From hongyuc at stanford.edu  Fri Jun  1 11:44:12 2012
From: hongyuc at stanford.edu (Henry Hong-Yu Chen)
Date: Fri, 1 Jun 2012 11:44:12 -0700
Subject: Dry etch PECVD SiO2
Message-ID: <CAJo8AH+7h=zFYVo1yKYuKzXPnEN1bjQf-kdKYAixLH_8fnPrNA@mail.gmail.com>

Dear Labmembers,

I plan to etch SiO2 (grown with STS) on the top of Pt (innotec). The
recipe I learned is CHF3/O2 PECVD SiO2 etching on wiki. If I want to
etch ~130nm SiO2, is 1um 3612 enough to for mask? Will the PR become
too hard to strip using aceton after etching?

In addition, I found mrc and drytek4 can do SiO2 etch. Which one gives
the better/steeper profile?

Thanks

Henry


From ntayebi at stanford.edu  Fri Jun  1 11:45:48 2012
From: ntayebi at stanford.edu (Noureddine Tayebi)
Date: Fri, 1 Jun 2012 11:45:48 -0700 (PDT)
Subject: Dry etch PECVD SiO2
In-Reply-To: <CAJo8AH+7h=zFYVo1yKYuKzXPnEN1bjQf-kdKYAixLH_8fnPrNA@mail.gmail.com>
Message-ID: <453480927.51663963.1338576348810.JavaMail.root@zm02.stanford.edu>

You'll be fine. I do it routinely.

N
----- Original Message -----
From: Henry Hong-Yu Chen <hongyuc at stanford.edu>
To: labmembers at snf.stanford.edu
Sent: Fri, 01 Jun 2012 11:44:12 -0700 (PDT)
Subject: Dry etch PECVD SiO2

Dear Labmembers,

I plan to etch SiO2 (grown with STS) on the top of Pt (innotec). The
recipe I learned is CHF3/O2 PECVD SiO2 etching on wiki. If I want to
etch ~130nm SiO2, is 1um 3612 enough to for mask? Will the PR become
too hard to strip using aceton after etching?

In addition, I found mrc and drytek4 can do SiO2 etch. Which one gives
the better/steeper profile?

Thanks

Henry



From jprovine at stanford.edu  Fri Jun  1 18:22:24 2012
From: jprovine at stanford.edu (J Provine)
Date: Fri, 1 Jun 2012 18:22:24 -0700
Subject: particle counts after tours
Message-ID: <CAOKRUa=xJhbSrn9x8V=vaqnT4zo26EvYMhkZ44uuXCDGcfnDGw@mail.gmail.com>

hi labmembers.  the tours of the labs have finished.  here was the particle
count this morning:
particle size (um)      # of particles
>5.0                  =          0
>1.0                  =          1
>0.5                  =          13
>0.3                  =          41

now those measurements have been reached again.
during the height of the tours the reading was

particle size (um)      # of particles
>5.0                  =          0
>1.0                  =          4
>0.5                  =          29
>0.3                  =          112


this for .05m^3 so these fall within class 100 guidelines.

happy processing.

j & fabian

*measurements taken near fiji ald systems.
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From liangjl at stanford.edu  Sun Jun  3 18:16:24 2012
From: liangjl at stanford.edu (Jiale Liang)
Date: Sun, 3 Jun 2012 18:16:24 -0700 (PDT)
Subject: Oral Exam Announcement: Jiale Liang
In-Reply-To: <215553685.485424.1338772488972.JavaMail.root@zm03.stanford.edu>
Message-ID: <1322010715.485910.1338772584433.JavaMail.root@zm03.stanford.edu>

Stanford University Ph.D. Oral Examination ? Department of Electrical Engineering

Title: Phase Change Memory Towards Sub-10nm - Device Structure and Array Analysis
Speaker: Jiale Liang
Advisor: H. -S. Philip Wong

Date: Wednesday, June 6, 2012
Time: 2:00 pm (Refreshments at 1:45pm)
Location: CIS-X Auditorium

Abstract:
Phase change memory (PCM) is a promising candidate for the next-generation nonvolatile-memory technology. Yet, questions remain unanswered as to what extent a functional PCM cell can be ultimately scaled to and what properties a PCM cell has at the single-digit nanometer scale. Moreover, for memory array implementation, array size limitations from sneak path leakage and wire scaling are severe. A careful co-design between memory device structure and array configuration beyond sub-10nm regime is hence imperative.

In the first part of my presentation, I will explore the scaling limit of PCM cells by demonstrating a fully functional cross-point memory cell using carbon nanotubes (CNTs) as the memory electrode. The use of CNT electrode brings the lithography-independent critical dimension down to 1.2 nm and contributes to a large reduction of programming current to 1.4 ?A, which is two orders of magnitude smaller than the state-of-the-art, and a record-low programming energy to 210 fJ. Measured electrical characteristics validate the advantage of device scaling on reducing the programming current of PCM cells and confirm the potential viability of a highly scaled ultra-dense PCM array down to 1.8nm node technology.

In the second part of my presentation, I will extend the discussion from a single PCM device to the resistive cross-point memory array. First, the methodology for worst case analysis and the reduced circuit model for cross-point memory arrays are introduced. Using this model, the size limiting factors of cross-point memory arrays without selection devices are analyzed considering both the array data pattern dependence and memory cell parameter dependence. Next, the impact of bit line and word line wire scaling on the write/read margin, energy dissipation, speed and reliability of resistive cross-point memory array are quantitatively examined for wire sizes down to the sub-10nm node. The impending resistivity increase due to wire dimensional scaling results in significantly degraded write and read windows, substantial interconnect energy, increased wire latency and exacerbating reliability. Lastly, the concept of using local back gate (LBG) CNFET as memory electrode, interconnect, and selection device for cross-point memory arrays is proposed. The improvement in the cross-point array performance promises the possibility of an integrated memory-carbon structure for sizes beyond sub-10nm.


From jprovine at stanford.edu  Tue Jun  5 09:53:07 2012
From: jprovine at stanford.edu (J Provine)
Date: Tue, 5 Jun 2012 09:53:07 -0700
Subject: EE412 final presentations
Message-ID: <CAOKRUakcXgQKkNn0+UKerwCYAa9cM+SwE6CcW+GA22ZfN4xMpg@mail.gmail.com>

Hello Labmembers,
on wednesday june 6 (tomorrow) at 11am-noon the EE412 class will present
their results of their work this quarter.  any interested parties are
welcome.

Kim Harrison will present on her studies of carbon contamination in various
SiO2 release processes.

Sam Emaminejad will present on his study of ALD dielectrics for fluidic
encapsulation in AC fields and the effect of ALD layers on PDMS bonding.

to celebrate another quarter of hard work and added community knowledge for
SNF pizza will be provided.

j
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From jprovine at stanford.edu  Tue Jun  5 10:07:43 2012
From: jprovine at stanford.edu (J Provine)
Date: Tue, 5 Jun 2012 10:07:43 -0700
Subject: EE412 final presentations
In-Reply-To: <4FCE3B78.8070904@cis.stanford.edu>
References: <CAOKRUakcXgQKkNn0+UKerwCYAa9cM+SwE6CcW+GA22ZfN4xMpg@mail.gmail.com>
	<4FCE3B78.8070904@cis.stanford.edu>
Message-ID: <CAOKRUamK4LrQXROfqup=cXKMOHZ0KTv6uN0k9_gS3kKqhedu-w@mail.gmail.com>

following up on two errors related to my email:
1) the room is allen 101
2) this is for EE412, not EE17N which is scheduled wednesday 2:15-5:05pm as
prof. pease pointed out.  interested parties are welcome to come to see the
presentations of the projects undertaken by the students in EE17N (a
freshman introsem on nanofabrication taught by prof. pease and myself).

*in brief:*
EE412: graduate SNF projects:  Allen 101:  11am-noon
EE17N:  undergraduate nanofabrication projects:  Allen 338x:  2:15-5:05pm
both wednesday june 6th, 2012.
j

On Tue, Jun 5, 2012 at 10:01 AM, pease <pease at cis.stanford.edu> wrote:

> 2:15 pm to 5:05pm!
> fp
>
>
>
> On 6/5/2012 9:53 AM, J Provine wrote:
>
>> Hello Labmembers,
>> on wednesday june 6 (tomorrow) at 11am-noon the EE412 class will present
>> their results of their work this quarter.  any interested parties are
>> welcome.
>>
>> Kim Harrison will present on her studies of carbon contamination in
>> various SiO2 release processes.
>>
>> Sam Emaminejad will present on his study of ALD dielectrics for fluidic
>> encapsulation in AC fields and the effect of ALD layers on PDMS bonding.
>>
>> to celebrate another quarter of hard work and added community knowledge
>> for SNF pizza will be provided.
>>
>> j
>>
>
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From pease at cis.stanford.edu  Tue Jun  5 10:01:44 2012
From: pease at cis.stanford.edu (pease)
Date: Tue, 05 Jun 2012 10:01:44 -0700
Subject: EE412 final presentations
In-Reply-To: <CAOKRUakcXgQKkNn0+UKerwCYAa9cM+SwE6CcW+GA22ZfN4xMpg@mail.gmail.com>
References: <CAOKRUakcXgQKkNn0+UKerwCYAa9cM+SwE6CcW+GA22ZfN4xMpg@mail.gmail.com>
Message-ID: <4FCE3B78.8070904@cis.stanford.edu>

2:15 pm to 5:05pm!
fp


On 6/5/2012 9:53 AM, J Provine wrote:
> Hello Labmembers,
> on wednesday june 6 (tomorrow) at 11am-noon the EE412 class will 
> present their results of their work this quarter.  any interested 
> parties are welcome.
>
> Kim Harrison will present on her studies of carbon contamination in 
> various SiO2 release processes.
>
> Sam Emaminejad will present on his study of ALD dielectrics for 
> fluidic encapsulation in AC fields and the effect of ALD layers on 
> PDMS bonding.
>
> to celebrate another quarter of hard work and added community 
> knowledge for SNF pizza will be provided.
>
> j


From jprovine at stanford.edu  Tue Jun  5 10:54:05 2012
From: jprovine at stanford.edu (J Provine)
Date: Tue, 5 Jun 2012 10:54:05 -0700
Subject: ROOM CHANGE Re: EE412 final presentations
Message-ID: <CAOKRUamEez9EmgF14xrjv28izrbQZUwDmVXRDUfAd=Su_TN0zg@mail.gmail.com>

>
> Hello Labmembers,
> on wednesday june 6 (tomorrow) at *11:30am-12:30* the EE412 class will
> present their results of their work this quarter.  any interested parties
> are welcome.  we will meet in *Nano 143*
>
> Kim Harrison will present on her studies of carbon contamination in
> various SiO2 release processes.
>
> Sam Emaminejad will present on his study of ALD dielectrics for fluidic
> encapsulation in AC fields and the effect of ALD layers on PDMS bonding.
>
> to celebrate another quarter of hard work and added community knowledge
> for SNF pizza will be provided.
>
>
j
>

and note:  EE17N presentations still 2:15-5:05 in allen 338x wednesday june
6th.

>
>
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From wslee at stanford.edu  Tue Jun  5 14:46:22 2012
From: wslee at stanford.edu (Scott Lee)
Date: Tue, 5 Jun 2012 17:46:22 -0400
Subject: Ru deposition
Message-ID: <CAC8qUHBSBeh=rQOAp__oEpGA-BUa-PFbhXJ1LSfJAdMs6FZBdA@mail.gmail.com>

Hi all,

I need to deposit about 20-50nm Ru ideally by ALD or CVD but sputtered Ru
could also work. Does anyone have a source for depositing Ru or have
experience with a company who deposits a wide array of thin films?

Thanks,
Scott
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From bayoung at stanford.edu  Wed Jun  6 10:28:54 2012
From: bayoung at stanford.edu (Betty Young)
Date: Wed, 6 Jun 2012 10:28:54 -0700 (PDT)
Subject: Ru deposition
In-Reply-To: <CAC8qUHBSBeh=rQOAp__oEpGA-BUa-PFbhXJ1LSfJAdMs6FZBdA@mail.gmail.com>
Message-ID: <809147344.15350551.1339003734481.JavaMail.root@zm08.stanford.edu>

Hi Scott,
I've used this company for interesting material needs.
http://lebowcompany.com/

They are amazing.
Good luck, Betty Young (Physics)

----- Original Message -----
From: "Scott Lee" <wslee at stanford.edu>
To: labmembers at snf.stanford.edu
Sent: Tuesday, June 5, 2012 2:46:22 PM
Subject: Ru deposition

Hi all, 


I need to deposit about 20-50nm Ru ideally by ALD or CVD but sputtered Ru could also work. Does anyone have a source for depositing Ru or have experience with a company who deposits a wide array of thin films? 


Thanks, 
Scott 


From jwc at snf.stanford.edu  Thu Jun  7 09:05:20 2012
From: jwc at snf.stanford.edu (James W. Conway)
Date: Thu, 07 Jun 2012 09:05:20 -0700
Subject: June 7 is the tenth Anniversary of 'First Light' on the RAITH 150
 Ebeam Lithography and Metrology System at Stanford Nanofabrication Facility
Message-ID: <4FD0D140.7000904@snf.stanford.edu>

Greetings Raith Community:

Today is the Tenth Anniversary of 'First Light' on the Stanford Raith 
150 system.

In the course of the last ten years the Raith 150 tool and I have made 
significant contributions to basic research in Nano-Antennas, Photonic 
Crystals and Integrated Photonic Platforms, and more recently in 
Plasmonic devices in addition to all the normal device fabrications for 
MEMS, NEMS, and microelectronics.

To date over 350 Users have been trained with nearly 200 currently 
working on the tool.  More than 50 peer reviewed Journal articles in 
Photonics and Plasmonics have resulted from this effort and I have been 
credited with significant contributions in more than 35 PhD thesis and 
defenses in the last  five years.

In looking back at many successes here at Stanford, I believe my biggest 
contribution here at Stanford has been in the creation and support of a 
large community of researchers working in rabid collaboration on the 
RAITH 150 system.

I look forward to further engagement with lab members in the next decade 
of research here at Stanford and hope to add Ion Beam Lithography 
capability to the Ebeam Lab this decade.

Thank you for your support!

James Conway
Ebeam Technology Group
Stanford nanofabrication Facility


From vrinda at stanford.edu  Thu Jun  7 11:24:01 2012
From: vrinda at stanford.edu (Vrinda Thareja)
Date: Thu, 7 Jun 2012 11:24:01 -0700
Subject: Wet etchant for silver
Message-ID: <CALERgFDzeoTY-kr1Rg+6v6jLd-_8RwXGhkGCmA5oz=ab_Sjzew@mail.gmail.com>

Hey labmembers,

Does anyone know a wet etchant for silver films? I need to etch a 40nm
groove in a 100nm silver film.

thanks,
-- 
~Vrinda

Vrinda Thareja
Ph.D. Candidate
Brongersma Group
Department of Materials Science and Engineering
Stanford University
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From arion at stanford.edu  Fri Jun  8 11:53:19 2012
From: arion at stanford.edu (Antonio Arion Gellineau)
Date: Fri, 8 Jun 2012 11:53:19 -0700 (PDT)
Subject: E240-Poster session
In-Reply-To: <CACqfE3qGyuwctA9geHkCF2ej76d8vxXwpk8jhQiuDZR5E2HSSw@mail.gmail.com>
Message-ID: <16467791.133.1339181618395.JavaMail.Antonio@MadCheetah>


Hi All,

The E240 poster presentation is today in the outdoor area outside AllenX from 3-5pm.

The future users of the SNF will be presenting on a wide variety of MEMS designs and topics; everything from energy harvesting to tunable lasers.

Also, there will be snacks.

Best,
E240 Teaching Team


From popomoo at stanford.edu  Sat Jun  9 09:05:58 2012
From: popomoo at stanford.edu (Sangmoo Jeong)
Date: Sat, 9 Jun 2012 09:05:58 -0700 (PDT)
Subject: watch out a big bug!
In-Reply-To: <1556805174.4624116.1339257575213.JavaMail.root@zm02.stanford.edu>
Message-ID: <1587044524.4626513.1339257958599.JavaMail.root@zm02.stanford.edu>

Dear SNF labmembers

When I loaded my wafers into tylan1 and put the tube in,
I found one bug flying around the furnace.
It was around 8:40am.

The bug looked like a big mosquito, not a fly.
I tried to catch it but I lost it soon. I seriously hope that it didn't go into the furnace.

I'm not sure it is still flying around in the cleanroom.
I have no idea how it visits here, 
but please be careful when you load your samples into the chambers or furnaces.



Best

Sangmoo


From zhangll.ime at gmail.com  Thu Jun  7 11:29:43 2012
From: zhangll.ime at gmail.com (Zhangll.ime)
Date: Thu, 7 Jun 2012 11:29:43 -0700
Subject: H2O2 etch photoresist rate
Message-ID: <B390DBA1-DA59-45B7-9519-5E0BF07F3097@gmail.com>

Hi all,

Does anyone know the etch rate of photoresist (for example, 3612) in H2O2 ?

Thanks a lot!

Sincerely yours,
Liangliang

-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University


From robinhmb at yahoo.com  Mon Jun 11 13:44:57 2012
From: robinhmb at yahoo.com (Robin King)
Date: Mon, 11 Jun 2012 13:44:57 -0700 (PDT)
Subject: H2O2 etch photoresist rate
In-Reply-To: <B390DBA1-DA59-45B7-9519-5E0BF07F3097@gmail.com>
References: <B390DBA1-DA59-45B7-9519-5E0BF07F3097@gmail.com>
Message-ID: <1339447497.25610.YahooMailNeo@web111513.mail.gq1.yahoo.com>

Hi Liangliang,
?
Putting?photoresist in H2O2 wouldn't be my first choice, as?it?can lift off badly, even in dilute solutions?or with?HMDS.?
Maybe?someone at SNF will have?a workaround for you. 
?
Best wishes, 
Robin King
?
?

From: Zhangll.ime <zhangll.ime at gmail.com>
To: "labmembers at snf.stanford.edu" <labmembers at snf.stanford.edu> 
Sent: Thursday, June 7, 2012 11:29 AM
Subject: H2O2 etch photoresist rate

Hi all,

Does anyone know the etch rate of photoresist (for example, 3612) in H2O2 ?

Thanks a lot!

Sincerely yours,
Liangliang

-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University
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From jasonlin at stanford.edu  Mon Jun 11 21:49:50 2012
From: jasonlin at stanford.edu (J. Jason Lin)
Date: Mon, 11 Jun 2012 21:49:50 -0700
Subject: Do NOT turn off power to wetbench General
Message-ID: <CA+JW7yENu+J2GNR9WTj=Lcjf=4_21Ehw87D-xdP77utGJiJpRQ@mail.gmail.com>

Dear labmembers,

If the wbgen-ctb is in use, please do NOT turn off the wetbench power when
you finish with wbgen-hpr.  It turns off power to both and the heater will
turn off.  Please be careful when working in this shared environment.

Thanks,
Jason
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From dwnam83 at gmail.com  Mon Jun 11 23:07:53 2012
From: dwnam83 at gmail.com (Donguk Nam)
Date: Mon, 11 Jun 2012 23:07:53 -0700
Subject: Selective dry etching of SiN from silicon
Message-ID: <E1E64252-AF9D-4216-A460-E21B8ADB4EFE@gmail.com>

Dear Labmembers,

Does anyone have any experience in selective dry etching of SiN from silicon? I have been using CHF3/O2 in Drytek4 but the etch selectivity is not high enough for my process.

Please let me know if anyone has some experience.

Best regards,
Donguk



From mcvittie at stanford.edu  Tue Jun 12 09:36:03 2012
From: mcvittie at stanford.edu (Jim McVittie)
Date: Tue, 12 Jun 2012 09:36:03 -0700 (PDT)
Subject: Selective dry etching of SiN from silicon
In-Reply-To: <E1E64252-AF9D-4216-A460-E21B8ADB4EFE@gmail.com>
Message-ID: <1122900606.2270745.1339518962973.JavaMail.root@zm06.stanford.edu>

Donguk,

In a CHF3/O2 process if you up the O2 percentage you will increase your sel of nitride to oxide (See Stocker paper for work done on AMT type etcher). By using N2 instead of O2, you can get high sel of nitr to poly-Si at high percentages of N2 (See Li paper for work done in (MRC/Drytek4)RIE type tool. You  can also get high sel to Si using CF4 or NF3 in high percentages of O2 (See Kastenmeier paper fpr work done in a downstream uwave etcher. The Gasonic is the closest tool like this which have but it dose not have Cf4 or NF3.).

   Jim 

Stocker, H.J. et al. "Selective reactive ion etching of silicon nitride on
       oxide in a multifacet ('HEX') plasma etching machine" 35th National
       Symposium of the American Vacuum Society. Held: Atlanta, GA, USA 2-7
       Oct. 1988. J. Vac. Sci. Technol. A, Vac. Surf. Films (USA), Journal of
       Vacuum Science & Technology A (Vacuum, Surfaces, and Films) (May-June
       1989) vol.7, no.3, pt.1 p. 1145-9

 Li, Y.X. et al. "Selective reactive ion etching of silicon nitride over
       silicon using CHF/sub 3/ with N/sub 2/ addition" JOURNAL OF VACUUM
       SCIENCE & TECHNOLOGY B (MICROELECTRONICS AND NANOMETER STRUCTURES)
       Sept.-Oct. 1995. vol.13, no.5, p. 2008-12 

Kastenmeier, B.E.E. et al. "Highly selective etching of silicon nitride
      over silicon and silicon dioxide" JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
      A (VACUUM, SURFACES, AND FILMS)  AIP for American Vacuum Soc, Nov. 1999.
      vol.17, no.6, p. 3179-84

----- Original Message -----
From: "Donguk Nam" <dwnam83 at gmail.com>
To: labmembers at snf.stanford.edu
Sent: Monday, June 11, 2012 11:07:53 PM
Subject: Selective dry etching of SiN from silicon

Dear Labmembers,

Does anyone have any experience in selective dry etching of SiN from silicon? I have been using CHF3/O2 in Drytek4 but the etch selectivity is not high enough for my process.

Please let me know if anyone has some experience.

Best regards,
Donguk

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From karthikb at stanford.edu  Tue Jun 12 14:24:15 2012
From: karthikb at stanford.edu (Karthik Balakrishnan)
Date: Tue, 12 Jun 2012 14:24:15 -0700
Subject: Fwd: Re: XLab is Interviewing Prospective Students
In-Reply-To: <6.2.5.6.2.20120612140139.020daeb8@stanford.edu>
References: <6.2.5.6.2.20120612140139.020daeb8@stanford.edu>
Message-ID: <CANdqu7xNH4Jnnh1wMnWWd7+pndA71b=NTzFhf8TT7pyvFs8z9Q@mail.gmail.com>

This might be of interest to some labmembers.

-Karthik

> >The EXtreme Environment Microsystems Laboratory (XLab) is
> >interviewing prospective graduate students! ?The lab website
> >(http://xlab.stanford.edu) has officially launched and students can
> >find brief descriptions of future research projects there.
> >
> >If you are interested in learning more about the research projects,
> >please contact Prof. Debbie G. Senesky ?at
> >dsenesky at stanford.edu. ?My office hours are on Tuesday and Thursday
> >(1:00pm to 2:30pm) and I would like to schedule meetings during those periods.
> >
> >Many thanks.
> >
> >-Debbie
> >________________________________________
> >Debbie G. Senesky, Ph.D.
> >Assistant Professor
> >Aeronautics and Astronautics Department
> >Stanford University
> >Email: dsenesky at stanford.edu
> >URL: http://xlab.stanford.edu
>


From jimkruger at yahoo.com  Tue Jun 12 15:57:25 2012
From: jimkruger at yahoo.com (jim kruger)
Date: Tue, 12 Jun 2012 15:57:25 -0700 (PDT)
Subject: Resist wafer bonding weights in Litho
Message-ID: <1339541845.92997.YahooMailNeo@web163103.mail.bf1.yahoo.com>

I have attached a Thermocouple to one of the weights for use in measuring delta T and time constants.

Please use the other one.? If it is in use and not available, use the one with the TC, but please be careful not to damage the TC.

I hope to be finished in? about 1 week.

Thanks,

jim
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From jwb2005 at stanford.edu  Wed Jun 13 10:40:42 2012
From: jwb2005 at stanford.edu (John Bumgarner)
Date: Wed, 13 Jun 2012 10:40:42 -0700
Subject: New Plasmatherm PECVD "ccp" and "icp" tools
Message-ID: <4FD8D09A.6030106@stanford.edu>

All,

This is notification that if you want to use the new Plasmatherm PECVD 
tools, please see Nancy Latta for training prior to any usage (hard 
requirement).  Jim McVittle is the technical expert, but Nancy must 
approve all users.

Use of these tools will meet the following general criteria.

For our cross contamination control strategy, we all calling these "All" 
tools.  This does not mean all materials are allowed.  It means that you 
can run "Au contaminated," "Semiclean" and "Clean" wafers and they will 
come out in the same category as they went in.

Important for "Clean" users - you must assume the tool is dirty when you 
enable and as such, you MUST run both the recipe to clean the chamber 
and the recipe to coat the chamber (and insure no cross contamination) 
prior to running your wafers.  Please see Nancy for details.

The only materials that may be run in these tools are the same as have 
been previously approved to run in STS Dep tool.  This is subject to 
change over time only through the Spec Mat/CCB process.  Additional 
information will be added to the Wiki for the tools over time.

Any questions, please see Nancy first before proceeding.

These are new tools, please follow the rules and keep them in good 
condition.  As a reminder, failure to follow the usage rules will result 
in your access to SNF being deactivated for a period of time.

Regards,

John


_____________________
John Bumgarner, PhD
Operations Director SNF





From shott at stanford.edu  Wed Jun 13 16:55:03 2012
From: shott at stanford.edu (John Shott)
Date: Wed, 13 Jun 2012 16:55:03 -0700
Subject: Java Update and problems running Remote Coral ....
Message-ID: <4FD92857.7090804@stanford.edu>

SNF Lab Members:

I have heard from James Conway and, indirectly, from Zhiping Zhang that 
an overnight upgrade of Java has "broken" remote Coral on their desktop.

While I don't know whether there is actually something wrong with the 
latest version of Java, I've been able to get Remote Coral running again 
(after intentionally upgrading the version of Java 7 on my desktop and 
breaking Remote Coral) by pushing out a fresh version of Remote Coral 
including an updated version of the third-party library that we use to 
securely encrypt/decrypt Remote Coral passwords.

The next time that you start Remote Coral, you may see that it either 
downloads a couple of files or asks you if you want to upgrade.  
Hopefully, those new files will resolve any problems you may encounter.

If that updated version doesn't resolve any problems you may be 
experiencing, please let me know.  It's possible that some folks may 
need to purge their Java Web Start cache to fully reload the 
application, but I'm hopeful that this may not be required and the 
updated files will simply fix any problems that you have been experiencing.

Thanks for your attention, but please let me know if you experience any 
problems.

John





From raisul at stanford.edu  Wed Jun 13 17:00:42 2012
From: raisul at stanford.edu (Raisul Islam)
Date: Wed, 13 Jun 2012 17:00:42 -0700 (PDT)
Subject: Java Update and problems running Remote Coral ....
In-Reply-To: <4FD92857.7090804@stanford.edu>
Message-ID: <2145861204.9379941.1339632042132.JavaMail.root@zm04.stanford.edu>

Hi,
I am also having problems with updated Java. I have tried running fresh version of coral but that did not work.
So do I need to get back to older version of Java?
-Raisul

----- Original Message -----
From: "John Shott" <shott at stanford.edu>
To: "labmembers" <labmembers at snf.stanford.edu>
Cc: "James Conway" <jwc at snf.stanford.edu>, "Zhiping Zhang" <zzp at stanford.edu>
Sent: Wednesday, June 13, 2012 4:55:03 PM
Subject: Java Update and problems running Remote Coral ....

SNF Lab Members:

I have heard from James Conway and, indirectly, from Zhiping Zhang that 
an overnight upgrade of Java has "broken" remote Coral on their desktop.

While I don't know whether there is actually something wrong with the 
latest version of Java, I've been able to get Remote Coral running again 
(after intentionally upgrading the version of Java 7 on my desktop and 
breaking Remote Coral) by pushing out a fresh version of Remote Coral 
including an updated version of the third-party library that we use to 
securely encrypt/decrypt Remote Coral passwords.

The next time that you start Remote Coral, you may see that it either 
downloads a couple of files or asks you if you want to upgrade.  
Hopefully, those new files will resolve any problems you may encounter.

If that updated version doesn't resolve any problems you may be 
experiencing, please let me know.  It's possible that some folks may 
need to purge their Java Web Start cache to fully reload the 
application, but I'm hopeful that this may not be required and the 
updated files will simply fix any problems that you have been experiencing.

Thanks for your attention, but please let me know if you experience any 
problems.

John





From jwc at snf.stanford.edu  Wed Jun 13 17:00:43 2012
From: jwc at snf.stanford.edu (James W. Conway)
Date: Wed, 13 Jun 2012 17:00:43 -0700
Subject: Java Update and problems running Remote Coral ....
In-Reply-To: <4FD92857.7090804@stanford.edu>
References: <4FD92857.7090804@stanford.edu>
Message-ID: <4FD929AB.8020202@snf.stanford.edu>

Works for me after allowing it to update files.

Thanks John!

James

On 6/13/2012 4:55 PM, John Shott wrote:
> SNF Lab Members:
>
> I have heard from James Conway and, indirectly, from Zhiping Zhang 
> that an overnight upgrade of Java has "broken" remote Coral on their 
> desktop.
>
> While I don't know whether there is actually something wrong with the 
> latest version of Java, I've been able to get Remote Coral running 
> again (after intentionally upgrading the version of Java 7 on my 
> desktop and breaking Remote Coral) by pushing out a fresh version of 
> Remote Coral including an updated version of the third-party library 
> that we use to securely encrypt/decrypt Remote Coral passwords.
>
> The next time that you start Remote Coral, you may see that it either 
> downloads a couple of files or asks you if you want to upgrade.  
> Hopefully, those new files will resolve any problems you may encounter.
>
> If that updated version doesn't resolve any problems you may be 
> experiencing, please let me know.  It's possible that some folks may 
> need to purge their Java Web Start cache to fully reload the 
> application, but I'm hopeful that this may not be required and the 
> updated files will simply fix any problems that you have been 
> experiencing.
>
> Thanks for your attention, but please let me know if you experience 
> any problems.
>
> John
>
>
>


From jwc at snf.stanford.edu  Wed Jun 13 17:02:00 2012
From: jwc at snf.stanford.edu (James W. Conway)
Date: Wed, 13 Jun 2012 17:02:00 -0700
Subject: Java Update and problems running Remote Coral ....
In-Reply-To: <2145861204.9379941.1339632042132.JavaMail.root@zm04.stanford.edu>
References: <2145861204.9379941.1339632042132.JavaMail.root@zm04.stanford.edu>
Message-ID: <4FD929F8.7020906@snf.stanford.edu>

I needed to do a restart of my PC after loading the Java update.

Best

JWC

On 6/13/2012 5:00 PM, Raisul Islam wrote:
> Hi,
> I am also having problems with updated Java. I have tried running fresh version of coral but that did not work.
> So do I need to get back to older version of Java?
> -Raisul
>
> ----- Original Message -----
> From: "John Shott"<shott at stanford.edu>
> To: "labmembers"<labmembers at snf.stanford.edu>
> Cc: "James Conway"<jwc at snf.stanford.edu>, "Zhiping Zhang"<zzp at stanford.edu>
> Sent: Wednesday, June 13, 2012 4:55:03 PM
> Subject: Java Update and problems running Remote Coral ....
>
> SNF Lab Members:
>
> I have heard from James Conway and, indirectly, from Zhiping Zhang that
> an overnight upgrade of Java has "broken" remote Coral on their desktop.
>
> While I don't know whether there is actually something wrong with the
> latest version of Java, I've been able to get Remote Coral running again
> (after intentionally upgrading the version of Java 7 on my desktop and
> breaking Remote Coral) by pushing out a fresh version of Remote Coral
> including an updated version of the third-party library that we use to
> securely encrypt/decrypt Remote Coral passwords.
>
> The next time that you start Remote Coral, you may see that it either
> downloads a couple of files or asks you if you want to upgrade.
> Hopefully, those new files will resolve any problems you may encounter.
>
> If that updated version doesn't resolve any problems you may be
> experiencing, please let me know.  It's possible that some folks may
> need to purge their Java Web Start cache to fully reload the
> application, but I'm hopeful that this may not be required and the
> updated files will simply fix any problems that you have been experiencing.
>
> Thanks for your attention, but please let me know if you experience any
> problems.
>
> John
>
>
>


From kgc at stanford.edu  Wed Jun 13 17:22:27 2012
From: kgc at stanford.edu (Katie Chang)
Date: Wed, 13 Jun 2012 17:22:27 -0700
Subject: Does anyone know how to remove or de-cross-link PMMA that has been UV crosslinked?
Message-ID: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>

Hello SNF users,

I was wondering if anyone had experience in removing crosslinked PMMA from
a wafer (or in de-crosslinking it). We have some devices on which we
accidentally forgot to use blue tape to cover up the contact pads when we
were spinning our passivating PMMA layer. Then, to compound the issue, we
gave them to a bio group that decided to sterilize them by pounding them
with UV light for 8 hours.

Now it seems nothing will get it off!  We tried to selectively scrub off
the PMMA from just the contact pads, which failed. Then, we tried to just
remove all of the PMMA from the whole wafer, which failed. We've tried
soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene,
and several other things, which all failed. Does anyone have any
suggestions?

Thanks for your help!

--Katie
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From robertchen at snf.stanford.edu  Wed Jun 13 17:17:58 2012
From: robertchen at snf.stanford.edu (Robert Chen)
Date: Wed, 13 Jun 2012 17:17:58 -0700
Subject: Java Update and problems running Remote Coral ....
In-Reply-To: <4FD929F8.7020906@snf.stanford.edu>
References: <2145861204.9379941.1339632042132.JavaMail.root@zm04.stanford.edu> <4FD929F8.7020906@snf.stanford.edu>
Message-ID: <CAHjbCJOh-prUTyCX6wD4y5dWLs9pz9XPs7Hu1eR-Vu1D_gc+pg@mail.gmail.com>

Same thing happened to the Badger system in SNC/SNL. People in charge said
we just needed to upgrade to Java 7. Should be the same case here...so
getting Java 7 will help you out in both coral-based systems (Badger for
SNC and Coral for SNF).

Robert

On Wed, Jun 13, 2012 at 5:02 PM, James W. Conway <jwc at snf.stanford.edu>wrote:

> I needed to do a restart of my PC after loading the Java update.
>
> Best
>
> JWC
>
>
> On 6/13/2012 5:00 PM, Raisul Islam wrote:
>
>> Hi,
>> I am also having problems with updated Java. I have tried running fresh
>> version of coral but that did not work.
>> So do I need to get back to older version of Java?
>> -Raisul
>>
>> ----- Original Message -----
>> From: "John Shott"<shott at stanford.edu>
>> To: "labmembers"<labmembers at snf.**stanford.edu<labmembers at snf.stanford.edu>
>> >
>> Cc: "James Conway"<jwc at snf.stanford.edu>, "Zhiping Zhang"<
>> zzp at stanford.edu>
>> Sent: Wednesday, June 13, 2012 4:55:03 PM
>> Subject: Java Update and problems running Remote Coral ....
>>
>> SNF Lab Members:
>>
>> I have heard from James Conway and, indirectly, from Zhiping Zhang that
>> an overnight upgrade of Java has "broken" remote Coral on their desktop.
>>
>> While I don't know whether there is actually something wrong with the
>> latest version of Java, I've been able to get Remote Coral running again
>> (after intentionally upgrading the version of Java 7 on my desktop and
>> breaking Remote Coral) by pushing out a fresh version of Remote Coral
>> including an updated version of the third-party library that we use to
>> securely encrypt/decrypt Remote Coral passwords.
>>
>> The next time that you start Remote Coral, you may see that it either
>> downloads a couple of files or asks you if you want to upgrade.
>> Hopefully, those new files will resolve any problems you may encounter.
>>
>> If that updated version doesn't resolve any problems you may be
>> experiencing, please let me know.  It's possible that some folks may
>> need to purge their Java Web Start cache to fully reload the
>> application, but I'm hopeful that this may not be required and the
>> updated files will simply fix any problems that you have been
>> experiencing.
>>
>> Thanks for your attention, but please let me know if you experience any
>> problems.
>>
>> John
>>
>>
>>
>>
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From pease at cis.stanford.edu  Wed Jun 13 18:34:22 2012
From: pease at cis.stanford.edu (Roger Fabian Pease)
Date: Wed, 13 Jun 2012 18:34:22 -0700
Subject: Does anyone know how to remove or de-cross-link PMMA that has been UV crosslinked?
In-Reply-To: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>
References: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>
Message-ID: <C38CCA3D-AD31-4925-BDFD-74F91D5CBE31@cis.stanford.edu>

Oxygen plasma or Ozone and a hot plate were used many years ago. May still be.
FP

Sent from my iPhone

On Jun 13, 2012, at 5:22 PM, Katie Chang <kgc at stanford.edu> wrote:

> Hello SNF users,
> 
> I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.
> 
> Now it seems nothing will get it off!  We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?
> 
> Thanks for your help!
> 
> --Katie


From yspark at nano-liquid.com  Wed Jun 13 19:01:25 2012
From: yspark at nano-liquid.com (Paul Park)
Date: Wed, 13 Jun 2012 19:01:25 -0700
Subject: Does anyone know how to remove or de-cross-link PMMA that has
 been UV crosslinked?
In-Reply-To: <C38CCA3D-AD31-4925-BDFD-74F91D5CBE31@cis.stanford.edu>
References: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>
	<C38CCA3D-AD31-4925-BDFD-74F91D5CBE31@cis.stanford.edu>
Message-ID: <CAO8HA5Got7jhv5UezSMrNK-b79=Gedi1r3qv90_AioFPJE7_hQ@mail.gmail.com>

There is PMMA remover available.

Check out http://www.dynaloy.com/

Good luck!

Paul

On Wed, Jun 13, 2012 at 6:34 PM, Roger Fabian Pease
<pease at cis.stanford.edu>wrote:

> Oxygen plasma or Ozone and a hot plate were used many years ago. May still
> be.
> FP
>
> Sent from my iPhone
>
> On Jun 13, 2012, at 5:22 PM, Katie Chang <kgc at stanford.edu> wrote:
>
> > Hello SNF users,
> >
> > I was wondering if anyone had experience in removing crosslinked PMMA
> from a wafer (or in de-crosslinking it). We have some devices on which we
> accidentally forgot to use blue tape to cover up the contact pads when we
> were spinning our passivating PMMA layer. Then, to compound the issue, we
> gave them to a bio group that decided to sterilize them by pounding them
> with UV light for 8 hours.
> >
> > Now it seems nothing will get it off!  We tried to selectively scrub off
> the PMMA from just the contact pads, which failed. Then, we tried to just
> remove all of the PMMA from the whole wafer, which failed. We've tried
> soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene,
> and several other things, which all failed. Does anyone have any
> suggestions?
> >
> > Thanks for your help!
> >
> > --Katie
>
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From kangning at stanford.edu  Wed Jun 13 22:44:36 2012
From: kangning at stanford.edu (=?utf-8?B?a2FuZ25pbmc=?=)
Date: Wed, 13 Jun 2012 21:44:36 -0800
Subject: =?utf-8?B?UmU6IFJlOiBEb2VzIGFueW9uZSBrbm93IGhvdyB0byByZW1vdmUgb3IgZGUtY3Jvc3MtbGluayBQTU1BIHRoYXQgaGFzYmVlbiBVViBjcm9zc2xpbmtlZD8=?=
References: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>,
 <C38CCA3D-AD31-4925-BDFD-74F91D5CBE31@cis.stanford.edu>,
 <CAO8HA5Got7jhv5UezSMrNK-b79=Gedi1r3qv90_AioFPJE7_hQ@mail.gmail.com>
Message-ID: <201206132144348548429@stanford.edu>

I didn't know they are also offering silicone solvents & removers. Cool.

Kangning


2012-06-13 



kangning 



???? Paul Park 
????? 2012-06-13  18:01:43 
???? Roger Fabian Pease 
??? Katie Chang; labmembers at snf.stanford.edu 
??? Re: Does anyone know how to remove or de-cross-link PMMA that hasbeen UV crosslinked? 
 
There is PMMA remover available.

Check out http://www.dynaloy.com/

Good luck!

Paul


On Wed, Jun 13, 2012 at 6:34 PM, Roger Fabian Pease <pease at cis.stanford.edu> wrote:

Oxygen plasma or Ozone and a hot plate were used many years ago. May still be.
FP

Sent from my iPhone


On Jun 13, 2012, at 5:22 PM, Katie Chang <kgc at stanford.edu> wrote:

> Hello SNF users,
>
> I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.
>
> Now it seems nothing will get it off!  We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?
>
> Thanks for your help!
>
> --Katie
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From jwc at snf.stanford.edu  Thu Jun 14 08:56:28 2012
From: jwc at snf.stanford.edu (James W. Conway)
Date: Thu, 14 Jun 2012 08:56:28 -0700
Subject: Does anyone know how to remove or de-cross-link PMMA that has
 been UV crosslinked?
In-Reply-To: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>
References: <CAAnEng=wARjdkGx9CHJELSi0DozHTi2Nje1229_OQ5Sw3e5Cqg@mail.gmail.com>
Message-ID: <4FDA09AC.4070104@snf.stanford.edu>

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From mtang at stanford.edu  Thu Jun 14 09:52:12 2012
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 14 Jun 2012 09:52:12 -0700
Subject: Reminder:  Process Clinic at 10 am today
Message-ID: <4FDA16BC.2030000@stanford.edu>

Hi all --

Process Clinic today at 10 am, in the cube area next to Maureen's 
office.  Staff members will be on hand to offer processing advice. 
(Senior labmembers are welcome to add their experienced perspectives!)  
All labmembers are welcome to bring processing questions, materials and 
process requests, mask layouts for all to brainstorm.

Your SNF Staff


From zhangll.ime at gmail.com  Thu Jun 14 17:27:57 2012
From: zhangll.ime at gmail.com (Zhangll.ime)
Date: Thu, 14 Jun 2012 17:27:57 -0700
Subject: Bake condition before ion implantation
Message-ID: <BFAD861B-FD0F-404F-9907-7F8208044716@gmail.com>

Hi all,

Does anyone know the bake conditions for AZ3612 before 20keV 4e15 ion-implantation?

I was using 115C 30min (on hot plate) last night but found wrinkles on my photoresist.

Any suggestion is appreciated. Thanks!

Sincerely yours,
Liangliang

-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University

From gsosa at stanford.edu  Fri Jun 15 12:56:44 2012
From: gsosa at stanford.edu (Gary J Sosa)
Date: Fri, 15 Jun 2012 12:56:44 -0700 (PDT)
Subject: Schedules Litho facilities work on 6/18
In-Reply-To: <fea4f74a-4849-4267-ad1b-104fa98aaae8@Gary-PC>
Message-ID: <df9f9c9f-38ae-4b51-b258-8535e12259f5@Gary-PC>

Greetings Lab-members .. 

On Monday, June 18th, the facilities group will be servicing the transfer fan T-6 which provides conditioned air to Aisle L-100. This is the Headway, Laurell and Blue-M oven aisle in the Litho area. The repair work is scheduled to start at 6:30am and be completed by 10:30am. During this time period, there will be no temperature or humidity control in the L-100 aisle. We strongly recommend that you refrain from processing your work in this aisle during this time to avoid any unstable or unpredictable results. If you choose to do process work at this time, please take a test wafer if possible. Litho staff members will be available on Monday to address any questions or concerns that you may have. Thank you in advance for your patience and understanding. 

The Litho Team 


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From edmyers at stanford.edu  Fri Jun 15 17:13:43 2012
From: edmyers at stanford.edu (Ed Myers)
Date: Fri, 15 Jun 2012 17:13:43 -0700
Subject: Etcher Installation Update -June 2012
Message-ID: <4FDBCFB7.1030202@stanford.edu>

Lab Members,

I want to let everyone know a major hurdle to the start-up of the four 
new dry etch systems has been passed.  This week we received the 
installation permit from Santa Clara County.  This allows us to move 
forward.  If you have been watching the installation process you will 
see most of the mechanical work has been completed (process gas, cooling 
water, exhaust, pump lines and electrical).  Only a few items such as 
certification of the gas lines, seismic bracing and smaller items such 
as labeling and protective decking need to be completed.  We are close 
enough that we have contacted the equipment vendors to schedule their 
first visit.  The first visit is the service group to verify the tool 
hook-ups and the mechanical functionality of the systems.  We will not 
run any process work at this time.

The second hurdle yet ahead of us is the Toxic Gas Ordinance (TGO) 
permit.  This permit is in review with Santa Clara County.  We must have 
this permit issued before we can charge any of the new lines with 
process gases.  If the timing works out correctly, we should receive the 
TGO permit right about the time the service groups have completed there 
tool functionality verification.  Optimistically this means process 
development could commence in 6 to 8 weeks.   Yes, we are working to 
pull this in.

You have most likely noticed the new ALD and MVD systems are also 
waiting.  The first PO's for their installation was submitted last 
week.  This PO is for the design and permit package preparation.  The PO 
covers the drawings and calculations for all the piping, exhaust, 
electrical, seismic and code analysis for both tools.  The next 
objective for the ALD/MVD project is to issue PO's and get started on 
the electrical and mechanical work.  Just as with the etchers, we hope 
to be nearly completed with the installation when the permits arrive.

Regards,
SNF Staff


From ylyang at stanford.edu  Sat Jun 16 23:54:10 2012
From: ylyang at stanford.edu (Yongliang Yang)
Date: Sat, 16 Jun 2012 23:54:10 -0700 (PDT)
Subject: wifi in SNF
In-Reply-To: <91817054.13838446.1339915600170.JavaMail.root@zm04.stanford.edu>
Message-ID: <834924127.13839567.1339916050582.JavaMail.root@zm04.stanford.edu>

Hi, all,

The wifi in SNF is bad recently. One can only connect to internet in lith area. In other places, the computer shows that the wifi is connected, but can not access to internet.

I think it should be fixed.

Best,
Yongliang


From grahamab at snf.stanford.edu  Sun Jun 17 08:07:52 2012
From: grahamab at snf.stanford.edu (Andrew Graham)
Date: Sun, 17 Jun 2012 08:07:52 -0700
Subject: wifi in SNF
In-Reply-To: <834924127.13839567.1339916050582.JavaMail.root@zm04.stanford.edu>
References: <91817054.13838446.1339915600170.JavaMail.root@zm04.stanford.edu>
	<834924127.13839567.1339916050582.JavaMail.root@zm04.stanford.edu>
Message-ID: <CAFF=XsK1hyrpU9wNAbN3OjMbvgEXAGxJf9DOe3h52qMz=42v9A@mail.gmail.com>

I've also seen this several times recently and agree it would be awesome if
Stanford could address it.

Andrew

On Sat, Jun 16, 2012 at 11:54 PM, Yongliang Yang <ylyang at stanford.edu>wrote:

> Hi, all,
>
> The wifi in SNF is bad recently. One can only connect to internet in lith
> area. In other places, the computer shows that the wifi is connected, but
> can not access to internet.
>
> I think it should be fixed.
>
> Best,
> Yongliang
>
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From jwb2005 at stanford.edu  Mon Jun 18 13:52:37 2012
From: jwb2005 at stanford.edu (John Bumgarner)
Date: Mon, 18 Jun 2012 13:52:37 -0700
Subject: Fwd: Wireless access point update
In-Reply-To: <F4B0F8A1-BADA-403A-B0A0-8A0677A9A5CA@ee.stanford.edu>
References: <F4B0F8A1-BADA-403A-B0A0-8A0677A9A5CA@ee.stanford.edu>
Message-ID: <4FDF9515.5000901@stanford.edu>

Just FYI,  Joe Little installed a new box this morning and the rest of 
the info is below.  Hope this helps with access in the fab. -- John

-------- Original Message --------
Subject: 	Wireless access point update
Date: 	Mon, 18 Jun 2012 11:20:34 -0700
From: 	Joe Little <jlittle at ee.stanford.edu>
To: 	jwb2005 at stanford.edu



John,

We've installed an additional access point to provide coverage to all four sides of the nano fab. This provides support for 802.11g and above wireless networks. Stanford is also in the process of updating their access points this summer for better stability and range, and should still support legacy wireless. Hopefully this will be completed some time in the next month or so.



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From arkam at stanford.edu  Mon Jun 18 17:53:56 2012
From: arkam at stanford.edu (Arka Majumdar)
Date: Mon, 18 Jun 2012 17:53:56 -0700 (PDT)
Subject: Silicon on Insulator wafer
In-Reply-To: <1960827307.8779299.1340067136826.JavaMail.root@zm06.stanford.edu>
Message-ID: <1465874800.8780418.1340067236708.JavaMail.root@zm06.stanford.edu>

Hi

I am looking for a SOI wafer (220nm thick Silicon on 1micron oxide preferably). I talked to SOItech, but they do not sell anything less than 10 wafers. That is too much for my processing, as I will not need more than one. 

Please let me know if I can get one wafer from anyone, or, if you know someone who might have one.

Thanks
Arka

-- 
PhD Student
Ginzton Lab (EE)
Stanford University
www.stanford.edu/~arkam


From mtang at stanford.edu  Tue Jun 19 05:34:23 2012
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 19 Jun 2012 05:34:23 -0700
Subject: New Summer Course!
Message-ID: <4FE071CF.8010204@stanford.edu>

Hi all --

Fellow labmember, Rainer Fasching,  is teaching a new course on 
electrochemistry!

****************************************************************************** 

Applied Electrochemistry -- Advanced Batteries ME420 - Syllabus, Summer 
2012.

This class is build around applied electrochemistry with focus on energy 
conversion and storage. Basic concepts of electrochemistry are 
presented, of which the fundamentals of electrochemical energy 
conversion/storage are built. Electrochemical methods of energy 
conversion and storage are discussed with emphasis on thescaling behaviors.

Advanced battery concepts/systems and their applications (electrical 
vehicle and grid) will be a main subject of this year. High energy 
density battery technologies (beyond intercalation materials) and the 
influence on nano-structured materials/architecture will be discussed. 
Here the class will focus on challenges, solutions, and future 
perspectives of high capacity materials in closed systems (e.g. Li-ion, 
F-ion, flow batteries) as well as open systems (e.g. Li-air).

In addtion solid-state electrolytes with their potential for all 
solid-state batteries will be introduced this year.

Journals articles and book chapters will be used for in class discussion 
to emphasize on current research and challenges.

Goal of the course:
To introduce you to the fundamentals, modern methods, and current
trends of applied electrochemistry:
Understand the basic concepts of electrochemistry for energy storage
Gain familiarity with advanced battery technologies and current trends
Build confidence and knowledge to deal independently with 
electrochemical problems

Classroom: Will be announced
Time: Tuesday and Thursday
10:00-12:00 AM
Instructor: Rainer Fasching
Building 530, Room 220
Tel: 650-723-0084
Fax: 650-723-5034
Email: _rfasch at stanford.edu <mailto:rfasch at stanford.edu>_ 
<_mailto:rfasch at stanford.edu_>

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From maxms at stanford.edu  Tue Jun 19 22:47:33 2012
From: maxms at stanford.edu (Max Marcel Shulaker)
Date: Tue, 19 Jun 2012 22:47:33 -0700 (PDT)
Subject: noxious smell in lab
In-Reply-To: <636724201.11270030.1340171087671.JavaMail.root@zm03.stanford.edu>
Message-ID: <1157243554.11270289.1340171253687.JavaMail.root@zm03.stanford.edu>

Hey everyone,
For those late-night fabbers, there is a very bad smell in the lab that is quite strong by and around lampoly and that hall way.  The smell is very strong by lampoly, and can even be smelled out into litho.  It has been described as burned electronics, or very similar to the inside of MRC after running freon.  
It has started to dissipate a bit, but still smells awful.  
Happy processing,
Max


From jprovine at stanford.edu  Wed Jun 20 09:37:01 2012
From: jprovine at stanford.edu (J Provine)
Date: Wed, 20 Jun 2012 09:37:01 -0700
Subject: Wireless access point update
In-Reply-To: <4FDF9515.5000901@stanford.edu>
References: <F4B0F8A1-BADA-403A-B0A0-8A0677A9A5CA@ee.stanford.edu>
	<4FDF9515.5000901@stanford.edu>
Message-ID: <CAOKRUanfyFDH+Zs-8ab2k+LZZGGZBBRv+5hPc_wJpikUAa=3WQ@mail.gmail.com>

feedback from the trenches, the wireless is still terrible.  i can get
neither Stanford nor EE-WiFi wireless over the last ~hour.  and should i
manage to get connected, i'm right back out on my ear within minutes.  i
hope the ongoing efforts improve this, but for now it is not improved.  i'm
working (or trying to) near the chemical pass through/gowning room.
j

On Mon, Jun 18, 2012 at 1:52 PM, John Bumgarner <jwb2005 at stanford.edu>wrote:

>  Just FYI,  Joe Little installed a new box this morning and the rest of
> the info is below.  Hope this helps with access in the fab. -- John
>
> -------- Original Message --------  Subject: Wireless access point update  Date:
> Mon, 18 Jun 2012 11:20:34 -0700  From: Joe Little
> <jlittle at ee.stanford.edu> <jlittle at ee.stanford.edu>  To:
> jwb2005 at stanford.edu
>
> John,
>
> We've installed an additional access point to provide coverage to all four sides of the nano fab. This provides support for 802.11g and above wireless networks. Stanford is also in the process of updating their access points this summer for better stability and range, and should still support legacy wireless. Hopefully this will be completed some time in the next month or so.
>
>
>
>
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From npapte at stanford.edu  Wed Jun 20 10:18:13 2012
From: npapte at stanford.edu (Nikhil Apte)
Date: Wed, 20 Jun 2012 10:18:13 -0700
Subject: shortage of medium size booties
Message-ID: <CAHqdPi1b8s4YTb6Ypct1hOpW3ZAm_TGtpGbGmwGibYtAOfr7VA@mail.gmail.com>

Hi,

Since the last month or so, there has been quite a shortage of medium size
(blue & yellow) booties. It is almost impossible to find a pair during
prime time. Often users have to wear larger booties. This is a safety issue
as it is easy to trip with these larger booties. We had ample medium
booties before. Whatever happened to those?

Thanks,
Nikhil
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From chienyuc at stanford.edu  Wed Jun 20 10:22:35 2012
From: chienyuc at stanford.edu (Chien-Yu Chen)
Date: Wed, 20 Jun 2012 10:22:35 -0700 (PDT)
Subject: shortage of medium size booties
In-Reply-To: <CAHqdPi1b8s4YTb6Ypct1hOpW3ZAm_TGtpGbGmwGibYtAOfr7VA@mail.gmail.com>
Message-ID: <1292588171.11809236.1340212955134.JavaMail.root@zm03.stanford.edu>

Agree.  Not only medium but large booties (brown and white) are also in shortage, especially in the morning.

Thanks,
Chien-Yu

----- Original Message -----
From: "Nikhil Apte" <npapte at stanford.edu>
To: labmembers at snf.stanford.edu
Sent: Wednesday, June 20, 2012 10:18:13 AM
Subject: shortage of medium size booties

Hi, 


Since the last month or so, there has been quite a shortage of medium size (blue & yellow) booties. It is almost impossible to find a pair during prime time. Often users have to wear larger booties. This is a safety issue as it is easy to trip with these larger booties. We had ample medium booties before. Whatever happened to those? 


Thanks, 
Nikhil 


From jlittle at ee.stanford.edu  Wed Jun 20 10:46:18 2012
From: jlittle at ee.stanford.edu (Joe Little)
Date: Wed, 20 Jun 2012 10:46:18 -0700
Subject: Wireless access point update
In-Reply-To: <CAOKRUanfyFDH+Zs-8ab2k+LZZGGZBBRv+5hPc_wJpikUAa=3WQ@mail.gmail.com>
References: <F4B0F8A1-BADA-403A-B0A0-8A0677A9A5CA@ee.stanford.edu> <4FDF9515.5000901@stanford.edu> <CAOKRUanfyFDH+Zs-8ab2k+LZZGGZBBRv+5hPc_wJpikUAa=3WQ@mail.gmail.com>
Message-ID: <58A02F09-2D0D-4461-8E6E-D0629408B983@ee.stanford.edu>

AP is in place and active. You can use either Stanford or EE-WiFi networks, and remember, no third party APs should be in the fab.

On Jun 20, 2012, at 9:37 AM, J Provine <jprovine at stanford.edu> wrote:

> feedback from the trenches, the wireless is still terrible.  i can get neither Stanford nor EE-WiFi wireless over the last ~hour.  and should i manage to get connected, i'm right back out on my ear within minutes.  i hope the ongoing efforts improve this, but for now it is not improved.  i'm working (or trying to) near the chemical pass through/gowning room.
> j
> 
> On Mon, Jun 18, 2012 at 1:52 PM, John Bumgarner <jwb2005 at stanford.edu> wrote:
> Just FYI,  Joe Little installed a new box this morning and the rest of the info is below.  Hope this helps with access in the fab. -- John
> 
> -------- Original Message --------
> Subject:	Wireless access point update
> Date:	Mon, 18 Jun 2012 11:20:34 -0700
> From:	Joe Little <jlittle at ee.stanford.edu>
> To:	jwb2005 at stanford.edu
> 
> John,
> 
> We've installed an additional access point to provide coverage to all four sides of the nano fab. This provides support for 802.11g and above wireless networks. Stanford is also in the process of updating their access points this summer for better stability and range, and should still support legacy wireless. Hopefully this will be completed some time in the next month or so.
> 
> 
> 

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From mtang at stanford.edu  Wed Jun 20 11:26:57 2012
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 20 Jun 2012 11:26:57 -0700
Subject: Higher temperatures in the lab observed
Message-ID: <4FE215F1.5060106@stanford.edu>

Dear Labmembers --

You may have noticed that the temperature is running high in one or more 
areas of the lab over the past week or so (especially noted over the 
past week by lampoly/intlvac's).  Facilities knows about this.  It looks 
like a more extensive problem than originally thought, so they are 
continuing to work on it.  We will update you as soon as we hear more.

Your SNF Staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From doxdo at stanford.edu  Wed Jun 20 13:39:32 2012
From: doxdo at stanford.edu (Sochnikov Ilya)
Date: Wed, 20 Jun 2012 13:39:32 -0700
Subject: laser cutting
Message-ID: <CAJX=u0XF47tV0FCO8hvov=kukiE-dZd--F5qxcoM5i33nurmxg@mail.gmail.com>

Hello all,

Does anyone know, where can I slice a piece of wafer with a laser cutter?

thanks,
ilya


From edmyers at stanford.edu  Wed Jun 20 17:23:57 2012
From: edmyers at stanford.edu (Ed Myers)
Date: Wed, 20 Jun 2012 17:23:57 -0700
Subject: Fwd: J.A. Woollam WVASE Short Course
In-Reply-To: <4FE1EEFE.4090002@jawoollam.com>
References: <4FE1EEFE.4090002@jawoollam.com>
Message-ID: <4FE2699D.3070401@stanford.edu>

All,

Here is a great chance to learn more about the Woollam ellipsometer.  
The SNF system does run the VWVASE software.

Please contact Veronica directly if you are interested.

Regards,
Ed

-------- Original Message --------
Subject: 	J.A. Woollam WVASE Short Course
Date: 	Wed, 20 Jun 2012 10:40:46 -0500
From: 	Veronica Cockerill <vcockerill at jawoollam.com>
To: 	WoollamMailList at jawoollam.com



Dear J.A. Woollam Customers,

We would like to invite those of you who use our WVASE software to the 
next WVASE Data Analysis Fundamentals Short Course. It will be held 
*August 7-10, 2012* at the Harvard University in Cambridge, 
Massachusetts. I have attached a course description and registration 
form. If you would like to attend, please fill out the registration form 
completely and fax or email to me by*July 26, 2012.* Once I receive your 
registration form, I will send a confirmation email.

This course will focus on data analysis methods for spectroscopic 
ellipsometry, using WVASE software, with a significant amount of 
"hands-on" computer time. For this reason, participants should be 
familiar with WVASE software.

*NOTE:* Many of you use our other data analysis software, CompleteEASE. 
A course dedicated to WVASE will _NOT_ be of benefit to you if you use 
CompleteEASE. They are two completely different programs. The next 
CompleteEASE short course has not been scheduled yet. Once it is, I will 
notify you of that course. Thank you for your patience.

If you have any questions, please let me know.

Best regards,
Veronica
-- 

*******************************
Veronica Cockerill
Marketing Coordinator
J. A. Woollam Co., Inc.
645 M Street, Suite 102
Lincoln, NE 68508
_vcockerill at jawoollam.com
_Phone: (402)477-7501 x101
Fax: (402)477-8214
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From mtang at stanford.edu  Fri Jun 22 15:24:57 2012
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 22 Jun 2012 15:24:57 -0700
Subject: Partial Lab Shutdown, Saturday, 6/23/12
Message-ID: <4FE4F0B9.40608@stanford.edu>

Dear labmembers --

The scrubber exhaust system requires unexpected maintenance.  This will 
take place from 7:30-2 pm tomorrow, Saturday, June 23.  Most tools in 
the lab require scrubber exhaust and so will not be available during 
this time.  Wet benches will be shutdown earlier, to allow for bath 
draining in advance of the scrubber shutdown.  The few tools remaining 
that do not require scrubber exhaust will remain in operation (see list 
below).  Please also be aware that scrubber maintenance often results in 
strong, unpleasant, sulfurous odors in the vicinity of this building - 
you may want to avoid coming in.  We deeply apologize for the 
inconvenience this causes in your scheduling.

Your SNF Staff

Tools OK to run:  Raith, sem4160, svgcoat, svgdev, exposure/align tools, 
metal deposition tools.

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From vrinda at stanford.edu  Fri Jun 22 23:37:33 2012
From: vrinda at stanford.edu (Vrinda Thareja)
Date: Fri, 22 Jun 2012 23:37:33 -0700
Subject: Patterning mask 0 in silica using ASML
Message-ID: <CALERgFDAgoqZaZEOy0KcGiAAqnznWakaizAWQcsrSKaePM5Vzg@mail.gmail.com>

Hey labmembers,

Has anyone patterned mask 0 in silica (silicon dioxide) using ASML? I want
to make alignment marks (mask 0) in 300nm silica on silicon substrate. I
plan to evaporate ~100nm silver onto silica and then deposit ~20nm alumina.
I am not sure about the depth of the alignment marks for obtaining best
contrast. I would be extremely grateful for any suggestions/recipe.

thanks,
-- 
~Vrinda

Vrinda Thareja
Ph.D. Candidate
Brongersma Group
Department of Materials Science and Engineering
Stanford University
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From mtang at stanford.edu  Sat Jun 23 08:05:22 2012
From: mtang at stanford.edu (Mary Tang)
Date: Sat, 23 Jun 2012 08:05:22 -0700 (PDT)
Subject: Lab is mostly shutdown, until ~2 pm
In-Reply-To: <14501632.20658019.1340463765266.JavaMail.root@zm04.stanford.edu>
Message-ID: <1915402431.20658940.1340463922858.JavaMail.root@zm04.stanford.edu>

Hi all --

The scrubber exhaust maintenance has begun (and a delightful aroma it is.)  Most tools in the lab are shutdown.  Check Coral (if tools are reserved during this time, even tools you don't normally enable, do not use.) Work should be done by 2 pm; we'll keep you posted.

Thanks for your attention --

Your SNF Staff


From mtang at stanford.edu  Sat Jun 23 15:31:56 2012
From: mtang at stanford.edu (Mary Tang)
Date: Sat, 23 Jun 2012 15:31:56 -0700
Subject: Lab is back on (mostly)
Message-ID: <4FE643DC.2080307@stanford.edu>

Hi all --

The lab is mostly back on.  Please check Coral for down tools (primarily 
furnaces and epi2).  Make sure to read the comments for wet benches, as 
new chemicals will need to be poured.  There is still a faint odor of 
sulfur around the building, but this should dissipate with a little time.

The scrubber exhaust maintenance procedure took a bit longer than 
expected, due to some excitement with our toxic gas detection system.  
No, despite the odors, there was no toxic gas release event.  But we 
find we are unable to reset some of the toxic gas sensors, so some 
furnaces and epi remain down.  Again, please check Coral.

Many thanks for Jose in Facilities for being on the ball and John Shott 
for just being there and knowing the answers to everything.

Please record your observations on Coral or send a note to staff.

Thanks for your patience --

Your SNF Staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From mtang at stanford.edu  Sat Jun 23 15:42:54 2012
From: mtang at stanford.edu (Mary Tang)
Date: Sat, 23 Jun 2012 15:42:54 -0700
Subject: Lab is back on (mostly)
In-Reply-To: <4FE643DC.2080307@stanford.edu>
References: <4FE643DC.2080307@stanford.edu>
Message-ID: <4FE6466E.2070303@stanford.edu>

Hi again --

Sorry, I forgot two things:

- Furnaces and Epi2 will be addressed Monday -- the toxic gas service 
group will be coming in late Monday morning to troubleshoot.

- Tony in Facilities is also a champ for all the work done today.

M

On 6/23/2012 3:31 PM, Mary Tang wrote:
> Hi all --
>
> The lab is mostly back on.  Please check Coral for down tools 
> (primarily furnaces and epi2).  Make sure to read the comments for wet 
> benches, as new chemicals will need to be poured.  There is still a 
> faint odor of sulfur around the building, but this should dissipate 
> with a little time.
>
> The scrubber exhaust maintenance procedure took a bit longer than 
> expected, due to some excitement with our toxic gas detection system.  
> No, despite the odors, there was no toxic gas release event.  But we 
> find we are unable to reset some of the toxic gas sensors, so some 
> furnaces and epi remain down.  Again, please check Coral.
>
> Many thanks for Jose in Facilities for being on the ball and John 
> Shott for just being there and knowing the answers to everything.
>
> Please record your observations on Coral or send a note to staff.
>
> Thanks for your patience --
>
> Your SNF Staff
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From calvin at agmicrosystems.com  Sun Jun 24 03:02:30 2012
From: calvin at agmicrosystems.com (calvinli)
Date: Sun, 24 Jun 2012 03:02:30 -0700
Subject: More PRS-1000 needed this weekend
Message-ID: <B9EE857A-74A2-4146-B7FD-B94F2F9ECE8F@agmicrosystems.com>

Hi Sir:


I wonder if there is anyone who happened to be here this Sunday and have the authorization to get more PRS-1000 to the chemical store area.


Thanks a lot


Calvinli

From sixram at stanford.edu  Mon Jun 25 21:10:30 2012
From: sixram at stanford.edu (Han-Bo-Ram Lee)
Date: Mon, 25 Jun 2012 21:10:30 -0700
Subject: Raman spectroscopy
Message-ID: <CAH55aiZNsFT21wa6oe6DEOzz75jj1gW8S=wB0A3_Fa8BxcApsw@mail.gmail.com>

Hi All

Has anyone used Raman spectroscopy in Stanford? I'm now looking for Raman
to analyze my graphene samples.

Thanks,

Boram


Han-Bo-Ram Lee, Ph.D
Bent Research Group
Department of Chemical Engineering
Stanford University

Mail : Rm 113, Stauffer III Bldg., 381 North South Mall, Stanford, CA 94305
Email : sixram[at]stanford.edu or sixram[at]gmail.com
WWW : bentgroup.stanford.edu/
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From audet at stanford.edu  Tue Jun 26 10:11:27 2012
From: audet at stanford.edu (Ross Audet)
Date: Tue, 26 Jun 2012 10:11:27 -0700
Subject: Stanford Optical Society Summer BBQ, Thurs, June 28 @ 4:30 PM, Allen Bldg patio
Message-ID: <005701cd53be$b96e07e0$2c4a17a0$@stanford.edu>



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From bhuff at stanford.edu  Tue Jun 26 12:30:36 2012
From: bhuff at stanford.edu (Brett E. Huff)
Date: Tue, 26 Jun 2012 12:30:36 -0700
Subject: New Gowning Service Contract.  Need your help ASAP to initiate.  
Message-ID: <83FCC2F9-A9A1-4BD7-A4F2-36DF89E5368B@stanford.edu>

SNF Lab Users,
	Please find your ID in the attached Excel spreadsheet and complete the information on your desired clean room garment size requirements
Understand that if you request a particular size and change your mind later it will be difficult to meet the needs of everyone.  No guessing please.

Lab Staff please reply and specify the following:
Gown Size:
Boot Size:
Hood Size:

This should help resolve the existing low stock issue we are currently having on boots...


Brett E. Huff
SNG Clean Room Manager
Stanford University
?510-612-8670
bhuff at stanford.edu

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From bhuff at stanford.edu  Tue Jun 26 12:37:25 2012
From: bhuff at stanford.edu (Brett E. Huff)
Date: Tue, 26 Jun 2012 12:37:25 -0700
Subject: New Gowning Service Contract.  Need your help ASAP to initiate.  With attachment
In-Reply-To: <83FCC2F9-A9A1-4BD7-A4F2-36DF89E5368B@stanford.edu>
References: <83FCC2F9-A9A1-4BD7-A4F2-36DF89E5368B@stanford.edu>
Message-ID: <F2DFBF56-26A0-43A9-B6B0-FAAA1AACAD55@stanford.edu>


On Jun 26, 2012, at 12:30 PM, Brett E. Huff wrote:

> SNF Lab Users,
> 	Please find your ID in the attached Excel spreadsheet and complete the information on your desired clean room garment size requirements
> Understand that if you request a particular size and change your mind later it will be difficult to meet the needs of everyone.  No guessing please.
> 
> Lab Staff please reply and specify the following:
> Gown Size:
> Boot Size:
> Hood Size:
> 
> This should help resolve the existing low stock issue we are currently having on boots...
> 
> 
> Brett E. Huff
> SNF Clean Room Manager
> Stanford University
> ?510-612-8670
> bhuff at stanford.edu
> 

Brett E. Huff
SNF Clean Room Manager
Stanford University
?510-612-8670
bhuff at stanford.edu

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From bhuff at stanford.edu  Tue Jun 26 12:57:03 2012
From: bhuff at stanford.edu (Brett E. Huff)
Date: Tue, 26 Jun 2012 12:57:03 -0700
Subject: Yes, some names may not be on this list.  This data was taken from cleanroom door entry data.
Message-ID: <FFA1563D-60AC-4F32-B913-CFE1BEE03C30@stanford.edu>

All,
	The access data was taken for a 4 week period to sample a fixed period in time.  If you are missing you either skipped badging into the gown room (I hope not) or you were otherwise busy elsewhere during our random 4 week pull.  Please provide your user id name and sizing and you will be counted amongst the user roll.


Brett E. Huff
SNF Clean Room Manager
Stanford University
?510-612-8670
bhuff at stanford.edu

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From bhuff at stanford.edu  Tue Jun 26 13:20:39 2012
From: bhuff at stanford.edu (Brett E. Huff)
Date: Tue, 26 Jun 2012 13:20:39 -0700
Subject: Yes, Google Docs may have been the way to go.  But...
Message-ID: <64649AF1-690F-4F88-8D07-75ECEB891D36@stanford.edu>

I was taught by my mother to never ask a woman her age or weight.  I considered dress size and clean room gown to be similar?
And sometime the boys like to seem beefed up rather than comfortable.  

This way it is only my business what you are choosing.  

Keep the emails coming.



Brett E. Huff
SNF Clean Room Manager
Stanford University
?510-612-8670
bhuff at stanford.edu

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From svo at stanford.edu  Tue Jun 26 14:07:04 2012
From: svo at stanford.edu (Sonny Vo)
Date: Tue, 26 Jun 2012 14:07:04 -0700
Subject: Yes, Google Docs may have been the way to go. But...
In-Reply-To: <64649AF1-690F-4F88-8D07-75ECEB891D36@stanford.edu>
References: <64649AF1-690F-4F88-8D07-75ECEB891D36@stanford.edu>
Message-ID: <CANEv+3AHh1iRtpMDp8jjHZAKtJh9vEwOkZE=_4chHmxiz7rmOQ@mail.gmail.com>

In my eastern culture, fat=p.h.a.t.=pretty.hot.and.tempting.
I am 5''6+-.5 and weigh 127lbs+-5lb, please reserve an XXL everything
for me Brett.
Thanks!

Sonny

On 6/26/12, Brett E. Huff <bhuff at stanford.edu> wrote:
> I was taught by my mother to never ask a woman her age or weight.  I
> considered dress size and clean room gown to be similar?
> And sometime the boys like to seem beefed up rather than comfortable.
>
> This way it is only my business what you are choosing.
>
> Keep the emails coming.
>
>
>
> Brett E. Huff
> SNF Clean Room Manager
> Stanford University
> ?510-612-8670
> bhuff at stanford.edu
>
>


From mbaran at stanford.edu  Tue Jun 26 15:00:16 2012
From: mbaran at stanford.edu (Maureen Baran)
Date: Tue, 26 Jun 2012 15:00:16 -0700 (PDT)
Subject: Found Apple Charger in the Lab
Message-ID: <000001cd53e7$103ce730$30b6b590$@stanford.edu>

Dear Labmembers,

 

One of the Lab Staff found an Apple Charger in the lab.  If this is yours
please come by my cubicle and let me know.  I am leaving for the day
however, I will be back tomorrow.  In the meantime, I will lock the Apple
charger up for the evening.

 

Maureen

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From apal at stanford.edu  Tue Jun 26 15:25:48 2012
From: apal at stanford.edu (Ashish Pal)
Date: Tue, 26 Jun 2012 15:25:48 -0700 (PDT)
Subject: New Gowning Service Contract.  Need your help ASAP to initiate.
  With attachment
In-Reply-To: <F2DFBF56-26A0-43A9-B6B0-FAAA1AACAD55@stanford.edu>
Message-ID: <1489069351.22595946.1340749548042.JavaMail.root@zm09.stanford.edu>

Hi,
Please find the attached excel sheet with my entry.
Best Regards
Ashish

----- Original Message -----
From: "Brett E. Huff" <bhuff at stanford.edu>
To: labmembers at snf.stanford.edu, labstaff at snf.stanford.edu
Cc: "John Bumgarner" <jwb2005 at stanford.edu>
Sent: Tuesday, June 26, 2012 12:37:25 PM
Subject: Re: New Gowning Service Contract.  Need your help ASAP to initiate.  With attachment







On Jun 26, 2012, at 12:30 PM, Brett E. Huff wrote: 




SNF Lab Users, 
Please find your ID in the attached Excel spreadsheet and complete the information on your desired clean room garment size requirements 
Understand that if you request a particular size and change your mind later it will be difficult to meet the needs of everyone. No guessing please. 


Lab Staff please reply and specify the following: 
Gown Size: 
Boot Size: 
Hood Size: 


This should help resolve the existing low stock issue we are currently having on boots... 



Brett E. Huff 
SNF Clean Room Manager 
Stanford University 
?510-612-8670 
bhuff at stanford.edu 


Brett E. Huff 
SNF Clean Room Manager 
Stanford University 
?510-612-8670 
bhuff at stanford.edu 
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From robertchen at snf.stanford.edu  Tue Jun 26 15:43:02 2012
From: robertchen at snf.stanford.edu (Robert Chen)
Date: Tue, 26 Jun 2012 15:43:02 -0700
Subject: New Gowning Service Contract. Need your help ASAP to initiate.
 With attachment
In-Reply-To: <1489069351.22595946.1340749548042.JavaMail.root@zm09.stanford.edu>
References: <F2DFBF56-26A0-43A9-B6B0-FAAA1AACAD55@stanford.edu> <1489069351.22595946.1340749548042.JavaMail.root@zm09.stanford.edu>
Message-ID: <CAHjbCJMntQTnDu3OaUGLRg+M0GAqP=wqR2Lj+mq_GLtrQanPkA@mail.gmail.com>

All,

Please use REPLY, not REPLY ALL when emailing out. In other words, don't
include labmembers or labstaff in your replies, otherwise EVERYONE keeps
getting the same excel file with a new entry!!

Brett, alternatively you can try using the Google Survey to maintain
privacy while avoiding getting tons of excel sheets. It will plug in the
entries into a single excel sheet that has limited access based on who you
want to see it. Please email me back if you're interested and I can help
you set one up.

Thanks,

Robert

On Tue, Jun 26, 2012 at 3:25 PM, Ashish Pal <apal at stanford.edu> wrote:

> Hi,
> Please find the attached excel sheet with my entry.
> Best Regards
> Ashish
>
> ----- Original Message -----
> From: "Brett E. Huff" <bhuff at stanford.edu>
> To: labmembers at snf.stanford.edu, labstaff at snf.stanford.edu
> Cc: "John Bumgarner" <jwb2005 at stanford.edu>
> Sent: Tuesday, June 26, 2012 12:37:25 PM
> Subject: Re: New Gowning Service Contract.  Need your help ASAP to
> initiate.  With attachment
>
>
>
>
>
>
>
> On Jun 26, 2012, at 12:30 PM, Brett E. Huff wrote:
>
>
>
>
> SNF Lab Users,
> Please find your ID in the attached Excel spreadsheet and complete the
> information on your desired clean room garment size requirements
> Understand that if you request a particular size and change your mind
> later it will be difficult to meet the needs of everyone. No guessing
> please.
>
>
> Lab Staff please reply and specify the following:
> Gown Size:
> Boot Size:
> Hood Size:
>
>
> This should help resolve the existing low stock issue we are currently
> having on boots...
>
>
>
> Brett E. Huff
> SNF Clean Room Manager
> Stanford University
> ?510-612-8670
> bhuff at stanford.edu
>
>
> Brett E. Huff
> SNF Clean Room Manager
> Stanford University
> ?510-612-8670
> bhuff at stanford.edu
>
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From ashutosh.shastry at gmail.com  Wed Jun 27 15:31:21 2012
From: ashutosh.shastry at gmail.com (Ashutosh Shastry)
Date: Wed, 27 Jun 2012 15:31:21 -0700
Subject: Engineering Intern Position
Message-ID: <CAEy1YSEY6A+JaYMX_tvMJbjjedY47aEACvXzCaQfkf1j6pNHJg@mail.gmail.com>

Dear Labmates,



If you know someone who might be interested in the following Engineering
Intern Position:

http://www.coriumgroup.com/jobs.html



Please ask them to contact me.



Thanks,

Ashutosh



*Ashutosh Shastry, Ph.D.*

Director, Engineering

Corium International, Inc.

235 Constitution Drive,

Menlo Park, CA 94025

ashutoshs at coriumintl.com

650-353-7193



-- 
Ashutosh Shastry, Ph.D.
*Science & Strategy for Medical Device Development*
http://www.linkedin.com/in/AshutoshShastry
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From ashutoshs at coriumtech.com  Wed Jun 27 15:08:54 2012
From: ashutoshs at coriumtech.com (Ashutosh Shastry)
Date: Wed, 27 Jun 2012 18:08:54 -0400
Subject: Engineering Intern Position
Message-ID: <1B9A43508C273B4EA9B7AD90914681A505E880AB@cmgitsvr04.coriumintl.com>

 

Dear Labmates,

 

If you know someone who might be interested in the following Engineering
Intern Position:

http://www.coriumgroup.com/jobs.html

 

Please ask them to contact me.

 

Thanks,

Ashutosh

 

Ashutosh Shastry, Ph.D.

Director, Engineering

Corium International, Inc.

235 Constitution Drive,

Menlo Park, CA 94025

ashutoshs at coriumintl.com

650-353-7193

 




CONFIDENTIALITY NOTICE:  This e-mail transmission, and any attachments, is
intended only for the use of the individual

or entity named above and may contain information that is confidential,
privileged and exempt from disclosure under

applicable law. If you are not the intended recipient, you are hereby notified
that any disclosure, copying, distribution

or use of any of the information contained in this transmission is strictly
PROHIBITED.
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From mtang at stanford.edu  Fri Jun 29 16:21:54 2012
From: mtang at stanford.edu (Mary Tang)
Date: Fri, 29 Jun 2012 16:21:54 -0700
Subject: PRS1000 Alert:  Please conserve!
Message-ID: <4FEE3892.8060108@stanford.edu>

To users of wbmetal,wbgen2, wbgeneral and wbgaas:

Our chemical distributor informs us that our regular allotment of 
PRS1000 will be delayed by a few weeks.  We are trying to find stock 
elsewhere, but it seems to be a problem with manufacturer so little luck 
so far.  Please, please conserve your use of PRS1000 as our supplies are 
very low.

- Do not drain/change the shared PRS1000 baths unless OK'ed by staff.
- At general wet benches, use PRX-127 if your process allows.

Thanks for your cooperation and patience --

Your SNF Staff

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From shott at stanford.edu  Sat Jun 30 08:19:34 2012
From: shott at stanford.edu (John Shott)
Date: Sat, 30 Jun 2012 08:19:34 -0700
Subject: Problems with Remote Coral:
Message-ID: <4FEF1906.2000202@stanford.edu>

SNF Lab Members:

I've received a handful of reports over the last week or so about Remote 
Coral failing to run.  Although I don't fully understand the cause of 
this problem, most people have noticed that it has occurred shortly 
after their machine was updated to the latest version of the Java 
Runtime Environment (JRE).  I've received different error reports but 
most of them seem to indicate problems with one or more of the signed 
jar files ... even though I believe that all of the jar files are 
properly signed.  There have been reports of problems such as these on 
the Oracle Java Web Start discussion forums but, thus far, no details of 
what is wrong in the latest JREs.  Nonetheless, you should be able to 
get Remote Coral running again without resorting to the more drastic 
step of removing that JRE.

Thus far, most people have been able to restore Remote Coral 
functionality by simply emptying the Java Web Start cache and then 
reloading it.  Note: thus far this has affected only Windows XP or 
Windows 7 machines, so here are instructions for clearing the Java Web 
Start cache on thos platforms:


Look for the "Run ..." menu item on your Start menu.  When that comes 
up, enter the command "javaws -viewer".

That will open a window name Java Control Panel and a second one named 
the Java Cache Viewer.

In the Java Cache Viewer you will see the Remote Coral entry named 
"Remote Coral (SNF)". Click on that, and then select the large red "X" 
at the top-center of that window.  That will delete Remote Coral from 
your cache.

Then click "Close" on the Java Cache Viewer to close it and "OK" on the 
Java Control Panel to close it.

Then point a browser to:

http://snf.stanford.edu/coral/etc/coral.jnlp

A fresh Remote Roral will be installed.  I think that there is a 80-90% 
chance that this will fix your problem.  If not, I can describe more 
diagnostics and additional steps that should resolve this for you. Send 
me email if this does not work for you.

Note: when you download the fresh version of Remote Coral, you may get a 
pop-up window that is a Security Warning.  That will be asking you if 
you trust software from us (Stanford Nanofabrication Facility) or the 
Legion of the Bouncy Castle.  The Legion of the Bouncy Castle 
(www.bouncycastle.org) is the third-party, open source encryption 
package that we use to encrypt/decrypt your Remote Coral passwords.  I 
certainly trust the code that is contained in their JAR files.

Good luck,

John