photo resist pretreatment before ion implantation
kimsangb at stanford.edu
Wed Apr 23 21:12:06 PDT 2008
Thank you for those who sent me the reply. I found a recipe from ee410
class runsheet, which you can find at
http://www.stanford.edu/class/ee410/#HO thanks to Mary's help.
0) After developing 1um thick 3612,
1) 30mins at 110C
2) 15mins UV exposure
3) 30mins at 110C
4) Ion implantation
SangBum Kim wrote:
> Dear SNF labmembers,
> Could anyone give me some advice on typical photoresist pretreatment
> before ion implantation, please?
> For example, do I need 1) UV hardening of resist or 2) heat
> treatment? Any other suggestions?
> I plan to use ion implantation service from Innovion and use 1.6um
> thick SPR 3612 as a photoresist with maximum As ion energy of 180keV.
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