From shott at stanford.edu  Sun Jun  1 20:38:35 2008
From: shott at stanford.edu (John Shott)
Date: Sun, 01 Jun 2008 20:38:35 -0700
Subject: Chemicals have been stocked ....
Message-ID: <48436B3B.1080804@stanford.edu>

SNF Lab Members:

The chemical shortage of sulfuric, peroxide, and 50:1 in the passthrough 
has been alleviated ....

Happy processing,

John




From ifushman at stanford.edu  Tue Jun  3 23:13:28 2008
From: ifushman at stanford.edu (Ilya Fushman)
Date: Tue, 3 Jun 2008 23:13:28 -0700
Subject: Fwd: University PhD Disseration Defense for Ilya Fushman
In-Reply-To: <p06230900c46b05d83a56@171.64.84.39>
References: <p06230900c46b05d83a56@171.64.84.39>
Message-ID: <bf3d86240806032313h46c51dc3qe24beb96a4f9300@mail.gmail.com>

Dear Labmembers,I'd like to invite you to attend my defense.
Please see the email below.
-ilya

---------- Forwarded message ----------
From: Claire Nicholas <claireni at stanford.edu>
Date: Tue, Jun 3, 2008 at 8:02 AM
Subject: Re: University PhD Disseration Defense for Ilya Fushman
To:
Cc: apgradstudents at lists.stanford.edu, apfaculty at lists.stanford.edu


 Department of Applied Physics
University PhD Dissertation Defense


Quantum Dots in Photonic Crystals: From Quantum Information Processing to
Single Photon Nonlinear Optics

Ilya Fushman

Research Advisor: Professor Jelena Vuckovic

5 June 2008 @4:15 p. m.
in
Applied Physics Building,  Room 200

Abstract
Photonic crystal cavities have emerged as one of the leading technology
platforms for classical and quantum information processing with photons.
These cavities possess extremely small optical volumes and high quality
factors, which result in long photon storage times and high field
intensities inside these nano-resonators. The field intensities due to
single photons inside such resonators are significant, and allow the
exploration of light-matter interaction at the single photon level.
Furthermore, these devices are fabricated in standard high index
semiconductors, and thus benefit from existing technologies, scaling,
integration and mass production. The combination of photonic crystals with
optically active materials such as quantum dots and quantum wells offer the
possibility of exploring novel regimes of light-matter interaction and the
implementation of information processing devices.
We have recently demonstrated that the presence of a single semiconductor
quantum dot inside a photonic crystal cavity can strongly modify the
transmission of photons through the resonator. [1] Furthermore, due to the
enhancement of the electromagnetic field intensity, the nonlinear properties
of a single quantum dot can realize interactions between photon streams at
the single photon level. We have exploited this effect to demonstrate a
controlled phase shift interaction between photons, which serves as a proof
of concept for quantum logic with photons on a semiconductor chip. [2] We
have also shown that such cavities are extremely sensitive to local changes
in refractive index, and can be used to realize all-optical modulation at
high rates exceeding 20GHz, with applications to classical information
processing. [3] The speed of such modulators is limited by the free-carrier
lifetime of electron-hole pairs inside the semiconductor, which is greatly
reduced relative to the bulk value by the large surface-area to volume ratio
of photonic crystals.

[1] Controlling Cavity Reflectivity With a Single Quantum Dot, Dirk Englund,
Andrei Faraon, Ilya Fushman, Nick Stoltz, Pierre Petroff, Jelena Vuckovic,
Nature, vol. 450, number 7171, pp. 857-861 (2007)
[2] Controlled Phase Shifts with a Single Quantum Dot, Ilya Fushman, Dirk
Englund, Andrei Faraon, Nick Stoltz, Pierre Petroff, Jelena Vuckovic,
Science, vol. 320, number 5877, pp. 769-772 (2008)
[3] Ultra Fast Nonlinear Optical Tuning of Photonic Crystal Cavities, Ilya
Fushman, Edo Waks, Dirk Englund, Nick Stoltz, Pierre Petroff, and Jelena
Vuckovic, Applied Physics Letters, vol. 90, article 091118 (2007)
(arXiv:physics/0611303)

-- 


--++**==--++**==--++**==--++**==--++**==--++**==--++**==
apgradstudents mailing list
apgradstudents at lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/apgradstudents





-- 
Ilya Fushman
Applied Physics
Stanford University
cvitae.org/ilya/
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From mse.whu at stanford.edu  Wed Jun  4 10:30:44 2008
From: mse.whu at stanford.edu (Wei Hu)
Date: Wed, 04 Jun 2008 10:30:44 -0700
Subject: Reminder: University Ph.D. Oral Examination - Wei Hu
In-Reply-To: <20080522142736.4a32pe8tcggog0sk@webmail.stanford.edu>
References: <20080522142736.4a32pe8tcggog0sk@webmail.stanford.edu>
Message-ID: <20080604103044.1hojdbkjhusk8cgk@webmail.stanford.edu>

High-Moment Synthetic Magnetic Nanoparticles for Biomedical Applications

Wei Hu
Materials Science & Engineering
Advisor: Prof. Shan X. Wang

Thursday, June 5th, 2008
9:30 AM (Refreshments served at 9:15 AM)
McCullough Bldg. Room 335

Abstract:

Superparamagnetic nanoparticles are widely used in biology and  
medicine for applications which include biomolecule purifications and  
cell separations, magnetic resonance imaging(MRI) contrast agents, and  
bio-magnetic sensing. These nanoparticles are usually synthesized by  
chemical routes, which are powerful but the size of nanoparticles are  
typically below 20 nm due to the superparamagnetic limit. Beyond this  
size, it is difficult to attain monodispersity and the onset of  
ferromagnetism results in coercivity,
remanent magnetization and consequently magnetically induced  
agglomeration. Magnetic nanoparticles with higher moments are often  
desired to produce large signals or to avoid restrictive requirements  
for high magnetic field gradients in separations. One conventional  
solution is to incorporate numerous magnetic nanoparticles into larger  
composites using matrices comprised of dextran or silica. However,  
there are still limitations associated with controlling the  
monodispersity, magnetic response and variations in the number and  
size of the embedded nanoparticles.

In this talk, I'll present the physical fabrication of sub-100 nm  
monodisperse disk-shape synthetic nanoparticles with high  
magnetization ferromagnetic multilayers (e.g. Co-Fe alloy) using  
nanoimprint lithography (NIL) and high vacuum deposition, followed by  
release and stabilization of nanoparticles in solution.  
Antiferromagnetic interlayer interactions are exploited to achieve  
zero remanence and thus these nanoparticles are termed synthetic  
antiferromagnetic (SAF) nanoparticles, which posses magnetic moments
well above those typical of superparamagnetic nanoparticles.

