From mtang at stanford.edu Mon Dec 1 09:00:14 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 01 Dec 2008 09:00:14 -0800 Subject: Process Clinic today, 2-4 pm Message-ID: <4934181E.6000004@stanford.edu> Labmembers -- Just a reminder of the Process Clinic today (Monday), from 2-4 pm in the cubicle area near Maureen's office. Bring your process runsheets (or learn how to make one), your processing questions, mask layouts, etc. Staff will be on hand to help out where we can. Senior labmembers are especially welcome to offer advice. We'll be there! Your SNF staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Tue Dec 2 08:16:01 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 02 Dec 2008 08:16:01 -0800 Subject: Reminder: Annual SNF Lab Cleanup!! Message-ID: <49355F41.4080408@stanford.edu> Dear labmembers -- Remember, the lab shuts down for annual cleaning and maintenance starting at 7 am sharp on WEDNESDAY, DECEMBER 17. However, staff will begin cleanup on MONDAY, DECEMBER 15 according to the following: 1. IN THE LAB: All personal items must be stored inside assigned lab bins. No personal items on WIP racks or on top of lab bins. Anything found outside of lab bins will be removed from the lab. 2. LAB BINS: All assigned bins in the lab must be labeled with the current owner's Coral login. Bins which are assigned to labmembers who have not been very active in the lab will be tagged for reassignment to active labmembers in the new year. 3. IN THE CAD ROOM: All personal storage bins in the CAD room (CIS 151) must be labeled with the Coral login and the current date. No chemicals inside storage bins. Staff may choose move bins around to make better use of available space. 4. IN THE CUBICLE AREA: As an evacuation path for cubicle and office occupants, aisleways must be clear to 36" across and no unsecured items stored above (to prevent blocking paths in case of earthquake, as per code.) Desk space will be subject to reassignment to active labmembers, SNF student helpers and guests. In addition, carpets will be cleaned at 6 pm on Friday, December 5. All boxes and other personal items should picked up off the floor. Any questions, ask a staff member -- Thanks, Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From rwoo at stanford.edu Tue Dec 2 11:20:34 2008 From: rwoo at stanford.edu (Raymond Woo) Date: Tue, 02 Dec 2008 11:20:34 -0800 Subject: Raymond Woo Ph.D. Defense (Mon Dec. 8, 1pm, Packard 202) Message-ID: <49358A82.3040609@stanford.edu> Come for the food, stay for the free live entertainment. ------------------------------------------------------- Band-to-Band Tunneling Transistors for Low Power Logic Applications University Oral Examination Raymond Woo Department of Electrical Engineering Stanford University Advisor: James D. Plummer Date: Monday, December 8, 2008 Time: 1pm (Refreshments served at 12:45pm) Location: Packard Room 202 Abstract: As MOSFET gate lengths are scaled below 45nm, fundamental physical limitations are for the first time presenting barriers to further scaling. Among the most important of these barriers is the ?kT/q? limitation which, due to the thermal distribution of carriers, limits the rate at which a MOSFET can be turned on or off with respect to applied gate voltage. This means that as supply voltages are reduced, leakage power is increasing exponentially. This presentation first provides a review of the MOSFET leakage power problem as well as a systematic study of all of the possible ways to overcome the ?kT/q? limitation. Next, I focus on a specific novel device, the Band-to-Band Tunneling (BTBT) transistor, which has the potential to beat the ?kT/q? limit. Simulation and experimental studies will be presented that provide a thorough understanding of BTBT devices and their scaling properties. The use of different channel materials and device structures are examined to explore the design space of BTBT transistors and to gain insight into the practical prospects for these devices to outperform MOSFETs. From mtang at stanford.edu Thu Dec 4 11:38:30 2008 From: mtang at stanford.edu (Mary Tang) Date: Thu, 04 Dec 2008 11:38:30 -0800 Subject: IMPORTANT! EVACUATION DRILL MONDAY DECEMBER 15TH 9:30 AM Message-ID: <493831B6.4030706@stanford.edu> Labmembers: Please be aware that the annual building evacuation drill will take place on Monday, December 15, at 9:30 am. What does this mean for the lab? This means that at that time, the fire alarm will go off. Everyone must evacuate both buildings, including the lab, and report to the Emergency Assembly Point. The Fire department will perform a sweep of the building and lab to make sure everyone has left. The evacuation drill ends when the Fire Marshal gives the "all clear". We don't anticipate it will take long; perhaps 30 minutes at most. Although alarms will sound, no other building systems should be affected (in the case of a real fire alarm, toxic gases will shut off). Long furnace runs and other operations that can normally be run safely unattended for this period of time should be unaffected. However, attended operations should be avoided during this time. Please plan your processing Monday morning accordingly. Thanks for your attention -- Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From edmyers at stanford.edu Fri Dec 5 09:15:12 2008 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 05 Dec 2008 09:15:12 -0800 Subject: J.A. Woollam Co. - Short Course Announcement Message-ID: <6.2.5.6.2.20081205091436.02751ea8@stanford.edu> >Dear J.A. Woollam Customers, > >We would like to invite