From joe.mcrae at quswami.com  Mon Apr  2 11:19:01 2012
From: joe.mcrae at quswami.com (Joseph McRae)
Date: Mon, 2 Apr 2012 11:19:01 -0700
Subject: Processing very thin substrates
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB12EA9928764@QUSWAMI-DSRV1.quswami.local>

Does anyone have experience processing 'paper-thin' (~.05 mm) stainless steel round substrates? I am looking for any helpful hints in the areas of wafer bonding or fabricating wafer pockets to facilitate further processing.

Thanks,

Joe McRae
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From ludwig.galambos at gmail.com  Mon Apr  2 13:40:23 2012
From: ludwig.galambos at gmail.com (Ludwig G.)
Date: Mon, 2 Apr 2012 13:40:23 -0700
Subject: 25 pcs. EPI wafer , <111>
Message-ID: <CAC4rqR-Quxu2gC40cYdYs1h7HBg1UrD8oKn-64jyXXMRoLF-gQ@mail.gmail.com>

Hi All,

we have a box of 4" , 25 wafers:
- EPI thickness 9.39um,  orientation <111>
Res. 0.005-0.020: EPI  Res. 1.640 Ohm-cm
Thickness: 510um
Made by Sumitomo

anyone interested, let me know

Ludwig
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From kyunglok at stanford.edu  Mon Apr  2 18:36:20 2012
From: kyunglok at stanford.edu (Kyunglok Kim)
Date: Mon, 2 Apr 2012 18:36:20 -0700
Subject: 4 inch glass wafers
Message-ID: <CAFNutZ_TLkpK4UkECcvoL17O4J5V3wy-WFcuXe_CuDeOJWX+-Q@mail.gmail.com>

Dear labmembers,


I would like to buy some 4 inch glass wafers for thin film deposition tests.
If there is someone who knows a vendor treating glass wafers, please let me
know the name of the company.
Thanks!


Best Regards,

Kyunglok Kim
PhD Candidate
Electrical Engineering
Stanford University
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From shott at stanford.edu  Mon Apr  2 19:42:03 2012
From: shott at stanford.edu (John Shott)
Date: Mon, 02 Apr 2012 19:42:03 -0700
Subject: 4 inch glass wafers
In-Reply-To: <CAFNutZ_TLkpK4UkECcvoL17O4J5V3wy-WFcuXe_CuDeOJWX+-Q@mail.gmail.com>
References: <CAFNutZ_TLkpK4UkECcvoL17O4J5V3wy-WFcuXe_CuDeOJWX+-Q@mail.gmail.com>
Message-ID: <4F7A637B.7070100@stanford.edu>

Kyunglok:

Unless we are out of them, we should have Pyrex 7740 wafers in the stock 
room as well as quartz wafers.  As the 7740 wafers contain sodium, they 
will not be allowed in all tools, so it likely depends on what tools you 
need to use to make your decision.  They are, of course, considerably 
less expensive than quartz ... but the quartz wafers have a far broader 
range of tools in which they are allowed.

Good luck,

John



From toecutter4ranger at gmail.com  Mon Apr  2 20:25:50 2012
From: toecutter4ranger at gmail.com (ToeCutter)
Date: Mon, 2 Apr 2012 20:25:50 -0700
Subject: 4 inch glass wafers
In-Reply-To: <4F7A637B.7070100@stanford.edu>
References: <CAFNutZ_TLkpK4UkECcvoL17O4J5V3wy-WFcuXe_CuDeOJWX+-Q@mail.gmail.com> <4F7A637B.7070100@stanford.edu>
Message-ID: <38F07AB0-821B-4132-8188-60A3CF38F402@gmail.com>

I have some glass and possibly corning code borosilicatealuminum glass  
as well as quartz left over from other user projects past.

See me during office hours 9-10 T Th Fr Allen 31

James Conway

On Apr 2, 2012, at 7:42 PM, John Shott <shott at stanford.edu> wrote:

> Kyunglok:
>
> Unless we are out of them, we should have Pyrex 7740 wafers in the  
> stock room as well as quartz wafers.  As the 7740 wafers contain  
> sodium, they will not be allowed in all tools, so it likely depends  
> on what tools you need to use to make your decision.  They are, of  
> course, considerably less expensive than quartz ... but the quartz  
> wafers have a far broader range of tools in which they are allowed.
>
> Good luck,
>
> John
>


From shott at stanford.edu  Tue Apr  3 06:26:16 2012
From: shott at stanford.edu (John Shott)
Date: Tue, 03 Apr 2012 06:26:16 -0700
Subject: Two quick questions for our industrial lab members ....
Message-ID: <4F7AFA78.6080106@stanford.edu>

SNF Industrial Lab Members:

The National Science Foundation has asked us two questions about 
companies that are using our facility that are difficult for us to know, 
but likely very easy for you to determine.  This information will be 
only used by NSF and will not be published or discussed outside of the 
National Science Foundation.  It should only take a minute or two to 
respond.

First, they have asked us to identify companies that were founded based 
on technology developed primarily at SNF or at one of the other NNIN 
laboratories.  This will primarily be companies formed by a faculty 
member or a graduate student based on University research, that have 
spun off from such research activity, or by companies that have licensed 
such technology.

Second, they have asked us to identify companies that conduct the great 
majority of their fabrication R&D effort at SNF or at one of the other 
NNIN laboratories.

If you believe that your company falls into either category, would you 
kindly send me a quick email message that includes your company name, 
the approximate year that your company was founded, and the category to 
which your company belongs.

Thanks for your consideration.

John

Note: the other institutions that are members of the NNIN include 
Arizona State University, Cornell University, Georgia Tech, Harvard, 
Howard University, Penn State, UCSB, University of Colorado, University 
of Michigan, University of Minnesota, UT Austin, University of 
Washington, and Washington University  of St. Louis.




From dwarnold at eksigent.com  Tue Apr  3 08:23:23 2012
From: dwarnold at eksigent.com (Arnold, Don W)
Date: Tue, 3 Apr 2012 15:23:23 +0000
Subject: Two quick questions for our industrial lab members ....
In-Reply-To: <4F7AFA78.6080106@stanford.edu>
References: <4F7AFA78.6080106@stanford.edu>
Message-ID: <8D11AE29129C90439967E18A9BA0FE7F1AE162@DHRNASVXM01.danaher.org>

John,

For question 1) - we were not spun out of a NNIN facility.
For question 2) - most of our fabrication related R&D is done at SNF.  
We are now 'eksigent, part of AB SCIEX' after a 2010 acquisition. The company name is AB SCIEX, LLC. Eksigent was originally founded in 2000 (a spin-out from Sandia National Laboratories) and acquired in 2010. Eksigent is an instrumentation/ microfluidics division of AB SCIEX, which was historically a mass spectrometer company.


Don W.?Arnold
General Manager, eksigent, part of AB Sciex
dwarnold at eksigent.com 
T 925 560 2602 M 925 337 6155 F 925 560 2700 

5875 Arnold Road, Suite 300
Dublin?CA?94568 USA
www.eksigent.com



-----Original Message-----
From: John Shott [mailto:shott at stanford.edu] 
Sent: Tuesday, April 03, 2012 6:26 AM
To: labmembers
Subject: Two quick questions for our industrial lab members ....

SNF Industrial Lab Members:

The National Science Foundation has asked us two questions about companies that are using our facility that are difficult for us to know, but likely very easy for you to determine.  This information will be only used by NSF and will not be published or discussed outside of the National Science Foundation.  It should only take a minute or two to respond.

First, they have asked us to identify companies that were founded based on technology developed primarily at SNF or at one of the other NNIN laboratories.  This will primarily be companies formed by a faculty member or a graduate student based on University research, that have spun off from such research activity, or by companies that have licensed such technology.

Second, they have asked us to identify companies that conduct the great majority of their fabrication R&D effort at SNF or at one of the other NNIN laboratories.

If you believe that your company falls into either category, would you kindly send me a quick email message that includes your company name, the approximate year that your company was founded, and the category to which your company belongs.

Thanks for your consideration.

John

Note: the other institutions that are members of the NNIN include Arizona State University, Cornell University, Georgia Tech, Harvard, Howard University, Penn State, UCSB, University of Colorado, University of Michigan, University of Minnesota, UT Austin, University of Washington, and Washington University  of St. Louis.




Please be advised that this email may contain confidential 
information.  If you are not the intended recipient, please notify us 
by email by replying to the sender and delete this message.  The 
sender disclaims that the content of this email constitutes an offer 
to enter into, or the acceptance of, any agreement; provided that the 
foregoing does not invalidate the binding effect of any digital or 
other electronic reproduction of a manual signature that is included 
in any attachment.




From shott at stanford.edu  Tue Apr  3 08:40:07 2012
From: shott at stanford.edu (John Shott)
Date: Tue, 03 Apr 2012 08:40:07 -0700
Subject: Two quick questions for our industrial lab members ....
In-Reply-To: <8D11AE29129C90439967E18A9BA0FE7F1AE162@DHRNASVXM01.danaher.org>
References: <4F7AFA78.6080106@stanford.edu> <8D11AE29129C90439967E18A9BA0FE7F1AE162@DHRNASVXM01.danaher.org>
Message-ID: <4F7B19D7.1090508@stanford.edu>

Don:

Thanks for your prompt response.  I appreciate it.

John


On 4/3/2012 8:23 AM, Arnold, Don W wrote:
> John,
>
> For question 1) - we were not spun out of a NNIN facility.
> For question 2) - most of our fabrication related R&D is done at SNF.
> We are now 'eksigent, part of AB SCIEX' after a 2010 acquisition. The company name is AB SCIEX, LLC. Eksigent was originally founded in 2000 (a spin-out from Sandia National Laboratories) and acquired in 2010. Eksigent is an instrumentation/ microfluidics division of AB SCIEX, which was historically a mass spectrometer company.
>
>
> Don W. Arnold
> General Manager, eksigent, part of AB Sciex
> dwarnold at eksigent.com
> T 925 560 2602 M 925 337 6155 F 925 560 2700
>
> 5875 Arnold Road, Suite 300
> Dublin CA 94568 USA
> www.eksigent.com
>



From ylyang at stanford.edu  Tue Apr  3 15:53:13 2012
From: ylyang at stanford.edu (Yongliang Yang)
Date: Tue, 3 Apr 2012 15:53:13 -0700 (PDT)
Subject: New sputter training  & sputtering vendor out of SNF
In-Reply-To: <1358886627.2642397.1331330258728.JavaMail.root@zm04.stanford.edu>
Message-ID: <1440169372.24599438.1333493593551.JavaMail.root@zm04.stanford.edu>

Hi, Ed,

I just stopped by your office about the training on Intlvac. My wafers have been ready to deposit 1um Al/2%Si. Please let me know when you can arrange the training.

to lab-members,does anyone know where I can do the HF dip and Al/2%Si sputtering out of SNF? I am fabricating cantilever-tip structure, and need to deposit Al as electric connection. Before deposition, native oxide should be removed.. But I can not do the Ar etching since the Ar bombardment will make the tip dull. The only choice is HF dip. Most vendors out of SNF do not have HF capability.

Also, I noticed on coral, there is no people use our new/old Intlvac, the only clean metal deposition tool in SNF. I do not know why? 

If you can give me some information about the qualification of Intlvac or suggestions about my process, that will be great.

Best,
Yongliang 



----- Original Message -----
From: "Yongliang Yang" <ylyang at stanford.edu>
To: "Ed Myers" <edmyers at stanford.edu>
Sent: Friday, March 9, 2012 1:57:38 PM
Subject: New sputter training

Hi, Ed,

I would like to get trained on the new semi-clean sputtering machine. Please add me the the training list. My coral is ylyang.

Best,
Yongliang




From jwc at snf.stanford.edu  Tue Apr  3 18:02:26 2012
From: jwc at snf.stanford.edu (James W. Conway)
Date: Tue, 03 Apr 2012 18:02:26 -0700
Subject: AFM training
In-Reply-To: <275870371.41911759.1333497602867.JavaMail.root@zm06.stanford.edu>
References: <275870371.41911759.1333497602867.JavaMail.root@zm06.stanford.edu>
Message-ID: <4F7B9DA2.5060303@snf.stanford.edu>

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From yspark at nano-liquid.com  Wed Apr  4 05:53:54 2012
From: yspark at nano-liquid.com (Paul Park)
Date: Wed, 4 Apr 2012 21:53:54 +0900
Subject: Two quick questions for our industrial lab members ....
In-Reply-To: <4F7AFA78.6080106@stanford.edu>
References: <4F7AFA78.6080106@stanford.edu>
Message-ID: <CAO8HA5GGqSTSYNMVOor0UxbEF4XcdsLU0H5GpFwMh+jWJ8yX4A@mail.gmail.com>

Hello John

My name is Youngsoh Park (Paul) at Nano Liquid Devices, Inc.

We have received Small Business Innovation Research (SBIR) Phase-I fund
from NSF (Award number IIP-0946111 "Low Cost, High Bandwidth RF Switch) on
1/1/2010 and later on received Phase-II fund (Award number IIP-1127563 with
same title) on 9/15/2011 for 2 years period (active now).

The majority of the work has been done at SNF.

Regards,
Paul

On Tue, Apr 3, 2012 at 10:26 PM, John Shott <shott at stanford.edu> wrote:

> SNF Industrial Lab Members:
>
> The National Science Foundation has asked us two questions about companies
> that are using our facility that are difficult for us to know, but likely
> very easy for you to determine.  This information will be only used by NSF
> and will not be published or discussed outside of the National Science
> Foundation.  It should only take a minute or two to respond.
>
> First, they have asked us to identify companies that were founded based on
> technology developed primarily at SNF or at one of the other NNIN
> laboratories.  This will primarily be companies formed by a faculty member
> or a graduate student based on University research, that have spun off from
> such research activity, or by companies that have licensed such technology.
>
> Second, they have asked us to identify companies that conduct the great
> majority of their fabrication R&D effort at SNF or at one of the other NNIN
> laboratories.
>
> If you believe that your company falls into either category, would you
> kindly send me a quick email message that includes your company name, the
> approximate year that your company was founded, and the category to which
> your company belongs.
>
> Thanks for your consideration.
>
> John
>
> Note: the other institutions that are members of the NNIN include Arizona
> State University, Cornell University, Georgia Tech, Harvard, Howard
> University, Penn State, UCSB, University of Colorado, University of
> Michigan, University of Minnesota, UT Austin, University of Washington, and
> Washington University  of St. Louis.
>
>
>
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From goldhaber-gordon at stanford.edu  Wed Apr  4 07:28:04 2012
From: goldhaber-gordon at stanford.edu (David Goldhaber-Gordon)
Date: Wed, 4 Apr 2012 07:28:04 -0700
Subject: Stanford Nanoprobes Workshop, May 18, 2012
In-Reply-To: <20120403161734.A1957441D33@smtp.stanford.edu>
References: <20120403161734.A1957441D33@smtp.stanford.edu>
Message-ID: <CAMnK59ETTpCzTVZ3OA8QagZGdN3dy9WVhDmarqq9NVh4GrucCg@mail.gmail.com>

Dear SNF Labmembers,

This is a reminder of the annual workshop of the Center for Probing the
Nanoscale at Stanford next month. We have an exciting array of speakers, as
you can see below.

Best,
David Goldhaber-Gordon
Director, Center for Probing the Nanoscale

 *If you have already registered, thank you!

PLEASE FORWARD TO OTHERS WHO MIGHT BE INTERESTED
Stanford University's Center for Probing the
<http://www.stanford.edu/group/cpn/>Nanoscale<http://www.stanford.edu/group/cpn/>(CPN)
8th Annual Workshop

*Friday, May 18, 2012
8:30-6, with continental breakfast and lunch included.
Poster session from 4-6, with hors d'oeuvres served.
* Registration<http://www.stanford.edu/group/cpn/research/anworkshop_reg.html>
*(Students, Postdocs and Stanford's CPN affiliates are FREE)

*Location:
 Huang <http://soenew.stanford.edu/visit/huang_center/index.html> Engineering
Center <http://soenew.stanford.edu/visit/huang_center/index.html>
*Mackenzie Room 300, 475 Via Ortega, Stanford University

[image: []]

-- 
-----------------------------------------------------------------
David Goldhaber-Gordon
goldhaber-gordon at stanford.edu
Associate Professor of Physics                  davidg at post.harvard.edu
and Director,                                                  (permanent
forwarding)
Center for Probing the Nanoscale
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)

Address for letters or packages:                      Administrative
Associate:
David Goldhaber-Gordon                                 Deborah Woodward
Geballe Laboratory for Advanced Materials       McCullough, Rm. 331
McCullough Building, Room 346                      Phone: (650) 723-0400
476 Lomita Mall                                             Fax: (650)
724-3681
Stanford, CA 94305-4045                                email:
deborahw at stanford.edu
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From cachang at stanford.edu  Wed Apr  4 09:18:43 2012
From: cachang at stanford.edu (Chia-Ming Chang)
Date: Wed, 4 Apr 2012 09:18:43 -0700 (PDT)
Subject: [Reminder] Special Seminar - Dr. Peter Kiesel (Palo Alto Research
 Center),	Thursday April 05,	4:15PM, CISX 101
In-Reply-To: <166775939.32778036.1332373094041.JavaMail.root@zm06.stanford.edu>
Message-ID: <1843054619.42481887.1333556323300.JavaMail.root@zm06.stanford.edu>







Special Seminar Presented by the Stanford Optical Society 
? 
? Opto-fluidic Detection System Enabling Sophisticated Point-of-care Diagnostics 
Dr. Peter Kiesel 
PARC (Palo Alto Research Center, Inc.) 
Thursday, April 05, 4:15 PM, CISX 101 Auditorium 
Refreshments at 4PM 
? The strategic landscape for biological and biomedical testing is undergoing a truly disruptive transformation. Today the majority of tests are performed at major, centralized clinical laboratories since compact, robust, and inexpensive instruments for point of care (POC) testing are not available. The principal drivers for POC testing are reducing costs, obtaining timely test results, lowering mortality rates, and reducing morbidity. We have demonstrated and prototyped a new optical detection approach that delivers high signal-to-noise discrimination ? without complex optics, expensive detectors or bulky excitation sources. It therefore enables a truly compact and low-cost microfluidic-based instrument that can be used for diagnostics on whole blood or other complex fluids. The enabling technique is termed ?spatially modulated emission? and generates a time-dependent signal as a continuously fluorescing bio-particle traverses a predefined pattern for optical transmission. Correlating the detected signal with the known pattern achieves high discrimination of the particle signal from background noise. The detection technique has been evaluated with measurements of CD4+ lymphocytes in human blood, which is required for initiation and monitoring the treatment of HIV-infected patients. T he technique has been benchmarked against a commercial instrument and excellent agreement for both absolute CD4 and percentage CD4 has been demonstrated. More recent experiments showed that our detection platform can address a large variety of diagnostic needs including multiplexed bead-based assays (ELISA on-the-flow) and identification and enumeration of pathogens (e.g., Giardia , Cryptosporidium and E.Coli ) in fluids. 


About the speaker 

Dr. Peter Kiesel, Principal Scientist, Palo Alto Research Center ? 
Dr. Kiesel is conducting research in the areas of compact optical sensing systems, ultra sensitive light detection, and nitride based light emitters. Leading the optical detection group at PARC, Peter's current research and development activities include compact on-chip optical detection systems targeting bio-technological and medical applications. Key technologies that he has developed over the last 5 years include: 
? ?? Micro-fluidic-based optical detection platform for on-the-flow analyte characterization; 
? ?? Spatially modulated excitation and emission technique for analyte detection with improved signal-to-noise discrimination which enables point-of-care flow cytometers; 
? ?? Low-cost interrogation unit for wavelength-encoded optical sensors; 
? ?? Improved light/target interaction by guiding light in the fluid containing the analyte; 
? ?? Cavity-enhanced sensing, a method enabling on-the-flow absorption and refractive index measurements in a microfluidic device; 
? ?? Chip-size spectrometer which enables fluorescence spectroscopy on a chip; and 
? ?? Detection of individual bacteria based on native fluorescence. Dr. Kiesel is author or coauthor of more than 240 scientific publications including 90 refereed journal articles, 53 issued patents, 22 patent applications and 3 book chapters. He has organized many international workshops and conferences and has been the principal investigator on more than 12 research projects covering a large variety of sensing systems and optoelectronic devices (e.g., pathogen detection in water, micro-fluidic flow cytometer, bio-detection based on native fluorescence spectroscopy, highly efficient light emitters, light modulators, sensitive photo detectors, opto-optical switches, and polarization coded logic elements). 
? 
http://photons.stanford.edu 



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From edmyers at stanford.edu  Wed Apr  4 13:31:28 2012
From: edmyers at stanford.edu (Ed Myers)
Date: Wed, 04 Apr 2012 13:31:28 -0700
Subject: EE410 Lab Class is starting
Message-ID: <4F7CAFA0.5020509@stanford.edu>

All,

The 2012 version of the EE410 Class will arrive in the fab next week.  
Lab schedules are still being developed, but the class will start with 
the ASML next week.  Once I have the official lab session times, I will 
be reserving the required equipment.  I apologize in advance to those 
who will lose their equipment reservations next week.  In future weeks, 
I will make the EE410 reservations much earlier.

Regards,
Your EE410 team


From mtang at stanford.edu  Thu Apr  5 17:57:04 2012
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 05 Apr 2012 17:57:04 -0700
Subject: Nanoink Dip Pen Litho Workshop, 4/18/12
Message-ID: <4F7E3F60.404@stanford.edu>

Hi all --

You may have seen (and been inconvenienced by) the construction work 
going on in the former Maintenance shop adjacent to the lab.  Your 
patience will soon be rewarded -- this will become the new 
nano-Structure Integration Lab.  The nSiL will be a shared lab for 
chemical and nano processes not normally allowed in the main lab.  Now 
that we will soon have a new space, we are now in the process of 
defining what goes into the space and how it will be used.  If you would 
like to join in on the conversation, stay tuned in coming weeks.  Or 
drop me a note.

One of faculty wishlist capabilities is dip pen nanolithography.  So 
Nanoink has agreed to hold a workshop/demo of their newest offering.  
This will be on April 18, in the Annex Auditorium, from 10-3, with lunch 
provided.  Attendees are welcome to bring samples to test (though I'd 
suggest contacting Nanoink in advance so that everyone can be prepared.) 
Please see the attached for details. Registration is limited.

The workshop is open to all.

Cheers --

Mary

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From ben.jian at arrayedfiberoptics.com  Thu Apr  5 21:24:33 2012
From: ben.jian at arrayedfiberoptics.com (Ben Jian)
Date: Thu, 05 Apr 2012 21:24:33 -0700
Subject: making tiny through holes in glass substrate
Message-ID: <4F7E7001.2010108@arrayedfiberoptics.com>

Hi Labmembers,

I am trying to find a cheap way to make some through holes in glass or 
fused silica.  This is for a prototype device.  The holes are 135um +/- 
10um and can have loose tolerance.  The glass substrate thickness should 
be at least 100um.  The hole profile is not very important.  We want to 
make a small number of holes (say 4x4) with a pitch of 500um.  We have 
looked into laser drilling but the price is too high for us ($3000).  It 
seems that very small diameter diamond drills of this diameter exist but 
I don't know who can provide this service, because air bearing drilling 
machines are required.  Does anyone have a low cost solution?  Thank you.

Ben


From clchang6 at stanford.edu  Fri Apr  6 00:01:25 2012
From: clchang6 at stanford.edu (Chienliu Chang)
Date: Fri, 6 Apr 2012 00:01:25 -0700
Subject: making tiny through holes in glass substrate
References: <4F7E7001.2010108@arrayedfiberoptics.com>
Message-ID: <9979EA6FDFF64216A81CC7C8034346E2@corp.cusa.canon.com>

Dear Ben,
I know two solutions for your spec.
1. You can find "Photosensitive glass wafers" in HOYA. They also offer 
conductive feed-throughs if needed.
2. Electrochemical etch of Pyrex glass. (You can search the author 
"Esashi".)

Method 2 above is doable here.
Additionally, I also have tried femto-second laser, but it is not a cheap 
way. (You can search my paper.)
I think there are still a lot of methods.
Good luck.
Chienliu

-------------------------------------------------
Chienliu Chang, Ph.D.

Room 104
Ginzton Laboratory
Center for Nanoscale Science & Engineering
Stanford University
348 Via Pueblo, Stanford, CA 94305-4088

Phone: 650-725-2265
Email: clchang6 at stanford.edu
       clchang6 at ntu.edu.tw
-------------------------------------------------
----- Original Message ----- 
From: "Ben Jian" <ben.jian at arrayedfiberoptics.com>
To: <labmembers at snf.stanford.edu>
Sent: Thursday, April 05, 2012 9:24 PM
Subject: making tiny through holes in glass substrate


> Hi Labmembers,
>
> I am trying to find a cheap way to make some through holes in glass or 
> fused silica.  This is for a prototype device.  The holes are 135um +/- 
> 10um and can have loose tolerance.  The glass substrate thickness should 
> be at least 100um.  The hole profile is not very important.  We want to 
> make a small number of holes (say 4x4) with a pitch of 500um.  We have 
> looked into laser drilling but the price is too high for us ($3000).  It 
> seems that very small diameter diamond drills of this diameter exist but I 
> don't know who can provide this service, because air bearing drilling 
> machines are required.  Does anyone have a low cost solution?  Thank you.
>
> Ben 



From sjkramer at micron.com  Fri Apr  6 07:44:49 2012
From: sjkramer at micron.com (Steve Kramer (sjkramer))
Date: Fri, 6 Apr 2012 14:44:49 +0000
Subject: making tiny through holes in glass substrate
In-Reply-To: <4F7E7001.2010108@arrayedfiberoptics.com>
References: <4F7E7001.2010108@arrayedfiberoptics.com>
Message-ID: <6A4577FCF96D6B449F19985D4A7685A00C567A99@NTXBOIMBX04.micron.com>

Ben,
I have used Ceramic Tech in Freemont to have wafer pockets milled into quartz blank wafers.  They may be able to provide the hole drilling service, or suggest someone who can.  I'm quite surprised that the laser drilling company was so expensive.

http://www.ceramictechinc.com/company.html
e-mail:  kanu at ceramictechinc.com.

Please tell them Micron Technology sent you.

Regards,
Steve

-----Original Message-----
From: Ben Jian [mailto:ben.jian at arrayedfiberoptics.com] 
Sent: Thursday, April 05, 2012 10:25 PM
To: labmembers at snf.stanford.edu
Subject: making tiny through holes in glass substrate

Hi Labmembers,

I am trying to find a cheap way to make some through holes in glass or 
fused silica.  This is for a prototype device.  The holes are 135um +/- 
10um and can have loose tolerance.  The glass substrate thickness should 
be at least 100um.  The hole profile is not very important.  We want to 
make a small number of holes (say 4x4) with a pitch of 500um.  We have 
looked into laser drilling but the price is too high for us ($3000).  It 
seems that very small diameter diamond drills of this diameter exist but 
I don't know who can provide this service, because air bearing drilling 
machines are required.  Does anyone have a low cost solution?  Thank you.

Ben


From maxms at stanford.edu  Fri Apr  6 17:06:38 2012
From: maxms at stanford.edu (Max Shulaker)
Date: Fri, 6 Apr 2012 17:06:38 -0700
Subject: Hf etch resist adhesion
In-Reply-To: <CAFHbKkG7_4Td+ZPju2EkaCTxYRrkgvGUwf+WK4Uvz6GKwPSfjA@mail.gmail.com>
References: <CAFHbKkG7_4Td+ZPju2EkaCTxYRrkgvGUwf+WK4Uvz6GKwPSfjA@mail.gmail.com>
Message-ID: <CAFHbKkGuXmZDC8jQYNhmf0LiuzKvJKQkQv3cuAE38AT8nmwKgg@mail.gmail.com>

Hello all,
I hope everyone had a good week.
I was wondering if anyone had a fix for poor resist adhesion during a
longer (15 minute) 6:1 BOE etch?  I notice all of my resist features peel
off after a few minutes.  My substrate, if you are curious, is hafnium
dioxide.
Thanks, and any help would be appreciated
Max
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From pradeep.nataraj at gmail.com  Fri Apr  6 18:41:00 2012
From: pradeep.nataraj at gmail.com (Pradeep Nataraj)
Date: Fri, 6 Apr 2012 18:41:00 -0700
Subject: Hf etch resist adhesion
In-Reply-To: <CAFHbKkGuXmZDC8jQYNhmf0LiuzKvJKQkQv3cuAE38AT8nmwKgg@mail.gmail.com>
References: <CAFHbKkG7_4Td+ZPju2EkaCTxYRrkgvGUwf+WK4Uvz6GKwPSfjA@mail.gmail.com>
	<CAFHbKkGuXmZDC8jQYNhmf0LiuzKvJKQkQv3cuAE38AT8nmwKgg@mail.gmail.com>
Message-ID: <CAEhDSuaynNGKhzyqvsBO0LXEU50TjLJQHN6hETO3B93NzNd0Cg@mail.gmail.com>

Max,

Make sure you hard bake the resist for at least 30 min at 110C.
Try using PadEtch, which is very benign to resist. I do not know if it
etches HfOx, I never tried it before.
Pradeep

On Fri, Apr 6, 2012 at 5:06 PM, Max Shulaker <maxms at stanford.edu> wrote:

> Hello all,
> I hope everyone had a good week.
> I was wondering if anyone had a fix for poor resist adhesion during a
> longer (15 minute) 6:1 BOE etch?  I notice all of my resist features peel
> off after a few minutes.  My substrate, if you are curious, is hafnium
> dioxide.
> Thanks, and any help would be appreciated
> Max
>
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From levi at snowboard.stanford.edu  Sun Apr  8 20:40:59 2012
From: levi at snowboard.stanford.edu (Ofer Levi)
Date: Sun, 08 Apr 2012 20:40:59 -0700
Subject: making tiny through holes in glass substrate
In-Reply-To: <6A4577FCF96D6B449F19985D4A7685A00C567A99@NTXBOIMBX04.micron.com>
References: <4F7E7001.2010108@arrayedfiberoptics.com> <6A4577FCF96D6B449F19985D4A7685A00C567A99@NTXBOIMBX04.micron.com>
Message-ID: <4F825A4B.1010206@snow.stanford.edu>

Hello Steve and Ben,
Not sure if you have checked this already but for larger holes, the 
crystal shop at the nano building next to CIS used to provide hole 
drilling service in Quartz wafers. You can ask Tim how small can he 
drill the holes, but it is worthwhile checking. It also depends on the 
tolerance for the distance between holes.

Regards,
Ofer


On 4/6/2012 7:44 AM, Steve Kramer (sjkramer) wrote:
> Ben,
> I have used Ceramic Tech in Freemont to have wafer pockets milled into quartz blank wafers.  They may be able to provide the hole drilling service, or suggest someone who can.  I'm quite surprised that the laser drilling company was so expensive.
>
> http://www.ceramictechinc.com/company.html
> e-mail:  kanu at ceramictechinc.com.
>
> Please tell them Micron Technology sent you.
>
> Regards,
> Steve
>
> -----Original Message-----
> From: Ben Jian [mailto:ben.jian at arrayedfiberoptics.com]
> Sent: Thursday, April 05, 2012 10:25 PM
> To: labmembers at snf.stanford.edu
> Subject: making tiny through holes in glass substrate
>
> Hi Labmembers,
>
> I am trying to find a cheap way to make some through holes in glass or
> fused silica.  This is for a prototype device.  The holes are 135um +/-
> 10um and can have loose tolerance.  The glass substrate thickness should
> be at least 100um.  The hole profile is not very important.  We want to
> make a small number of holes (say 4x4) with a pitch of 500um.  We have
> looked into laser drilling but the price is too high for us ($3000).  It
> seems that very small diameter diamond drills of this diameter exist but
> I don't know who can provide this service, because air bearing drilling
> machines are required.  Does anyone have a low cost solution?  Thank you.
>
> Ben


From rthowe at stanford.edu  Mon Apr  9 07:42:23 2012
From: rthowe at stanford.edu (Roger T. Howe)
Date: Mon, 09 Apr 2012 07:42:23 -0700
Subject: registering for NanoInk Workshop
In-Reply-To: <21D0D9B821CCE04E83622FC6410727BD035BBBD5@EXSVRSKO01.NANOINK>
References: <21D0D9B821CCE04E83622FC6410727BD035BBBD5@EXSVRSKO01.NANOINK>
Message-ID: <4F82F54F.60809@stanford.edu>

All,

Be sure to register, of you'll have to bring your own lunch.

Roger

-------- Original Message --------
Subject: 	RE: NanoInk Workshop
Date: 	Mon, 9 Apr 2012 09:40:49 -0500
From: 	Karen Berkley <kberkley at NANOINK.net>
To: 	Roger T. Howe <rthowe at stanford.edu>



Hi Roger,

I just wanted to make sure that everyone who plans to attend does 
register with the following link.  We want to make sure we have enough 
food for lunch.

http://tiny.cc/Nanoink-Stanford

Thank you,

Karen

*From:*Roger T. Howe [mailto:rthowe at stanford.edu]
*Sent:* Friday, April 06, 2012 6:30 PM
*To:* Karen Berkley
*Cc:* Roger T. Howe
*Subject:* Re: NanoInk Workshop

Karen,

Thanks for the invitation.  I'll try to stop by -- several from my group 
will be there.

Roger

On 4/6/12 9:15 AM, Karen Berkley wrote:

Dear Roger,

We wanted to send you a personal invitation to our upcoming workshop at 
Stanford.  Hope you can make it.

Best regards,

Karen

*KAREN BERKLEY **I*Administrative Assistant*I*****NanoFabrication 
Systems Division

t: 1-847-329-2971 *I*  f: 1-847-679-8767 *I*kberkley at nanoink.net 
<mailto:kberkley at nanoink.net>

____________________________________________________________________

*NanoInk, Inc. **I****Illinois Science & Technology Park **I**  8025 
Lamon Ave, Skokie, IL 60077 USA*

*t: 1-847-679-NANO (6266) **I**  f: 1-847-679-8767 **I**www.NanoInk.net 
<http://www.NanoInk.net>*

**

*IMPORTANT NOTICE:
This email contains information from the sender that may be 
CONFIDENTIAL, LEGALLY PRIVILEGED, PROPRIETARY or otherwise protected 
from disclosure. This email is intended for use only by the person or 
entity to whom it is addressed.  If you are not the intended recipient, 
any use, disclosure, copying, distribution, printing, or any action 
taken in reliance on the contents of this email, is strictly prohibited.*

**

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From usharaghuram at gmail.com  Mon Apr  9 08:56:03 2012
From: usharaghuram at gmail.com (Usha Raghuram)
Date: Mon, 9 Apr 2012 08:56:03 -0700
Subject: making tiny through holes in glass substrate
In-Reply-To: <4F825A4B.1010206@snow.stanford.edu>
References: <4F7E7001.2010108@arrayedfiberoptics.com>
	<6A4577FCF96D6B449F19985D4A7685A00C567A99@NTXBOIMBX04.micron.com>
	<4F825A4B.1010206@snow.stanford.edu>
Message-ID: <CAF4-F1t9Y2Qsgp7NStkCxvFCVJ=cors9w+xtZj+h_txKiTwpNw@mail.gmail.com>

Hello Ben,

Ihave used Crystalmark befgore to driull through holes in quartz. They may
be able to do what you need.  Here is the contact info.

Chris Romero
Crystal Mark, Inc.
613 Justin Ave.
Glendale, CA 91201
telephone (818) 240-7520 x235
fax (818) 247-3574
email chris at crystalmarkinc.com

Regards,

Usha

On Sun, Apr 8, 2012 at 8:40 PM, Ofer Levi <levi at snowboard.stanford.edu>wrote:

> Hello Steve and Ben,
> Not sure if you have checked this already but for larger holes, the
> crystal shop at the nano building next to CIS used to provide hole drilling
> service in Quartz wafers. You can ask Tim how small can he drill the holes,
> but it is worthwhile checking. It also depends on the tolerance for the
> distance between holes.
>
> Regards,
> Ofer
>
>
>
> On 4/6/2012 7:44 AM, Steve Kramer (sjkramer) wrote:
>
>> Ben,
>> I have used Ceramic Tech in Freemont to have wafer pockets milled into
>> quartz blank wafers.  They may be able to provide the hole drilling
>> service, or suggest someone who can.  I'm quite surprised that the laser
>> drilling company was so expensive.
>>
>> http://www.ceramictechinc.com/**company.html<http://www.ceramictechinc.com/company.html>
>> e-mail:  kanu at ceramictechinc.com.
>>
>> Please tell them Micron Technology sent you.
>>
>> Regards,
>> Steve
>>
>> -----Original Message-----
>> From: Ben Jian [mailto:ben.jian@**arrayedfiberoptics.com<ben.jian at arrayedfiberoptics.com>
>> ]
>> Sent: Thursday, April 05, 2012 10:25 PM
>> To: labmembers at snf.stanford.edu
>> Subject: making tiny through holes in glass substrate
>>
>> Hi Labmembers,
>>
>> I am trying to find a cheap way to make some through holes in glass or
>> fused silica.  This is for a prototype device.  The holes are 135um +/-
>> 10um and can have loose tolerance.  The glass substrate thickness should
>> be at least 100um.  The hole profile is not very important.  We want to
>> make a small number of holes (say 4x4) with a pitch of 500um.  We have
>> looked into laser drilling but the price is too high for us ($3000).  It
>> seems that very small diameter diamond drills of this diameter exist but
>> I don't know who can provide this service, because air bearing drilling
>> machines are required.  Does anyone have a low cost solution?  Thank you.
>>
>> Ben
>>
>
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From mtang at stanford.edu  Tue Apr 10 08:58:46 2012
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 10 Apr 2012 08:58:46 -0700
Subject: Fire alarm testing this morning
Message-ID: <4F8458B6.4010309@stanford.edu>

Dear building occupants --

We've been informed that there will fire alarm testing this morning as 
part of the final permitting for the SNF renovation project.  Many 
apologies for the inconvenience.  The testing will begin shortly, but 
should be complete by about 10 am.

