From sunxuhui at gmail.com Wed Oct 1 12:15:45 2008 From: sunxuhui at gmail.com (Xuhui Sun) Date: Wed, 1 Oct 2008 12:15:45 -0700 Subject: Si wet etching Message-ID: Does anybody know how to wet etch Si? What kind of etchant can I use? what's the etching rate? Thank you very much! Jeff Sun From mtang at stanford.edu Sun Oct 5 16:08:05 2008 From: mtang at stanford.edu (Mary Tang) Date: Sun, 05 Oct 2008 16:08:05 -0700 Subject: SNF Process Clinic, Monday, 10/6, 2-4 pm Message-ID: <48E948D5.6010808@stanford.edu> Hi all -- Next Process Clinic is Monday, 10/6 from 2-4 pm in the cubicle area near Maureen's office. Bring your process questions, your process flows, device layouts, and new materials requests. Keith Best from ASML will also be on hand. All labmembers (and prospective labmembers) are welcome. Your SNF Staff From mtang at stanford.edu Mon Oct 6 08:16:32 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 06 Oct 2008 08:16:32 -0700 Subject: Venture Clinic w/Shahin Farschi, Tues. 10/7, 3 pm Message-ID: <48EA2BD0.1080908@stanford.edu> Are you thinking about the possibility of building a startup? Shahin Farshchi, an Associate from Lux Capital, will be moderating the Venture Clinic, which aims to provide an informal forum for researchers interested in brainstorming with a venture capitalist on avenues for commercializing technology, and what to expect when starting a new venture. Technical discussions should be limited to what has been already disclosed or published. This will take place on Tuesday, Oct. 7 at 3 pm in CIS 101. For more information, contact: Shahin Farshchi, Ph.D. Phone: 925.323.2784 Email: shahin.farshchi at luxcapital.com -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From rparsa at stanford.edu Mon Oct 6 14:50:09 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Mon, 6 Oct 2008 14:50:09 -0700 (PDT) Subject: Seminar Today: Retro-Mechanical Era? From MEMS to NEMS switches, 3-4:30pm CISX 101] In-Reply-To: Message-ID: <634633104.3400091223329809751.JavaMail.root@zm06.stanford.edu> E342 SEMINAR (MEMS Lab2) Monday, October 6, 2008 3:00 - 4:30 pm CISX-101 Title: Retro-Mechanical Era? >From MEMS to NEMS switches Speaker: Prof. Jun-Bo Yoon KAIST University, Korea Abstract: A switch has been playing very important role on our human history. For example, manual phone line switching gave us a great motivation to invent a transistor at Bell lab in around 1950. After dramatic progress in the modern integrated circuit technology, we now are sitting on a position looking back our mechanical switch era. Why? I'd like to discuss the reason with you while presenting recent progresses achieved in MEMS and NEMS switches in this talk. From eap at gloworm.Stanford.EDU Mon Oct 6 15:15:50 2008 From: eap at gloworm.Stanford.EDU (Eric Perozziello) Date: Mon, 6 Oct 2008 15:15:50 -0700 (PDT) Subject: Reminder: Cleanliness & Contamination Meeting, Thursday, 9/25, 3 pm In-Reply-To: <48DBF860.50809@stanford.edu> Message-ID: Following last meeting, we were told "nothing had been decided yet." After all the opposition and questions at that meeting, I'm hoping that there is a followup discussion for such a dramatic shift in the mission of the lab. Is anything scheduled or planned? Thanks, -Eric On Thu, 25 Sep 2008, Mary Tang wrote: > Hi all -- > > Just a reminder. For details: > > http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3413:200809:phkllicgjinehokifeok > > Your SNF Staff > > -- > Mary X. Tang, Ph.D. > Stanford Nanofabrication Facility > CIS Room 136, Mail Code 4070 > Stanford, CA 94305 > (650)723-9980 > mtang at stanford.edu > http://snf.stanford.edu > > From edmyers at stanford.edu Tue Oct 7 09:43:50 2008 From: edmyers at stanford.edu (Ed Myers) Date: Tue, 07 Oct 2008 09:43:50 -0700 Subject: Veeco AFM seminar Reminder Message-ID: <6.2.5.6.2.20081007094239.02fbc320@stanford.edu> >All, > >Mayur Savla the Veeco Bay Area AFM Applications Engineer, will hold >a seminar on: > >Wednesday, October 8 at 2:30 to 3:15 PM >Allen Center for Integrated Systems >CIS-X Cypress Auditorium (CISX101). > >He will discuss the best practices and set-up tips for optimizing >scan parameters for surface roughness and step height measurements, >Force curve measurements, Phase imaging, Fluid imaging and >Electrical Measurements using AFM. > >Registration is required if you want to win the free sample pack of >AFM tips. See the flyer for instructions. > >If you have any questions, please feel free to contact me or Paul >Charell at pcharell at veeco.com. > >Regards, >Ed -------------- next part -------------- A non-text attachment was scrubbed... Name: Veeco AFM Seminar2.doc Type: application/msword Size: 28160 bytes Desc: not available URL: From mmlee at stanford.edu Wed Oct 8 10:39:33 2008 From: mmlee at stanford.edu (Meredith M. Lee) Date: Wed, 8 Oct 2008 10:39:33 -0700 Subject: Postdoctoral Opportunity at the University of Maryland Message-ID: <9fa245520810081039q54f88b13jcc53d1537b3ac05d@mail.gmail.com> Student OSA/SPIE and labmembers, Please see below for a postdoc opening from Edo Waks, a former Stanford Ph.D student and postdoc. *Postdoctoral Fellow Opening* * * *Department of Electrical and Computer Engineering* *University** of Maryland, College Park* * * The nanophotonics group at the University of Maryland, College Park, is seeking to hire a Postdoctoral Fellow. The main interests for our research group are: experimental and theoretical quantum optics, quantum information processing, photonic crystal design and fabrication, quantum dots, physics of optoelectronic devices, and plasmonics. We are particularly interested in candidates with optics lab and nanofabrication experience. The nanophotonics group is led by Edo Waks, and is part of the Department of Electrical and Computer Engineering. Our group is part of the newly formed Joint Quantum Institute (JQI), as well as the Inistute for Research in Electronics and Applied Physics (IREAP). JQI brings together leading researchers from both NIST and Maryland to study quantum coherence and quantum information, while IREAP combines the expertise of top scientists from Departments of Physics, Electrical Engineering, and Material Science to perform highly multidisciplinary research. Postdocs will have the opportunity to establish close ties with researchers at Maryland, NIST, and IREAP. They will also have access to state-of-the-art nanofabrication facilities at the University of