From mtang at stanford.edu Mon Jun 1 09:41:16 2009 From: mtang at stanford.edu (Mary Tang) Date: Mon, 01 Jun 2009 09:41:16 -0700 Subject: Process Clinic, Today (Monday) 2-4 pm Message-ID: <4A2404AC.5040809@stanford.edu> Greetings Labmembers -- Process Clinic, Monday, June 1, 2 pm, in the cubicle area outside Maureen's office. Bring process questions, mask layouts, SpecMat requests. New labmembers are especially encouraged to come and review process flows and runsheets. Experienced people will be on hand for discussion. -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From kattsai at stanford.edu Mon Jun 1 13:17:45 2009 From: kattsai at stanford.edu (Katherine Tsai) Date: Mon, 1 Jun 2009 13:17:45 -0700 Subject: Reminder: MEMS & Neuroscience Seminar TODAY 4-5 PM, Allen 101X (Wesley Chang, UCSF) Message-ID: <1c62e49d0906011317r3bcbc734kdb9c0454a9496139@mail.gmail.com> Reminder: MEMS & Neuroscience Seminar TODAY 4-5 PM, Allen 101X Microdevice Technologies for Neuroscience Wesley Chang, PhD Postdoctoral Researcher Programs in Neuroscience and Bioengineering University of California, San Francisco Abstract: Given the broad efforts to develop MEMS technologies for serving biology, new clinical and research capabilities are becoming available in specialties such as neuroscience. In our own work, we have used novel, MEMS-based microsurgical tools to explore the possibility of repairing nerves by directly reconnecting individual axons, the slender projections from nerve cells that carry signals throughout the nervous system. This capability can only be developed with tools that can operate with microns-scale precision and perform numerous tasks within a confined volume and may provide an important alternative nerve repair strategy to conventional approaches based on stimulating regeneration, which have only seen limited successes. As we continue to develop MEMS-based nerve repair as a clinical application, we have also identified another essential use for microfabrication technology in support basic research in neuroscience. By employing thin film deposition and batch microfabrication methods, we have developed specialized cell culture substrates that can be mass-produced with reliable, high-resolution micropatterning to provide neuroscientists with well-organized neuron cultures that can be arranged into efficient arrays for high-throughput experimentation. While bioengineers have demonstrated numerous methods for micropatterning of cell culture over the years, our new method is user-friendly and can potentially permit widespread adoption of cell micropatterning among biologists and non-engineers. My talk will discuss both of these applications of microtechnology to neuroscience. Bio: Wesley Chang is a postdoctoral researcher in the laboratory of Dr. David Sretavan in the Departments of Ophthalmology and Physiology and Programs in Neuroscience and Bioengineering at UC San Francisco. He received both his Ph.D. and B.S. degrees in Mechanical Engineering at UC Berkeley. Dr. Chang is also a founder of Aperys LLC, a new company that develops research tools for neuroscience and biology. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: WChang.Seminar.June1.pdf Type: application/pdf Size: 587526 bytes Desc: not available URL: From shott at stanford.edu Tue Jun 2 08:30:05 2009 From: shott at stanford.edu (John Shott) Date: Tue, 02 Jun 2009 08:30:05 -0700 Subject: Remote Coral .... do not upgrade to JRE 1.6.0_14 Message-ID: <4A25457D.2030105@stanford.edu> SNF Lab Members: Notre Dame (they also run Coral ....) has reported that Remote Coral "breaks" after upgrading to JRE 1.6.0_14 (which also upgrades Java Web Start to version 1.6.0_14) because it us unable to properly load and initialize the Bouncy Castle encryption/decryption package that we use. As a result, I would suggest that you NOT upgrade your JRE (Java Runtime Environment) to JRE 1.6.0_14. I will be tracking this issue and will send out an announcement when Sun resolves this issue. Hopefully in release JRE 1.6.0_15. Thank you for your consideration, John From mtang at stanford.edu Tue Jun 2 08:57:18 2009 From: mtang at stanford.edu (Mary Tang) Date: Tue, 02 Jun 2009 08:57:18 -0700 Subject: Maskmaking Clinic, Wed. June 3, 3 pm Message-ID: <4A254BDE.5060606@stanford.edu> Hi all -- Bill Martin, representing Compugraphics and other mask suppliers, will be here on Wednesday, June 3, at 3 pm in Allen 101 (Linvill Room). If you have ANY questions about maskmaking for any of the tools at SNF, then this is the place to come. Bring your ideas, your sketches, and your layouts. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mpreiner at stanford.edu Tue Jun 2 09:42:04 2009 From: mpreiner at stanford.edu (Michael John Preiner) Date: Tue, 2 Jun 2009 09:42:04 -0700 (PDT) Subject: University PhD Dissertation Defense Michael J. Preiner In-Reply-To: Message-ID: <737295703.2598501243960924976.JavaMail.root@zm03.stanford.edu> Department of Applied Physics University PhD Dissertation Defense Electronic and Optical Spectroscopy of Molecular Junctions Michael John Preiner Research Advisor: Nicholas Melosh 3 June 2009 @1:30 p.m. (Refreshments served at 1:15 p.m.) Allen Building (Formerly CIS-X), Room 101 Abstract Electronic transport through molecules has been intensively studied in recent years, due to scientific interest in fundamental questions about charge transport and the technological promise of nanoscale circuitry. A wide range of range of experimental platforms have been developed to electronically probe both single molecules and molecular monolayers. However, it remains challenging to fabricate reliable electronic contacts to molecules, and the vast majority of molecular electronic architectures are not amenable to standard characterization techniques, such as optical spectroscopy. Thus the field of molecular electronics has been hampered with problems of reproducibility, and many fundamental questions about transport and switching behavior remain unanswered. In the work I will present, we have developed a new method for creating robust, large area junctions where the electronic transport is through a single monolayer of molecules. This method utilizes atomic layer deposition (ALD) to grow an ultrathin oxide layer on top of a molecular monolayer, which passivates defects and protects the molecules against subsequent processing. I will also show how this method can be be adapted to provide a mechanism for rapid imaging and analysis of single defects in molecular monolayers. I will then present results of spectroscopy of these molecular electronic junctions using optically excited hot electrons. Finally, I will discuss methods of coupling surface plasmons to these molecular junctions to greatly increase the light intensity within the molecular layer, which presents a major step towards in-situ optical spectroscopy of active molecular junctions. -- --++**==--++**==--++**==--++**==--++**==--++**==--++**== apgradstudents mailing list apgradstudents at lists.stanford.edu https://mailman.stanford.edu/mailman/listinfo/apgradstudents From rissman at stanford.edu Tue Jun 2 10:34:41 2009 From: rissman at stanford.edu (Paul Rissman) Date: Tue, 02 Jun 2009 10:34:41 -0700 Subject: Nano Facilities equipment survey Message-ID: <20090602173441.5C10E37DA2@smtp-roam.stanford.edu> On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of the Shared Nano-facilities Committee, please complement the data being gathered from a faculty survey by taking the survey found at: http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d This survey will indicate the most urgent needs for new shared tools. Stanford has made great progress on shared nano-facilities in the past year. Your inputs will help the committee decide which tools are most important for future grant opportunities. On the first page are five candidates for the next NSF Major Research Instrumentation grant competition. Five candidate tools (listed alphabetically): 1. Chemically assisted ion beam etcher (CAIBE) - Enables high precision dry etching of semiconductors (Si, III-V, II-VI), chalcogenide materials, magnetic materials and metal oxides using a combination of reactive gases and ion beam. Provides a controllable etch by giving independent control of ion energy, current density, and incident angle. 2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB allows imaging, etching and deposition of materials on length scales at 100 nm. Electron column enables non-destructive imaging of high resolution samples to achieve three-dimensional imaging with high-resolution SEM. 3. Electron microprobe - Provides quantitative chemical analysis of major and minor elements and qualitative analysis of trace elements in sample. The combination wavelength-dispersive and energy-dispersive spectrometers with backscattered and secondary electron imaging allows detection of elements from Beryllium through Uranium. 4. Plasma etcher - Modern r&d plasma etch tools to support etch of silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI, photoresist and other materials. This equipment would replace the ones installed in 1988 in SNF and will be better able to reproduce the fine structures fabricated in lithography. 5. Scanning electron microscope (SEM) (high resolution and/or environmental) - Will provide more capacity for high resolution scanning electron microscopy with resolution to 0.8 nm. The environmental SEM provides for the capability to work at lower vacuum for high-resolution imaging of insulating and non-solid materials. Highlights of progress on Stanford nanofacilities: Tools ordered: 1. workhorse/training TEM (installation underway) 2. aberration-corrected FEI Titan TEM (expected in 2010) 3. JEOL 6300 ebeam lithography system (expected in September, 2009) Proposals submitted: 1. NanoSIMS (submitted to NSF MRI competition in January, 2009) 2. nanofab tools (submitted to NSF through the NNIN in May, 2009) 3. Academic Research Infrastructure for facilities upgrades (no equipment) (in progress). The nanobuilding construction is proceeding rapidly. The new nanobuilding includes 9000 square feet of shared facilities. The design team is working hard to meet the sensitive specifications for the quiet environment necessary for many modern tools. Shared Nano-facilities Committee Chris Chidsey, Chemisty Curt Frank, Engineering Sam Gambhir, Radiology, BioX, and Molecular Imaging David Goldhaber-Gordon, Physics Paul McIntyre, Materials Science and Engineering Kam Moler, Applied Physics and Physics Jody Puglisi, Structural Biology Olav Solgaard, Electrical Engineering Jonathan Stebbins, Geological and Environmental Sciences Jelena Vuckovic, Electrical Engineering H.-S. Philip Wong, Electrical Engineering From mtang at stanford.edu Tue Jun 2 13:44:05 2009 From: mtang at stanford.edu (Mary Tang) Date: Tue, 02 Jun 2009 13:44:05 -0700 Subject: Learn about lab fires! Message-ID: <4A258F15.6090608@stanford.edu> Hi all -- Alison Pena, from the Stanford Fire Marshall's office, will be giving a one hour class on how to deal with laboratory fires. This will be held this Friday, June 5, at 1:30 pm, in Allen 101 (note the room change from any previous notes.) The training will take about one hour and consists of a brief presentation and video, followed by hands-on practice with a fire extinguisher on a controlled burn. It's fun -- and good to know in any lab environment. Preregistration is required, with preference given to active labmembers and building occupants. If interested, send me an email. Another session is scheduled for July. Stay tuned for announcements. Thanks for your attention! Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From bfeller at stanford.edu Wed Jun 3 08:37:19 2009 From: bfeller at stanford.edu (Bobby Feller) Date: Wed, 3 Jun 2009 08:37:19 -0700 Subject: capillary electrophoresis Message-ID: Hello, I would like to measure the mobility of some small proteins using capillary electrophoresis detected by UV absorbance. Does anyone know if there is equipment available for use either on or off campus? Any other suggestions are welcome. Thanks, Bob -------------- next part -------------- An HTML attachment was scrubbed... URL: From tdo at stanford.edu Wed Jun 3 11:09:36 2009 From: tdo at stanford.edu (Thomas O'Sullivan) Date: Wed, 03 Jun 2009 11:09:36 -0700 Subject: SNF Users Advisory Committee Message-ID: <4A26BC60.4080107@stanford.edu> Dear SNF labmembers, As you may have heard, a number of SNF users (academic and industrial) have been meeting regularly to provide input from the "user perspective" to SNF management regarding various issues surrounding the lab. These may include equipment purchase/repair, staffing, training programs, and others. The group meets once every 1-2 months, or as needed to discuss new issues. Are you interested in being part of this group? If so, please e-mail me by next Friday, June 12th. Our next meeting is scheduled for June 16th. Best regards, Tom -- Thomas D. O'Sullivan Ph.D. Candidate, Electrical Engineering Center for Integrated Systems Stanford University 420 Via Palou, CIS-X Room B113 Stanford, CA 94305-4075 o: (650)725-6970 c: (708)261-5383 f: (650)723-4659 http://snow.stanford.edu/~tdo/ From mtang at stanford.edu Wed Jun 3 11:54:35 2009 From: mtang at stanford.edu (Mary Tang) Date: Wed, 03 Jun 2009 11:54:35 -0700 Subject: Mask Clinic, today (Wed) 3 pm, Allen 101 Message-ID: <4A26C6EB.9020300@stanford.edu> Hi all -- Just a reminder that Bill Martin will be here this afternoon to discuss maskmaking with anyone interested. He can cover everything from the basics to checking your file before submission for maskmaking. He'll be in Allen (CIS) 101 at 3 pm. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From ligao at stanford.edu Wed Jun 3 23:19:07 2009 From: ligao at stanford.edu (Li Gao) Date: Wed, 3 Jun 2009 23:19:07 -0700 (PDT) Subject: PhD Dissertation Defense - Li Gao @ 2:00pm June 10th In-Reply-To: <1875016545.842181244096308937.JavaMail.root@zm07.stanford.edu> Message-ID: <1289368903.842251244096347183.JavaMail.root@zm07.stanford.edu> University PhD Dissertation Defense Spin Polarized Current Phenomena in Magnetic Tunnel Junctions Li Gao Department of Applied Physics Research Advisors: Professor James Harris and Dr. Stuart Parkin 10 June 2009 @ 2:00p.m. in Packard Building, Room 101 (Refreshments @ 1:40p.m.) Abstract Spin polarized current is of significant importance both scientifically and technologically. Recent advances in film growth and device fabrication in spintronics make possible an entirely new class of spin-based devices. An indispensable element in all these devices is the magnetic tunnel junction (MTJ) which has two ferromagnetic electrodes separated by an insulator barrier of atomic scale. When electrons flow through an MTJ, they become spin-polarized by the first magnetic electrode. Thereafter, the interplay between the spin-polarized current and the second magnetic layer manifests itself via two phenomena: i.) Tunneling magnetoresistance (TMR) effect. The relative alignment of the electrode moments determines the resistance and its change. This TMR effect is largely determined by the spin-polarized density states of the electrodes, interface states, tunneling matrix, and so on. However, despite extensive experimental and theoretical efforts, many aspects of TMR remain poorly understood. In my research, it is shown that thin CoFe alloy can be made amorphous by sandwiching the usually used crystalline CoFe electrode between two amorphous layers. Incorporating amorphous Co70Fe30 with Al2O3 to form MTJs, both the TMR and the tunneling spin polarization are significantly enhanced when the alloy is amorphous. The tunneling anisotropic magnetoresistance effect in both MgO and Al2O3 based MTJs was also investigated. ii.) Spin-transfer torque (STT) effect. The spin-polarized current exerts a torque on the local moments and can thereby induce steady-state precessional excitation modes or complete switching of a nanomagnet. This effect has mostly been studied, to date, in metallic structures where the spin-valve magnetoresistance is small so that the output power is limited. However, the giant TMR in MgO base MTJs, which also have much higher resistance than spin-valves, can give rise to much higher rf power outputs. It is also found that the spectrum is very sensitive to small variations in device structures, even in those devices which exhibit similarly high TMR (~120%) and have similar resistance-area products (~4-10 Wm m2). From zhangy at stanford.edu Thu Jun 4 11:20:40 2009 From: zhangy at stanford.edu (Yuan Zhang) Date: Thu, 4 Jun 2009 11:20:40 -0700 Subject: PhD Orals - Yuan Zhang, June 10, 2009, 9am, Packard 101 Message-ID: <20090604182040.23CDA17840B@smtp1.stanford.edu> Nanoscale Phase Change Memory: Device Structure and Materials Characterization PhD Oral Examination Speaker: Yuan Zhang, Department of Electrical Engineering, Stanford University PhD Advisor: Prof. H.-S. Philip Wong Time: 9am (refreshments served at 8:45am) Date: Wednesday, June 10, 2009 Location: Packard 101 Abstract: Modern digital system requires the capability of storing and retrieving large amounts of information at very high speed. Non-volatile solid state memories retains information when the power is turned off and is now the mainstream data storage device for many applications including personal electronics such as iPOD, mobile phones, and netbooks. The market for non-volatile memory (NVM) technology has grown substantially in recent years. However, Flash memory, the dominant NVM technology, is facing fundamental scaling challenges. In view of this, research in various new memory technologies have been explored and accelerated. Among these exploratory memory technologies, phase change memory (PCM) is one of the most promising candidates, given its simple structure, good scalability, high speed, and long endurance. This talk consists of two parts. In the first part, germanium nanowire diode was implemented as selection device for PCM array. Unidirectional programming and reading for PCM cell requires a selection device in a memory array structure to enable large array sizes. Having a diode selection device can not only reduce the read disturbance and leakage power, but also have the potential to further increase the array density, by three-dimensional stacking of cross-point memory layers. Germanium nanowire pn junction diode is a good candidate for selection device because it has good scalability, requires low processing temperature and has high conductivity. We demonstrated a phase change memory cell structure utilizing in-situ doped crystalline germanium nanowire diode integrated with a phase change memory cell. The vertical nanowire diode served as the bottom electrode and the memory cell selection device. Electrical measurement showed low reset current and rectifying programming behavior. This method provides a possible path toward high-density, 3D cross-point memory arrays. In the second part of the talk, we addressed the scalability for both phase change materials and phase change memory devices. Phase transition properties of commonly used phase change materials for both thin blanket films and nanodot samples were studied using x-ray diffraction, and size dependence of the phase change properties was observed. We employed self-assembly diblock copolymer patterning to fabricate sub-20nm phase change nanodots. This diblock copolymer patterning technique was additionally utilized to fabricate devices with small contact areas to lower the reset programming current. Reduced reset current was achieved compared to a conventional structure. The device can be further scaled by patterning a single self-assembled contact hole in each cell to demonstrate device scalability below 20 nm. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- An embedded and charset-unspecified text was scrubbed... Name: ATT00043.txt URL: From candacec at stanford.edu Fri Jun 5 08:36:37 2009 From: candacec at stanford.edu (Candace Chan) Date: Fri, 05 Jun 2009 08:36:37 -0700 Subject: Ph.D defense Candace K. Chan, Monday June 8 @ 2pm, Braun Lec In-Reply-To: <4A21B972.2030101@stanford.edu> References: <4A21B972.2030101@stanford.edu> Message-ID: <4A293B85.5020701@stanford.edu> Reminder - Ph.D defense on Monday > *One-dimensional nanostructured materials for Li-ion battery and > supercapacitor electrodes* > > Candace K. Chan (Dept. of Chemistry) > Adviser: Yi Cui (Dept. of Materials Science & Engineering) > > Monday, June 8 @ 2 pm (Refreshments served at 1:45 pm) > Braun Lecture Hall (Mudd Chemistry Building) > > Abstract > > The need for improved electrochemical storage devices has necessitated > research on new and advanced electrode materials. One-dimensional > nanomaterials such as nanowires, nanotubes, and nanoribbons, can > provide a unique opportunity to engineer electrochemical devices to > have improved electronic and ionic conductivity as well as > electrochemical and structural transformations. Several properties of > nanomaterials, including 1) facile strain relaxation and phase > transformation, 2) good ionic diffusion, and 3) good electronic > conduction are important characteristics that allow for improvements > in performance over bulk materials. Several examples of how > nanomaterials are being used to improve problems in energy storage > will be given, with discussion on fundamental and applied studies at > the single nanowire and ensemble level all the way up to the > nanocomposite level. > > A study on the phase transformations in V2O5 nanoribbons during > reaction with lithium will be presented, with implications for Li-ion > cathodes. Transformation of the V2O5 nanoribbons into the fully > lithiated ?-Li3V2O5 phase was found to depend not only on the width > but also the thickness of the nanoribbons. For the first time, > complete delithiation of ?-Li3V2O5 back to the single-crystalline, > pristine V2O5 nanoribbon was observed, indicating a 30% higher energy > density. > > For Li-ion battery anodes, the use of Si and Ge nanowires (NWs) as > high capacity replacements for graphite will be discussed. By using a > SiNW electrode, a 10X higher specific capacity was achieved. Problems > plaguing bulk Si, such as pulverization and poor charge storage > retention, were not observed in the SiNWs due to the NWs having > improved accommodation of strain and volume expansion. > > Finally, an entirely printable supercapacitor device will be presented > based on high surface area carbons and a flexible, printable silver > nanowire-based current collector. These devices demonstrate how > nanomaterials can be integrated into a roll-to-roll manufacturing > process while still displaying good performance. > > > > > > > -- > Candace K. Chan > Ph.D. Student, Department of Chemistry > Stanford University > McCullough Building Room 209 > 476 Lomita Mall > Stanford, CA 94305 -- Candace K. Chan Ph.D. Student, Department of Chemistry Stanford University McCullough Building Room 209 476 Lomita Mall Stanford, CA 94305 -------------- next part -------------- An HTML attachment was scrubbed... URL: From nppatil at stanford.edu Fri Jun 5 09:02:41 2009 From: nppatil at stanford.edu (Nishant Patil) Date: Fri, 5 Jun 2009 09:02:41 -0700 Subject: FW: PhD Orals - Nishant Patil, June 8, 2009, 3:30 pm, Packard 101 Message-ID: <20090605160239.CB095170531@smtp2.stanford.edu> Carbon Nanotube Digital VLSI Circuits Nishant Patil Advisor: Subhasish Mitra Department of Electrical Engineering Stanford University Time: 3:30 pm (refreshments served at 3:15 pm) Date: Monday, June 8, 2009 Location: Packard 101 Abstract Carbon Nanotube Field Effect Transistors (CNFETs), consisting of semiconducting single walled Carbon Nanotubes (CNTs), have several promising applications such as extensions to silicon VLSI and large area electronics. While there has been significant progress at a single-device level, a major gap exists between such results and their transformation into VLSI CNFET technologies. Major CNFET technology challenges include mis-positioned CNTs, metallic CNTs, and wafer-scale integration. This work presents design and processing techniques to overcome these challenges. Experimental results demonstrate the effectiveness of the presented techniques. Mis-positioned CNTs can result in incorrect logic functionality of CNFET circuits. A new layout design technique produces CNFET circuits for arbitrary logic functions that are immune to a large number of mis-positioned CNTs. This technique is significantly more efficient compared to traditional defect- and fault-tolerance techniques. Furthermore, it is VLSI-compatible and does not require changes to existing VLSI design and manufacturing flows. A CNT can be semiconducting or metallic depending upon the arrangement of carbon atoms. Typical CNT synthesis techniques yield ~33% metallic CNTs. Metallic CNTs create source-drain shorts in CNFETs resulting in excessive leakage (Ion/Ioff < 5) and highly degraded noise margins. A new technique, VLSI-compatible Metallic-CNT Removal (VMR), overcomes challenges posed by metallic CNTs by combining layout design with CNFET processing. VMR produces CNFET circuits with Ion/Ioff in the range of 10^3-10^5, and overcomes the limitations of existing metallic-CNT removal approaches. The above techniques are demonstrated for complex logic structures using wafer-scale growth and transfer of aligned CNTs. Such an integrated approach enables experimental demonstration of cascaded CNFET logic circuits. -------------- next part -------------- An HTML attachment was scrubbed... URL: From shibingw at stanford.edu Fri Jun 5 10:52:59 2009 From: shibingw at stanford.edu (Shibing Wang) Date: Fri, 05 Jun 2009 10:52:59 -0700 Subject: micron size particles Message-ID: <4A295B7B.2060001@stanford.edu> Dear all, I know this is a bit out of date, as we are in the nano-age, but does anybody use micron size (5 um) regular shape particles of Au, Pt, Re, SiO2, or NaCl, or any other compounds in your research? Our group try to study the deformation of these materials under high pressure in diamond anvil cells using X-ray Microscopy in SSRL. A regular shape like cube or sphere around 5 cubic-micron would be ideal for the diamond anvil cell experiment. Thank you very much, Shibing Wang From mtang at stanford.edu Fri Jun 5 12:35:19 2009 From: mtang at stanford.edu (Mary Tang) Date: Fri, 05 Jun 2009 12:35:19 -0700 Subject: Fire Extinguisher Training, TODAY, at 1:30 pm Message-ID: <4A297377.5080001@stanford.edu> Hi all -- There's still room in the fire extinguisher training class today (Friday). We meet at 1:30 pm in Allen/CIS 101. Training will be about one hour and everyone gets to set off a real fire exinguisher on a real fire. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From shott at stanford.edu Sun Jun 7 11:25:04 2009 From: shott at stanford.edu (John Shott) Date: Sun, 07 Jun 2009 11:25:04 -0700 Subject: Limited DI use today .... Message-ID: <4A2C0600.6030702@stanford.edu> SNF Lab Members: Last night a fitting in the DI system came loose (in wbmiscres) and resulted in loss of a large amount of DI water in the storage tank so that we have a "Low Level" warning in that tank. While the DI system is still usable and fully functional today, I encourage you to make sure that you use no more DI water than needed and make sure that you don't accidentally leave any goosenecks on. This will allow the storage tank to recover and refill so that we can start with a full tank on Monday morning. Thanks for your continued support, John From mtang at stanford.edu Sun Jun 7 18:53:16 2009 From: mtang at stanford.edu (Mary Tang) Date: Sun, 07 Jun 2009 18:53:16 -0700 Subject: [POSSIBLE VIRUS:###] [Fwd: ME510 Applied Electrochemistry at Micro- and Nanoscale with Focuse on Energy Storage] Message-ID: <28978_1244425993_4A2C6F09_28978_384600_1_4A2C6F0C.9060200@stanford.edu> -------------- next part -------------- An embedded message was scrubbed... From: "Rainer Fasching" Subject: ME510 Applied Electrochemistry at Micro- and Nanoscale with Focuse on Energy Storage Date: Sun, 7 Jun 2009 14:03:20 -0700 Size: 10397 URL: From nppatil at stanford.edu Mon Jun 8 09:16:23 2009 From: nppatil at stanford.edu (Nishant Patil) Date: Mon, 8 Jun 2009 09:16:23 -0700 Subject: PhD Orals - Nishant Patil, June 8, 2009, 3:30 pm, Packard 101 Message-ID: <20090608161620.E13A2C79D@smtp4.stanford.edu> Reminder - Ph.D. Orals Carbon Nanotube Digital VLSI Circuits Nishant Patil Advisor: Subhasish Mitra Department of Electrical Engineering Stanford University Time: 3:30 pm (refreshments served at 3:15 pm) Date: Monday, June 8, 2009 Location: Packard 101 Abstract Carbon Nanotube Field Effect Transistors (CNFETs), consisting of semiconducting single walled Carbon Nanotubes (CNTs), have several promising applications such as extensions to silicon VLSI and large area electronics. While there has been significant progress at a single-device level, a major gap exists between such results and their transformation into VLSI CNFET technologies. Major CNFET technology challenges include mis-positioned CNTs, metallic CNTs, and wafer-scale integration. This work presents design and processing techniques to overcome these challenges. Experimental results demonstrate the effectiveness of the presented techniques. Mis-positioned CNTs can result in incorrect logic functionality of CNFET circuits. A new layout design technique produces CNFET circuits for arbitrary logic functions that are immune to a large number of mis-positioned CNTs. This technique is significantly more efficient compared to traditional defect- and fault-tolerance techniques. Furthermore, it is VLSI-compatible and does not require changes to existing VLSI design and manufacturing flows. A CNT can be semiconducting or metallic depending upon the arrangement of carbon atoms. Typical CNT synthesis techniques yield ~33% metallic CNTs. Metallic CNTs create source-drain shorts in CNFETs resulting in excessive leakage (Ion/Ioff < 5) and highly degraded noise margins. A new technique, VLSI-compatible Metallic-CNT Removal (VMR), overcomes challenges posed by metallic CNTs by combining layout design with CNFET processing. VMR produces CNFET circuits with Ion/Ioff in the range of 10^3-10^5, and overcomes the limitations of existing metallic-CNT removal approaches. The above techniques are demonstrated for complex logic structures using wafer-scale growth and transfer of aligned CNTs. Such an integrated approach enables experimental demonstration of cascaded CNFET logic circuits. -------------- next part -------------- An HTML attachment was scrubbed... URL: From rissman at stanford.edu Tue Jun 9 11:22:47 2009 From: rissman at stanford.edu (Paul Rissman) Date: Tue, 09 Jun 2009 11:22:47 -0700 Subject: Nano Facilities equipment survey Message-ID: <20090609182249.E6CD437D82@smtp-roam.stanford.edu> This is a reminder that if you haven't had a few minutes to take this survey, please join the many people who have done so already. The survey will be available until Friday, 6/26. ------------------------------------------------------------------------------------------------------------------------------------------------------------- On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of the Shared Nano-facilities Committee, please complement the data being gathered from a faculty survey by taking the survey found at: http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d This survey will indicate the most urgent needs for new shared tools. Stanford has made great progress on shared nano-facilities in the past year. Your inputs will help the committee decide which tools are most important for future grant opportunities. On the first page are five candidates for the next NSF Major Research Instrumentation grant competition. Five candidate tools (listed alphabetically): 1. Chemically assisted ion beam etcher (CAIBE) - Enables high precision dry etching of semiconductors (Si, III-V, II-VI), chalcogenide materials, magnetic materials and metal oxides using a combination of reactive gases and ion beam. Provides a controllable etch by giving independent control of ion energy, current density, and incident angle. 