From mahnaz at stanford.edu Fri Sep 2 11:16:47 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 02 Sep 2011 11:16:47 -0700 Subject: Litho solvent exhaust shut down Message-ID: <4E611D8F.6050604@stanford.edu> Hello all, Just to let you know that AGC would like to replace the solvent exhaust fan next week. *This work has been scheduled for next Wednesday and Thursday 9/7 and 9/8 during this two days Litho will be pretty much unavailable.* I have been told that they will start early morning around 6:30 am and hoping to finish it earlier than anticipated. We will still need to adjust all the setting back to normal after the job is done by AGC and test all the resist thickness. *The asml lamp has to be shut down. Tuesday and Wednesday 9/6 and 9/7 ASML is due to get the Monthly pm. On Tuesday, we will need longer tool time to finish as much of the pm as possible and do the rest of the test without the lamp on Wednesday. * Sorry for any inconvenient this may cause but the work is essential for litho area so Please plan accordingly. Litho team -------------- next part -------------- An HTML attachment was scrubbed... URL: From kennygee at stanford.edu Fri Sep 2 11:15:06 2011 From: kennygee at stanford.edu (Kenny Green) Date: Fri, 02 Sep 2011 11:15:06 -0700 Subject: Fwd: RE: BioE+ChE Construction Update - Week of September 6 In-Reply-To: References: Message-ID: <4E611D2A.4020006@stanford.edu> All- fyi ------------------------------------------------------------------------ *From:* Virgilio, Chris *Sent:* Saturday, August 27, 2011 11:40 AM *To:* 'Rick Rondeau'; 'Garcia, Phillip J.'; 'Thomas, Ward'; 'Scott, Ariadne'; 'Pond, Stephen'; 'Kloberdanz, Frank L.'; jabbott at stanford.edu; 'Hamai, Laura'; 'Tatom, Jetta'; 'Green, Kenneth J'; 'Eredia, Jaime R'; 'Ross, Dorrene M.'; 'Christiansen, Nancy'; 'Meyer, Sandy'; 'Schlimmer, Mike'; 'Weeks, Merry'; 'Randall, Lawrence E.'; 'Matson, Pamela A'; 'Koseff, Jeffrey R'; 'Hoang, Khoa'; 'Chan, Leonard G.'; 'Hum, Norman'; 'Dhalla, Jarnail'; 'Porterfield, Robert'; 'Madou, Ramses'; 'Miranda, Frank Mo'; 'Roberts, Jared'; 'Tang, Mary'; 'Stout, Lester W.'; 'Shott, John D'; 'Chin, Richard'; 'Tiberio, Richard, PhD'; 'Intersimone, D. P.'; 'Velten, Sharon'; 'Bible, Sara'; 'Morales, Felicia'; 'Koos, Thomas G.'; 'Kramer, Stewart L'; Wooden, Thomas; Jones, Robert (Pleasanton); 'Bible, Sara'; 'Nancy Christiansen'; 'Miranda, Frank Mo'; 'Dhalla, Jarnail'; 'Stout, Lester W.'; 'Intersimone, D. P.'; 'Velten, Sharon'; 'Hamai, Laura'; 'Conway, Daragh James'; 'Wheeler, Bob'; 'eglatzel at stanford.edu'; Peter K. Wong (SU); 'mmalfs at cis.stanford.edu'; Curt.frank at stanford.edu; endy at stanford.edu; csmolke at stanford.edu; Jaramillo at stanford.edu; esgs at stanford.edu; Felipa at stanford.edu; pjuanes at stanford.edu; arios1 at stanford.edu; scottg at bonair.stanford.edu; tracyi at bonair.stanford.edu; laurab6 at stanford.edu *Cc:* Wooden, Thomas; Jones, Robert (Pleasanton); Schimmer, Joel; Ellis, Damon; Thatcher, Eric *Subject:* BioE+ChE Construction Update - Week of August 29th Please find attached the BioE+ChE construction update for nextweek. Chris Virgilio Whiting-Turner Contracting Co. 4000 Via Ortega Stanford, CA 94305 o. 925.271.6596 c. 925.580.4554 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 2011.09.06 - Weekly Update BioE + ChemE.pdf Type: application/octet-stream Size: 1809894 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 2011.09.06 - Site Logistics Plan CAD with Crane Areas and Updated Fence Location.pdf Type: application/octet-stream Size: 355238 bytes Desc: not available URL: From gsosa at stanford.edu Tue Sep 6 08:02:01 2011 From: gsosa at stanford.edu (Gary J Sosa) Date: Tue, 6 Sep 2011 08:02:01 -0700 (PDT) Subject: Morning Litho status report 9/6 In-Reply-To: <82434645-4bdf-41a4-b1a1-b941746b3495@Gary-PC> Message-ID: Good morning All.... Here is the Morning Litho status report: Important Notice- Please Read: This is just a reminder that tomorrow morning(9/7) at 6:30am, the solvent exhaust system will be shut down so that contractors