you to our next WVASE32 Data Analysis >Fundamentals Short Course to be held March 17-20, 2009 at the >University of Texas in San Antonio, Texas, USA. I have attached a >course description and registration form. If you are interested, >please fill out the registration form completely and fax back to me >at +1(402)-477-8214 by February 23, 2009. Once I receive your >registration form, I will send a confirmation email. > >This course will focus on data analysis methods for spectroscopic >ellipsometry with a significant amount of "hands-on" computer time. >For this reason, participants should be familiar with WVASE32 software. > >If you have any questions, please let me know. > >Best regards, >Veronica > >******************************* >Veronica Inlow >Marketing Coordinator >J. A. Woollam Co., Inc. >645 M Street, Suite 102 >Lincoln, NE 68508 >vinlow at jawoollam.com >Phone: (402)477-7501 x101 >Fax: (402)477-8214 -------------- next part -------------- A non-text attachment was scrubbed... Name: Short_Course_Reg_UTSA09.pdf Type: application/pdf Size: 281812 bytes Desc: not available URL: From mtang at stanford.edu Fri Dec 5 14:09:47 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 05 Dec 2008 14:09:47 -0800 Subject: CIS/SNF/CISX Building Party - NOW! Message-ID: <4939A6AB.2070404@stanford.edu> Hey all -- Come, take a break, and join your work and lab mates for some fun and food -- the Building party is starting NOW! Your Building party planners -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From rissman at stanford.edu Mon Dec 8 08:38:09 2008 From: rissman at stanford.edu (Paul Rissman) Date: Mon, 08 Dec 2008 08:38:09 -0800 Subject: Nano for N^3 workshop announcement Message-ID: <200812081638.mB8GcDtL014121@smtp-roam.Stanford.EDU> Reminder - This is Thursday and Friday of this week. Please register if you are interested in attending. ------------------------------------------------------------------------------------------------------------------------------------------------------ Workshop Title - Nanotechnology as an Enabler for Neuroscience, Neuroengineering and Neural Prostheses (Nano for N^3) When - Thursday, December 11, 2008 (8 AM - 6 PM), Friday, December 12, 2008 (8 AM - 1 PM) Where - Stanford University, Allen Center for Integrated Systems, Cypress conference room (CISX 101) Local hotels - Westin Palo Alto - http://www.starwoodhotels.com/westin/property/overview/index.html?propertyID=1198 alternatives - http://www.paloaltoonline.com/lodging/ Workshop organizers - Professor Krishna Shenoy (shenoy at stanford.edu) and Professor Yoshio Nishi (nishi at ee.stanford.edu) Registration - http://www.surveymonkey.com/s.aspx?sm=ELU8fQDmb2NyfkLhDhjIwQ_3d_3d Goals of the workshop Neural prostheses aim to help improve the quality of life for patients suffering from neurological disease and injury. They function by translating electrical signals from the brain (e.g., action potentials, local field potentials, ECoGs,EEGs) into control signals for guiding assistive devices. Despite considerable progress in recent years, the field actively continues to pursue (1) increased sensor lifetime and (2) increased system performance so that the anticipated quality-of-life improvements will clearly outweigh potential surgical risks. Despite ongoing efforts in recent years, neither sensor lifetime nor system performance have grown at a rate necessary to dramatically enable the widespread clinical translation of these systems. MEMS-based electrode arrays have had functional lifetimes of approximately one year without substantial improvement. While flexible substrate and pharmacological agent delivery through micro-fluidic channels appears promising, there is considerable interest in understanding what nano-structured electrical and/or optical sensors which reside at the size scale of neurons (< 1 um) may enable. Similarly, system performance relies on massively parallel measurement of neural signals and MEMS based measurement has remained at roughly 100-200 neurons for the past decade. There is considerable interest in understanding what massively parallel, nano-structured electrical and/or optical sensors ? which could provide both the high-density measurements within one brain/neural area, and measurement from multiple brain areas separated by many centimeters ? may provide. Advances in both of these areas are crucial for the sustained advancement of both basic systems neuroscience ? which aims to provide fundamental scientific understanding of complex nervous systems, and may generate biologically-inspired computational principles for next generation electronic computational architectures - as well as more applied neuroengineering, which aims to build core technology. The major goals of the workshop are: - To build bridges and promote collaborations between the neuroscience, neuroengineering, neural prosthesis and nanotechnology/sensor communities. - To identify limitations in current neural-measurement technologies and critical needs for basic neuroscience, neuroengineering, and clinical neural prostheses. - To identify potential solutions to these needs based on recent progress in nano- and micro-technology. - To identify how NNIN can best leverage its tools, user base and staff expertise to enable these goals. Tentative agenda Thursday, December 11, 2008 8:30 AM - opening remarks, Professor Yoshio Nishi, Stanford, Professor Krishna Shenoy, Stanford 9:00 AM - Professor William Newsome, Stanford University - "The Need for Measuring/Perturbing Neural Activity for Basic