From mihuhou at stanford.edu  Sat Mar  1 00:03:40 2008
From: mihuhou at stanford.edu (Ying Chen)
Date: Sat, 1 Mar 2008 00:03:40 -0800
Subject: Resolution of Alphastep.
References: <Pine.LNX.4.44.0802280925140.21445-100000@cis.Stanford.EDU>
Message-ID: <001501c87b72$c2d55c30$22930c80@ZhuBaoBao>

Hi, labmembers,

I am trying to measure step heights (40~50nm) on a partly etched sample. Can 
anyone tell me whether the alphastep could measure such small steps?

Thanks!

Ying




----- Original Message ----- 
From: "Jim McVittie" <mcvittie at cis.Stanford.EDU>
To: <mihuhou at stanford.edu>
Sent: Thursday, February 28, 2008 9:29 AM
Subject: Re: Gold substrate in Rudolph.


> Ying,
>
> 6328A is not a great place to do measurements on Au since it has a
> transition in this its optical properities in this region. The Wollam will
> give better results since you can change the wavelength. The following
> results are from http://www.luxpop.com/.  Jim
>
> First set of refs:
> At a wavelength of 6328 nm (0.196 eV), the index of refraction of gold is
> n = 5.21, k = 43.82.
>
> Note that for thin films the index can vary depending on deposition
> parameters.
>
> References:
> [1] L. G. Shulz, "The optical constants of silver, gold, copper and
> aluminum. 1) the absorption coefficient k and 2) the index of refraction
> n," J. Opt. Soc. Am. , Vol. 44, No. 5, pp. 357-362 and 362-368,
> [2] M. A. Ordal, L. L. Long, R. J. Bell, S. E. Bell, R. W. Alexander, Jr.,
> and C. A. Ward, "Optical properties of the metals Al, Co, Cu, Au, Fe, Pb,
> Ni, Pd, Pt, Ag, Ti, and W in the infrared and far infrared," Appl. Opt. ,
> Vol. 22, No. 7, 1 April 1983, pp. 1099-1119 (Molutevich et al).
>
> Second set of refs:
> At a wavelength of 6328 nm (0.196 eV), the index of refraction of gold is
> n = 5.635, k = 38.1493.
>
> Note that for thin films the index can vary greatly depending on
> deposition parameters.
> References:
> [1] E. D. Palik, "Handbook of Optical Constants of Solids, " Academic
> Press.
>
>
> On Wed, 27 Feb 2008 mihuhou at stanford.edu wrote:
>
>> Hi, Jim,
>>
>> Can you check up the gold optical information and show me how to use
>> it with Rudolph? I am available tomorrow afternoon.
>>
>> Thanks a lot!
>> Ying
>>
>
> -- 
> --------------------------------------------------------------
> Jim McVittie, Ph.D.    Senior Research Scientist
> Allen Center for Integrated Systems     Electrical Engineering
> Stanford University             jmcvittie at stanford.edu
> Rm. 336, 330 Serra Mall Fax: (650) 723-4659
> Stanford, CA 94305-4075 Tel: (650) 725-3640
>
> 



From cwhicks at stanford.edu  Sat Mar  1 12:09:03 2008
From: cwhicks at stanford.edu (Clifford Hicks)
Date: Sat, 1 Mar 2008 12:09:03 -0800 (PST)
Subject: Ferric Chloride (FeCl3) Etch Mask?
In-Reply-To: <0FC4C1B93D218E428D20BFCB9424D5D205AA2680@SJEXCH02.ds.jdsu.net>
Message-ID: <Pine.LNX.4.44.0803011206010.28788-100000@cardinal3.Stanford.EDU>




Probably not what you are looking for, but a Sharpie pen works well,
the kind that writes on metal or other smooth surfaces. If it's a big,
simple design you can draw it by hand and the pen ink itself is a pretty
good resist.

	- Clifford

>
> Hello,
> I'm hoping to etch patterns into/through copper, nickel, and/or aluminum
> foils using an aqueous solution of FeCl3.  I was wondering if anybody
> has
> any experience etching any metals with FeCl3, and which masks work for
> this
> process.  Any help would be greatly appreciated!  Thanks,
> Kevin
> kcrabb at stanford.edu
>




From jimkruger at yahoo.com  Sun Mar  2 10:49:13 2008
From: jimkruger at yahoo.com (jim kruger)
Date: Sun, 2 Mar 2008 10:49:13 -0800 (PST)
Subject: Resolution of Alphastep.
In-Reply-To: <001501c87b72$c2d55c30$22930c80@ZhuBaoBao>
Message-ID: <689515.13717.qm@web38913.mail.mud.yahoo.com>

The AlphaStep can show a 100nm step but it is
difficult to get much accuracy at his level
(roughness, vibrations).

The Zygo has ~ 1 nm precison but will only work on
metals or semiconductors. For dielectrics, it is
easily confused by the multiple reflections.  The Zygo
uses "white light" interference centered at about
600nm.  Some metals or semiconductors are
semi-transparent at this wave length.  If the material
is not optically opaque on both side of the step
measured, a systematic, thickness dependent, error can
result.  If you need to measure a thin metal or a
dielectric step, overcoat the step with a (smooth)
metal thick enough to be opaque at 600 nm.

AFM is also possible but is even more trouble (in my
opinion). 

jimkruger
--- Ying Chen <mihuhou at stanford.edu> wrote:

