From ben.jian at arrayedfiberoptics.com Wed Aug 1 01:07:51 2012 From: ben.jian at arrayedfiberoptics.com (Ben Jian) Date: Wed, 01 Aug 2012 01:07:51 -0700 Subject: A call to action In-Reply-To: References: Message-ID: <5018E3D7.3070106@arrayedfiberoptics.com> Dear SNF lab members, I have been an industrial user of the lab for about ten years.At the beginning I was a regular user.Now with the dwindling financial resources at my disposal, I use the lab once in a while.As head of a small startup company, every dollar has to count.I feel compelled to write this letter to the entire community.I am writing to you because we face a major crisis. Am I the only one who is outraged by the recent 30.2% rate increase in the middle of a recession?To top it off,this was followed shortly by the announcement of two new staff hires.A true budget-balancing measure would include a serious round of layoffs and other cost-cutting measures.Instead, we are witnessing the reverse - robust hiring.At SNF,it is easy to hire people, but nearly impossible to let go.This staff addition paves the way for the next round of major rate increase.Thus the vicious cycle continues.Unless we SNF users take action and stop this, the vicious cycle of rate increases will never end. 10.1% annual SNF rate increase over eight years In December 2004, the fully capped rate was $3312 (without overhead) for industrial users.In December 2012,it will become $6000.In eight years, user fee has seen an 81.1% increase!That is a rate of 10.1% per year growth over eight years.With overhead, the monthly capped rate will be a staggering $9420 in December.That is mind bogging incompetence!The user fee has been treated as an ATM machine.The SNF is in serious jeopardy of becoming irrelevant with the latest round of irresponsible rate increase. The people in charge of nominating SNF management have given us one bad administration after another.The Nishi/Rissman administration was the one who gave us the 40.6% rate increase in 2005.Just to show how arrogant and how much they took users for granted, the big fee increase was actually made retroactive by one month!Not to mention that in 2004, there was no hour limit in lab usage.Since then, it has been 160 hours. I don't know the current operations director of SNF at all. However, based on the recent actions of announcing a 30% fee increase followed immediately by the hiring of not one but two new staff members, it shows the sheer insensitivity and cluelessness of the management style. The SNF administrations have been characterized by cronyism and gross mismanagement.This is a serious waste of taxpayer's dollar. Ideas for reform The SNF should be run like a business, because it serves a sizeable community of small businesses with limited research budgets.We are given significant supporting funds from the NSF.I want to see significant cost saving compared to similar university labs.The SNF must be run like a lean and mean organization. The SNF director preferably should come from inside SNF and should have regular job responsibilities in addition to managing people.There are some SNF staff members who can do an excellent job of running the lab, yet they have been passed up time and again in favor of expensive people managers from outside research labs, first HP Labs, now SRI Labs.They gave us 40% in 2005 and 30% rate increase in 2012, respectively. The sizeable number of PhD-level staff members can be a poor use of precious resources; SNF is not a place where there is a continuing demand for such high level skills.If there is a need for high level skill, hiring should be on a temporary or part-time basis.With the talent that the Bay area is known for, it would be really easy to get top talent at a fraction of the cost of a full time staff. The SNF could learn a few lessons from the Microfab at Berkeley.Instead of staff members, they use students and audio/visual media to train new users.This is a lab where things get done, all while keeping user fees in check. Demand change Before SNF goes down the tubes, maybe there is something we can do.Maybe we can rise up and demand change.Dear lab members:We need to take action.We deserve better. Take back SNF before the latest round of increase ruins SNF for good.Rebel against this incompetent SNF administration.Take this opportunity to bring real change to SNF that's long overdue.Overhaul SNF management completely. I suggest: 1.We demand the out of touch SNF operations director's immediate resignation. 2.We the industrial users must have power in the SNF decision making, instead of "taxation without representation". I for one could do a much better job of managing SNF's finance if given the chance.We need to form a new decision making committee for SNF consisting of three equal voting blocks of SNF staff, faculty and industrial members.All financial decisions must be approved by this committee and SNF management must be accountable to this committee. 3.We need to "Starve the beast".Abolish the 30.2% rate increase.There should be no rate increase for three years, then 3% each year as previously agreed.SNF must learn to live within its means.Examine every corner for cost saving. Control cost through internal attrition if not layoff.SNF needs to become every ounce efficient, each person wearing multiple hats. I am wary of the repercussions of this letter.Last time in 2004 after objecting to the big rate increase as a whistle blower, I was singled out by Nishi/Rissman for retribution.Rissman made a lot of rules just for me with the threat of permanently banning me from SNF.This time I want to make clear that if SNF tries to do the same,I will let the entire SNF community know. If there is no significant improvement, I for one will lobby NSF to move its funding elsewhere such as Berkeley.The double digit rate increase over eight years speaks for itself about the gross incompetence of the SNF management.I will make a strong case to NSF that SNF through its total mismanagement has stifled the growth of small businesses, which are the job growth engine of this economy. I will make sure Berkeley gets a copy of my letter to bolster their case of why Berkeley should get the NSF funding instead. Yours truly, Ben Jian, PhD President Arrayed Fiberoptics Corporation -------------- next part -------------- An HTML attachment was scrubbed... URL: From rthowe at stanford.edu Wed Aug 1 07:23:51 2012 From: rthowe at stanford.edu (Roger T. Howe) Date: Wed, 01 Aug 2012 07:23:51 -0700 Subject: A call to action In-Reply-To: <5018E3D7.3070106@arrayedfiberoptics.com> References: <5018E3D7.3070106@arrayedfiberoptics.com> Message-ID: <50193BF7.2090208@stanford.edu> Ben, Needless to say, I would have appreciated your contacting me first with your concerns rather than sending your email to the SNF community. I would be happy to meet with you and introduce you to John Bumgarner, the Operations Director, who's been here for a little over one year now. We are working hard to make the SNF a more effective nanofab, with significant investments in infrastructure upgrades and new tools by NSF and Stanford. The recent rate increases were discussed with the user community. The recent rate changes reduced the hourly rate for the many academic users who don't cap. In order to make the net result revenue-neutral, we increased the cap, which increased the cost for heavy users, including several members of my own research group. You needn't be concerned about any retributions from the SNF staff; if you feel that there are issues about your treatment in the SNF, please bring them to my attention. I've cc'ed the Dean of Engineering, Jim Plummer, to let him know your concerns. Roger Howe On 8/1/12 1:07 AM, Ben Jian wrote: > > Dear SNF lab members, > > I have been an industrial user of the lab for about ten years.At the > beginning I was a regular user.Now with the dwindling financial > resources at my disposal, I use the lab once in a while.As head of a > small startup company, every dollar has to count.I feel compelled to > write this letter to the entire community.I am writing to you because > we face a major crisis. > > Am I the only one who is outraged by the recent 30.2% rate increase in > the middle of a recession?To top it off,this was followed shortly by > the announcement of two new staff hires.A true budget-balancing > measure would include a serious round of layoffs and other > cost-cutting measures.Instead, we are witnessing the reverse - robust > hiring.At SNF,it is easy to hire people, but nearly impossible to let > go.This staff addition paves the way for the next round of major rate > increase.Thus the vicious cycle continues.Unless we SNF users take > action and stop this, the vicious cycle of rate increases will never end. > > > 10.1% annual SNF rate increase over eight years > > In December 2004, the fully capped rate was $3312 (without overhead) > for industrial users.In December 2012,it will become $6000.In eight > years, user fee has seen an 81.1% increase!That is a rate of 10.1% per > year growth over eight years.With overhead, the monthly capped rate > will be a staggering $9420 in December.That is mind bogging > incompetence!The user fee has been treated as an ATM machine.The SNF > is in serious jeopardy of becoming irrelevant with the latest round of > irresponsible rate increase. > > The people in charge of nominating SNF management have given us one > bad administration after another.The Nishi/Rissman administration was > the one who gave us the 40.6% rate increase in 2005.Just to show how > arrogant and how much they took users for granted, the big fee > increase was actually made retroactive by one month!Not to mention > that in 2004, there was no hour limit in lab usage.Since then, it has > been 160 hours. > > I don't know the current operations director of SNF at all. However, > based on the recent actions of announcing a 30% fee increase followed > immediately by the hiring of not one but two new staff members, it > shows the sheer insensitivity and cluelessness of the management style. > > The SNF administrations have been characterized by cronyism and gross > mismanagement.This is a serious waste of taxpayer's dollar. > > > Ideas for reform > > The SNF should be run like a business, because it serves a sizeable > community of small businesses with limited research budgets.We are > given significant supporting funds from the NSF.I want to see > significant cost saving compared to similar university labs.The SNF > must be run like a lean and mean organization. > > The SNF director preferably should come from inside SNF and should > have regular job responsibilities in addition to managing people.There > are some SNF