Unlike the chemical synthesis of magnetic nanoparticles, physical  
fabrication enables accurate control of particle shape, size and  
composition, and thus synthetic nanoparticles possess a lot of  
interesting properties which are not readily accessible to  
conventional superparamagnetic nanoparticles. For example, I  
demonstrate SAF nanoparticles with adjustable saturation fields, which  
are desired for multiplex magnetic labeling in biodetection or  
multiplex cell sorting. Their high magnetic moments afford great ease  
for magnetic manipulation in solutions with only modest field  
gradients, which
is highly desired for magnetic sorting. Metallic synthetic  
nanoparticles strongly scatter light and can be individually tracked  
in solution under optical microscopy.

To further evaluate their application potential for biomedicine, we performed
bio-magnetic detection with streptavidin functionalized SAF  
nanoparticles. A low concentration of analyte DNA molecules at 10 pM  
was clearly detectable. MRI measurements of nanoparticle enhanced  
proton transverse relaxation revealed that SAF nanoparticles are  
promising as contrast enhancement agents. In addition, hysteresis  
measurements indicate that magnetic nanoparticles with vortex domain  
structure (a second type of synthetic nanoparticles) could be  
efficient heating elements for magnetic nanoparticle hyperthermia.

Last but not least, large scale fabrication of SAF nanoparticles with  
low cost and high throughput is achieved using self-assembled stamps  
and a polymer sacrificial layer with the assistance of batch-process  
thermal evaporation. This fabrication technique is ideal for producing  
multi-modal nanoparticles by exploiting layers with unique magnetic,  
optical, radioactive, or electronic properties.
-- 
Wei Hu
Ph.D. Candidate
Department of Materials and Engineering
Stanford University




From mbaran at stanford.edu  Wed Jun  4 11:19:55 2008
From: mbaran at stanford.edu (Maureen Baran)
Date: Wed, 4 Jun 2008 11:19:55 -0700
Subject: Found USB Stick on the First floor of the CIS Building
Message-ID: <20080604181956.6887265B1A5@smtp2.stanford.edu>

Dear Lab Mebmers,

 

If you have misplaced your USB memory stick in the last couple of days,
please stop by my cubicle # 41 on the first floor of the CIS Building.  Be
prepared to describe your lost item.

 

Thank you,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran at stanford.edu

650-725-3664

 

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From mtang at stanford.edu  Wed Jun  4 17:57:48 2008
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 04 Jun 2008 17:57:48 -0700
Subject: SNF Process Grand Rounds, 6/6/08, 11:30 am, CIS 101
Message-ID: <48473A0C.2010705@stanford.edu>

Hi all --

It's that time again, the SNF Process Grand Rounds.  Time for:
- Process brainstorming for anyone who'd like to pose a process question. 
- Review of Quality Circle activities.
- And, if anyone is interested, a tutorial on using LEdit for mask layouts.

We'll be in CIS 101 at 11:30.  Pizza will be on hand.  Hope to see you 
there.

Your SNF Process staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From mtang at stanford.edu  Thu Jun  5 18:03:25 2008
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 05 Jun 2008 18:03:25 -0700
Subject: New Lab Practices, effective Monday, June 9
Message-ID: <48488CDD.4070009@stanford.edu>

Dear Labmembers:

Over the past few months, Quality Circles comprised of process and 
maintenance staff and students have been meeting regularly with the goal 
of defining ways in which we can improve our lab.  A lot of activities 
and programs have come out of these meetings -- and we would like to 
inform you of two of them, scheduled to begin next week.

 

First: Name tags.  Starting Monday, we will expect everyone to begin 
wearing name tags in the lab.  Blank tags will be provided in the 
gowning room and are colored coded to distinguish labmembers from staff 
and from visitors.  With 230+ labmembers making use of the lab every 
month, it's hard to know who everyone is, especially with bunnysuits 
on.  We hope this helps make it easier to find who that mystery Coral 
login "mrxyz" with the late innotec reservation is.  And we hope it will 
help reduce anonymity and improve personal accountability in the lab.

 

Second:  The shadowing program.  Starting Monday, labmembers wanting to 
be qualified on most wet benches and furnaces will be required first to 
observe a qualified labmember operate the system.  Shadowing forms will 
be available in the gowning room and will include some advice on 
shadowing courtesy.  For you experienced users, please be aware that new 
labmembers may scan through Coral reservations looking for someone to 
observe:  this may be you.  You have the right to refuse... but we want 
to encourage everyone to contribute and to use this as an opportunity to 
get to know, work with, and better train the next generation of 
labmembers.  And if you would like to be qualified on any of the 
automatic wet benches or furnaces, contact the appropriate staff member 
as usual; you'll be given instructions, forms, and training materials.

 

These are only a couple of the many activities, projects, and programs 
coming out of the Quality Circles.  If you would like to participate in 
any of these (Furnaces, Litho, Etch, Metals, RTA's, and Epi), please 
come to a meeting (most are held in CIS 201, but contact a staff member 
to confirm).  These are biweekly and schedules are posted on the 
whiteboard outside the gowning room. 

 

Thanks for your attention --

 

The SNF Quality Circles

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Fri Jun  6 08:46:37 2008
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 06 Jun 2008 08:46:37 -0700
Subject: SNF Process Grand Rounds
Message-ID: <48495BDD.8060009@stanford.edu>

Hi all --

Just a reminder -- Process Grand Rounds today, at 11:30, in CIS 101.
1.  Process Brainstorming:  bring your process questions to pose to the 
gang.
2.  Quality Circle Update
3.  Maskmaking with LEdit tutorial

M

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From shuluc at stanford.edu  Fri Jun  6 13:49:44 2008
From: shuluc at stanford.edu (shuluc at stanford.edu)
Date: Fri, 06 Jun 2008 13:49:44 -0700
Subject: Missing 3 inch Wafers in single wafer holders
Message-ID: <20080606134944.03iqj0imsooww408@webmail.stanford.edu>

Hi,

Sorry for bothering.

Has anyone seen two 3-inch single wafer holders with label "Wafer 4"  
and "Wafer 5"
on top of them recently?
Please let me know if you ever saw these kind of 3 inch wafer holders.
Thank a lot~~
Best,

Erik



From mtang at stanford.edu  Fri Jun  6 17:19:17 2008
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 06 Jun 2008 17:19:17 -0700
Subject: Acid Use and Courtesy at Wet Benches
Message-ID: <4849D405.6080203@stanford.edu>

Hi all --

Just two reminders:

1. Check acid change frequency and to log your acid changes.  According 
to the wbdiff operating procedures:

    * The 4:1 sulfuric/peroxide clean should be changed once every five
      days.
    * The 5:1:1 H2O:H2O2:HCl hot pot should be changed every four hours.
    * The 50:1 HF tank should be changed once/day.
    * The 6:1 BOE is changed once per month or on an as-needed basis.

With the pass through fully stocked this afternoon, this should be more 
than sufficient for the weekend.  Please be judicious in your use of acids.

2.  Ask before sharing a wet bench.  The person who has the bench 
enabled is responsible for the bench, and therefore, your use if you 
share.  The person enabled has priority access -- and may ask you to 
enable over him/her.

Thanks for your attention --

Your SNF staff


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From akamath at kovio.com  Sun Jun  8 11:43:19 2008
From: akamath at kovio.com (Arvind Kamath)
Date: Sun, 8 Jun 2008 11:43:19 -0700
Subject: Mechanical post CMP scrub
Message-ID: <0A734412B02624499172B7366A97336B10556FBA06@server.print-this.com>

Hello,

   I am looking for a post (metal) CMP mechanical brush scrub cleaning service preferably in Silicon Valley.  Something on the lines of an Ontrak brush scrub for 4" wafers would be very useful.

      Thanks,
                    Arvind Kamath
                    Kovio Inc.


From rmelamud at stanford.edu  Mon Jun  9 15:54:21 2008
From: rmelamud at stanford.edu (Renata Melamud)
Date: Mon, 09 Jun 2008 15:54:21 -0700
Subject: Renata Melamud Thesis Defense - 9am Friday 06/13/08
Message-ID: <484DB49D.7040407@stanford.edu>

Renata Melamud
Ph.D. Thesis Oral Examination
"Temperature Insensitive Microelecromechanical Resonators"
Advisor: Prof. Thomas Kenny

Date: Friday, June 13th
Time: 9:00 am (Refreshments beforehand)
Place: CISX-101 (Auditorium)
http://campus-map.stanford.edu/index.cfm?ID=04-055

Abstract:

Silicon resonators for frequency reference applications capitalize on 
the size and cost advantages of silicon processing. Start-ups developing 
silicon resonators, such as SiTime, Discera, and Silicon Clocks, seek to 
displace the $2.5 billion quartz crystal frequency reference market that 
is at the core of modern electronic devices. However, unacceptable 
frequency deviations caused by the temperature dependence of silicon?s 
material properties prevent these resonators from competing with quartz 
resonators in high precision applications.

This work describes the design, fabrication, and testing of silicon - 
silicon dioxide composite resonators whose temperature sensitivity is 
comparable to quartz crystal resonators. The optimization of the 
composite resonator demonstrates a thirty-fold reduction in 
frequency-temperature sensitivity compared to uncompensated silicon 
resonators. These temperature insensitive devices are single anchored 
flexural mode resonators, are isolated from packaging stresses, and are 
hermetically sealed in a CMOS compatible wafer-level encapsulation 
technology. In conjunction with active temperature compensation schemes, 
such as those employed in the quartz industry, this passive technology 
enables silicon-based frequency references to surpass the size and power 
limitations of quartz crystals in high precision applications.



From mtang at stanford.edu  Mon Jun  9 17:58:43 2008
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 09 Jun 2008 17:58:43 -0700
Subject: "Venture" Clinic - Friday, June 13, 11 am, CIS 101
Message-ID: <484DD1C3.1050201@stanford.edu>

Dear Labmembers:

Are you thinking about starting a company to commercialize your research?  

Shahin Farschi, an Associate from Lux Capital, will be moderating a Venture Clinic, from 11-12, this Friday, June 13, in CIS 101.  The aim of the clinic is to provide an informal forum for researchers interested in brainstorming with a venture capitalist on ways to commercialize research.  Technical discussions should be limited to what has been already disclosed or published.

For more information, contact: 

Shahin Farshchi, Ph.D.
Associate
Lux Capital Management, LLC
T: 925.323.2784
http://www.luxcapital.com

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From saurabhc at stanford.edu  Tue Jun 10 12:05:35 2008
From: saurabhc at stanford.edu (Saurabh A. Chandorkar)
Date: Tue, 10 Jun 2008 12:05:35 -0700
Subject: Saurabh Chandorkar Thesis Defense - 12:30pm Friday, 13 June 2008
Message-ID: <484ED07F.3060509@stanford.edu>

Ph.D. Thesis Oral Examination
"Energy Loss Mechanisms in Micromechanical Resonators"
Advisor: Prof. Thomas W. Kenny and Prof. Kenneth E. Goodson

Date: Friday, June 13th
Time: 12:30 pm (Refreshments beforehand)
Venue: CISX-101 (Auditorium)
http://campus-map.stanford.edu/index.cfm?ID=04-055

Keywords: energy loss mechanisms, micromechanical resonators,
thermoelastic dissipation, Akhiezer effect, entropy generation 
minimization, quantum limit

Abstract:

Micromechanical resonators have the potential to replace quartz
crystals for timing and frequency references owing to their small
form factors, better aging stability and CMOS scalability. 
Quality factor, an important performance characteristic of all 
resonators, determines limits for system characteristics like 
close to carrier phase noise, stability and motional impedance.
Thus, for most applications we would like to design for the 
maximum achievable quality factor, and this requires good 
understanding of the energy loss mechanisms that limit the 
performance of modern micromechanical resonators. This work 
focuses on two such mechanisms: Thermoelastic dissipation and 
Akhiezer effect.

Thermoelastic dissipation refers to the energy lost from a solid
due to flow of heat between regions of different volumetric 
changes. This work presents a comprehensive entropic formulation
for quantifying energy loss due to thermoelastic dissipation. 
Entropy generation minimization, and therefore energy loss 
minimization, will be demonstrated through several case studies 
including simple fixed-fixed beams, simple fixed-fixed beams with
slots, composite beams and various bulk mode structures. We compare
our simulations against experimental evidence for confirmation of
modeling technique.

Certain bulk mode resonator structures will be shown to be immune
to thermoelastic dissipation. Akhiezer effect sets the ultimate
quantum limit of minimum achievable energy loss in dielectric 
micromechanical resonators. It will be shown that the current 
micromechanical resonators found in literature are very close to
this limit. Finally, recent results of microresonators designed
to operate close to Akhiezer effect limit will be discussed.



From linyouc at stanford.edu  Tue Jun 10 13:22:25 2008
From: linyouc at stanford.edu (linyouc at stanford.edu)
Date: Tue, 10 Jun 2008 13:22:25 -0700
Subject: Borrowing silicon wafer with thick silicon oxide
Message-ID: <20080610132225.yvgbv8a8sggs88go@webmail.stanford.edu>

Dear All,

Does anyone have extra 4" silicon wafer with thick silicon oxide on  
top(>100nm) I can borrow?  I sort of desperately need this kind of  
wafer, and would certainly return the favor later on in some ways.

