Cleaning after dry etching (Removal of Fluorine)

Joongsun Park joongsun.park at gmail.com
Mon Nov 16 18:13:40 PST 2009


Jim,

I meant after using SF6 or CF4 gas in drytek1/2.
Let me know if you need further information.

Joongsun

On Mon, Nov 16, 2009 at 6:01 PM, Jim McVittie <mcvittie at cis.stanford.edu>wrote:

> Joongsun,
>
> Can you define what you mean by Fluorine contaminants? What etch process
> are you coming from? When I know more about what you want, I may be able
> to give you some info.
>
>        Jim
>
> On Mon, 16 Nov 2009, Joongsun Park wrote:
>
> > Dear labmembers,
> >
> > Does anyone know how to clean samples after dry etching?
> > I could observe a lot of Fluorine contaminants after etching. If anyone
> > knows cleaning processes please let me know.
> > Many thanks in advance.
> >
> > Best,
> > Joongsun
> >
>
> --
> --------------------------------------------------------------
> James (Jim) P. McVittie, Ph.D.          Sr. Research Scientist
> Paul G. Allen Building                  Electrical Engineering
> Stanford Nanofabrication Facility       jmcvittie at stanford.edu
> Stanford University                     Office: (650) 725-3640
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>
>
>
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