Neuroscience and Prostheses" 9:30 AM - Professor Jose Carmena, UC Berkeley - "Technology constraints for bidirectional brain-machine interfaces" 10:00 AM - Professor Daryl Kipke, University of Michigan - "Micro- and nano-scaled implantable devices for high-fidelity, chronic neural interfaces in neuroprosthetic and scientific applications" 10:30 AM - break 11:00 AM - Professor Florian Solzbacher, University of Utah - "Next Generation Neural Interfaces - Bridging the Gap Between Engineering and Healthcare" 11:30 AM - Professor Wentai Liu, UC Santa Cruz - "Integration and Miniaturization of Neural Implants" 12 noon - lunch 1:00 PM - Professor Mark Wrightman, UNC - "Monitoring Chemical Neurotransmission and Single Unit Activity Simultaneously" 1:30 PM - Professor Paul Garris, Illinois State University - "Toward a Smart Deep Brain Stimulator with Chemical Sensing Feedback for Control" 2:00 PM - Professor Daniel Palanker, Stanford University - "Optoelectronic Retinal Prosthesis for Restoring Sight to the Blind" 2:30 PM - Professor Ellis Meng, USC - "Hybrid Neural Interfaces and Implantable Drug Delivery Systems Enabled by BioMEMS" 3:00 PM - Professor Edward Keefer, UT Southwestern - "Characteristics of carbon nanotube neural interfaces" 3:30 PM - break 4:00 PM - Professor Bruce Wheeler, University Illinois, Urbana Champaign - "Brain on a Chip: Progress in its Design and Construction" 4:30 PM - Dr. Vijendra Sahi, Nanosys Inc. - title TBD 5:00 PM - Professor Mark Schnitzer, Stanford University - "Of Mice, Men, and Microscopes: Imaging cellular dyamics of motor control in behaving subjects" 5:30 PM - Professor Karl Deisseroth, Stanford University - "Optogenetics: Development and Application" Friday December 12, 2008 8:30 AM - Breakout group discussion - "Neuro-Nano Needs and Opportunities" 10:30 AM - break 11:00 AM - Breakout group overview - "Neuro-Nano Needs and Opportunities" 12 noon - closing remarks -------------- next part -------------- An HTML attachment was scrubbed... URL: From rparsa at stanford.edu Mon Dec 8 10:30:55 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Mon, 8 Dec 2008 10:30:55 -0800 (PST) Subject: Maryam Ziaei-Moayyed's Defense: This Thursday at 1pm In-Reply-To: <2529430.3147441225918549110.JavaMail.root@zm06.stanford.edu> Message-ID: <211294137.2594811228761055515.JavaMail.root@zm06.stanford.edu> ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ University PhD Dissertation Defense "Internal Electrostatic Transduction of RF MEMS Resonators" Maryam Ziaei-Moayyed Advisor: Professor Roger Howe Department of Electrical Engineering Stanford University Date: Thursday, December 11th, 2008 Time: 1:00 pm Location: Packard Building, Room 101 Abstract: Radio Frequency (RF) Microelectromechanical Systems (MEMS) resonators offer advantages in terms of power, bandwidth, quality factor, and compatibility with CMOS technology. These resonators have many applications in wireless communications such as frequency references, filters and mixers. One of the major challenges of RF MEMS resonators is the high motional impedance. This work describes design, fabrication, and testing of internal electrostatic transduction of MEMS resonators. By replacing the air gap in resonators with high-k dielectrics, higher transduction efficiencies resulting in lower motional impedance and higher quality factor are achievable. Internal electrostatic transduction allows for efficient coupling to a specific resonance mode, while achieving high quality factors. The devices were fabricated in a novel and manufacturable double-nanogap process tailored toward high frequency resonators. Internal electrostatic transduction of a bulk-mode GHz ring resonator on a quartz substrate is demonstrated. By integrating the transducing electrode within the same vibrating structures, a Lam?-mode resonator with inherent differential drive, sense transduction and high quality factor is demonstrated. This work demonstrates the valuable potential of internal electrostatic transduction in extending MEMS resonators toward higher frequencies. From mtang at stanford.edu Tue Dec 9 13:35:05 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 09 Dec 2008 13:35:05 -0800 Subject: Make sure to properly use Hazardous Waste Tags! Message-ID: <493EE489.5050203@stanford.edu> Dear labmembers -- Please make sure to properly fill out hazardous waste tags when disposing of chemical waste. 1. Use complete, proper chemical names. DO NOT use acronyms or trade names ("Cr14 etch") but list all the chemicals in the mix. Stanford EH&S (Environmental Health & Safety) department needs to know what the chemicals are in order to properly sort and dispose of them (and they are not going to know what "Gold Etch" or "AL12" means.) 