Many thanks

Linyou

-- 
Linyou Cao
PhD candidate
Dept. of Mater. Sci.and Engin., Brongersma Group
President&Co-founder
Stanford Nanoscience&Nanotechnology Society
Stanford University


From saurabhc at stanford.edu  Wed Jun 11 00:00:51 2008
From: saurabhc at stanford.edu (Saurabh A. Chandorkar)
Date: Wed, 11 Jun 2008 00:00:51 -0700
Subject: NOTE: DEFENSE TIMING CHANGED TO 11:30AM , 13 June 2008
In-Reply-To: <484ED07F.3060509@stanford.edu>
References: <484ED07F.3060509@stanford.edu>
Message-ID: <484F7823.40807@stanford.edu>

Ph.D. Thesis Oral Examination
"Energy Loss Mechanisms in Micromechanical Resonators"
Advisor: Prof. Thomas W. Kenny and Prof. Kenneth E. Goodson

Date: Friday, June 13th
Time: 11:30 pm (Refreshments beforehand)
Venue: CISX-101 (Auditorium)
http://campus-map.stanford.edu/index.cfm?ID=04-055

Keywords: energy loss mechanisms, micromechanical resonators,
thermoelastic dissipation, Akhiezer effect, entropy generation 
minimization, quantum limit

Abstract:

Micromechanical resonators have the potential to replace quartz
crystals for timing and frequency references owing to their small
form factors, better aging stability and CMOS scalability. Quality 
factor, an important performance characteristic of all resonators, 
determines limits for system characteristics like close to carrier phase 
noise, stability and motional impedance.
Thus, for most applications we would like to design for the maximum 
achievable quality factor, and this requires good understanding of the 
energy loss mechanisms that limit the performance of modern 
micromechanical resonators. This work focuses on two such mechanisms: 
Thermoelastic dissipation and Akhiezer effect.

Thermoelastic dissipation refers to the energy lost from a solid
due to flow of heat between regions of different volumetric changes. 
This work presents a comprehensive entropic formulation
for quantifying energy loss due to thermoelastic dissipation. Entropy 
generation minimization, and therefore energy loss minimization, will be 
demonstrated through several case studies including simple fixed-fixed 
beams, simple fixed-fixed beams with
slots, composite beams and various bulk mode structures. We compare
our simulations against experimental evidence for confirmation of
modeling technique.

Certain bulk mode resonator structures will be shown to be immune
to thermoelastic dissipation. Akhiezer effect sets the ultimate
quantum limit of minimum achievable energy loss in dielectric 
micromechanical resonators. It will be shown that the current 
micromechanical resonators found in literature are very close to
this limit. Finally, recent results of microresonators designed
to operate close to Akhiezer effect limit will be discussed.





From barlian at stanford.edu  Wed Jun 11 18:19:00 2008
From: barlian at stanford.edu (A. Alvin Barlian)
Date: Wed, 11 Jun 2008 18:19:00 -0700
Subject: Late Announcement: Ph.D. Oral Examination - Alvin Barlian
Message-ID: <62F132FC-74AF-44DE-AB52-BFAD04953DEC@stanford.edu>

Microfabricated Piezoresistive Shear Stress Sensors for Underwater  
Applications

A. Alvin Barlian

Department of Mechanical Engineering, Stanford University

Ph.D. Oral Examination

Thursday, June 12, 2008 (Packard 101), 9AM



Abstract

Shear stress at the solid-fluid interface is a frequently studied  
parameter in fluid dynamics because of its relevance to many  
engineering applications, such as those in aerodynamic and  
hydrodynamic design. Shear stress measurements are also critical in  
biomedical and environmental science research. For example, shear  
stress data lead to improved understanding of fluid flow physics in  
cardiovascular systems and coral reef ecologies.
We present the design and characterization of a piezoresistive  
floating-element shear stress sensor. Conventional and oblique-angle  
ion-implantation techniques were used to form piezoresistors on the  
top and sidewall surfaces of the tethers. Hydrogen anneal technology  
was used to smooth sidewall scallops commonly seen in the Deep  
Reactive Ion Etching (DRIE) process and to reduce the noise in  
sidewall piezoresistors. A microfabricated piezoresistive cantilever  
was used to characterize the in-plane sensitivity of the sensor, while  
Laser Doppler Vibrometry was used to characterize its out-of-plane  
sensitivity.
The SiO2/Si3N4/SiO2 triplex layer and Parylene C were used as  
passivation schemes in two underwater experiments. The first  
experiment used a cylindrical water tank sitting on a rotating table  
to produce solid body rotation. The second experiment used a gravity- 
driven water flume to create a uniform, fully-developed flow over the  
sensor. Polymer flip-chip flexible interconnects were fabricated and  
used for the packaging of the sensor in the second experiment.
Piezoresistors formed using the oblique-angle ion-implantation  
technique required a thermal annealing step to activate dopants, hence  
increasing junction depth and reducing sensitivity. A novel sidewall  
epitaxial piezoresistor fabrication process, using selective  
deposition, is demonstrated for in-plane sensing applications. Early  
findings on electrical and mechanical characteristics are presented.

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From edmyers at stanford.edu  Sat Jun 14 14:49:48 2008
From: edmyers at stanford.edu (Ed Myers)
Date: Sat, 14 Jun 2008 14:49:48 -0700
Subject: Fwd: last two bottles of 50:1 HF left.
Message-ID: <6.2.5.6.2.20080614144718.025f6c58@stanford.edu>

All,

The chemical pass-through has been replenished.  Please adhere to the 
posted frequency for changing the chemicals.

The 4:1 sulfuric/peroxide clean should be changed once every five days.
The 5:1:1 H2O:H2O2:HCl hot pot should be changed every four hours.
The 50:1 HF tank should be changed once/day.
The 6:1 BOE is changed once per month or on an as-needed basis.

Regards,
Ed

>Subject: last two bottles of 50:1 HF left.
>




From mtang at stanford.edu  Sun Jun 15 11:33:46 2008
From: mtang at stanford.edu (Mary Tang)
Date: Sun, 15 Jun 2008 11:33:46 -0700
Subject: SNF Process Clinic, Monday, June 16, 2-4 pm
Message-ID: <4855608A.3070909@stanford.edu>

Greetings Labmembers --

Process Clinic, this coming Monday, June 16, from 2-4 pm in the cubicle 
area near CIS 41.  Bring questions about processing and process flow, 
mask layouts, and new materials and chemicals.  Staff and experienced
labmembers will be on hand to offer suggestions.  SpecMat will convene
at 3 pm to review new material/chemical requests.

