Wet etching TiW?

jim kruger jimkruger at yahoo.com
Tue Oct 4 06:55:40 PDT 2011

Heat to 40 or 50 C for greater rate is standard. 

Resist adhesion may be an issue, re-bake on a hot plate just before etch and repeat if you dry it off for inspection and then etch more.


From: Suyog Gupta <suyog at stanford.edu>
To: labmembers at snf.stanford.edu
Sent: Tuesday, October 4, 2011 5:35 AM
Subject: Wet etching TiW?

Dear Labmembers,

I was wondering if anybody has tried wet etching TiW? I have about 100nm of TiW on Al2O3 that I need to wet etch. 
H2O2 seems to work but the etch rate at room temperature turned out to be too slow ~ 3 nm/min. If you have any suggestions, please let me know!

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/labmembers/attachments/20111004/3f80a357/attachment.html>

More information about the labmembers mailing list