photo resist pretreatment before ion implantation

SangBum Kim kimsangb at stanford.edu
Wed Apr 23 21:12:06 PDT 2008


Thank you for those who sent me the reply. I found a recipe from ee410 
class runsheet, which you can find at 
http://www.stanford.edu/class/ee410/#HO thanks to Mary's help.

0) After developing 1um thick 3612,
1) 30mins at 110C
2) 15mins UV exposure
3) 30mins at 110C
4) Ion implantation

SangBum


SangBum Kim wrote:

> Dear SNF labmembers,
>
>  
>
>  Could anyone give me some advice on typical photoresist pretreatment 
> before ion implantation, please?
>
>  For example, do I need 1) UV hardening of resist or 2) heat 
> treatment? Any other suggestions?
>
>  
>
>  I plan to use ion implantation service from Innovion and use 1.6um 
> thick SPR 3612 as a photoresist with maximum As ion energy of 180keV.
>
>  
>
> Thanks,
>
> SangBum
>

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/labmembers/attachments/20080423/16ef0917/attachment.html>


More information about the labmembers mailing list