Your SNF Staff



From edmyers at stanford.edu  Mon Jun 16 08:45:10 2008
From: edmyers at stanford.edu (Ed Myers)
Date: Mon, 16 Jun 2008 08:45:10 -0700
Subject: Ge Spin-Etch Clean Tool
Message-ID: <6.2.5.6.2.20080616084206.02d55ba8@stanford.edu>

All,

The process engineer from Laurell Technologies will be available from 
9-11am on Wednesda,y June 18th to explain the new Spin-Etch tool SNF 
just installed.  Please take the time to stop by and get your 
questions answered from the expert.

Regards,
Ed



From Luke_Tang at stanford.edu  Mon Jun 16 14:56:13 2008
From: Luke_Tang at stanford.edu (Luke Tang)
Date: Mon, 16 Jun 2008 14:56:13 -0700
Subject: PhD Dissertation Defense for Luke Tang on June 19
Message-ID: <6.2.5.6.2.20080616145502.04b9dec0@stanford.edu>


>
>
>Department of Applied Physics
>University PhD Dissertation Defense
>
>Nanometre-Scale Photodetectors Enhanced by Optical Antennas
>
>Liang (Luke) Tang
>
>Research Advisor: Professor David A.B. Miller
>
>June 19, 2008 @ 3:00 p.m.
>in
>Center for Integrated Systems (CIS-X), Auditorium room 101
>
>Abstract
>
>The use of optics to make connections within and 
>between electronic chips has been the subject of 
>research for over 20 years because it could 
>solve many of the problems experienced in 
>electrical systems. A critical challenge for the 
>convergence of optics and electronics is that 
>the micrometre scale of optics is significantly 
>larger than the nanometre scale of modern 
>electronic devices. In the conversion from 
>photons to electrons by photodetectors, this 
>size incompatibility often leads to substantial 
>penalties in power dissipation, area, latency 
>and noise. A photodetector can be made smaller 
>by using a subwavelength active region which, 
>however, could result in very low responsivity 
>because of the diffraction limit of the light.
>In our first approach to tackle this problem, we 
>use a C-shaped nano-aperture antenna in a thin 
>metal layer to enhance the photocurrent response 
>of a subwavelength photodetector. The work is 
>the first demonstration of a plasmonic-enhanced 
>semiconductor photodetector at near-infrared 
>wavelengths. In our second approach, we exploit 
>the idea of a dipole antenna from radio waves, 
>but at near infrared wavelengths (~ 1.3 ?m), to 
>concentrate radiation into a nanometre-scale Ge 
>photodetector. Despite the small antenna size (~ 
>380 nm long) and the different properties of 
>metals at such high frequencies (~ 230 THz), the 
>antenna has qualitatively similar behavior to 
>the common radio-frequency half-wave Hertz 
>dipole. It gives a relative enhancement of 20 
>times in the resulting photocurrent in the 
>subwavelength Ge detector element, which has an 
>active volume of 0.00072 _m3, two orders of 
>magnitude smaller than previously demonstrated 
>detectors at such wavelengths. Finally, we 
>integrate an antenna-enhanced photodetector on a 
>commercial CMOS chip, which is the first 
>demonstration of any plasmonic effect in Si 
>CMOS. Photodetectors are one of the most 
>critical components in optoelectronic 
>integration, and decreasing their size may 
>enable novel chip architectures and ultra-low 
>electrical and optical power operations.
>
>
>--
>--++**==--++**==--++**==--++**==--++**==--++**==--++**==
>apgradstudents mailing list
>apgradstudents at lists.stanford.edu
>https://mailman.stanford.edu/mailman/listinfo/apgradstudents
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From mbaran at stanford.edu  Mon Jun 16 16:42:03 2008
From: mbaran at stanford.edu (Maureen Baran)
Date: Mon, 16 Jun 2008 16:42:03 -0700
Subject: Does Anyone know Victor Andrade?
Message-ID: <20080616234204.ED70E2D6C89@smtp1.stanford.edu>

 

Dear All,

 

He dropped his Driver's License and I have it at my desk.  I am in cubicle
#41 on the first floor of the CIS building.

 

Thank you,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran at stanford.edu

650-725-3664

 

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From eap at gloworm.Stanford.EDU  Mon Jun 16 22:38:39 2008
From: eap at gloworm.Stanford.EDU (Eric Perozziello)
Date: Mon, 16 Jun 2008 22:38:39 -0700 (PDT)
Subject: Acid Waste Neutralizer down for the night
Message-ID: <Pine.GSO.4.44.0806162230470.12313-100000@gloworm.Stanford.EDU>



Please do not dump acids or bases at any of the wetbenches
tonight.  The Neutralizer is down until the morning.
Cesar got the system back into spec manually, and
Tony Padilla came in from vacation to look at the system.
Jose will take care of it in the morning.

It's critical that no chemicals be dumped.  If the pH
goes out of spec in the neutralizer tanks, then the
neutralizer must divert ALL water to a holding tank,
that will quickly fill up and overflow.  Even if noone
is dumping water from the lab, the scrubbers and other
facilities continuously feed (almost pure) water to
the system.  So if we upset the pH in the system even slightly,
we create a very bad overflow situation.




From shott at stanford.edu  Tue Jun 17 08:38:17 2008
From: shott at stanford.edu (John Shott)
Date: Tue, 17 Jun 2008 08:38:17 -0700
Subject: Acid neutralization .... OK to use!
Message-ID: <4857DA69.4010700@stanford.edu>

SNF Lab Members:

The sodium hydroxide tank for the acid waste neutralization system has 
been filled.  While facilities is still monitoring the condition of tank 
#2 that caused excessive sodium hydroxide usage, we have been given the 
"all clear" to resume normal processing activities.  While there may be 
some interruption in service later, depending on what they learn, for 
the moment we may resume full wet bench operations.

Happy processing,

John




From mmlee at stanford.edu  Tue Jun 17 09:09:45 2008
From: mmlee at stanford.edu (Meredith M. Lee)
Date: Tue, 17 Jun 2008 09:09:45 -0700
Subject: Ultra parallel quartz wafers from Hoya?
Message-ID: <9fa245520806170909n33ccb0fdh3e205680d3fc2986@mail.gmail.com>

Hi all,

Does anyone have a Hoya quartz UP wafer that I could look at under an
interferometer?  (or any comments on how flat/parallel they or other quartz
wafers are?)