2. Examples are posted at the Chemicals Passthrough. Chemical compositions for the most chemical mixtures are now posted there too. (And if your favorite chemical mixture isn't listed, let Uli know.) 3. For hazardous waste tags that are not properly filled out: you will be called back into the lab to fill out a proper tag. Second offense, you'll be expected to help staff label, bag and sort general lab waste. We realize that many labmembers are electrical engineers with a year of undergraduate general chemistry a distant memory... But it is important that everyone one of us is diligent in managing our chemical waste in a way that makes it safe for us, for the people who have to take care of it, and our environment. If you have any questions about these procedures, the documentation, or other chemical safety concerns, please bring them up with your favorite staff member. Thanks for your attention -- Your Lab Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From edmyers at stanford.edu Wed Dec 10 09:52:54 2008 From: edmyers at stanford.edu (Ed Myers) Date: Wed, 10 Dec 2008 09:52:54 -0800 Subject: Woollam Training Course Message-ID: <6.2.5.6.2.20081210094454.0313cb08@stanford.edu> Fellow Lab Members, The JA Woollam company, the manufacture of our Spectral Ellipsometer, is proposing a condensed two day training course covering their WVASE32 modeling software. Since this is a customized course for our ellipsometer users we want to gauge the interest in the course before we start making the arrangements. The course would be in the April time frame and the cost would be approximately $500 per person, paid directly to JA Woollam. Please let me know if this is a course you would plan on attending, or under what circumstances you would attend. Please don't say free because there are real costs to holding this course. Thanks, Ed From filip at stanford.edu Wed Dec 10 16:18:45 2008 From: filip at stanford.edu (Filip Crnogorac) Date: Wed, 10 Dec 2008 16:18:45 -0800 (PST) Subject: missing bonded piece Message-ID: <815529550.766851228954725191.JavaMail.root@zm09.stanford.edu> Dear labusers, a 50x50mm square bonded Si piece was taken from the EVBond501 table this morning (~10am). I know it looked aesthetically pleasing, but I need it back. Please let me know if you have mistakenly taken it, or place it back inside my box that is on the table. Thanks, Filip -------------------------------------- Ph.D. Candidate, Stanford University Department of Electrical Engineering Center for Integrated Systems B-103, 420 Via Palou Stanford, CA 94305 From rissman at stanford.edu Thu Dec 11 08:07:25 2008 From: rissman at stanford.edu (Paul Rissman) Date: Thu, 11 Dec 2008 08:07:25 -0800 Subject: Nano for N^3 workshop announcement Message-ID: <20081211160729.89F737FE8@smtp-roam.stanford.edu> Reminder - Today and Tomorrow ------------------------------------------------------------------------------------------------------------------------------------------------------ Workshop Title - Nanotechnology as an Enabler for Neuroscience, Neuroengineering and Neural Prostheses (Nano for N^3) When - Thursday, December 11, 2008 (8 AM - 6 PM), Friday, December 12, 2008 (8 AM - 1 PM) Where - Stanford University, Allen Center for Integrated Systems, Cypress conference room (CISX 101) Local hotels - Westin Palo Alto - http://www.starwoodhotels.com/westin/property/overview/index.html?propertyID=1198 alternatives - http://www.paloaltoonline.com/lodging/ Workshop organizers - Professor Krishna Shenoy (shenoy at stanford.edu) and Professor Yoshio Nishi (nishi at ee.stanford.edu) Registration - http://www.surveymonkey.com/s.aspx?sm=ELU8fQDmb2NyfkLhDhjIwQ_3d_3d Goals of the workshop Neural prostheses aim to help improve the quality of life for patients suffering from neurological disease and injury. They function by translating electrical signals from the brain (e.g., action potentials, local field potentials, ECoGs,EEGs) into control signals for guiding assistive devices. Despite considerable progress in recent years, the field actively continues to pursue (1) increased sensor lifetime and (2) increased system performance so that the anticipated quality-of-life improvements will clearly outweigh potential surgical risks. Despite ongoing efforts in recent years, neither sensor lifetime nor system performance have grown at a rate necessary to dramatically enable the widespread clinical translation of these systems. MEMS-based electrode arrays have had functional lifetimes of approximately one year without substantial improvement. While flexible substrate and pharmacological agent delivery through micro-fluidic channels appears promising, there is considerable interest in understanding what nano-structured electrical and/or optical sensors which reside at the size scale of neurons (< 1 um) may enable. Similarly, system performance relies on massively parallel measurement of neural signals and MEMS based measurement has remained at roughly 100-200 neurons for the past decade. There is considerable interest in understanding what massively parallel, nano-structured electrical and/or optical sensors ? which could provide both the high-density measurements within one brain/neural area, and measurement from multiple brain areas separated by many centimeters ? may provide. Advances in both of these areas are crucial for the sustained advancement of both basic systems neuroscience ? which aims to provide fundamental scientific understanding of complex nervous systems, and may generate biologically-inspired computational principles for next generation electronic computational architectures - as well as more applied neuroengineering, which aims to build core technology. The major goals of the workshop are: - To build bridges and promote collaborations between the neuroscience, neuroengineering, neural prosthesis and nanotechnology/sensor communities. - To identify limitations in current neural-measurement technologies and critical needs for basic neuroscience, neuroengineering, and clinical neural prostheses. - To identify potential solutions to these needs based on recent progress in nano- and micro-technology. - To identify how NNIN can best leverage its tools, user base and staff expertise to enable these goals. Tentative agenda Thursday, December 11, 2008 8:30 AM - opening remarks, Professor Yoshio Nishi, Stanford, Professor Krishna Shenoy, Stanford 9:00 AM - Professor William Newsome, Stanford University - "The Need for Measuring/Perturbing Neural Activity for Basic Neuroscience and Prostheses" 9:30 AM - Professor Jose Carmena, UC Berkeley - "Technology constraints for bidirectional brain-machine interfaces" 10:00 AM - Professor Daryl Kipke, University of Michigan - "Micro- and nano-scaled implantable devices for high-fidelity, chronic neural interfaces in neuroprosthetic and scientific applications" 10:30 AM - break 11:00 AM - Professor Florian Solzbacher, University of Utah - "Next Generation Neural Interfaces - Bridging the Gap Between Engineering and Healthcare" 11:30 AM - Professor Wentai Liu, UC Santa Cruz - "Integration and Miniaturization of Neural Implants" 12 noon - lunch 1:00 PM - Professor Mark Wrightman, UNC - "Monitoring Chemical Neurotransmission and Single Unit Activity Simultaneously" 1:30 PM - Professor Paul Garris, Illinois State University - "Toward a Smart Deep Brain Stimulator with Chemical Sensing Feedback for Control" 2:00 PM - Professor Daniel Palanker, Stanford University - "Optoelectronic Retinal Prosthesis for Restoring Sight to the Blind" 2:30 PM - Professor Ellis Meng, USC - "Hybrid Neural Interfaces and Implantable Drug Delivery Systems Enabled by BioMEMS" 3:00 PM - Professor Edward Keefer, UT Southwestern - "Characteristics of carbon nanotube neural interfaces" 3:30 PM - break 4:00 PM - Professor Bruce Wheeler, University Illinois, Urbana Champaign - "Brain on a Chip: Progress in its Design and Construction" 4:30 PM - Dr. Vijendra Sahi, Nanosys Inc. - title TBD 5:00 PM - Professor Mark Schnitzer, Stanford University - "Of Mice, Men, and Microscopes: Imaging cellular dyamics of motor control in behaving subjects" 5:30 PM - Professor Karl Deisseroth, Stanford University - "Optogenetics: Development and Application" Friday December 12, 2008 8:30 AM - Breakout group discussion - "Neuro-Nano Needs and Opportunities" 10:30 AM - break 11:00 AM - Breakout group overview - "Neuro-Nano Needs and Opportunities" 12 noon - closing remarks -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Fri Dec 12 05:56:39 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 12 Dec 2008 05:56:39 -0800 Subject: Cleantamination Meeting Canceled - Meet again in Jan09! Message-ID: <49426D97.7040005@stanford.edu> Dear Labmembers -- Today's scheduled Cleantamination meeting has been canceled since many people are out or otherwise committed (I, for example, am on jury duty call.) The summary of the last meeting is posted on the wiki at: https://spf.stanford.edu/SNF/processes/cleantamination-group/mtg-3 Comments on this and suggestions for topics for the next meeting are welcome. We will meet again the first Friday in January. Topics for discussion will include: Update on projects 1. Measuring contamination 2. RTA's for gold 3. STS etch policies 4. "Semi-Clean" chrome processing 5. ALD 6. STS dep cleaning and contamination If you have a contamination or cleanliness process concern which entails a policy or equipment change beyond the scope of SpecMat, please let me know and we'll add it to the agenda. See you next year! Mary From kevhuang at stanford.edu Fri Dec 12 09:50:40 2008 From: kevhuang at stanford.edu (Kevin Huang) Date: Fri, 12 Dec 2008 09:50:40 -0800 Subject: Kevin Huang Ph.D. Defense (Mon Dec. 15, 2pm, CIS-X 101) Message-ID: <93586f8c0812120950p688b4d2j75dcf8796b23c43c@mail.gmail.com> Come for some food if still around next Monday! -------------------------------------------------------------------------- Title: Expandable Monolithic Silicon Network For Cost-Effective Large Area Electronics University Oral Examination Kevin Huang Department of Electrical Engineering Stanford University Advisor: Peter Peumans Date: Monday, December 15, 2008 Time: 2pm (Refreshments served at 1:45pm) Location: CIS-X 101 (Auditorium) Abstract: CMOS technology has progressed substantially over the past decades in terms of cost per function and energy required per unit of computation due to advances in microelectronic manufacturing. Unfortunately, these advances have not been shared by the field of large area electronics because a different set of constraints exists in this field, for example, cost per unit area is an important factor when evaluating the applicability of technologies. Therefore, entirely different technologies such as inkjet printing or other pattern transfer methods are used. One method, fluidic self-assembly, uses small chiplets of monolithic silicon electronics that self-assemble at specific sites in a large-area system to realize large-area electronics. This approach does benefit from advances in CMOS technology and allows one to build large-area and high-performance electronic systems, but it has proven challenging to ensure high yields and throughput. Our approach to construct large-area electronic systems from monolithic silicon substrates expands a functional silicon die by several orders of magnitude in area by structuring the silicon die as a two-dimensional network of silicon islands and springs. Each island houses electronics and connects mechanically and electrically via springs to neighboring islands in a 2D network topology. Electrical interconnects on top of the spiral springs provide electrical connectivity between the islands. Since all the strain induced by the expansion process is contained in the spiral springs, the active device area remains strain free. Silicon networks with built-in 2D expandability can also conform to curved surfaces. The fabrication processrequired to realize such networks can be performed on a wafer that has been fully processed in a foundry as a post-CMOS process. Expandable silicon is a platform technology that enables the use of microelectronic manufacturing, with its exponential reduction in cost per electronic function and exponential increase in performance, in large-area systems. This preserves the benefits of foundry processing while reducing cost per unit area to levels compatible with many application domains. This technology can be used for the cost-effective manufacturing of microconcentrator solar cells, RFID tags, sensor networks, curved imagers, retinal prostheses, and displays. In my talk, I will discuss the design constraints of expandable silicon, the processes that were developed and illustrate the use of expandable silicon. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Fri Dec 12 15:57:44 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 12 Dec 2008 15:57:44 -0800 Subject: IMPORTANT! EVACUATION DRILL MONDAY DECEMBER 15TH 9:30 AM Message-ID: <4942FA78.3080407@stanford.edu> // Labmembers: Please be aware that the annual building evacuation drill will take place on Monday, December 15, at 9:30 am. What does this mean for the lab? This means that at that time, the fire alarm will go off. Everyone must evacuate both buildings, including the lab, and report to the Emergency Assembly Point. The Fire department will perform a sweep of the building and lab to make sure everyone has left. The evacuation drill ends when the Fire Marshal gives the "all clear". We don't anticipate it will take long; perhaps 30 minutes at most. Although alarms will sound, no other building systems should be affected (in the case of a real fire alarm, toxic gases will shut off). Long furnace runs and other operations that can normally be run safely unattended for this period of time should be unaffected. However, attended operations should be avoided during this time. Please plan your processing Monday morning accordingly. Thanks for your attention -- Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From yoonyoung.chung at stanford.edu Mon Dec 15 11:00:01 2008 From: yoonyoung.chung at stanford.edu (Yoonyoung Chung) Date: Mon, 15 Dec 2008 11:00:01 -0800 Subject: Anyone used BCB (benzocyclobutene) before? Message-ID: <7dc35a890812151100g24809bd2s64fa525ae8beb71d@mail.gmail.com> Hello, labmember. Is there anyone who used BCB (benzocyclobutene) in the lab before? I plan to use it for a dielectric between metal interconnect lines. I would appreciate getting your advice about BCB process. Thank you. Regards, Yoonyoung -- Yoonyoung Chung Ph.D. Candidate Department of Electrical Engineering Stanford University Email: yoonyoung.chung at stanford.edu --------------------------------------------------------- Final judge is by Nature itself From rparsa at stanford.edu Mon Dec 15 14:08:58 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Mon, 15 Dec 2008 14:08:58 -0800 (PST) Subject: MEMS Seminar: Thursday, December 18th, Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems, 2-3pm CISX-101 In-Reply-To: <1305489122.3825361229378875985.JavaMail.root@zm06.stanford.edu> Message-ID: <1342630753.3825611229378938355.JavaMail.root@zm06.stanford.edu> MEMS Seminar Announcement: ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Thursday, December 18th, 2008 2:00 ? 3:00 pm CISX-101 Title: Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems Speaker: Prof. Sunghoon Kwon Seoul National University, Korea Abstract: There are two different fabrication methods for building complex micro devices: top-down and bottom-up. The top-down approach, based on conventional photolithography, has given us amazing CMOS manufacturing capabilities but it?s facing a fundamental limit in it's downward scalability. Recently, various bottom-up manufacturing technologies have gained notice for their ability to overcome limits of top-down manufacturing. Breakthroughs will result from marrying top-down technique such as lithography and bottom-up technique such as self-assembly. Moving past the mundane introduction, what I really want to talk about is ?Smart Scalable Systems?, a radical bottom-up point of view for building complex systems. It seeks to construct a complex system by self-assembly of many simpler components, like a mosaic or a collage in art. Instead of building a system monolithically, it scalably assembles lots of small parts that are manufactured separately in large quantity to build up complex systems such as biosensors, energy sources, and displays. In this seminar optofluidic maskless lithography will be presented as a first step for smart particle generation. Secondly, various fluidic self-assembly technologies such as railed microfluidics will be discussed as a smart particle assembly method. Then I will give a road map of application examples such as encoded particle based scalable biosensors, LED chip packaging, scalable energy sources and scalable displays. Finally, I will end with an innovative method of artificially mimicking nature?s various structural colors as a first step to scalable display. By creatively combining OFML and magnetic self-assembly, we demonstrated full color printing of artificial structural color using a single material. Bio.: Sunghoon Kwon was born and raised in Seoul, Korea. He received his BS from Seoul National University in Electrical Engineering in 1998. Fascinated by MRI and CT, he decided to study biomedical engineering and got his MS in BME from SNU. His passion for sailing motivated him to move