> Hi, labmembers,
> 
> I am trying to measure step heights (40~50nm) on a
> partly etched sample. Can 
> anyone tell me whether the alphastep could measure
> such small steps?
> 
> Thanks!
> 
> Ying
> 
> 
> 
> 
> ----- Original Message ----- 
> From: "Jim McVittie" <mcvittie at cis.Stanford.EDU>
> To: <mihuhou at stanford.edu>
> Sent: Thursday, February 28, 2008 9:29 AM
> Subject: Re: Gold substrate in Rudolph.
> 
> 
> > Ying,
> >
> > 6328A is not a great place to do measurements on
> Au since it has a
> > transition in this its optical properities in this
> region. The Wollam will
> > give better results since you can change the
> wavelength. The following
> > results are from http://www.luxpop.com/.  Jim
> >
> > First set of refs:
> > At a wavelength of 6328 nm (0.196 eV), the index
> of refraction of gold is
> > n = 5.21, k = 43.82.
> >
> > Note that for thin films the index can vary
> depending on deposition
> > parameters.
> >
> > References:
> > [1] L. G. Shulz, "The optical constants of silver,
> gold, copper and
> > aluminum. 1) the absorption coefficient k and 2)
> the index of refraction
> > n," J. Opt. Soc. Am. , Vol. 44, No. 5, pp. 357-362
> and 362-368,
> > [2] M. A. Ordal, L. L. Long, R. J. Bell, S. E.
> Bell, R. W. Alexander, Jr.,
> > and C. A. Ward, "Optical properties of the metals
> Al, Co, Cu, Au, Fe, Pb,
> > Ni, Pd, Pt, Ag, Ti, and W in the infrared and far
> infrared," Appl. Opt. ,
> > Vol. 22, No. 7, 1 April 1983, pp. 1099-1119
> (Molutevich et al).
> >
> > Second set of refs:
> > At a wavelength of 6328 nm (0.196 eV), the index
> of refraction of gold is
> > n = 5.635, k = 38.1493.
> >
> > Note that for thin films the index can vary
> greatly depending on
> > deposition parameters.
> > References:
> > [1] E. D. Palik, "Handbook of Optical Constants of
> Solids, " Academic
> > Press.
> >
> >
> > On Wed, 27 Feb 2008 mihuhou at stanford.edu wrote:
> >
> >> Hi, Jim,
> >>
> >> Can you check up the gold optical information and
> show me how to use
> >> it with Rudolph? I am available tomorrow
> afternoon.
> >>
> >> Thanks a lot!
> >> Ying
> >>
> >
> > -- 
> >
>
--------------------------------------------------------------
> > Jim McVittie, Ph.D.    Senior Research Scientist
> > Allen Center for Integrated Systems     Electrical
> Engineering
> > Stanford University            
> jmcvittie at stanford.edu
> > Rm. 336, 330 Serra Mall Fax: (650) 723-4659
> > Stanford, CA 94305-4075 Tel: (650) 725-3640
> >
> > 
> 
> 



      ____________________________________________________________________________________
Never miss a thing.  Make Yahoo your home page. 
http://www.yahoo.com/r/hs


From chongxie at stanford.edu  Sun Mar  2 19:14:43 2008
From: chongxie at stanford.edu (Chong Xie)
Date: Sun, 02 Mar 2008 19:14:43 -0800
Subject: Ferric Chloride (FeCl3) Etch Mask?
In-Reply-To: <Pine.LNX.4.44.0803011206010.28788-100000@cardinal3.Stanford.EDU>
References: <Pine.LNX.4.44.0803011206010.28788-100000@cardinal3.Stanford.EDU>
Message-ID: <47CB6D23.2040709@stanford.edu>

Go a bit further from this point. You could transfer laser printed 
pattern to your surface by transparency films easily. The ink works fine 
as mask. This may give you a little better resolution and make your 
design easier.

Chong

Clifford Hicks wrote:
>
> Probably not what you are looking for, but a Sharpie pen works well,
> the kind that writes on metal or other smooth surfaces. If it's a big,
> simple design you can draw it by hand and the pen ink itself is a pretty
> good resist.
>
> 	- Clifford
>
>   
>> Hello,
>> I'm hoping to etch patterns into/through copper, nickel, and/or aluminum
>> foils using an aqueous solution of FeCl3.  I was wondering if anybody
>> has
>> any experience etching any metals with FeCl3, and which masks work for
>> this
>> process.  Any help would be greatly appreciated!  Thanks,
>> Kevin
>> kcrabb at stanford.edu
>>
>>     
>
>
>
>   



From mtang at stanford.edu  Mon Mar  3 08:11:40 2008
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 03 Mar 2008 08:11:40 -0800
Subject: Ferric Chloride (FeCl3) Etch Mask?
In-Reply-To: <47CB6D23.2040709@stanford.edu>
References: <Pine.LNX.4.44.0803011206010.28788-100000@cardinal3.Stanford.EDU> <47CB6D23.2040709@stanford.edu>
Message-ID: <47CC233C.6030308@stanford.edu>

Hi all --

YES! Some of my favorite stuff (next to PDMS) is the "Press-n-Peel" PCB 
film (http://www.techniks.com/).  It's a film that you can run through a 
laser printer.  The ink stays on the film, but is easily transferred 
when you iron it onto your substrate,  It is not high resolution (maybe 
100 um), but is easy and cheap and stands up to standard copper etchant.

M

Chong Xie wrote:
> Go a bit further from this point. You could transfer laser printed 
> pattern to your surface by transparency films easily. The ink works 
> fine as mask. This may give you a little better resolution and make 
> your design easier.
>
> Chong
>
> Clifford Hicks wrote:
>>
>> Probably not what you are looking for, but a Sharpie pen works well,
>> the kind that writes on metal or other smooth surfaces. If it's a big,
>> simple design you can draw it by hand and the pen ink itself is a pretty
>> good resist.
>>
>>     - Clifford
>>
>>  
>>> Hello,
>>> I'm hoping to etch patterns into/through copper, nickel, and/or 
>>> aluminum
>>> foils using an aqueous solution of FeCl3.  I was wondering if anybody
>>> has
>>> any experience etching any metals with FeCl3, and which masks work for
>>> this
>>> process.  Any help would be greatly appreciated!  Thanks,
>>> Kevin
>>> kcrabb at stanford.edu
>>>
>>>     
>>
>>
>>
>>   
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From mmlee at stanford.edu  Mon Mar  3 08:20:30 2008
From: mmlee at stanford.edu (Meredith M. Lee)
Date: Mon, 3 Mar 2008 08:20:30 -0800
Subject: Ferric Chloride (FeCl3) Etch Mask?
In-Reply-To: <47CC233C.6030308@stanford.edu>
References: <Pine.LNX.4.44.0803011206010.28788-100000@cardinal3.Stanford.EDU>
	 <47CB6D23.2040709@stanford.edu> <47CC233C.6030308@stanford.edu>
Message-ID: <9fa245520803030820i71ac9c01u2ab837e479a19fb5@mail.gmail.com>

I have some extra sheets of the blue printer film if you want to test it out
right away.  It works pretty well for large features printed from a laser
printer (and you can use a sharpie to correct for problems in
the transferring).