2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB allows imaging, etching and deposition of materials on length scales at 100 nm. Electron column enables non-destructive imaging of high resolution samples to achieve three-dimensional imaging with high-resolution SEM. 3. Electron microprobe - Provides quantitative chemical analysis of major and minor elements and qualitative analysis of trace elements in sample. The combination wavelength-dispersive and energy-dispersive spectrometers with backscattered and secondary electron imaging allows detection of elements from Beryllium through Uranium. 4. Plasma etcher - Modern r&d plasma etch tools to support etch of silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI, photoresist and other materials. This equipment would replace the ones installed in 1988 in SNF and will be better able to reproduce the fine structures fabricated in lithography. 5. Scanning electron microscope (SEM) (high resolution and/or environmental) - Will provide more capacity for high resolution scanning electron microscopy with resolution to 0.8 nm. The environmental SEM provides for the capability to work at lower vacuum for high-resolution imaging of insulating and non-solid materials. Highlights of progress on Stanford nanofacilities: Tools ordered: 1. workhorse/training TEM (installation underway) 2. aberration-corrected FEI Titan TEM (expected in 2010) 3. JEOL 6300 ebeam lithography system (expected in September, 2009) Proposals submitted: 1. NanoSIMS (submitted to NSF MRI competition in January, 2009) 2. nanofab tools (submitted to NSF through the NNIN in May, 2009) 3. Academic Research Infrastructure for facilities upgrades (no equipment) (in progress). The nanobuilding construction is proceeding rapidly. The new nanobuilding includes 9000 square feet of shared facilities. The design team is working hard to meet the sensitive specifications for the quiet environment necessary for many modern tools. Shared Nano-facilities Committee Chris Chidsey, Chemisty Curt Frank, Engineering Sam Gambhir, Radiology, BioX, and Molecular Imaging David Goldhaber-Gordon, Physics Paul McIntyre, Materials Science and Engineering Kam Moler, Applied Physics and Physics Jody Puglisi, Structural Biology Olav Solgaard, Electrical Engineering Jonathan Stebbins, Geological and Environmental Sciences Jelena Vuckovic, Electrical Engineering H.-S. Philip Wong, Electrical Engineering From ligao at stanford.edu Tue Jun 9 11:28:11 2009 From: ligao at stanford.edu (Li Gao) Date: Tue, 9 Jun 2009 11:28:11 -0700 (PDT) Subject: Reminder: Tomorrow PhD Dissertation Defense - Li Gao @ 2:00pm in Packard Building, Room 101 In-Reply-To: <1289368903.842251244096347183.JavaMail.root@zm07.stanford.edu> Message-ID: <806244516.1667191244572091702.JavaMail.root@zm07.stanford.edu> University PhD Dissertation Defense Spin Polarized Current Phenomena in Magnetic Tunnel Junctions Li Gao Department of Applied Physics Research Advisors: Professor James Harris and Dr. Stuart Parkin 10 June 2009 @ 2:00p.m. in Packard Building, Room 101 (Refreshments @ 1:40p.m.) Abstract Spin polarized current is of significant importance both scientifically and technologically. Recent advances in film growth and device fabrication in spintronics make possible an entirely new class of spin-based devices. An indispensable element in all these devices is the magnetic tunnel junction (MTJ) which has two ferromagnetic electrodes separated by an insulator barrier of atomic scale. When electrons flow through an MTJ, they become spin-polarized by the first magnetic electrode. Thereafter, the interplay between the spin-polarized current and the second magnetic layer manifests itself via two phenomena: i.) Tunneling magnetoresistance (TMR) effect. The relative alignment of the electrode moments determines the resistance and its change. This TMR effect is largely determined by the spin-polarized density states of the electrodes, interface states, tunneling matrix, and so on. However, despite extensive experimental and theoretical efforts, many aspects of TMR remain poorly understood. In my research, it is shown that thin CoFe alloy can be made amorphous by sandwiching the usually used crystalline CoFe electrode between two amorphous layers. Incorporating amorphous Co70Fe30 with Al2O3 to form MTJs, both the TMR and the tunneling spin polarization are significantly enhanced when the alloy is amorphous. The tunneling anisotropic magnetoresistance effect in both MgO and Al2O3 based MTJs was also investigated. ii.) Spin-transfer torque (STT) effect. The spin-polarized current exerts a torque on the local moments and can thereby induce steady-state precessional excitation modes or complete switching of a nanomagnet. This effect has mostly been studied, to date, in metallic structures where the spin-valve magnetoresistance is small so that the output power is limited. However, the giant TMR in MgO base MTJs, which also have much higher resistance than spin-valves, can give rise to much higher rf power outputs. It is also found that the spectrum is very sensitive to small variations in device structures, even in those devices which exhibit similarly high TMR (~120%) and have similar resistance-area products (~4-10 Wm m2). From tura at ucla.edu Tue Jun 9 12:30:14 2009 From: tura at ucla.edu (Ahmet Tura) Date: Tue, 09 Jun 2009 12:30:14 -0700 Subject: 2-inch wafer boats (gladys') Message-ID: <20090609123014.16q3ynpytoo84k44@mail.ucla.edu> There were boats for 2-inch wafers for wbdiff, wbnonmetal, wbmetal in the black cabinet in the back alley. I used them yesterday, but this morning they were gone. They have clean-room wipes on them that say "Gladys 2-inch wafer boats". I use them very frequently so I would really appreciate if they reappear. Sorry for emailing everybody, but I have no idea who might have taken them so I had to spam everyone.. Thanks, -- Ahmet Tura From zhangy at stanford.edu Tue Jun 9 13:04:27 2009 From: zhangy at stanford.edu (Yuan Zhang) Date: Tue, 9 Jun 2009 13:04:27 -0700 Subject: Reminder: PhD Orals - Yuan Zhang, June 10, 2009, 9am, Packard 101 In-Reply-To: <6.2.5.6.2.20090604112750.0501a720@stanford.edu> Message-ID: <20090609200424.8BAB81A06C8@smtp3.stanford.edu> Nanoscale Phase Change Memory: Device Structure and Materials Characterization PhD Oral Examination Speaker: Yuan Zhang, Department of Electrical Engineering, Stanford University PhD Advisor: Prof. H.-S. Philip Wong Time: 9am (refreshments served at 8:45am) Date: Wednesday, June 10, 2009 Location: Packard 101 Abstract: Modern digital system requires the capability of storing and retrieving large amounts of information at very high speed. Non-volatile solid state memories retains information when the power is turned off and is now the mainstream data storage device for many applications including personal electronics such as iPOD, mobile phones, and netbooks. The market for non-volatile memory (NVM) technology has grown substantially in recent years. However, Flash memory, the dominant NVM technology, is facing fundamental scaling challenges. In view of this, research in various new memory technologies have been explored and accelerated. Among these exploratory memory technologies, phase change memory (PCM) is one of the most promising candidates, given its simple structure, good scalability, high speed, and long endurance. This talk consists of two parts. In the first part, germanium nanowire diode was implemented as selection device for PCM array. Unidirectional programming and reading for PCM cell requires a selection device in a memory array structure to enable large array sizes. Having a diode selection device can not only reduce the read disturbance and leakage power, but also have the potential to further increase the array density, by three-dimensional stacking of cross-point memory layers. Germanium nanowire pn junction diode is a good candidate for selection device because it has good scalability, requires low processing temperature and has high conductivity. We demonstrated a phase change memory cell structure utilizing in-situ doped crystalline germanium nanowire diode integrated with a phase change memory cell. The vertical nanowire diode served as the bottom electrode and the memory cell selection device. Electrical measurement showed low reset current and rectifying programming behavior. This method provides a possible path toward high-density, 3D cross-point memory arrays. In the second part of the talk, we addressed the scalability for both phase change materials and phase change memory devices. Phase transition properties of commonly used phase change materials for both thin blanket films and nanodot samples were studied using x-ray diffraction, and size dependence of the phase change properties was observed. We employed self-assembly diblock copolymer patterning to fabricate sub-20nm phase change nanodots. This diblock copolymer patterning technique was additionally utilized to fabricate devices with small contact areas to lower the reset programming current. Reduced reset current was achieved compared to a conventional structure. The device can be further scaled by patterning a single self-assembled contact hole in each cell to demonstrate device scalability below 20 nm. -------------- next part -------------- An HTML attachment was scrubbed... URL: From edmyers at stanford.edu Thu Jun 11 12:50:16 2009 From: edmyers at stanford.edu (Ed Myers) Date: Thu, 11 Jun 2009 12:50:16 -0700 Subject: Critically Low Chemical Inventory Message-ID: <6.2.5.6.2.20090611111109.0336ffb8@stanford.edu> All, This spring we have had extreme difficulty in receiving delivery on a number of critical chemicals. Many of you may have seen the staff mixing 50:1 HF. We are forced in to this approach because of HF mixing equipment failures at the manufacture. This is close to being resolved, but we still have a week or so to go. What you may not know is the problems we are having with our supplier of photolithography chemicals. The critical chemicals where we are in a shortage situation include the MF-26A the 3612 developer, EC13 the edge bead removal and PRX127. As a result we will be limiting the availability of these chemicals. Currently we only have inventory of MF-26A to support two weeks of usage on the coat tracks (this does not include any manual develop usage). The email we received yesterday from the chemical supplier gave a 4 week delivery date. This leaves us with a 2 week short fall. Please note, these chemicals were ordered in time. It is the supplier who is not able to support their normal delivery schedule. As a result we are immediately implementing MF-26A restrictions which includes the removal from the area of the deep beakers used for manual develop. These beakers are being replaced by short glassware until we receive our delivery. Often we see huge amounts of developer being used for single or very few wafers. The SVG developer tracks use ~50 ml per wafer for development (that is 50ml total for both develop steps and not each step). There is no need to pour two or three inches of developer into a beaker when manual developing. Also, we will only leave one bottle of MF-26A in the fab for manual develop. Please use it sparingly. What you can do regarding MF-26A conservation 1) Develop your wafers on the SVG track. You will use thousands times more developer if you used a beaker. 2) Use the correct sized beaker for your sample. Don't develop pieces in a 4" beaker. 3) Gently remind your lab members their excessive use of developer may result in no one being to develop their wafers in a couple of weeks. Remember each bottle which is used for manual develop cost about 1 day of track usage and as a result we will run out a day earlier. We will also see a short fall with ED-13. This chemical is only used in the coat tracks, so changes made to control it's usage will not be obvious to the lab member community. Finally, we are also struggling with PRX127. Our inventory and the delivery date will put us in a close situation. If we follow normal usage trends, the scheduled delivery will arrive just as we will be running out. If we see a spike in usage, like we did last weekend, or a delay in the delivery date we could also run out of this chemical. Especially during this time (and we would hope at all times) please adhere to the chemical change out schedule. It is important that we do not drain and replenish the pots before they have expired. Most of the delivery problems we are facing has resulted from the consolidation of the older product lines and the lower demand for some of these chemicals. The chemical supplier request long range forecasts from it's customers. Depending on the customers forecast the company schedules their manufacturing runs. As a result we are all placed on a balancing act tied to their manufacturing facility. Any problems the manufacturing line has, or any poor forecasting has a huge impact on the end of line customers such as SNF. Thank you for your understanding and most importantly your chemical conservation during this shortfall. Regards, Your SNF Staff From ahazeghi at stanford.edu Sun Jun 14 19:05:44 2009 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Sun, 14 Jun 2009 19:05:44 -0700 Subject: Delamination problem with Pd Message-ID: <000801c9ed5d$cae49810$60adc830$@edu> I am using Pd in my process (~360A evaporated with Innotec) for S/D fingers and probing pads, I can get a clean lift off however probing the pads almost destroys them as they seem to come off very easily even with a tiny scratch from the probe tips. Due to the nature of these devices I have to use Pd directly on the surface. I would appreciate if anyone has a solution for this issue. Thanks, Arash ---------------------------------------------------------------------------- ------ Arash Hazeghi PhD Candidate Stanford Center for Integrated Systems CIS-X 300, 420 Via Palou Mall, Stanford, CA 94305 phone: +1-650-725-0418 web: http://www.stanford.edu/~ahazeghi -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon Jun 15 08:20:45 2009 From: mtang at stanford.edu (Mary Tang) Date: Mon, 15 Jun 2009 08:20:45 -0700 Subject: Process Clinic Today (Monday) 2-4 pm Message-ID: <4A3666CD.5050000@stanford.edu> Greetings Labmembers -- Process Clinic today, Monday, June 15, 2 pm, in the cubicle area outside Maureen's office. Bring process questions, mask layouts, SpecMat requests. New labmembers are especially encouraged to come and for process flow and runsheet reviews. Experienced people will be on hand for discussion. Keith Best from ASML will also be here offering processing advice on just about everything, including the ASML. Your SNF staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mcvittie at cis.Stanford.EDU Mon Jun 15 14:16:15 2009 From: mcvittie at cis.Stanford.EDU (Jim McVittie) Date: Mon, 15 Jun 2009 14:16:15 -0700 (PDT) Subject: Free Bio-Nano-MEMS Technology Talks -- TFUG Meeting June 17; San Jose Message-ID: NCCAVS THIN FILM USER GROUP (www.avsusergroups.org ) FREE ADMISSION-No need to register, just show up!! TOPIC: Bio-Nano-MEMS Technology Meeting Date: June 17, 2009 EARLY START TIME: 1:30 - 5:00 pm Location: SEMI Global Headquarters Seminar Rooms 1 & 2 3081 Zanker Road San Jose, CA 95134 **Park in front or behind the vacant building across from SEMI** Co-Chairs: Roc Blumenthal, roc at rocsolidsoln.com Hok-kin Choi, Hokkin.choi at intel.com Connie Wang, connie_wang at amat.com Agenda: 1:30 - 1:35 Welcome/Announcements 1:35-2:05 "Development of Nano Biosensors for Diverse Applications" Dr. M. Meyyappan, NASA Ames Research Center, m.meyyappan at nasa.gov Abstract: Biosensors are needed in biomedical, water quality monitoring, agricultural and food quality testing, environmental monitoring, pathogen detection, general lab-on-a-chip needs and related applications. Detection of gases or vapors may rely on intelligent pattern recognition approach using a sensor array. But biosensors in a fluidic environment should preferably work using a "lock and key" approach wherein a probe molecule, selected a priori for the target of interest, is attached to an electrode or a device. Upon hybridization, either electrical or electrochemical signal can be measured, though most biosensors to date have relied on optical signal transduction. Electronic approach is more amenable to wafer scale fabrication as well as for integration with microfluidics for sample delivery. This brief talk outlines general requirements and presents some examples from our lab. The author acknowledges contributions from Hua Chen, Prabhu Arumugam, Jun Li, Y. Lu and Jing Li. 2:05 - 2:35 "Biomimeticaly Engineered Nanomedical Systems", Demir Akin, DVM, Ph.D, Deputy Director, Center for Cancer Nanotechnology Excellence focused on Therapy Response (CCNE-TR), School of Medicine, Department of Radiology, Stanford University, Demir.Akin at stanford.edu Abstract: Dramatic changes occur in the material properties and unexpected behaviors emerge as the material dimensions approach nanometer size. Biological systems capitalize on these nanophenomena in the forms of naturally evolved life sustaining functions. Towards the realization of personalized medicine, nanotechnology promise amazing possibilities which can all be collectively named under Nanomedicine. In this talk, I will give some examples of these natural nanodevices and also some of our own man-made biomimetic micro to nanoscale nanomedical devices. As a highly cohesive, interdisciplinary group of researchers, we have been designing, fabricating and studying diagnostic and therapeutic applications of various BioMEMS and BioNEMS-based devices ranging from silicon-based nanocantilevers, nanopores to nanowires as biosensors, active biomimetic nanodevices that utilize phi29 DNA packaging machinery for novel biomolecule sensing, capture and sorting functions to novel multifunctional nanodevices utilizing microbal robotics (microbotics) for targeted delivery and controlled drug release. Systems level integration of a mixture of these modalities, as Lab-on-a Chip devices, will also be presented as well as some nanomaterials biocompatibility studies. Brief but specific examples from each of these Nanomedicine domains will be given in the hopes that this talk will lead us to explore future collaborative "nano-possibilities" under the umbrella of Stanford's Center for Cancer Nanotechnology Excellence. 2:35-3:05 "An Investigation into the "World-to-chip" Interface", Sammy S. Datwani, Ph.D, Labcyte Inc., datwani at gmail.com Abstract: Two arenas of the "World-to-chip" interface will be discussed with relevant applications to nanoscale biotechnology. In the first half of this presentation - a novel micro-fluidic interconnector system will be discussed that is capable of holding high pressure (up to 7,000 psi) for a fully integrated chip based micro-fluidic high pressure liquid chromatography (HPLC) system. Technical aspects of the interconnect system, design, materials and utility will be discussed. In the second half of this presentation - a newly developed method, acoustic droplet ejection (ADE) for precisely generating nanoliter and picoliter volume droplets using focused acoustic energy at, or near, a liquid surface will be discussed. Since both micro-fluidic devices and micro-plate wells are compatible with this method - a wide range of experimental results will be shown to elucidate how ADE enables precise dispensing of small fluid volumes into the "micro and nano" world to aid in drug discovery and improve experimental results in biochemistry. 3:05-3:30 Break 3:30-4:00 "Biophysics: Looking forward from the past", S. Jeffrey Rosner, Ph.D, Agilent Technologies, jeff_rosner at agilent.com Abstract: The field of biophysics has been responsible for a large number of the biology-related Nobel prizes in the 20th century, yet the promise of quantitative, deterministic measurements in the biological sciences is only slowly beginning to take hold. This talk will discuss some of the reasons behind this and show examples of some of the most exciting current research in biological measurements deriving from the physics community. 4:00-4:30 "Transdermal delivery of macromolecules using Macroflux(r) technology - system requirements with emphasis on microfabrication, surface chemical properties, drug-specific requirements, and the interaction with human skin and systemic biology", Russell Ford, Ph.D, Zosano Pharma, RFord at zosanopharma.com Abstract: Transdermal drug delivery offers unique advantages compared to alternate routes such as oral, parenteral, and pulmonary. Transdermal systems have traditionally been limited to pharmaceuticals with molecular weight of 500 Daltons or less. Much focus has been centered on microneedle, microporation, iontophoretic, and other approaches to increasing the size of candidate drugs that can be transdermally administered. The Macroflux technology, originally developed by Alza Corporation, a division of Johnson & Johnson, is at the forefront of microneedle-based transdermal drug delivery. The basic principle of operation involves a dynamic mechanical actuator, microfabricated array of microprojections on an adhesive patch, and special-purpose drug formulation. This total system addresses the numerous and varied requirements for a drug delivery system across a wide spectrum of drug candidates. This presentation outlines the numerous disciplines and technology elements necessary to ensure the total system functions as intended. Special emphasis will be placed on the roles of microfabrication, surface chemical properties, drug-specific requirements, and the interaction with human skin and systemic biology. 4:30 - 5:00 "Micro stereolithography system for 3D micro modeling", Norihiko Saitou, JSR Corporation, Norihiko_Saitou at jsr.co.jp Abstract: ACCULAS, developed by D-MEC Co., Ltd. is the world's first industrial micro stereolithography technology which can create micro-structures with resolution down to 1um. A large variety of 3D items such as curved shapes, air bridge structures, overhang structures and so on, can be created with a singular process by using ACCULAS. Sample applications include simulation modeling of micro machines, micro arrays, probe pins and other micro devices. Also, with the addition of surface metal deposition, the master form can be used as a mold and can be used to create replicas of itself. We will introduce the features of the micro stereolithography equipment ACCULAS and provide a number of modeling examples. (D-MEC is wholly-owned subsidiary of JSR Corporation.) Speaker Biographies: Dr. M. Meyyappan Meyya Meyyappan is Chief Scientist for Exploration Technology at the Center for Nanotechnology, NASA Ames Research Center in Moffett Field, CA. Until June 2006, he served as the Director of the Center for Nanotechnology as well as Senior Scientist. He is a founding member of the Interagency Working Group on Nanotechnology (IWGN) established by the Office of Science and Technology Policy (OSTP). The IWGN is responsible for putting together the National Nanotechnology Initiative. Dr. Meyyappan has authored or co-authored over 175 articles in peer reviewed journals and made over 200 Invited/Keynote/Plenary Talks in nanotechnology subjects across the world. His research interests include carbon nanotubes and various inorganic nanowires, their growth and characterization, and application development in chemical and biosensors, instrumentation, electronics and optoelectronics. Dr. Meyyappan is a Fellow of the Institute of Electrical and Electronics Engineers (IEEE), the Electrochemical Society (ECS), AVS, Materials Research Society, and the California Council of Science and Technology. In addition, he is a member of the American Society of Mechanical Engineers (ASME) and American Institute of Chemical Engineers. He is the IEEE Nanotechnology Council Distinguished Lecturer on Nanotechnology, IEEE Electron Devices Society Distinguished Lecturer, and ASME's Distinguished Lecturer on Nanotechnology (2004-2006). He served as the President of the IEEE's Nanotechnology Council in 2006-2007. For his contributions and leadership in nanotechnology, he has received numerous awards including: a Presidential Meritorious Award; NASA's Outstanding Leadership Medal; Arthur Flemming Award given by the Arthur Flemming Foundation and the George Washington University; 2008 IEEE Judith Resnick Award; IEEE-USA Harry Diamond Award; AIChE Nanoscale Science and Engineering Forum Award. For his sustained contributions to nanotechnology, he was inducted into the Silicon Valley Engineering Council Hall of Fame in February 2009. For his educational contributions, he has received: Outstanding Recognition Award from the NASA Office of Education; the Engineer of the Year Award(2004) by the San Francisco Section of the American Institute of Aeronautics and Astronautics(AIAA); IEEE-EDS Education Award. Demir Akin, D.V.M, Ph.D. Dr. Demir Akin is and internationally recognized expert in Nanobiotechnology and a pioneer nanomedical scientist in the areas of bioinspired diagnostic and therapeutic devices and their applications in cancer as well as infectious diseases. His formal education includes a doctorate in veterinary medicine, a master's in clinical and diagnostic microbiology and a doctorate in comparative pathobiology and molecular virology. Most recently he was at the Biomedical Engineering Department at Purdue University as an assistant research professor (Nanomedicine) and there he also managed the BioMEMS and Nanobio laboratories of the Birck Nanotechnology Center. He currently serves as the Deputy Director of the Center for Cancer Nanotechnology Excellence focused on Therapy Response (CCNE-TR) in the School of Medicine at Stanford University. Dr. Akin worked in the areas of molecular virology and viral bioinformatics of coronaviruses and other RNA viruses from 1998 to 2000 for his postdoctoral work at Purdue University. He became a Research Scientist in the School of Nuclear Engineering at Purdue University in 2001 and worked on artificial intelligence-based In-Silico Biology and Genomics software development with a cancer focus. He joined the Electrical and Computer Engineering Department at Purdue University in 2002 as a Senior Research Scientist and the Manager of the BioMEMS Laboratories. He was instrumental in the ground-up design, operation and leadership of the Birck Nanotechnology Center at Purdue and served as the Manager of the BioMEMS and Nanobio Laboratories from 2003 to 2008. Among other responsibilities at Birck, he instructed formal Nanobio and BSL-2 training to the shared facility users, provided biomedical expertise to the engineering research groups and he was responsible for the compliance assurances for federal, state and institutional regulations and biocontainment/biosafety practices. Dr. Akin carried out research in the areas of diagnostic and therapeutic micro/nano-medical devices, microchip and microfluidics-based devices for biothreat agent detection, nanomedical robotics via biomimetic devices, biosensing and single molecule imaging studies of biological entities at nanomaterials interfaces and biological engineering for synthetic biology during his Research Assistant Professor appointment at the Weldon School of Biomedical Engineering at Purdue. Among his other distinctions, he is a founding member of the American Academy of Nanomedicine, a member of NCI Alliance for Nanotechnology in Cancer and serves as panelist on numerous grant/scientific review boards nationally and internationally. His research interests include integration of biology and engineering for realization of biomimetic and bioinspired medical devices, Nanomedicine (BioMEMS-based sensors and devices with medical diagnostic and therapeutic potential, early cancer detection and antineoplastic therapy response monitoring, smart nanodrugs and their targeted delivery and controlled release), synthetic biology, single molecule sensing, imaging and their mechanoelastic/biophysical characterization using atomic force microscopy, advanced optical microscopy and electro-mechanical sensing, and infectious agent diagnostics for biothreat agents and viral pathogens with pandemic potential. Sammy S. Datwani, Ph.D. Dr. Datwani is a Staff Engineer and the Chemistry Department Manager in the R&D Division of Labcyte Inc., a biotechnology start-up company located in the bay area. Dr. Datwani has over fifteen years of experience managing & applying cutting edge research and development in industry & academia. Dr. Datwani's research interests include an in-depth understanding of fluid mechanics, interfacial transport, surface chemistry, thin films, microfluidics, microdevice design, laboratory automation, high throughput drug screening, microarraying, polymer chemistry and materials science. Prior to joining Labcyte, Dr. Datwani was the technical lead for the development of an integrated high performance liquid chromatography on a chip (cHiPLCTM) system in the Advanced Development Group at Eksigent Technologies, LLC. Prior to that, Dr. Datwani led the development of the Library CardTM product which married high throughput drug discovery on a microfluidic chip with a high density reagent storage array. Dr. Datwani earned his Ph.D. in Chemical and Biomolecular Engineering from The Johns Hopkins University and a M.S. in Chemical Engineering and Polymer Science from The Columbia University. S. Jeffrey Rosner, Ph.D. After a several opportunities with startups, government, and other corporations, Jeff Rosner joined Hewlett-Packard (HP) in 1978. There he has held a variety of management and individual contributor positions in operating divisions and the corporate laboratories. When Agilent was formed from the instrumentation core of HP's business, Jeff joined the new company, where he has been deeply involved in technology acquisition. He has authored or co-authored over 50 journal articles and holds 13 U.S. patents. He holds a BS in Electrical Engineering from the Massachusetts Institute of Technology and an MS and Ph.D. from Stanford University in Materials Science. Russell Ford, Ph.D. Russell Ford has been at Zosano Pharma (formerly The Macroflux Corporation) since 2006 as Associate Director System Design and Development, responsible for design, integration, and manufacturability of non-drug components including the microprojection array, applicator, adhesive patch, and primary packaging. During this time, numerous design improvements have been implemented that increase drug delivery payload, manufacturability of the array, ease-of-use, and patient compliance. Prior to Zosano, he spent over 6 years at Cygnus Therapeutics, working on the GlucoWatch, the first-ever FDA approved automatic semicontinuous glucose monitoring system. Using reverse iontophoresis, the devise implemented a disposable hydrogel and screen-printed electrodes to sample interstitial fluid through the skin. He has also designed minimally invasive neurovascular intervention products at Boston Scientific. Prior to this medical device experience, he has worked on a variety of manufacturing technologies, including some time with Applied Materials on their robotic mechanisms for wafer processing equipment. Dr. Ford earned his Masters and PhD degrees in Mechanical Engineering/Design Division at Stanford University. Norihiko Saitou Mr. Norihito Saitou graduated from Keio University Japan at 1988. After that He got the master degree at 1990 from Keio University and joined to JSR corporation immediately. He worked in JSR research center around 5years to develop the UV curable resin development. After that, until now, he has been managing business of this UV curable resin in JSR Corporation. ********************************************************** Corporate Sponsorship Opportunities for TFUG Meetings! For details please contact meeting Co-Chairs listed above or Heather Korff, NCCAVS Office, 530-896-0477, heather at avs.org. ********************************************************** 2009 TFUG Meeting Schedule: (www.avsusergroups.org - Dates/location subject to change) All Meetings at SEMI Global Headquarters, unless otherwise indicated. August 19-Display (Image/OELD/LED), submit abstracts to Co-Chairs, Qian Wang, Edith Ong, and Ketan Itchhaporia, qwang at parc.com, edithong at comcast.net, gkfly at aol.com. November 8-13-AVS 56th International Symposium & Exhibition, San Jose, CA. For details visit www.avs.org December 9-BEOL Integration, submit abstracts to Co-Chairs: Brett Cruden, Roc Blumenthal, and Kapila Wijekoon; bcruden at arc.nasa.gov, roc at rocsolidsoln.com, kapila_wijekoon at amat.com ********************************************************** NCCAVS User Group website: www.avsusergroups.org Find: Meeting Schedules, Announcements, Call for Papers, Committee Contact Information, Proceedings from monthly meetings, and more. Sign up for a User Group: www.avsusergroups.org *********************************************************** From kevhuang at stanford.edu Tue Jun 16 12:52:31 2009 From: kevhuang at stanford.edu (Kevin Huang) Date: Tue, 16 Jun 2009 12:52:31 -0700 Subject: silver wet etching rate Message-ID: <93586f8c0906161252o6dd796b2m467c2ef44613adb1@mail.gmail.com> Hi, Could anyone please let me know an approximate etching rate of silver in Cr etchant in the SNF or are there any other etchants in SNF that's better suited for Ag etching? Thanks. Kevin ================================== Kevin Huang Ph.D. Candidate Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ================================== -------------- next part -------------- An HTML attachment was scrubbed... URL: From gthareja at stanford.edu Wed Jun 17 00:27:25 2009 From: gthareja at stanford.edu (Gaurav Thareja) Date: Wed, 17 Jun 2009 00:27:25 -0700 (PDT) Subject: alternatives to Gasonics and Drytek2 Message-ID: <406288250.4215031245223645775.JavaMail.root@zm06.stanford.edu> Dear Labmembers. Considering both equipments are down, please let me know the "Dry" alternative equipment to 1. Gasonics - PR stripping 2. Drytek 2 - Descumming the PR thanks ~gaurav From kocabas at stanford.edu Thu Jun 18 09:35:26 2009 From: kocabas at stanford.edu (S. Ekin Kocabas) Date: Thu, 18 Jun 2009 09:35:26 -0700 Subject: PhD Oral Examination: "Modeling of Nanometallic Waveguides," 3pm, AP200 Message-ID: PhD Oral Examination Department of Electrical Engineering Stanford University Speaker: S. Ekin Kocabas, kocabas at stanford.edu Title: Modeling of Nanometallic Waveguides Date: Thursday, June 18, 2009 Time: 3:15pm (refreshments at 3:00pm) Location: Applied Physics, Rm 200 http://campus-map.stanford.edu/index.cfm?ID=04-230 Abstract: Plasmonics is a new and vibrant branch of optics that tries to understand and design metallic structures to focus and guide light at the nanometer level, below the diffraction limit, with applications covering a wide range of fields from bio-sensing to optical interconnects. The optical interconnect applications will require a dense integration between the optical and the electrical components which necessitates a solid understanding of the way electromagnetic waves propagate and scatter as they flow through the system. In this talk, I will focus on one of the most popular waveguiding geometries in plasmonics: the metal-insulator-metal (MIM) waveguide. The talk will illustrate the use of the ideas developed in the microwave domain to design waveguiding components at optical wavelengths. As an example, I will provide the details on the use of the Smith Chart to build a mode converter that transforms the mode of a large waveguide to that of a smaller waveguide with no energy loss [1]. Circuit models for waveguide junctions will be derived and their physical significance will be discussed as well. Lastly, the modes of the MIM waveguide will be at the focus of our theoretical lens [2]. I will compare and contrast the rich set of modes that exists in the MIM waveguide to those that exist in the dielectric slab and the parallel plate waveguides. The importance of using the full set of supported modes---which form a complete basis set---will be illustrated by mode-matching calculations. [1] http://tinyurl.com/l4f54y [2] http://tinyurl.com/l2u32o -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Thu Jun 18 13:38:03 2009 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 18 Jun 2009 13:38:03 -0700 (PDT) Subject: Important Notice - Please Read In-Reply-To: <1498404881.3606561245357148206.JavaMail.root@zm08.stanford.edu> Message-ID: <974759195.3608531245357483197.JavaMail.root@zm08.stanford.edu> Hello lab-members... As Ed Myers indicated in an earlier Email, We are critically low on several chemicals in the lab. In particular, we are very low on MF-26A developer and do not have enough to sustain us until our next delivery , expected July 6th. In an effort to keep the Litho area up and running, we have received a large quantity of LDD26W developer. This was the standard developer for all 3612 resist processes prior to the change-over at the beginning of the year. We will temporarily change over to this developer for use with all 3612 resist processing. The MF26A developer will still be available for use with Shipley 955-7 photo-resist. This change-over will take place on Friday, June 19th between 7:30AM and 9:30 AM. All necessary program changes will be done at this time. There will also be copies of the recipes at the SVG develop tracks for your reference. Please review the recipes carefully and make sure you select the appropriate developer program for your resist process. We do not anticipate any problems, as this was the process of record last year. However, it is advised that you develop a test wafer to verify your process. If you have any problem, please report them in coral. Also, please contact a staff member if you have any questions or concerns. Thanks... Your SNF Staff From lana.lau at gmail.com Fri Jun 19 09:01:11 2009 From: lana.lau at gmail.com (lana@stanford.edu) Date: Fri, 19 Jun 2009 09:01:11 -0700 Subject: OSA/SPIE bbq! Message-ID: <5be61e0b0906190901q507981f9sbbf099a1fed7c87e@mail.gmail.com> The Stanford OSA/SPIE chaper is hosting a recruitment & photonics retreat renion bbq next Thurs (see below). All who are interested in joining the Stanford Optical Society of America or getting free food are welcome! Lana Lau OSA/SPIE Membership Chair [image: SPIE/OSA BBQ, for more info visit http://photons.stanford.edu] -- Lana Lau PhD candidate W. E. Moerner Lab Stanford University mailing address: Stanford University Department of Chemistry 333 Campus Drive #121 mailbox 99 Stanford, CA 94305 (650) 724-4052 office (650) 724-4051 lab -- Lana Lau PhD candidate W. E. Moerner Lab Stanford University mailing address: Stanford University Department of Chemistry 333 Campus Drive #121 mailbox 99 Stanford, CA 94305 (650) 724-4052 office (650) 724-4051 lab -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: OSA_BBQ.jpg Type: image/jpeg Size: 84383 bytes Desc: not available URL: From shott at stanford.edu Mon Jun 22 07:44:27 2009 From: shott at stanford.edu (John Shott) Date: Mon, 22 Jun 2009 07:44:27 -0700 Subject: Remote Coral from behind firewalls .... Message-ID: <4A3F98CB.4070504@stanford.edu> SNF Lab Members: There have been a small number of you who have been unable to run Remote Coral because of firewall issues .... particularly from industrial concerns or government