Maryland Fablab and NIST. The initial appointment will be for one year with the possibility of renewal for an additional one to two years subject to satisfactory progress and availability of funds. The start time of the appointment is open to negotiation. Qualified candidates must have attained a Ph.D. prior to the beginning of their appointment. Applicants should send a detailed CV along with 3-4 references by email to edowaks at umd.edu. Please make the header of your email is "Nanophotonics Research Position" to ensure that it is appropriately received. Additional information may be found on our web page at http://www.ireap.umd.edu/NanoPhotonics/. Email applications are preferred, but if a hard copy application is required it may be mailed to the following address: Edo Waks Institute for Research in Electronics and Applied Physics University of Maryland College Park, MD 20742-3511 -- -------------------------------------------------- Meredith M. Lee Stanford University Ph.D. Candidate, Dept. of Electrical Engineering President, Stanford Student OSA/SPIE Center for Integrated Systems 420 Via Ortega, Stanford, CA 94305-4075 Fax: (650) 723-4659 mmlee at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rparsa at stanford.edu Thu Oct 9 04:20:34 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Thu, 9 Oct 2008 04:20:34 -0700 (PDT) Subject: E342 MEMS Seminar; Zero to Millions: High Volume MEMS Start-Ups in the Fabless Era, Monday Oct. 13th, 3-4pm CISX 101 In-Reply-To: <1359250768.3860831223551197480.JavaMail.root@zm06.stanford.edu> Message-ID: <1486747393.3860851223551234051.JavaMail.root@zm06.stanford.edu> MEMS Seminar Announcement: ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ E342 SEMINAR (MEMS Lab2) Monday, October 13, 2008 3:00 ? 4:00 pm CISX-101 Title: Zero to Millions: High Volume MEMS Start-Ups in the Fabless Era Speaker: Dr. Brian Bircumshaw LV Sensors, Inc., Emeryville, California Abstract: So, you have a novel MEMS widget and you want to start a company? The reality of today is that credit is tight. Technology speculators (like venture capitalists) increasingly back ?safer? software options. They will not fund a fab; and, to succeed, you will need a system with market pull, not a widget. Despite these limitations, MEMS is entering the mainstream, and there are many opportunities out there. This talk will delve into the topic of building a high volume MEMS start-up in the fabless/fab-lite era. It will explore the necessary conditions for success on the business side. It will then examine the constraints imposed by the investors and the marketplace. With the business landscape established, the talk will delve into system design considerations, from the MEMS to the package & electronics, from wafer probe to product test and calibration. The talk will also touch on the extremely important topic of sub-contractors, such as wafer foundries.Throughout, the talk will draw on examples and vignettes from LV Sensors, Inc. (LVSI). Once described as a ?secretive wireless sensor co.,? LVSI is an example of a high volume electronics start-up. Combining MEMS and electronics in a custom package, LVSI has developed the world?s first Tire Pressure Sensor (TPS) with integrated pressure sensor, RF capabilities, and dual-axis motion sensor. Bio: Brian Bircumshaw was born and raised in San Diego. He received his BS with Honor from Caltech in Mechanical Engineering. His passion for traveling motivated him to look abroad for his post-graduate degrees. In 1999, he received his MPhil from Cambridge University ( England ) in computational fluid dynamics on a Churchill Fellowship. In 2000, he received a diploma in technology management from the University of Strathclyde ( Scotland ) on a Rotary Ambassadorial Scholarship. Excited by ants on microscopic gears, Brian returned to the USA to work on MEMS at UC Berkeley with Profs. Al Pisano and Roger Howe. In 2005, he received his PhD in RF MEMS resonators, and began working at LV Sensors with the start-up personalities of Dr. Janusz Bryzek and Curtis Ray. Brian is the principal architect behind the design of LVSI?s MEMS pressure sensor and accelerometer, as well as their fabrication process flow and integration into the TPS product. -------------- next part -------------- A non-text attachment was scrubbed... Name: Brian Bircumshaw.doc Type: application/msword Size: 53248 bytes Desc: not available URL: From xinranw at stanford.edu Sat Oct 11 22:44:01 2008 From: xinranw at stanford.edu (Xinran Wang) Date: Sat, 11 Oct 2008 22:44:01 -0700 Subject: ITO deposition Message-ID: <22ffcd060810112244q14242b84u6bc45d66d2ad4567@mail.gmail.com> Dear Labmembers, We need to deposit ITO (Indium tin oxide) on some wafers. Could anybody provide a good company that can do this? Thanks! Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From jameson at stanford.edu Mon Oct 13 10:54:26 2008 From: jameson at stanford.edu (John Ross Jameson) Date: Mon, 13 Oct 2008 10:54:26 -0700 (PDT) Subject: SiO2/PR selectivity in MRC Message-ID: Hi, Does anyone have an MRC recipe for an SiO2 etch that's got at least a 2:1 selectivity over the 955 photoresist (or 3612, if that's all you have)? Last week, I did an etch with 2.5 sccm O2, 15 sccm CHF3, 50W, 50mT, but found it etched PR *faster* than SiO2 (I need the opposite). I've had suggestions of pumping down the chamber longer to remove residual O2, reducing the O2 flow rate, and breaking the etch into pieces to keep the sample from heating up. Thanks in advance, John From mtang at stanford.edu Tue Oct 14 12:34:25 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 14 Oct 2008 12:34:25 -0700 Subject: Bionanoparticle Characterization Workshop, Tuesday, Oct. 21, 2008 Message-ID: <48F4F441.6080101@stanford.edu> Dear Labmembers -- SNL and SNF are holding a workshop on the characterization of nanoparticles for biology as part of the NCI Alliance program for Cancer Bionanotechnology. This workshop will be held from 9 am - 3 pm in the Stanford Nanocharacterization Lab next Tuesday, Oct. 21, 2008. The morning session (9-11:30) will consist of lectures introducing basic concepts of bionanoparticle characterization and modification; the afternoon (12:30-3) will consist of hands-on demos in the Nanocharacterization Lab. Registration is free to academic researchers. Please RSVP to Richard Chin (rwchin at stanford.edu) by Friday, Oct. 17, if you would like to attend. From dwitte at stanford.edu Wed Oct 15 15:14:15 2008 From: dwitte at stanford.edu (Daniel Witte) Date: Wed, 15 Oct 2008 15:14:15 -0700 Subject: Fine Al or Au bonding wire Message-ID: <8d3fd7200810151514q17a38b9du8c3b1751cdce77a1@mail.gmail.com> Hi all, I'm trying to find some Al or Au bonding wire, in 0.5 or 0.7 mil diameter. Turns out it's expensive to order, and I don't really need much, so if anyone can loan me a spool that'd be very helpful! (Or if you know where I might find some, that'd be useful too.) Thanks much, Dan. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Sun Oct 19 12:58:36 2008 From: mtang at stanford.edu (Mary Tang) Date: Sun, 19 Oct 2008 12:58:36 -0700 Subject: Process Clinic, 2-4 pm Monday Message-ID: <48FB916C.2060101@stanford.edu> Hi all -- The next Process Clinic is Monday, Oct. 20, from 2-4 pm in the cubicle area near Maureen's office. Bring your process flows, process questions, layouts, and new material requests. Senior labmembers are especially welcome to offer first-hand advice and suggestions. Your SNF staff From mtang at stanford.edu Sun Oct 19 13:48:28 2008 From: mtang at stanford.edu (Mary Tang) Date: Sun, 19 Oct 2008 13:48:28 -0700 Subject: Labmembers' Meeting, Friday, Oct. 24, 1 pm, CISX Auditorium Message-ID: <48FB9D1C.9000601@stanford.edu> Hi all -- Just a reminder of the Labmembers' meeting this Friday, Oct. 24, 1 pm, in the CISX auditorium. On the agenda -- - General announcements - Quality Circle updates - Wiki website - Cleanliness & Contamination Working Group - EE410 Redesign project - Other project updates All this, and more. Everyone in the lab community is welcome. Your SNF Staff From mtang at stanford.edu Mon Oct 20 10:14:08 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 20 Oct 2008 10:14:08 -0700 Subject: Cleanliness & Contamination Working Group: Meeting this Friday, 3 pm Message-ID: <48FCBC60.50507@stanford.edu> Labmembers: Since our meeting on cleanliness and contamination a few weeks ago, many meetings and discussions have taken place. Again, we'd like to emphasize that no policy decisions have been made. Instead the discussions have focused on how to structure an ongoing forum whereby the lab community can work out how new process flows can be incorporated into the lab without risking others' work.. The first cleanliness and contamination working group meeting will be this Friday, Oct. 24, at 3 pm, in CIS 101. The philosophical approach NOT a radical shift in the basic cleanliness and contamination policies of the lab, but rather to facilitate pathways to meet more of our labmembers' processing needs. The discussion at this meeting is intended to be at a fairly high level, where other working groups and activities may be spun out to address specific issues in more detail. Certain PI's may be invited to participate as appropriate. Meeting minutes will be posted for the lab community. The objective in this first meeting will be to identify specific process technologies with special needs and identify the labmember advocate who will represent this technology in working group meetings. Several people have already volunteered (or been volunteered by their PI's) to represent the following areas: novel materials for CMOS; memory; GaAs on Si; detectors; EE410; MEMS; nanowires, solar. If you have specific critical needs for your process technology, whether it is to maintain a certain level of cleanliness or introduce a previously untested material, and you are willing to serve as an advocate for your process technology, then we invite you to participate in this working group meeting. Thanks for your attention -- Jim McVittie, Ed Myers, Peter Griffin, John Shott, Mike Deal, & Mary Tang From rschaevitz at stanford.edu Mon Oct 20 12:26:34 2008 From: rschaevitz at stanford.edu (Rebecca Schaevitz) Date: Mon, 20 Oct 2008 12:26:34 -0700 Subject: OSA/SPIE Seminar: Jon Roth / Aesthera - Thurs. 10/23, 4pm, Ginzton AP 299 Message-ID: <975904830810201226g7a6a2796pcb1ba04d02888b5b@mail.gmail.com> The Optical Society of America/SPIE Stanford Student Chapter, and the Stanford Photonics Research Center present: "Light, Vacuum, Acne: Research at a Medical Device Startup" Speaker: Jonathan E. Roth, Aesthera Thursday, October 23, 2008 4:15pm, Ginzton Building, AP 299 Refreshments at 4:00pm Abstract: Acne is typically treated with drugs. Due to dangers of isotretinoin, a medication used for severe acne, and growing concern over the over-prescription of antibiotics, there is a need for new safe and effective treatments. The first part of this talk will describe a novel acne treatment developed by Aesthera utilizing light and suction. Light is used to selectively heat structures in skin. Suction applied during light pulsing increases the selectivity of absorption by stretching the skin surface while raising the pilosebaceous unit, where acne occurs, towards the surface. Further ongoing research to improve acne treatment will be discussed. The second part of the talk will focus on the experience of working in a startup, and contrasts with academia. While long-term research can boost the valuation and chances of long-term success of a small company, the startup must focus on short term profitability to gain solid footing. The product development process for a medical device will also be discussed. About our speaker: Jon Roth earned a Ph.D. in 2007, working with optoelectronic modulators in David Miller's group. In 2008 he joined Aesthera, a startup which sells medical devices to dermatologists. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Roth_OSApresentation_20081023C.pdf Type: application/pdf Size: 30001 bytes Desc: not available URL: From arguicha at stanford.edu Mon Oct 20 13:36:46 2008 From: arguicha at stanford.edu (Alex Guichard) Date: Mon, 20 Oct 2008 13:36:46 -0700 Subject: University Ph.D. Oral Examination - Alex R. Guichard - Tuesday, 10/28, CISX Auditorium Message-ID: Growth and Optical Properties of CMOS-compatible Silicon Nanowires Alex R. Guichard Department of Materials Science and Engineering Advisor: Professor Mark L. Brongersma Tuesday, October 28th, 2008 1:30 PM (Refreshments served at 1:15 PM) CIS-X Auditorium Silicon is the dominant semiconductor in both the microelectronics and photovoltaic industries. The main reasons for its success can be traced back to its excellent materials and electronic properties. In contrast, its indirect bandgap makes bulk Si a quite uninteresting optical material. In the early 1990s the discovery of efficient room temperature light emission from electrochemically etched porous Si and subsequent reports of optical gain from Si nanocrystals (Si-nc) early this decade resulted in an explosion of research in this area; these events sparked the dream of realizing Si-based light sources, optoelectronic circuitry, and possibly even a laser. By now, this research has provided a significant understanding of the fundamental optical properties of Si nanostructures. Despite the rapid advancements, an efficient electrically-pumped light source based on these materials does not yet exist. This is in part due to their inefficient charge injection and transport properties. Moreover, the growth processes for Si nanostructures are not yet fully CMOS compatible. In this presentation, I discuss a potential alternative material system for to porous Si and Si-nc: Si nanowires (SiNWs). I will illustrate the use of CMOS compatible fabrication techniques such as chemical vapor deposition (CVD), lithographic patterning, and thermal oxidation to generate Si NWs with diameters as small as 3 nm. At these diameters, quantum mechanical phenomena substantially modify the electronic and optical properties of the NWs. Photoluminescence (PL) measurements, demonstrate that their emission wavelength can be tuned by precisely controlling the crystalline Si NW diameter, as determined by dark field and high-resolution transmission electron microscopy. The PL decay lifetimes of these NWs are on the order of 50 ?s, which suggest the PL is originating from confined excitons in the indirect bandgap Si cores. For solar cell and laser applications, we also quantify undesirable, non-radiative Auger recombination (AR) processes in the NWs. It was found that AR is about 2 orders of magnitude slower than in Si ?ncs, which have been a serious contender for a Si- based laser. Although these results are promising, single NW studies reveal the need for better passivation strategies before efficient NW light sources can be realized. A second potential application for SiNWs is as a building block for low-cost, thin film, Si-based photovoltaics (PV). The market for thin- film PV, particularly organic thin-film PV, exists because it offers a potential cost reduction versus bulk, crystalline-Si-based PV. However, many thin film technologies, while possessing superior optical absorption properties compared to crystalline Si (c-Si), suffer from poor electronic transport properties. Here, I present a new hybrid organic/inorganic PV design that combines the excellent optical properties of highly absorptive organic dye molecules and the useful electronic properties of high-mobility crystalline SiNWs. In the proposed cell, light is first absorbed in the dye and via F?rster energy transfer electron-hole pairs are generated in the SiNW. The charges can be extracted from the Si NWs by generating a p-n junction in the wires and contacts at both ends. Here, I investigate the feasibility of such a device by performing photocurrent spectroscopy on individual dye-coated, lightly-doped Si NWs. An approximately twofold increase in the photocurrent is obtained in the wavelength range corresponding to the dye's absorption band, indeed suggesting the possibility to use dyes to boost the efficiency of weakly absorbing Si structures. These results could pave the way for new low- cost, Si-based solar cell designs that leverage the strengths of the Si PV and microelectronics industries. -------------- next part -------------- An HTML attachment was scrubbed... URL: From arguicha at stanford.edu Mon Oct 20 23:16:13 2008 From: arguicha at stanford.edu (Alex Guichard) Date: Mon, 20 Oct 2008 23:16:13 -0700 Subject: metal delamination during lift-off? Message-ID: Has anyone ever experienced problems with metallization layers peeling away during lift-off? I am trying to contact thin (~100 nm) regions of Si with most of the electrode area in contact with SiO2. Using the standard lift-off process flow outlined on SNF's website, I have tried Pd - which supposedly has less than stellar edhesion to SiO2 - and Ni which has good SiO2 adhesion. Both were deposited with Innotec. In both attempts, the metals peeled off during the acetone bath step. Any suggestions would be greatly appreciated. Thanks! Alex From shott at stanford.edu Tue Oct 21 07:02:25 2008 From: shott at stanford.edu (John Shott) Date: Tue, 21 Oct 2008 07:02:25 -0700 Subject: Adobe Reader on the Sunrays ... Message-ID: <48FDE0F1.7050702@stanford.edu> SNF Lab Members: One of the biggest complaints about the Opteron-based machine used to support the Sunrays is the absence of Adobe Reader to display PDF documents. This complaint is widespread among the Solaris x86 community .... not just here at SNF. Finally, there is some good news to report on this front: 1. Adobe has finally announced that they will support Adobe Reader on the Solaris x86 platform on their next major release (Acrobat Reader 9). That is welcome news but, at present, doesn't really help. 2. As an interim measure, Transitive (a company in Los Gatos that specializes in software that allows applications compiled on Solaris SPARC architecture to run on other platforms) has recently released QuickTransit that will allow Adobe Reader to run on the Solaris x86 platform. I have intalled this program on the flare computer and you should now be able to fire up this application named "transread" by issuing the command: transread MyFile.pdf Note: the full path to transread is /bin/transread. The first time that you fire up transread, it seems to take a while to open .... 15-30 seconds ... so be patient. It will first open a licence agreement and then show you your document. If you wish to have this open in your browser, once you are in transread, select "Preferences" from the "Edit" menu. In the preferences menu, select "Internet". This will open a window that will allow you to specify the browser to use. In this case, you should enter the full path to the browser executable: either /bin/firefox for Firefox users or /usr/sfw/bin/mozilla for Mozilla users. Let me know if you encounter any problems .... be we hope that this will provide you improved access to PDF documents. Thank you for your continued support, John From jwc at snf.stanford.edu Wed Oct 22 10:24:25 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 22 Oct 2008 10:24:25 -0700 Subject: Potential issue with YES oven In-Reply-To: <00ff01c933d1$c3e620b0$4bb26210$@edu> References: <00ff01c933d1$c3e620b0$4bb26210$@edu> Message-ID: <48FF61C9.2010604@snf.stanford.edu> Arash, You will likely need to perform a more thorough cleaning than just stripping in acetone as I don't think you are obtaining a clean surface to prime to. I would recommend Remover PG heated to between 40 and 60 C. with ultrasonic for 10 minutes, then a second bath of heated Remover PG for 5 - 10 minutes with ultrasonic, followed by 5 minutes in Acetone (No ultrasonic as it appears to often break the wafer in the U/S), followed by 5 minutes in Isopropanol with ultrasonic. Finally a perfect NS blow off and then direct into the YES Prime Oven. I used the prime oven yesterday and had normal results. Best, James Conway Arash Hazeghi wrote: > > Hi, > > I was trying to spin Ma-N 2043 (negative eBeam resist) on my wafers > (thermal SiO2), I used YES oven but the resist adhesion was very poor, > literally all the resist came off during spinning (like putting water > on a hydrophobic surface). The standard Ma-N 2043 recipe recommends > HMDS step and I had successfully coated wafers with identical > processing in the past with Ma-N 2043. Last night, I tried three > times, each time striping the wafers in Acetone, and putting them in > YES oven prior to spinning but it didn't help. Nothing has changed in > the processing of my wafers so I tend to believe there was something > in the YES oven last night that caused poor adhesion. Has anyone else > experienced any similar issues? Is there a solution? > > > > Thanks, > > Arash > > > > > > > > ---------------------------------------------------------------------------------- > > Arash Hazeghi > > > > PhD Candidate > > Stanford Center for Integrated Systems > > CIS-X 300, 420 Via Palou Mall, > > Stanford, CA 94305 > > > > phone: +1-650-725-0418 > > web: http://www.stanford.edu/~ahazeghi > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jimkruger at yahoo.com Wed Oct 22 13:35:19 2008 From: jimkruger at yahoo.com (jim kruger) Date: Wed, 22 Oct 2008 13:35:19 -0700 (PDT) Subject: MaN adhesion In-Reply-To: <48FF61C9.2010604@snf.stanford.edu> Message-ID: <645684.93062.qm@web38903.mail.mud.yahoo.com> My experience was that MaN does not like HMDS at all. A plasma treatment just before spin was much more effective. O2 strip or Ar sputter. Equipment to use depends on if you are "golden" or CMOS clean. jim --- On Wed, 10/22/08, James Conway wrote: > From: James Conway > Subject: Re: Potential issue with YES oven > To: "Arash Hazeghi" > Cc: labmembers at snf.stanford.edu, "Mahnaz Mansourpour" > Date: Wednesday, October 22, 2008, 10:24 AM > Arash, > > You will likely need to perform a more thorough cleaning > than just > stripping in acetone as I don't think you are obtaining > a clean surface > to prime to. > > I would recommend Remover PG heated to between 40 and 60 C. > with > ultrasonic for 10 minutes, then a second bath of heated > Remover PG for > 5 - 10 minutes with ultrasonic, > followed by 5 minutes in Acetone (No ultrasonic as it > appears to often > break the wafer in the U/S), followed by 5 minutes in > Isopropanol with > ultrasonic. Finally a perfect NS blow off and then direct > into the YES > Prime Oven. > > I used the prime oven yesterday and had normal results. > > Best, > > James Conway > > > Arash Hazeghi wrote: > > > > Hi, > > > > I was trying to spin Ma-N 2043 (negative eBeam resist) > on my wafers > > (thermal SiO2), I used YES oven but the resist > adhesion was very poor, > > literally all the resist came off during spinning > (like putting water > > on a hydrophobic surface). The standard Ma-N 2043 > recipe recommends > > HMDS step and I had successfully coated wafers with > identical > > processing in the past with Ma-N 2043. Last night, I > tried three > > times, each time striping the wafers in Acetone, and > putting them in > > YES oven prior to spinning but it didn't help. > Nothing has changed in > > the processing of my wafers so I tend to believe there > was something > > in the YES oven last night that caused poor adhesion. > Has anyone else > > experienced any similar issues? Is there a solution? > > > > > > > > Thanks, > > > > Arash > > > > > > > > > > > > > > > > > ---------------------------------------------------------------------------------- > > > > Arash Hazeghi > > > > > > > > PhD Candidate > > > > Stanford Center for Integrated Systems > > > > CIS-X 300, 420 Via Palou Mall, > > > > Stanford, CA 94305 > > > > > > > > phone: +1-650-725-0418 > > > > web: http://www.stanford.edu/~ahazeghi > > > > > > From rparsa at stanford.edu Wed Oct 22 13:51:59 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Wed, 22 Oct 2008 13:51:59 -0700 (PDT) Subject: E342 MEMS Seminar: Monday Oct. 27th 3-4pm in CISX-101; Stress Engineered MEMS: Packaging springs, RF coils and more In-Reply-To: <1756355432.1075391224708714998.JavaMail.root@zm06.stanford.edu> Message-ID: <1133614618.1075411224708719714.JavaMail.root@zm06.stanford.edu> MEMS Seminar Announcement: ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ E342 SEMINAR (MEMS Lab2) Monday, October 27th, 2008 3:00 ? 4:00 pm CISX-101 Title: Stress Engineered MEMS: Packaging springs, RF coils and more. Speaker: Dr. Eugene M. Chow Palo Alto Research Center (PARC), California Abstract: After a little introduction to PARC, I'll describe how we've been using designed stress gradients (GPa/um) to make a variety of micro-devices. The focus has been on spring based electrical interconnects for electronics packaging. We'll describe various package test vehicles we've built and tested with micrometer scale structures (smaller and more compliant than other approaches). I'll also describe a high Q RF MEMS coil and other work devices we've demonstrated based on this technology. Bio.: Eugene M. Chow received a B.S. in engineering physics from University of California, Berkeley (1995), and from Stanford University earned a M.S. in electrical engineering, M.S. in management science and engineering, and a Ph.D. in electrical engineering (2001). At Stanford he worked on silicon micromachining, focusing on through wafer electrical interconnects in silicon, atomic force piezoresistive cantilever arrays, and deep plasma etching. He is currently a research staff member at the Palo Alto Research Center (formerly Xerox PARC), in the Electronic Materials and Devices Lab. There he focuses on MEMS and solid state device research, such as microsprings for integrated circuit packaging, thin film transistors, large area printed organic electronics and novel printing concepts. -------------- next part -------------- A non-text attachment was scrubbed... Name: Eugene Chow.doc Type: application/msword Size: 87552 bytes Desc: not available URL: From nayoung at stanford.edu Thu Oct 23 06:56:19 2008 From: nayoung at stanford.edu (Na Young Kim) Date: Thu, 23 Oct 2008 06:56:19 -0700 (PDT) Subject: Raman spectroscopy available? Message-ID: <532139976.737791224770179331.JavaMail.root@zm09.stanford.edu> Dear Labmembers, I am wondering whether I have an access to do Raman spectroscopy on campus or off campus. I would like to look at Si SOI wafers using this method. If you have expereicne to share with me, that will be great. Thanks, Na Young From mtang at stanford.edu Thu Oct 23 08:47:33 2008 From: mtang at stanford.edu (Mary Tang) Date: Thu, 23 Oct 2008 08:47:33 -0700 Subject: PQuest User Survey Message-ID: <49009C95.4040507@stanford.edu> Dear PQuest user (or prospective PQuest user): The Etch Quality Circle is proposing changes to the way the allocation of etch chemistries is managed at the Pquest. Your inputs would be greatly appreciated; please see the Survey Monkey link below. The next Etch Quality Circle meeting is Wednesday, Oct. 29, at 2 pm in CIS 201. We trust we will have enough input to make the final decision by then. Interested parties are welcome to attend this meeting (please let us know if you plan to come.) http://www.surveymonkey.com/s.aspx?sm=AOqZY6TBzAHBptgBO2szEw_3d_3d Thanks, The Etch Quality Circle (tdo, jimkruger, nharjee, jprovine, lwchang, krivoire, faraon, latta, emyers, shott, eenriquez, mdickey, mtang) From shott at stanford.edu Fri Oct 24 09:28:20 2008 From: shott at stanford.edu (John Shott) Date: Fri, 24 Oct 2008 09:28:20 -0700 Subject: SNF Coral and WebSite outage next Tuesday morning ... Message-ID: <4901F7A4.3050205@stanford.edu> SNF Labmembers: Next Tuesday morning, October 28, from about 8 a.m. to 10 a.m. the power to the CIS 220 computer room will be taken down to install some additional electrical service for a computer array. During this time, the Coral servers, the machine that serves the Sunrays in the lab, the SNF web site, xReporter, and the Plone web site will be unavailable. Prior to that time, we will issue the "All On" command to turn on all interlock on so that work in the lab will not be delayed. As soon as power is restored and Coral returns to service, we will ask each of you to disable any tools that you are using .... and will then disable everything else. We hope that this will provide a minimal disruption to our activities. Please contact me if you have any questions and concerns. Thanks, John p.s. PCs and laptops in offices and networking outside of the computer room should not be affected. From mtang at stanford.edu Fri Oct 24 12:01:42 2008 From: mtang at stanford.edu (Mary Tang) Date: Fri, 24 Oct 2008 12:01:42 -0700 Subject: Reminder: Labmembers' Mtg and Cleanliness/Contamination Working Group Mtg today Message-ID: <49021B96.8070406@stanford.edu> Hi all -- Just a reminder of the lab-wide, general Labmembers' meeting today, at 1 pm in the CISX Auditorium http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3437:200810:hjpgkgilegmpbbpjfhie and the Cleanliness & Contamination Working Group meeting today, at 3 pm in CIS 101. http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3438:200810:nooibngkagipcfimmggk Your SNF staff From mrlin at stanford.edu Mon Oct 27 12:54:11 2008 From: mrlin at stanford.edu (Albert Lin) Date: Mon, 27 Oct 2008 12:54:11 -0700 (PDT) Subject: Notice of Equipment Reservations for Video Shoot Message-ID: <985753417.1220011225137251395.JavaMail.root@zm07.stanford.edu> Dear Labmembers, We would like to inform you that we will be filming a short video for an NSF project on the following equipment and dates/times. The SNF staff has given us their support and approval for the video shoot. While we have already made the corresponding reservations (with the help of SNF staff) and do not expect any equipment conflicts, we ask that you do not run any wafers on the specified equipment during the listed times and please ensure that your wafers are done and removed prior to the listed times. During the listed times, you will have no/limited access to the equipment (to access your wafers) while we are filming. We apologize for any inconvenience and we appreciate your understanding. Thank you very much. Albert Lin mrlin at stanford.edu Equipment Reserved Date/Time SVG Coater Tracks 1 & 2: 10/29 5pm-6pm ASML Stepper: 10/29 6pm-7pm SVG Developer Tracks 1 & 2: 10/29 6:30pm-7:30pm WBSolvent: 10/30 4:30pm-5pm From mtang at stanford.edu Mon Oct 27 14:52:22 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 27 Oct 2008 14:52:22 -0700 Subject: Maskmaking Clinic, Tuesday, 10/28, 3 pm Message-ID: <49063816.2070504@stanford.edu> Hi all -- Bill Martin, representing Compugraphics, will be available to answer questions about maskmaking layouts and how to submit designs for fabrication. This will be on Tuesday, Oct. 28, at 3 pm in CIS 101. Bring your layouts and your maskmaking questions to the expert. Your SNF staff From mtang at stanford.edu Mon Oct 27 16:42:07 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 27 Oct 2008 16:42:07 -0700 Subject: New SNF website: Call for Beta testers! Message-ID: <490651CF.5040807@stanford.edu> Greetings labmembers -- As you may have heard, many students and staff have been working on a new website for the lab. This is a wiki-based site, designed to be used by labmembers as a repository for all that info you might need on a day-to-day basis in the lab. This includes updated operating procedures, links, recipes, and a few original articles. Our goal is to gradually shift links from the current website to this one and eventually move over some time early next year. We are inviting Beta testers to check out the website, with privileges to contribute and update content. If you are interested in being a Beta tester, please get in touch with me -- Mary From arguicha at stanford.edu Mon Oct 27 17:23:22 2008 From: arguicha at stanford.edu (Alex Guichard) Date: Mon, 27 Oct 2008 17:23:22 -0700 Subject: Reminder - University Ph.D. Oral Examination - Alex R. Guichard - Tuesday, 