staff members who can do an excellent job of running the > lab, yet they have been passed up time and again in favor of expensive > people managers from outside research labs, first HP Labs, now SRI > Labs.They gave us 40% in 2005 and 30% rate increase in 2012, respectively. > > The sizeable number of PhD-level staff members can be a poor use of > precious resources; SNF is not a place where there is a continuing > demand for such high level skills.If there is a need for high level > skill, hiring should be on a temporary or part-time basis.With the > talent that the Bay area is known for, it would be really easy to get > top talent at a fraction of the cost of a full time staff. > > The SNF could learn a few lessons from the Microfab at > Berkeley.Instead of staff members, they use students and audio/visual > media to train new users.This is a lab where things get done, all > while keeping user fees in check. > > > Demand change > > Before SNF goes down the tubes, maybe there is something we can > do.Maybe we can rise up and demand change.Dear lab members:We need to > take action.We deserve better. > > Take back SNF before the latest round of increase ruins SNF for > good.Rebel against this incompetent SNF administration.Take this > opportunity to bring real change to SNF that's long overdue.Overhaul > SNF management completely. > > I suggest: > > 1.We demand the out of touch SNF operations director's immediate > resignation. > > 2.We the industrial users must have power in the SNF decision making, > instead of "taxation without representation". I for one could do a > much better job of managing SNF's finance if given the chance.We need > to form a new decision making committee for SNF consisting of three > equal voting blocks of SNF staff, faculty and industrial members.All > financial decisions must be approved by this committee and SNF > management must be accountable to this committee. > > 3.We need to "Starve the beast".Abolish the 30.2% rate increase.There > should be no rate increase for three years, then 3% each year as > previously agreed.SNF must learn to live within its means.Examine > every corner for cost saving. Control cost through internal attrition > if not layoff.SNF needs to become every ounce efficient, each person > wearing multiple hats. > > I am wary of the repercussions of this letter.Last time in 2004 after > objecting to the big rate increase as a whistle blower, I was singled > out by Nishi/Rissman for retribution.Rissman made a lot of rules just > for me with the threat of permanently banning me from SNF.This time I > want to make clear that if SNF tries to do the same,I will let the > entire SNF community know. > > If there is no significant improvement, I for one will lobby NSF to > move its funding elsewhere such as Berkeley.The double digit rate > increase over eight years speaks for itself about the gross > incompetence of the SNF management.I will make a strong case to NSF > that SNF through its total mismanagement has stifled the growth of > small businesses, which are the job growth engine of this economy. I > will make sure Berkeley gets a copy of my letter to bolster their case > of why Berkeley should get the NSF funding instead. > > Yours truly, > > Ben Jian, PhD > > President > > Arrayed Fiberoptics Corporation > -------------- next part -------------- An HTML attachment was scrubbed... URL: From tberg at stanford.edu Wed Aug 1 08:05:07 2012 From: tberg at stanford.edu (Ted Berg) Date: Wed, 01 Aug 2012 08:05:07 -0700 Subject: Fwd: Horns and strobe tests In-Reply-To: <501944F8.1020001@stanford.edu> References: <501944F8.1020001@stanford.edu> Message-ID: <501945A3.8080700@stanford.edu> -------- Original Message -------- Subject: Horns and strobe tests Date: Wed, 01 Aug 2012 08:02:16 -0700 From: Ted Berg To: cis-building at cis.stanford.edu, cisx-building at cis.stanford.edu Hello All, Tomorrow morning about 7:00am there will be a brief test of the Toxic gas horns and strobes in preparation for the county inspection Monday. Sorry for the possible disruption. Ted -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwb2005 at stanford.edu Wed Aug 1 14:32:55 2012 From: jwb2005 at stanford.edu (John Bumgarner) Date: Wed, 01 Aug 2012 14:32:55 -0700 Subject: EPI informational update Message-ID: <5019A087.6030408@stanford.edu> Hello everyone, Just a note to let those interested know that we now have an service contract in place with Applied Materials to support the EPI tool in SNF. I expect we will see an increase in up time for this capacity-constrained tool over the next year. As the year goes along please keep me informed how this works out so we will know if we want to renew for next year also. Thanks to Ted, Maurice and Brett for getting this in place to improve our services. Regards, John From mbaran at stanford.edu Wed Aug 1 16:33:23 2012 From: mbaran at stanford.edu (Maureen Baran) Date: Wed, 1 Aug 2012 16:33:23 -0700 (PDT) Subject: Have You Misplaced a Text Book - Finite Element Analysis Theory and Application with ANSYS Message-ID: <00eb01cd703e$07d84670$1788d350$@stanford.edu> Has anyone misplaced a text book entitled "Finite Element Analysis Theory and Application with ANSYS" by Saeed Moaveni? It has been sitting in the copy room on the first floor next to Office 146 for the last several days. I now have it in my cubicle, #41. If this book is yours please come by and pick it up. Thank you, Maureen -------------- next part -------------- An HTML attachment was scrubbed... URL: From edfei at stanford.edu Thu Aug 2 13:42:43 2012 From: edfei at stanford.edu (Ed Fei) Date: Thu, 2 Aug 2012 13:42:43 -0700 Subject: Missing Photoresist Message-ID: Hey Everybody, Xiaochi and I are looking for a small bottle of BCB photoresist that we put in the harris group bin (the one in the chemical storage room next to epi). We had taken it out to defrost this morning, but it is no longer there. Please let us know if you may have seen it or know its whereabouts. Thanks! Ed 925-286-0819 -------------- next part -------------- An HTML attachment was scrubbed... URL: From xixie54 at stanford.edu Fri Aug 3 13:08:29 2012 From: xixie54 at stanford.edu (Xi Xie) Date: Fri, 3 Aug 2012 13:08:29 -0700 (PDT) Subject: induce random via hole on aluminum oxide In-Reply-To: <442597086.40940329.1344024489477.JavaMail.root@zm06.stanford.edu> Message-ID: <1279781699.40940487.1344024509084.JavaMail.root@zm06.stanford.edu> Hi, I have an 3-D aluminum oxide layer of 10nm thickness and want to induce random via hole (10nm-200nm) on it. Since the layer is 3-D, wet etch is preferred. Does anyone have experience in doing that? Thanks! Best, Xi From tberg at stanford.edu Mon Aug 6 07:32:26 2012 From: tberg at stanford.edu (Ted Berg) Date: Mon, 06 Aug 2012 07:32:26 -0700 Subject: Fwd: TGO Testing Monday Aug. 6th In-Reply-To: <50180C97.1040501@stanford.edu> References: <50180C97.1040501@stanford.edu> Message-ID: <501FD57A.7080400@stanford.edu> Just a reminder for all. Thanks for your patience. Ted -------- Original Message -------- Subject: TGO Testing Monday Aug. 6th Date: Tue, 31 Jul 2012 09:49:27 -0700 From: Ed Myers To: labmembers at snf.stanford.edu CC: Aaron McCarthy All, We are tentatively scheduled for the County to come in Monday afternoon (1pm-5pm) and test our Toxic Gas Monitoring changes associated with the new etcher installation. The county will want to see live gas challenges, which will lead to shutdown of our hazardous gases. This will be very dissruptive since it will effect the gas supplies all the etcher, epi, LPVCD, PECVD, etc. Once I receive confirmation as to the time of the visit, I will make blocking reservations on all the tools which will be effected. While I know how disruptive this is, it is also very good news for those waiting for the new etcher to come on line. We must pass this inspection before we can turn on the process gases. Once we can turn on the process gases, the process engineers can come in and do the final start-up and qualification on the four new etchers. Regards, The SNF Staff -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Mon Aug 6 11:04:55 2012 From: mbaran at stanford.edu (Maureen Baran) Date: Mon, 6 Aug 2012 11:04:55 -0700 (PDT) Subject: White Case with Pink Zipper Found in Auditorium 101X Message-ID: <009101cd73fe$025e3bf0$071ab3d0$@stanford.edu> Dear All, A meeting just finished in the Allen Auditorium 101X and found sitting on one of the chairs was a White Canvas pencil case with a pink zipper. There are pencils in it however, there is also a set of keys in it. If this is yours, please come by my cubicle, # 41 on the first floor of the Allen building and claim it. Maureen -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaran at stanford.edu Tue Aug 7 09:01:17 2012 From: mbaran at stanford.edu (Maureen Baran) Date: Tue, 7 Aug 2012 09:01:17 -0700 (PDT) Subject: 2012-13 SNF Sponsorship Applications and Parking Permit Applications are HERE Message-ID: <004c01cd74b5$e78cf650$b6a6e2f0$@stanford.edu> Dear All, Stanford's Parking and Transportation just sent out a note that the 2012-13 Sponsorship Applications and Parking Permit Applications are available. If you drive on campus to work at SNF somewhat regularly the cost of a Parking Permit is less then purchasing the daily parking passes. I believe the daily parking passes are $12.00 per day. In order to buy the Permit you need to be sponsored by SNF. I have the 2012-13 Sponsorship Applications and the Parking Permit Applications hanging on the outside of my cubicle for you to pick up. Please note that Parking and Transportation doesn't give you a grace period to get your new permit. They will start enforcing the new parking permits as of September 1st, 2012. The current cost of a parking ticket on campus is $45.00. Thank you, Maureen -------------- next part -------------- An HTML attachment was scrubbed... URL: From alokv at stanford.edu Tue Aug 7 15:57:42 2012 From: alokv at stanford.edu (Alok Vasudev) Date: Tue, 7 Aug 2012 15:57:42 -0700 Subject: VC clinic TOMORROW (8/8) at 4:15 PM in Allen 101 Message-ID: Interested in starting a company or joining a startup after graduation? Do you want to learn what it takes to make a great technology into a great technology company? Wonder how the latest IP legislation impacts commercializing innovations you make in the lab? Join Shahin Farschi, Principal at Lux Capital, and Gavin McCraley, Of Counsel at law firm Morrison & Forrester to hear the answers to these questions and any more you can think up! The venture clinic will take place in Allen 101 at 4:15 PM TOMORROW 8/8. -------------- next part -------------- An HTML attachment was scrubbed... URL: From artitw at stanford.edu Wed Aug 8 11:50:35 2012 From: artitw at stanford.edu (Artit Wangperawong) Date: Wed, 8 Aug 2012 11:50:35 -0700 Subject: Has anyone used NaCl substrates in vacuum? Message-ID: Hi Everyone, I am heating NaCl substrates under vacuum and am wondering if the stuff sublimates. If you have experience with similar procedures, may I get in touch with you to ask about it? Thanks! Art -------------- next part -------------- An HTML attachment was scrubbed... URL: From jimkruger at yahoo.com Wed Aug 8 13:15:19 2012 From: jimkruger at yahoo.com (jim kruger) Date: Wed, 8 Aug 2012 13:15:19 -0700 (PDT) Subject: Has anyone used NaCl substrates in vacuum? In-Reply-To: References: Message-ID: <1344456919.50416.YahooMailNeo@web161001.mail.bf1.yahoo.com> For NaCl, My tables show MP 801 C, VP at 530 C = 1E-4 Torr, so subliming ~ fast. You are likely getting it all over your system if you go very hot. jim ________________________________ From: Artit Wangperawong To: "glamstuds at lists.stanford.edu" ; "labmembers at snf.stanford.edu" Sent: Wednesday, August 8, 2012 11:50 AM Subject: Has anyone used NaCl substrates in vacuum? Hi Everyone, I am heating NaCl substrates under vacuum and am wondering if the stuff sublimates. If you have experience with similar procedures, may I get in touch with you to ask about it? ? Thanks! Art -------------- next part -------------- An HTML attachment was scrubbed... URL: From mlacour at stanford.edu Wed Aug 8 19:08:06 2012 From: mlacour at stanford.edu (Mette Funding La Cour) Date: Wed, 8 Aug 2012 19:08:06 -0700 (PDT) Subject: lost student card In-Reply-To: <29780396.47560195.1344478002477.JavaMail.root@zm03.stanford.edu> Message-ID: <653063224.47560446.1344478086346.JavaMail.root@zm03.stanford.edu> Has anyone found a student ID card in the fab during the last hour. I seem to have lost mine either in the cleanroom just now or when going from snf building to Nano building. If you have seen it please let me know... Thanks, Mette From edmyers at stanford.edu Thu Aug 9 16:28:22 2012 From: edmyers at stanford.edu (Ed Myers) Date: Thu, 09 Aug 2012 16:28:22 -0700 Subject: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) Message-ID: <50244796.6030809@stanford.edu> All, SNF and Plasma-Therm would like to invite you and your team members to attend the Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) to be held at the Stanford University on September 10 and 11, 2012. The Workshop is intended to provide understanding and insight to those working with plasma etching and deposition processes and equipment. The goal is to help researchers make faster progress on projects requiring plasma processing. The course has been very well received at Harvard, UC Berkeley, UCLA, Notre Dame, USF, IMRE, Israel, and Lund University. Graduate students, post docs, professors, and staff have all found the material useful. The format encourages questions and we hope attendees take advantage of the opportunity for networking and discussing their projects. The workshop is meant to encourage cooperation within the academic and industrial research communities. Please be assured that the course is not an advertisement about Plasma-Therm products. Aside from a very brief 15 min introduction to Plasma-Therm, the rest of the day is dedicated to education on fundamentals and advanced etching and plasma-enhanced chemical vapor deposition technology. Presentation materials are equally useful to those that do and do not have our equipment. Details regarding the Workshop objectives, agenda, location, and speaker can be found on the attached flyer. Please note that the workshop is free and registration is requested online by August 31, 2012 at the website: http://www.surveymonkey.com/s/FPQLZPQ Regards, SNF Staff and Plasma-Therm -------------- next part -------------- A non-text attachment was scrubbed... Name: Stanford - Plasma-Therm Workshop flyer and agenda.pdf Type: application/pdf Size: 145696 bytes Desc: not available URL: From tberg at stanford.edu Fri Aug 10 06:32:29 2012 From: tberg at stanford.edu (Ted Berg) Date: Fri, 10 Aug 2012 06:32:29 -0700 Subject: CL-96 gas monitor is still down Message-ID: <50250D6D.5080903@stanford.edu> Hello All, The CL-96 gas monitor is still down. This system is one that monitors toxics in the lab. Therefore all gases for tools associated with it are down for now. Calcon our TGO company is busy working on the system and we will let everyone know as soon as it is back up. From tberg at stanford.edu Fri Aug 10 09:45:13 2012 From: tberg at stanford.edu (Ted Berg) Date: Fri, 10 Aug 2012 09:45:13 -0700 Subject: Gases for CL96 Message-ID: <50253A99.2010502@stanford.edu> All gases related to CL96 have been turned off for the weekend. . Parts for repair should be here early Monday. Gases include: Arsine, B2H6, Phosphine, and Silane for Epi. Silane for Tylan and Thermco LTOs. Silane for STS. Silane for ICP and CCP. So the tools that are down are : Epi, ICP, CCP Tylan and Thermco LPs , STS dep. Sorry for any inconvenience . Ted From cechang at stanford.edu Fri Aug 10 10:38:54 2012 From: cechang at stanford.edu (Chu-En Chang) Date: Fri, 10 Aug 2012 10:38:54 -0700 Subject: Missing USB stick Message-ID: Hi all, If you found a red Transcend USB stick (link to pic), please let me know or drop it at Maureen's cubicle. Thanks, Chu-En -------------- next part -------------- An HTML attachment was scrubbed... URL: From rfasch at stanford.edu Mon Aug 13 06:24:25 2012 From: rfasch at stanford.edu (Rainer Fasching) Date: Mon, 13 Aug 2012 06:24:25 -0700 Subject: Challenges and opertunities of Lithium Air Batteries - guest lecture by Scheffler Rouven In-Reply-To: <4FE071CF.8010204@stanford.edu> Message-ID: Hi all: I just wanted to let you know that on Tuesday 8/14/12 a guest ? Dr Scheffler Rouven ? will speak about challenges, and opportunities of Lithium air battery in my class. He is a core scientist at VW and works closely with IBM on this subject. You are welcome to attend this lecture. Best regards, Rainer Fasching Where: Mechanical Engineering Admin. (02-530) 440 Escondido Mall Bldg. 530 Room 127 When: Tuesday 8/14/1012 10:00-12:00 AM From: Mary Tang Date: Tue, 19 Jun 2012 05:34:23 -0700 To: "Labmembers at Snf. Edu" Cc: Rainer Fasching Subject: New Summer Course! Hi all -- Fellow labmember, Rainer Fasching, is teaching a new course on electrochemistry! **************************************************************************** ** Applied Electrochemistry ? Advanced Batteries ME420 - Syllabus, Summer 2012. This class is build around applied electrochemistry with focus on energy conversion and storage. Basic concepts of electrochemistry are presented, of which the fundamentals of electrochemical energy conversion/storage are built. Electrochemical methods of energy conversion and storage are discussed with emphasis on thescaling behaviors. Advanced battery concepts/systems and their applications (electrical vehicle and grid) will be a main subject of this year. High energy density battery technologies (beyond intercalation materials) and the influence on nano-structured materials/architecture will be discussed. Here the class will focus on challenges, solutions, and future perspectives of high capacity materials in closed systems (e.g. Li-ion, F-ion, flow batteries) as well as open systems (e.g. Li-air). In addtion solid-state electrolytes with their potential for all solid-state batteries will be introduced this year. Journals articles and book chapters will be used for in class discussion to emphasize on current research and challenges. Goal of the course: To introduce you to the fundamentals, modern methods, and current trends of applied electrochemistry: Understand the basic concepts of electrochemistry for energy storage Gain familiarity with advanced battery technologies and current trends Build confidence and knowledge to deal independently with electrochemical problems Classroom: Will be announced Time: Tuesday and Thursday 10:00-12:00 AM Instructor: Rainer Fasching Building 530, Room 220 Tel: 650-723-0084 Fax: 650-723-5034 Email: rfasch at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From tberg at stanford.edu Mon Aug 13 07:29:12 2012 From: tberg at stanford.edu (Ted Berg) Date: Mon, 13 Aug 2012 07:29:12 -0700 Subject: CL96 update Message-ID: <50290F38.3060907@stanford.edu> Good Morning All, Just an update on the CL96 gas monitoring system. As most of you know, there are many systems that are running behind the scenes to keep the lab functional such as process cooling water, mechanical pumps, fume scrubbers, acid waste neutralization, bulk gases, etc. One of the most important background systems is the toxic gas monitoring system. The CL96 is one part of this important safety system. It monitors several toxic gases to tools in the lab and *we are not allowed to run the tools* if we cannot monitor the gases going to them. Once again Calcon, our toxic gas company, is on site waiting for parts to get this safety system back up. We are sorry for any inconvenience. -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at stanford.edu Mon Aug 13 14:19:02 2012 From: maurice at stanford.edu (maurice stevens) Date: Mon, 13 Aug 2012 14:19:02 -0700 Subject: CL96 update-good news In-Reply-To: <50290F38.3060907@stanford.edu> References: <50290F38.3060907@stanford.edu> Message-ID: <50296F46.5090700@stanford.edu> Calcon received the need parts this morning. After swapping out parts and changing our version of software, Calcon has the CL96 communicating with the rest of the TGO system. Gases are back on and we are releasing tools back to the lab. -m On 8/13/2012 7:29 AM, Ted Berg wrote: > Good Morning All, > Just an update on the CL96 gas monitoring system. As most of you > know, there are many systems that are running behind the scenes to > keep the lab functional such as process cooling water, mechanical > pumps, fume scrubbers, acid waste neutralization, bulk gases, etc. > One of the most important background systems is the toxic gas > monitoring system. The CL96 is one part of this important safety > system. It monitors several toxic gases to tools in the lab and *we > are not allowed to run the tools* if we cannot monitor the gases going > to them. Once again Calcon, our toxic gas company, is on site waiting > for parts to get this safety system back up. We are sorry for any > inconvenience. -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 -------------- next part -------------- An HTML attachment was scrubbed... URL: From cgupta2 at stanford.edu Mon Aug 13 14:51:57 2012 From: cgupta2 at stanford.edu (Chaitanya Gupta) Date: Mon, 13 Aug 2012 14:51:57 -0700 (PDT) Subject: Hydrogen flame anneal In-Reply-To: <616051366.9826656.1344894648945.JavaMail.root@zm05.stanford.edu> Message-ID: <1114383120.9830732.1344894717046.JavaMail.root@zm05.stanford.edu> Hello SNF users, I was wondering if anyone on this list has had experience with hydrogen flame annealing of gold surfaces, or would know of a facility on campus where one can do flame annealing? If so, could you please get back to me and Dr. Chang (cc'd here). Thank you, Chaitanya Gupta Paul Allen Building, 420 Via Palou Mall, Stanford University, Stanford, CA 94305-4070 (217)7213701 From hohmanjn at stanford.edu Mon Aug 13 15:58:06 2012 From: hohmanjn at stanford.edu (James Hohman) Date: Mon, 13 Aug 2012 15:58:06 -0700 (PDT) Subject: Hydrogen flame anneal In-Reply-To: <1114383120.9830732.1344894717046.JavaMail.root@zm05.stanford.edu> Message-ID: <1635086329.23206252.1344898686570.JavaMail.root@zm10.stanford.edu> I have extensive experience in this area, but do not have a facility for doing it. I can advise on how to set one up. Best, j Nathan Hohman ----- Original Message ----- From: Chaitanya Gupta To: labmembers at snf.stanford.edu Cc: Shuai Chang Sent: Mon, 13 Aug 2012 14:51:57 -0700 (PDT) Subject: Hydrogen flame anneal Hello SNF users, I was wondering if anyone on this list has had experience with hydrogen flame annealing of gold surfaces, or would know of a facility on campus where one can do flame annealing? If so, could you please get back to me and Dr. Chang (cc'd here). Thank you, Chaitanya Gupta Paul Allen Building, 420 Via Palou Mall, Stanford University, Stanford, CA 94305-4070 (217)7213701 From yuxinz at stanford.edu Wed Aug 15 16:26:37 2012 From: yuxinz at stanford.edu (Yuxin Zheng) Date: Wed, 15 Aug 2012 16:26:37 -0700 Subject: Need something Message-ID: <002901cd7b3d$6abc01a0$403404e0$@edu> Hi, Does anyone have Tetrahydrofuran(THF) solvent and Epo-Tek 377 that I can borrow for a couple days? We need them ASAP. Thanks, Yuxin Zheng PhD candidate Hesselink's group Department of Electrical Engineering, Stanford University -------------- next part -------------- An HTML attachment was scrubbed... URL: From vijayn at stanford.edu Fri Aug 17 07:18:57 2012 From: vijayn at stanford.edu (Vijay Kris Narasimhan) Date: Fri, 17 Aug 2012 07:18:57 -0700 (PDT) Subject: Monday - Optical Properties of III-V Nanowire Arrays - McCullough 218 @ 2:30PM-3:00PM In-Reply-To: <277630508.28997959.1345212486093.JavaMail.root@zm02.stanford.edu> Message-ID: <228084962.29001280.1345213137722.JavaMail.root@zm02.stanford.edu> Hi All, Nicklas Anttu from Professor Hongqi Xu's group at Lund University will be visiting Stanford on Monday. He will discuss the optical properties of nanowire arrays and present work on characterizing these arrays optically during a half-hour talk at 2:30PM in McCullough 218 followed by a short informal Q&A period. Please see the abstract below and circulate to your colleagues and students if you think they'd be interested. Please RSVP to me if you'd be interested in attending. Hope to see you there! Cheers, Vijay Kris Narasimhan, International Fulbright S&T Fellow Cui & Melosh Research Groups Department of Materials Science and Engineering Optical Properties of III-V semiconductor nanowire arrays Monday, August 20, 2012, 2:30PM~3:00PM, McCullough 218 Abstract Vertical III-V semiconductor nanowire arrays offer the possibility for highly tunable optical response in opto-electronic applications. In this presentation, I review the strongly diameter dependent absorption of light in InAs nanowire arrays. 1 Recent results of a four-fold absorption enhancement by a non-absorbing dielectric shell around the nanowires and the underlying physical mechanism will also be discussed. After that, a method for extracting the nanowire dimensions from measured reflectance spectra is demonstrated for as-grown InP nanowire arrays. Finally, a brief overview of the modeling of nanowire arrays for photovoltaics is given with emphasis on different optical loss mechanisms. [1] Wu, P. M.; Anttu, N.; Xu, H. Q.; Samuelson, L.; Pistol, M.-E. Nano Letters 2012 , 12 , 1990. Biography Nicklas Anttu is a final year PhD student under the supervision of Professor Hongqi Xu at the Division of Solid State Physics at Lund University, Sweden. His research in nanophotonics is focused on the modeling of the optical response of nanostructures with special emphasis on semiconductor nanowires as well as plasmonic systems. -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at stanford.edu Fri Aug 17 15:05:22 2012 From: maurice at stanford.edu (Maurice M Stevens) Date: Fri, 17 Aug 2012 15:05:22 -0700 (PDT) Subject: Power glitch//many tools down In-Reply-To: <1942656735.6214651.1345240990873.JavaMail.root@zm03.stanford.edu> Message-ID: <1499989098.6215410.1345241122067.JavaMail.root@zm03.stanford.edu> SNF experienced a power glitch at ~2:55pm today. Many tools are down. Users are checking the tools they are running and will report down tools on Coral. Check Coral before coming into the lab to check tool status. From edmyers at stanford.edu Fri Aug 17 16:36:09 2012 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 17 Aug 2012 16:36:09 -0700 (PDT) Subject: Most SNF Tools are Shutdown 8/17/12 Message-ID: <364636547.1288159.1345246569584.JavaMail.root@zm07.stanford.edu> All, At about 3pm the SNF experience a number of tool faults. What we have found out is, Cogen has lost the ability to provide chilled water. This greatly impacts the SNF lab. You will first notice the high room temperature in lab before you notice all the shutdown tools which need process cooling water, that is tied to Cogens' chilled water. The staff is busy shutting down pumps and furnace to prevent overheating damage. If you have reservations for this evening it is highly unklikely the equipment will be available. Please review Coral before heading to the fab. The only report as to when we will get chilled water (and room temperature control and process cooling water) is "we don't know when it will be available." Until Cogen is back and running the fab will have very limited equipment available for processing. Regards, SNF Staff From mahnaz at stanford.edu Fri Aug 17 16:42:55 2012 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 17 Aug 2012 16:42:55 -0700 Subject: Cogen is down Message-ID: <502ED6FF.1000106@stanford.edu> Hello all, What a toasty Friday afternoon.... Cogen is DOWN, so Chilled water and steam are down so there are no environmental controls are available. There is possibility of CDA to go down as well. Facility will come in after they get the call from MCS that chilled water has come back on. we will need at least 5 hours after the chilled water comes back to restart the thin film equipment. Jim H. on vacation has come in and helping out with getting started. I have powered down the asml Lamp. all the furnaces and most etchers are shut down as well. Please check coral for update and take the opportunity and have a nice weekend. Snf staff From xuanwu at stanford.edu Sat Aug 18 01:28:15 2012 From: xuanwu at stanford.edu (Xuan Wu) Date: Sat, 18 Aug 2012 01:28:15 -0700 Subject: optical microscope z-depth multiplication factor Message-ID: <502F521F.4000406@stanford.edu> Hi SNF labmembers, Does anyone know the multiplication factor needed to convert the number in the digital Z-axis control of the optical microscope (next to the UV curing chamber in the litho area) to microns? It seems the paper with the instructions on it is lost. Thanks, Xuan From vijayn at stanford.edu Mon Aug 20 07:24:01 2012 From: vijayn at stanford.edu (Vijay Kris Narasimhan) Date: Mon, 20 Aug 2012 07:24:01 -0700 (PDT) Subject: Monday - Optical Properties of III-V Nanowire Arrays - McCullough 218 @ 2:30PM-3:00PM In-Reply-To: <228084962.29001280.1345213137722.JavaMail.root@zm02.stanford.edu> Message-ID: <503579754.33846857.1345472641500.JavaMail.root@zm02.stanford.edu> Hey All, Just a quick reminder about Nicklas's talk this afternoon. Let me know if you'd like to come! Vijay ----- Original Message ----- From: "Vijay Kris Narasimhan" To: "labmembers" , "cuigroupmaillist" , "Melosh Group" , "Paul McIntyre" , "James Harris" Cc: "Nicklas Anttu" Sent: Friday, August 17, 2012 7:18:57 AM Subject: Monday - Optical Properties of III-V Nanowire Arrays - McCullough 218 @ 2:30PM-3:00PM Hi All, Nicklas Anttu from Professor Hongqi Xu's group at Lund University will be visiting Stanford on Monday. He will discuss the optical properties of nanowire arrays and present work on characterizing these arrays optically during a half-hour talk at 2:30PM in McCullough 218 followed by a short informal Q&A period. Please see the abstract below and circulate to your colleagues and students if you think they'd be interested. Please RSVP to me if you'd be interested in attending. Hope to see you there! Cheers, Vijay Kris Narasimhan, International Fulbright S&T Fellow Cui & Melosh Research Groups Department of Materials Science and Engineering Optical Properties of III-V semiconductor nanowire arrays Monday, August 20, 2012, 2:30PM~3:00PM, McCullough 218 Abstract Vertical III-V semiconductor nanowire arrays offer the possibility for highly tunable optical response in opto-electronic applications. In this presentation, I review the strongly diameter dependent absorption of light in InAs nanowire arrays. 1 Recent results of a four-fold absorption enhancement by a non-absorbing dielectric shell around the nanowires and the underlying physical mechanism will also be discussed. After that, a method for extracting the nanowire dimensions from measured reflectance spectra is demonstrated for as-grown InP nanowire arrays. Finally, a brief overview of the modeling of nanowire arrays for photovoltaics is given with emphasis on different optical loss mechanisms. [1] Wu, P. M.; Anttu, N.; Xu, H. Q.; Samuelson, L.; Pistol, M.-E. Nano Letters 2012 , 12 , 1990. Biography Nicklas Anttu is a final year PhD student under the supervision of Professor Hongqi Xu at the Division of Solid State Physics at Lund University, Sweden. His research in nanophotonics is focused on the modeling of the optical response of nanostructures with special emphasis on semiconductor nanowires as well as plasmonic systems. -------------- next part -------------- An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Mon Aug 20 10:31:05 2012 From: jprovine at stanford.edu (J Provine) Date: Mon, 20 Aug 2012 10:31:05 -0700 Subject: PCW back online Message-ID: in light of questions asked this morning...in case there is any lingering confusion the process cooling water for SNF is *back online*. check coral for specific machine status. from *B*(uilding)*G*(rounds)(&)*M*(aintenance): Building Managers, COGEN has been restarted and all campus electrical, steam, and chilled water systems are now at full capacity. All building facilities systems are in normal operation. We thank you for your efforts to curtail non-essential equipment when COGEN was down. Effective immediately, any equipment that had been turned off to preserve limited utilities may be restarted. j -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwb2005 at stanford.edu Mon Aug 20 13:06:42 2012 From: jwb2005 at stanford.edu (John Bumgarner) Date: Mon, 20 Aug 2012 13:06:42 -0700 Subject: Coral software information update meeting (Badger) Message-ID: <503298D2.90303@stanford.edu> Hello all, Stanford has invested significantly in producing an upgraded version of Coral lab management software, now called Badger. SNF is planning to convert to this during the winter shutdown. Badger maintains a similar look to Coral and the same functionality, but with some improvements. I have asked Michael Bell to provide an introduction and update to all the interested lab members on Sept 6 at 10 am in the AllenX conference room, 101X. Please attend if you want to learn more. Regards, John From xiangyuc at stanford.edu Mon Aug 20 15:05:38 2012 From: xiangyuc at stanford.edu (Xiangyu Chen) Date: Mon, 20 Aug 2012 15:05:38 -0700 (PDT) Subject: DISSERTATION DEFENSE: Helen Xiangyu Chen In-Reply-To: Message-ID: <1293987123.107263102.1345500338372.JavaMail.root@zm01.stanford.edu> DEPT OF PHYSICS DISSERTATION DEFENSE Ph.D. Candidate: Helen Xiangyu Chen Research Advisor: H.-S. Philip Wong Date: Monday, August 27, 2012 Time: 9am, refreshment served at 8:45am Location: Packard 202 Title: Graphene in Back-End-Of-Line Technology Abstract: Back-End-Of-Line technology have always been one of the major components of modern high-speed integrated circuits (ICs). In the most advanced IC technology, the capacitance associated with interconnects typically accounts for about 50% of the active processor power consumption, and the associated signal delay along interconnects is one of the main bottlenecks for the routing of high-speed signals. Conventional interconnect materials such as copper are facing great challenges to satisfy requirements when physical dimensions are scaled down to the nanoscale range and the need for new interconnect material becomes prominent. In this work, we studied applications of graphene in BEOL technology. We successfully demonstrated integration of graphene interconnects with CMOS circuits and studied the high speed performance of these wires. We have also studied the reliability performance and failure mechanism of graphene interconnects. Finally, we demonstrated that application of graphene in BEOL can go beyond being used as interconnect. The unique physical and electrical properties of graphene makes it a promising candidate for being used as copper diffusion barrier as well. From qran at stanford.edu Mon Aug 20 18:46:42 2012 From: qran at stanford.edu (Helen Qiushi Ran) Date: Mon, 20 Aug 2012 18:46:42 -0700 Subject: can't open labmember's wiki page Message-ID: Hi all, I can't open labmemeber's wiki page (snf.stanford.edu/snf) for the whole day. I am not sure whether it's because of my network or the server is down. Does anyone else have this problem? Best, Helen Helen Qiushi Ran Ph.D. Candidate Department of Electrical Engineering, Stanford, CA, 94305 -------------- next part -------------- An HTML attachment was scrubbed... URL: From haemmerl at stanford.edu Mon Aug 20 19:10:02 2012 From: haemmerl at stanford.edu (Alexandre Haemmerli) Date: Mon, 20 Aug 2012 19:10:02 -0700 Subject: can't open labmember's wiki page In-Reply-To: References: Message-ID: <1F30FCB4-FA03-4DD8-926B-87B770564D6C@stanford.edu> Same thing here ---------------------------------- Alexandre Haemmerli Ph.D. Candidate Mechanical Engineering Stanford University (650) 353-8041 microsystems.stanford.edu On Aug 20, 2012, at 6:46 PM, Helen Qiushi Ran wrote: > Hi all, > I can't open labmemeber's wiki page (snf.stanford.edu/snf) for the whole day. I am not sure whether it's because of my network or the server is down. Does anyone else have this problem? > Best, > Helen > Helen Qiushi Ran > Ph.D. Candidate > Department of Electrical Engineering, > Stanford, CA, 94305 > > > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Tue Aug 21 07:53:34 2012 From: shott at stanford.edu (John Shott) Date: Tue, 21 Aug 2012 07:53:34 -0700 Subject: can't open labmember's wiki page In-Reply-To: References: Message-ID: <5033A0EE.50602@stanford.edu> SNF Lab Members: While I can't say exactly what was wrong, a bit of cleaning and a restart of the underlying Plone CMS (Content Management System) should now allow you to access the https://snf.stanford.edu/SNF portion of our web site. John On 8/20/2012 6:46 PM, Helen Qiushi Ran wrote: > Hi all, > I can't open labmemeber's wiki page (snf.stanford.edu/snf > ) for the whole day. I am not sure > whether it's because of my network or the server is down. Does anyone > else have this problem? > Best, > Helen > Helen Qiushi Ran > Ph.D. Candidate > Department of Electrical Engineering, > Stanford, CA, 94305 > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Tue Aug 21 09:41:18 2012 From: mtang at stanford.edu (Mary Tang) Date: Tue, 21 Aug 2012 09:41:18 -0700 Subject: Follow up of this weekend's cooling water incident Message-ID: <5033BA2E.4060507@stanford.edu> Dear labmembers -- Thanks for your patience this weekend as the campus struggled with loss of cooling water. Several people have asked what happened. This is what we understand. Just before 3 pm Friday, a 60Kv electrical line was damaged during construction work, causing the Cardinal Cogeneration Plant to shut down. Those of you in the lab at that time may have experienced the associated power glitch which caused a number of tools to shutdown or lockup. The Cogen plant is the large green "steamy" structure across the street from us. It supplies power, cooling water and steam to the entire Stanford campus. Cogen cooling water is used to absorb heat from the Allen building process cooling water (PCW) recirculating system. SNF uses PCW to cool pumps, chillers, and other heat-generating systems. Cogen cooling water is also used for controlling building temperature and fab humidity and temperature. Without cooling water, our tools shut off and the building/lab heat up. Friday afternoon, campus wide, buildings got hot and computer system shut down. Emergency backup systems kicked in. In the case of SNF, city water was automatically introduced to keep the PCW temperatures down. However, with the whole campus also using city water as backup, the pressure was not sufficient to keep our tools running. By Friday evening, SNF staff were able to safety shutdown the major heat generating tools and thus avoid damage to tools or the PCW system. Stanford emergency crews worked through the weekend and by around 9 pm Sunday evening were able to restore cooling water campus wide. Although a couple of SNF tools are still suffering from the unexpected shutdown, quick action and long hours by SNF and FacOps staff prevented serious damage. Special thanks to Maurice, Mahnaz, Ed, Ray, and Elmer for directing traffic and shutting tools down; Jim H for cutting his vacation short to come in, help and advise; Ted for calling in instructions and advice while home sick; and Tony in FacOps for keeping staff informed and putting in long hours to make sure the PCW was OK. While recognizing the heroic efforts of many staff, there are a number of things we need to do to improve communications at the infrastructure level and with our labmember community. These will be addressed in coming weeks. If there are any questions about specific tools, please consult with Coral and the responsible staff member. If there are questions about this incident, please don't hesitate to ask. Thanks again, Your SNF Staff From robertchen at snf.stanford.edu Tue Aug 21 10:40:12 2012 From: robertchen at snf.stanford.edu (Robert Chen) Date: Tue, 21 Aug 2012 10:40:12 -0700 Subject: Solution for Slow Etch Pit Density Studies in Ge Message-ID: Hi All, I'm looking for an etchant for looking at etch pit density studies for Germanium (001) epi (etching pits corresponding to threading dislocations). There are a few recipes out there, but I believe they use some non-standard and non-stocked chemicals in SNF. Does anyone have a recipe (and the chemicals) that is verified to work for this? Thanks, Robert Chen -------------- next part -------------- An HTML attachment was scrubbed... URL: From Bin.Yang at globalfoundries.com Tue Aug 21 10:54:14 2012 From: Bin.Yang at globalfoundries.com (Yang, Bin) Date: Tue, 21 Aug 2012 13:54:14 -0400 Subject: Solution for Slow Etch Pit Density Studies in Ge In-Reply-To: References: Message-ID: Robert, Dilute Secco etch from IBM works well for threading dislocations in SiGe. It required a Silicon cap though. Quick Turnaround Technique for Highlighting Defects in Thin Si/SiGe Bilayers S. W. Bedella,z, D. K. Sadanaa, K. Fogela, H. Chenb and A. Domenicuccib doi: 10.1149/1.1676116 Electrochem. Solid-State Lett. 2004 volume 7, issue 5, G105-G107 J. Phys. D: Appl. Phys. 42 (2009) 175306 (6pp) doi:10.1088/0022-3727/42/17/175306 Defect identification in strained Si/SiGe heterolayers for device applications Thanks, Bin From: robertatx at gmail.com [mailto:robertatx at gmail.com] On Behalf Of Robert Chen Sent: Tuesday, August 21, 2012 10:40 AM To: labmembers Subject: Solution for Slow Etch Pit Density Studies in Ge Hi All, I'm looking for an etchant for looking at etch pit density studies for Germanium (001) epi (etching pits corresponding to threading dislocations). There are a few recipes out there, but I believe they use some non-standard and non-stocked chemicals in SNF. Does anyone have a recipe (and the chemicals) that is verified to work for this? Thanks, Robert Chen -------------- next part -------------- An HTML attachment was scrubbed... URL: From edmyers at stanford.edu Tue Aug 21 15:59:15 2012 From: edmyers at stanford.edu (Ed Myers) Date: Tue, 21 Aug 2012 15:59:15 -0700 Subject: Fwd: J.A. Woollam CompleteEASE Short Course In-Reply-To: <5033E13C.1020607@jawoollam.com> References: <5033E13C.1020607@jawoollam.com> Message-ID: <503412C3.5090309@stanford.edu> All, Here is another course being offered by Woollam. This course covers their CompletEASE software (not the WVASE32 being used at the SNF). The two software programs are very different and taking a class on one software package will not help you with the other. Regards, SNF Staff -------- Original Message -------- Subject: J.A. Woollam CompleteEASE Short Course Date: Tue, 21 Aug 2012 14:27:56 -0500 From: Veronica Cockerill To: WoollamMailList at jawoollam.com Dear J.A. Woollam Customers, We would like to invite those of you who use our CompleteEASE software to the next CompleteEASE Data Analysis Fundamentals Short Course. It will be held *October 9-12, 2012* at the University of Washington in Seattle, Washington. I have attached a course description and registration form. If you would like to attend, please fill out the registration form completely and fax or email to me by*October 1, 2012.* Once I receive your registration form, I will send a confirmation email. This course will focus on data analysis methods for spectroscopic ellipsometry, using CompleteEASE software, with a significant amount of "hands-on" computer time. For this reason, participants should be familiar with CompleteEASE software. *All participants will need to bring their own laptop. *You will be supplied a copy of the software to install on your computer before class begins. *NOTE:* Many of you use our other data analysis software, WVASE. A course dedicated to CompleteEASE will not be of benefit to you if you use WVASE. They are two completely different programs. The next WVASE short course has not been scheduled yet. Once it is, I will notify you of that course. Thank you for your patience. If you have any questions, please let me know. Best regards, Veronica -- ******************************* Veronica Cockerill Marketing Coordinator J. A. Woollam Co., Inc. 645 M Street, Suite 102 Lincoln, NE 68508 _vcockerill at jawoollam.com _Phone: (402)477-7501 x101 Fax: (402)477-8214 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: UWashington_CE_SC_Reg.pdf Type: application/pdf Size: 236335 bytes Desc: not available URL: From maxms at stanford.edu Tue Aug 21 18:12:37 2012 From: maxms at stanford.edu (Max Shulaker) Date: Tue, 21 Aug 2012 18:12:37 -0700 Subject: laser glass machining Message-ID: Hello all, I was wondering if anyone had suggestions for vendors in the area who do good (and cheap) laser (or other methods) of glass machining. On each glass slide, I'm just looking to do a few holes in the mm range, so it doesn't have to be anything super fancy. Thanks, Max -------------- next part -------------- An HTML attachment was scrubbed... URL: From igorpapa at eecs.berkeley.edu Tue Aug 21 18:24:07 2012 From: igorpapa at eecs.berkeley.edu (Igor Paprotny) Date: Tue, 21 Aug 2012 18:24:07 -0700 Subject: laser glass machining In-Reply-To: References: Message-ID: <000c01cd8004$d31a67c0$794f3740$@berkeley.edu> I use LP Glassblowing for exactly this kinda of thing. Their phone number is: 408 988 7561 Good service and fast turnaround. From: maxmshulaker at gmail.com [mailto:maxmshulaker at gmail.com] On Behalf Of Max Shulaker Sent: Tuesday, August 21, 2012 6:13 PM To: labmembers at snf.stanford.edu Subject: laser glass machining Hello all, I was wondering if anyone had suggestions for vendors in the area who do good (and cheap) laser (or other methods) of glass machining. On each glass slide, I'm just looking to do a few holes in the mm range, so it doesn't have to be anything super fancy. Thanks, Max -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Tue Aug 21 18:24:50 2012 From: shott at stanford.edu (John Shott) Date: Tue, 21 Aug 2012 18:24:50 -0700 Subject: Fwd: using Coral after installing Mac10.8 Message-ID: <503434E2.4050807@stanford.edu> SNF Lab Members: Maurice has discovered that he was unable to run Remote Coral after upgrading to Mac OSX 10.8 (Mountain Lion) without making a change to his security settings. Here is Maurice's note including a discussion of the changes required to allow Remote Coral to run on a Mac with the latest OS. If you have a Mac that is running OSX 10.8, you will likely be similarly affected. Thanks to Maurice for his good sleuthing ability .... Have a good evening, John -------- Original Message -------- Subject: using Coral after installing Mac10.8 Date: Tue, 21 Aug 2012 16:18:11 -0700 From: maurice stevens To: Michelle Rincon , "Brett E. Huff" CC: John Bumgarner , John Shott Hey guys, I found I couldn't access coral this past weekend after installing the new version of Mac OS. It wouldn't accept the certificate for the Coral. After searching the web today I found the solution: http://stackoverflow.com/questions/11136805/java-applet-with-self-signed-certificate-on-os-x-mountain-lion "It is new security feature in Mac OS X, by default only apps from Mac Store & from trusted developers are allowed to run there. Fortunatelly, it is easy to change, you have to allow this in Mac OS X preferences. Go to Preferences -> Security & Privacy and click on padlock to allow changes. Then in "Allow appications downloaded from" select "Anywhere". After that, the button in Java dialog will be enabled." Coral works after changing this in preferences. -m -------------- next part -------------- An HTML attachment was scrubbed... URL: From aflannery at mcube-inc.com Tue Aug 21 19:57:52 2012 From: aflannery at mcube-inc.com (Anthony Flannery) Date: Tue, 21 Aug 2012 19:57:52 -0700 Subject: laser glass machining In-Reply-To: References: Message-ID: <010301cd8011$ec887e60$c5997b20$@com> Hi, I have borrowed time on CO2 lasers on campus. It's not efficient absorption in glass, but it does work. I created a dwg file and used that for the pattern. The one I used was in a specific research group and I don't know if it is around anymore. One piece of advice - metalize the surface with 1 um of aluminum before ablating. The slag from the machining will deposit back and make the surface really crappy. If you put down this metal layer, it's thin enough that it ablates off quickly. Also Al reflectivity in IR is not nearly so high as in the visible spectrum (unlike gold). Clean off the slag after the ablation mechanically and with rinsing, and then follow with a sulfuric perioxide clean. You'll get a nice clean surface. Tony Flannery From: Max Shulaker [mailto:maxms at stanford.edu] Sent: Tuesday, August 21, 2012 6:13 PM To: labmembers at snf.stanford.edu Subject: laser glass machining Hello all, I was wondering if anyone had suggestions for vendors in the area who do good (and cheap) laser (or other methods) of glass machining. On each glass slide, I'm just looking to do a few holes in the mm range, so it doesn't have to be anything super fancy. Thanks, Max -------------- next part -------------- An HTML attachment was scrubbed... URL: From mkerby at stanford.edu Wed Aug 22 00:40:14 2012 From: mkerby at stanford.edu (Matt Kerby) Date: Wed, 22 Aug 2012 00:40:14 -0700 Subject: laser glass machining - how about glass drilling? Message-ID: <002a01cd8039$5e6c00c0$1b440240$@stanford.edu> Max, If you want to drill holes perpendicular to the surface of glass microscope slides, you should use the SNF's Roland MDX-15 CNC. I setup and use the system for super-clean automated pattern drilling of 635 micron diameter holes (60+ per run) in 0.7mm thick glass wafers. The hole diameter is determined by your diamond drill bit diameter and the geometry via CAD file. Let me know if this is what you need and I can assist with the details. Best, Matt Kerby From: maxmshulaker at gmail.com [mailto:maxmshulaker at gmail.com] On Behalf Of Max Shulaker Sent: Tuesday, August 21, 2012 6:13 PM To: labmembers at snf.stanford.edu Subject: laser glass machining Hello all, I was wondering if anyone had suggestions for vendors in the area who do good (and cheap) laser (or other methods) of glass machining. On each glass slide, I'm just looking to do a few holes in the mm range, so it doesn't have to be anything super fancy. Thanks, Max -------------- next part -------------- An HTML attachment was scrubbed... URL: From ckenney at stanford.edu Wed Aug 22 17:40:32 2012 From: ckenney at stanford.edu (Crystal Rose Kenney) Date: Wed, 22 Aug 2012 17:40:32 -0700 (PDT) Subject: EE PhD Oral Examination In-Reply-To: <247179082.55466630.1345655328504.JavaMail.root@zm06.stanford.edu> Message-ID: <1286252699.55998155.1345682432366.JavaMail.root@zm06.stanford.edu> PhD Dissertation Defense Exploiting non-linear Arrhenius dependence of diode IV curves to extract Schottky barrier band diagrams Crystal Kenney Department of Electrical Engineering Advisor(s): Prof. Krishna Saraswat and Prof. H.S. Philip Wong Thursday August 30th 2012 10:00 am (Refreshments at 9:45 am) Location: Packard 202 Abstract: Accurate extraction of Schottky barrier height is imperative to the development of low resistance contacts. An analytical model for current density is proposed that accurately accounts for conduction in the thermionic emission (TE), thermionic field emission (TFE), and field emission (FE) regimes. Use of this model in non-linear regression allows more information to be extracted from diode IVT curves than previously possible. The proposed model uses the Arrhenius non-linear dependence experimental diode IV curves to regress the Schottky barrier height (?B0), steepness factor (E00), and Fermi level (?), enabling band diagrams of the measured interfaces to be determined. This model is tested against both simulated interfaces using the tranismission matrix method (TMM) and experimental data. This complete picture of band information allows material interface behavior to be understood more completely, ultimately facilitating more efficient contact engineering. -------------- next part -------------- An HTML attachment was scrubbed... URL: From artitw at stanford.edu Wed Aug 22 19:01:03 2012 From: artitw at stanford.edu (Artit Wangperawong) Date: Wed, 22 Aug 2012 19:01:03 -0700 Subject: Anyone have patterned Si like this? Message-ID: Hi, Thanks for all your help regarding the NaCl substrate question last time! I have another request -- does anyone have patterned silicon with ~100nm deep pits and ~50nm wide grooves like the attached image? It is meant to be use as a stamp and can be returned to you after use. Art -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PatternedSi.png Type: image/png Size: 210528 bytes Desc: not available URL: From mtang at stanford.edu Thu Aug 23 08:58:51 2012 From: mtang at stanford.edu (Mary Tang) Date: Thu, 23 Aug 2012 08:58:51 -0700 Subject: Process Clinic Today @11 Message-ID: <5036533B.7040600@stanford.edu> Hi all - Process Clinic, today (Thursday) at 11. Meet in the cube area nearby Maureen's office. Feel free to bring your process flows, device cross sections an mask layouts. Your SNF Staff From jaehlee at stanford.edu Fri Aug 24 06:42:29 2012 From: jaehlee at stanford.edu (Jae Hyung Lee) Date: Fri, 24 Aug 2012 06:42:29 -0700 Subject: a contact mask missing Message-ID: Dear All, Please help me to locate my mask. The following label should be in front of the cover: Customer: Stanford University Device: SOSOI_TEC Layer: SOSOI_TEC-VIA Please let me know if you have seen this mask. Thank you very much! Best, Jae -------------- next part -------------- An HTML attachment was scrubbed... URL: From jaehlee at stanford.edu Fri Aug 24 06:50:12 2012 From: jaehlee at stanford.edu (Jae Hyung Lee) Date: Fri, 24 Aug 2012 06:50:12 -0700 Subject: a contact mask missing In-Reply-To: References: Message-ID: Never mind. Mario just came in to the lab and found it for me. Thanks! - Jae On Fri, Aug 24, 2012 at 6:42 AM, Jae Hyung Lee wrote: > Dear All, > > Please help me to locate my mask. The following label should be in front > of the cover: > > Customer: Stanford University > Device: SOSOI_TEC > Layer: SOSOI_TEC-VIA > > Please let me know if you have seen this mask. Thank you very much! > > Best, > Jae > -------------- next part -------------- An HTML attachment was scrubbed... URL: From ylyang at stanford.edu Fri Aug 24 11:25:00 2012 From: ylyang at stanford.edu (Yongliang Yang) Date: Fri, 24 Aug 2012 11:25:00 -0700 (PDT) Subject: Sputter gold on Al piece In-Reply-To: <1248382289.7928746.1345832278813.JavaMail.root@zm04.stanford.edu> Message-ID: <910243467.7940214.1345832700312.JavaMail.root@zm04.stanford.edu> Hi, all, I would like to sputter gold layer on an Al piece. I am not sure if I still need adherent layer such (Ti, Cr). Does anyone have experience on it. BTW, the sputteiring will be done in our lab not in SNF due to contamination. Best, Yongliang From ylyang at stanford.edu Fri Aug 24 12:20:01 2012 From: ylyang at stanford.edu (Yongliang Yang) Date: Fri, 24 Aug 2012 12:20:01 -0700 (PDT) Subject: Sputter gold on Al piece In-Reply-To: <910243467.7940214.1345832700312.JavaMail.root@zm04.stanford.edu> Message-ID: <1846080085.8025573.1345836001160.JavaMail.root@zm04.stanford.edu> Thank you for lab members' reply and sharing the valuable experience. If only considering the adhesion, the gold can be directly deposited on Al without adhesion layer. But there is intermetallic (Purple plague) at Al-Au contact, which has different properties. So it is better to have adhesion layer. Best, Yongliang ----- Original Message ----- From: "Yongliang Yang" To: labmembers at snf.stanford.edu Sent: Friday, August 24, 2012 11:25:00 AM Subject: Sputter gold on Al piece Hi, all, I would like to sputter gold layer on an Al piece. I am not sure if I still need adherent layer such (Ti, Cr). Does anyone have experience on it. BTW, the sputteiring will be done in our lab not in SNF due to contamination. Best, Yongliang From maxms at stanford.edu Fri Aug 24 18:21:16 2012 From: maxms at stanford.edu (Max Marcel Shulaker) Date: Fri, 24 Aug 2012 18:21:16 -0700 (PDT) Subject: coverslip for bonding In-Reply-To: <1216403629.14623038.1345857492894.JavaMail.root@zm03.stanford.edu> Message-ID: <1091423118.14623610.1345857676495.JavaMail.root@zm03.stanford.edu> Hey everyone, Thanks for all of the responses for the glass drilling - the response was really amazing. I was wondering if anyone knew a place where you can purchase glass coverslips for bonding? For the anodic bonding, it should be type Pyres 7740, however, every coverslip I have seen is borosilicate. Does anyone have suggestions for getting this type of glass/ in something roughly 25mm*25mm or 25*50mm (size can be different, but on this order)? Or, does anyone have experience bonding with borosilicate or some other glass which can be bought in these rough dimensions? (thickness ~300um) Thanks for your help, Max Shulaker From shott at stanford.edu Fri Aug 24 18:48:11 2012 From: shott at stanford.edu (John Shott) Date: Fri, 24 Aug 2012 18:48:11 -0700 Subject: coverslip for bonding In-Reply-To: <1091423118.14623610.1345857676495.JavaMail.root@zm03.stanford.edu> References: <1091423118.14623610.1345857676495.JavaMail.root@zm03.stanford.edu> Message-ID: <24098EF4-7B21-4880-9764-3DACA63EA880@stanford.edu> Max Although there may be minor chemical differences, Pyrex 7740 is Corning's trade name for a glass whose primary constituent is borosilicate glass. Have you actually asked about the differences between the borosilicate glass you have been quoted and true Pyrex 7740? They may be chemically very similar, but the vendor may be careful not to use a trademarked name if Corning is not their supplier. You may be asking for champagne, and being told that they only sell California sparkling wine. Have a good weekend, John Sent from my iPhone On Aug 24, 2012, at 6:21 PM, Max Marcel Shulaker wrote: > Hey everyone, > Thanks for all of the responses for the glass drilling - the response was really amazing. > I was wondering if anyone knew a place where you can purchase glass coverslips for bonding? > For the anodic bonding, it should be type Pyres 7740, however, every coverslip I have seen is borosilicate. > Does anyone have suggestions for getting this type of glass/ in something roughly 25mm*25mm or 25*50mm (size can be different, but on this order)? Or, does anyone have experience bonding with borosilicate or some other glass which can be bought in these rough dimensions? (thickness ~300um) > Thanks for your help, > Max Shulaker From edmyers at stanford.edu Mon Aug 27 15:26:55 2012 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 27 Aug 2012 15:26:55 -0700 Subject: Fwd: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) In-Reply-To: <50244796.6030809@stanford.edu> References: <50244796.6030809@stanford.edu> Message-ID: <503BF42F.4050909@stanford.edu> A friendly reminder as the workshop is getting closer. -------- Original Message -------- Subject: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) Date: Thu, 09 Aug 2012 16:28:22 -0700 From: Ed Myers To: labmembers at snf.stanford.edu CC: Lishan, David (Plasma-Therm LLC) All, SNF and Plasma-Therm would like to invite you and your team members to attend the Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) to be held at the Stanford University on September 10 and 11, 2012. The Workshop is intended to provide understanding and insight to those working with plasma etching and deposition processes and equipment. The goal is to help researchers make faster progress on projects requiring plasma processing. The course has been very well received at Harvard, UC Berkeley, UCLA, Notre Dame, USF, IMRE, Israel, and Lund University. Graduate students, post docs, professors, and staff have all found the material useful. The format encourages questions and we hope attendees take advantage of the opportunity for networking and discussing their projects. The workshop is meant to encourage cooperation within the academic and industrial research communities. Please be assured that the course is not an advertisement about Plasma-Therm products. Aside from a very brief 15 min introduction to Plasma-Therm, the rest of the day is dedicated to education on fundamentals and advanced etching and plasma-enhanced chemical vapor deposition technology. Presentation materials are equally useful to those that do and do not have our equipment. Details regarding the Workshop objectives, agenda, location, and speaker can be found on the attached flyer. Please note that the workshop is free and registration is requested online by August 31, 2012 at the website: http://www.surveymonkey.com/s/FPQLZPQ Regards, SNF Staff and Plasma-Therm -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Stanford - Plasma-Therm Workshop flyer and agenda.pdf Type: application/pdf Size: 145696 bytes Desc: not available URL: From mtang at stanford.edu Wed Aug 29 15:25:16 2012 From: mtang at stanford.edu (Mary Tang) Date: Wed, 29 Aug 2012 15:25:16 -0700 Subject: Fwd: Invited Talk by Prof. Paul Alivisatos (8/31), updated title and abstract In-Reply-To: References: Message-ID: <503E96CC.7080509@stanford.edu> -------- ---------- Forwarded message ---------- From: Chris Earhart Date: Wed, Aug 29, 2012 at 3:07 PM Subject: Invited Talk by Prof. Paul Alivisatos (8/31), updated title and abstract To: Chris Earhart [image: Inline image 1] MSE Undergraduate Research Program Invited Talk Friday, August 31, 2012 William R. Hewlett Teaching Center, 201 Lecture at 3:30PM Studies of Colloidal Nanocrystals in the Electron Microscope A. Paul Alivisatos, Ph.D. Director of Lawrence Berkeley National Laboratory Larry and Diane Bock Professor Departments of Chemistry and Materials Science University of California, Berkeley This talk will present our recent work on the study of colloidal nanocrystals in a fluid using the TEM. We have studied the motion of nanocrystals, the trajectories for the growth of individual particles, and the formation of nanocrystal arrays as the liquid evaporates. In each case, the ability to observe the behavior of single particles offers new physical insights. MSE Undergraduate Summer Research Poster Symposium Science and Technology at the Nanoscale Friday, August 31, 2012 Patio outside of Hewlett 201 4:30PM (After the invited talk by Prof. Paul Alivisatos) Sponsored by the Office of the Vice Provost for Undergraduate Education (VPUE) ** Pizza and drinks will be served** *Map of Hewlett Teaching Center:*** *[image: Inline image 2] * * * *List of Undergraduate Research Posters* *REU Student* *Advisor* *Poster Title* Amin Aalipour N. Melosh Exploring Cell-Nanostraw Interactions to Promote Highly Efficient Intracellular Delivery Erin Antono R. Salleo Suppressed Crystallinity Hinders Doping Efficiency in p-doped Solution Processed TIPS-Pentacene Tracey Atkinson J. Dionne Enhancing Magnetic Dipole Transitions with Nanocrescents Jena Barnes K. Goodson Thermal Characterization of Zinc Oxide Nanowire Films Mai Bui D. Nelson Growth of "Fish-Eye" Fatigue Cracks in Steel Alloys Sam Carreon S. Wang Physical Fabrication of Nanoparticles Maverick Chea J. Dionne Pressure Dependence of Upconverting Nanoparticles Brian Fei R. Sinclair TEM Analysis of QD Thin Films Deposited by ALD Brian Flamm R. Sinclair TEM Holography and Image Simulations Darren Hau M. McGehee Effect of Antioxidant Additive on Polymer Photobleaching and Organic Solar Cells Atsu Kobashi B. Clemens Kinetic and Structural Properties of Magnesium Hydride Formation John Lawrence P. McIntyre Effects of Forming Gas Anneal on the Performance of ALD-TiO2-coated Si Photoanodes for Electrocatalytic Hydrolysis Elena Leon R. Dauskardt Effects of UV Damage on the Biomechanical Propertiesof the Stratum Corneum Marion Lepert B. Clemens The Photoelectrochemical Analysis of Semiconductors Jason Middleton N. Melosh Self-Assembling Superstructures of 1D Molecular Wires Janina Motter Y. Cui Chemical Exfoliation of Synthesized Bismuth Selenide Nanoplates Kevin Moy R. Salleo Plasmonic-Enhanced Upconversion in Security Applications Keziah Plattner A. Lindenberg Ultrafast Dynamics of Phase-Change Materials Andrew Ponec M. McGehee Improved Efficiency of Bulk Heterojunction Solar Cells through Silicon Naphthalocyanine Dye Additives Victoria Robles S. Heilshorn Extending Tunability of Elastin-like Matrices: Nanostructure and Mechanics Wilson Torres S. Heilshorn Patterning Thin Film Elastin Like Protein Using Photolithography Ellen Tsay R. Dauskardt Cohesion and Reliability of Organic Bulk Heterojunction Solar Cells Sigberto Viesca S. Wang Hydrophilic treatments for PDMS microfluidic chips -------------- next part -------------- A non-text attachment was scrubbed... Name: MSE Symposium Anouncement.pdf Type: application/pdf Size: 579514 bytes Desc: not available URL: From edmyers at stanford.edu Thu Aug 30 10:36:46 2012 From: edmyers at stanford.edu (Ed Myers) Date: Thu, 30 Aug 2012 10:36:46 -0700 Subject: Fwd: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) In-Reply-To: <50244796.6030809@stanford.edu> References: <50244796.6030809@stanford.edu> Message-ID: <503FA4AE.7060004@stanford.edu> All, Due to the overwhelming response, we have reached the allowable occupancy level in the conference room. I encourage you to still sign up, but please be aware it will be on a waiting list status. I also encourage those who have registered and know they will not be attending the full two days to let me know. I'm sure you don't want to be responsible for preventing anyone from attending. Regards, Ed -------- Original Message -------- Subject: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) Date: Thu, 09 Aug 2012 16:28:22 -0700 From: Ed Myers To: labmembers at snf.stanford.edu CC: Lishan, David (Plasma-Therm LLC) All, SNF and Plasma-Therm would like to invite you and your team members to attend the Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) to be held at the Stanford University on September 10 and 11, 2012. The Workshop is intended to provide understanding and insight to those working with plasma etching and deposition processes and equipment. The goal is to help researchers make faster progress on projects requiring plasma processing. The course has been very well received at Harvard, UC Berkeley, UCLA, Notre Dame, USF, IMRE, Israel, and Lund University. Graduate students, post docs, professors, and staff have all found the material useful. The format encourages questions and we hope attendees take advantage of the opportunity for networking and discussing their projects. The workshop is meant to encourage cooperation within the academic and industrial research communities. Please be assured that the course is not an advertisement about Plasma-Therm products. Aside from a very brief 15 min introduction to Plasma-Therm, the rest of the day is dedicated to education on fundamentals and advanced etching and plasma-enhanced chemical vapor deposition technology. Presentation materials are equally useful to those that do and do not have our equipment. Details regarding the Workshop objectives, agenda, location, and speaker can be found on the attached flyer. Please note that the workshop is free and registration is requested online by August 31, 2012 at the website: http://www.surveymonkey.com/s/FPQLZPQ Regards, SNF Staff and Plasma-Therm -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Stanford - Plasma-Therm Workshop flyer and agenda.pdf Type: application/pdf Size: 145696 bytes Desc: not available URL: From shott at stanford.edu Thu Aug 30 14:58:08 2012 From: shott at stanford.edu (John Shott) Date: Thu, 30 Aug 2012 14:58:08 -0700 Subject: Updating Java on your computers .... Message-ID: <503FE1F0.1020905@stanford.edu> SNF Lab Members: As you may know, there has been a lot of press in the last week about a "zero-day" exploit in Java that affects all computer platforms and all browsers that run on those platforms. It was believed that this affected only Java 7 and not Java 6. A number of you likely have Java 7 on your machines. Earlier today, Oracle has released an updated version of both Java 7 (specifically Java 7 update 7) and Java 6 (Java 6 update 36) to address these issues. If you run Remote Coral on a computer, you have either Java 6 or Java 7 on your machine and should update those versions as soon as possible to reduce the likelihood that you machines will become infected or injected with various forms of malware. For those of you running Windows XP or Windows 7, the easiest way to upgrade your machine is to open the Java Control Panel . This is normally an icon on the main page that contains other control panels. That will usually be found on either XP or Windows 7 machines in: Windows XP Click Start > Settings > Control Panel Windows 7, Windows Vista Click Start > Control Panel > Programs Double click that Java icon which should open the Java Control Panel. There you should see the Update tab. Select that and click the "Update Now" button. That should download and install the latest version of the Java Runtime Environment (JRE) onto your machine. After that is done, you may want to open the Java Control Panel again, but this time select the Java tab. On that page you will see a "View ..." button. Clicking that will show you the version (or versions) of Java that are currently installed on your machine. After the upgrade you should under Platform either 1.7 (Java 7) or 1.6 (Java 6) and under product it should list either 1.7.0_07 for the latest version of Java 7 or 1.6.0_35 for the latest version of Java 6. Note: if you run Stanford administrative application, you may also see Java 1.6.0_21 because a number of Stanford-specific applications will ONLY run on that version of Java. In any event, I encourage you to make these upgrades as soon as possible to minimize the chances that undesirable code may get injected onto your machine. Note: while I am less familiar with Mac OS-X, if you are running Java 7 on a Mac, there is also an upgrade for Java 7 for the Mac available from http://java.oracle.com. Java 6 for Mac OS-X has been controlled and distributed by Applie and I don't know if they have an updated version. Hopefully, this will reduce the risk for anyone running Java on their machines. Thanks, John From kgc at stanford.edu Thu Aug 30 15:04:54 2012 From: kgc at stanford.edu (Katie Chang) Date: Thu, 30 Aug 2012 15:04:54 -0700 Subject: Does anyone have 950PMMA A4? Message-ID: Hello labmembers, Would anyone know of where I be able to get a little bit of 950PMMA A4? As far as I can see SNF only carries 2%, 5%, 9% etc. (I guess I could always mix some 2% and 5% together, but I'm afraid that might not be so accurate). Thanks! --Katie -------------- next part -------------- An HTML attachment was scrubbed... URL: From steelxu at stanford.edu Thu Aug 30 16:29:36 2012 From: steelxu at stanford.edu (Xiaoqing Xu) Date: Thu, 30 Aug 2012 16:29:36 -0700 (PDT) Subject: Does anyone have SOG stored inside SNF? In-Reply-To: <1153399584.20439455.1346367057749.JavaMail.root@zm03.stanford.edu> Message-ID: <302319848.20494738.1346369376757.JavaMail.root@zm03.stanford.edu> Hi all, Does anyone have SOG stored inside SNF? Could you share with me? I want to spin coat 100-1000nm SiO2 on my nanowire samples to passivate the substrate. The samples are smaller than 1*1cm, so a small amount of SOG is needed. If anyone can share with me, that will be very helpfull! Thanks! Xiaoqing From bhuff at stanford.edu Fri Aug 31 11:44:49 2012 From: bhuff at stanford.edu (Brett E. Huff) Date: Fri, 31 Aug 2012 11:44:49 -0700 Subject: New Prudential Gown Services starting Sept. 4th. Message-ID: <5E7D7EF6-6F38-48C6-B317-44DCFEA9E8E3@stanford.edu> Labmemebers, Starting Tuesday, Sept 4th we will be removing all gowns from hangers twice per month. Once in the beginning and a second time on or around the 15th of each month. If you are in the facility prior to the gowns being pulled in the morning, please recycle your garments on your way out. The new gowns are owned by Prudential and will be maintained by them. Based on those that responded to the survey a statistically estimated stock level across the size distributions are available and in circulation. New for users: Your hood and boots need to be strapped or snapped to the gown or hanger. We should no longer have shortages of boots and boot pairs in the inventory. We will stock the bins as best we can the first several days after removing all the gowns. Until storage location and inventory details are fully implemented please be patient with my stock room staff. If you know you are only visiting our facility once or twice in a month, please do not use a hanger, rather place your garments into the garment recycle bin as you exit. We have enough garments to accommodate your needs and we do not pay based on number of wash cycles. For those that are in the XS, 2XL, 3XL and 4XL garment sizing, please use a hanger to to insure your needs are met. For those not in this distribution of sizing, please do not use garments, this inventory is very constrained. If you come across damaged garments, please make a knot out of the item and place in the garment recycle. Prudential takes that as an indication for inspection on their part. For future reference: We are looking at increasing the space for our gown room to improve circulation of clean air and to prevent the occasional overcrowding that occurs at peak entry times. This will also improve our space to keep garment stock conveniently located. I expect there may be concerns or questions, please to prevent email overload, reply with your questions to me directly. Brett E. Huff SNF Clean Room Manager Stanford University ?510-612-8670 bhuff at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From vrinda at stanford.edu Fri Aug 31 12:33:42 2012 From: vrinda at stanford.edu (Vrinda Thareja) Date: Fri, 31 Aug 2012 12:33:42 -0700 Subject: Spin-on glass/ sputter dielectric on a substrate Message-ID: Hey labmembers, Two questions: 1. I am interested in spin coating my sample (Ag/ Si) with 150nm spin-on glass. Does anyone have spin-on glass that I can borrow for now? If you can recommend some vendors then I can also place an order for you today. 2. Does anyone know of any company/vendor that can sputter dielectric (any oxide would work) of a given thickness on a substrate for me? Any help would be highly appreciated! thanks, -- ~Vrinda Vrinda Thareja Ph.D. Candidate Brongersma Group Department of Materials Science and Engineering Stanford University From yinliu at lwmicrosystems.com Fri Aug 31 12:58:26 2012 From: yinliu at lwmicrosystems.com (Yin Liu) Date: Sat, 1 Sep 2012 03:58:26 +0800 Subject: help needed, Au coated Si wafer In-Reply-To: References: Message-ID: Hi everyone I need a Au coated Si wafer, for optical reflection purpose. A 4 inch should be fine. Does anyone has a spare one? Thanks! Yin Liu