor Joachim Stohr 21 April 2008 @2:30 p.m. In McCullough Building, Room 335 Abstract The study of spin-dependent transport phenomena in ferromagnetic metals has gained a lot of interest amongst both theoretical and experimental physicists in the last two decades. In addition to being a rich field of study in terms of basic research, these studies have given rise to, and are continuing to give rise to some very important technological applications. Discovery of the Giant Magneto Resistance (GMR) effect in 1988-89 revolutionized the read head technology for hard drives, thus enabling much higher storage density than before. The proposal and the subsequent experimental conformation of the existence of Spin Transfer Torque (STT) effect in ferromagnetic multilayers promises to be a good candidate for developing high density, non-volatile, magnetic random access memory (MRAM) and tunable DC driven microwave oscillators. The subject matter of study in the thesis work being presented is investigation of magnetization switching mechanisms in STT devices. In the first part of this talk, I will present the results of a novel time resolved X-ray microscopy technique, developed to study magnetization dynamics at fast time scales (< 1 ns) and at short length scales (< 100nm). Experiments have been performed at the Advanced Light Source (ALS), Berkeley, and they show systematic size dependent trends in the switching behavior in STT devices. Samples with a lateral dimension of 100x180nm show vortex-driven switching, whereas smaller samples with a lateral dimension of 100x150nm do not switch by a vortex. Moreover, when a non-zero angle in introduced between the fixed and the free layers, vortex-driven switching becomes manifest in samples with smaller dimensions also. In the second part of the talk, I will briefly discuss the results of micro-magnetic simulation studies and also present a simple phenomenological model which explains the different switching mechanisms. -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- --++**==--++**==--++**==--++**==--++**==--++**==--++**== apgradstudents mailing list apgradstudents at lists.stanford.edu https://mailman.stanford.edu/mailman/listinfo/apgradstudents From tberg at stanford.edu Mon Apr 21 06:03:44 2008 From: tberg at stanford.edu (Ted Berg) Date: Mon, 21 Apr 2008 06:03:44 -0700 Subject: Horizontal tube cleaner leaving today Message-ID: <480C90B0.10401@stanford.edu> Hello All, Just a reminder that the Horizontal tube cleaner will be moving out today so the botlle wash room-Wafer saw, polisher will not be available. Thanks, ted From mtang at stanford.edu Mon Apr 21 12:01:36 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 21 Apr 2008 12:01:36 -0700 Subject: Reminder: Process Clinic & SpecMat today, 2-4 pm Message-ID: <480CE490.4000205@stanford.edu> Hi everyone -- Process Clinic today from 2-4 in the bullpen area. From 2-3 will be open session. From 3-4 will be SpecMat. Bring your processing questions, process flows, and special materials requests. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Mon Apr 21 16:30:54 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 21 Apr 2008 16:30:54 -0700 Subject: SNF Process Grand Rounds, Friday, 4/25 Message-ID: <480D23AD.1070305@stanford.edu> Hi all -- The next SNF Process Grand Rounds will be this Friday, April 25, at 11:30 am in CIS 101. There will be two topics on the agenda. 1. LTO Process Issues. As many of you know, SNF staff and labmembers have been trying to deal with a particle issue on this system. It has also been brought to our attention that there are electrical testing issues related to LTO which may go back several months or more. We would like to solicit and share data and other input from labmembers which may help set a timeline for these issues -- and which might help identify the problem and maybe even pinpoint possible causes. Please bring any data you might have. 2. Quality Circles. This will be an opportunity to update progress on the functional area Quality Circles. Pizza provided. Hope to see you there! Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From wanki at stanford.edu Mon Apr 21 20:56:32 2008 From: wanki at stanford.edu (Wanki Kim) Date: Mon, 21 Apr 2008 20:56:32 -0700 Subject: Etching of ITO Message-ID: Hi all, I am trying to make an electrode using ITO. Could anyone please tell me the way how to etch ITO? Thanks. Best, Wanki From jprovine at stanford.edu Tue Apr 22 12:04:46 2008 From: jprovine at stanford.edu (J Provine) Date: Tue, 22 Apr 2008 12:04:46 -0700 Subject: SEMINAR: Prof. Leslie Field Reversibly Rebuilding the Polar Ice Cap Message-ID: <20080422120446.hya5bytq80g4co08@webmail.stanford.edu> labmembers, today there is a seminar that should be of wide spread interest since we all live on the earth. Visiting Prof. Leslie Field will speak about a Reversible method for rebuilding the Polar Ice cap and other global habit elements. see attached notice. Talk is at 3pm in Packard 101. ~j -------------- next part -------------- A non-text attachment was scrubbed... Name: Seminar - Dr. Leslie Field - April 22, 2008.doc Type: application/msword Size: 34304 bytes Desc: not available URL: From tberg at stanford.edu Tue Apr 22 13:16:27 2008 From: tberg at stanford.edu (Ted Berg) Date: Tue, 22 Apr 2008 13:16:27 -0700 Subject: Horizontal tube cleaner is gone Message-ID: <480E479B.9040605@stanford.edu> Hello All, Horizontal tube cleaner is gone The room is back in business. Thanks for your patience.ted From shott at stanford.edu Tue Apr 22 14:16:03 2008 From: shott at stanford.edu (John Shott) Date: Tue, 22 Apr 2008 14:16:03 -0700 Subject: Micromanipulator 6000 probe station ... Message-ID: <480E5593.3070006@stanford.edu> SNF Lab Members: I've fixed a few items on the Micromanipulator 6000 probe station (the one in CIS 152): 1. I've put on an new Z-stage drive belt so that the fine-adjustment of the stage height works once again. 2. I've fixed the long-dead fourth motorized stage motion so that it will now allow the electric motors to drive left/right and back/front (both at low- and high-speed). 3. I've fixed and adjusted the lever detent that holds the stage and probes well above the sample. Somebody had been tinkering with some of the set screws on that assembly and had very nearly caused it major problems by misadjusting the tension on the ball bearings in that assembly. Finally, if you are using the probe station and find that the probe tips are in poor condition, I've got a stockpile of spare probe tips and would be happy to replace any that are badly mangled. Hopefully these adjustments and repairs will make the probe station more functional for everyone. Happy probing, John From sergei at scipp.ucsc.edu Tue Apr 22 16:11:48 2008 From: sergei at scipp.ucsc.edu (Sergei Kachiguin) Date: Tue, 22 Apr 2008 16:11:48 -0700 Subject: Etching of ITO In-Reply-To: References: Message-ID: <480E70B4.8010106@scipp.ucsc.edu> Depends on your sample's feature size, I guess. We are using HCL liquid etching in our electrode array fabrication. The thickness of our ITO film is 200 nm and it's usually gone in 8 minutes. Some overetch time will be helpful. Take care, Sergei Wanki Kim wrote: > Hi all, > > I am trying to make an electrode using ITO. > Could anyone please tell me the way how to etch ITO? > Thanks. > > Best, > Wanki > > From akamath at kovio.com Tue Apr 22 16:17:32 2008 From: akamath at kovio.com (Arvind Kamath) Date: Tue, 22 Apr 2008 16:17:32 -0700 Subject: Tungsten Wet etch In-Reply-To: References: Message-ID: <0A734412B02624499172B7366A97336B0E0DAD335A@server.print-this.com> Hello, We have a resist lifting problem while etching 0.4um of sputtered W on SiO2 using HMDS/Shipley 3612 1um resist. All feature sizes start to peel off after about 1min of etching. H2O2 is used as etchant @35C. Can anyone suggest a known good process for this (etchant, adhesion promoter, process conditions)? For the record, I do not see lifting with resist on SiO2 processed at the same time in the bath. Thanks, Arvind Kamath From mtang at stanford.edu Tue Apr 22 16:23:20 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 22 Apr 2008 16:23:20 -0700 Subject: Mask Clinic: Wednesday, 3 pm Message-ID: <480E7368.5040408@stanford.edu> Hi all -- Bill Martin will be back tomorrow (Wednesday) at 3 pm to answer your mask questions. We'll meet in the bullpen/cubicle area outside Mahnaz' office. If you haven't done so already, please check out the mask layout guide at https://www.stanford.edu/group/snf/Masks/Maskmaking.html (SUNet ID required - or contact a staff person for the info). Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From jopizio at stanford.edu Tue Apr 22 18:09:07 2008 From: jopizio at stanford.edu (Joey Albert Sulpizio) Date: Tue, 22 Apr 2008 18:09:07 -0700 Subject: suggestions for Alumina etchant? Message-ID: <20080422180907.dsb4vp8osgssg08g@webmail.stanford.edu> Hello: Does anybody have experience wet-etching Al2O3? In particular, I'd be interested in etchants that are not harmful to organics. Thanks. --Joey From mrjpark at stanford.edu Wed Apr 23 08:21:23 2008 From: mrjpark at stanford.edu (Joong Sun Park) Date: Wed, 23 Apr 2008 08:21:23 -0700 Subject: 1in siicon wafer Message-ID: <388DC3ED-BE8A-4E8E-88BA-50D08FEA404D@stanford.edu> Hi all, Does anyone have extra(two or three) 1in wafers that I can get today? I forgot to order so if someone has it I can pay for the wafers. Thanks! Joongsun Sent from iPhone From kimsangb at stanford.edu Wed Apr 23 21:12:06 2008 From: kimsangb at stanford.edu (SangBum Kim) Date: Wed, 23 Apr 2008 21:12:06 -0700 Subject: photo resist pretreatment before ion implantation In-Reply-To: <003101c8a0c4$66bdd450$a9b50c80@sangbumhome> References: <003101c8a0c4$66bdd450$a9b50c80@sangbumhome> Message-ID: <48100896.6050204@stanford.edu> Thank you for those who sent me the reply. I found a recipe from ee410 class runsheet, which you can find at http://www.stanford.edu/class/ee410/#HO thanks to Mary's help. 0) After developing 1um thick 3612, 1) 30mins at 110C 2) 15mins UV exposure 3) 30mins at 110C 4) Ion implantation SangBum SangBum Kim wrote: > Dear SNF labmembers, > > > > Could anyone give me some advice on typical photoresist pretreatment > before ion implantation, please? > > For example, do I need 1) UV hardening of resist or 2) heat > treatment? Any other suggestions? > > > > I plan to use ion implantation service from Innovion and use 1.6um > thick SPR 3612 as a photoresist with maximum As ion energy of 180keV. > > > > Thanks, > > SangBum > -------------- next part -------------- An HTML attachment was scrubbed... URL: From caner at stanford.edu Wed Apr 23 22:45:43 2008 From: caner at stanford.edu (Caner Onal) Date: Wed, 23 Apr 2008 22:45:43 -0700 Subject: photo resist pretreatment before ion implantation In-Reply-To: <48100896.6050204@stanford.edu> References: <003101c8a0c4$66bdd450$a9b50c80@sangbumhome> <48100896.6050204@stanford.edu> Message-ID: Hi SangBum, Just wanted to clarify one point here: The second 30min 110 C bake is not needed if you send your wafers for implant right away. It is intended for wafers that sit around for a long while (this is the case for ee410, sometimes the wafers wait in the lab for 2-3 days before the implant step). The reason is that if you leave your wafers waiting around for a long time the resist layer tends to absorb moisture from the ambient and this reverses the effect of baking. Hope this saves you some time, Caner. On Apr 23, 2008, at 9:12 PM, SangBum Kim wrote: > Thank you for those who sent me the reply. I found a recipe from > ee410 class runsheet, which you can find at http://www.stanford.edu/class/ee410/#HO > thanks to Mary's help. > > 0) After developing 1um thick 3612, > 1) 30mins at 110C > 2) 15mins UV exposure > 3) 30mins at 110C > 4) Ion implantation > > SangBum > > > SangBum Kim wrote: >> >> Dear SNF labmembers, >> >> Could anyone give me some advice on typical photoresist >> pretreatment before ion implantation, please? >> For example, do I need 1) UV hardening of resist or 2) heat >> treatment? Any other suggestions? >> >> I plan to use ion implantation service from Innovion and use 1.6um >> thick SPR 3612 as a photoresist with maximum As ion energy of 180keV. >> >> Thanks, >> SangBum > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From pruitt at stanford.edu Thu Apr 24 14:50:28 2008 From: pruitt at stanford.edu (Beth Pruitt) Date: Thu, 24 Apr 2008 14:50:28 -0700 Subject: seminar today by Prof Mary Boyce from MIT Message-ID: periodic elastomeric structures and their acoustic structural models, i.e. "phononic crystals" > > >Mechanics of Deformation-Triggered >Pattern Transformations and Superelastic Behavior >in Periodic Elastomeric Structures > >Presented by > >Mary C. Boyce >Department of Mechanical Engineering >Massachusetts Institute of Technology >Thursday, April 24, 2008 >4:15 PM in Building 300, Room 300 > >Periodic microstructures abound in nature and provide numerous >interesting and unique mechanical, photonic, phononic and >hydrophobic properties. Here, novel and uniform deformation-induced >pattern transformations have been found in periodic elastomeric >cellular solids upon reaching a critical level of mechanical load. >This behavior is accompanied by a superelastic stress-strain >behavior where, after reaching the critical load, the material >deforms elastically to large deformations at nearly constant stress. >Numerical simulations utilizing Bloch wave analysis clearly show the >mechanism of the pattern switch to be a form of local >microstructural elastic instability, giving reversible and >repeatable transformation events as confirmed by experiments. The >nature of the instability and accompanying pattern transformation >depend on the initial periodic pattern. The deformation-triggered >transformations have been physically realized for several periodic >elastomeric structures including square and oblique arrays of >circular holes as well as rectangular arrays of elliptical holes, >each subjected to axial compression. A ligament buckling instability >was found to trigger the transformations in the square and >rectangular lattices and a shear instability triggered the >transformation in the oblique lattice. Post-deformation >transformation is observed to accentuate the new pattern and is >found to be elastic and to occur at nearly constant stress, >resulting in superelastic behavior. >Furthermore, periodic microstructures are a known method to control >wave propagation and create materials with tailored band gap >structures. Here, we calculate the acoustic band structures of >different periodic elastomers at different levels of deformation. We >demonstrate the ability to use deformation to transform phononic >band gaps. The elastomeric nature of the material makes the >transformation in both structural pattern and phononic band gap a >reversible and repeatable process, creating a phononic band gap >switch. > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mahnaz at stanford.edu Fri Apr 25 10:36:42 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 25 Apr 2008 10:36:42 -0700 Subject: Yellow cabinets Message-ID: <481216AA.3050804@stanford.edu> Hello all, Urgent Please look in to your nonstandard chemicals and remove bottles that are not in use or has gotten expired. This is quiet urgent. I was checking the yellow cabinets around 10 am this morning and when I opened the right cabinet one bottle fell out, I was lucky to catch it. I want the cabinet cleaned TO DAY . At 3 pm today I am forced to take some ( I say about 20 bottles out), if you have chemicals and can take it to your lab for now I would appreciate that. I am forced to do this, I would rather every one take a few minutes and help us out here. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From zhangy at stanford.edu Fri Apr 25 13:52:52 2008 From: zhangy at stanford.edu (Yuan Zhang) Date: Fri, 25 Apr 2008 13:52:52 -0700 Subject: quesiton about thin Au film liftoff on Si substrate Message-ID: <20080425205249.E425B65AF43@smtp2.stanford.edu> Hello labmembers, I've got into troubles lifting off very thin Au film recently. I used PMMA as photoresist, and patterned my sample (Si substrate) with ebeam. A very thin Au layer (5 angstroms) was deposited by Innotec. After liftoff, I found many Au nanoparticles or even clusters redeposited onto the unpatterned substrate. I thick it may be partially caused by the electronegativity between Au and Si. I wonder if there is anyway to prevent this behavior. Any comments and suggestions will be highly appreciated. Thanks for your attention. Thanks, Yuan -------------- next part -------------- An HTML attachment was scrubbed... URL: From gracewu at stanford.edu Tue Apr 29 13:18:34 2008 From: gracewu at stanford.edu (Grace Wu) Date: Tue, 29 Apr 2008 13:18:34 -0700 Subject: Lunch at CIS Patio In-Reply-To: <47FEC031.1090805@stanford.edu> References: <47FEC031.1090805@stanford.edu> Message-ID: <6.2.5.6.2.20080429130913.047cdfd0@stanford.edu> All, There are plenty of food left at the CIS Patio. Go get them while they are last! Grace -------------- next part -------------- An HTML attachment was scrubbed... URL: From shhliu at stanford.edu Wed Apr 30 13:33:23 2008 From: shhliu at stanford.edu (Shuhong Liu) Date: Wed, 30 Apr 2008 13:33:23 -0700 Subject: PhD Oral Examination - Shuhong Liu (Wednesday, May 14, 2008, 1:30 pm) Message-ID: <20080430133323.jpx6xhfyww8kkcg0@webmail.stanford.edu> Controlled Deposition of Organic Semiconductor Single Crystals and its Application in Field-Effect Transistors Shuhong Liu Department of Materials Science and Engineering Advisor: Professor Zhenan Bao Wednesday, May 14, 2008, 1:30 pm, Packard building, Room 101 (Refershment to be served at 1:15 pm) Abstract: The search for low-cost, large area, flexible devices has led to a remarkable increase in the research and development of organic semiconductors. Single-crystal organic field-effect transistors are ideal device structures for studying fundamental science associated with charge transport in organic materials and have demonstrated high mobility and outstanding electrical characteristics. For example, an exceptionally high carrier mobility of 20 cm2/Vs has been demonstrated for rubrene single crystal field effect transistors. However, it remains a technical challenge to integrate single-crystal devices into practical electronic applications. A key difficulty is that organic single-crystal devices are usually fabricated one device at a time by handpicking a single crystal and placing it onto the device substrate. This makes it impossible to mass-produce at high density with reasonable throughput. Therefore, there is a great need for a high-throughput method for depositing large arrays of organic semiconductor single crystals directly onto device structures. In this talk, I?ll present several approaches towards realizing this goal. In the first part, I?ll introduce a solution-processing technique that relies on solvent wetting and de-wetting on substrates with patterned wettability to selectively direct the deposition or removal of organic crystals. The assembly of different organic crystals over centimeter-squared areas on Au, SiO2 and flexible plastic substrates is demonstrated. By designing line features on the substrate, alignment of needle-like crystals is also achieved. As a demonstration of the potential application of this approach, arrays of organic single crystal FETs are fabricated by patterning organic single crystals directly onto and between transistor source and drain electrodes. Besides organic single crystals, our self-assembly strategy is also be applicable for patterning other objects such as metallic nanowires. In the second part, I?ll present a vapor-processing technique that patterns organic single crystals using carbon nanotube (CNT) bundles as templates. Several organic semiconductor materials are successfully patterned, including p-type pentacene, tetracene, sexiphenylene, and sexithiophene, as well as n-type tetracyanoquinodimethane (TCNQ). This study suggests that the selective growth of crystals onto patterned carbon nanotubes is most likely due to the coarse topography of the CNT bundles. Moreover, we observe that the crystals nucleate from CNT bundles and grow onto CNT bundles in a conformal fashion. The crystal growth can be directly applied onto transistor source-drain electrodes and arrays of organic single-crystal field effect transistors are demonstrated. To investigate the impact of CNTs on device performance, CNT bundles are incorporated into thin-film FETs and a mobility enhancement of organic semiconductors is observed. In the third part, I?ll present a method that offers the control of the size and shape of organic single crystals using patterned Au films as templates. It is observed that ?-sexithiophene (?-6T) crystals nucleate from the edge or the top surface of Au films and then grow two dimensionally on SiO2 surface. The sizes and shapes of ?-6T crystals are precisely determined by that of the Au patterns. After removing Au templates, large arrays of ?-6T crystals with controlled sizes and various shapes such as stripes, squares, hexagons, etc. are achieved. Top-contact FETs made of ?-6T ribbons are demonstrated. Besides organic single crystals, Au templates can also act as templates to pattern vapor- and solution-deposited organic semiconductor thin films. Patterned organic thin-film FETs exhibit superior performance compared to unpatterned devices. From mtang at stanford.edu Wed Apr 30 18:41:05 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 30 Apr 2008 18:41:05 -0700 Subject: Maskmaking update Message-ID: <48191FB1.3050106@stanford.edu> Hello Labmembers -- Lots of new stuff on the maskmaking front, so please check out the the website describing maskmaking resources at: http://snf.stanford.edu/Process/Masks/Masks.html Some key features: - Special pricing for has been arranged for both academic and industrial SNF labmembers from several suppliers. - Mask Order Forms and contact info for maskmasking services are provided online for industrial labmembers (http://snf.stanford.edu/Process/Resources/MaskSources.html) and academic labmembers (https://www.stanford.edu/group/snf/Masks/Maskmaking.html). - Detailed instructions on how to fill out mask order forms are available on these pages. - An overview from Bill Martin describing the terminology and layout conventions -- essential info for new layouts - Tips & tricks and detailed examples for making the most of LEdit in your layouts. If you have any questions or would like to contribute tips & tricks or other info, please don't hesitate to get in touch with one of us (Ed, Mahnaz, Mary). The SNF Mask Team -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu