From mtang at stanford.edu Mon Oct 3 09:07:12 2011 From: mtang at stanford.edu (Mary Tang) Date: Mon, 03 Oct 2011 09:07:12 -0700 Subject: Reminder: Labmembers' meeting today, 2 pm Message-ID: <4E89DDB0.7040801@stanford.edu> Dear Labmembers -- Just a reminder that there is a Labmember Community meeting today, at 2 pm, in the Allen X Auditorium. On the agenda: - Welcome and state of the lab -12/14/11-1/31/12 lab shutdown/renovation and what it means to you - New tools in the lab - New organizational chart - Lab safety - Open Q&A Hope you can make it -- slides will be posted for those who can't.' Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From sbasumal at stanford.edu Mon Oct 3 11:09:27 2011 From: sbasumal at stanford.edu (Shrestha Basu Mallick) Date: Mon, 3 Oct 2011 11:09:27 -0700 Subject: PhD Oral Examination - Design and Fabrication of Nanostructures for Light Manipulation in Solar Cells and MicroElectroMechanical Systems (Mon. Oct10, 3:00pm, CIS-X 101) Message-ID: Department of Applied Physics University PhD Dissertation Defense Design and Fabrication of Nanostructures for Light Manipulation in Solar Cells and MicroElectroMechanical Systems Shrestha Basu Mallick Research Advisor: Professor Mark Brongersma Monday October 10, 2011 @3:00 pm (Refreshments served @2:45 pm) Location: Allen Building, (Formerly CIS-X), Room 101 ABSTRACT This talk is about nano-structuring of semiconductor devices for the improvement of their optical properties. The phenomenon of guided resonances in photonic crystal (PC) slabs will be discussed and ways of engineering these guided resonances for a variety of applications such as improved reflectivity in micro-electro-mechanical (MEMS) mirrors and increased absorption in thin-film solar cells will be discussed. The first part of the talk will focus on the application of PCs in MEMS. A new process (GOPHER) that was developed to make low stress PCs out of monolithic silicon will be discussed. The advantage and ease of making multilayer PCs with Gopher will be illustrated and experimental results showing Gopher structures having spectra with broadband reflectivity (suitable for mirror applications) as well as sharp peaks ( suitable for sensors) will be presented. Other applications of Gopher such as making waveguides etc will be briefly discussed. The integration of a high quality PC mirror with a 1D resonant MEMS scanner will be demonstrated. Finally, the results of fabrication of a prototype wafer-scale encapsulated optical device will be shown. The Gopher process has a lot of potential for facilitating the integration of micro and nanoscale photonics with CMOS circuitry. ** **** **** **The second part of the talk will focus on the application of PCs for light-trapping in solar cells. Thin-film photovoltaics has the potential to reduce cost by reducing the amount of photoactive material required and allowing for the use of material of poorer quality. Crystalline Silicon (c-Si) is an attractive material for photovoltaic cells due to its natural abundance, nearly ideal band gap, and leverage of existing process and materials knowledge. However, the poor optical absorption in the near-infrared spectral range requires the use of very efficient light trapping techniques. One such technique that is explored is to pattern the active layer into a 2D PC. Electromagnetic simulations are performed to show that an enhancement in integrated short-circuit current by a factor of 3 is possible when compared to a planar slab of equivalent volume. This is because the PC supports guided resonances into which incident radiation can couple which increases the absorption. Finally, the fabrication of an ultrathin c-Si solar cell where the active material is patterned into a square-lattice 2D PC is demonstrated. Both short-circuit current and external quantum efficiency measurements show an enhancement in optical absorption, especially at longer wavelengths. Scanning photocurrent maps confirm the improved optical absorption in the photonic crystal regions. Future applications of nanostructuring to thin-film cells that can be commercially realized will be discussed. -------------- next part -------------- An HTML attachment was scrubbed... URL: From suyog at stanford.edu Tue Oct 4 05:35:58 2011 From: suyog at stanford.edu (Suyog Gupta) Date: Tue, 4 Oct 2011 05:35:58 -0700 Subject: Wet etching TiW? Message-ID: Dear Labmembers, I was wondering if anybody has tried wet etching TiW? I have about 100nm of TiW on Al2O3 that I need to wet etch. H2O2 seems to work but the etch rate at room temperature turned out to be too slow ~ 3 nm/min. If you have any suggestions, please let me know! Thanks, Suyog -------------- next part -------------- An HTML attachment was scrubbed... URL: From jimkruger at yahoo.com Tue Oct 4 06:55:40 2011 From: jimkruger at yahoo.com (jim kruger) Date: Tue, 4 Oct 2011 06:55:40 -0700 (PDT) Subject: Wet etching TiW? In-Reply-To: References: Message-ID: <1317736540.10973.YahooMailNeo@web38906.mail.mud.yahoo.com> Heat to 40 or 50 C for greater rate is standard. Resist adhesion may be an issue, re-bake on a hot plate just before etch and repeat if you dry it off for inspection and then etch more. jim ________________________________ From: Suyog Gupta To: labmembers at snf.stanford.edu Sent: Tuesday, October 4, 2011 5:35 AM Subject: Wet etching TiW? Dear Labmembers, I was wondering if anybody has tried wet etching TiW? I have about 100nm of TiW on Al2O3 that I need to wet etch. H2O2 seems to work but the etch rate at room temperature turned out to be too slow ~ 3 nm/min. If you have any suggestions, please let me know! Thanks, Suyog -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Tue Oct 4 20:11:20 2011 From: mtang at stanford.edu (Mary Tang) Date: Tue, 04 Oct 2011 20:11:20 -0700 Subject: Venture Clinic, Wed, 10/5, 5 pm, Allen 101 Message-ID: <4E8BCAD8.5000700@stanford.edu> Dear labmembers -- If you are interested in learning about the whole mysterious business of venture capital, Gavin McCraley from Morrison& Foerster and Shahin Farschi from Lux Capital will be on hand to answer your questions. The Venture clinic will be Wednesday, 10/5 at 5 pm in the Allen 101 conference room and is open to all. Contact info for our guest hosts: Shahin Farshchi, Ph.D. http://www.luxcapital.com C: 925.323.2784 and Gavin McCraley Morrison& Foerster LLP Direct: 650-813-4105 gmccraley at mofo.com -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Wed Oct 5 16:19:20 2011 From: mtang at stanford.edu (Mary Tang) Date: Wed, 05 Oct 2011 16:19:20 -0700 Subject: Reminder: SNF Venture Clinic, today at 5 pm Message-ID: <4E8CE5F8.3@stanford.edu> Dear labmembers -- If you are interested in learning about the whole mysterious business of venture capital, Gavin McCraley from Morrison& Foerster and Shahin Farschi from Lux Capital will be on hand to answer your questions. The Venture clinic will be Wednesday, 10/5 at 5 pm in the Allen 101 conference room and is open to all. Contact info for our guest hosts: Shahin Farshchi, Ph.D. http://www.luxcapital.com C: 925.323.2784 and Gavin McCraley Morrison& Foerster LLP Direct: 650-813-4105 gmccraley at mofo.com -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From toecutter4ranger at gmail.com Fri Oct 7 15:20:00 2011 From: toecutter4ranger at gmail.com (ToeCutter) Date: Fri, 7 Oct 2011 15:20:00 -0700 Subject: Wet etching TiW? In-Reply-To: References: Message-ID: <8A1DE0DA-093D-40D0-8713-F3F6E614AC7B@gmail.com> I used to etch off pallets coated with TiW and Au with heated H2O2 at 40 degrees C followed by Au Anodic etch. This was on a SLOAN sputter tool. JWC On Oct 4, 2011, at 5:35 AM, Suyog Gupta wrote: > Dear Labmembers, > > I was wondering if anybody has tried wet etching TiW? I have about > 100nm of TiW on Al2O3 that I need to wet etch. > H2O2 seems to work but the etch rate at room temperature turned out > to be too slow ~ 3 nm/min. If you have any suggestions, please let > me know! > > Thanks, > Suyog From mtang at stanford.edu Sat Oct 8 07:42:36 2011 From: mtang at stanford.edu (Mary Tang) Date: Sat, 08 Oct 2011 07:42:36 -0700 Subject: SNF Renovation: Lab Storage Cleanup,Part 1-Oct. 24 Message-ID: <4E90615C.5080702@stanford.edu> Dear labmembers -- Please be aware that the upcoming SNF renovation begins in two weeks -- and we need your help! - CAD Room Storage by Oct. 24: This room will become the new maintenance workshop. Make sure to remove all your personal items from the CAD room (Allen 151) by Oct. 24. Undated items or Items in boxes dated more than one year ago are subject to immediate removal. All boxes and items not removed by Oct. 24 are subject to disposal. If you are from off-campus, are NOW ACTIVELY working in the lab and require access to your items, let us know and we will find temporary storage space. - Cubicle area by Oct. 24: This area will be reconfigured to accommodate displaced staff members and existing occupants. All personal items must be removed so planning may begin. The area will remain available for use by visitors and consultants until it is reconfigured, but all personal items should be removed and stored safely off-site. Part 2 of the lab storage cleanup will be on Dec. 12. By 9 am, all personal items must be removed from the lab storage bins and wip racks. The renovation involves extensive construction on the HEPA's and space above them, so your personal items will be safer outside the lab. We also need space to accommodate four new etchers, so storage bins will be reconfigured and reassigned when the lab reopens. Just a reminder that construction begins on 12/15/11. Individual tools will be shut down before then as we stage for the long term shutdown; we will post plans as they are finalized. The lab will be open for occupancy on Feb. 1, 2012, but be aware that this is when staff is allowed back into the lab. There will be a startup period as tools are brought back online. If you have any questions, please contact any staff member. Regular lab renovation updates will be posted on the website starting next week. Thanks for your attention -- Your SNF Staff From robert.chen at stanford.edu Sun Oct 9 18:43:06 2011 From: robert.chen at stanford.edu (Robert Chen) Date: Sun, 9 Oct 2011 18:43:06 -0700 Subject: Etching Away HSQ Message-ID: Hi Labmembers, Does anyone have experience etching away HSQ masks patterned using e-beam? Looking for recipes, etch rates, and general considerations. Thanks, Robert Chen Electrical Engineering Ph.D. Candidate Harris MBE Group, Stanford University http://robochen.web.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From charles.w.holzwarth at intel.com Mon Oct 10 08:41:42 2011 From: charles.w.holzwarth at intel.com (Holzwarth, Charles W) Date: Mon, 10 Oct 2011 08:41:42 -0700 Subject: Etching Away HSQ In-Reply-To: References: Message-ID: <1F4FECD144773542BDCD65C1A82CE1F8A0EA58AB@orsmsx502.amr.corp.intel.com> Robert, HSQ is basically a very low quality SiOx after ebeam pattering so HF works great to remove it. In my previous work in Si photonics this was complicated by the fact that the BOX layer of the SOI wafer was exposed when the HSQ was to be removed. I found that an SC-1 clean followed by a 4 min dip in 0.125% solution of HF was enough to remove my HSQ etch mask without significantly etching the BOX. How easy it is to remove the HSQ can vary significantly depending on the e-beam dose used and other processes the HSQ will see. For example annealing the HSQ after development will make it significantly harder to remove. My HSQ for the process above was exposed with a dose of 1500uC/cm^2 developed by 25% TMAH and used as an etch mask during RIE using HBr as the etch gas before I removed it. Best regards, Charles From: robertatx at gmail.com [mailto:robertatx at gmail.com] On Behalf Of Robert Chen Sent: Sunday, October 09, 2011 6:43 PM To: labmembers at snf.stanford.edu Subject: Etching Away HSQ Hi Labmembers, Does anyone have experience etching away HSQ masks patterned using e-beam? Looking for recipes, etch rates, and general considerations. Thanks, Robert Chen Electrical Engineering Ph.D. Candidate Harris MBE Group, Stanford University http://robochen.web.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Oct 10 12:03:05 2011 From: jwc at snf.stanford.edu (James W. Conway) Date: Mon, 10 Oct 2011 12:03:05 -0700 Subject: Etching Away HSQ In-Reply-To: References: Message-ID: <4E934169.7030603@snf.stanford.edu> 2% HF (1:50) like we have on wbnonmetal and BOE will both etch off HSQ. I normally perform a Piranha clean in the 9:1 H2SO4:H2O2 before the HF dip to remove organics... See me if you have questions during my office hours. James On 10/9/2011 6:43 PM, Robert Chen wrote: > Hi Labmembers, > > Does anyone have experience etching away HSQ masks patterned using > e-beam? Looking for recipes, etch rates, and general considerations. > > Thanks, > > Robert Chen > Electrical Engineering Ph.D. Candidate > Harris MBE Group, Stanford University > http://robochen.web.stanford.edu From rsnyder at stanford.edu Wed Oct 12 10:07:22 2011 From: rsnyder at stanford.edu (Rebecca Lee Snyder) Date: Wed, 12 Oct 2011 10:07:22 -0700 (PDT) Subject: Volunteer Opportunity - Help BGC Students w/ College & Scholarship Applications Message-ID: <1621812839.1611784.1318439242124.JavaMail.root@zm08.stanford.edu> ** Volunteer Opportunity ** Are you interested in helping high school students at the Boys and Girls Club with their college and scholarship application essays? Having been through the application process successfully, your help is exactly what these kids need! Trust us, you?re qualified!! We?re currently seeking volunteer tutors for one-on-one mentoring to help students develop their ideas and personal histories into essays to be used in scholarship and college applications. Commitment specifics: *one hour of mentor training *hour-long sessions with mentee (specific day tbd - please specify availability) *sessions will be one evening per week *program will last for the remainder of fall quarter If you are interested in volunteering or learning more about the program please contact us at rsnyder at stanford.edu (Becky) or andreina at stanford.edu (Andreina). This is a great opportunity to pass on your own experiences and to help others achieve success! -- Rebecca L. Snyder Ph.D. Candidate Department of Bioengineering Heilshorn Biomaterials Group Stanford University From tberg at stanford.edu Fri Oct 14 11:03:07 2011 From: tberg at stanford.edu (Ted Berg) Date: Fri, 14 Oct 2011 11:03:07 -0700 Subject: STS Dep and Epi shutdown Wed. Oct. 19 for gas tie ins Message-ID: <4E98795B.5010802@stanford.edu> Hello All, STSdep and Epi will be shut down on Wed. Oct 19 for gas line tie ins for the new CCP and ICP tools. Hopefully back up by the afternoon. Ted From mtang at stanford.edu Fri Oct 14 11:26:50 2011 From: mtang at stanford.edu (Mary Tang) Date: Fri, 14 Oct 2011 11:26:50 -0700 Subject: Renovation Countdown: 61 days! Message-ID: <4E987EEA.50008@stanford.edu> Dear labmembers -- Please be reminded that the upcoming SNF renovation begins shortly -- we need your help! - CAD Room Storage by Oct. 24: This will become the new maintenance workshop. Make sure to remove all your personal items from the CAD room (Allen 151) by Oct. 24. Undated items or Items in boxes dated > one year have been removed. Items not removed by Oct. 24 are subject to disposal. If you are from off-campus, are NOW ACTIVELY working in the lab and require access to your items, let us know and we will find temporary storage space. - ASML/SNF Visitor/Consultant Cubicle area by Oct. 24: This area will be reconfigured to accommodate displaced staff members and existing occupants. All personal items must be removed so planning may begin. The area will remain available for use by visitors and consultants until it is reconfigured, but all personal items should be removed and stored safely off-site. Part 2 of the lab storage cleanup will be on Dec. 12. By 9 am, all personal items must be removed from the lab storage bins and wip racks. The renovation involves extensive construction on the HEPA's and space above them, so your personal items will be safer outside the lab. We also need space to accommodate four new etchers, so storage bins will be reconfigured and reassigned when the lab reopens. Just a reminder that construction begins on 12/15/11. Individual tools will be shut down before then as we stage for the long term shutdown; we will post plans as they are finalized. The lab will be open for occupancy on Feb. 1, 2012, but be aware that this is when staff is allowed back into the lab. There will be a startup period as tools are brought back online. If you have any questions, please contact any staff member. Thanks for your attention -- Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Fri Oct 14 13:41:10 2011 From: mtang at stanford.edu (Mary Tang) Date: Fri, 14 Oct 2011 13:41:10 -0700 Subject: Maskmaking Clinic, Tuesday, 10/18/11 Message-ID: <4E989E66.6000701@stanford.edu> Hi all -- If you have any photomask making questions, you can pose them to an expert. Bill Martin, who represents the qualified photomask providers for SNF, will be here next Tuesday afternoon, from 3:15-4:30, to meet with anyone interested in knowing about masks, how they are made, and how to purchase them. He will be in the cubicle area next to Maureen's office. He can also be reached at: Billm at Compsus.com -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mbaran at stanford.edu Mon Oct 17 14:02:07 2011 From: mbaran at stanford.edu (Maureen Baran) Date: Mon, 17 Oct 2011 14:02:07 -0700 (PDT) Subject: Cell Phone Found in the Ladies Bathroom on 1st Floor Across from the Gowning Room of the Lab Message-ID: <00b901cc8d10$0c554610$24ffd230$@stanford.edu> Dear All, A cellular phone was found in the ladies room on the first floor of the Allen Building across from the entrance to the lab. If it's yours please come and pick it up from me. I'm in cubicle # 41. I'm closest to the side doors facing the construction site. Thank you, Maureen -------------- next part -------------- An HTML attachment was scrubbed... URL: From jcdoll at stanford.edu Tue Oct 18 12:22:10 2011 From: jcdoll at stanford.edu (Joey Doll) Date: Tue, 18 Oct 2011 12:22:10 -0700 Subject: Gram gauge for wirebonder force calibration? Message-ID: Hi Labmembers - Does anyone have a gram gauge that I could borrow to calibrate the force applied by a wirebonder? I'm using a Westbond 7400E to wirebond thin (50nm) metal bondpads, and the tool has a tendency to punch through the electrode and short to another layer below it. I've tried adjusting the power/time and switching from ultrasonic to thermocompression/thermosonic to no avail. If you have a gauge or experience working with thin bondpads please let me know. Thanks! - joey -------------- next part -------------- An HTML attachment was scrubbed... URL: From klharris at stanford.edu Tue Oct 18 16:46:26 2011 From: klharris at stanford.edu (Kimberly L. Harrison) Date: Tue, 18 Oct 2011 16:46:26 -0700 Subject: Keyence Microscope Demo Wednesday 4:15 in Allen 101 Message-ID: Hi Everyone, Keyence will be doing a demo of their digital microscopes tomorrow (Wednesday) at 4:15 in Allen 101. I have requested a demo for two products: VH-Z500 (500x-5000x) and VH-Z100 (100x-1000x). We hope they can demonstrate the imaging of some NEMS/MEMS devices while they are here, so perhaps bring some of your own devices if you are curious about their capabilities. For more information about Keyence's lenses: http://www.digitalmicroscope.com/solutions/vhx1000_lens/rzlens.php Best, Kim -------------- next part -------------- An HTML attachment was scrubbed... URL: From petousis at stanford.edu Tue Oct 18 17:36:36 2011 From: petousis at stanford.edu (Yannis Petousis) Date: Tue, 18 Oct 2011 17:36:36 -0700 (PDT) Subject: Potential Suppliers for Silicon Wafers with P-N Pattern In-Reply-To: <641474372.1811762.1318977667867.JavaMail.root@zm04.stanford.edu> Message-ID: <1277360249.1818871.1318984596425.JavaMail.root@zm04.stanford.edu> We need a silicon wafer with a large number of exposed lateral p-n junctions (10-100nm wide) on the surface of the wafer. The actual pattern is not so important but a simple design we could think of, was alternating p and n strips that extend laterally on the wafer surface (the longer the strips, the better), i.e. if you were to look on our wafer from the top, you should see a "zebra" pattern of p and n. In other words, the top view should look similar to the cross-section of a different wafer which has stacked p and n layers vertically. Dopant and orientation are not particularly important. Do you know of any suppliers that would be able to fabricate this? Thanks, Yannis From rthowe at stanford.edu Wed Oct 19 21:42:09 2011 From: rthowe at stanford.edu (Roger T. Howe) Date: Wed, 19 Oct 2011 21:42:09 -0700 Subject: seminar next Monday 4-5 on next-gen PV Message-ID: <4E9FA6A1.6060007@stanford.edu> All, Greg Nielson of Sandia - Albuquerque will be giving a seminar on Sandia's microsystems-enabled PV project. See the attached flyer. Allen 101X Auditorium, 4-5. Roger -------------- next part -------------- A non-text attachment was scrubbed... Name: Greg.Nielson.Seminar.Oct24.2011.pdf Type: application/binary Size: 1903800 bytes Desc: not available URL: From mtang at stanford.edu Fri Oct 21 16:08:51 2011 From: mtang at stanford.edu (Mary Tang) Date: Fri, 21 Oct 2011 16:08:51 -0700 Subject: Individual Tool Shutdowns over the next two weeks Message-ID: <4EA1FB83.1030105@stanford.edu> Dear labmembers -- Pre-renovation construction begins Monday. One project will involve shutting down the process cooling water in different fingerwalls throughout the lab. Individual tools have been reserved according to the project schedule; we'll do our best to keep everyone informed of changes. The schedule for shutdown is as follows: Monday, 10/24 - tylans1-4, fga2 bank Tuesday, 10/25 - tylannitride, tylanbpsg, tylansige, teos2, tylanpoly, thermcolto, thermcopoly1/2, thermconitride1, thermco1/2 Wed. 10/26 - drytek2, pquest, amtetcher Thur, 10/27 - lampoly, intlvac_evap, intlvac_sputter, tel Fri, 10/28 - stsetch, drytek4, mrc Mon, 10/31 - gryphon, innotec, p5000etch Tue, 11/1 - stsetch2, matrix, metalica, sts dep, savannah, fiji-l/r Thur, 11/3 - asml The contractors will begin work on the cooling water lines at 7 am and expect to end by 3 pm each day. Staff may need to shutdown tools earlier to prepare for the work and may need extra time to bring them back up afterward, depending on the individual tool. Updates for individual tools will be posted on Coral. Thanks for your patience -- after two years of planning, renovation construction begins!! Your SNF staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Fri Oct 21 16:56:43 2011 From: mtang at stanford.edu (Mary Tang) Date: Fri, 21 Oct 2011 16:56:43 -0700 Subject: Renovation Countdown: 55 days! Message-ID: <4EA206BB.3030805@stanford.edu> Labmembers -- Pre-renovation construction begins Monday.... And YOU can help! CAD Room and SNF cubicle area cleanup- Monday, 10/24: Remove all personal items from Allen 151 and the SNF cubicle farm. If you are actively working in the lab and need access to these items, let a staff member know and we'll make arrangements. Otherwise, anything that is unclaimed may be disposed of. (Please note that the SNF cubicle area refers only to the cube farm containing Maureen's office, not the student office areas.) Lab bin cleanup - Monday, 12/12: Remove all personal items from the lab by this time. This includes items in lab bins, WIP racks, shared storage, personal glass ware shelves, etc. Remember, there will be heavy construction in the lab, so protect your belongings. Any items left in the lab may and probably will be removed. Personal chemicals can remain in flammables cabinets. The chemicals refrigerator, however, will be without power during part of the renovation so contact staff about protecting critical chemicals. There will be no lab bin charges for Dec/Jan; bins will be reassigned when the lab reopens. Red lockers - If you have a locker, you might want to empty it -- because on 12/15, the locker corridor will become the staging area for lab construction and will be blocked. Any questions or concerns, let us know -- plans are coming together, but there are no doubt many details which still need to be worked out. Thanks for your attention -- Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From ywidjaja at stanfordalumni.org Fri Oct 21 21:44:39 2011 From: ywidjaja at stanfordalumni.org (Yuniarto Widjaja) Date: Fri, 21 Oct 2011 21:44:39 -0700 Subject: no flammable gas Message-ID: FYI, just saw a note from Mary posted on the lab entrance door that some of the flammable gas (SiH4, DCS, etc.) are out for the time being. Just thought of sending out this email since I didn't see any emails regarding this matter. The tools status doesn't seem to be updated yet on coral. Yuniarto -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Fri Oct 21 22:02:02 2011 From: mtang at stanford.edu (Mary Tang) Date: Fri, 21 Oct 2011 22:02:02 -0700 Subject: no flammable gas In-Reply-To: References: Message-ID: <4EA24E4A.1010904@stanford.edu> Thanks Yuniarto -- Right now, we should have all gases back online except for germane for tylansige and thermcopoly1/2. (Epi2 germane is OK.) The toxic gas detector for this particular cylinder failed so all the gases in the vault were shut off for a little while. Let me know if you observe any gas problems. Mary On 10/21/2011 9:44 PM, Yuniarto Widjaja wrote: > FYI, just saw a note from Mary posted on the lab entrance door that some of > the flammable gas (SiH4, DCS, etc.) are out for the time being. Just > thought of sending out this email since I didn't see any emails regarding > this matter. The tools status doesn't seem to be updated yet on coral. > > Yuniarto > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From dongrip at stanford.edu Mon Oct 24 10:34:25 2011 From: dongrip at stanford.edu (Dong Rip Kim) Date: Mon, 24 Oct 2011 10:34:25 -0700 Subject: ME PhD Oral Examination - Dong Rip Kim (1pm, 10/28/2011, Nano Bldg. 232) Message-ID: <3A491DC4-943D-40E8-84C1-3CF869F22F6A@stanford.edu> Ph.D. Dissertation Defense Characterization and Optimization of Silicon Nanowires for Biosensing and Photovoltaic Applications Dong Rip Kim Department of Mechanical Engineering Advisor: Prof. Xiaolin Zheng Time: Friday, 28th October 2011, 1pm (Refreshments at 12:45pm) Venue: Center for Nanoscale Science and Engineering (Nano Building) Conference room # 232 Research Abstract One-dimensional nanowires, due to their excellent electrical, optical, and chemical properties, and large surface to volume ratios, offer the promise of producing revolutionary advances in many areas of technology. This study investigates two application examples of Si nanowires (SiNWs) in the areas of biosensing and solar cells, respectively. First, SiNWs have been highlighted as real-time, label-free, multiplexing, and femtomolar level accuracy biosensors. However, SiNWs are frequently placed on the bottom wall of a microfluidic channel in the sensing process where the convection velocity is almost zero such that the performance of SiNW biosensors is restrained by the analyte transport. Moreover, although the sensing is carried out in a microfluidic environment where the charged analytes coexist with charged ions of the electrolytic solution, efforts are lacking in understanding the effects of charged ions in the electrolytic solution on the sensing performance of SiNWs. Herein, this study focuses on the characterization and optimization of microfluidic sensing environment for SiNW biosensors in terms of the response time, sensitivity, and selectivity. Our numerical studies suggest that the diffusive analyte transport currently limits the response time of SiNW biosensors. Through microfluidic optimizations, about 17.4 times faster response time and doubled sensitivity are achievable in SiNW biosensing. In addition, our experimental investigation shows that SiNWs can also detect ionic movements and distributions other than targeted species inside the microfluidic channel, which can affect the selectivity of SiNW biosensors and lead to false signals. Second, vertically aligned radial junction Si wire array solar cells can offer the opportunity to use lower grade material to produce efficient solar cells, due to the decoupling of light absorption and charge-carrier collection directions, and enhanced light trapping. Nevertheless, radial junction Si wire array solar cells still face critical challenges such as large junction and surface recombination losses of photogenerated charge carriers due to their inherent large surface area, which is one of the primary reasons responsible for the gap between reported experimental efficiencies (typically below 10%) and the estimated 17% theoretical efficiency. Therefore, we experimentally investigated junction and surface passivation strategies to effectively suppress large junction and surface recombinations of vertically aligned radial junction Si wire array solar cells. The inclusion of intrinsic polycrystalline Si layer between the p-n junction layers increases the efficiency by about 30% by reducing the dark current, and the top amorphous silicon nitride layer improves the efficiency by about 20% due to its combined surface passivation and antireflection effects. With the combination of both passivation layers, the maximum efficiency of our solar cells is improved from 7.2% to 11.0% under AM 1.5G illumination. -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Oct 24 14:20:26 2011 From: jwc at snf.stanford.edu (James W. Conway) Date: Mon, 24 Oct 2011 14:20:26 -0700 Subject: ANNOUNCEMENT: Ebeam Lab Town Hall Meeting Friday October 28th 2011 2:00 to 3:30 PM Packard 202 -- VISITING SPEAKER: MOHAMMAD ALI MOHAMMAD -- NANOSCALE ELECTRON BEAM PROCESSING AND APPLICATIONS Message-ID: <4EA5D69A.1070108@snf.stanford.edu> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: clip_image002.png Type: image/png Size: 53535 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: MALIMOHAMMAD_Stanford_Oct_2011.doc Type: application/msword Size: 2818560 bytes Desc: not available URL: From mtang at stanford.edu Mon Oct 24 21:09:37 2011 From: mtang at stanford.edu (Mary Tang) Date: Mon, 24 Oct 2011 21:09:37 -0700 Subject: Individual Tool Shutdowns over the next two weeks In-Reply-To: <4EA1FB83.1030105@stanford.edu> References: <4EA1FB83.1030105@stanford.edu> Message-ID: <4EA63681.3020505@stanford.edu> Hi all -- Just to clarify, as several people have asked: the tool shutdowns described below are for ONE DAY only as indicated, for pre-renovation construction work on the water lines. M On 10/21/2011 4:08 PM, Mary Tang wrote: > Dear labmembers -- > > Pre-renovation construction begins Monday. One project will involve > shutting down the process cooling water in different fingerwalls > throughout the lab. Individual tools have been reserved according to > the project schedule; we'll do our best to keep everyone informed of > changes. The schedule for shutdown is as follows: > > Monday, 10/24 - tylans1-4, fga2 bank > Tuesday, 10/25 - tylannitride, tylanbpsg, tylansige, teos2, tylanpoly, > thermcolto, thermcopoly1/2, thermconitride1, thermco1/2 > Wed. 10/26 - drytek2, pquest, amtetcher > Thur, 10/27 - lampoly, intlvac_evap, intlvac_sputter, tel > Fri, 10/28 - stsetch, drytek4, mrc > Mon, 10/31 - gryphon, innotec, p5000etch > Tue, 11/1 - stsetch2, matrix, metalica, sts dep, savannah, fiji-l/r > Thur, 11/3 - asml > > The contractors will begin work on the cooling water lines at 7 am and > expect to end by 3 pm each day. Staff may need to shutdown tools > earlier to prepare for the work and may need extra time to bring them > back up afterward, depending on the individual tool. Updates for > individual tools will be posted on Coral. > > Thanks for your patience -- after two years of planning, renovation > construction begins!! > > Your SNF staff > > From mehdij at stanford.edu Mon Oct 24 16:36:19 2011 From: mehdij at stanford.edu (Mehdi Javanmard) Date: Mon, 24 Oct 2011 16:36:19 -0700 Subject: Fwd: FW: Technical Information on NR71-1000PY, NR71-1500PY, NR71-3000PY, NR71-6000PY, RD6 and RR41. In-Reply-To: References: Message-ID: Hello all, I was wondering if anybody in the lab has any experience with NR71 resist and if they have a small bit (less than 2-3 ml) that I could borrow before I order some that will come in. thanks, Mehdi ** ** Please find enclosed Technical Information on Negative Resists NR71-1000PY, NR71-1500PY, NR71-3000PY and NR71-6000PY, Resist Developer RD6 and Resist Remover RR41. **** NR71-1000PY, NR71-1500PY, NR71-3000PY and NR71-6000PY are designed for lift-off applications, when temperature of resist pattern during metal deposition may exceed 100?C.**** Lift-off with NR71-series resists is carried out in heated resist removers such as RR41.**** If you feel that further assistance is needed please do not hesitate to contact me at your earliest convenience.**** ** E-mail: zpsobczak at futurrex.com www.futurrex.com**** -- Mehdi Javanmard, PhD Engineering Research Associate Stanford Genome Technology Center (510)364-5147 mehdij at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... 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Name: RR41.pdf Type: application/pdf Size: 100159 bytes Desc: not available URL: From audet at stanford.edu Tue Oct 25 11:12:24 2011 From: audet at stanford.edu (Ross Michael Audet) Date: Tue, 25 Oct 2011 11:12:24 -0700 (PDT) Subject: TODAY: Stanford Optical Society Fall BBQ Message-ID: <007f01cc9341$a4473870$ecd5a950$@edu> You are cordially invited to the Stanford Optical Society's Fall BBQ, which will be held TODAY, the 25th of October, in the CIS-X patio at 4:00pm. Please see attachment for invite and map. -------------- next part -------------- A non-text attachment was scrubbed... Name: OSABBQ2011.pdf Type: application/pdf Size: 101093 bytes Desc: not available URL: From kgc at stanford.edu Wed Oct 26 08:32:42 2011 From: kgc at stanford.edu (Katie Chang) Date: Wed, 26 Oct 2011 08:32:42 -0700 Subject: Missing Kindle in SNF Message-ID: Hi Labmembers, Has anyone seen or picked up an Amazon Kindle somewhere in SNF this week? It was left in SNF Saturday night. Please email me if you know where it might be! Thanks, --Katie -------------- next part -------------- An HTML attachment was scrubbed... URL: From suyog at stanford.edu Wed Oct 26 14:43:52 2011 From: suyog at stanford.edu (Suyog Gupta) Date: Wed, 26 Oct 2011 14:43:52 -0700 Subject: Using phosphorus spin on dopant Message-ID: Dear Labmembers, Does anybody have experience of using phosphorus spin on dopants (SOD)? I have the P509 SOD (~ 10% Phos) from Filmtronics. Here is the process flow that I've tried on epi-Ge substrates: 1. Coat : 3000rpm for 10s 2. Bake : 200C, 2 mins on a hotplate 3. RTP : 600C, 10s, Forming Gas ambient 4. SOD removal : 6:1 BOE, 2 min. Few issues that I'm facing right now: 1. The SOD film develops some cracks after baking. 2. It's hard to remove the SOD film after RTP. Even a longer BOE clean doesn't seem to get rid of all the residue. Any suggestions/tips on how to work with this SOD will be much appreciated! 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Name: Stanford_10_28_2011_HIM_Presentation_Abstract.pdf Type: application/pdf Size: 145230 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Agenda -- Ebeam Town Hall Meeting 10282011.doc Type: application/msword Size: 24576 bytes Desc: not available URL: From robert.chen at stanford.edu Fri Oct 28 18:51:31 2011 From: robert.chen at stanford.edu (Robert Chen) Date: Fri, 28 Oct 2011 20:51:31 -0500 Subject: Looking for Karlsuss Mask with Disks Message-ID: Hi Labmembers, I wondering if someone has a mask with disk structures around 2-25um (chrome disks, clear field). I'd like to use it with Karlsuss for a few samples. Thanks, Robert Chen Electrical Engineering Ph.D. Candidate Harris MBE Group, Stanford University http://robochen.web.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From edmyers at stanford.edu Mon Oct 31 16:48:17 2011 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 31 Oct 2011 16:48:17 -0700 Subject: Precious Metals Charging Policy Change Message-ID: <4EAF33C1.6090306@stanford.edu> SNF Lab Members, Starting tomorrow (11/1/11), SNF will begin charging for SNF purchased precious metal used in our metal systems (Innotec, Metallica, Intlvac_Evap and Intlvac_Sputter). Please note the cost of the precious metals will not fall under the cap and will be added as an additional charge each month. We expect to purchase over $300,000 in metals this year and the cost needs to be passed on to the users of those metals. Users will weigh targets before and after usage and log those values in the logbook and on Coral. Coral will require both weights before allowing users to disable the metal deposition system. We will be charging the metals at the spot price SNF paid. We will update the charges as new batches of metals are purchased and released for use. Currently, the metal price we paid results in a billing rate of: Gold: $47.40 per gram Platinum: $63.12 per gram Palladium: $25.96 per gram Iridium: $41.86 per gram For reference a 100nm deposition requires approximately 4.5 grams of gold. Coral is set up to input all metals used in the systems. Please weight all of your targets and sources and input the data into Coral. We have scales on order for each metal system, but they have not arrived. Until the new scales arrive, please us the scale located on the Innotec work bench for weighing your metals. (Please report any Coral glitches, error or bugs that you see to me so we can document them and get them addressed) For the next four Mondays in November we will reserve extra time in our Process clinics (2:00pm in the area near Mahnaz's desk) for users who would like to talk about moving their processes to other metals. Regards, SNF Staff