Thanks,
-Meredith

-- 
--------------------------------------------------
Meredith M. Lee
Stanford University
Ph.D. Candidate, Dept. of Electrical Engineering
President, Stanford Student OSA/SPIE

Center for Integrated Systems
420 Via Ortega, Stanford, CA 94305-4075
Fax: (650) 723-4659
mmlee at stanford.edu
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From Luke_Tang at stanford.edu  Wed Jun 18 14:05:50 2008
From: Luke_Tang at stanford.edu (Luke Tang)
Date: Wed, 18 Jun 2008 14:05:50 -0700
Subject: REMINDER- PhD Dissertation Defense for Luke Tang on June 19th
Message-ID: <6.2.5.6.2.20080618135507.056d52e8@stanford.edu>


>
>
>Department of Applied Physics
>University PhD Dissertation Defense
>
>Nanometre-Scale Photodetectors Enhanced by Optical Antennas
>
>Liang (Luke) Tang
>
>Research Advisor: Professor David A. B. Miller
>
>June 19, 2008 @ 3:00 P.M.
>in
>Center for Integrated Systems (CIS-X), Auditorium, Room 101
>
>Abstract
>
>The use of optics to make connections within and 
>between electronic chips has been the subject of 
>research for over 20 years because it could 
>solve many of the problems experienced in 
>electrical systems. A critical challenge for the 
>convergence of optics and electronics is that 
>the micrometre scale of optics is significantly 
>larger than the nanometre scale of modern 
>electronic devices. In the conversion from 
>photons to electrons by photodetectors, this 
>size incompatibility often leads to substantial 
>penalties in power dissipation, area, latency 
>and noise. A photodetector can be made smaller 
>by using a subwavelength active region which, 
>however, could result in very low responsivity 
>because of the diffraction limit of the light.
>
>In our first approach to tackle this problem, we 
>use a C-shaped nano-aperture antenna in a thin 
>metal layer to enhance the photocurrent response 
>of a subwavelength photodetector. The work is 
>the first demonstration of a plasmonic-enhanced 
>semiconductor photodetector at near-infrared 
>wavelengths. In our second approach, we exploit 
>the idea of a dipole antenna from radio waves, 
>but at near infrared wavelengths (~ 1.3 ?m), to 
>concentrate radiation into a nanometre-scale Ge 
>photodetector. Despite the small antenna size (~ 
>380 nm long) and the different properties of 
>metals at such high frequencies (~ 230 THz), the 
>antenna has qualitatively similar behavior to 
>the common radio-frequency half-wave Hertz 
>dipole. It gives a relative enhancement of 20 
>times in the resulting photocurrent in the 
>subwavelength Ge detector element, which has an 
>active volume of 0.00072 _m3, two orders of 
>magnitude smaller than previously demonstrated 
>detectors at such wavelengths. Finally, we 
>integrate an antenna-enhanced photodetector on a 
>commercial CMOS chip, which is the first 
>demonstration of any plasmonic effect in Si 
>CMOS. Photodetectors are one of the most 
>critical components in optoelectronic 
>integration, and decreasing their size may 
>enable novel chip architectures and ultra-low 
>electrical and optical power operations.
>
>
>--
>--++**==--++**==--++**==--++**==--++**==--++**==--++**==
>apgradstudents mailing list
>apgradstudents at lists.stanford.edu
>https://mailman.stanford.edu/mailman/listinfo/apgradstudents
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From mtang at stanford.edu  Wed Jun 18 17:29:29 2008
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 18 Jun 2008 17:29:29 -0700
Subject: Labmembers' Meeting, Friday, June 20, 11 am, CISX-101
Message-ID: <4859A869.4090505@stanford.edu>

Greetings labmembers --

Please come to the SNF Labmembers' meeting, this Friday, June 20, from 
11 am - noon, in the CISX Auditorium.  The agenda will be a review of 
the status of the various programs and projects underway in the lab, 
including:

- the new Wiki-based website
- updating the EE410 device process
- new equipment installations and upgrades
- and much more --

Be there and be aware!

Your SNF staff


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From mtang at stanford.edu  Fri Jun 20 08:55:27 2008
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 20 Jun 2008 08:55:27 -0700
Subject: Reminder:  Labmembers' Meeting Today (Friday) at 11 am
Message-ID: <485BD2EF.7030607@stanford.edu>

Hi all --

Just a reminder that there's a Labmembers' Meeting today (Friday) at 11 
am in the CISX 101 Auditorium.  All are invited.  Find out what the new 
"spin etch" tool can do (located next to wbgaas).  Get a sneak peak at 
the new lab web site under development.  Hear about new equipment and 
process capabilities on the horizon.  Be there and be aware --

Your SNF Staff


From shott at stanford.edu  Mon Jun 23 14:00:33 2008
From: shott at stanford.edu (John Shott)
Date: Mon, 23 Jun 2008 14:00:33 -0700
Subject: Intermittent sliding lab door ...
Message-ID: <48600EF1.3000601@stanford.edu>

SNF Lab Members:

We've had two reports of the inner sliding door (the one between the 
inside of the lab and the gowning area) failing to open: once on Friday 
and once today.  On Friday, by the time we could look at it, it seemed 
to be working again.  Today, I got there in time to see that it, in 
fact, would not open .... but power cycling it seemed to make it 
functional once again.  I've put in a request to facilities (because 
they take care of that door) to take a look at it.

However, particularly in the event of a power failure or other 
emergency, you should all be aware that you can ALWAYS get that door to 
open by pushing outward on the metal frame on the left side near the 
latch.  That will cause the door to swing open (rather than slide open) 
and you can get out.  Also, the outer door to the hallway has a white 
"Emergency Override" button on the right side of the door frame (at 
about the height of the handle) that will allow that door to open 
immediately, even if the inner door is open.

So, we will try to resolve the intermittent failure that we are seeing 
on that inner door, but I wanted to make sure that you all know that you 
can always get out of those doors even if they appear to not be functional.

Thank you for your continued support,

John






From sjo at stanford.edu  Mon Jun 23 17:01:08 2008
From: sjo at stanford.edu (Sebastian J. Osterfeld)
Date: Mon, 23 Jun 2008 17:01:08 -0700
Subject: Open Source software for mask editing - MAC, PC, Linux
Message-ID: <48603944.3050702@stanford.edu>

Dear Labmembers,

In the spirit of supporting open source software, I just wanted to 
recommend the very nice open-source program LayoutEditor, which can be 
found at http://layout.sourceforge.net/

It is small and easy to use, and it works natively with GDS (mask) and 
DXF (autocad) file formats. It shows you what the mouse buttons will do 
at any given instance, and it also can display your mask layers as a 
stack in 3D. It's available for Windows, MAC, and Linux. If you need a 
program to edit or display your mask files on your own computer, then 
this program is the best alternative to L-Edit that I know - see 
screenshots below. L-Edit may still have better DRC and geometry flag 
checking - which you can do when you're mostly done with your design - 
but I have exclusively been using LayoutEditor for years now with good 
success.

Best regards,
Sebastian Osterfeld

LayoutEditor3D



LayoutEditor
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From mpovinel at stanford.edu  Mon Jun 23 19:37:12 2008
From: mpovinel at stanford.edu (Michelle Povinelli)
Date: Mon, 23 Jun 2008 19:37:12 -0700
Subject: lost Stanford ID
Message-ID: <6E481170-C3B9-4D86-8FC7-21A6EB5E8DBB@stanford.edu>

I believe I dropped my ID somewhere inside the clean room. If any one  
finds it, please send me an email.
Thanks,
Michelle Povinelli



From chongxie at stanford.edu  Mon Jun 23 20:18:49 2008
From: chongxie at stanford.edu (Chong Xie)
Date: Mon, 23 Jun 2008 20:18:49 -0700
Subject: Lost Car Key
Message-ID: <48606799.8000303@stanford.edu>

Dear lab members,

I lost my only car key somewhere, probably in the CIS building. If 
anyone has seen a black car key, please let me know.

Thanks,

Chong


From shott at stanford.edu  Wed Jun 25 07:46:13 2008
From: shott at stanford.edu (John Shott)
Date: Wed, 25 Jun 2008 07:46:13 -0700
Subject: Forest fire smoke ....
Message-ID: <48625A35.9070703@stanford.edu>

SNF Lab Members:

Once again, we seem to have the low-level smell of smoke in and around 
the building and, as a result, in the lab.  My guess is that, depending 
on wind and atmospheric conditions, this may be an ongoing occurrence 
for the next few days until the forest fires are fully extinguished.

Please be extra cautious in the lab under these conditions.  It will 
require extra care to distinguish "real" lab odors from the smell of the 
smoke.

Thank you for your continued support,

John





From dwitte at stanford.edu  Wed Jun 25 16:30:20 2008
From: dwitte at stanford.edu (Daniel Witte)
Date: Wed, 25 Jun 2008 16:30:20 -0700
Subject: silicon 110 wafer?
Message-ID: <8d3fd7200806251630odc666b9gfdd95b4ac73132e1@mail.gmail.com>

Hi all,

Does anyone have a bare <110> Si wafer I can have? I'm trying to run some
experiments on short notice, so if anyone can spare one that'd be a big
help. Doping doesn't really matter.

Thanks much,
Dan
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From jskach at gmail.com  Thu Jun 26 09:25:00 2008
From: jskach at gmail.com (Jessica Kachian)
Date: Thu, 26 Jun 2008 09:25:00 -0700
Subject: Help Requested
Message-ID: <bb2195f50806260925y7f9ebe9ahc3bdec7abad3e34@mail.gmail.com>

Hello SNF Users,

I'm a grad student in Stacey Bent's lab in the ChE department.  I'm looking
for a MegaOhmMeter that I could borrow for about an hour.  I don't mean a
multimeter that measures megaohms or an impedance analyzer.  I mean
specifically a device that can apply up to 1 kV across an insulative
material and measure the resulting small current that would flow through it
(and calculate the resistance) if it were defective.  I badly need this
device to check whether or not the anode of our XPS gun is shorted to
ground.  Until we can determine if the problem is with our gun or our gun
controller, we cannot proceed with troubleshooting/repair.

Thank you so much,
Jessica Kachian

P.S.  An example of a MegaOhmMeter can be found here
http://www.yesco.net/megaohmmeter.htm
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From mtang at stanford.edu  Sat Jun 28 20:24:59 2008
From: mtang at stanford.edu (Mary Tang)
Date: Sat, 28 Jun 2008 20:24:59 -0700
Subject: SNF Process Clinic, Mon, 2-4/Special Guest, ASML's Keith Best
Message-ID: <4867008B.4010609@stanford.edu>

Greetings labmembers --

The next SNF process clinic will be Monday, June 30, from 2-4 pm.  Keith 
Best, Director of Special Applications at ASML, will be on hand to 
answer any technical or process questions about the ASML -- he's 
particularly keen on meeting anyone interested in the new 3D align 
upgrade which was successfully qualified just last week.   As usual, 
Process staff will also be on hand to discuss your process and SpecMat 
questions.

Bring your process flows, your MSDS sheets, whatever --

See you there --

Your Process Staff


From rflynn at stanford.edu  Mon Jun 30 11:36:28 2008
From: rflynn at stanford.edu (Roger Flynn)
Date: Mon, 30 Jun 2008 11:36:28 -0700
Subject: Flynn PhD Thesis Defense, Tuesday July 1, 3PM
Message-ID: <00a501c8dae0$3626a190$1a41430a@Nusselt>

PhD Thesis Oral Examination

"Flow Boiling Instabilities in Microchannels"

Candidate: Roger D. Flynn

Advisor: Prof. Ken Goodson

 

Date: Tuesday, July 1

Time: 3:00PM, refreshments beforehand

Room CISX-101 (Auditorium)

http://campus-map.stanford.edu/index.cfm?ID=04-055

 

Abstract

 

There is a growing demand for compact high heat flux cooling in a number of
components like microprocessors, LEDs and laser diodes.  Microchannel heat
sinks are a natural solution, leveraging microfabrication to thin convection
boundary layers for enhanced heat transfer in a package comparable in size
to the cooled components.  Liquid flow microchannel heat sinks have recently
been commercialized, cooling 250 W/cm2, but much lower flow rates and
pumping powers are achievable with flow boiling which utilizes the fluid's
latent heat of vaporization.  However, boiling produces instabilities which
must be better understood and controlled before implementation is practical.
Instabilities have been well documented, particularly in nuclear reactor
design, but confined bubble growth and short length scales in microchannels
lead to a significantly different balance of forces which govern
instabilities.

This work describes a unique set of experiments which enable decoupling and
characterization of thermal and hydrodynamic microchannel flow
instabilities.  Modeling and analysis are developed around data for a single
channel and then applied to two parallel channels.  The dual channel system
exhibits the same parallel channel instabilities observed in massive
parallel channels, but with fewer coupled channel interactions.  Thermal and
hydrodynamic instabilities are further deconvolved by MEMS fabricated dual
channels with and without lateral heat conduction between channels.
Thermally isolated channels exhibit the worst case of hydrodynamic
instability, leading to premature dryout, while thermally connected channels
redistribute heat to stabilize flow boiling.  Appropriate scaling for each
mechanism gives guidelines for design of a microchannel heat sink with
stable flow boiling, fit for the most demanding high heat flux and space
constrained applications.