-Meredith

On Mon, Mar 3, 2008 at 8:11 AM, Mary Tang <mtang at stanford.edu> wrote:

> Hi all --
>
> YES! Some of my favorite stuff (next to PDMS) is the "Press-n-Peel" PCB
> film (http://www.techniks.com/).  It's a film that you can run through a
> laser printer.  The ink stays on the film, but is easily transferred
> when you iron it onto your substrate,  It is not high resolution (maybe
> 100 um), but is easy and cheap and stands up to standard copper etchant.
>
> M
>
> Chong Xie wrote:
> > Go a bit further from this point. You could transfer laser printed
> > pattern to your surface by transparency films easily. The ink works
> > fine as mask. This may give you a little better resolution and make
> > your design easier.
> >
> > Chong
> >
> > Clifford Hicks wrote:
> >>
> >> Probably not what you are looking for, but a Sharpie pen works well,
> >> the kind that writes on metal or other smooth surfaces. If it's a big,
> >> simple design you can draw it by hand and the pen ink itself is a
> pretty
> >> good resist.
> >>
> >>     - Clifford
> >>
> >>
> >>> Hello,
> >>> I'm hoping to etch patterns into/through copper, nickel, and/or
> >>> aluminum
> >>> foils using an aqueous solution of FeCl3.  I was wondering if anybody
> >>> has
> >>> any experience etching any metals with FeCl3, and which masks work for
> >>> this
> >>> process.  Any help would be greatly appreciated!  Thanks,
> >>> Kevin
> >>> kcrabb at stanford.edu
> >>>
> >>>
> >>
> >>
> >>
> >>
> >
>
>
> --
> Mary X. Tang, Ph.D.
> Stanford Nanofabrication Facility
> CIS Room 136, Mail Code 4070
> Stanford, CA  94305
> (650)723-9980
> mtang at stanford.edu
> http://snf.stanford.edu
>
>
>


-- 
--------------------------------------------------
Meredith M. Lee
Stanford University
Ph.D. Candidate, Dept. of Electrical Engineering
President, Stanford Student OSA/SPIE

Center for Integrated Systems
420 Via Ortega, Stanford, CA 94305-4075
Fax: (650) 723-4659
mmlee at stanford.edu
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From jwc at snf.stanford.edu  Mon Mar  3 11:08:22 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Mon, 03 Mar 2008 11:08:22 -0800
Subject: Tomorrow : Lab Presentation:  Chemically Amplified Molecular Resists
 for E-Beam Lithography , Dr. Alex Robinson University of Birmingham, UK.
  Tuesday March 4 , 20081:30 PM CIS 101
Message-ID: <47CC4CA6.8040502@snf.stanford.edu>

*
*

*
*

*
**Special Ebeam Lab Presentation: 
Chemically Amplified Molecular Resists for E-Beam Lithography
Dr. Alex P.G. Robinson University of Birmingham, UK.
Tuesday March 4, 2008 1:30 PM in CIS 101*

*It is my pleasure to announce that Dr. Alex P.G. Robinson will be 
visiting the Stanford Nanofabrication Facility next Tuesday afternoon 
and will present his work on Chemically Amplified Molecular Resists. He 
has also promised to give us an introduction and an update on activities 
at the Nanoscale Physics Research Laboratory <http://nprl.bham.ac.uk/> 
at the **University of Birmingham.

All interested parties are invited to attend.  There will be ample time 
for discussions after his presentation and we have the room through 3 PM.


James W. Conway
Ebeam Lab
Stanford Nanofabrication Facility
650-725-7075
-------------------------------------------------------





*

*Chemically Amplified Molecular Resists for E-Beam Lithography***

J. Manyam^a , F.P. Gibbons^a , S. Diegoli^b , M. Manickam^b , J.A. 
Preece^b , R.E. Palmer^a , _A.P.G. Robinson_^a

/ /

^a Nanoscale Physics Research Laboratory, School of Physics and 
Astronomy, The University of Birmingham, Birmingham, B15 2TT, UK

phone: +44 (0)121 414 4641   e-mail: a.p.g.robinson at bham.ac.uk 
<mailto:alex at nprl.ph.bham.ac.uk>

^b School of Chemistry, The University of Birmingham, Birmingham, B15 
2TT, UK

 

Key words:  Electron Beam Lithography, Molecular Resist, Fullerene, 
Chemically Amplified Resist

 

The minimum lithographic feature size for microelectronic fabrication 
continues to shrink, and resist properties are beginning to dominate the 
achievable resolution. There is a strong need for a high resolution, 
high sensitivity resist for the 32 nm node, and beyond, that is not met 
by conventional polymeric resists at this time. The line width roughness 
(LWR) requirements at the 32 nm node [1] are already equal to the radius 
of gyration of a typical resist polymer, [2] whilst the resolution 
itself will be less than the polymer molecule size at future nodes. 
Molecular resists, such as oglimers and molecular glasses rely on 
smaller molecules, giving the potential for lower LWR and improved 
resolution. Fullerene derivative molecules have a diameter of 
approximately 1 nm and have been shown to act as negative tone resists 
with high etch durability and a resolution of 10 nm when exposed via 
electron beam lithography.  However, the sensitivity of such resists is 
extremely poor and significant improvements would have to be made to 
make the material commercially viable.  A common way to improve resist 
sensitivity is chemical amplification (CA) by addition of a 
photosensitizer, and optionally a cross-linker. Here we present a 
fullerene based three component chemically amplified resist system, 
which shows high resolution and sensitivity, wide process latitude, and 
etch durability comparable with commercial novolac resists.

 

Fullerene resist films were prepared on hydrogen terminated silicon by 
spin coating and were irradiated using a Philips XL30SFEG scanning 
electron microscope equipped with a Raith lithography system. The 
fullerene CA resist consisted of the derivative MF03-04, an epoxide 
cross-linker and a photoacid generator.  The sensitivity of this resist 
was shown to be between 5 and 10 ?C/cm^2 at 20 keV for various 
combinations of post application bake and post exposure bake 
conditions.  Using 30 keV electron beam exposure, sparse patterns with 
12 nm resolution were demonstrated, at a line dose of 300 pC/cm, whilst 
dense patterns with half-pitch 20 nm were achieved at 200 pC/cm, as 
shown in figure 1. The LWR for the densely patterned resist (measured at 
hp 25 nm) is approximately 4 nm. The etch durability of the fullerene 
resist was comparable to SAL601, a common novolac resist.

 

[1] International Technology Road map for Semiconductors, 2006 Update, 
http://www.itrs.net <http://www.itrs.net/>.

[2] R.L. Brainard, G.G. Barclay, E.H. Anderson, L.E. Ocola, 
Microelectron. Eng., *2002*, /61-62/, 707.

 

Figure 1:         20 nm half-pitch lines and spaces exposed with a dose 
of 200 pC/cm at 30 keV, developed in MCB (1:1) IPA for 10 s, with a 10 s 
IPA rinse.


*
*

*
*

*
*

*
*

*
*

*
*

*
*



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From rissman at stanford.edu  Mon Mar  3 12:13:42 2008
From: rissman at stanford.edu (Paul Rissman)
Date: Mon, 03 Mar 2008 12:13:42 -0800
Subject: Image Technology - Friday 3/7 - 10 AM - CIS 101
Message-ID: <200803032013.m23KDlr5020824@smtp-roam.Stanford.EDU>

Fernando Mendez, VP of Sales/Marketing for Image Technology will be here

                         Friday, March 7
                               10 AM
                                CIS 101

to answer questions about mask making at their company.  Here is the 
material to be covered:


>1) Job setup requirements such as data formats, paperwork, and PO
>2) Equipment tool sets and capability
>3) Instruction on how to complete our MOF (mask order form)
>4) Answer any particular questions students may have



From mtang at stanford.edu  Mon Mar  3 19:12:18 2008
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 03 Mar 2008 19:12:18 -0800
Subject: Enterprise Forum, March 5, 4 pm in CIS 101:  Ask a VC
Message-ID: <47CCBE12.5030900@stanford.edu>

Greetings labmembers --

Just a reminder of the visit by Shahin Farschi from Lux Capital. Following a brief presentation, Shahin is most interested in an informal
discussion with researchers about the role of VC's in developing new opportunities.
 This is scheduled for Wednesday, March 5, from 4-5 pm in CIS 101.  Bio and presentation abstract can be found at:  
http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3077:200802:daieogjjhbhgegkgdlol

Shahin also invites advance suggestions for specific topics of discussion -- just email him at shahin.farshchi at luxcapital.com








From mtang at stanford.edu  Mon Mar  3 19:14:01 2008
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 03 Mar 2008 19:14:01 -0800
Subject: SNF Process Grand Rounds, Friday, 3/7
Message-ID: <47CCBE79.7070709@stanford.edu>

Greeting labmembers --

Minutes of last week's Process Grand Rounds are now posted on the 
website (linked from the home page.)  Stay tuned for the next episode, 
this Friday, March 7, 11:30-1 in CIS 101.

Your SNF staff


From nharjee at stanford.edu  Tue Mar  4 13:58:39 2008
From: nharjee at stanford.edu (Nahid Harjee)
Date: Tue, 4 Mar 2008 13:58:39 -0800
Subject: Sharp silicon tips
Message-ID: <2feeb6700803041358l36db8780j9da9b975277b611@mail.gmail.com>

Dear lab members,

If any of you have experience fabricating sharp silicon tips for scanning
probe microscopy applications, please let me know. I'm interested in
learning more about your process and sharing some of my results.

Thanks for your help,

nh

-- 
Nahid Harjee
Ph.D. Candidate
Electrical Engineering
Stanford University
408-761-8651
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From ahazeghi at stanford.edu  Tue Mar  4 15:17:42 2008
From: ahazeghi at stanford.edu (Arash Hazeghi)
Date: Tue, 4 Mar 2008 15:17:42 -0800
Subject: Imaging tubes
Message-ID: <021a01c87e4d$f25ea690$d71bf3b0$@edu>

Greetings,

 

I am trying to image my nanotubes (diameter ~1.5nm) using AFM in tapping
mode, I am wondering if anyone else has done similar imaging before and can
share some tips and tricks with me.

 

 

 

 

 

Thanks,

 

Arash

 

 

 

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From mtang at stanford.edu  Wed Mar  5 15:45:09 2008
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 05 Mar 2008 15:45:09 -0800
Subject: Shahin Farschi, today, at 4 pm
Message-ID: <47CF3085.9090203@stanford.edu>

Hi all --

Just a reminder that Shahin Farschi, from Lux Capital, will be speaking 
today about collaborations between venture and inventors.  This is in 
CIS 101.  There will be refreshments and Shahin will be around 
afterwards for questions and discussion.  For an abstract of his talk, see:

http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3077:200802:daieogjjhbhgegkgdlol

Hope to see you there!

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From mtang at stanford.edu  Wed Mar  5 17:53:29 2008
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 05 Mar 2008 17:53:29 -0800
Subject: Cencelled:  Friday 3/7/08  Maskmaking presentation by Image-Technology
Message-ID: <47CF4E99.905@stanford.edu>

Greetings labmembers:

The presentation on maskmaking by Image Technology originally scheduled 
for this Friday at 10 am is now canceled (original announcement: 
http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3108:200803:ecijpjkikjbekmcnnifp)

We are now working on assembling documentation and pricing for Stanford 
researchers.  Please bear with us as we iron out the details -- we hope 
to have something presentable by the end of next week.  In the meantime, 
if you are immediate need of maskmaking services, please get in touch 
with Ed, Mahnaz, or Mary and we can share with you the information we 
have thus far.

Thanks for your patience --

Ed. Mahnaz & Mary
(The staff who are sorely missing Paul Jerabek's solid presence the most)

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From mtang at stanford.edu  Thu Mar  6 16:26:10 2008
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 06 Mar 2008 16:26:10 -0800
Subject: SNF Process Grand Rounds, Friday, 3/7/08
Message-ID: <47D08BA2.4060405@stanford.edu>

Greetings labmembers --

Just a reminder of the next SNF Process Grand Rounds, which will be 
Friday, 3/7, at 11:30 am in CIS 101.  The agenda will be:

1.  Brainstorming of a process problem or two (we invite submissions).
2.  Review of action items from previous meetings.
3.  Continue Quality Circle discussions.  We will review everyone's 
schemes for Coral data collection on key tools and begin discussion of 
data reporting.

Sandwiches provided.

For a summary of last week's meeting, check here:  
http://snf.stanford.edu/Labmembers/ProcessGrandRound022908.html

Hope to see you there --

Your SNF Staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From mtang at stanford.edu  Thu Mar  6 16:48:05 2008
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 06 Mar 2008 16:48:05 -0800
Subject: Do you have an opinion about STS etching? Take this DRIE Survey!
Message-ID: <47D090C5.7010909@stanford.edu>

Greetings again, labmembers --

We'd like to know your opinions and expectations for deep RIE etching at 
SNF.  Please help us by filling out this short, online survey:
http://www.surveymonkey.com/s.aspx?sm=HV3UtmHb0exdw7_2b_2bMBEz9g_3d_3d

We will close the survey and post results in two weeks -- so if you care 
about STS etching at SNF, fill this out soon!
(Special thanks to Nahid for organizing the survey!)


Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

-- 





From mrjpark at stanford.edu  Fri Mar  7 01:27:06 2008
From: mrjpark at stanford.edu (Joong Sun Park)
Date: Fri, 7 Mar 2008 01:27:06 -0800
Subject: Tube-type furnace to borrow or local vendor? 
Message-ID: <BC5D830F-4128-4285-A0F7-9821D5E90058@stanford.edu>

Dear Labmembers,

I'm wondering if anyone has tube-type furnace for annealing, and if I  
could borrow a bit because the one in the my lab is out of order just  
now.
The model of tube furnace is MTF 10/25/130 from carbolite.
As long as inner diameter of tube is larger than 25mm and temperature  
goes up to 500-600 C,  any tube furnace will be fine.
Also if anyone knows somewhere that I can borrow in bay area, please  
let me know.

