Solution for Slow Etch Pit Density Studies in Ge

Yang, Bin Bin.Yang at globalfoundries.com
Tue Aug 21 10:54:14 PDT 2012


Robert,

Dilute Secco etch from IBM works well for  threading dislocations in SiGe. It required a Silicon cap though.

Quick Turnaround Technique for Highlighting Defects in Thin Si/SiGe Bilayers
S. W. Bedella,z, D. K. Sadanaa, K. Fogela, H. Chenb and A. Domenicuccib
doi: 10.1149/1.1676116 Electrochem. Solid-State Lett. 2004 volume 7, issue 5, G105-G107

J. Phys. D: Appl. Phys. 42 (2009) 175306 (6pp) doi:10.1088/0022-3727/42/17/175306
Defect identification in strained Si/SiGe heterolayers for device applications

Thanks,

Bin

From: robertatx at gmail.com [mailto:robertatx at gmail.com] On Behalf Of Robert Chen
Sent: Tuesday, August 21, 2012 10:40 AM
To: labmembers
Subject: Solution for Slow Etch Pit Density Studies in Ge

Hi All,

I'm looking for an etchant for looking at etch pit density studies for Germanium (001) epi (etching pits corresponding to threading dislocations). There are a few recipes out there, but I believe they use some non-standard and non-stocked chemicals in SNF. Does  anyone have a recipe (and the chemicals) that is verified to work for this?

Thanks,

Robert Chen
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