Regarding metal etching.
chandran at stanford.edu
Wed Mar 30 14:31:15 PDT 2011
This is a question for all who are/will be interested in metal etching. We
are in the process of nailing down the specs for a new inductively coupled
plasma metal etcher for SNF. I would like to solicit input from lab members
as to what would be critical for them.
In the wish list we already have the following:
Metals to be etched :
Au,Ag,Pt, Ti, Cr, Ni, Al
4" to pieces
up to 400nm
5% over wafer
Shooting for <5nm rms. Seems like it varies a lot with metals and chemistry
vs sputter etc.
Depends on chemistry and metal. Quite a range
Please go ahead and add whatever you feel is important so that we can try to
include it in the new system.
Thanks a lot,
Materials Science & Engineering
476 Lomita Mall,McCullough Building
Stanford CA 94305-4045
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