From mbaran at stanford.edu Fri Jul 2 09:11:02 2010 From: mbaran at stanford.edu (Maureen Baran) Date: Fri, 2 Jul 2010 09:11:02 -0700 Subject: Lost Item Found in the Gowning Room Message-ID: <000701cb1a01$2ac6c430$80544c90$@edu> An item was found in the gowning room and given to me for safe keeping. If you believe you misplaced something in the gowning room please come to my cubicle #41 and claim. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From alsune at stanford.edu Sat Jul 3 17:05:01 2010 From: alsune at stanford.edu (Woo Shik Jung) Date: Sat, 3 Jul 2010 17:05:01 -0700 Subject: Odor in tylanbpsg area Message-ID: Dear labmembers, There is a strange odor in the tylanbpsg areathermcopoly1 area. Mary Tang recommended that people should not go near the are and evacuate the lab if the smell spreads. Regards, Wooshij Jung -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Sat Jul 3 19:01:10 2010 From: mtang at stanford.edu (Mary Tang) Date: Sat, 03 Jul 2010 19:01:10 -0700 Subject: Odor in tylanbpsg area In-Reply-To: References: Message-ID: <4C2FEB66.8040804@stanford.edu> Update: The odor was reported around 5. By 5:30, it seems to have completely dissipated. All systems seem to be functioning normally and there are no indications of a leak. The odor may be coming in from outside ("Sewer" like odors have been reported in the office areas for the past couple of weeks). If odors are observed, clear the immediate area (feel free to use the yellow "Hazard" tape in the spill cart across from the Flammables storage cabinets) or evacuate the lab, if needed. And please call the SNF duty phone. Thanks, Mary Woo Shik Jung wrote: > Dear labmembers, > > There is a strange odor in the tylanbpsg areathermcopoly1 area. Mary > Tang recommended that people should not go near the are and evacuate > the lab if the smell spreads. > > Regards, > > Wooshij Jung -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From colbybellew at yahoo.com Thu Jul 8 14:12:52 2010 From: colbybellew at yahoo.com (Colby Bellew) Date: Thu, 8 Jul 2010 14:12:52 -0700 (PDT) Subject: Suggestions for polishing germanium Message-ID: <450440.89749.qm@web80707.mail.mud.yahoo.com> Labmembers, I have some two inch wafers of high purity germanium that are 1mm thick. I need to polish the surface to a very smooth finish. Does anyone know of a vendor that may be able to help with that? Thanks, Colby Bellew From mtang at stanford.edu Fri Jul 9 08:15:42 2010 From: mtang at stanford.edu (Mary Tang) Date: Fri, 09 Jul 2010 08:15:42 -0700 Subject: Venture Clinic, Monday, July 12, 4:30 pm Message-ID: <4C373D1E.9020408@stanford.edu> Greetings labmembers -- Shahin Farschi of Lux Capital will be hosting the Venture Clinic next Monday, July 12, at 4:30 pm, in Allen 101. Here's an opportunity to learn about the current climate in the venture world or bounce around any startup ideas you might have. Shahin's contact information is below: Shahin Farshchi, Ph.D. Senior Associate Lux Capital Management, LLC C: 925.323.2784 http://www.luxcapital.com -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Fri Jul 9 11:13:28 2010 From: mbaran at stanford.edu (Maureen Baran) Date: Fri, 9 Jul 2010 11:13:28 -0700 Subject: Found Glasses in the Gryphon Aisle of the Lab Message-ID: <004701cb1f92$6df218e0$49d64aa0$@edu> Dear Lab Members: A pair of glasses was found in the Gryphon aisle of the lab. The frames are brown and clear stripped if these are yours please come by my desk and claim them. Thanks, Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Fri Jul 9 13:15:40 2010 From: mtang at stanford.edu (Mary Tang) Date: Fri, 09 Jul 2010 13:15:40 -0700 Subject: Seminar Announcement: Roger Brennan "Spreading Resistance Analysis, (SRP)" July 13, Tuesday 2pm, Allen 101X A Message-ID: <4C37836C.8090603@stanford.edu> "Spreading Resistance Analysis (SRP)" Speaker - Roger Brennan Date: Jul 13, Tuesday Time: 2p - 3p Cypress Semiconductor Auditorium (Former CISX101 auditorium) Allen Building Brief Abstract of Presentation: Using a pair of tiny probe tips, it is usually possible to extract a resistivity-depth profile in silicon and germanium. Assuming published values of carrier mobility (derived from single-crystal material), it is possible to calculate a carrier concentration-depth profile -- critical for device performance. SRP had a dynamic range of about 9 decades and can cover the entire resistivity range in one profile if needed. Of course, as with all measurement techniques, it has it limitations. Bio for the speaker - Roger Brennan While working as a chemist, about two years after earning his BS in Chemistry (Marshall University, 1963), he became excited about semiconductor processing. Thirty-six resumes later, he became the masking engineer for the beginning MOS production effort at Texas Instruments, Dallas TX. Over the years, he has been a diffusion and masking engineer working with bipolar, MOS, and MEMS -- both analog and digital. Late in1979, he discovered Solecon Labs and the usefulness of their spreading resistance analysis. He joined Solecon in 1980 as the laboratory manager and served as president from 1992 until retirement in 1997. He returned as a "retread" in 2004 and has been serving as the applications director. -- Caitlin R. Azhderian, Ed.M Student Services- Courses and Teaching Assistant Appointments Stanford University Department of Electrical Engineering 350 Serra Mall, 172 Stanford, CA 94305-9505 P: 650.724.0531 F: 650.723.1882 E: caitlina at stanford.edu -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From raritiesr16 at graphiteelectronicthermalmanagement.com Sat Jul 10 05:40:35 2010 From: raritiesr16 at graphiteelectronicthermalmanagement.com (Gabrielle Howell) Date: Sat, 10 Jul 2010 12:40:35 +0000 Subject: We know how to make you graduated from university faster. Message-ID: <8ABB6D1E6BA2466BB98DC2D37A019827@recepcao> In today's world, sad to say, it is simply no longer good enough to just excel at what
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Call us right now and get the credit & recognition you deserve. Call us right now for your customized diploma: Inside U.SA.: 1-718-989-5740 Outside U.S.A.: +1-718-989-5740. Just leave your NAME & TEL. PHONE # (with country-code) on the voicemail and one of our staff members will get back to you promptly! From chingmei at stanford.edu Sat Jul 10 14:11:32 2010 From: chingmei at stanford.edu (Ching-Mei Hsu) Date: Sat, 10 Jul 2010 14:11:32 -0700 (PDT) Subject: Student ID lost in SNF this morning (07/10) Message-ID: <655109498.345134.1278796292133.JavaMail.root@zm01.stanford.edu> Dear labmemebers, I lost my student ID this morning in SNF. The last time I used it was around noon in the gowning room. If you happen to find it, please let me know. This is very appreciated. Sincerely, Ching-Mei -- Ching-Mei Hsu PhD Candidate Materials Science and Engineering Stanford University McCullough rm. 209 476 Lomita Mall Stanford, CA 94305 From nharjee at stanford.edu Sat Jul 10 14:24:13 2010 From: nharjee at stanford.edu (Nahid Harjee) Date: Sat, 10 Jul 2010 14:24:13 -0700 Subject: SIMS profiles of P diffusions Message-ID: Hi Labmembers, Do any of you have SIMS profiles of P diffusions performed in our POCl3 furnace (tylan6) in the temperature range 800C - 950C that you would be willing to share with me? I would like to compare them to SRA profiles I have to evaluate electrical activation. Thanks, nh -- Nahid Harjee Ph.D. Candidate Electrical Engineering Stanford University 408-761-8651 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon Jul 12 08:59:13 2010 From: mtang at stanford.edu (Mary Tang) Date: Mon, 12 Jul 2010 08:59:13 -0700 Subject: Process & Venture Clinics Today (Monday) Message-ID: <4C3B3BD1.8040605@stanford.edu> Dear Labmembers -- Just a reminder of two events for today, Monday, July 12: 1. Biweekly Process Clinic: 2-3 pm, in the cubicle area by Maureen's office. Bring device sketches, process questions/runsheets, and mask layouts. Staff and experienced labmembers will be on hand to brainstorm solutions. 2. Venture Clinic with Shahin Farschi of Lux Capital: 4:30 pm in Allen 101 conference room. Learn about the venture world or discuss your startup ideas. Everyone from the labmember community is welcome. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mbaran at stanford.edu Mon Jul 12 09:07:52 2010 From: mbaran at stanford.edu (Maureen Baran) Date: Mon, 12 Jul 2010 09:07:52 -0700 Subject: Seminar Announcement: Roger Brennan "Spreading Resistance Analysis (SRP)" Tuesday, July 13th, 2:00P Allen 101X Auditorium Message-ID: <002b01cb21dc$61ab0230$25010690$@edu> "Spreading Resistance Analysis (SRP)" Speaker - Roger Brennan Date: Jul 13, Tuesday Time: 2p - 3p Cypress Semiconductor Auditorium (Former CISX101 auditorium) Allen Building Brief Abstract of Presentation: Using a pair of tiny probe tips, it is usually possible to extract a resistivity-depth profile in silicon and germanium. Assuming published values of carrier mobility (derived from single-crystal material), it is possible to calculate a carrier concentration-depth profile -- critical for device performance. SRP had a dynamic range of about 9 decades and can cover the entire resistivity range in one profile if needed. Of course, as with all measurement techniques, it has its limitations. Bio for the speaker - Roger Brennan While working as a chemist, about two years after earning his BS in Chemistry (Marshall University, 1963), he became excited about semiconductor processing. Thirty-six resumes later, he became the masking engineer for the beginning MOS production effort at Texas Instruments, Dallas TX. Over the years, he has been a diffusion and masking engineer working with bipolar, MOS, and MEMS -- both analog and digital. Late in1979, he discovered Solecon Labs and the usefulness of their spreading resistance analysis. He joined Solecon in 1980 as the laboratory manager and served as president from 1992 until retirement in 1997. He returned as a "retread" in 2004 and has been serving as the applications director. Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From tberg at stanford.edu Tue Jul 13 09:23:34 2010 From: tberg at stanford.edu (Ted Berg) Date: Tue, 13 Jul 2010 09:23:34 -0700 Subject: RTP and ALD status Message-ID: <4C3C9306.3030309@stanford.edu> Hello All, Just another update on the new tool status. Both RTPs are facilitized and waiting for responses from Santa Clara county Fire. The ALD is basically in the same situation. We have no control on the timing of responses from the county. As soon as permits are approved we will ask for final inspections and get the next step going . Once again thank you for your understanding and cooperation as things move forward. ted From yjhuo at stanford.edu Thu Jul 15 10:04:23 2010 From: yjhuo at stanford.edu (Yijie Huo) Date: Thu, 15 Jul 2010 10:04:23 -0700 Subject: FW: EE PhD Oral Examination - Yijie Huo, Monday, July 19, 2010; 10:00 a.m. Message-ID: _____ From: ee-students-bounces at lists.stanford.edu [mailto:ee-students-bounces at lists.stanford.edu] On Behalf Of Natasha Newson Sent: Wednesday, July 14, 2010 10:51 AM To: ee-students at mailman.stanford.edu Subject: EE PhD Oral Examination - Yijie Huo, Monday, July 19, 2010; 10:00 a.m. Stanford University PhD Oral Defense - Department of Electrical Engineering Speaker: Yijie Huo Advisor: James S. Harris Date: Monday, July 19, 2010 Time: 10:00 a.m. Location: CIS-X 101 Auditorium Title: Group IV materials and devices for Si photonic integrated circuits Abstract: Silicon photonics has generated much interest in the past 10 years due to its ability to enhance the performance of CMOS integrated circuits (IC). The interconnect bandwidth limitation becomes a more and more critical challenge with device scaling. Optical communication has the ability to solve this emerging problem due to its high speed, high bandwidth, and low power consumption. Most of the key devices in Si photonic ICs have already been demonstrated, such as waveguides, detectors, and modulators. However, a practical silicon-compatible coherent light source is still a major challenge. Germanium has already been demonstrated to be a promising material for optoelectronic devices, such as photo-detectors and modulators. However, Ge is an indirect band gap semiconductor that has strong phonon-assisted non-radiative recombination which overcomes the radiative recombination. This makes Ge-based light sources very inefficient and difficult to realize. Fortunately, Ge has a direct G valley that is only 0.13eV higher in energy than the indirect L valley, suggesting that with band-structure engineering, Ge has the potential to become a direct band gap material and an efficient light emitter. In this talk, we first present the background and the key devices of Si photonic ICs. We then focus on how band-structure engineering can be used on Ge to achieve a direct band gap semiconductor by use of either tensile stain or GeSn alloys. To achieve high biaxial tensile strain (up to 2.3%), Ge QWs were grown on top of fully-relaxed InGaAs buffer layers in our MBE system and were verified by AFM, XRD, Raman spectroscopy, and TEM. A strong increase of photoluminescence (PL) from strained Ge layers and the temperature-dependent PL intensity prove that a direct band gap semiconductor was achieved. We also achieved more than 7% Sn incorporation in Ge, which is much higher than the 1% solid solubility limit of Sn inside Ge. Material characterization shows good crystal quality without precipitation or phase segregation. Direct band gap narrowing is observed with increasing Sn percentage, which is consistent with theoretical predication. Possible applications from this work will also be discussed. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- An embedded and charset-unspecified text was scrubbed... Name: ATT00114.txt URL: From erichall at stanford.edu Thu Jul 15 13:16:33 2010 From: erichall at stanford.edu (Eric Hall) Date: Thu, 15 Jul 2010 13:16:33 -0700 Subject: SU-8 2015? Message-ID: I have a bottle of SU-8 2015 on order, but it looks like I'm going to need some before it arrives. Would it be possible for me to borrow some? I need enough to cover about 6 wafers. Once my bottle arrives, you will of course be welcome to take what you feel is appropriate compensation. If you don't have SU-8 2015 but you do have some spare SU-8 2025, I can also work with that. Thank you! Eric erichall at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Jul 15 15:22:44 2010 From: shott at stanford.edu (John Shott) Date: Thu, 15 Jul 2010 15:22:44 -0700 Subject: Watch out for "Your Amazon.com Order" phishing email messages .... Message-ID: <4C3F8A34.2060906@stanford.edu> SNF Lab Members: A number of folks have been receiving email messages today with the subject line "Your Amazon.com Order" .... that claims to be a confirmation of an order at Amazon.com. Don't be fooled .... this seems to be some sort of phishing scheme coming from Romania. Do not click on any of the links, but delete this message as quickly as possible. Thanks, John From sonnyvo at gmail.com Thu Jul 15 16:26:29 2010 From: sonnyvo at gmail.com (Sonny Vo) Date: Thu, 15 Jul 2010 16:26:29 -0700 Subject: cu etchant Message-ID: <4C3F9925.10005@gmail.com> hi labmembers, does anyone have a small quantity of cu-wet-etchant to spare? It's fairly cheap i was told so i can return it in a few weeks, but i need to do a quick test tomorrow or sometimes this weekend. i need to etch Cu on blue tape with 3612 resist as a protective covering after litho. Nitric Acid etches Cu but will also etch away the resist. sputtering in mrc is an alternative too, but wet-etch would be cleaner. Thank you. S From wslee at stanford.edu Fri Jul 16 10:08:30 2010 From: wslee at stanford.edu (Scott Lee) Date: Fri, 16 Jul 2010 10:08:30 -0700 Subject: NNIN iWSG 2010 Message-ID: Hi all, I participated in this program last year and it was incredible! The first week is full of interesting talks from experts in the field and the second week consists of an adventure to a more rural area. The other students are from around the country and share a love for technology, traveling, and adventure. Last but certainly not least, benefits include an all expenses paid trip to India. Cheers, Scott ---------- Forwarded message ---------- From: Lynn Rathbun Date: Thu, Jul 15, 2010 at 2:33 PM Subject: NNIN iWSG To: 2009 iWSG participant Please distribute the attached flyer to your friends. Lynn ************************************************************** Dr. Lynn Rathbun Rathbun at cnf.cornell.edu NNIN Program Manager (607)-254-4872 CNF Laboratory Manager Duffield Hall (607)-255-8601 Fax Cornell University (607)-592-1549 Work Cell Ithaca, New York 14853 (607)-342-1880 Personal Cell -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: iwsg_2010_poster_2.pdf Type: application/pdf Size: 149896 bytes Desc: not available URL: From mtang at stanford.edu Fri Jul 16 16:06:26 2010 From: mtang at stanford.edu (Mary Tang) Date: Fri, 16 Jul 2010 16:06:26 -0700 Subject: Aloha party for jimkruger - Monday 1 pm Message-ID: <4C40E5F2.3030905@stanford.edu> Dear labmembers -- Jim Kruger (Coral ID jimkruger, aka the distinguished, bearded gentleman in the Hawaiian shirt) will be on leave from SNF for a couple of months. Please join us for a little chocolate cake and a great show of appreciation for his gentle warmth and astounding technical depth. We'll meet Monday, July 19, 1 pm at his desk, which will be enshrined and preserved for his return. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From yjhuo at stanford.edu Sun Jul 18 15:21:32 2010 From: yjhuo at stanford.edu (Yijie Huo) Date: Sun, 18 Jul 2010 15:21:32 -0700 Subject: FW: Tomorrow: EE PhD Oral Examination - Yijie Huo, Monday, July 19, 2010; 10:00 a.m. Message-ID: <10B9E37EA652425C8D24B95D08E3D5B5@home3dfaef8acc> _____ From: ee-students-bounces at lists.stanford.edu [mailto:ee-students-bounces at lists.stanford.edu] On Behalf Of Natasha Newson Sent: Wednesday, July 14, 2010 10:51 AM To: Subject: EE PhD Oral Examination - Yijie Huo, Monday, July 19, 2010; 10:00 a.m. Stanford University PhD Oral Defense - Department of Electrical Engineering Speaker: Yijie Huo Advisor: James S. Harris Date: Monday, July 19, 2010 Time: 10:00 a.m. Location: CIS-X 101 Auditorium Title: Group IV materials and devices for Si photonic integrated circuits Abstract: Silicon photonics has generated much interest in the past 10 years due to its ability to enhance the performance of CMOS integrated circuits (IC). The interconnect bandwidth limitation becomes a more and more critical challenge with device scaling. Optical communication has the ability to solve this emerging problem due to its high speed, high bandwidth, and low power consumption. Most of the key devices in Si photonic ICs have already been demonstrated, such as waveguides, detectors, and modulators. However, a practical silicon-compatible coherent light source is still a major challenge. Germanium has already been demonstrated to be a promising material for optoelectronic devices, such as photo-detectors and modulators. However, Ge is an indirect band gap semiconductor that has strong phonon-assisted non-radiative recombination which overcomes the radiative recombination. This makes Ge-based light sources very inefficient and difficult to realize. Fortunately, Ge has a direct G valley that is only 0.13eV higher in energy than the indirect L valley, suggesting that with band-structure engineering, Ge has the potential to become a direct band gap material and an efficient light emitter. In this talk, we first present the background and the key devices of Si photonic ICs. We then focus on how band-structure engineering can be used on Ge to achieve a direct band gap semiconductor by use of either tensile stain or GeSn alloys. To achieve high biaxial tensile strain (up to 2.3%), Ge QWs were grown on top of fully-relaxed InGaAs buffer layers in our MBE system and were verified by AFM, XRD, Raman spectroscopy, and TEM. A strong increase of photoluminescence (PL) from strained Ge layers and the temperature-dependent PL intensity prove that a direct band gap semiconductor was achieved. We also achieved more than 7% Sn incorporation in Ge, which is much higher than the 1% solid solubility limit of Sn inside Ge. Material characterization shows good crystal quality without precipitation or phase segregation. Direct band gap narrowing is observed with increasing Sn percentage, which is consistent with theoretical predication. Possible applications from this work will also be discussed. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- An embedded and charset-unspecified text was scrubbed... Name: ATT00114.txt URL: From mtang at stanford.edu Mon Jul 19 09:05:36 2010 From: mtang at stanford.edu (Mary Tang) Date: Mon, 19 Jul 2010 09:05:36 -0700 Subject: Reminder: Aloha party for jimkruger - Monday 1 pm Message-ID: <4C4477D0.7030209@stanford.edu> Hi all -- Just a reminder: it's TODAY! ************************ Dear labmembers -- Jim Kruger (Coral ID jimkruger, aka the distinguished, bearded gentleman in the Hawaiian shirt) will be on leave from SNF for a couple of months. Please join us for a little chocolate cake and a great show of appreciation for his gentle warmth and astounding technical depth. We'll meet Monday, July 19, 1 pm at his desk, which will be enshrined and preserved for his return. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Mon Jul 19 09:42:23 2010 From: mtang at stanford.edu (Mary Tang) Date: Mon, 19 Jul 2010 09:42:23 -0700 Subject: Reminder: Aloha party for jimkruger - Monday 1 pm In-Reply-To: <4C4477D0.7030209@stanford.edu> References: <4C4477D0.7030209@stanford.edu> Message-ID: <4C44806F.50800@stanford.edu> Hawaiian wear has been suggested in Jim's honor.... M Mary Tang wrote: > Hi all -- > > Just a reminder: it's TODAY! > > > ************************ > > Dear labmembers -- > > > Jim Kruger (Coral ID jimkruger, aka the distinguished, bearded > gentleman in the Hawaiian shirt) will be on leave from SNF for a > couple of months. Please join us for a little chocolate cake and a > great show of appreciation for his gentle warmth and astounding > technical depth. We'll meet Monday, July 19, 1 pm at his desk, which > will be enshrined and preserved for his return. > > > Your SNF Staff > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mdeal at stanford.edu Mon Jul 19 11:06:13 2010 From: mdeal at stanford.edu (Michael Deal) Date: Mon, 19 Jul 2010 11:06:13 -0700 Subject: Webcasting a cleanroom tour to teachers in Denver on Tuesday Message-ID: <4C449415.50108@stanford.edu> An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Tue Jul 20 13:30:42 2010 From: jprovine at stanford.edu (J Provine) Date: Tue, 20 Jul 2010 13:30:42 -0700 Subject: EVG Spray Coater update Message-ID: Hello SNFers: Many of you already know, but i wanted to get the word out that the evg spray coater is up and running and documented. everything you should need to find out if this lovely piece of equipment is right for you can be found at: https://snf.stanford.edu/SNF/equipment/optical-photolithography/resist-coat/ev101-spray-coater/evg-101-spray-coater there you will also find information on getting trained and qualified. any feedback is welcome. special thanks to all of the users who have contributed to the early development of the tool to get it to this point of being ready for the full user community. J -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Wed Jul 21 12:16:36 2010 From: mbaran at stanford.edu (Maureen Baran) Date: Wed, 21 Jul 2010 12:16:36 -0700 Subject: FW: Memorial Service for Pat Burke - Thursday, July 22, 4 p.m., Memorial Church Message-ID: <00b301cb2909$3d3acfa0$b7b06ee0$@edu> Dear All, Just in case you haven't received the information on the Memorial Service for Pat Burke. Here it is. Sincerely, Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -----Original Message----- From: Carol Muller [mailto:cbmuller at stanford.edu] Sent: Friday, July 16, 2010 6:03 PM To: Hernandez, Rita; eefaculty at mailman.stanford.edu; ee-adminlist at mailman.stanford.edu; ee-students at mailman.stanford.edu; cis-building at cis.stanford.edu; Clare; Tiiu Johnson; rabbipkn at stanford.edu; mclennan at stanford.edu; Rosan E. Gomperts; soe-finance at lists.stanford.edu; soe-dept-mgrs at mailman.stanford.edu; Naaf, Marian; Dr. Alejandro M. Martinez; lfaris at stanford.edu; Ken Hsu; mfe at stanford.edu; carolv at stanford.edu; a.hernandez at stanford.edu; k.lee-anderson at stanford.edu; npete at stanford.edu; elaineray at stanford.edu Cc: Allison Hecimovich; mahnaz at stanford.edu; John Shott; Alfs, Marjorie M Subject: Memorial Service for Pat Burke - Thursday, July 22, 4 p.m., Memorial Church Friends and colleagues, After speaking with Pat Burke's family members, we've determined a memorial service will be held Thursday, July 22 at 4:00 p.m. in Memorial Church. I hope many of you will be able to attend. If you are aware of others who would want to know, I'd appreciate your help in forwarding this message. Pat had many dear friends and colleagues across the Stanford community. I will send out further information next week, and I'd welcome hearing from any of you who would like to be involved in planning for it -- there will be a meeting Monday at 2 p.m. in the Round Room at Memorial Church for this purpose. Thanks to all of you who have already reached out to one another to share our sorrow -- Pat was a remarkable human being who clearly treasured Stanford and his colleagues here. Carol Muller Mark A Horowitz wrote: > > Colleagues, > > I am now able to release information about the tragic death which was > discovered yesterday morning. I'm deeply sorry to let you know that > Pat Burke, our long-time IT manager and network/systems administrator, > apparently took his life. Pat has been an incredibly conscientious, > much appreciated contributor to and friend in our community here, and > his loss leaves us all grieving. > > There will be a meeting this morning at 9:00 a.m. in Packard 101, at > which I will share the few details we know, and we can provide support > to each other in this difficult time. > > I've asked Carol Muller to be the point person for us in collecting > your thoughts about how we can best remember and recognize Pat's > substantial contributions to our work and friendship over the years. > We'll keep you informed about planning a memorial service. > > I want to provide again the information for you or others you may > notice who need support in dealing with this situation, about > resources available: > > Help Center 723-4577 > > Human Resources 736-9881 > > Office for Religious Life 723-1762 > > CAPS 723-3785 > > In situations like this I am glad that we're in a department where > people really care about each other, and that we will rally together > to help us all get through this difficult time. > > Your friend, > > Mark > > ------------------------------------------------------------------------ > > _______________________________________________ > eefaculty mailing list > eefaculty at lists.stanford.edu > https://mailman.stanford.edu/mailman/listinfo/eefaculty > -- Carol B. Muller, Ph.D. Department Manager, Electrical Engineering School of Engineering Packard 168 Stanford University Stanford, CA 94305 cbmuller at stanford.edu 650-723-4607 From mtang at stanford.edu Wed Jul 21 13:30:52 2010 From: mtang at stanford.edu (Mary Tang) Date: Wed, 21 Jul 2010 13:30:52 -0700 Subject: [POSSIBLE VIRUS:###] Memorial for Pat Burke (from Carol Muller) Message-ID: <25339_1279744252_4C4758FC_25339_1578_1_4C4758FC.5020100@stanford.edu> -------------- next part -------------- An embedded message was scrubbed... From: Carol Muller Subject: [Fwd: Pat Burke memorial service, Thursday, July 22, 4 p.m., Memorial Church, and related information] Date: Tue, 20 Jul 2010 18:09:16 -0700 Size: 5711 URL: From cearhart at stanford.edu Wed Jul 21 14:35:54 2010 From: cearhart at stanford.edu (Chris Earhart) Date: Wed, 21 Jul 2010 14:35:54 -0700 Subject: PhD Defense, Chris Earhart (July 28, Wednesday, 2010, CISX Auditorium 9:30 am) In-Reply-To: References: Message-ID: A Ph.D. Defense Announcement "Magnetic Sifter and Nanoparticles for Cell and Protein Separation" PhD Candidate: Chris Earhart Department of Materials Science and Engineering Advisor: Professor Shan X. Wang Date: Wednesday, July 28, 2010 Time: 9:30 am (refreshments at 9:15 am) Place: CIS-X Auditorium (Rm 101) Abstract: Nanoscience and nanotechnology have been applied in recent years to cancer research, with the goal of making a revolutionary change in the ways in which cancer is diagnosed and treated. Magnetic nanotechnologies, in particular, have shown significant potential in several areas such as imaging, therapeutics, and early detection. The topic of this presentation is a novel magnetic separation device, the magnetic sifter, and physically fabricated magnetic nanoparticles for applications in cell and protein separation. The magnetic sifter is a microfabricated planar die containing a dense array of pores (~200-5000/mm2) in a magnetically soft membrane. When magnetized by an external field, the sifter pores generate large magnetic field gradients near the pore edges, which capture nanoscale magnetic carriers during flow with high efficiency and throughput. The magnetic sifter is a microfluidic device, in the sense that it contains microfabricated, micron-scale pores for fluid flow. It is also a macrofluidic device, in that high-volume throughput is achieved by parallel flow through the large number of pores. When paired with magnetic carriers functionalized with recognition moieties, the magnetic sifter can be used in both cell and protein enrichment schemes. Separations of magnetically labeled tumor cells and individual magnetic nanoparticles using the sifter will be discussed. With its planar structure and presentation of captured cells, the sifter can also be used as a cell imaging platform. The use of the sifter to capture and quantify low concentrations (~100/mL) of tumor cells in whole blood samples has been demonstrated. Lastly, a method for high-throughput fabrication of novel magnetic carriers, synthetic antiferromagnetic (SAF) nanoparticles, will be presented. The method has enabled production of large quantities of SAF nanoparticles, which have desirable properties for applications in magnetic separation. The capture and release of SAF nanoparticles with the magnetic sifter has been shown. High capture efficiencies are achieved at flow rates 10-20x higher than what was previously possible with commercially available magnetic carriers. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Thu Jul 22 05:24:44 2010 From: mtang at stanford.edu (Mary Tang) Date: Thu, 22 Jul 2010 05:24:44 -0700 Subject: Fire Alarm, 7/22 Message-ID: <4C48388C.4080201@stanford.edu> Dear Labmembers -- There was a fire alarm at 2 am this morning which shut down most gases to the lab. The alarm was determined to be a detector malfunction in one of the Extension labs, so everything is OK. The alarm shut off most process gases to the lab. These, with the exception of dopant gases containing PH3, AsH3, or B2H6, have been turned back on. Maintenance staff will be here shortly and should be able to double-check everything. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From tberg at stanford.edu Thu Jul 22 13:37:32 2010 From: tberg at stanford.edu (Ted Berg) Date: Thu, 22 Jul 2010 13:37:32 -0700 Subject: Status of new tools Message-ID: <4C48AC0C.8060809@stanford.edu> Hello All, Just another quick update on the status of the tools. RTAs are almost completely facilitized ( we have to make a few minor changes to do for the county) Field service was in and checked operation and found no initial problems. Field service was in and did final assembly on the Fiji we are now just waiting on the county fire folks. Thanks again for the cooperation and patience. Ted From jprovine at stanford.edu Fri Jul 23 06:30:52 2010 From: jprovine at stanford.edu (J Provine) Date: Fri, 23 Jul 2010 06:30:52 -0700 Subject: ALD updates (savannah, fiji1, and fiji2) Message-ID: Hello all, as you are hopefully becoming aware the SNF is home to three new ALD chambers (namely savannah, fiji1, and fiji2). I am writing to give an update about these tools, the plans going forward, and to let you know about the new ALD quality circle. *ALD quality circle:* this is the most important element of this email because the quality circle will be the best way to gain further information about the ALD systems going forward. The quality circle will meet every other friday 10-11am in Allen 201 (starting next friday, July 30). The point of these meetings is to disseminate information about ALD in the SNF; address issues and concerns from the user community; propose new processes and capabilities; develop appropriate procedures and policy for the tools; and perform, monitor, and evaluate experiments as the ALD capability in SNF is expanded and developed. savannah: this thermal ALD system from cambridge nanotech was purchased as by Profs. HSP Wong, Howe, and Mitra as part of their nanomechanical logic grant from DARPA. It is semi-clean in status and currently operating with Al2O3, TiO2 films running well and TiN and WN underdevelopment. Lots more information including how to get trained can be found here: https://snf.stanford.edu/SNF/equipment/chemical-vapor-deposition/ald/savannah There are a couple of holes remaining concerning this documentation: the process results and the full list of recipe parameters. these will be completed when i return to stanford this weekend. any feedback about the documentation is appreciated. fiji1/fiji2: This is the new cambridge nanotech fiji f202 system that was purchased in 2010 with recovery act money through an NSF grant, some contributions by several faculty, the nano groups, and in collaboration with cambridge nanotech. fiji1 and fiji2 can operated independently and are identical other than that fiji1 is will be classified as clean and has an ozone generator, while fiji 2 will be classified as all materials and does not have ozone. if you feel the classification of fiji1 and fiji2 need to be flipped or changed, please come to the quality circle to discuss. fiji1/2 had their facilitization completed yesterday as noted in Ted Berg's update email. They are awaiting final permitting from the fire department, university, and county (by the time you read this some of these permits may already be in). The fiji system has both thermal and plasma ALD capable. once the permits are finalized, a representative from cambridge will be present to do a final check including deposition tests. these are the depositions tests that will be performed initially: fiji1: Al2O3 with h2O precursor; Al2O3 with ozone; Al2O3 with O2 plasma; HfO2 with h2o precursor; HfO2 with ozone; HfO2 with O2 plasma fiji2: Al2O3 with h2O precursor; Al2O3 with O2 plasma; HfO2 with h2o precursor; HfO2 with O2 plasma after successful completion of these films, the system will be immediately available for training. documentation similar to that of the savannah is currently in preparation. Numerous users excited for this new capability have already contacted me and i have a list for trainees that i will continue to add to based on a first come first served basis. The first films to be developed on the fiji system after the test films are as follows: TiO2, TiN, Pt, Ru, WN, ZrO2, SiO2 each of those films has an established fiji recipe from our partners at cambridge that have been developed on their fiji system. i were nice enough to let me run TiO2, HfO2, Al2O3, Pt, Ru, TiN, ZrO2, and SiO2 when i visited in them in late May. these films have been in the hands of various labmembers. the feedback has been positive for each so far. because of the previously established recipes we can expect these films to come along somewhat quickly although there will be significant effort necessary to characterize these films. those interested in helping should visit the quality circle meetings. after these films a longer term co-development with cambridge's help and input will be undertaken on: W, ITO, Ni, Cr, SrTiO3 and other films depending on the interest of the user community. the timeframe and effort required to develop these films is unknown (that's why it is research) but i would expect it to be substantial and not something one could realistically expect to happen within a few weeks. best guess for timeline: permitting: August 8 final qualification: August 15 training begins and availability of Al2O3 and HfO2: August 17 Availability of TiO2, TiN, Pt, Ru, WN: August 30 (these precursors have already been ordered or are already delivered to SNF availability of ZrO2 and SiO2: early September (these precursors still need to be ordered and find a champion for early development) availability of W, ITO, Ni, Cr, etc: sometime in the future (if you want to be involved to make it sooner, please let me know). well i think i've covered most of what i wanted to get out to everyone...and at this point i've typed a much longer email that anyone particularly likes to read. any and all feedback and question are welcome. if you happen to have read this far, pat yourself on the back and remember to be nice to your fellow man all day long. j ps. one final thing, please be careful when moving around the fiji system because the loadlock arms are fragile and should not be bumped into accidentally (well, actually they should not be bumped into on purpose either, but i thought that wasn't very likely). -------------- next part -------------- An HTML attachment was scrubbed... URL: From kyunglok at stanford.edu Fri Jul 23 13:57:22 2010 From: kyunglok at stanford.edu (Kyunglok Kim) Date: Fri, 23 Jul 2010 13:57:22 -0700 Subject: Question: Need to backside etch after about 3um LPCVD LTO deposition? Message-ID: Dear labmembers, I had deposited 3um LPCVD LTO on the silicon wafers. The next several steps for the wafers include ASML lithography and STS DRIE. In this case, should I etch out the oxide on the backside of Si wafers? Or can I use ASML and STS DRIE without backside etching on sample wafers? Thanks, Kyunglok -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Mon Jul 26 09:46:03 2010 From: mbaran at stanford.edu (Maureen Baran) Date: Mon, 26 Jul 2010 09:46:03 -0700 Subject: Process Clinic CANCELLED for today ONLY - Returning on August 9th @ 2:00P Message-ID: <003b01cb2ce2$096731a0$1c3594e0$@edu> Dear Lab Members, Due to Vacation schedules the Process Clinic that was scheduled for today at 2:00P has been cancelled. It will be back on schedule, August 9th at 2:00P. Maureen Maureen Baran Stanford Nanofabrication Facility Lab Services Administrator mbaran at stanford.edu 650-725-3664 -------------- next part -------------- An HTML attachment was scrubbed... URL: From cearhart at stanford.edu Tue Jul 27 10:43:04 2010 From: cearhart at stanford.edu (Chris Earhart) Date: Tue, 27 Jul 2010 10:43:04 -0700 Subject: Reminder - PhD Defense, Chris Earhart Message-ID: A Ph.D. Defense Announcement "Magnetic Sifter and Nanoparticles for Cell and Protein Separation" PhD Candidate: Chris Earhart Department of Materials Science and Engineering Advisor: Professor Shan X. Wang Date: Wednesday, July 28, 2010 Time: 9:30 am (refreshments at 9:15 am) Place: CIS-X Auditorium (Rm 101) Abstract: Nanoscience and nanotechnology have been applied in recent years to cancer research, with the goal of making a revolutionary change in the ways in which cancer is diagnosed and treated. Magnetic nanotechnologies, in particular, have shown significant potential in several areas such as imaging, therapeutics, and early detection. The topic of this presentation is a novel magnetic separation device, the magnetic sifter, and physically fabricated magnetic nanoparticles for applications in cell and protein separation. The magnetic sifter is a microfabricated planar die containing a dense array of pores (~200-5000/mm2) in a magnetically soft membrane. When magnetized by an external field, the sifter pores generate large magnetic field gradients near the pore edges, which capture nanoscale magnetic carriers during flow with high efficiency and throughput. The magnetic sifter is a microfluidic device, in the sense that it contains microfabricated, micron-scale pores for fluid flow. It is also a macrofluidic device, in that high-volume throughput is achieved by parallel flow through the large number of pores. When paired with magnetic carriers functionalized with recognition moieties, the magnetic sifter can be used in both cell and protein enrichment schemes. Separations of magnetically labeled tumor cells and individual magnetic nanoparticles using the sifter will be discussed. With its planar structure and presentation of captured cells, the sifter can also be used as a cell imaging platform. The use of the sifter to capture and quantify low concentrations (~100/mL) of tumor cells in whole blood samples has been demonstrated. Lastly, a method for high-throughput fabrication of novel magnetic carriers, synthetic antiferromagnetic (SAF) nanoparticles, will be presented. The method has enabled production of large quantities of SAF nanoparticles, which have desirable properties for applications in magnetic separation. The capture and release of SAF nanoparticles with the magnetic sifter has been shown. High capture efficiencies are achieved at flow rates 10-20x higher than what was previously possible with commercially available magnetic carriers. From shott at stanford.edu Wed Jul 28 08:38:01 2010 From: shott at stanford.edu (John Shott) Date: Wed, 28 Jul 2010 08:38:01 -0700 Subject: Roof painting and possible odors in the lab .... Message-ID: <4C504ED9.5090209@stanford.edu> SNF Lab Members: As you likely know, this building is in the process of getting it's roof painted. Particularly when they are painting the west side (above the loading dock) which is very close to the air intakes, there is a chance that odors from that activity will enter the lab. The folks from facilities and the contractor have provided us both with a detailed schedule of the job and with the MSDS sheets for the paint they are using. I have attached those documents. It appears as if this Thursday and next Monday and Tuesday will be the days when painting will be happening on the west side of the building. Based on the MSDS sheets, the materials that are being used are water based and noticeably less toxic than a number of products. That said, they do have a small component (0.1% by weight) of aqueous ammonia and the color component also contains nearly 2% by weight of ethylene glycol (anti-freeze in your car is approximately 50% ethylene glycol). There may be some of these odors in the lab and we will be doing out best to be aware of how strong the odor is. However, if you find these odors irritating or if you find that you develop either a headache or nausea let a staff member know and get out of the lab into nice fresh air. Thank your for your consideration, John -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS_09_COLOR.pdf Type: application/pdf Size: 18561 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 2 WEEK SCHEDULE 7-27-1.pdf Type: application/pdf Size: 16321 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: MSDS_09_CLEAR ACRYLIC BASE.pdf Type: application/pdf Size: 18484 bytes Desc: not available URL: From rfasch at stanford.edu Wed Jul 28 22:01:56 2010 From: rfasch at stanford.edu (Rainer Fasching) Date: Wed, 28 Jul 2010 22:01:56 -0700 Subject: FW: Guest lectrure - Dr. Craig Horn - flow batteries for grid storage Message-ID: <001101cb2edb$2bac0380$83040a80$@edu> Dear Labmembers: Just in case you have time and you are interested in flow batteries - please see below - you are more than welcome to join the talk. Best regards, Rainer Fasching Where: HP teaching center Room 101 When: Tuesday form 10am-11am. From: Rainer Fasching [mailto:rfasch at stanford.edu] Sent: Wednesday, July 28, 2010 9:57 PM To: Su10-ME-420-01 Subject: Guest lectrure - Dr. Craig Horn - flow batteries for grid storage An announcement has been added in the "Su10-ME-420-01 Applied Electrochemistry at Micro- and Nanoscale with focuse on batterie systems" site at Coursework 5 (https://coursework.stanford.edu/portal/site/Su10-ME-420-01) Subject: Guest lectrure - Dr. Craig Horn - flow batteries for grid storage From: Rainer Fasching Date: Jul 28, 2010 9:56 pm Message: All: As mentioned in class Craig Horn will give a guest lecture about flow batteries tomorrow in. He is the cofounder and CEO of EnerVault, a company that devlopes energy storage solution for grid stabilization. I look forward to his talk. Below for your informaton his BIO. Dr Horn is start-up veteran in areas of renewable energy, fuel cells, batteries, telecom, and nanotechnology. He has more than 20 years of experience working with renewable energy technologies overlapping with 9 years in nanotechnology. Majority of his career he spent in ground-level projects (synchrotron radiation spectroscopy of Li-ion materials, nanoscale material based Li-ion components, nanoscale material deposition of active glass films for telecom components, disruptive manufacturing of fuel cell stacks) resulting in 15 US patents awarded, over 14 US applications pending, and numerous international patents. Lectured on energy storage and flow battery technologies at Stanford, UC Berkeley, national laboratories, and utilities. See you tomorrow in class, Rainer Fasching _____ This automatic notification message was sent by Coursework 5 (https://coursework.stanford.edu/portal) from the Su10-ME-420-01 site. You can modify how you receive notifications at My Workspace > Preferences. -------------- next part -------------- An HTML attachment was scrubbed... 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Name: ATT00015.txt URL: From jprovine at stanford.edu Thu Jul 29 06:37:58 2010 From: jprovine at stanford.edu (J Provine) Date: Thu, 29 Jul 2010 06:37:58 -0700 Subject: ALD updates (savannah, fiji-l, and fiji-r) Message-ID: Dear SNFers, this time a shorter update on the ald status in the snf. *quality circle*: first meeting this friday at 10am in allen 101. note the location change compared to what was announced previously. *savannah*: system now on coral. the documentation is finished as it currently stands. changes were: 1) corrected QC meeting location; 2) full, annoted list of ALD recipe commands; 3) standard recipes delineated and annotated; and 4) process monitoring data added. training is open for those interested. see the website ( https://snf.stanford.edu/SNF/equipment/chemical-vapor-deposition/ald/savannah) for all pertinent information and provide any feedback you wish. *fiji1 and fiji2*: as john shott astutely pointed out fiji1 and fiji2 were not easily differentiable, so instead we have fiji-l (left chamber when facing the load lock end of the system - this is the one with ozone and is currently slated as the clean chamber) and fiji-r (right chamber when facing the load lock end of the chamber). the chambers under fiji-l and fiji-r are on coral. those who have emailed me are on the training list. it is very helpful to know your desired materials and cleanliness level to plan accordingly. the system is still in permitting limbo and i hope to have further information soon regarding that status. thank you and have a great day. j -------------- next part -------------- An HTML attachment was scrubbed... URL: From rfasch at stanford.edu Wed Jul 28 22:36:07 2010 From: rfasch at stanford.edu (Rainer Fasching) Date: Wed, 28 Jul 2010 22:36:07 -0700 Subject: Guest lectrure - Dr. Craig Horn - flow batteries for grid storage Message-ID: <000001cb2edf$f2224cf0$d666e6d0$@edu> Dear Labmembers: Just in case you have time and you are interested in flow batteries - please see below - you are more than welcome to join the talk. Best regards, Rainer Fasching Where: HP teaching center Room 101 When: Tuesday form 10am-11am. From: Rainer Fasching [mailto:rfasch at stanford.edu] Sent: Wednesday, July 28, 2010 9:57 PM To: Su10-ME-420-01 Subject: Guest lectrure - Dr. Craig Horn - flow batteries for grid storage An announcement has been added in the "Su10-ME-420-01 Applied Electrochemistry at Micro- and Nanoscale with focuse on batterie systems" site at Coursework 5 (https://coursework.stanford.edu/portal/site/Su10-ME-420-01) Subject: Guest lectrure - Dr. Craig Horn - flow batteries for grid storage From: Rainer Fasching Date: Jul 28, 2010 9:56 pm Message: All: As mentioned in class Craig Horn will give a guest lecture about flow batteries tomorrow in. He is the cofounder and CEO of EnerVault, a company that devlopes energy storage solution for grid stabilization. I look forward to his talk. Below for your informaton his BIO. Dr Horn is start-up veteran in areas of renewable energy, fuel cells, batteries, telecom, and nanotechnology. He has more than 20 years of experience working with renewable energy technologies overlapping with 9 years in nanotechnology. Majority of his career he spent in ground-level projects (synchrotron radiation spectroscopy of Li-ion materials, nanoscale material based Li-ion components, nanoscale material deposition of active glass films for telecom components, disruptive manufacturing of fuel cell stacks) resulting in 15 US patents awarded, over 14 US applications pending, and numerous international patents. Lectured on energy storage and flow battery technologies at Stanford, UC Berkeley, national laboratories, and utilities. See you tomorrow in class, Rainer Fasching _____ This automatic notification message was sent by Coursework 5 (https://coursework.stanford.edu/portal) from the Su10-ME-420-01 site. You can modify how you receive notifications at My Workspace > Preferences. -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Jul 29 14:31:04 2010 From: shott at stanford.edu (John Shott) Date: Thu, 29 Jul 2010 14:31:04 -0700 Subject: Update on electrical outage and electrical tests for tomorrow morning at 7 a.m. Message-ID: <4C51F318.8080609@stanford.edu> SNF Lab Members and Allen Building Residents: As a number of you know, last evening we experienced an electrical outage that caused a loss of power to about half of the building. It is my understanding that his has been traced to a ground current fault that was detected by one of the two main circuit breakers in the building. FacOps and the campus electrical shop have restored as much of the power as they can and now believe that the failure was likely caused by one of six lighting circuits. Those six lighting circuits are still off and will not likely be restored until tomorrow morning. Tomorrow morning at 7 a.m., the electrical shop will restore power to each of the six lighting circuits one at a time to see if they can identify the troublesome circuit. This means that there is the very real chance that this experiment will trip the same main breaker once again. While we hope that will not happen, we will at least know for certain which of the lighting circuits is at fault. Because of the risk that power may go off again tomorrow morning, it is my recommendation that folks planning to use the lab or other sensitive equipment plan around this time period. Specifically, I recommend that you not be using equipment between about 7 a.m. and 8 a.m. tomorrow morning for fear that your run may be interrupted and equipment may shutdown in an unplanned fashion. We apologize for this inconvenience and hope that we will be able to find the faulty circuit and resolve this issue so that it does not cause further interruptions. Thank you for your continued support, John From shott at stanford.edu Fri Jul 30 07:41:17 2010 From: shott at stanford.edu (John Shott) Date: Fri, 30 Jul 2010 07:41:17 -0700 Subject: Lighting circuits restored .... Message-ID: <4C52E48D.2010004@stanford.edu> SNF Lab Members: All lighting circuits in the lab have been successfully restored without causing any additional power outages. The lab should be fully functional and you should be able to resume full process activity without fear of another building-wide power failure. Thank you for your continued support, John