 

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From khurana at stanford.edu  Mon Jun 30 13:36:22 2008
From: khurana at stanford.edu (Tarun)
Date: Mon, 30 Jun 2008 12:36:22 -0800
Subject: PhD Oral Examination annoucement
Message-ID: <486943C6.1000405@stanford.edu>

University Ph.D. Oral Examination

Title:  On-Chip Isotachophoresis Assays for High Sensitivity  
Electrokinetic Preconcentration, Separation and Indirect Fluorescence 
Detection

Candidate: Tarun Khurana

Advisor: Prof. Juan G. Santiago
Department of Mechanical Engineering

Time: Wednesday,  July 2nd  2008,  2:00 pm

refreshments served at 1:45 pm

Location: McCullough building, room 122 (map attached)


Abstract:
Microfluidic devices have been particularly attractive for separation 
based chemical and biological analysis since the small length scales 
bring fundamental improvements in reagent volume, analysis time, 
resolution and separation efficiency.  However, smaller length scales 
and volumes are also associated with lower detection sensitivity and 
therefore, microchip electrophoresis analysis is often less sensitive 
and is more commonly used for fluorescent analytes since fluorescence 
detection platform offers higher sensitivity.  This presentation will 
focus on leveraging an electrophoresis technique termed isotachophoresis 
(ITP) for improving the detection sensitivity of on-chip electrophoresis 
assays and extending its scope to non-fluorescent analytes.
    ITP is a robust sample preconcentration technique focuses analytes 
into zones that are ~10 ?m wide. Such extreme compression of analytes 
results in drastic improvement in the detection sensitivity and 
resolution of electrophoretic separation system.  We present a 
theoretical and experimental study of dynamics of ITP preconcentration 
that helps identify and optimize experiment parameters to achieve high 
sample preconcentration      We have also demonstrated an indirect 
detection technique based on ITP to detect non fluorescent analytes on a 
standard fluorescence detection platforms.  We leverage ITP to 
preconcentrate and separate analytes into distinct analyte zones and use 
a set of fluorescent species with different electrophoretic mobilities 
to demarcate the boundaries of these analyte zones and thereby, 
indirectly detect the non-fluorescent analytes present.  We obtain ~1 ?M 
detection sensitivity with this assay with high repeatability and have 
demonstrated indirect detection of a variety of analytes such as amino 
acids, organic acids and environmental toxins such as phenols and cresol.






------------------------------------------------------------------------

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From ljy at stanford.edu  Mon Jun 30 14:16:42 2008
From: ljy at stanford.edu (Jung-Yong Lee)
Date: Mon, 30 Jun 2008 14:16:42 -0700
Subject: Shadow Mask
Message-ID: <794cfe150806301416t290c2d5fmaad864ac1cd26336@mail.gmail.com>

Hi, does anyone know any decent shadow mask makers? The shadow mask is for
metal deposition, and the smallest size is 0.004". Thanks.

Jung-Yong
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From ccreese at stanford.edu  Mon Jun 30 14:24:11 2008
From: ccreese at stanford.edu (Colin Reese)
Date: Mon, 30 Jun 2008 14:24:11 -0700
Subject: Shadow Mask
In-Reply-To: <794cfe150806301416t290c2d5fmaad864ac1cd26336@mail.gmail.com>
References: <794cfe150806301416t290c2d5fmaad864ac1cd26336@mail.gmail.com>
Message-ID: <48694EFB.9080901@stanford.edu>

We've used Towne Technologies for features down to 50um with success.

http://townetech.com/



Jung-Yong Lee wrote:
> Hi, does anyone know any decent shadow mask makers? The shadow mask is 
> for metal deposition, and the smallest size is 0.004". Thanks.
> 
> Jung-Yong

-- 


*****************************************
Colin Reese
PhD Candidate
Stanford University
Department of Chemical Engineering
Office: 650 725 3144
Mobile: 503 888 6154
email: ccreese at stanford.edu
*****************************************



From rebeccat at stanford.edu  Mon Jun 30 17:24:25 2008
From: rebeccat at stanford.edu (Rebecca Taylor)
Date: Mon, 30 Jun 2008 17:24:25 -0700
Subject: Shadow Mask
In-Reply-To: <794cfe150806301416t290c2d5fmaad864ac1cd26336@mail.gmail.com>
References: <794cfe150806301416t290c2d5fmaad864ac1cd26336@mail.gmail.com>
Message-ID: <260484cf0806301724y41b1e7a2s6b0aeaa64d5d1ba9@mail.gmail.com>

Dear Jung-Yong,
I've been working with a company in San Jose called Directed Light.  They're
lasercutting a few masks for me out of .005" Kapton film.  I believe their
spot size is between 10 and 25 microns-- I need to do more measures on my
devices to verify.

If you're interested in Kapton film-based shadow masks, I can send along the
contact information.

best,
-rebecca taylor
-- 
Rebecca Taylor
Graduate Research Assistant
Microsystems & Biomechanical Computation Groups
Mechanical Engineering
Stanford University
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From ben.jian at arrayedfiberoptics.com  Mon Jun 30 23:40:18 2008
From: ben.jian at arrayedfiberoptics.com (=?iso-8859-1?Q?ben.jian?=)
Date: Tue, 01 Jul 2008 06:40:18 +0000
Subject: Looking for advice on wafer bonding
Message-ID: <20080701064018.23255.qmail@server266.com>

Dear labmembers,

I have been doing silicon-silicon wafer bonding for years using
gold-silicon eutectic bonding.  While this is a reasonable wafer bonding
method,  it leaves much to be desired.  Briefly,  the bond is not very
strong - frequently even ultrasonic cleaning can break the bonded chip
stack.

I am looking for a better silicon-silicon wafer bonding process.  Factors
to consider include process simplicity, bonding yield/strength, tolerance
to dust particle, etc.  If every step can be performed at SNF,  it would be
always better.  A lower temperature process is desirable.

Your kind advice is greatly appreciated.

Ben Jian
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From shengyuan.wang at grandisinc.com  Mon Jun 30 18:56:06 2008
From: shengyuan.wang at grandisinc.com (Shengyuan Wang)
Date: Mon, 30 Jun 2008 18:56:06 -0700
Subject: Shadow Mask
In-Reply-To: <260484cf0806301724y41b1e7a2s6b0aeaa64d5d1ba9@mail.gmail.com>
Message-ID: <000a01c8db1d$a0daaf80$8b01a8c0@SYlaptop>

Here is another source,
 
1" shadow mask 4 mil stainless substrate.
 
Mark Devereaux
71 Willie Street
Lowell MA 01854
 
T:978-805-5000
F:978-805-5049
 
They made 100, 200, 500um lines with 350um spacing for us.
 
 

  _____  

From: jrbexbox at gmail.com [mailto:jrbexbox at gmail.com] On Behalf Of Rebecca
Taylor
Sent: Monday, June 30, 2008 5:24 PM
To: Jung-Yong Lee
Cc: snf
Subject: Re: Shadow Mask


Dear Jung-Yong, 

I've been working with a company in San Jose called Directed Light.  They're
lasercutting a few masks for me out of .005" Kapton film.  I believe their
spot size is between 10 and 25 microns-- I need to do more measures on my
devices to verify.  

If you're interested in Kapton film-based shadow masks, I can send along the
contact information.

best,
-rebecca taylor
-- 
Rebecca Taylor
Graduate Research Assistant
Microsystems & Biomechanical Computation Groups
Mechanical Engineering
Stanford University 
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