to the Bay area for his advanced degree. In 2004, he got his Ph.D in Bioengineering at UC Berkeley completing his thesis work on MEMS confocal microscopes with Professor Luke Lee. He then worked on various nanofabrication and nanoscience problems with Professor Jeff Bokor at the Molecular Foundry at Lawrence Berkeley National Laboratory. He also founded SPS Microsystems, a company working on commercialization of a MEMS projector for cell phone. In 2006 he arrived back to Korea and joined SNU EE as a faculty member. His research group, the Biophotonics and Nano Engineering Laboratory (BINEL), is now working on various topics such as guided self assembly, scalable biosensors, and artificial structural colors. -------------- next part -------------- A non-text attachment was scrubbed... Name: Sunghoon Kwon.doc Type: application/octet-stream Size: 76288 bytes Desc: not available URL: From mtang at stanford.edu Tue Dec 16 13:46:27 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 16 Dec 2008 13:46:27 -0800 Subject: Annual Alarm Testing: Wed. Dec. 17, 9 am - noon Message-ID: <494821B3.4080001@stanford.edu> Dear Building Occupants: The annual testing of the Toxic Gas Alarm system will begin Wednesday morning, Dec. 17. There will be a brief activation of the fire alarm system in the morning which is part of the testing. There is no need to evacuate for this test. (In the case of an emergency situation, the alarm will continue for more than a few seconds.) Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Wed Dec 17 07:55:32 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 17 Dec 2008 07:55:32 -0800 Subject: SNF Lab is now in Annual Shutdown Message-ID: <494920F4.1030100@stanford.edu> Dear Labmembers: The SNF Lab is now officially closed for business. We will reopen on Tuesday, Jan. 6, at 7 am. During the shutdown, only SNF staff, Facilities, and contractors are allowed into the cleanroom. There will be many "non-clean" and even potentially hazardous activities being performed (to make the lab a cleaner, brighter place when you return) so labmembers are not allowed inside the lab until 1/6. Limited access to equipment outside the lab (wafersaw, semhitachi) is allowed: please check with Staff before using as there will be Facilities and maintenance work planned which will affect access or use of these tools. Until startup -- Happy holidays-- and see you next year! Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From tholme at stanford.edu Thu Dec 18 09:06:22 2008 From: tholme at stanford.edu (Tim Holme) Date: Thu, 18 Dec 2008 09:06:22 -0800 (PST) Subject: borrow Pt paste? Message-ID: <1445625037.4147121229619982955.JavaMail.root@zm06.stanford.edu> Is anyone willing to let me borrow 2 drops of Pt paste? I'd like to test it before asking my advisor to plop down $1000 on a new jar. Thanks, Tim From rthowe at stanford.edu Thu Dec 18 10:55:53 2008 From: rthowe at stanford.edu (Roger T. Howe) Date: Thu, 18 Dec 2008 10:55:53 -0800 Subject: Seminar today 2-3 in CISX-101 Message-ID: <494A9CB9.8000307@stanford.edu> Everyone (who's still around), This seminar is worth attending -- Prof. Sunghoon Kwon from SNU. Roger MEMS Seminar Announcement: ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Thursday, December 18th, 2008 2:00 ? 3:00 pm CISX-101 Title: Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems Speaker: Prof. Sunghoon Kwon Seoul National University, Korea Abstract: There are two different fabrication methods for building complex micro devices: top-down and bottom-up. The top-down approach, based on conventional photolithography, has given us amazing CMOS manufacturing capabilities but it?s facing a fundamental limit in it's downward scalability. Recently, various bottom-up manufacturing technologies have gained notice for their ability to overcome limits of top-down manufacturing. Breakthroughs will result from marrying top-down technique such as lithography and bottom-up technique such as self-assembly. Moving past the mundane introduction, what I really want to talk about is ?Smart Scalable Systems?, a radical bottom-up point of view for building complex systems. It seeks to construct a complex system by self-assembly of many simpler components, like a mosaic or a collage in art. Instead of building a system monolithically, it scalably assembles lots of small parts that are manufactured separately in large quantity to build up complex systems such as biosensors, energy sources, and displays. In this seminar optofluidic maskless lithography will be presented as a first step for smart particle generation. Secondly, various fluidic self-assembly technologies such as railed microfluidics will be discussed as a smart particle assembly method. Then I will give a road map of application examples such as encoded particle based scalable biosensors, LED chip packaging, scalable energy sources and scalable displays. Finally, I will end with an innovative method of artificially mimicking nature?s various structural colors as a first step to scalable display. By creatively combining OFML and magnetic self-assembly, we demonstrated full color printing of artificial structural color using a single material. Bio.: Sunghoon Kwon was born and raised in Seoul, Korea. He received his BS from Seoul National University in Electrical Engineering in 1998. Fascinated by MRI and CT, he decided to study biomedical engineering and got his MS in BME from SNU. His passion for sailing motivated him to move to the Bay area for his advanced degree. In 2004, he got his Ph.D in Bioengineering at UC Berkeley completing his thesis work on MEMS confocal microscopes with Professor Luke Lee. He then worked on various nanofabrication and nanoscience problems with Professor Jeff Bokor at the Molecular Foundry at Lawrence Berkeley National Laboratory. He also founded SPS Microsystems, a company working on commercialization of a MEMS projector for cell phone. In 2006 he arrived back to Korea and joined SNU EE as a faculty member. His research group, the Biophotonics and Nano Engineering Laboratory (BINEL), is now working on various topics such as guided self assembly, scalable biosensors, and artificial structural colors. ------------------------------------------------------------------------ _______________________________________________ ciems-stanford mailing list ciems-stanford at lists.stanford.edu https://mailman.stanford.edu/mailman/listinfo/ciems-stanford From rparsa at stanford.edu Thu Dec 18 12:14:10 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Thu, 18 Dec 2008 12:14:10 -0800 (PST) Subject: Reminder: MEMS Seminar Today: Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems, 2-3pm CISX-101 In-Reply-To: <1342630753.3825611229378938355.JavaMail.root@zm06.stanford.edu> Message-ID: <1513162173.4173771229631250444.JavaMail.root@zm06.stanford.edu> MEMS Seminar Announcement: ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Thursday, December 18th, 2008 2:00 ? 3:00 pm CISX-101 Title: Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems Speaker: Prof. Sunghoon Kwon Seoul National University, Korea Abstract: There are two different fabrication methods for building complex micro devices: top-down and bottom-up. The top-down approach, based on conventional photolithography, has given us amazing CMOS manufacturing capabilities but it?s facing a fundamental limit in it's downward scalability. Recently, various bottom-up manufacturing technologies have gained notice for their ability to overcome limits of top-down manufacturing. Breakthroughs will result from marrying top-down technique such as lithography and bottom-up technique such as self-assembly. Moving past the mundane introduction, what I really want to talk about is ?Smart Scalable Systems?, a radical bottom-up point of view for building complex systems. It seeks to construct a complex system by self-assembly of many simpler components, like a mosaic or a collage in art. Instead of building a system monolithically, it scalably assembles lots of small parts that are manufactured separately in large quantity to build up complex systems such as biosensors, energy sources, and displays. In this seminar optofluidic maskless lithography will be presented as a first step for smart particle generation. Secondly, various fluidic self-assembly technologies such as railed microfluidics will be discussed as a smart particle assembly method. Then I will give a road map of application examples such as encoded particle based scalable biosensors, LED chip packaging, scalable energy sources and scalable displays. Finally, I will end with an innovative method of artificially mimicking nature?s various structural colors as a first step to scalable display. By creatively combining OFML and magnetic self-assembly, we demonstrated full color printing of artificial structural color using a single material. Bio.: Sunghoon Kwon was born and raised in Seoul, Korea. He received his BS from Seoul National University in Electrical Engineering in 1998. Fascinated by MRI and CT, he decided to study biomedical engineering and got his MS in BME from SNU. His passion for sailing motivated him to move to the Bay area for his advanced degree. In 2004, he got his Ph.D in Bioengineering at UC Berkeley completing his thesis work on MEMS confocal microscopes with Professor Luke Lee. He then worked on various nanofabrication and nanoscience problems with Professor Jeff Bokor at the Molecular Foundry at Lawrence Berkeley National Laboratory. He also founded SPS Microsystems, a company working on commercialization of a MEMS projector for cell phone. In 2006 he arrived back to Korea and joined SNU EE as a faculty member. His research group, the Biophotonics and Nano Engineering Laboratory (BINEL), is now working on various topics such as guided self assembly, scalable biosensors, and artificial structural colors. From ehe at stanford.edu Sat Dec 20 23:13:25 2008 From: ehe at stanford.edu (Elizabeth Edwards) Date: Sat, 20 Dec 2008 23:13:25 -0800 Subject: Missing storage box - EHE Message-ID: Greetings labmembers, I'm having trouble locating a brown box labelled on at least two sides "Elizabeth Edwards/ehe at stanford.edu 12/2008" that was in the storage racks in the CAD room. I last saw it around 12/17/08 and could not find it anywhere in the CAD room or hallway. If you see it anywhere please send me an email. Thanks, Liz Edwards ehe at stanford.edu From shibingw at stanford.edu Tue Dec 23 18:32:05 2008 From: shibingw at stanford.edu (Shibing Wang) Date: Tue, 23 Dec 2008 18:32:05 -0800 Subject: synthetic single crystal quartz Message-ID: <49519F25.3070003@stanford.edu> Dear labmembers, does anyone have used synthetic single crystal quartz before, either as wafers or for other functionality? I am hoping to find very tiny amount (~mg) of quartz for use in high-pressure measurements. I was wondering if you happen to have old samples that you'll never use again containing quartz? Or if you know where to get synthetic single crystal quartz. I'd really appreciate any kind of help. Thanks and happy holidays! Shibing Wang shibingw at stanford.edu