labs with tightly locked down firewalls. We believe that we have been able to control the ports that the Coral servers are using in hopes that your local IT staff will be able to open up your firewalls in order to be able to run Remote Coral. We are now able to tell you that the Coral servers will be running on the range of ports from 50000 to 50014 on the server shine.stanford.edu (171.64.101.141). In other words, if your firewall folks are willing to open your local firewall to the range of ports 50000:50014 when the destination IP address is (171.64.101.141) you should be able to run the SNF version of Remote Coral. Note, if you also wish to run the SNL version of Remote Coral, that will be the same port range (50000:50014) but the destination address is (171.67.100.167). Let me know if this allows you to run remote coral when you had previously been blocked. Thanks, John From rissman at stanford.edu Mon Jun 22 08:36:19 2009 From: rissman at stanford.edu (Paul Rissman) Date: Mon, 22 Jun 2009 08:36:19 -0700 Subject: Nano Facilities equipment survey Message-ID: <20090622153619.B4FC937CE4@smtp-roam.stanford.edu> This is a reminder that if you haven't had a few minutes to take this survey, please join the over 100 people who have done so already. The survey will be available until Friday, 6/26. ------------------------------------------------------------------------------------------------------------------------------------------------------------- On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of the Shared Nano-facilities Committee, please complement the data being gathered from a faculty survey by taking the survey found at: http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d This survey will indicate the most urgent needs for new shared tools. Stanford has made great progress on shared nano-facilities in the past year. Your inputs will help the committee decide which tools are most important for future grant opportunities. On the first page are five candidates for the next NSF Major Research Instrumentation grant competition. Five candidate tools (listed alphabetically): 1. Chemically assisted ion beam etcher (CAIBE) - Enables high precision dry etching of semiconductors (Si, III-V, II-VI), chalcogenide materials, magnetic materials and metal oxides using a combination of reactive gases and ion beam. Provides a controllable etch by giving independent control of ion energy, current density, and incident angle. 2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB allows imaging, etching and deposition of materials on length scales at 100 nm. Electron column enables non-destructive imaging of high resolution samples to achieve three-dimensional imaging with high-resolution SEM. 3. Electron microprobe - Provides quantitative chemical analysis of major and minor elements and qualitative analysis of trace elements in sample. The combination wavelength-dispersive and energy-dispersive spectrometers with backscattered and secondary electron imaging allows detection of elements from Beryllium through Uranium. 4. Plasma etcher - Modern r&d plasma etch tools to support etch of silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI, photoresist and other materials. This equipment would replace the ones installed in 1988 in SNF and will be better able to reproduce the fine structures fabricated in lithography. 5. Scanning electron microscope (SEM) (high resolution and/or environmental) - Will provide more capacity for high resolution scanning electron microscopy with resolution to 0.8 nm. The environmental SEM provides for the capability to work at lower vacuum for high-resolution imaging of insulating and non-solid materials. Highlights of progress on Stanford nanofacilities: Tools ordered: 1. workhorse/training TEM (installation underway) 2. aberration-corrected FEI Titan TEM (expected in 2010) 3. JEOL 6300 ebeam lithography system (expected in September, 2009) Proposals submitted: 1. NanoSIMS (submitted to NSF MRI competition in January, 2009) 2. nanofab tools (submitted to NSF through the NNIN in May, 2009) 3. Academic Research Infrastructure for facilities upgrades (no equipment) (in progress). The nanobuilding construction is proceeding rapidly. The new nanobuilding includes 9000 square feet of shared facilities. The design team is working hard to meet the sensitive specifications for the quiet environment necessary for many modern tools. Shared Nano-facilities Committee Chris Chidsey, Chemisty Curt Frank, Engineering Sam Gambhir, Radiology, BioX, and Molecular Imaging David Goldhaber-Gordon, Physics Paul McIntyre, Materials Science and Engineering Kam Moler, Applied Physics and Physics Jody Puglisi, Structural Biology Olav Solgaard, Electrical Engineering Jonathan Stebbins, Geological and Environmental Sciences Jelena Vuckovic, Electrical Engineering H.-S. Philip Wong, Electrical Engineering From jswi at stanford.edu Wed Jun 24 13:28:53 2009 From: jswi at stanford.edu (Jung-Sub Wi) Date: Wed, 24 Jun 2009 13:28:53 -0700 (PDT) Subject: Vacuum furnace In-Reply-To: <1057662329.5102421245875160302.JavaMail.root@zm09.stanford.edu> Message-ID: <1492669800.5103061245875333659.JavaMail.root@zm09.stanford.edu> Dear my labmembers I wonder if anyone has (or know) a vacuum furnace to anneal some coupon samples upto 800oC. In my samples, there are no volatile species at this temperature range. It is just a Si coupon with some Fe and Pt. I really appreciate for your time and kind consideration, in advance. With my best wishes Jung-Sub Wi, Ph.D. Department of Materials Science and Engineering Stanford University From shiwei20012002 at yahoo.com Wed Jun 24 14:18:41 2009 From: shiwei20012002 at yahoo.com (Wei Shi) Date: Wed, 24 Jun 2009 14:18:41 -0700 (PDT) Subject: Vacuum furnace Message-ID: <833768.66905.qm@web35705.mail.mud.yahoo.com> ? www.sstinternational.com ? ? Thanks, Wei --- On Wed, 6/24/09, Jung-Sub Wi wrote: From: Jung-Sub Wi Subject: Vacuum furnace To: labmembers at snf.stanford.edu, "supd-members" Date: Wednesday, June 24, 2009, 1:28 PM Dear my labmembers I wonder if anyone has (or know) a vacuum furnace to anneal some coupon samples upto 800oC. In my samples, there are no volatile species at this temperature range. It is just a Si coupon with some Fe and Pt. I really appreciate for your time and kind consideration, in advance. With my best wishes Jung-Sub Wi, Ph.D. Department of Materials Science and Engineering Stanford University -------------- next part -------------- An HTML attachment was scrubbed... URL: From amroy at stanford.edu Wed Jun 24 19:01:03 2009 From: amroy at stanford.edu (Arunanshu Roy) Date: Wed, 24 Jun 2009 19:01:03 -0700 Subject: Metal based wafer bonding Message-ID: Has anyone attempted metal based wafer bonding in vacuum using Ti or other metals in SNF? I am trying to design a process for my experiment and it would help me a lot if I could speak to someone with experience in this technique. Thanks and regards, Arunanshu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mferrier at stanford.edu Fri Jun 26 09:58:42 2009 From: mferrier at stanford.edu (Marlene Ferrier) Date: Fri, 26 Jun 2009 09:58:42 -0700 (PDT) Subject: Dimethyl Sulfoxide Message-ID: <1870778122.5033141246035522342.JavaMail.root@zm08.stanford.edu> Dear Labmember, I was wondering if anyone would have about 150-200ml of Dimethylsulfoxide to share with me. Most likely I will order some more in the near future so you could have it back if needed. Thank you very much for your response Marlene From mtang at stanford.edu Sun Jun 28 07:13:45 2009 From: mtang at stanford.edu (Mary Tang) Date: Sun, 28 Jun 2009 07:13:45 -0700 Subject: Process Clinic, Monday, 2-4 pm Message-ID: <4A477A99.2000307@stanford.edu> ------------------------------------------------------------------------ Greetings Labmembers -- Process Clinic, Monday, June 28, 2-4 pm, in the cubicle area outside Maureen's office. Bring process questions, mask layouts, SpecMat requests. New labmembers are especially encouraged to come and review process flows and runsheets. The experts from ASML will also be on hand. See you there! Your SNF and ASML staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From jrjain at stanford.edu Sun Jun 28 11:30:57 2009 From: jrjain at stanford.edu (Raja Jain) Date: Sun, 28 Jun 2009 11:30:57 -0700 Subject: SNF Bake Sale Tomorrow for Leukemia & Lymphoma Society Message-ID: <001f01c9f81e$94b77c50$be2674f0$@edu> Hi All, SNF will be hosting a bake sale tomorrow, Monday, June 29, in Nancy's office (Allen 145). Proceeds of the sale will support the Leukemia & Lymphoma Society, which helps cancer research and patient services. There will be treats prepared by a number of staff, student, and industrial members, so come enjoy some tasty goods and support an important cause. Additional donations of food and funds will certainly be welcome, so don't hesitate to let the philanthropic bug bite! (Apologies to those receiving this email twice) -------------- next part -------------- An HTML attachment was scrubbed... URL: From jrjain at stanford.edu Mon Jun 29 12:55:56 2009 From: jrjain at stanford.edu (Raja Jain) Date: Mon, 29 Jun 2009 12:55:56 -0700 Subject: Delicious post-lunch treats in Nancy's office Message-ID: <005c01c9f8f3$9e25ab60$da710220$@edu> Ease your way into the work week with a delicious post-lunch treat! The SNF bake sale is on in Nancy's office (Allen 145) now! A large variety of homemade items (listed below) are available for sale, courtesy of several generous staff and lab members. Come enjoy some special goods (including Scottish and Turkish pastries) and support the Leukemia & Lymphoma Society! Panna cotta (Marika) Mango orange fruit preserves (Marika) Blueberry scones (Robin) Cranberry orange scones (Robin) Spinach & Feta Cheese Borek (Nevran) Scottish flapjacks (Debbie) Apple, walnut, and cinnamon pastry with powdered sugar (Nevran) Chocolate rum balls (Robin) Chocolate and double-chocolate chip cookies (Maureen) Ginger cookies (Serene) Double-chocolate chip cookies (Raja) Zucchini, chocolate, and walnut muffins (Linda O.) Blueberry muffins (Maureen) Brownies (Maureen) Rice-Krispie Treats (Maureen) -------------- next part -------------- An HTML attachment was scrubbed... URL: