MEMS Seminar NOW in CISX Aud.

Roozbeh Parsa rparsa at stanford.edu
Wed Feb 6 15:44:32 PST 2008


Title: Lessons from Gate Stack Research for Nano Scale Devices and  
Future Challenges in Silicon based Device Technology


Date: Wednesday, February 6, 2008
Time: 4:00 ? 5:00 pm (refreshments at 3:45)
Place: CISX Auditorium
Host: Prof. Roger Howe


Speaker:
Dr. Byoung Hun Lee
SEMATECH, Austin, Texas


Abstract:

After the four decades since its implementation in the core of silicon  
device technology, the polysilicon/SiO2 gate stack has been finally  
replaced with metal electrode/ high-k dielectric gate stacks for  
leading edge Si CMOS devices.  More than a decade of intense research  
on the new gate stack materials such as Hf-based gate dielectric and  
various metal electrodes yielded plenty of new understandings on the  
device physics and characterization technologies as well as new  
material systems and provided a new pathway to future nano scale  
device development. This talk will review the key technical challenges  
that have been overcome to implement new gate stack materials,  
including the discussion on the mobility degradation mechanism of  
high-k dielectric, a unified dipole model used to control the  
effective workfunction of metal electrode, and new understandings on  
the reliability physics for high-k dielectrics. Then, the technical  
challenges associated with alternative materials and novel devices  
will be discussed for future device and material research.

Biography:

Byoung Hun Lee received a B.S. (1989) and a M.S. (1992) in Physics  
from Korea Advanced Institute of Science and Technology and Ph.D  
(2000) in electrical and computer engineering from the University of  
Texas at Austin.  He worked at Samsung semiconductor (1992-1997) and  
IBM (2001-2007). He has authored and co-authored more than 300 journal  
and conference papers in the various miconductor research areas  
including memory technology, MOSFET reliability, SOI device and  
process, strained silicon devices, and high-k and metal gate process  
and devices.  He is currently managing emerging technology program at  
SEMATECH.  He is a senior member of IEEE and acting as a guest editor  
for Microelectronics Engineering and IEEE Transaction on Devices and  
Materials Reliability.
He is a general chair of IEEE International Symposium on Advanced Gate  
Stack Technology in 2008 and served a member of technical committee in  
various technical conferences including International Reliability  
Physics Symposium, Semiconductor Interface Specialist Conference and  
VLSI-TSA.



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