Thanks,

Joongsun




From gsosa at stanford.edu  Fri Mar  7 06:58:48 2008
From: gsosa at stanford.edu (Gary J Sosa)
Date: Fri, 07 Mar 2008 06:58:48 -0800
Subject: SVG Coater 2 Scheduled Downtime
Message-ID: <20080307065848.1m0qpzsw5c4swo04@webmail.stanford.edu>

  Hello Labmembers...

   On Monday, March 10th, SVG coater #2 will be down from 10:00AM to  
4:00PM. The vendor from NETTrack will be here to install a software  
upgrade and to work or resolving some of the issues that we have had  
with the systems. Sorry for the short notice. If there are any  
questions or concerns that you have, or any observations that you have  
made, regarding the recipe manager,  please let me know so that we can  
address them on Monday.

    Thanks..  Gary


From gsosa at stanford.edu  Fri Mar  7 06:44:34 2008
From: gsosa at stanford.edu (Gary J Sosa)
Date: Fri, 07 Mar 2008 06:44:34 -0800
Subject: Karl Suss Aligners Scheduled Downtime
Message-ID: <20080307064434.496msku700sw4gkw@webmail.stanford.edu>

  Hi Labmembers....

    On the 17th and 18th of March, we will have a vendor here to do  
PM's on the Karl Suss aligners. Karl Suss 1 will be done on the 17th  
and Karl Suss 2 will be done on the 18th during the day. Each PM will  
take 6 - 8 hours. During this time, the aligner will not be available  
for use. Please make alternate plans as needed. Sorry  for the  
inconvenience.

   Thanks... Gary


From okilic at stanford.edu  Fri Mar  7 12:49:56 2008
From: okilic at stanford.edu (Onur Kilic)
Date: Fri, 7 Mar 2008 12:49:56 -0800
Subject: Fwd: University PhD Dissertation Defense for Onur Kilic
In-Reply-To: <p06230900c3f5ca304ba3@171.64.84.39>
References: <p06230900c3f5ca304ba3@171.64.84.39>
Message-ID: <2f2f0d6f0803071249x3b8869ccyfc3bd7f4601adae@mail.gmail.com>

Department of Applied Physics
University PhD Dissertation Defense


Fiber Based Photonic-Crystal Acoustic Sensor

Onur Kilic
Research Advisor: Professor O. Solgaard

11 March 2008 @4:00 p.m.
in
Applied Physics Building, Room 200
(Refreshments at 3:45 p.m.)
*
*
Abstract
Photonic crystal slabs can be employed to make various free space optical
devices by tailoring the geometrical parameters of the structure such as
hole radius, pitch, or hole shape. A standard photonic crystal slab can be
used to make efficient optical filters and broadband mirrors. Breaking the
symmetry through introducing asymmetric holes also enables polarization
sensitive devices such as retarders, polarization beam splitters, and
photonic crystals with additional non-degenerate resonances useful for
increased sensitivity in sensors. The fabrication of photonic crystal slabs
is compatible with microfabrication techniques, making them suitable as key
components in micromachined sensor applications.
We report a micromachined acoustic sensor that consists of a Fabry-Perot
interferometer made of a photonic-crystal reflector embedded on a compliant
silicon diaphragm placed at the tip of a single-mode fiber. The small
thickness of the photonic crystal slab makes it ideal as the external
reflector that needs to be compliant for high sensitivity. Measurements in
air indicate that this sensor has a relatively uniform frequency response up
to at least 50 kHz, and detects pressures as low as 18 ?Pa/Hz1/2. This limit
is four orders of magnitude lower than in similar types of acoustic fiber
sensors.
        Through a modification in the design, such a sensor can also be used
in water. In addition to the high compliance, the advantage for using the
photonic crystal slab is that the holes provide a venting channel for
pressure equalization so that the hydrophone can be employed in deep-sea
applications. Measurements in water over the range of 10 kHz-50 kHz show
that the hydrophone has a minimum detectable pressure down to 10 ?Pa/Hz1/2,
close to the ambient noise level. A model was developed to show that after
optimization to ocean acoustics, this sensor has a minimum detectable
pressure that follows the minimum ambient noise spectrum of the ocean
(reaching a minimum of ~10 ?Pa/Hz1/2 at ~30 kHz) in the bandwidth of 1
Hz-100 kHz. By placing several such sensors with different acoustic power
ranges within a single sensor chip, the hydrophone is able of exhibiting a
dynamic range in the excess of 200 dB.

-- 
Onur Kilic

Applied Physics
Stanford University

OnurKilic.com
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From iwjung at stanford.edu  Sun Mar  9 16:25:34 2008
From: iwjung at stanford.edu (Il Woong Jung)
Date: Sun, 09 Mar 2008 16:25:34 -0700
Subject: litho nanospec has bulb out, nanospec next to drytek2 out of spec
Message-ID: <20080309162534.yomkhgnpooc0c084@webmail.stanford.edu>

The nanospec in the litho area has a burnt out bulb.
The nanospec next to drytek 2 seems to be out of spec.
I and another user have measured using the new nanospec in the litho  
room which measures values more to our expected specs: 4300A and 5300A  
respectively.
The nanospec next to drytek2 measures ~300A less.
Just a heads up to people who are using this machine to take measurements.

Il Woong





From mtang at stanford.edu  Mon Mar 10 18:25:23 2008
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 10 Mar 2008 18:25:23 -0700
Subject: Maskmaking and Process Grand Rounds
Message-ID: <47D5DF83.8030403@stanford.edu>

Hi all --

Two topics which may be of general interest:

1.  Maskmaking: Following Paul Jerabek's retirement and the timely 
demise of the Micronics laser, we are in the process of making 
alternative arrangements for SNF academic researchers. To see what's up, 
check out:  https://www.stanford.edu/group/snf/Masks/Maskmaking.html  
(SUNet ID required.)

2.  SNF Process Grand Rounds.  For those of you who missed last Friday's 
meeting, minutes have just been posted (linked from the SNF home page.)  
Since a couple of us will be in an all-day site visit this Friday, the 
next meeting will be in TWO weeks, on Friday, March 21. 

Comments, questions, and suggestions appreciated.

Your SNF staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From kimsora at stanford.edu  Wed Mar 12 13:51:17 2008
From: kimsora at stanford.edu (Sora Kim)
Date: Wed, 12 Mar 2008 13:51:17 -0700
Subject: University PhD Dissertation Defense for Sora Kim
References: <p06230900c3f5ca304ba3@171.64.84.39> <2f2f0d6f0803071249x3b8869ccyfc3bd7f4601adae@mail.gmail.com>
Message-ID: <004301c88482$d1bd7b10$4b2242ab@GoSora>

Photonic crystal mirrors:


Fundamental components for integrated photonic crystal MEMS





Sora Kim


Research Advisor: Olav Solgaard





Time: 1:15pm, March 14th, 2008 (Refreshment: 1:00pm)


Place: CISX-Auditorium





Abstract:
The 2D photonic crystal (PC) slab is an interesting optical component due to its ability to confine photons 3-dimensionally and couple to external radiation as well as its simplicity of fabrication. Many novel optical devices have been proposed based on the 2D PC slabs such as PC-based light-emitting diodes, lasers, directional output couplers, and sensors. Specifically, we are interested in integrating 2D PC slabs in optical MEMS devices such as tunable filters, position sensors, and scanners in order to achieve compactness and better sensitivity.





In the first part of the talk, a broadband PC mirror based on a 2D PC slab, which is a basic component of the optical PC MEMS devices, is discussed. Dielectric mirrors are preferred to metal mirrors in optical communication wavelengths because of their low loss. For example, Distributed Bragg Reflector (DBR) mirrors are commonly used for very high reflectivity (~99.5%). However, these mirrors consist of several pairs of dielectric layers, complicating their fabrication and resulting in bulky mirrors. 2D PC mirrors can be excellent alternatives to DBR mirrors because they have comparable reflectivity with a single dielectric layer. In the talk, I will review the basic principles of how to achieve a broadband spectrum by 2D PC slabs and present a broadband mirror with high reflectivity around 1550nm and small polarization and angular dependences.





In the second part of the talk, I will focus on ways to improve the optical spectrum of 2D PC mirrors by controlling the surface quality. Hydrogen annealing is a traditional way of reducing the roughness of etched silicon surfaces. We showed that the silicon migration of hydrogen annealing could be used to improve the optical spectrum of 2D PC mirrors by smoothing the rough interfaces and increasing the uniformity of PC holes. In particular, we applied hydrogen annealing on a 2D PC mirror that was processed on a silicon substrate by isotropic silicon etching (GOPHER). The reflectivity of the 2D PC mirror increased and the polarization dependence decreased.





In the last part, I will briefly introduce a 2D PC MEMS scanner and a 2D PC displacement sensor as applications of 2D PC mirrors that are integrated into optical MEMS are introduced. 
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From nishiy at stanford.edu  Wed Mar 12 14:42:08 2008
From: nishiy at stanford.edu (Yoshio Nishi)
Date: Wed, 12 Mar 2008 14:42:08 -0700
Subject: Presentations for NNIN Annual Review at Stanford
Message-ID: <001101c88489$edc49ad0$3b06d53d@stanford.edu>

Dear SNF Lab Members,

SNF will be hosting the Annual NNIN Review on campus on April 30 through
May 2 this year.  This is a critical review for us as we are applying 
for a 5-year renewal for the NNIN program from the National Science 
Foundation. There will be a technical session on April 30 where all NNIN 
sites will feature technical presentations by non-local (that is, in our 
case, non-Stanford) lab users.

We are looking for either one or two strong presentations to be given by 
members of the non-Stanford research community.  If you are in a 
position to give a short talk (probably 12-15 minutes plus questions) on 
April 30, I would like to hear from you at your earliest convenience.

Thank you, and best regards,

Yoshio Nishi
Director, SNF




From gsosa at stanford.edu  Wed Mar 12 18:18:04 2008
From: gsosa at stanford.edu (Gary J Sosa)
Date: Wed, 12 Mar 2008 18:18:04 -0700
Subject: SVG Coater Logsheets
Message-ID: <20080312181804.ge4qe7edwsk0oskc@webmail.stanford.edu>

  Hi labmembers...

    In an effort to help us understand the fix the problems on the SVG  
coaters, especially with the "recipe manager", we have created a  
logsheet to collect some important information. The logsheets are on a  
clipboard hanging on the left side of the track. I have even provided  
a pen. If you encounter any problems on the coat tracks, please make  
an enrty on the logsheet with all the pertinent information. Your help  
will be greatly appriciated.

   Thanks... Gary


From shott at stanford.edu  Thu Mar 13 07:50:29 2008
From: shott at stanford.edu (John Shott)
Date: Thu, 13 Mar 2008 07:50:29 -0700
Subject: SNF Stockroom Label Maker?
Message-ID: <47D93F35.2060003@stanford.edu>

SNF Lab Members and CIS Building Occupants:

Did anyone borrow the label maker that lives in the SNF stockroom?  It 
has apparently been missing for 2 weeks or so .... and should never 
leave that room.

Your help will be greatly appreciated in tracking down this useful 
little item.

Thanks,

John



From jprovine at stanford.edu  Thu Mar 13 09:06:34 2008
From: jprovine at stanford.edu (J Provine)
Date: Thu, 13 Mar 2008 09:06:34 -0700
Subject: Seminar:  Materials Informatics by Prof. Rajan of ISU Wednesday
	March 19, 3-4pm CISX 101
Message-ID: <20080313090634.pwy23uuby80kko0g@webmail.stanford.edu>

Everyone,

Wednesday March 19 3-4pm
in CISX 101
Prof. Krishna Rajan of Iowa State University will give a seminar
titled "Materials Informatics for MEMS Design and Nanodevices."
Please come hear his talk about this unique perspective on materials
research.

-Abstract-
Materials science seeks to understand structure-property
relationships, which can be very complex and difficult to discover.
?Materials Informatics? can enable one to survey complex, multiscale
information in a high throughput, statistically robust, and yet
physically meaningful manner. The application of such approaches can
have a significant impact in materials design and discovery.  While
informatics is well established in fields such as biology, drug
discovery, astronomy and quantitative social sciences, its
applications to materials science problems is relatively new. This
presentation will demonstrate examples of how the use of data mining
techniques in a wide array of materials science problems can help to
address the challenges of informational complexity. Examples are
provided in the context of fundamental materials science problems that
are relevant to M/NEMS structures and nanomaterials in general.

-Biosketch-
Prof. Krishna Rajan is the Stanley Chair Professor in
Interdisciplinary Engineering and a member of the Department of
Materials Sciences and Engineering at Iowa State University. After
receiving his doctorate in 1978 from the Massachusetts Institute of
Technology in Materials Science, he held a research appointment at MIT
and at the Metallurgy and Materials Science Department at Cambridge
University until 1980. From 1980-87 he was staff scientist at the
National Research Council of Canada. In 1987, he joined the faculty at
Rensselaer Polytechnic Institute, where he became a full professor in
1993. Prof. Rajan moved to Iowa State University in 2005, were he
heads CoSMIC, the Combinatorial Sciences and Materials Informatics
Collaboratory, which is supported by the NSF and the International
Materials Institute. Prof. Rajan?s research interests focus on the
microstructural aspects of materials science with a major effort in
the applications of high-resolution electron microscopy. Professor
Rajan?s research extends into coupling new developments in computer
and mathematical sciences into combinatorial materials science and
informatics. Based on these efforts he has established the first
academic program in materials informatics and combinatorial materials
science in a major Materials Science department in the United States.

~j

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From gsosa at stanford.edu  Fri Mar 14 07:37:21 2008
From: gsosa at stanford.edu (Gary J Sosa)
Date: Fri, 14 Mar 2008 07:37:21 -0700
Subject: Scheduled Downtime
Message-ID: <20080314073721.sl3yxt72cks4scog@webmail.stanford.edu>

  Hi All

    This message is to notify you that SVG coater #1 will be down on  
Monday, 3/17 from 7:00 AM to Noon. We will have a vendor here to begin  
troubleshooting and repairs of the Vapor Prime module. Sorry for the  
short notice but please make alternate plans as needed and continue to  
check coral for  track status.

   Also let me remind everyone that Karl Suss Aligner #1 will go down  
on Monday 3/17 @ 10:00 AM for 6 - 8 hours to perform a PM. Karl Suss  
Aligner #2 will go down on Tuesday 3/18 @ 9:00 AM for 6 - 8 hours to  
perform a PM.

   Thanks...  Gary


From mbaran at stanford.edu  Fri Mar 14 15:10:59 2008
From: mbaran at stanford.edu (Maureen Baran)
Date: Fri, 14 Mar 2008 14:10:59 -0800
Subject: Unique USB Stick Found
Message-ID: <20080314221059.AA04165A4BF@smtp2.stanford.edu>

A unique USB stick was found in the CAD room today.  If this is yours,
please be prepared to describe it.

 

Thank you,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran at stanford.edu

650-725-3664

 

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From wingli at stanford.edu  Wed Mar 19 15:32:02 2008
From: wingli at stanford.edu (wingli at stanford.edu)
Date: Wed, 19 Mar 2008 15:32:02 -0700
Subject: Borrow portable tachometer
Message-ID: <20080319153202.vwh3jey5w8ggwkwo@webmail.stanford.edu>

Dear Labmembers,

I'm wondering if anyone has a portable tachometer (non-contact) and if  
I could borrow it for a while.  The tachometer of my spin coater is  
out of order and I would like to calibrate the spin speed.

Many thanks!
Wing


From mtang at stanford.edu  Wed Mar 19 23:05:46 2008
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 19 Mar 2008 23:05:46 -0700
Subject: Where can you make masks?  SNF Process Grand Rounds, Friday, 3/21,
 11:30
Message-ID: <47E1FEBA.3030307@stanford.edu>

Hi everyone --

The next SNF Process Grand Rounds is this Friday, 3/21, at 11:30 am in 
CIS 101.   Topics to be covered (not necessarily in this order) will be 
as follows:

1.  Where and how to get masks and reticles made, and how much they'll cost.
2.  Process brainstorming (bring your process problems!)
3.  Finish mapping out process qual data collection, using Coral
4.  Decide on when process qual data should be collected.
5.  Decide on how the data should be accessed, reported, and/or viewed.
6.  Discuss John's test database mockup of data entry for metal dep

Pizza, this time.  Hope to see you there!

Mary


From mtang at stanford.edu  Thu Mar 20 10:02:47 2008
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 20 Mar 2008 10:02:47 -0700
Subject: SNF Survey: DRIE/STS Etch
Message-ID: <47E298B7.8040006@stanford.edu>

Hi all --

Just wanted to let you know that the SNF STS etch opinion survey closes at
midnight tonight(yes, it's been two weeks since it's been live.)  If you have 
an opinion on STS usage and management at SNF (and I know you do!), we 
want to encourage you to share it.  It's  short and sweet with plenty of 
opportunity to add your own comments.  Here's the link:

http://www.surveymonkey.com/s.aspx?sm=HV3UtmHb0exdw7_2b_2bMBEz9g_3d_3d

Special thanks to Nahid for organizing the survey!

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From hailiang at stanford.edu  Thu Mar 20 22:43:53 2008
From: hailiang at stanford.edu (Hailiang Wang)
Date: Thu, 20 Mar 2008 22:43:53 -0700
Subject: vacuum furnace
Message-ID: <20080320224353.t3anpx6hskc0g0g0@webmail.stanford.edu>

Dear labmembers,

Sorry to bother you, I just want to ask is there any available vacuum  
furnace as you know that can be heated to above 1200C.

Your help is really appreciated.
Thanks.

Hailiang




From mtang at stanford.edu  Fri Mar 21 10:02:55 2008
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 21 Mar 2008 10:02:55 -0700
Subject: SNF Process Grand Rounds, today, 11:30, CIS 101
Message-ID: <47E3EA3F.301@stanford.edu>

Hi everyone --

Just a reminder of the Process Grand Rounds today (Friday) at 11:30 in 
CIS 101.  On the agenda:

1.  Maskmaking services
2.  Process brainstorming
3.  Process qual data on Coral
4.  When to do process quals
5.  How to get process qual data

Pizza provided.

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From shott at stanford.edu  Mon Mar 24 14:21:02 2008
From: shott at stanford.edu (John Shott)
Date: Mon, 24 Mar 2008 14:21:02 -0700
Subject: Problems with "desktop" on Sunrays?
Message-ID: <47E81B3E.7020005@stanford.edu>

SNF Lab Members:

Several people have reported problems with the computer "desktop" when 
they log into the Sunrays.
These problems seem to affect only those people who have been using the 
Java Desktop System .... this is the one that looks a little more 
Windows-like and has the menu labeled "Launch" in the lower left corner.

For reasons that I can't completely explain, several people ended up 
with corrupted configuration files starting about last Friday.  In some 
cases, it seems to freeze on a window that says "The Panel" and in other 
cases it simply shows a dark screen and never gets to your login 
environment.

If you seem to have these problems, send me email with your Coral login 
name.  I believe that I can "fix" this by giving you a fresh set of 
configuration files.

Thanks,

John





From shott at stanford.edu  Tue Mar 25 07:16:25 2008
From: shott at stanford.edu (John Shott)
Date: Tue, 25 Mar 2008 07:16:25 -0700
Subject: Changing desktop environments and easier starting of Coral in the
 "new" desktop environment ...
Message-ID: <47E90939.8070700@stanford.edu>

SNF Lab Members:

In working with a few of you to restore your desktop environments, I've 
learned several things that I
thought I'd share with you.

First, let me define a couple of terms: there are two desktop 
environments available on our Sun Rays:
the older one is called the Common Desktop Environment (CDE) and is the 
one that has the menu bar along the bottom center of the window with the 
little globe at the left end and usually will automatically start Coral 
for you.  The newer one is called the Java Desktop System (JDS) and has 
the yellowish "Launch" menu in the lower left corner.

Several of you have told me that you like this new one (JDS) better .... 
some of you like it because it is more "Windows-like" and some of you 
have said that you like it because it gives you easier access to the 
Star Office (AKA Open Office) tools.  The complaint about this one 
(other than the snafu of a couple of days ago) is that Coral is harder 
to start .... you have to open a Terminal window and manually type "coral".

I believe that I have improved this in two ways: you should now see the 
Coral icon at the very top of the Launch menu.  Selecting that from the 
menu should start Coral for you.  If you would like to make it so that 
Coral will start automatically for you, however, you can issue the 
following command .... if you type it correctly, Coral should start 
automatically for you each time that you login to the Sun Rays under the 
Java Desktop System.  Here is the command that you should type ....

cp /etc/skel/.gnome2/session-manual ~/.gnome2/session-manual

Note: don't miss the "dot" that preceeds gnome2 in two places .... this 
will copy a file that "auto-starts" Coral into the appropriate location 
in your directory.

A couple of other items:

1. Can you test the Java Desktop System for a bit and then move back to 
CDE if you don't like it?

Yes

2. How do you switch from one to the other?

By default, you get the desktop system that you used last time ... so, 
once you use one or the other, you will continue to get that unless and 
until you explicitly tell it that you want to use the other.

To switch from one to another, you have to insert a smart card into the 
system before you login.
Then, also before you login, you need to click the "Options" button 
below the login space and then select "Session ...".  You will be given 
4 options:
    Common Desktop Environment (CDE)
    Java Desktop System, Release 3
    User's Last Session
    Failsafe Session

Select the one that you would like to try, and then login normally.  
That should start up the specified desktop environment .... and will 
continue to do so unless you explicitly switch back to the other.

Please let me know if you have any problems or questions.

Thanks,

John




From mtang at stanford.edu  Tue Mar 25 16:50:14 2008
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 25 Mar 2008 16:50:14 -0700
Subject: Berkeley Nano Forum
In-Reply-To: <47E98ECA.1080603@berkeley.edu>
References: <47E98ECA.1080603@berkeley.edu>
Message-ID: <47E98FB6.7@stanford.edu>

Labmembers --

A meeting announcement from across the bay:


> *Fellow Researchers in Nanotechnology!*
>
>
> The Berkeley Nanotechnology Club is proud to present to you an 
> opportunity to
> present your research in the field of Nanotechnology at our upcoming 
> *Berkeley*
> *Nano Forum on April 27^th *. The event will be hosting of about 300 
> fellow
> researchers, professors, entrepreneurs and others. We invite you to 
> bring your
> research and put it on display at our *Poster Session*, to do so, 
> please submit
> your 250 word abstracts to the following email addresses: 
> tapanpatel at berkeley.edu  <mailto:tapanpatel at berkeley.edu>
> and also to kayte at berkeley.edu <mailto:kayte at berkeley.edu>.
>
> *Where:* Haas School of Business on the UCB Campus)
> *When:* April 27^th
> *Abstract Deadline:* April 5th (March 28^th for UCB students)^
> *Abstracts Submission:* tapanpatel at berkeley.edu 
> <mailto:tapanpatel at berkeley.edu> ; kayte at berkeley.edu 
> <mailto:kayte at berkeley.edu>  
>
> *Also* take a look at the attached Poster Session Flyer.
>
>
> To subscribe to the Berkeley Nanotechnology Club mailing list, send an 
> e-mail to majordomo at listlink.berkeley.edu 
> <mailto:majordomo at listlink.berkeley.edu> containing the single line 
> "subscribe nanoclub" (without the quotes) in the body of the message.
>
> Visit us at http://nanoclub.berkeley.edu <http://nanoclub.berkeley.edu/>
>
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Thu Mar 27 12:42:04 2008
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 27 Mar 2008 12:42:04 -0700
Subject: SNF Enterprise Forum:  Follow up
Message-ID: <47EBF88C.4060706@stanford.edu>

Dear Labmembers:

Earlier this month, we hosted a Venture Forum featuring Shahin Farschi from Lux Capital.  Your feedback on this event has been very positive.  Shahin has indicated that he would be willing to provide his slides outlining the venture process.  He also said he would glad to return for future seminars; and so we would like to know if there are any specific topics in the venture initiation process that you would like to see covered.  Please send comments and  suggestions to me.  Shahin would also be glad to talk about career opportunities in venture; please get in touch with him directly at shahin.farschi at luxcapital.com if you are interested.

Thanks,

Mary


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu




From nishiy at stanford.edu  Thu Mar 27 18:21:11 2008
From: nishiy at stanford.edu (Yoshio Nishi)
Date: Thu, 27 Mar 2008 18:21:11 -0700
Subject: SNF oraganizational change
Message-ID: <000a01c89072$02b0c5b0$393342ab@stanford.edu>



Hi all, 

Please find attached the announcement for the change of SNF organizational
and reporting structure, which becomes effective immediately.
I would like to ask your full cooperation and support to the new SNF as our
critically important infrastructure for nanotechnology research at Stanford.

Thank you,

Yoshio Nishi
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From arguicha at stanford.edu  Fri Mar 28 13:43:13 2008
From: arguicha at stanford.edu (Alex Guichard)
Date: Fri, 28 Mar 2008 13:43:13 -0700
Subject: tylan: oxidation at T between 950 and 1000?
Message-ID: <2EE66161-11EA-48EC-A446-CF4866463142@stanford.edu>

Hello all:
I was wondering if anyone could describe the use of any of the Tylan  
recipes that would allow me to oxidize Si at a "non-standard"  
temperature, specifically one between 950 and 1000?C.  I found a  
recipe called "DRY3TEMP", which looks like it might do what I want it  
to, but I wanted to ask you all if anyone could describe their  
experience with such a recipe.

Thanks,
Alex


Alex R. Guichard
Ph.D Candidate
Dept. of Mat. Sci. and Eng.
Stanford University
(M)919-434-6906  (F)650-724-9851
(O) 650-723-6352  (L)650-723-6466

I am running another marathon to raise money for Leukemia and Lymphoma  
research!  Support my efforts at:
http://www.active.com/donate/tntsvmb/alex07