Nano Facilities equipment survey

Paul Rissman rissman at stanford.edu
Tue Jun 2 10:34:41 PDT 2009


On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of 
the Shared Nano-facilities Committee, please complement the data 
being gathered from a faculty survey by taking the survey found at:

http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d

This survey will indicate the most urgent needs for new shared tools.

Stanford has made great progress on shared nano-facilities in the 
past year.  Your inputs will help the committee decide which tools 
are most important for future grant opportunities.  On the first page 
are five candidates for the next NSF Major Research Instrumentation 
grant competition.

Five candidate tools (listed alphabetically):

1. Chemically assisted ion beam etcher (CAIBE) - Enables high 
precision dry etching of semiconductors (Si, III-V, II-VI), 
chalcogenide materials, magnetic materials and metal oxides using a 
combination of reactive gases and ion beam.  Provides a controllable 
etch by giving independent control of ion energy, current density, 
and incident angle.

2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB 
allows imaging, etching and deposition of materials on length scales 
at 100 nm.  Electron column enables non-destructive imaging of high 
resolution samples to achieve three-dimensional imaging with 
high-resolution SEM.

3. Electron microprobe - Provides quantitative chemical analysis of 
major and minor elements and qualitative analysis of trace elements 
in sample.  The combination wavelength-dispersive and 
energy-dispersive spectrometers with backscattered and secondary 
electron imaging allows detection of elements from Beryllium through Uranium.

4. Plasma etcher - Modern r&d plasma etch tools to support etch of 
silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI, 
photoresist and other materials.  This equipment would replace the 
ones installed in 1988 in SNF and will be better able to reproduce 
the fine structures fabricated in lithography.

5. Scanning electron microscope (SEM) (high resolution and/or 
environmental) - Will provide more capacity for high resolution 
scanning electron microscopy with resolution to 0.8 nm.  The 
environmental SEM provides for the capability to work at lower vacuum 
for high-resolution imaging of insulating and non-solid materials.

Highlights of progress on Stanford nanofacilities:

Tools ordered:
1. workhorse/training TEM (installation underway)
2. aberration-corrected FEI Titan TEM (expected in 2010)
3. JEOL 6300 ebeam lithography system (expected in September, 2009)

Proposals submitted:
1. NanoSIMS (submitted to NSF MRI competition in January, 2009)
2. nanofab tools (submitted to NSF through the NNIN in May, 2009)
3. Academic Research Infrastructure for facilities upgrades (no 
equipment) (in progress).

The nanobuilding construction is proceeding rapidly.  The new 
nanobuilding includes 9000 square feet of shared facilities.  The 
design team is working hard to meet the sensitive specifications for 
the quiet environment necessary for many modern tools.

Shared Nano-facilities Committee
Chris Chidsey, Chemisty
Curt Frank, Engineering
Sam Gambhir, Radiology, BioX, and Molecular Imaging
David Goldhaber-Gordon, Physics
Paul McIntyre, Materials Science and Engineering
Kam Moler, Applied Physics and Physics
Jody Puglisi, Structural Biology
Olav Solgaard, Electrical Engineering
Jonathan Stebbins, Geological and Environmental Sciences
Jelena Vuckovic, Electrical Engineering
H.-S. Philip Wong, Electrical Engineering




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