can replace the exhaust fan on the roof as part of the building renovation. This work is scheduled to take 2 days, during which time there will be no solvent exhaust in the Litho area. As a result, the following tools will not be available for use: SVG Coaters, SVG Developers, EVG Spraycoater, Karl Suss Coater, Headway Spinner, Laurel Spinner, ASML Stepper, Bake-plate Station, Blue-M Ovens. Please adjust your processing schedules accordingly. The work is expected to be completed on Thursday(9/8), after which we will test and qualify the tools. Please monitor Coral for tools status. We will also send out an email at the completion of the work, with current litho status. Thanks for your patience and understanding. The Litho Team Please check back in Coral for latest tool updates and current equipment Status. Photolithography Quick Snapshot Tuesday, September 06, 2011 Reported Problems Problem Updates ( > 24 Hrs ) EVG Bonder: Down.The turbo pump is bad. Turbo pump is at vendor being repaired as of 8/26. Vendor needed to order special shaft seals which caused in additional delay. New target date for rebuild completion is 9/8 Photolithography Area Status Tuesday, September 06, 2011 General Information / Lab Activities Mahnaz- Vacation today( 9/6) Exposure Tools Status Comments Priority ASML Stepper PROBLEM Intermittent carrier inspection 2 EVAlign UP EVAlign2 UP EVG-Imprint UP Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 3617 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 955-0.7 Process Up 220-3 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime UP Hotplates- Laurel-left UP Laurel- right UP Headway UP Torrey Pines- left UP 90 Deg C UP 115 Deg C UP Torrey Pines- Right UP Metrology/Inspection Status Alpha-Step 500 UP Nanospec 2-Litho UP Nanospec 1-Etch UP P2 Profiler UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond DOWN Dead turbo pump 1 KSBonder UP KSCoat UP Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From carterl at stanford.edu Tue Sep 6 10:25:19 2011 From: carterl at stanford.edu (Carter Lin) Date: Tue, 6 Sep 2011 10:25:19 -0700 (PDT) Subject: Lost Samples Message-ID: <1287100592.9795.1315329919741.JavaMail.root@zm01.stanford.edu> Dear Labmembers, I lost two of my samples last week and wonder whether you have seen them. Each sample is an array of 2x2 cm^2 diced chips from a quartz wafer, covered by blue tapes on both sides. I left them on wbsolvent and Jeannie told me she had seen them last week. If you know where they are now, please let me know. Much Appreciated Carter From mtang at stanford.edu Wed Sep 7 05:06:21 2011 From: mtang at stanford.edu (Mary Tang) Date: Wed, 07 Sep 2011 05:06:21 -0700 Subject: Fall Course: EE412 Advanced Nanofabrication Lab Message-ID: <4E675E3D.4030006@stanford.edu> Dear Labmembers: EE412 returns this Fall, with Profs. Olav Solgaard and Roger Howe at the helm. This is a team-project-based course with the aim to develop, characterize and document processes that will be of value to the SNF labmember community (as well as your own research!) Students can select from available projects or work with staff member or other approved mentor to come up with their own. Students will receive not only course credit, but lab time and supplies in support of their projects -- and of course the satisfaction of contributing to the lab community knowledge base. This Fall, we are pleased to offer new tools (the Fiji ALD, Intlvac PVD sputter, and Intlvac evaporator) in addition to the usual suspects (EV Spraycoater, STSetch2, etc.) To see previous projects, see the wiki: https://snf.stanford.edu/SNF/processes/ee412 -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From ysohn at stanford.edu Thu Sep 8 16:45:36 2011 From: ysohn at stanford.edu (Young Ik Sohn) Date: Thu, 8 Sep 2011 16:45:36 -0700 (PDT) Subject: DRIE for small feature Message-ID: <630738781.144428.1315525536666.JavaMail.root@zm08.stanford.edu> Hi all, I wonder if there is who have an experience with DRIE for small features. My target structure is a hole of 5um diameter, and I'd like to DRIE for around 100um while having as good vertical profile as possible. Please contact me if anyone has a similar experience. Thanks, Young Ik Sohn From shott at stanford.edu Fri Sep 9 12:36:23 2011 From: shott at stanford.edu (John Shott) Date: Fri, 09 Sep 2011 12:36:23 -0700 Subject: Fwd: RE: BioE+ChE Construction Update - Week of September 12th Message-ID: <4E6A6AB7.9090803@stanford.edu> Please find attached the update for nextweek. Have a great weekend. Chris Virgilio Whiting-Turner Contracting Co. 4000 Via Ortega Stanford, CA 94305 o. 925.271.6596 c. 925.580.4554 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 2011.09.12 - Weekly Update BioE + ChE.pdf Type: application/octet-stream Size: 3457448 bytes Desc: not available URL: From jprovine at stanford.edu Mon Sep 12 14:50:59 2011 From: jprovine at stanford.edu (J Provine) Date: Mon, 12 Sep 2011 14:50:59 -0700 Subject: [equipment] a good home for LB trough and wirebonder Message-ID: Hi folks, in the process of repurposing a lab, we have a langmuir blodgett trough and an ultrasonic wire bonder that need a good home. both worked the last time someone gave them some attention and love but have not been in use over the last few years. hopefully someone can find a good use for one or both of these. if you let me know your intentions we can arrange to have it moved from our lab to yours. the LB trough is from Joyce Loebl. the wirebonder is of less obvious vintage. images of each are attached and the supporting granite tables are also available with the gear. if you have any questions, feel free to email me. j -------------- next part -------------- An HTML attachment was scrubbed... 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Name: wire bonder.JPG Type: image/jpeg Size: 1144268 bytes Desc: not available URL: From jprovine at stanford.edu Mon Sep 12 16:02:51 2011 From: jprovine at stanford.edu (J Provine) Date: Mon, 12 Sep 2011 16:02:51 -0700 Subject: TAKEN Re: [equipment] a good home for LB trough and wirebonder Message-ID: both pieces of equipment have been claimined. thanks for your interest and for helping this gear find a good home. j On Mon, Sep 12, 2011 at 2:50 PM, J Provine wrote: > Hi folks, > in the process of repurposing a lab, we have a langmuir blodgett trough and > an ultrasonic wire bonder that need a good home. both worked the last time > someone gave them some attention and love but have not been in use over the > last few years. hopefully someone can find a good use for one or both of > these. if you let me know your intentions we can arrange to have it moved > from our lab to yours. > > the LB trough is from Joyce Loebl. the wirebonder is of less obvious > vintage. images of each are attached and the supporting granite tables are > also available with the gear. if you have any questions, feel free to email > me. > > j > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From bilee at stanford.edu Tue Sep 13 17:14:17 2011 From: bilee at stanford.edu (Byoungil Lee) Date: Tue, 13 Sep 2011 17:14:17 -0700 Subject: Oral Exam Announcement: Byoungil Lee Message-ID: <61BBF2E9A60B4D6E92EA204971C308E4@BILEEOFFICE> Stanford University PhD Oral Defense - Department of Electrical Engineering Speaker: Byoungil Lee Date: September 16, 2011 (Friday) Time: 1:00 PM (Refreshments served at 12:45 PM) Location: Paul Allen Auditorium (CISX-AUD) Advisor: H.-S Philip Wong Title: Fabrication and Characterization of Nanoscale Resistance Change Memory Abstract: As the current charge-based memory technologies such as DRAM and Flash Memory are facing their fundamental scaling limits, new types of memory technologies such as spin-torque-transfer RAM (STTRAM), phase-change memory (PCM), and metal-oxide resistance change memory (RRAM) have been actively explored. Among these candidates, RRAM devices utilize the resistance change property of the metal-oxide films, and have shown promising results such as fast switching speed, low programming current, and good CMOS compatibility. Despite the potential advantages, they suffer from the critical issues that must be addressed for the high-density memory application, which includes existence of forming-process, large variation in switching characteristics, and cell selection issue in the cross-point structure. In this talk, I will first demonstrate the process and characterization methodology for RRAM devices to verify the characteristics and potential issues in the nanoscale regime down to 50X50 nm2 size. Unipolar switching memory cells using NiO thin films were fabricated by ebeam lithography process. The device characteristics and the scaling trends will be discussed. Next, I will present two novel RRAM structures developed by the process and characterization methods established in the previous section. In the first structure, both top and bottom electrodes are processed prior to the metal-oxide deposition, and therefore, contamination-less programming region is achieved in the memory cell. Moreover, the novel structure features more confined conduction path compared to the conventional structure, which results in narrower low-resistance distribution. The process flow and characteristics of the nanoscale NiO memory cells using this structure will be presented. In the second structure, an oxide-to-oxide interface is incorporated inside the memory cell in order to utilize the initial leakage and eliminate the high-voltage forming process. Due to this initial leakage, the as-fabricated AlOx memory cells exhibit low-resistance sates, while the conventional AlOx devices show high-resistance initial states. The new memory cell does not require the high-voltage forming process since the as-fabricated cells can be switched to high-resistance states with a regular RESET voltage. Finally, application of the forming-less AlOx cells to the complementary resistive switch (CRS) scheme will be discussed using the measured cell characteristics. The CRS scheme was proposed in 2010 as a potential solution to the high-density cross-point memory arrays. The novel memory cells with forming-less property demonstrate promising results that enables the CRS operation using bipolar switching RRAM cells. -- -------------- next part -------------- An HTML attachment was scrubbed... URL: From edmyers at stanford.edu Fri Sep 16 10:20:03 2011 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 16 Sep 2011 10:20:03 -0700 Subject: Fab Door Open Monday 9/19 Message-ID: <6.2.5.6.2.20110916101254.06221388@stanford.edu> Lab Members, On Monday morning (9/19) the double doors near the ALD and GaAs wet bench will be open in order to roll out the AG4108 and AG4100. In the near future you will see more tool movement as we prepare the fab locations for the new etch systems which will be arriving this year. If you have sensitive samples, please plan your use of the ALD and GaAs wet bench accordingly. Regards, SNF Staff From edmyers at stanford.edu Sun Sep 18 17:04:42 2011 From: edmyers at stanford.edu (Ed Myers) Date: Sun, 18 Sep 2011 17:04:42 -0700 (PDT) Subject: Fab Evacuation Alarm, 9/18/11 Message-ID: <1366013771.875773.1316390682586.JavaMail.root@zm07.stanford.edu> All, It is safe to go back in to the fab. The alarm was from the Ozone detector monitoring the exhuast on the Fiji ALD systems. Working with the fire department, using their portable detector we could not find a trace of ozone in the fab area. As a precaution, I have shut down the Fiji systems until we can take a look at the system and the detector on Monday. Very low concentrations of ozone is generated within the system and exhausted through the scrubber and should never reach the fab air. Thanks to the lab member community which called the duty phone and allowed us to quickly. Regards, SNF Staff From alexneu at stanford.edu Tue Sep 20 18:19:07 2011 From: alexneu at stanford.edu (Alex Neuhausen) Date: Tue, 20 Sep 2011 18:19:07 -0700 Subject: Oral Exam Announcement - Alex Neuhausen Message-ID: Stanford University PhD Oral Defense - Department of Electrical Engineering Date: September 26, 2011 (Monday) Time: 1:00 PM (Refreshments at 12:45 PM) Location: McCullough 335 Title:* Molecular Junctions of Self-Assembled Monolayers with Universal Soft Contacts * Abstract: As transistor scaling following Moore?s Law faces mounting obstacles from device leakage and heat dissipation, numerous disruptive ?post-silicon? technologies are being explored. Devices consisting of a single or few organic molecules have been proposed as extremely scalable, low-power logic and memory elements. The diversity and consistency of molecules that may be obtained through chemical synthesis has resulted in numerous exciting device proposals. However, in the many studies of transport through molecular systems that have been presented in the literature, the difficulty in establishing contacts to a desired molecular system has arisen as a complication. There is an emerging consensus that the ideal molecular device geometry should consist of a self-assembled monolayer (SAM) sandwiched between two electrodes to average out molecule-contact variations and ensure consistent behavior with scaling.**** ** ** This talk will begin with a discussion of the general characteristics of a scalable molecular device, and then briefly review recent device designs demonstrated in the literature, with an emphasis on the limitations of the various contact materials and deposition methods. A novel, scalable, high-yield molecular junction incorporating an isolating dielectric layer and a soft polymer top contact will then be presented. Studies of transport through alkanethiol SAMs with a variety of terminations formed on gold substrates will be presented. Models explaining the molecular length-decay and unique temperature dependence behavior will be demonstrated. Studies of devices incorporating platinum and silver substrates will be presented to provide insight into the packing behavior of the SAM. The limitations of devices with soft contacts will be explored with the presentation of studies of conjugated molecular systems and molecules with redox-active organometallic terminal groups. The demonstration of scalable, high-yield molecular junctions is an important step in the development of computing devices beyond Moore?s Law. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Thu Sep 22 20:36:23 2011 From: mtang at stanford.edu (Mary Tang) Date: Thu, 22 Sep 2011 20:36:23 -0700 Subject: Last call for proposals: EE412 Advanced Nanofabrication Lab Message-ID: <4E7BFEB7.308@stanford.edu> Dear Labmembers: Just a few days before EE412 begins anew, with Profs. Olav Solgaard and Roger Howe at the helm. Class meets Tuesdays, starting September 27, at 4 pm in the Allen 101 conference room. If you aren't familiar with this, EE412 is a team-project-based course to develop, characterize and document processes of value to the SNF community (and your own research!) You can select from available projects or work with staff member or other mentor to come up with their own. You get not only course credit, but lab time and supplies to support your projects -- and of course the satisfaction of contributing to the lab community knowledge base. This Fall, we are pleased to offer new tools (the Fiji ALD, Intlvac PVD sputter, and Intlvac evaporator) in addition to the usual suspects (EV Spraycoater, STSetch2, etc.) To see previous projects, see the wiki:https://snf.stanford.edu/SNF/processes/ee412 If you're interested, come to class on Tuesday! -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From srikantv at stanford.edu Mon Sep 26 09:55:54 2011 From: srikantv at stanford.edu (Srikant Vaithilingam) Date: Mon, 26 Sep 2011 09:55:54 -0700 Subject: EE PhD Oral Examination - Srikant Vaithilingam, Friday Sept. 30, 2pm, CISX Auditorium Message-ID: <002601cc7c6d$27e2b470$77a81d50$@stanford.edu> Title: "Photoacoustic Imaging using Capacitive Micromachined Ultrasonic Transducers (CMUTs)" Date: Sept. 30, 2011 (Friday) Time: 2:15 PM (Refreshments served at 2:00 PM) Location: CISX Auditorium Abstract: Photoacoustic imaging is a relatively new medical imaging modality with tremendous clinical potential. In this talk, I will explain the 'photoacoustic effect' ? the conversion of short light pulses into ultrasonic waves ? and how it allows us to obtain structural/functional information with high spatial resolution and sensitivity. I will present details of a mechanical scanning photoacoustic imaging instrument that I developed including integrating the optics, acoustic transducer, electronics and software. Using this instrument a number of unique photoacoustic molecular contrast agents have been designed and tested to visualize tumors. I will then introduce capacitive micromachined ultrasonic transducer (CMUT) arrays as a possible technology platform to perform 3-D volumetric photoacoustic imaging with high sensitivity. CMUTs offer a number of advantages over traditional piezoelectric ultrasound transducers including batch fabrication, wide bandwidth transducers, ability to fabricate 2-D arrays with arbitrary geometries and tight integration with electronics. I will show photoacoustic imaging results in tissue phantoms using CMUTs and preliminary results of real-time photoacoustic imaging. Finally, I will introduce a new microfabrication process to make CMUTs that offers better reliability against dielectric breakdown and increased design flexibility. From amroy at stanford.edu Mon Sep 26 21:07:05 2011 From: amroy at stanford.edu (Arunanshu Roy) Date: Mon, 26 Sep 2011 21:07:05 -0700 Subject: Ta wet etching Message-ID: Hi, I was wondering if anyone has experience with wet etching of thin Ta films. I only need to etch 5 nm and I don't mind a slow etch rate. Most references I found online recommend using a concentrated solution of HF and HNO3 but I would prefer something milder, especially since I am not looking for a high etch rate. Thanks a lot, Arunanshu From jimkruger at yahoo.com Tue Sep 27 09:51:26 2011 From: jimkruger at yahoo.com (jim kruger) Date: Tue, 27 Sep 2011 09:51:26 -0700 (PDT) Subject: Ta wet etching In-Reply-To: References: Message-ID: <1317142286.16447.YahooMailNeo@web38901.mail.mud.yahoo.com> The Berkeley MEMS etch tables, available on the SNF website if you dig deep enough, list 50C H2O2 and Transcene NiCr etch, as well as harsher recipes, for Ta.? I think it should be easy to dry etch as well.? What are you stopping on? jim ________________________________ From: Arunanshu Roy To: labmembers at snf.stanford.edu Sent: Monday, September 26, 2011 9:07 PM Subject: Ta wet etching Hi, I was wondering if anyone has experience with wet etching of thin Ta films. I only need to etch 5 nm and I don't mind a slow etch rate. Most references I found online recommend using a concentrated solution of HF and HNO3 but I would prefer something milder, especially since I am not looking for a high etch rate. Thanks a lot, Arunanshu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwb2005 at stanford.edu Tue Sep 27 10:28:15 2011 From: jwb2005 at stanford.edu (John Bumgarner) Date: Tue, 27 Sep 2011 10:28:15 -0700 Subject: Sept 2011 SNF updates Message-ID: <4E8207AF.9020403@stanford.edu> Dear SNF lab members, As part of my roles and responsibilities, I am planning to send out a bimonthly, or even monthly, note about what is happening at SNF. I will hopefully keep it brief and informal, but also informative. Attached is the first version. Included are comments on: Safety Lab Members meeting Renovation and associated fab shutdown Dec 14 to Jan 31. New tools being installed New Org chart for SNF Please feel free to come see me if you have questions or inputs. Regards, John B _______________________ John Bumgarner, PhD Operations Director SNF -------------- next part -------------- A non-text attachment was scrubbed... Name: SNF Members Update 9 11.pdf Type: application/pdf Size: 253860 bytes Desc: not available URL: From narii at stanford.edu Wed Sep 28 09:34:00 2011 From: narii at stanford.edu (Yeul Na) Date: Wed, 28 Sep 2011 09:34:00 -0700 Subject: EE PhD Oral Examination - Yeul Na, Sept. 28, 9:30AM, CISX-Aud. Message-ID: Advisor: Krishna Saraswat Date: Thursday, September 29, 2011 Time: 9:30 AM Location: Paul Allen Auditorium (Formerly CISX-101) Title: Novel Phototransistors for Optical Interconnect* * Abstract: Interconnect is one of the major problems in high performance silicon chips in terms of latency, power and bandwidth. Optical interconnect has potential benefits to solve such problems. Because of very high carrier frequency, optical interconnect avoids the resistive loss physics of metal wires, thus high bandwidth is achievable. However, energy/bit is still high compared to conventional copper wire in short on-chip/off-chip interconnects. While lasers and optical modulators promise power requirement for on-chip optical interconnect lower than copper wire, receivers still consumes high power. To decrease receiver-end power consumption, receiver-less scheme had been proposed. To realize this, a device complimentary to photodetector is needed. First part of this talk presents the first complimentary device to photodetector operates at 850nm laser with output current reduction with incident light. Experiment result successfully showed voltage shift of Id-Vg curve, which is signature of phototransistor operation, as big as 0.7V. It also presents the first wavelength tunable complimentary to photodetector operates at optical communication wavelength range. These phototransistors have potential to replace current optical receiver circuit and reduce power dissipation to meet power requirement. Second part of this talk presents photodetector utilizes phototransistor concept. Responsivity higher than 700A/W is experimentally shown with 150nW of incident light in 850nm wavelength, which is higher than external quantum efficiency of 1000. In addition, small output capacitance of ~2fF/?m and high scalability are verified from simulation. With these characteristic, this phototransistor can replace conventional photodiode, and further decrease power dissipation of optical interconnect. -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at stanford.edu Thu Sep 29 16:38:18 2011 From: maurice at stanford.edu (maurice stevens) Date: Thu, 29 Sep 2011 16:38:18 -0700 Subject: Fwd: Smells in the lab Message-ID: <4E85016A.4050800@stanford.edu> Hi Lab Users, We have had several reports of smells in the lab this week during the evening hours. Please continue reporting smells you notice. I would also ask you to send me a description of the smell, time, location of even minor smells. We are trying to see if there is some pattern that will help us find the cause. One of the smell was reported near the LPCVD furnaces so we are going to clean/inspect more of the LPCVD exhaust/burnbox assembly. We clean the burnbox every week but tomorrow we will clean the manifold were the individual exhaust lines join and enter the burnbox. This extra cleaning was scheduled for the shutdown but the reported smell in our area has us looking at everything. Again, please continue reporting anything you notice. maurice -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 From svo at stanford.edu Fri Sep 30 21:00:30 2011 From: svo at stanford.edu (Sonny Vo) Date: Fri, 30 Sep 2011 21:00:30 -0700 Subject: pdms question Message-ID: hi labmembers, For those of you with particularly deep insight into pdms, i was wondering if there's a treatment method on the pdms surface or on the surface of something like mylar (transparency film), that *reduces the sticky factor of the pdms when attached to this mylar*. I'd like the pdms and mylar surface to still be optically transparent in the visible after the particular evaporation or chemical treatment method. i learned from a colleague that kapton can be chemically placed on the pdms but this compromises the optical property somewhat & the lifetime is poor (~a few weeks). Regards, Sonny ----*** Department of Applied physics, Stanford University research group: http://snow.stanford.edu/index.html* 626-216-4597 -------------- next part -------------- An HTML attachment was scrubbed... URL: