Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)
edmyers at stanford.edu
Thu Aug 9 16:28:22 PDT 2012
SNF and Plasma-Therm would like to invite you and your team members to
attend the Plasma-Therm Technical Workshop: Fundamentals of Plasma
Processing (Etching and Deposition) to be held at the Stanford
University on September 10 and 11, 2012.
The Workshop is intended to provide understanding and insight to those
working with plasma etching and deposition processes and equipment. The
goal is to help researchers make faster progress on projects requiring
plasma processing. The course has been very well received at Harvard, UC
Berkeley, UCLA, Notre Dame, USF, IMRE, Israel, and Lund University.
Graduate students, post docs, professors, and staff have all found the
The format encourages questions and we hope attendees take advantage of
the opportunity for networking and discussing their projects. The
workshop is meant to encourage cooperation within the academic and
industrial research communities.
Please be assured that the course is not an advertisement about
Plasma-Therm products. Aside from a very brief 15 min introduction to
Plasma-Therm, the rest of the day is dedicated to education on
fundamentals and advanced etching and plasma-enhanced chemical vapor
deposition technology. Presentation materials are equally useful to
those that do and do not have our equipment.
Details regarding the Workshop objectives, agenda, location, and speaker
can be found on the attached flyer.
Please note that the workshop is free and registration is requested
online by August 31, 2012 at the website:
SNF Staff and Plasma-Therm
-------------- next part --------------
A non-text attachment was scrubbed...
Name: Stanford - Plasma-Therm Workshop flyer and agenda.pdf
Size: 145696 bytes
Desc: not available
More information about the labmembers