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From shott at stanford.edu  Tue Apr 10 09:01:14 2012
From: shott at stanford.edu (John Shott)
Date: Tue, 10 Apr 2012 09:01:14 -0700
Subject: Fire alarm testing today and tomorrow ...
Message-ID: <4F84594A.5020008@stanford.edu>

SNF Lab Members and Allen Building Occupants:

There will be fire alarm testing occurring today (Tuesday) from about 9 
a.m. and 11 a.m. as the contractors and SUFMO officials test some new 
fire alarms and smoke detectors.

Then, tomorrow (Wednesday) this exercise will be repeated with Santa 
Clara county fire officials in attendance.

These alarms may be safely ignored.

I apologize for this short notice and for the inconvenience this may 
cause ...

Thanks,

John



From mbaran at stanford.edu  Tue Apr 10 14:42:08 2012
From: mbaran at stanford.edu (Maureen Baran)
Date: Tue, 10 Apr 2012 14:42:08 -0700 (PDT)
Subject: Found Cell Phone in a Case in the Gowning Room - if it's yours please Claim
Message-ID: <00b901cd1762$c8ca08d0$5a5e1a70$@stanford.edu>

Dear Labmembers,

 

A Staff member found a cell phone in a case in the gowning room.  If you
are missing yours please come by my cubicle and claim it.  I'm in cubicle
# 41 near the exterior doors facing the outside construction on the first
floor of the Allen building.

 

Maureen

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From mbaran at stanford.edu  Wed Apr 11 15:05:29 2012
From: mbaran at stanford.edu (Maureen Baran)
Date: Wed, 11 Apr 2012 15:05:29 -0700 (PDT)
Subject: Another USB stick was found in the Lab 
Message-ID: <01b101cd182f$35ccb4b0$a1661e10$@stanford.edu>

Dear Labmembers,

 

Another USB Stick was found in the lab.  It has AXIOM on it.  It is at my
desk if it's yours.  I'm in cubicle #41 on the first floor of the Allen
building.

 

Maureen

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From rthowe at stanford.edu  Thu Apr 12 09:35:20 2012
From: rthowe at stanford.edu (Roger T. Howe)
Date: Thu, 12 Apr 2012 09:35:20 -0700
Subject: Mike Roco seminar TODAY, 5:30, LKS Center 130
Message-ID: <4F870448.90601@stanford.edu>

A chance to see the big picture of US nanotechnology policy, from one of 
its senior authors.

Date: TODAY!
Time: 5:30-6:30
Location: Li Ka Shing Center, School of Medicine, Room LK 130
Reception following in lobby of LKS

Dr. Mike Roco
Senior Advisor on Nanotechnology
National Science Foundation

20 Years to Develop Nanotechnology: 2000 - 2020

Abstract

Twenty years is the estimated time scale to develop nanotechnology from 
basic interdisciplinary
concepts in 2000 to create a general purpose technology with mass and 
sustainable use by 2020
(?Nanotechnology Research Direction? NSTC 1999). This presentation 
outlines the outcomes in
the last ten years, what has worked and what has not, the current 
status, and most importantly how we
prepare now for the future (see ?Nanotechnology Research Directions for 
Societal Needs in 2020?
Springer 2011 www.wtec.org/nano2/). There is an increased focus on 
nanoscale science and
engineering integration, convergence with biology and other scientific 
domains, and establishing a
general-purpose technology. Use of ?direct? investigative tools and 
fundamental knowledge
progress through breakthroughs remain essential in still formative phase 
of development of
nanotechnology in 2012. The labor and markets are estimated to double 
each three years,
reaching a $3 trillion market encompassing 6 million jobs by 2020. It 
will be imperative over the
next decade to focus on four distinct aspects of nanotechnology 
development: better
comprehension of nature and communication leading to knowledge progress; 
technology, economic
and societal solutions leading to material progress; international 
collaboration on sustainable
development and quality of life leading to global progress; and people 
working together for equitable
governance leading to moral progress.


From mtang at stanford.edu  Thu Apr 12 14:11:21 2012
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 12 Apr 2012 14:11:21 -0700
Subject: Seminar:  SARFUS Technology for optical enhancement of nm-scale features
Message-ID: <4F8744F9.7060304@stanford.edu>

Hi all --

There will be a presentation by Nanolane, a company with a new form of optical microscopy capable of detecting nano-objects that is called surface-enhanced ellipsometric contrast microscopy (SEEC) (http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-15-13-8329).

The technique's power lies in the use of contrast-enhancing substrates called Surf slides:http://www.nano-microscopy.com/, they behave as though the diffraction limit along the z-axis was overcome. All sorts of nanomaterials can be imaged and measured by SEEC and its mesuring extension (quantitative SEEC), in particular organics:http://pubs.acs.org/doi/abs/10.1021/la202703j  but not only. On top of that, SEEC's high sensitivity to refractive index gradients makes it particularly appealing to the imaging of microscopic objects such as cells.

We believe such a non-invasive technique is quite complementary to other nanocharacterisation tools and could be used on a daily basis in labs to take a first look at a system prior to turning to more involved techniques.

This will be in the Allen 101 Conference room (not 101X) at 10 am on Friday, April 13.

(I saw this at the MRS and invited them to Stanford.  They have commercially available substrates that can be processed using most conventional fab methods -- and can be used to visualize nm-scale films and features, such as DNA, ALD films, CNT's...  Very cool.)

Mary


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From mtang at stanford.edu  Thu Apr 12 22:57:38 2012
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 12 Apr 2012 22:57:38 -0700
Subject: Power Glitch
Message-ID: <4F87C052.6070301@stanford.edu>

Hi all --

Max just informed me of a what he suspects might have been a power 
glitch in the lab (lights dimmed -- not surprising, given tonight's 
storm.)  History has shown that this can adversely affect equipment in 
the lab in unpredictable ways.  Recipes or process files may be lost,  
Logic may be messed up.  Before you use a tool, please do all the system 
checks before running.  If you encounter any problems, make sure to note 
your observations on Coral.  Staff will check things in the morning.

Thanks for your attention --

Mary


From mark.dante at thinsilicon.com  Fri Apr 13 07:46:04 2012
From: mark.dante at thinsilicon.com (Mark Dante)
Date: Fri, 13 Apr 2012 07:46:04 -0700
Subject: Pyramid texture etching
Message-ID: <CAOsHdoo+vw-XEMRjst+H8V6CZc+rWMOVTFg+KNyNffwG7qOFrg@mail.gmail.com>

Does anyone have any experience doing a pyramid texture etch on Si
wafers? I'm having trouble getting separated, well defined pyramids.
Any input on concentrations and experimental set ups would be much
appreciated. Thanks so much.

Mark

-- 
Mark Dante
Scientist/Project Manager
ThinSilicon Corp.
1400 N Shoreline Blvd, Suite B-3
Mountain View, CA 94043
Office: 650-937-0004
Fax: 650-937-0005


From mtang at stanford.edu  Fri Apr 13 09:20:14 2012
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 13 Apr 2012 09:20:14 -0700
Subject: Reminder:  SARFUS Presentation today at 10 am
Message-ID: <4F88523E.9000807@stanford.edu>

Hi all --

There will be a presentation by Nanolane, a company with a new form of 
optical microscopy capable of detecting nano-objects called 
surface-enhanced ellipsometric contrast microscopy (SEEC) 
(http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-15-13-8329).

The technique's power lies in the use of contrast-enhancing substrates 
called Surf slides:http://www.nano-microscopy.com/. All sorts of 
nanomaterials can be imaged and measured by SEEC and its mesuring 
extension (quantitative SEEC), in particular 
organics:http://pubs.acs.org/doi/abs/10.1021/la202703j . On top of that, 
SEEC's high sensitivity to refractive index gradients makes it 
particularly appealing to the imaging of microscopic objects such as cells.

This non-invasive/non-destructive technique is quite complementary to 
other nanocharacterisation tools and could be used on a daily basis in 
labs to take a first look at a system prior to turning to more involved 
techniques.

This will be in the Allen 101 Conference room (not 101X) at 10 am on 
Friday, April 13.

(I saw this at the MRS and invited them to Stanford.  They have 
commercially available substrates that can be processed using most 
conventional fab methods -- and can be used to visualize nm-scale films 
and features, such as DNA, ALD films, CNT's...  Very cool.)

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From takane at stanford.edu  Fri Apr 13 12:12:34 2012
From: takane at stanford.edu (Takane Usui)
Date: Fri, 13 Apr 2012 12:12:34 -0700
Subject: Angstrom Advanced Ellipsometer?
Message-ID: <3BFA8FCFA33C4D71B4BF45A0A764C6DB@takanepc3>

Hello Labmembers,

Has anyone had any experience with an ellipsometer from Angstrom Advanced?

Thank you,
Takane 

--
Takane Usui
Ph. D. Candidate
Stanford University

Email: takane at stanford.edu
Phone: (310) 500-6132
Web: npl-web.stanford.edu
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From kennygee at stanford.edu  Fri Apr 13 13:06:12 2012
From: kennygee at stanford.edu (Kenny Green)
Date: Fri, 13 Apr 2012 13:06:12 -0700
Subject: Fwd: BioE+ChE Construction Update - Week of April 16th
In-Reply-To: <C3466900058BF7469466BF3CD5372FBA11967C3D@wt-exch2.whiting-turner.com>
References: <C3466900058BF7469466BF3CD5372FBA11967C3D@wt-exch2.whiting-turner.com>
Message-ID: <4F888734.1070301@stanford.edu>



Please find attached the update for next week.

Changes from last week include:

  * Shotcrete operations will resume work on the North side of the site
    in the light well.
  * East portions of slab on grade in the basement and subbasement are
    now being poured next week.
  * Major pours next week will be for slab on grade on Monday (approx. 9
    trucks) and Friday (approx. 15 trucks).

Have a great weekend.

Chris Virgilio

Whiting-Turner Contracting Co.

4000 Via Ortega

Stanford, CA 94305

o. 925.271.6596

c. 925.580.4554

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From arkam at stanford.edu  Fri Apr 13 15:20:51 2012
From: arkam at stanford.edu (Arka Majumdar)
Date: Fri, 13 Apr 2012 15:20:51 -0700 (PDT)
Subject: Fwd: [ee-doctorate] Oral Exam Announcement: Arka Majumdar
In-Reply-To: <4F85ABF8.3030002@ee.stanford.edu>
Message-ID: <783252837.51904444.1334355651300.JavaMail.root@zm06.stanford.edu>



----- Forwarded Message -----
From: "Student Services" <studentservices at ee.stanford.edu>
To: ee-students at lists.stanford.edu
Sent: Wednesday, April 11, 2012 9:06:16 AM
Subject: [ee-doctorate] Oral Exam Announcement: Arka Majumdar




Solid State Cavity Quantum Electrodynamics with Quantum Dots Coupled to Photonic Crystal Cavities 

Arka Majumdar 

(Advisor: Prof. Jelena Vuckovic) 

Date: Monday, April 16 th , 2012; Time: 2pm (Refreshment starts at 1:45 pm) 

Venue: Paul G. Allen ( CIS - X ) Auditorium 



Quantum dots (QDs) coupled to optical cavities constitute a scalable, robust, on-chip, semiconductor platform for probing fundamental cavity quantum electrodynamics. Very strong interaction between light and matter can be achieved in this system as a result of the field localization inside sub-cubic wavelength volumes leading to vacuum Rabi frequencies in the range of 10s of GHz. Such strong light-matter interaction produces an optical nonlinearity that is present even at single-photon level and is tunable at a very fast time-scale. This enables one to go beyond fundamental CQED studies and to employ such effects for building practical information processing devices. My PhD work has focused on both fundamental physics of the coupled QD-nanocavity system, as well as on several proof-of-principle devices for low-power optical information processing based on this platform. 

We have demonstrated the effects of photon blockade and photon-induced tunneling, which confirm the quantum nature of the coupled dot-cavity system. Using these effects and the photon correlation measurements of light transmitted through the dot-cavity system, we identify the first and second order energy manifolds of the Jaynes-Cummings ladder describing the strong coupling between the quantum dot and the cavity field, and propose a new way to generate mutli-Fock states with high purity [1]. In addition, the interaction of the quantum dot with its semiconductor environment gives rise to novel phenomena unique to a solid state cavity QED system, namely phonon-mediated off-resonant dot-cavity coupling. We have employed this effect to perform cavity-assisted resonant quantum dot spectroscopy [2], which allows us to resolve frequency features far below the limit of a conventional spectrometer. Finally, the applications of such a coupled dot-cavity system in optical information processing including ultrafast, low power all-optical switching and electro-optic modulation are explored. With the light-matter interactions controlled at the most fundamental level, the nano-photonic devices we implemented on this platform operate at extremely low control powers and could achieve switching speeds potentially exceeding 10GHz [3]. 

References: 

1. Majumdar et. al., arXiv:1106.1926 (in press, PRA); arXiv:1111.6326 (in press, PRL) (2011). 

2. Englund, Majumdar et.al., PRL, Vol 104, 073904 (2010); Majumdar et.al., PRB, 82, 045306, (2010); PRB 84, 085309 (2011); PRB 84, 085310 (2011); PRB 84, 195304 (2011); arXiv:1111.7097; Rundquist, Majumdar et. al., APL 99, 251907 (2011). 

3. Faraon, Majumdar et. al., PRL, Vol 104, 047402 (2010); Majumdar et. al., Optics Express, Vol 18, pp. 3974-3984 (2010); Englund, Majumdar et. al., PRL, 108, 093604, (2012); Majumdar et.al., PRA, 85, 033802, (2012). 
-- 
EE students mailing list
ee-students at lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-students

_______________________________________________
ee-doctorate mailing list
ee-doctorate at lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-doctorate


From ben.jian at arrayedfiberoptics.com  Fri Apr 13 21:06:53 2012
From: ben.jian at arrayedfiberoptics.com (Ben Jian)
Date: Fri, 13 Apr 2012 21:06:53 -0700
Subject: making tiny through holes in glass substrate
In-Reply-To: <CAF4-F1t9Y2Qsgp7NStkCxvFCVJ=cors9w+xtZj+h_txKiTwpNw@mail.gmail.com>
References: <4F7E7001.2010108@arrayedfiberoptics.com> <6A4577FCF96D6B449F19985D4A7685A00C567A99@NTXBOIMBX04.micron.com> <4F825A4B.1010206@snow.stanford.edu> <CAF4-F1t9Y2Qsgp7NStkCxvFCVJ=cors9w+xtZj+h_txKiTwpNw@mail.gmail.com>
Message-ID: <4F88F7DD.1010700@arrayedfiberoptics.com>

Hi Usha,

Thank you for your advice.  I have found a SNF lab user who did the job 
for me already.  Thanks!

Ben

On 4/9/2012 8:56 AM, Usha Raghuram wrote:
> Hello Ben,
> Ihave used Crystalmark befgore to driull through holes in quartz. They 
> may be able to do what you need.  Here is the contact info.
> Chris Romero
> Crystal Mark, Inc.
> 613 Justin Ave.
> Glendale, CA 91201
> telephone (818) 240-7520 x235
> fax (818) 247-3574
> email chris at crystalmarkinc.com <mailto:chris at crystalmarkinc.com>
>
> Regards,
> Usha
> On Sun, Apr 8, 2012 at 8:40 PM, Ofer Levi <levi at snowboard.stanford.edu 
> <mailto:levi at snowboard.stanford.edu>> wrote:
>
>     Hello Steve and Ben,
>     Not sure if you have checked this already but for larger holes,
>     the crystal shop at the nano building next to CIS used to provide
>     hole drilling service in Quartz wafers. You can ask Tim how small
>     can he drill the holes, but it is worthwhile checking. It also
>     depends on the tolerance for the distance between holes.
>
>     Regards,
>     Ofer
>
>
>
>     On 4/6/2012 7:44 AM, Steve Kramer (sjkramer) wrote:
>
>         Ben,
>         I have used Ceramic Tech in Freemont to have wafer pockets
>         milled into quartz blank wafers.  They may be able to provide
>         the hole drilling service, or suggest someone who can.  I'm
>         quite surprised that the laser drilling company was so expensive.
>
>         http://www.ceramictechinc.com/company.html
>         e-mail: kanu at ceramictechinc.com <mailto:kanu at ceramictechinc.com>.
>
>         Please tell them Micron Technology sent you.
>
>         Regards,
>         Steve
>
>         -----Original Message-----
>         From: Ben Jian [mailto:ben.jian at arrayedfiberoptics.com
>         <mailto:ben.jian at arrayedfiberoptics.com>]
>         Sent: Thursday, April 05, 2012 10:25 PM
>         To: labmembers at snf.stanford.edu
>         <mailto:labmembers at snf.stanford.edu>
>         Subject: making tiny through holes in glass substrate
>
>         Hi Labmembers,
>
>         I am trying to find a cheap way to make some through holes in
>         glass or
>         fused silica.  This is for a prototype device.  The holes are
>         135um +/-
>         10um and can have loose tolerance.  The glass substrate
>         thickness should
>         be at least 100um.  The hole profile is not very important.
>          We want to
>         make a small number of holes (say 4x4) with a pitch of 500um.
>          We have
>         looked into laser drilling but the price is too high for us
>         ($3000).  It
>         seems that very small diameter diamond drills of this diameter
>         exist but
>         I don't know who can provide this service, because air bearing
>         drilling
>         machines are required.  Does anyone have a low cost solution?
>          Thank you.
>
>         Ben
>
>
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From npapte at stanford.edu  Sat Apr 14 16:09:27 2012
From: npapte at stanford.edu (Nikhil Apte)
Date: Sat, 14 Apr 2012 16:09:27 -0700
Subject: Kapton tape residue?
In-Reply-To: <AANLkTi=5__dotaex=dA=vhqmKz12D=MO1m85tW_3J7jP@mail.gmail.com>
References: <AANLkTi=5__dotaex=dA=vhqmKz12D=MO1m85tW_3J7jP@mail.gmail.com>
Message-ID: <CAHqdPi0MKc65P73dsmPubvunTZu6YgUDO5KSnVrrDLfQLqeRPw@mail.gmail.com>

Hi labmembers,

Does anybody have any experience of removing Kapton tape residue from
oxidized silicon wafers?

Thanks,
Nikhil
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From jouyang at stanford.edu  Mon Apr 16 19:13:06 2012
From: jouyang at stanford.edu (Joanie Ouyang)
Date: Mon, 16 Apr 2012 19:13:06 -0700 (PDT)
Subject: Fwd: Stanford MRS Art of Science Competition: Call for Submissions
In-Reply-To: <CAGfAdMDaC52eUQ0_oh88G+ohYbZ3pgaYonXBr2Gc492n=f=vWw@mail.gmail.com>
Message-ID: <391623259.13179690.1334628786465.JavaMail.root@zm03.stanford.edu>

For those interested in art.

-Joanie Ouyang
Materials Science and Engineering
Stanford University

----- Forwarded Message -----
From: "Ashwin Atre" <aatre at stanford.edu>
To: stanford-mrs at lists.stanford.edu, matsci-informal at lists.stanford.edu, mse-faculty at lists.stanford.edu, mse-students at lists.stanford.edu, mse-undergrads at lists.stanford.edu
Sent: Monday, April 16, 2012 6:59:06 PM
Subject: [matsci-informal] Stanford MRS Art of Science Competition: Call for	Submissions



The First Annual 
Art of Science Competition 

at Stanford University 
sponsored by the Materials Research Society 



The Art of Science Competition celebrates the aesthetics of research and explores the interconnected nature of science and art. An exhibition showcasing the best submissions will take place at the end of Spring Quarter. 


Send submissions to: StanfordMRS.AOS at gmail.com 


Award categories and prizes: 
First place ($100) 
Second place ($75) 
Third place ($50) 
People's choice ($25) 
Honorable mention: Non-microscopy image ($25) 
Honorable mention: Technical merit ($25) 




Inline image 1





Requirements of submission: 
All members of the Stanford community are invited to submit. Submission is limited to one piece per contestant. The focus of this competition is art, and thus the aesthetic rather than scientific quality of the image is key. Images must be related to materials science, broadly defined, but otherwise no limitations exist for image content. Creativity and uniqueness will be considered favorably. All images should be submitted as a high resolution .jpg file of at least 300 dpi, with a maximum size of 10 MB. The filename should include the submitter's first and last names. Images should be sent to StanfordMRS.AOS at gmail.com , along with a short description (maximum 150 words) of the techniques used, the object imaged, and the inspiration for the piece, as well as the full name of the submitter and his/her academic department. 


Submission deadline: 
May 18, 2012 

Judging and event details: 
Executives of the Stanford chapter of the Materials Research Society, faculty of the Dept. of Materials Science, and local artists will judge the submissions and will select finalists to be printed and put on display during the event. The time and location of the exhibition is TBD, but will take place at the end of the Spring quarter. 
_______________________________________________
matsci-informal mailing list
matsci-informal at lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/matsci-informal
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From bwchui at yahoo.com  Tue Apr 17 00:13:46 2012
From: bwchui at yahoo.com (Benjamin Chui)
Date: Tue, 17 Apr 2012 00:13:46 -0700 (PDT)
Subject: Six-inch wafer dishes
In-Reply-To: <4F88523E.9000807@stanford.edu>
References: <4F88523E.9000807@stanford.edu>
Message-ID: <1334646826.14415.YahooMailNeo@web162404.mail.bf1.yahoo.com>

Hello,

??? I was wondering if someone might have 2 six-inch wafer dishes (with the accompanying octopus springs) they could sell to/barter with me. Used or new doesn't matter, as long as they are reasonably clean. Thanks!

Ben Chui
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From mtang at stanford.edu  Tue Apr 17 10:46:38 2012
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 17 Apr 2012 10:46:38 -0700
Subject: Nanoink Dip Pen Litho Workshop, 4/18/12
In-Reply-To: <4F7E3F60.404@stanford.edu>
References: <4F7E3F60.404@stanford.edu>
Message-ID: <4F8DAC7E.6080306@stanford.edu>

Hi all --

Just a reminder of this workshop -- it's tomorrow and there are still a 
few spaces left!

M

-------- Original Message --------
Subject: 	Nanoink Dip Pen Litho Workshop, 4/18/12
Date: 	Thu, 05 Apr 2012 17:57:04 -0700
From: 	Mary Tang <mtang at stanford.edu>
To: 	labmembers at snf.stanford.edu



Hi all --

You may have seen (and been inconvenienced by) the construction work
going on in the former Maintenance shop adjacent to the lab.  Your
patience will soon be rewarded -- this will become the new
nano-Structure Integration Lab.  The nSiL will be a shared lab for
chemical and nano processes not normally allowed in the main lab.  Now
that we will soon have a new space, we are now in the process of
defining what goes into the space and how it will be used.  If you would
like to join in on the conversation, stay tuned in coming weeks.  Or
drop me a note.

One of faculty wishlist capabilities is dip pen nanolithography.  So
Nanoink has agreed to hold a workshop/demo of their newest offering.
This will be on April 18, in the Annex Auditorium, from 10-3, with lunch
provided.  Attendees are welcome to bring samples to test (though I'd
suggest contacting Nanoink in advance so that everyone can be prepared.)
Please see the attached for details. Registration is limited.

The workshop is open to all.

Cheers --

Mary



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From luckys at stanford.edu  Tue Apr 17 16:21:28 2012
From: luckys at stanford.edu (Lucky Suriyasena Liyanage)
Date: Tue, 17 Apr 2012 16:21:28 -0700 (PDT)
Subject: Er, Y evaporation
In-Reply-To: <1937622562.14326210.1334704723223.JavaMail.root@zm03.stanford.edu>
Message-ID: <875596613.14330254.1334704888314.JavaMail.root@zm03.stanford.edu>


Dear lab members,

Does anybody have experience evaporating Er/Y in Innotec or in any other machines outside SNF?

I would very much like to talk to you and share your experience. 
I believe I have  possible oxidation problem during/after evaporation thus I cannot use them for contacts.

Thank you. Any input or thought is highly appreciated.

Sincerely,
Lucky   


From rthowe at stanford.edu  Wed Apr 18 06:37:42 2012
From: rthowe at stanford.edu (Roger T. Howe)
Date: Wed, 18 Apr 2012 06:37:42 -0700
Subject: jobs at GE Global Research
Message-ID: <4F8EC3A6.70004@stanford.edu>

All,

Ron Olson, the Micro/Nano Fab Operations Manager at GE Global Research 
in New York, forwarded these job openings.

Roger


Testing&  Analysis Semiconductor Engineer<http://jobs.gecareers.com/search?utm_source=GECareerSite&startrow=1&q=1518607>
or go towww.gecareers.com<http://www.gecareers.com/>  and type in the search ?1518607?

DECRIPTION: As a Testing&  Analysis Semiconductor Engineer, you will develop solutions and lead the testing and analysis of novel power semiconductor devices , you will (1) build and adapt new or existing electrical testing hardware for evolving device testing needs for applications of interest to GE and (2) coordinate device testing, packaging and logistics per GE application needs. You will be an integral part of a multidisciplinary team charged with developing novel device ideas and associated fabrication methods and transitioning devices to GE business units.

Power Device Senior Process Engineer<http://jobs.gecareers.com/search?utm_source=GECareerSite&startrow=1&q=1518584>
or go towww.gecareers.com<http://www.gecareers.com/>  and type in the search ?1518584?

DESCRIPTION: As a Power Device Senior Process Engineer you will be working in a Class 100 clean room with a highly integrated team that is researching and developing state of the art SiC power devices and technologies. You will be responsible for process integration of a variety of SiC power devices. You will provide technical leadership to a team of engineers and technicians and be responsible for fabrication of advanced SiC devices, establishment of process controls, and lead troubleshooting efforts. Along with these activities you will be responsible for the development of processes and process flows for SiC power devices.






From mbaran at stanford.edu  Wed Apr 18 13:13:26 2012
From: mbaran at stanford.edu (Maureen Baran)
Date: Wed, 18 Apr 2012 13:13:26 -0700 (PDT)
Subject: Food is available on the Patio
Message-ID: <00bf01cd1d9f$b7334ad0$2599e070$@stanford.edu>

Dear All,

 

There are some sandwiches and salads on the patio.

 

Maureen

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From su1 at stanford.edu  Thu Apr 19 17:10:28 2012
From: su1 at stanford.edu (Suhas Kumar)
Date: Thu, 19 Apr 2012 17:10:28 -0700
Subject: VO2 deposition/vendors
Message-ID: <CAJjGYaYX+9cyH5qoF_jeddnNyYbC33rY1St0RQatR=nP_WMcsg@mail.gmail.com>

Hi All,

I am looking to get high quality VO2 (vanadium dioxide) films. Does anyone
have experience in depositing VO2? Any leads to a previously tried method
will be very appreciated.
Alternately, if anyone has info about vendors who supply VO2 films on
sapphire (or any other substrate), please let me know.

thanks
suhas
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From roberth at quswami.com  Fri Apr 20 08:49:37 2012
From: roberth at quswami.com (Robert Huang)
Date: Fri, 20 Apr 2012 08:49:37 -0700
Subject: sol-gel deposition of Pt nanoparticles
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB16D4BF2AA10@QUSWAMI-DSRV1.quswami.local>

Hello fellow lab members,

Do any of you have experience with sol-gel processing (or other techniques) to deposit Pt nanoparticles?  Initially we would like to do blanket wafer "depositions" but ultimately we want to do patterned depositions.  For the latter, from what I understand about the sol-gel technique, we'll need to do lift-off.  Any information/details would be appreciated.

Regards,

Robert Huang
Director, Process and Device Technology
QuSwami, Inc.
455 Mission Bay Blvd. South
Building 3, Suite 125
San Francisco, CA 94158
W: (415) 834-9910
M: (408) 854-0450
F: (415) 834-9975
Email: roberth at quswami.com<mailto:roberth at quswami.com>

**********************Privacy and Confidentiality Notice**********************
The information contained in this communication is proprietary, confidential, copyright, trade secret of QuSwami, Inc. It is intended solely for the use of the individual or entity to whom it is addressed and others authorized to receive it. If you are not the intended recipient, you are hereby notified that any disclosure, copying, distribution or taking any action in reliance to the contents of this information is strictly prohibited.
******************************************************************************
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From mtang at stanford.edu  Fri Apr 20 15:42:10 2012
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 20 Apr 2012 15:42:10 -0700
Subject: Limited access to CISX/CIS Corridor - 4/20-4/21
Message-ID: <4F91E642.9090609@stanford.edu>

Dear building occupants:

The new nSiL labs (which occupy the former SNF Maintenance Shop & Office 
areas) have just undergone County inspection and will soon be ready to 
use.  To prepare them,  a professional custodial crew will be cleaning, 
polishing, and waxing floors in the nSil and adjacent areas.  This will 
take place this evening and tomorrow evening.   The areas affected will 
include the corridor from the CIS/CISX door extending to the Receiving 
area.  So please do not exit CIS through the Receiving area or through 
the CIS/CISX double-doors during this time.

Thanks for your attention --

Your SNF Staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From svo at stanford.edu  Sun Apr 22 12:33:04 2012
From: svo at stanford.edu (Sonny Vo)
Date: Sun, 22 Apr 2012 12:33:04 -0700
Subject: Special Seminar - Dr. Zhilong Rao (JDSU), Thursday April 26, 4:00PM,
 CISX 101
Message-ID: <CANEv+3DwE6UJft3bnWb8GHcQCgAHQLG-fm5k85g9Xin=g3wGAQ@mail.gmail.com>

Dear All,
The Stanford Optical Society is hosting this interesting-informal
presentation by a recent alumni of the physics department, Dr. Zhilong Rao.
He will share his experience in the recent years as a scientist/engineer in
the hi-tech Silicon Valley industries, specifically Applied Materials and
now, JDSU. This will be invaluable especially to those of you looking
forward to graduation within the next 10 years. Have I mention FREE drinks
yet? No, i don't think i have, but if you scroll down and read the title,
you'll find an even better surprise.
bests
Sonny



*Special Seminar Presented by the Stanford Optical Society*



 *Product Engineering at JDSU
*

*Dr. Zhilong Rao
*

*JDS Uniphase Corporation (JDSU)*

*Thursday, April 26, 4:00 PM, CISX 101 Auditorium*
FREE FOOD and DRINKS and Candies! at 4PM


http://photons.stanford.edu

*JDS Uniphase Corporation (JDSU) *innovates and markets diverse
technologies that enhance the way people experience the world every day.
The products and technologies from JDSU enable fast, high-quality
communications, secure financial transactions, reliable consumer
electronics, green energy, differentiated brands and a host of other
solutions. JDSU provide these solutions through three business segments:
Communications Test and Measurement, Communications and Commercial Optical
Products, and Advanced Optical Technologies.


*Dr. Zhilong Rao *received his Ph.D. in Physics in 2008 from Stanford,
where he worked with Prof. James Harris on developing high-intensity
nano-aperture Vertical-Cavity Surface-Emitting Lasers (VCSELs) for
near-field optical applications. Currently, he holds a Senior Product
Engineer position within the Communications and Commercial Optical Products
division of JDSU, where he is responsible for managing semiconductor laser
and detector products for fiber optic communications. Prior to joining
JDSU, he worked as a Technologist in the office of Chief Technology Officer
at Applied Materials Inc.
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From alokv at stanford.edu  Mon Apr 23 16:34:27 2012
From: alokv at stanford.edu (Alok Vasudev)
Date: Mon, 23 Apr 2012 16:34:27 -0700
Subject: VC clinic TOMORROW (4/24) at 5 PM in Allen 101
Message-ID: <DF1EEE4811F6477EA1CD22877EFF0F29@gmail.com>

Interested in starting a company or joining a startup after graduation?  Do you want to learn what it takes to make a great technology into a great technology company?  Wonder how the latest IP legislation impacts commercializing innovations you make in the lab?

Join Shahin Farschi, Principal at Lux Capital, and Gavin McCraley, Of Counsel at law firm Morrison & Forrester to hear the answers to these questions and any more you can think up!  The venture clinic will take place in Allen 101 at 5 PM TOMORROW 4/24.
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From mmlee at stanford.edu  Mon Apr 23 23:48:34 2012
From: mmlee at stanford.edu (Meredith M. Lee)
Date: Mon, 23 Apr 2012 23:48:34 -0700
Subject: Magnifi - iPhone adapater for microscopes, telescopes
Message-ID: <CAOtRWgZCxNzg5WX=hQFfgiB=z4O8XeyzVrZwdF-1tmPLC1uhzw@mail.gmail.com>

FYI - I thought this would be of interest for many labmembers- please feel
free to forward widely!

A simple and useful adapter to help take iPhone images/video through
microscopes, binoculars, telescopes...designed by two Stanford-ers and
available now on Kickstarter for $60 through May 3:

http://www.kickstarter.com/projects/637232010/magnifi-the-worlds-first-iphone-photoadapter-case

and recently reviewed by Wired:
http://www.wired.com/gadgetlab/2012/04/magnifi-case-helps-you-record-scientific-wonders-with-your-iphone/


 After May 3 it will be available @ www.arcturuslabs.com for $80, and there
are plans for the release of other grips besides the iPhone4.

[image: Inline image 1]



-------------------------------------
Meredith M. Lee
Stanford University
Ph.D. Candidate, Dept. of Electrical Engineering
Center for Integrated Systems
420 Via Ortega, Stanford, CA 94305-4075
Phone 510.200.8821
mmlee at stanford.edu
http://linkedin.com/in/mmlee
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From svo at stanford.edu  Wed Apr 25 12:05:34 2012
From: svo at stanford.edu (Sonny Vo)
Date: Wed, 25 Apr 2012 12:05:34 -0700
Subject: Reminder: Dr. Zhilong Rao from JDSU (Thursday at 4pm CISX101)
Message-ID: <CANEv+3B_JaxV1v45jZ4CY=70MRDp3TrqM5c2HjrzhBFey5AeUA@mail.gmail.com>

Hello all,
Just a friendly reminder to drop by for some refreshments this *Thursday at
4pm in cis101X,* support Stanford Optical Society community building
events, and hear about the fascinating technologies being worked on at
JDSU.

bests
sonny
**


**

*
*

*Special Seminar Presented by the Stanford Optical Society*


*Product Engineering at JDSU***

*Dr. Zhilong Rao*

JDS Uniphase Corporation (JDSU)

*Thursday, April 26th, 4:15 PM, CISX 101 Auditorium*
The Best Refreshments Ever! at 4PM

JDS Uniphase Corporation (JDSU) innovates and markets diverse technologies
that enhance the way people experience the world every day.  The products
and technologies from JDSU enable fast, high-quality communications, secure
financial transactions, reliable consumer electronics, green energy,
differentiated brands and a host of other solutions. JDSU provide these
solutions through three business segments:  Communications Test and
Measurement, Communications and Commercial Optical Products, and Advanced
Optical Technologies.

Dr. Zhilong Rao received his Ph.D. in Physics in 2008 from Stanford, where
he worked with Prof. James Harris on developing high-intensity
nano-aperture Vertical-Cavity Surface-Emitting Lasers (VCSELs) for
near-field optical applications. Currently, he holds a Senior Product
Engineer position within the Communications and Commercial Optical Products
division of JDSU, where he is responsible for managing semiconductor laser
and detector products for fiber optic communications. Prior to joining
JDSU, he worked as a Technologist in the office of Chief Technology Officer
at Applied Materials Inc.
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From goldhaber-gordon at stanford.edu  Wed Apr 25 12:09:57 2012
From: goldhaber-gordon at stanford.edu (David Goldhaber-Gordon)
Date: Wed, 25 Apr 2012 12:09:57 -0700
Subject: Stanford Nanoprobes Workshop, May 18, 2012
In-Reply-To: <CAMnK59ETTpCzTVZ3OA8QagZGdN3dy9WVhDmarqq9NVh4GrucCg@mail.gmail.com>
References: <20120403161734.A1957441D33@smtp.stanford.edu> <CAMnK59ETTpCzTVZ3OA8QagZGdN3dy9WVhDmarqq9NVh4GrucCg@mail.gmail.com>
Message-ID: <CAMnK59EYEQHGvCTCOM34TWA_QioVNXBvjknSOLVV4nSH7yEP2g@mail.gmail.com>

Dear SNF Labmembers,

This is a reminder of the annual workshop of the Center for Probing the
Nanoscale at Stanford next month. We have an exciting array of speakers, as
you can see below.

Best,
David Goldhaber-Gordon
Director, Center for Probing the Nanoscale


 *If you have already registered, thank you!

PLEASE FORWARD TO OTHERS WHO MIGHT BE INTERESTED
Stanford University's Center for Probing the
<http://www.stanford.edu/group/cpn/>Nanoscale<http://www.stanford.edu/group/cpn/>(CPN)
8th Annual Workshop

*Friday, May 18, 2012
8:30-6, with continental breakfast and lunch included.
Poster session from 4-6, with hors d'oeuvres served.
* Registration<http://www.stanford.edu/group/cpn/research/anworkshop_reg.html>
*(Students, Postdocs and Stanford's CPN affiliates are FREE)

*Location:
 Huang <http://soenew.stanford.edu/visit/huang_center/index.html> Engineering
Center <http://soenew.stanford.edu/visit/huang_center/index.html>
*Mackenzie Room 300, 475 Via Ortega, Stanford University

[image: []]

-- 
-----------------------------------------------------------------
David Goldhaber-Gordon
goldhaber-gordon at stanford.edu
Associate Professor of Physics                  davidg at post.harvard.edu
and Director,                                                  (permanent
forwarding)

Center for Probing the Nanoscale
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)

Address for letters or packages:                      Administrative
Associate:
David Goldhaber-Gordon                                 Deborah Woodward
Geballe Laboratory for Advanced Materials       McCullough, Rm. 331
McCullough Building, Room 346                      Phone: (650) 723-0400
476 Lomita Mall                                             Fax: (650)
724-3681
Stanford, CA 94305-4045                                email:
deborahw at stanford.edu



-- 
-----------------------------------------------------------------
David Goldhaber-Gordon
goldhaber-gordon at stanford.edu
Associate Professor of Physics                  davidg at post.harvard.edu
and Director,                                                  (permanent
forwarding)
Center for Probing the Nanoscale
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)

Address for letters or packages:                      Administrative
Associate:
David Goldhaber-Gordon                                 Deborah Woodward
Geballe Laboratory for Advanced Materials       McCullough, Rm. 331
McCullough Building, Room 346                      Phone: (650) 723-0400
476 Lomita Mall                                             Fax: (650)
724-3681
Stanford, CA 94305-4045                                email:
deborahw at stanford.edu
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From khu834 at stanford.edu  Thu Apr 26 11:53:24 2012
From: khu834 at stanford.edu (Kevin Chih-Yao Huang)
Date: Thu, 26 Apr 2012 11:53:24 -0700
Subject: EE PhD Oral Examination - Kevin C.Y. Huang, Friday May 4, 10am CISX-AUD
Message-ID: <CALda9zhFy0t7xCA5Xx=1QTLTFsdTXccv0TOnfiJiKyqnmvC1ZQ@mail.gmail.com>

University PhD Dissertation Defense**

*Electrically driven optical antennas and slot waveguides: towards an
on-chip subwavelength light source*

* *

*Kevin Chih-Yao Huang*****

Department of Electrical Engineering

Advisor: Prof. Mark L. Brongersma****

** **

Friday May 4th 2012**

10:00 am****

(Refreshments at 9:45 am)****

** **

Location: Paul G. Allen Auditorium (CIS-X 101)****

http://cis.stanford.edu/directions/

**

Abstract:

The most recent developments in on-chip molecular sensing and high-speed
optical interconnection set stringent limits on the power consumption,
operating speed, and physical footprint of the constituent active devices.
In order to achieve new performance targets, it becomes particularly
important to scale down optical sources to the nanoscale. This effort is
inhibited by the fundamental diffraction limit of light, where the size
reduction of photonic elements dramatically increases optical losses,
thereby reducing the interaction strength of optoelectronic processes.

Metallic nanostructures which supports coupled electron and electromagnetic
wave oscillations called surface plasmon polaritons (SPPs) facilitate
stronger light-matter interaction at the nanoscale as they are capable of
concentrating and confining light to deep subwavelength volumes. These
plasmonic structures enable significant modification of the electromagnetic
environment, allowing nearby optical emission processes to be enhanced and
controlled. In my presentation, I discuss two examples that combine a
semiconductor quantum well (QW) with metallic nanostructures to realize
nano-light-emitting diodes (LEDs) with tailored emission properties.

In the first example, I illustrate the design methodology and demonstrate
experimentally, compact antenna-electrodes which facilitate simultaneous
operation as elec?trodes for current injection into nanoscale-LED and as
antennas capable of optically manipulating the electroluminescence. Differ?ent
designs of the antenna electrode dimensions show dipolar, quadrupolar and
higher order radiation patterns with enhanced directivity and polarization
ratio which are in good agreement with full-?eld numerical simulations.

In the second example, I demonstrate the integration of a metal-clad
nano-LED with metal-dielectric-metal slot waveguides to realize the
smallest electrically driven two-dimensionally confined guided optical mode
to date. The routing, splitting, free space coupling and directional
coupling of the slot waveguide mode are characterized to enable future
optical nano-circuits for high speed optical interconnects and sensing in
nanoscale volumes.
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From shott at stanford.edu  Fri Apr 27 07:17:07 2012
From: shott at stanford.edu (John Shott)
Date: Fri, 27 Apr 2012 07:17:07 -0700
Subject: Report for finding missing rundata ....
Message-ID: <4F9AAA63.3010606@stanford.edu>

SNF Lab Members:

A number of you have gotten reminders from me that you have forgotten to 
enter run data for a number of your metalization runs on the innotec, 
metalica, or intlvac_sputter.  In fact, a number of you got such a 
message from me yesterday .... and most of you have yet done nothing to 
fix this.

I've created a new xReporter report named My Missing Rundata that you 
will find under the Activity Reports category that will search for your 
equipment usage that seems to be missing run data during a particular 
month.  By default it will show you all equipment usage that is missing 
run data for the current month.  That search can be moved to other 
months or can be limited to a specific tool (AKA item in the report) 
such as the innotec.

Hopefully, this will help you to find and fix equipment usage that is 
missing run data.  The most frequent cause of missing run data is a 
situation when someone enables over your enable.  On a busy tool such as 
the innotec, this happens fairly frequently.

To fix this, click the History panel in the main Coral client and locate 
the equipment usage record that is missing run data.  If it occurred 
prior to two weeks ago, the history panel can move backwards in time in 
two-week increments by selecting the History Actions menu item and then 
the "Previous" function.  Similarly, the "Next" function will move you 
two weeks further forward.

Once you find an activity that you believe to have either missing or 
incorrect rundata, double click that entry in the history panel.  That 
will show you the details of that equipment usage.  Click "OK" and it 
will either show you existing rundata and give you the option to adjust 
it or prompt you to enter new rundata.

Note: in some cases, you may not have done an actual deposition.  The 
easiest way to handle this is to select a single layer deposition 
process (so that you need to enter minimal data), select "Aluminum" as 
the metal, and enter something like "1.0" for both the start weight and 
final weight and then enter something like "No deposition done" in the 
comment field.

Because we are now charging for precious metal usage, we need run data 
entered for ALL runs .... even if you did not deposit a precious metal 
... so that we don't get error messages when we run the nightly accounting.

As a reminder, I've attached the file from this morning that shows uses 
of the innotec, metalica, and intlvac_sputter for this month that are 
currently missing run data.  Please fix this for us quickly as we are 
rapidly approaching the end of the month.

Let me know if you have any questions,

John

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From cachang at stanford.edu  Fri Apr 27 10:45:19 2012
From: cachang at stanford.edu (Chia-Ming Chang)
Date: Fri, 27 Apr 2012 10:45:19 -0700 (PDT)
Subject: Special Seminar - Prof. Ci-Ling Pan (National Tsing Hua University,
 Taiwan),	Friday May 11,	4:15PM, CISX 101
In-Reply-To: <1843054619.42481887.1333556323300.JavaMail.root@zm06.stanford.edu>
Message-ID: <1365833481.66031737.1335548719342.JavaMail.root@zm06.stanford.edu>









Special Seminar Presented by the Stanford Optical Society 


Recent Progress in Photonic-Network-Compatible Sub-THz-wave wireless links at data rate of 20 Gb/s 

Prof. Ci-Ling Pan 
National Tsing Hua University, Taiwan 
Friday, May 11, 4:15 PM, CISX 101 Auditorium 
Refreshments at 4PM 


To meet the rapidly growing demand of gigabits wireless access applications, sub-THz or millimeter wave (MMW) carriers in W-band (75-110 GHz) or above are essential for obtaining the necessary broad transmission bandwidth. Thanks to the almost unlimited bandwidth and very low propagation loss in optical fiber, radio-over-fiber (RoF) communication system is now an efficient and cost-effective way to distribute synchronized photonic MMW signals from the central office to multiple base stations. In this talk, we will review our recent work on Photonic Wireless communication Link at 100 GHz or 0.1 THz. Key technologies are photonic MMW sources and photonic MMW transmitters will be described. Wireless data transmission at a data rate beyond 20-Gb/s via bias modulation of such novel device has been successfully achieved for both downlink and uplink. We have also demonstrated an optical ultra-wide band Impulse-Radio Fiber-to-the-antenna (UWB-IR FTTA) system for in-building and in-home applications, operating from 75 to 110 GHz. 



About the speaker 
Ci-Ling Pan is Tsing Hua Chair Professor, Chairperson of the Department of Physics and Institute of Astronomy , National Tsing Hua University (NTHU), Hsinchu , Taiwan . He also held joint appointment at the Institute of Photonics Technologies and served as Director of the Photonics Research Center of NTHU. Prof. Pan taught at National Chiao Tung University, Taiwan, 1981-2009. He also held visiting professorship at Osaka University and Chinese University of Hong Kong in 2004 and 2008, respectively. In the past decade, the main foci of Prof. Pan?s research activities have been Ultrafast and THz Photonics. Recent research highlights include developments of functional liquid crystal THz photonic devices, femtosoeocnd-laser recrystallization and activation of silicon as well as novel THz generators and detectors. The latter were used in diverse applications such as diagnostics of technologically important materials for photovoltaics, assessing burn trauma and optical-network-compatible W-band (100 GHz or 0.1 THz) wireless communication Link at a data rate beyond 20 Gbit/s. Prof. Pan is a Fellow of APS, IEEE, OSA, and SPIE. 



http://photons.stanford.edu 




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From mbaran at stanford.edu  Fri Apr 27 15:25:40 2012
From: mbaran at stanford.edu (Maureen Baran)
Date: Fri, 27 Apr 2012 15:25:40 -0700 (PDT)
Subject: "Green Container" at Shipping and Receiving for Recycling Small Electronic Devices
Message-ID: <00ea01cd24c4$af69d130$0e3d7390$@stanford.edu>

Dear All,

 

This past Monday, we received our own "Green Container" for Small
Electronic Devices and more.

 

This container is housed between the back doors of the loading dock and
the US Mail slots of the Allen Building.

 

The waste that is accepted and can be happily recycled are:

 

.         Cellular phones

.         Personal digital assistants (i.e. Palm Pilots),

.         Pagers, CDs, DVDs, Telephones,

.         Empty Printer/Toner/Ink jet Cartridges, 

.         Other small non-capital electronic waste

 

Waste NOT accepted are:

 

.         Computers, Monitors, and other capital electronic equipment 

 

Please contact your Department Property Administrator for appropriate
disposal of capital equipment

 

Kenny Green kennygee at stanford.edu - DPA for the Allen Building / Allen
Building

Maureen Baran mbaran at stanford.edu - DPA for SNF.

 

One last thing, if you want to recycle your "curley q" light bulbs you
can.  We ask that you wrap them up in a plastic bag so if they break in
transport they are contained.

 

Thank you,

 

Maureen

 

 

 

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From mtang at stanford.edu  Fri Apr 27 22:26:47 2012
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 27 Apr 2012 22:26:47 -0700
Subject: Etch area update, 4/27
Message-ID: <4F9B7F97.2000400@stanford.edu>

Hi all --

I've been told that people want more detail about the status of certain 
etch tools.  So, I'll try to expand on the daily postings (which can be 
found at http://toolstatus.blogspot.com/ and is linked from the SNF home 
page).

STSetch2:  This is the item of greatest need and concern.  As you may 
know, the system suffered a massive vacuum chamber leak which took 
several weeks to fix.  But then, the RF generator which has been 
replaced just before shutdown, was found to be out of calibration.  
Actually, the generator was good, but we suspect the DeviceNet 
communications interface board which was moved from the original to the 
replacement generator might also have stored calibrations.  So, this 
generator was sent out for recalibration.  Both this and the original 
generator are due back next week, the first one on Monday at 4:30 pm, 
the second a few days later.  The first, unfortunately, had been delayed 
a week, in large part  because of recent changes in Procurement 
requirements from suppliers.  (Ironically, Elmer had made the repair 
service feel so bad for our situation, they discounted the price as a 
courtesy -- which then required Procurement to authorize the change - 
MORE delay!!)  Plan A is to install the repaired generator Tuesday and 
requalify.  If Plan A doesn't work, then Plan B is to try the second 
generator, which should have arrived.  And yes, a Plan C is in the works.

Lampoly:  This generator is also out for repair.  It was due back today, 
but is delayed into next week because of changes in Procurement procedures.

Amtetcher:  The long pumpdowns are due to the hexode not cooling down.  
The hexode heats to 30 C when the chamber is open and cools down 23 C 
for the etch.  The hexode is slightly heated to reduce water adsorption 
during the 10 minutes of so of loading wafers when the chamber is 
open.   To control temperature, the hexode has a valve which controls 
the flow of a hot circulating water loop (30 C) and a cold loop (20C).  
This valve appears to be leaky or not sealing.  Unfortunately, it is an 
obsolete part, so some research into possible replacements needs to be 
done.  In the meantime, because it is a lot more important to keep the 
hexode at temperature for etching than it is to heat during loading, the 
heating has been disabled for now -- so the hexode will remain at 23 C 
whether the chamber is open or closed.  We believe this should not 
affect most, if any processes, significantly.  A quick requalification 
was performed to verify etch rates were good.

If you have specific needs or concerns, please contact a staff member -- 
we can provide more information, and possibly offer suggestions on 
backups either at SNF or elsewhere.

Thanks for your attention --

Team Etch




From mbaennin at stanford.edu  Fri Apr 27 23:51:57 2012
From: mbaennin at stanford.edu (Matthias Baenninger)
Date: Fri, 27 Apr 2012 23:51:57 -0700 (PDT)
Subject: Etch area update, 4/27
In-Reply-To: <4F9B7F97.2000400@stanford.edu>
Message-ID: <1340293851.60206665.1335595917276.JavaMail.root@zm04.stanford.edu>

Dear lab members,

For some of you the Intlvac Ion Beam Mill Etcher at the Stanford Nanocenter (across the road from SNF) might be an alternative. It is a very versatile tool accessible to academic and industrial users. Ion beam processing is a controllable thin film etching technique with independent control of ion energy, ion current density, and incidence angle.
More details can be found at http://www.stanford.edu/group/snc/equipment/ion%20beam%20mill.html

Please contact me at mbaennin at stanford.edu if you are interested in using the ion mill or have any questions.

Best,
Matthias


-----------------------------------
Matthias Baenninger, PhD
Goldhaber-Gordon Group
Stanford University
McCullough Bldg., Room 224
476 Lomita Mall
Stanford
CA 94305-4008
-----------------------------------



----- Original Message -----
From: "Mary Tang" <mtang at stanford.edu>
To: labmembers at snf.stanford.edu
Sent: Friday, 27 April, 2012 10:26:47 PM
Subject: Etch area update, 4/27

Hi all --

I've been told that people want more detail about the status of certain 
etch tools.  So, I'll try to expand on the daily postings (which can be 
found at http://toolstatus.blogspot.com/ and is linked from the SNF home 
page).

STSetch2:  This is the item of greatest need and concern.  As you may 
know, the system suffered a massive vacuum chamber leak which took 
several weeks to fix.  But then, the RF generator which has been 
replaced just before shutdown, was found to be out of calibration.  
Actually, the generator was good, but we suspect the DeviceNet 
communications interface board which was moved from the original to the 
replacement generator might also have stored calibrations.  So, this 
generator was sent out for recalibration.  Both this and the original 
generator are due back next week, the first one on Monday at 4:30 pm, 
the second a few days later.  The first, unfortunately, had been delayed 
a week, in large part  because of recent changes in Procurement 
requirements from suppliers.  (Ironically, Elmer had made the repair 
service feel so bad for our situation, they discounted the price as a 
courtesy -- which then required Procurement to authorize the change - 
MORE delay!!)  Plan A is to install the repaired generator Tuesday and 
requalify.  If Plan A doesn't work, then Plan B is to try the second 
generator, which should have arrived.  And yes, a Plan C is in the works.

Lampoly:  This generator is also out for repair.  It was due back today, 
but is delayed into next week because of changes in Procurement procedures.

Amtetcher:  The long pumpdowns are due to the hexode not cooling down.  
The hexode heats to 30 C when the chamber is open and cools down 23 C 
for the etch.  The hexode is slightly heated to reduce water adsorption 
during the 10 minutes of so of loading wafers when the chamber is 
open.   To control temperature, the hexode has a valve which controls 
the flow of a hot circulating water loop (30 C) and a cold loop (20C).  
This valve appears to be leaky or not sealing.  Unfortunately, it is an 
obsolete part, so some research into possible replacements needs to be 
done.  In the meantime, because it is a lot more important to keep the 
hexode at temperature for etching than it is to heat during loading, the 
heating has been disabled for now -- so the hexode will remain at 23 C 
whether the chamber is open or closed.  We believe this should not 
affect most, if any processes, significantly.  A quick requalification 
was performed to verify etch rates were good.

If you have specific needs or concerns, please contact a staff member -- 
we can provide more information, and possibly offer suggestions on 
backups either at SNF or elsewhere.

Thanks for your attention --

Team Etch




From cachang at stanford.edu  Sun Apr 29 10:55:17 2012
From: cachang at stanford.edu (Chia-Ming Chang)
Date: Sun, 29 Apr 2012 10:55:17 -0700 (PDT)
Subject: Special Seminar - Dr. Sami Hendow,	Monday May 14,	6:30PM, GCC
 (Please RSVP, Pizza will be served)
In-Reply-To: <1365833481.66031737.1335548719342.JavaMail.root@zm06.stanford.edu>
Message-ID: <1352633946.67223794.1335722116984.JavaMail.root@zm06.stanford.edu>










Special Seminar Presented by NATEA (North America Taiwanese Engineering & Science Association) and the Stanford Optical Society 

Micromachining with Nanosecond and Femtosecond Pulsed Lasers 

Dr. Sami Hendow 

Date : Monday, May 14, 6:30 PM 
Venue : Graduate Community Center (750 Escondido Road, Stanford, CA 94305) 
Agenda : 
6:30 - 7:00 PM: Registration and Social Networking (Pizza will be served) 
7:00 - 8:15 PM: Presentation including Q&A 
Fee : 
Free for members of NATEA and the Stanford Optical Society with RSVP 
$5.00 for non-members with RSVP 
$10 for all without RSVP 
RSVP: http://goo.gl/dXPht (contact: borchyuan at gmail.com or cachang at stanford.edu) 
Please RSVP prior to May 13 (Pizza will be served) 

Abstract 
Laser-material interactions using pulses that are nsec in durations or longer are dominated by thermal time constants. Ultrashort pulses, on the other hand, undergo a much faster photon-electron energy transfer where pulse energy is deposited at a rate much faster than the material's thermal time constant. We will show examples of micromachining of metal, silicon and ceramics using nsec pulses, and outline the effects of change of peak power, pulse energy and pulse width. We will also extend this discussion to oxide formation on the surface, as well as bursting where pulses are broken into short but rapidly deposited pulses. These effects will be contrasted when the micromachining operation is performed using psec and fsec ultrafast pulses. 

About the speaker 
Sami Hendow is an independent consultant. Recently, he was with Multiwave Photonics as Sr. Director responsible for Engineering and Application Development. Prior to that he was Engineering Program Manager with Spectra-Physics developing solid state and fiber amplified lasers. Before that, he was Sr. Scientist at Northrop Grumman working on the qualification of fiber lasers and power scaling by coherent beam combining of fiber laser arrays. Over the last 25 years, he has developed several products and has published about sixty articles and patents related to lasers and photonics technologies. Sami has a PhD in Optical Sciences from the University of Arizona. He is Chair of 2013 Fiber Lasers Conference, SPIE Photonics West, and member of conference program committees of the SPIE's Laser Applications in Microelectronic and Optoelectronic Manufacturing, and LIA's Laser Microprocessing Conference, ICALEO. 



http://photons.stanford.edu 





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From rthowe at stanford.edu  Sun Apr 29 14:30:54 2012
From: rthowe at stanford.edu (Roger T. Howe)
Date: Sun, 29 Apr 2012 14:30:54 -0700
Subject: Wednesday 12-1 Allen 101X seminar on NNIN iWSG Brazil trip with pizza
Message-ID: <4F9DB30E.70408@stanford.edu>

All --

I've attached a flyer for this Wednesday's noon seminar by Sonia 
Buckley, Meredith Lee, and Jared Schwede on the their experiences at the 
NNIN's International Winter School at the University of Campinas 
(UNICAMP), Campinas, Sao Paulo, Brazil and a second week's stay in a 
region along the Atlantic coast.

The seminar's jointly sponsored by NNIN, which will be adding pizza to 
the Stanford Nano Society's usual generous order to accommodate the 
larger crowd.

See you there!

Roger
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From jsnapp at stanford.edu  Mon Apr 30 10:06:11 2012
From: jsnapp at stanford.edu (Justin Snapp)
Date: Mon, 30 Apr 2012 10:06:11 -0700
Subject: EE PhD Oral Examination - Justin Snapp, Thursday May 3, 3pm
 CISX 101 Auditorium
Message-ID: <5373B2E7EF5C41A989A2C1D627DBE662@gmail.com>


Sidewall Silicon Carbide Emitters for Integrated Terahertz Vacuum Microelectronics


  


Justin Snapp


Department of Electrical Engineering


Advisor: Prof. Thomas H. Lee


Co-Advisor: Prof. Roger T. Howe  






Thursday, May 3, 2012


3:00 pm (refreshments at  2:45 pm)


Paul G. Allen Auditorium (Allen CIS-X 101)


http://cis.stanford.edu/directions/


  


  


The frequency band from 250 GHz to 2.5 THz is rich in potential applications, but suffers from a lack of efficient sources. This ?THz gap? arises from the sharp decrease in the efficiency of solid-state electronic amplifiers at frequencies above 100 GHz and the unavailability of compact, uncooled optical sources for wavelengths longer than the infrared.  Future THz systems hold great promise for leveraging the unique properties of THz waves, which are long enough in wavelength to be penetrating through clothing and skin, but short enough to be useful for imaging, resonant with complex molecular bonds, and low enough in energy to be safe and non-ionizing.   In additions to applications in security screening and medical imaging, continuous wave THz systems would also enable short-range extreme wideband communications.


  


We propose a micro-fabricated Barkhausen-Kurz (u-BK) oscillator as a promising candidate source. The u-BK oscillator has significant advantages over other vacuum electronic devices, promising high DC-to-THz efficiency and low startup current requirements.  This device achieves low impedance, even when operated at harmonics of the electron orbit frequency, by extracting energy over multiple passes of favorably phased electrons confined within a potential well. The need for an emitter integrated into a parabolic potential well poses a major fabrication challenge.  The basic fabrication process for the cavity and integrated poly-silicon carbide thermionic cathode has been demonstrated, providing the foundation for developing stable cathodes for injecting a sheet electron beam and for optimizing the electrode geometry for defining a parabolic potential well.


  


The talk will discuss why the proposed u-BK oscillator is a promising candidate for future efficient integrated THz circuits.  The fabrication process and results for the sidewall lateral emitter integratable into a silicon u-BK cavity process will be presented.  Experimental results from emission testing on integrated diode test structures under testing in a vacuum chamber will be shown.  Additionally future work towards the development of a fully realized integrated THz source will be discussed.  The demonstrated sidewall filament emitters allow the design of radically new vacuum electronics that combine electron emitters, coupled resonant cavities and lithographically shaped electrodes in a single substrate. This will enable a new class of efficient THz vacuum electronic integrated circuits.



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