10/28, CISX Auditorium References: Message-ID: Growth and Optical Properties of CMOS-compatible Silicon Nanowires Alex R. Guichard Department of Materials Science and Engineering Advisor: Professor Mark L. Brongersma Tuesday, October 28th, 2008 1:30 PM (Refreshments served at 1:15 PM) CIS-X Auditorium Silicon is the dominant semiconductor in both the microelectronics and photovoltaic industries. The main reasons for its success can be traced back to its excellent materials and electronic properties. In contrast, its indirect bandgap makes bulk Si a quite uninteresting optical material. In the early 1990s the discovery of efficient room temperature light emission from electrochemically etched porous Si and subsequent reports of optical gain from Si nanocrystals (Si-nc) early this decade resulted in an explosion of research in this area; these events sparked the dream of realizing Si-based light sources, optoelectronic circuitry, and possibly even a laser. By now, this research has provided a significant understanding of the fundamental optical properties of Si nanostructures. Despite the rapid advancements, an efficient electrically-pumped light source based on these materials does not yet exist. This is in part due to their inefficient charge injection and transport properties. Moreover, the growth processes for Si nanostructures are not yet fully CMOS compatible. In this presentation, I discuss a potential alternative material system for to porous Si and Si-nc: Si nanowires (SiNWs). I will illustrate the use of CMOS compatible fabrication techniques such as chemical vapor deposition (CVD), lithographic patterning, and thermal oxidation to generate Si NWs with diameters as small as 3 nm. At these diameters, quantum mechanical phenomena substantially modify the electronic and optical properties of the NWs. Photoluminescence (PL) measurements, demonstrate that their emission wavelength can be tuned by precisely controlling the crystalline Si NW diameter, as determined by dark field and high-resolution transmission electron microscopy. The PL decay lifetimes of these NWs are on the order of 50 ?s, which suggest the PL is originating from confined excitons in the indirect bandgap Si cores. For solar cell and laser applications, we also quantify undesirable, non-radiative Auger recombination (AR) processes in the NWs. It was found that AR is about 2 orders of magnitude slower than in Si ?ncs, which have been a serious contender for a Si- based laser. Although these results are promising, single NW studies reveal the need for better passivation strategies before efficient NW light sources can be realized. A second potential application for SiNWs is as a building block for low-cost, thin film, Si-based photovoltaics (PV). The market for thin- film PV, particularly organic thin-film PV, exists because it offers a potential cost reduction versus bulk, crystalline-Si-based PV. However, many thin film technologies, while possessing superior optical absorption properties compared to crystalline Si (c-Si), suffer from poor electronic transport properties. Here, I present a new hybrid organic/inorganic PV design that combines the excellent optical properties of highly absorptive organic dye molecules and the useful electronic properties of high-mobility crystalline SiNWs. In the proposed cell, light is first absorbed in the dye and via F?rster energy transfer electron-hole pairs are generated in the SiNW. The charges can be extracted from the Si NWs by generating a p-n junction in the wires and contacts at both ends. Here, I investigate the feasibility of such a device by performing photocurrent spectroscopy on individual dye-coated, lightly-doped Si NWs. An approximately twofold increase in the photocurrent is obtained in the wavelength range corresponding to the dye's absorption band, indeed suggesting the possibility to use dyes to boost the efficiency of weakly absorbing Si structures. These results could pave the way for new low- cost, Si-based solar cell designs that leverage the strengths of the Si PV and microelectronics industries. -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Tue Oct 28 11:32:30 2008 From: shott at stanford.edu (John Shott) Date: Tue, 28 Oct 2008 11:32:30 -0700 Subject: Coral update .... Message-ID: <49075ABE.8090608@stanford.edu> SNF Lab Members: I apologize for the fact that it took longer than expected to restore Coral service following the power shutdown in the computer room .... The primary problem we encountered is that the flash memory on our primary file server appears to have somehow scrambled the boot order of disks and was trying to look in the wrong location. Unfortunately, because this was the primary file server that provides your home directories, other systems (such as the Sunrays and the Coral servers) were left hanging until we resolved this issue. I believe that all Coral functionality has been resolved at this point .... and that Web servers, xReporter, and other elements have been restored. Starting at noon today, I will turn off any hardware interlocks for tools that have not been enabled in Coral. Thank you for your continued support and patience, John From mtang at stanford.edu Tue Oct 28 14:53:10 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 28 Oct 2008 14:53:10 -0700 Subject: Maskmaking Clinic - Today, 3 pm, CIS 101 Message-ID: <490789C6.9090600@stanford.edu> Greetings Labmembers -- Bill Martin is here today, ready to answer questions you may have about maskmaking and layout. It's happening right now, in CIS 101. Mary From mtang at stanford.edu Wed Oct 29 10:17:54 2008 From: mtang at stanford.edu (Mary Tang) Date: Wed, 29 Oct 2008 10:17:54 -0700 Subject: MEMS Packaging Presentation, Monday, 11/3/08, 11 am, CIS 101 Message-ID: <49089AC2.2060605@stanford.edu> */WaFER LEVEL Vacuum/Hermetic Packaging of MEMS Devices/**//* The purpose of this talk is to give an overview of MEMS packaging technologies developed at the Wireless Integrated Microsystems (WIMS) center at the University of Michigan. ePack, Inc. is a spin out of the University of Michigan---a short description of this company will be given at the end of the talk. ePack helps companies and researchers implement packaging technologies in order to encourage the commercialization of their MEMS devices. Two sets of packaging technologies will be discussed. I) Low temperature wafer-level packaging processes for vacuum/hermeticity will be presented including various solder bonding and localized heating technologies. Vacuum pressures lower than 10 mTorr were achieved with yields as high as high as 90% and 3 years of package reliability data. II) A harsh environment robust micromechanical technology (HERMIT) for vibration, shock and thermal isolation as well as vacuum packaging. This technology involves flip chipping MEMS devices onto another wafer which has specially designed vibration/shock/thermal isolation structures where another substrate is then used for batch encapsulation of the devices. This technology was a DARPA funded project was specially developed for high performance gyroscopes, but can be applied to any type of MEMS device. These technologies are a culmination of several bonding processes, feed-through technologies and various special materials. *Jay Mitchell* is president and co-founder of ePack Corp., a company providing packaging services and expertise to companies and researchers in order to bring MEMS devices to market. He finished his doctorate in January of 2008. In the fall of 2002, he began the Ph.D. program at the University of Michigan in mechanical engineering. In his research he developed a Au-Si eutectic wafer-level packaging process and a low temperature localized heating technique for the hermetic/vacuum packaging of MEMS and microsystems. In 2000 and 2001, he worked for Movaz Networks in the testing and design of micromirrors for telecommunications applications. He received his B.S. and M.S. from Case Western Reserve University in 1999 and 2000, respectively. His research interests include: MEMS, micromachining technologies, micromachined sensors, actuators, and micropackaging. -------------- next part -------------- An HTML attachment was scrubbed... URL: From rparsa at stanford.edu Wed Oct 29 12:23:46 2008 From: rparsa at stanford.edu (Roozbeh Parsa) Date: Wed, 29 Oct 2008 12:23:46 -0700 (PDT) Subject: E342 MEMS Seminar: Bright low-power displays using Digital Micro Shutter(tm) technology. Monday Nov. 3rd, 3-4pm in CISX-101 In-Reply-To: <325145036.2097951225308161917.JavaMail.root@zm06.stanford.edu> Message-ID: <60950128.2098171225308226666.JavaMail.root@zm06.stanford.edu> MEMS Seminar Announcement: ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ E342 SEMINAR (MEMS Lab2) Monday, Nov. 3rd, 2008 3:00 ? 4:00 pm CISX-101 Title: Bright low-power displays using Digital Micro Shutter(tm) technology. Speaker: Dr. Lodewyk Steyn Pixtronix Inc. Abstract: Mobile multimedia devices such as smart phones, portable media players and navigation (GPS) devices are playing ever increasing roles in our daily lives. Consumers are no longer just talking and texting, but finding their way, catching the news and watching the latest movies and videos. As we use these devices for more applications and for longer amounts of time, we need larger, brighter, better image quality displays that don?t drain the battery dry. Today?s LCD technologies struggle to support these requirements. The Pixtronix display technology makes a fundamental breakthrough in the power / performance trade off, delivering 145% NTSC color gamut (CIE 1976), 24-bit color, 1,000:1 contrast ratio and 170? view angles, all at roughly ? the power consumption of competing TFT-LCDs. At the heart of this technology is a MEMS-based Digital Micro Shutter? (DMS?) device that enables the low power, high speed light modulation in the Pixtronix displays. This talk will highlight some of the design innovations in the Pixtronix DMS technology, along with the manufacturing principles that have guided the design process. Bio.: Lodewyk Steyn is the Lead MEMS Engineer at Pixtronix Inc. and is responsible for the design and characterization of the proprietary Digital Micro Shutter? (DMS?) technology of Pixtronix. He was involved with the company since its inception in 2005 and assisted in the due diligence process that resulted in an initial financing round of $9 million. Born in South Africa, he obtained his B.Eng. degree in mechanical engineering from the University of Pretoria. He then relocated to Cambridge, MA to obtain his S.M. and Ph.D. in MEMS at the Massachusetts Institute of Technology. Dr. Steyn likes working with all aspects related to MEMS development, including the design, fabrication and reliability of MEMS devices, as well as the supporting engineering systems and processes required to transform MEMS from a benchtop technology into a product. When he?s not designing MEMS devices he can be found mountain biking, snowboarding or kite surfing. -------------- next part -------------- A non-text attachment was scrubbed... Name: Lodewyk Steyn.doc Type: application/msword Size: 83968 bytes Desc: not available URL: From huangzb at stanford.edu Thu Oct 30 00:00:14 2008 From: huangzb at stanford.edu (Zubin Huang) Date: Thu, 30 Oct 2008 00:00:14 -0700 (PDT) Subject: missing lab notebook In-Reply-To: <8ab79e460809181230x69b246d4y6265fcb5f3e5d0f6@mail.gmail.com> Message-ID: <2077676074.2239741225350014000.JavaMail.root@zm06.stanford.edu> Dear labmembers, My lab notebook is lost. It's a large notebook and has my name Zubin Huang and email huangzb at stanford.edu on it. Would you please email me if you know any information about where the notebook is? Thank you very much, Zubin From mtang at stanford.edu Thu Oct 30 13:48:03 2008 From: mtang at stanford.edu (Mary Tang) Date: Thu, 30 Oct 2008 13:48:03 -0700 Subject: "Cleantamination" Message-ID: <490A1D83.2060500@stanford.edu> Dear Labmembers -- As you know, the Cleanliness & Contamination working group has its first meeting last Friday. In the interest of better marketing, we've dubbed this the "Cleantamination" working group (thanks, J.) The meeting summary is now posted here: https://spf.stanford.edu/SNF/processes/cleantamination-group You may notice that this is a folder on the new labmember wiki. (Beta testers [and eventually, all SNF labmembers] can add content. For more info about the wiki, see http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3452:200810:okgbhkllhlmhjonlggmi) The next Cleantamination meeting is on Friday, November 7, in CIS 101. Working groups will update each other. We will try to assess the available resources for supporting Cleantamination efforts. All labmembers and PI's are welcome -- but be prepared to take on an assigned task! (Related, of course, to your process needs.) You SNF staff